Face mask

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Description

FIG. 1 is a perspective view of a face mask showing the claimed design;

FIG. 2 is a top plan view thereof;

FIG. 3 is a left side view thereof;

FIG. 4 is a front elevation view thereof;

FIG. 5 is a right side view thereof;

FIG. 6 is a rear elevation view thereof; and,

FIG. 7 is a bottom plan view thereof.

The broken lines illustrate portions of the face mask that form no part of the claimed design. The unshaded interior surfaces of the face mask in FIGS. 1, 2 and 7 form no part of the claimed design.

Claims

The ornamental design for a face mask, as shown and described.

Referenced Cited
U.S. Patent Documents
1955098 April 1934 Shaffer
5309574 May 10, 1994 Balaban
D408968 May 4, 1999 Bardin
D510652 October 18, 2005 Edwards
D518625 April 11, 2006 Barnhouse
7818819 October 26, 2010 Chiang
D699018 February 11, 2014 Shehadeh
D702401 April 8, 2014 Phillips
D723245 March 3, 2015 Womack
9591882 March 14, 2017 Duffin
D846831 April 30, 2019 Greene
10765160 September 8, 2020 Page
20140101822 April 17, 2014 Womack
Other references
  • Mission All Season Neck Gaiter . . . , [online article]; [item first available to the internet on Amazon on Jul. 13, 2020]; [retrieved from the internet on Mar. 11, 2021]; URL: https://www.amazon.com/Mission-Adjustable-Breathable-Reusable-Washable/dp/B08CVN81G7/ref=sr_1_42?dchild=1&keywords=neck%2Bgaiter&qid=1615480617&sr=8-42&th=1. (3 pgs).
  • Jasper Printed Neck Gaiter and Bandana. Retrieval and publication date unknown. URL: https://www.discountmugs.com/product/hbnd005-jasper-multi-functional-unisex-neck-gaiter/. (1 pg.).
Patent History
Patent number: D929079
Type: Grant
Filed: Sep 7, 2020
Date of Patent: Aug 31, 2021
Assignee: Shenzhen Sheenwang Technology Co., Ltd (Shenzhen)
Inventor: Jie Wang (Suizhou)
Primary Examiner: Jasmine Mlinarcik
Application Number: 29/749,554
Classifications
Current U.S. Class: D2/880; Face, Mouth, Or Ear (D29/108); D2/600