Face mask
Latest Iris Ohyama Inc. Patents:
Description
The broken lines shown represent the environment of the claimed design and form no part of the claimed design.
Claims
The ornamental design for a face mask, as shown and described.
Referenced Cited
U.S. Patent Documents
Foreign Patent Documents
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- A Notice of Allowance mailed by the Japanese Patent Office dated Jan. 5, 2022, which corresponds to Japanese Design Application No. 2021-010267 and is related to Design U.S. Appl. No. 29/815,567; with English language concise translation.
- A Notification mailed by the Japanese Patent Office dated Jan. 5, 2022, which corresponds to Japanese Design Application No. 2021-010267 and is related to Design U.S. Appl. No. 29/815,567; with English language concise translation.
Patent History
Patent number: D990663
Type: Grant
Filed: Nov 15, 2021
Date of Patent: Jun 27, 2023
Assignee: Iris Ohyama Inc. (Sendai)
Inventor: Rie Maeda (Kakuda)
Primary Examiner: Richard Kearney
Assistant Examiner: Michael Hoffman
Application Number: 29/815,567
Type: Grant
Filed: Nov 15, 2021
Date of Patent: Jun 27, 2023
Assignee: Iris Ohyama Inc. (Sendai)
Inventor: Rie Maeda (Kakuda)
Primary Examiner: Richard Kearney
Assistant Examiner: Michael Hoffman
Application Number: 29/815,567
Classifications