Toy attachment
Latest Patents:
- ANTIREFLECTIVE POLYMER AND HARDMASK COMPOSITION INCLUDING THE SAME
- COMPOSITION AND METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE
- EXPOSURE APPARATUS AND WIRING PATTERN FORMING METHOD
- DEBRIS CATCHER, ROTATING TARGET EXTREME ULTRAVIOLET (EUV) RADIATION GENERATION SYSTEM, METHOD OF GENERATING EUV RADIATION, METHOD OF INSPECTING PHOTOMASK, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
- A PELLICLE CLEANING SYSTEM
Description
Broken lines illustrating an environment of the toy attachment are for illustrative purposes only and form no part of the claimed design.
Claims
The ornamental design for the toy attachment, as shown and described.
Referenced Cited
U.S. Patent Documents
| D269967 | August 2, 1983 | Dmitrowsky |
| D278226 | April 2, 1985 | Henderson |
| D526951 | August 22, 2006 | Houck, II |
| D595187 | June 30, 2009 | Schroeder |
| D616805 | June 1, 2010 | Zha |
| D622204 | August 24, 2010 | Gall |
| D697019 | January 7, 2014 | Friesel |
| D715373 | October 14, 2014 | Thompson |
| D763733 | August 16, 2016 | Gattelli |
| D807809 | January 16, 2018 | Suzuki |
| D913192 | March 16, 2021 | Peng |
Patent History
Patent number: D979658
Type: Grant
Filed: Sep 9, 2020
Date of Patent: Feb 28, 2023
Assignee:
Inventor: Jeroen H. E. van der Weide (Sint-Oedenrode)
Primary Examiner: John A Voytek
Application Number: 29/749,816
Type: Grant
Filed: Sep 9, 2020
Date of Patent: Feb 28, 2023
Assignee:
Inventor: Jeroen H. E. van der Weide (Sint-Oedenrode)
Primary Examiner: John A Voytek
Application Number: 29/749,816
Classifications
Current U.S. Class:
Element Or Attachment (D21/453)