Residual stress measuring device

- Sintokogio, Ltd.
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Description

FIG. 1 is a front elevational view of a residual stress measuring device showing our new design;

FIG. 2 is a rear elevational view thereof;

FIG. 3 is a left side elevational view thereof;

FIG. 4 is a right side elevational view thereof;

FIG. 5 is a top plan view thereof;

FIG. 6 is a bottom plan view thereof;

FIG. 7 is a front, bottom, left side perspective view thereof; and,

FIG. 8 is a rear, top, right side perspective view thereof.

The drawings include surface shading which represents contour and not surface ornamentation.

The broken lines show portions of a residual stress measuring device that form no part of the claimed design.

Claims

The ornamental design for a residual stress measuring device, as shown and described.

Referenced Cited
U.S. Patent Documents
2950620 August 1960 Magill
D273039 March 13, 1984 Behrens
D277835 March 5, 1985 Nonnast
D307284 April 17, 1990 Del Corno
D328257 July 28, 1992 Ormand
D392300 March 17, 1998 Chow
D648742 November 15, 2011 Ward
D707900 June 24, 2014 Ediger
D718643 December 2, 2014 Joung
D768225 October 4, 2016 Hirose
D769211 October 18, 2016 Schnell
Patent History
Patent number: D799345
Type: Grant
Filed: Jun 16, 2016
Date of Patent: Oct 10, 2017
Assignee: Sintokogio, Ltd.
Inventors: Kyoichi Iwata (Toyokawa), Takuya Koyama (Toyokawa)
Primary Examiner: Melanie H Tung
Assistant Examiner: Fritzgerald Butac
Application Number: 29/568,267