Facemask
Description
The uneven-length broken lines depict environmental structure and form no part of the claimed design. The even-length broken lines represent stitching and form no part of the claimed design.
Claims
The ornamental design for a facemask, as shown and described.
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- EnerPlex (available [online] May 8, 2020) Retrieved from internet Feb. 11, 2022 from URL: https://www.amazon.com/EnerPlex-Premium-3-Ply-Reusable-Face/dp/B088C2WD5F/ (Year: 2020).
Patent History
Patent number: D963838
Type: Grant
Filed: Jun 12, 2020
Date of Patent: Sep 13, 2022
Inventor: Jung Rok Yoon (Seoul)
Primary Examiner: Richard Kearney
Assistant Examiner: Michael Hoffman
Application Number: 29/737,895
Type: Grant
Filed: Jun 12, 2020
Date of Patent: Sep 13, 2022
Inventor: Jung Rok Yoon (Seoul)
Primary Examiner: Richard Kearney
Assistant Examiner: Michael Hoffman
Application Number: 29/737,895
Classifications