Mask

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Description

FIG. 1 is a perspective view of a mask, showing my new design;

FIG. 2 is a front elevational view thereof;

FIG. 3 is a rear elevational view thereof;

FIG. 4 is a left side elevational view thereof;

FIG. 5 is a right side elevational view thereof;

FIG. 6 is a top plan view thereof; and,

FIG. 7 is a bottom plan view thereof.

The broken lines in the drawings show stitching in the mask which form a part of the claimed design.

Claims

I claim the ornamental design for a mask, as shown and described.

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Patent History
Patent number: D952131
Type: Grant
Filed: Sep 22, 2020
Date of Patent: May 17, 2022
Assignee: EDL CO., LTD. (Siheung-si)
Inventor: Jun-kyu Kong (Hwaseong-si)
Primary Examiner: Eric L Goodman
Assistant Examiner: Michael Hoffman
Application Number: 29/751,591
Classifications