Patterning slit for spectrometry
Latest Ocean Optics, Inc. Patents:
- Macro-scale features for optically black surfaces and straylight suppression
- Xenon suppression filter for spectrometry
- Method and light source for generating a tailored spectrum light output
- Reference light adjustment method for spectrometer based measurement or control systems
- Optical slit for a spectrometer that incorporates a wavelength calibration light source
Description
The surrounding broken line(s) define the bounds of the claimed design and form no part thereof.
Claims
The ornamental design for a patterning slit for spectrometry, as shown and described.
Referenced Cited
U.S. Patent Documents
20170003167 | January 5, 2017 | Ave |
20170343413 | November 30, 2017 | Ave |
Patent History
Patent number: D825363
Type: Grant
Filed: Apr 28, 2017
Date of Patent: Aug 14, 2018
Assignee: Ocean Optics, Inc. (Largo, FL)
Inventor: Paul W. Ave (Winter Park, FL)
Primary Examiner: Antoine Duval Davis
Application Number: 29/602,096
Type: Grant
Filed: Apr 28, 2017
Date of Patent: Aug 14, 2018
Assignee: Ocean Optics, Inc. (Largo, FL)
Inventor: Paul W. Ave (Winter Park, FL)
Primary Examiner: Antoine Duval Davis
Application Number: 29/602,096
Classifications