Mask

Skip to: Description  ·  Claims  ·  References Cited  · Patent History  ·  Patent History
Description

FIG. 1 is a perspective view of a first embodiment of a mask showing my new design;

FIG. 2 is a front elevational view thereof in which the profile lines 8-8 and 9-9 herein form no part of the claimed design;

FIG. 3 is a rear elevational view thereof;

FIG. 4 is a left elevational view thereof;

FIG. 5 is a right elevational view thereof;

FIG. 6 is a top plan view thereof;

FIG. 7 is a bottom plan view thereof;

FIG. 8 is a cross-sectional view along line 8-8 shown in FIG. 2;

FIG. 9 is a cross-sectional view along line 9-9 shown in FIG. 2;

FIG. 10 is a perspective view thereof in condition of use, where the design is adapted to fit a lower portion of a human's face;

FIG. 11 is a perspective view thereof in condition of use, where the design is adapted to fit an upper portion of the human's face;

FIG. 12 is a perspective view of a second embodiment of a mask showing my new design;

FIG. 13 is a front elevational view thereof in which the profile lines 19-19 and 20-20 herein form no part of the claimed design;

FIG. 14 is a rear elevational view thereof;

FIG. 15 is a left elevational view thereof;

FIG. 16 is a right elevational view thereof;

FIG. 17 is a top plan view thereof;

FIG. 18 is a bottom plan view thereof;

FIG. 19 is a cross-sectional view along line 19-19 shown in FIG. 13;

FIG. 20 is a cross-sectional view along line 20-20 shown in FIG. 13;

FIG. 21 is a perspective view thereof in condition of use, where the design is adapted to fit a lower portion of a human's face;

FIG. 22 is a perspective view thereof in condition of use, where the design is adapted to fit an upper portion of the human's face;

FIG. 23 is a perspective view of a third embodiment of a mask showing my new design;

FIG. 24 is a front elevational view thereof in which the profile lines 30-30 and 31-31 herein form no part of the claimed design;

FIG. 25 is a rear elevational view thereof;

FIG. 26 is a left elevational view thereof;

FIG. 27 is a right elevational view thereof;

FIG. 28 is a top plan view thereof;

FIG. 29 is a bottom plan view thereof;

FIG. 30 is a cross-sectional view along line 30-30 shown in FIG. 24;

FIG. 31 is a cross-sectional view along line 31-31 shown in FIG. 24;

FIG. 32 is a perspective view thereof in condition of use, where the design is adapted to fit a lower portion of a human's face; and,

FIG. 33 is a perspective view thereof in condition of use, where the design is adapted to fit an upper portion of the human's face.

The design is adapted to be optionally fitted to an upper portion of a human's face or to a lower portion of the human's face.

The dash-dot line broken line in the drawings illustrates section cut lines; the evenly broken lines disclose unclaimed environment. The broken lines form no part of the claimed design.

Claims

The ornamental design for a mask, as shown and described.

Referenced Cited
U.S. Patent Documents
452155 May 1891 Ahlstrom
587687 August 1897 Harder
885802 April 1908 Sterrick
1810486 June 1931 Lancaster
D172060 April 1954 Reich
D244880 June 28, 1977 Terry
4666148 May 19, 1987 Crawford
D307954 May 15, 1990 Alber
D329321 September 15, 1992 Ringwood
D335937 May 25, 1993 Owens
D340548 October 19, 1993 Russell
D340549 October 19, 1993 Russell
D355393 February 14, 1995 Bezener
D423726 April 25, 2000 Backus
D434852 December 5, 2000 Kim
D444920 July 10, 2001 Hicks
D449902 October 30, 2001 Pernicka
D485874 January 27, 2004 Reitz
D494644 August 17, 2004 Quinn
D496698 September 28, 2004 Reesman
6938272 September 6, 2005 Brown
D632745 February 15, 2011 Castaneda
D634373 March 15, 2011 Marrero
D665536 August 14, 2012 Jenke
D668022 October 2, 2012 Mergler
D693056 November 5, 2013 Omoto
D693057 November 5, 2013 Omoto
D693058 November 5, 2013 Omoto
D715453 October 14, 2014 In
D715454 October 14, 2014 Riggons
D763515 August 9, 2016 Chang
D768927 October 11, 2016 Eisenberg
D772327 November 22, 2016 Kaufer
D787115 May 16, 2017 Pan
D787975 May 30, 2017 Kosann
D802670 November 14, 2017 Wu
D818200 May 15, 2018 Broaddus
D832941 November 6, 2018 Wu
D833674 November 13, 2018 Pan
D836835 December 25, 2018 Hazem
20040139981 July 22, 2004 Liu
20050131504 June 16, 2005 Kim
20140352031 December 4, 2014 Choi
Other references
  • http://www.theatregarage.ca/event/mask-making-megan-koshka/—Retrieved Jun. 5, 2018.
  • https://www.bleedingcool.com/2017/09/23/casey-jones-neca-mask/—Published Sep. 23, 2017.
Patent History
Patent number: D857128
Type: Grant
Filed: Sep 27, 2018
Date of Patent: Aug 20, 2019
Inventor: Chun-Hung Wu (New Taipei)
Primary Examiner: Khawaja Anwar
Assistant Examiner: Mojtaba Tehrani
Application Number: 29/664,712
Classifications
Current U.S. Class: Mask (D21/660)