Sandal
Latest Patents:
- ANTIREFLECTIVE POLYMER AND HARDMASK COMPOSITION INCLUDING THE SAME
- COMPOSITION AND METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE
- EXPOSURE APPARATUS AND WIRING PATTERN FORMING METHOD
- DEBRIS CATCHER, ROTATING TARGET EXTREME ULTRAVIOLET (EUV) RADIATION GENERATION SYSTEM, METHOD OF GENERATING EUV RADIATION, METHOD OF INSPECTING PHOTOMASK, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
- A PELLICLE CLEANING SYSTEM
Description
The dash-dot-dash broken lines represent the bounds of the claimed design, while all other broken lines shown in the drawings depict portions of the sandal that form no part of the claimed design.
Claims
I claim the ornamental design for a sandal, as shown and described.
Referenced Cited
U.S. Patent Documents
| D121708 | July 1940 | Werman |
| D189716 | February 1961 | Kurata |
| D189717 | February 1961 | Kurata |
| D190468 | June 1961 | Kurata |
| D298582 | November 22, 1988 | Caire |
| D351719 | October 25, 1994 | Piotrowicz |
| D556990 | December 11, 2007 | Cabados |
| D587886 | March 10, 2009 | Neate |
| D587887 | March 10, 2009 | Neate |
| D587888 | March 10, 2009 | Neate |
| D607631 | January 12, 2010 | Carbajal |
Patent History
Patent number: D786539
Type: Grant
Filed: Jul 26, 2016
Date of Patent: May 16, 2017
Assignee: (Cupertino, CA)
Inventor: Gregory Seth Vixama (San Bruno, CA)
Primary Examiner: Holly Baynham
Assistant Examiner: Rashida C Walshon
Application Number: 29/572,256
Type: Grant
Filed: Jul 26, 2016
Date of Patent: May 16, 2017
Assignee: (Cupertino, CA)
Inventor: Gregory Seth Vixama (San Bruno, CA)
Primary Examiner: Holly Baynham
Assistant Examiner: Rashida C Walshon
Application Number: 29/572,256
Classifications
Current U.S. Class:
D2/916