Patents Issued in November 20, 2008
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Publication number: 20080284987Abstract: The positions of the four corners of the projection area and the positions of the four corners of the projection image are detected on an image captured by a camera unit, and the positions of the four corners of the projection area with respect to the positions of the four corners of the projection image is transformed to the positions on a panel coordinate system set in a spatial optical modulating device (panel). A first minimum target frame including the four corners of the projection area transformed on the panel coordinate system is set on the panel coordinate system and a second target frame in consideration of an aspect ratio of the projection image is set on the panel coordinate system based on the position of the first target frame on the panel coordinate system.Type: ApplicationFiled: October 18, 2005Publication date: November 20, 2008Applicant: SHARP KABUSHIKI KAISHAInventor: Ryohichi Yonezawa
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Publication number: 20080284988Abstract: Disclosed herein is an image projecting apparatus, including: a one-dimension type light modulating device for modulating a light in accordance with image information; a projection optical system; and a light deflecting device for deflecting an image light in a direction approximately perpendicular to an extension direction of a one-dimensional image light emitted from the one-dimensional light modulating device; wherein the light deflecting device is composed of a first light deflecting device arranged between the projection optical system and the one-dimension type light modulating device, and a second light deflecting device arranged on an emission side of the projection optical system; the second light deflecting device is detachably mounted.Type: ApplicationFiled: April 7, 2008Publication date: November 20, 2008Inventors: Izushi Kobayashi, Yutaka Sugawara, Akihiro Kojima, Akira Nakamura, Katsuhisa Ito
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Publication number: 20080284989Abstract: In a developing method for performing developing treatment of a substrate by supplying a developing solution onto a resist film formed on a surface of the substrate, the present invention controls a zeta potential of the surface of the substrate at a predetermined potential in the same polarity as that of a zeta potential of insoluble substances floating in the developing solution, thereby preventing or reducing the adhesion of the insoluble substances to the resist film and the substrate. This remedies the occurrence of development defects. The adhesion of the insoluble substances to the resist film and the substrate can also be prevented or inhibited by supplying an acid liquid to a liquid on the substrate, or controlling a pH value of the liquid on the substrate to control an absolute value of the zeta potential of the insoluble substances.Type: ApplicationFiled: July 10, 2008Publication date: November 20, 2008Applicant: TOKYO ELECTRON LIMITEDInventors: Yuko Ono, Junichi Kitano
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Publication number: 20080284990Abstract: An immersion lithographic projection apparatus having a megasonic transducer configured to clean a surface and a method of using megasonic waves through a liquid to clean a surface of an immersion lithographic projection apparatus are disclosed. A flow, desirably a radial flow, is induced in the liquid.Type: ApplicationFiled: April 11, 2008Publication date: November 20, 2008Applicant: ASML NETHERLANDS B.V.Inventors: Anthonius Martinus Cornelis Petrus De Jong, Hans Jansen, Marco Koert Stavenga, Peter Franciscus Wanten, Bauke Jansen, Johannes Wilhelmus Jacobus Leonardus Cuijpers, Raymond Gerardus Marius Beeren, Kornelis Tijmen Hoekerd
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Publication number: 20080284991Abstract: An exposure apparatus exposes a substrate with exposure light through a liquid. The exposure apparatus comprises: a liquid immersion member, which has a liquid contact surface that includes a liquid recovery area; and a porous member, which are disposed at a first side of the liquid contact surface; wherein, the liquid on an object, which is disposed at the first side of the liquid contact surface, is recovered from the liquid recovery area.Type: ApplicationFiled: May 9, 2008Publication date: November 20, 2008Applicant: Nikon CorporationInventor: Yasufumi Nishii
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Publication number: 20080284992Abstract: An exposure system for exposing a photoresist layer on a top surface of a wafer to light. The exposure system including: an environment chamber containing a light source, one or more focusing lenses, a mask holder, a slit and a wafer stage, the light source, all aligned to an optical axis, the wafer stage moveable in two different orthogonal directions orthogonal to the optical axis, the mask holder and the slit moveable in one of the two orthogonal directions; a filter in a sidewall of the environment chamber, the filter including: a filter housing containing chemically active carbon nanotubes, the chemically active carbon nanotubes comprising a chemically active layer formed on carbon nanotubes or comprising chemically reactive groups on sidewalls of the carbon nanotubes; and means for forcing air or inert gas first through the filter then into the environment chamber and then out of the environment chamber.Type: ApplicationFiled: July 7, 2008Publication date: November 20, 2008Inventors: Steven J. Holmes, Mark C. Hakey, David V. Horak, James G. Ryan
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Publication number: 20080284993Abstract: A wafer chuck assembly includes a first chuck section configured to hold a semiconductor wafer on a support surface thereof, and a second chuck section removably attached to the first chuck section. The first chuck section has a gap therein, the gap located adjacent an outer edge of the wafer, and the gap containing a volume of immersion lithography fluid therein. A fluid circulation path is configured within the first chuck section so as to facilitate the radial outward movement of the immersion lithography fluid in the gap, thereby maintaining a meniscus of the immersion lithography fluid at a selected height with respect to a top surface of the semiconductor wafer.Type: ApplicationFiled: July 30, 2008Publication date: November 20, 2008Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATIONInventors: Dmitriy Shneyder, Raschid J. Bezama, Dario L. Goldfarb, Kafal Lai
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Publication number: 20080284994Abstract: A method for reducing contamination in immersion lithography includes retaining a semiconductor wafer on a support surface of a wafer chuck, the wafer chuck having a gap therein, the gap located adjacent an outer edge of the wafer, and the gap containing a volume of immersion lithography fluid therein; and providing a fluid circulation path within the wafer chuck so as to facilitate the radial outward movement of the immersion lithography fluid in the gap, thereby maintaining a meniscus of the immersion lithography fluid at a selected height with respect to a top surface of the semiconductor wafer.Type: ApplicationFiled: July 30, 2008Publication date: November 20, 2008Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATIONInventors: Dmitriy Shneyder, Raschid J. Bezama, Dario L. Goldfarb, Kafal Lai
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Publication number: 20080284995Abstract: A method of helping to prevent liquid reaching under a substrate is disclosed that includes introducing a gas at a bottom edge of the substrate so that a buffer is created at the edge of the substrate, helping to keep immersion liquid that is present at the top and edge of the substrate away from the bottom surface of the substrate.Type: ApplicationFiled: July 24, 2008Publication date: November 20, 2008Applicant: ASML NETHERLANDS B.V.Inventors: Joost Jeroen Ottens, Johannes Henricus Wilhelmus Jacobs, Nicolaas Rudolf Kemper, Martinus Hendrikus Antonius Leenders
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Publication number: 20080284996Abstract: Photolithographic apparatus, systems, and methods that make use of optical compensation devices are disclosed. In various embodiments, an imaging mask includes an optically transmissive substrate. A first patterned region is formed on the substrate, and a second patterned region is formed on the substrate that is proximate to the first patterned region, the first patterned region and the second patterned region each having a plurality of optically transmissive and optically attenuating regions formed on the mask. An optical compensation region is positioned proximate to at least one of the first patterned region and the second patterned region that is configured to change a phase of the illumination radiation incident on the at least one of the first patterned region and the second region by altering an optical property of the substrate.Type: ApplicationFiled: May 16, 2007Publication date: November 20, 2008Inventors: Xinya Lei, Fei Wang, Pary Baluswamy
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Publication number: 20080284997Abstract: A scanning exposure apparatus projects a pattern of an original onto a substrate via a projection optical system and shifts the original and the substrate in synchronization with each other with respect to an optical axis of the projection optical system so as to transfer the pattern of the original to the substrate by exposure. The scanning exposure apparatus includes a unit configured to correct a relative position between the original and the substrate by a correction amount according to a shifting rate at which the original and the substrate are shifted in synchronization with each other.Type: ApplicationFiled: March 12, 2008Publication date: November 20, 2008Applicant: CANON KABUSHIKI KAISHAInventor: Yukio Takabayashi
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Publication number: 20080284998Abstract: A system and method for controlling exposure in a lithographic apparatus are disclosed. The system can have adjustable optical elements capable of being decentered to adjust an illumination distribution. Embodiments include a lithographic apparatus structure configured to allow for spatial dose control, for example as a function of X and Y in response to spatial variation in polarization state and birefringence of optical components of the lithographic system.Type: ApplicationFiled: April 2, 2008Publication date: November 20, 2008Applicants: CARL ZEISS SMT AG, ASML NETHERLANDS B.V.Inventors: Bernd Geh, Erik Roelof Loopstra, Donis Flagello
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Publication number: 20080284999Abstract: The invention concerns a device for transferring structures which are provided in a mask onto a substrate, with at least one illumination device, for homogeneous illumination of a section of the mask, and with a mask holding device, for holding a mask in a mask plane which is defined by an X axis and a Y axis which is perpendicular to it, and with at least one lens device, which is arranged on the side of the mask plane facing away from the illumination device, for mapping the structures onto the substrate, and with a substrate holding device, for holding the substrate in a substrate plane which is parallel to the mask plane and at a distance from the lens device, and with means for synchronous movement of the illumination device and lens device in parallel, relative to the mask plane and substrate plane, along the X axis and/or along the Y axis.Type: ApplicationFiled: May 6, 2008Publication date: November 20, 2008Inventor: Erich Thallner
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Publication number: 20080285000Abstract: A lithographic apparatus includes a projection system configured to project a patterned radiation beam onto a target portion of a substrate. The apparatus is configured to provide the radiation beam with a radiation distribution in a pupil plane of an illumination system of the apparatus, the intensity of the radiation contained substantially within a plurality of discrete areas across the radiation beam and the radiation beam having one or more first regions of a first polarization having a spatial distribution across the pupil plane which overlap partial portions of the discrete areas and one or more second regions of a second polarization having a spatial distribution in areas across the pupil plane which overlap the rest of the discrete areas other than the partial portions.Type: ApplicationFiled: May 17, 2007Publication date: November 20, 2008Applicant: ASML NETHERLANDS B.V.Inventors: Hendrikus Alphonsus Ludovicus Van Dijck, Freerk Adriaan Stoffels
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Publication number: 20080285001Abstract: Lithography aperture lenses, illumination systems, and methods are disclosed. In a preferred embodiment, a lens includes a substantially transparent material and an electro-optical material disposed proximate the substantially transparent material, wherein the lens is a lens for an illuminator of a lithography system.Type: ApplicationFiled: May 14, 2007Publication date: November 20, 2008Inventors: Jens Schneider, Vlad Temchenko
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Publication number: 20080285002Abstract: Objectives, such as projection objectives for semiconductor lithography, are disclosed. An objective generally has an optical axis and optical elements mounted in an objective housing. Projection exposure apparatuses having an objective are also disclosed. In addition, guides and adjusting systems for an optical element in an objective are disclosed. Further, related components and methods are disclosed.Type: ApplicationFiled: June 2, 2008Publication date: November 20, 2008Applicant: CARL ZEISS SMT AGInventor: Klaus Rief
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Publication number: 20080285003Abstract: A reticle blind which is capable of being opened and closed at a relatively high speed and which does not cause mechanical disturbances or reaction forces. The reticle blind includes two reticle blind assemblies designed to cooperate with one another to control the passing of a laser beam of an exposure system onto a work piece, such as a semiconductor wafer or flat panel display. Each reticle blind assembly includes a linear motor having a mover and a blind configured to be positioned between a first position and a second position by the mover. Each reticle blind assembly also includes a counter mass assembly including a portion of a guide mechanism having at least one guide bar and a stator of the linear motor. The stator of the linear motor and the guide bar are integrated to form the counter mass which is configured to absorb reaction forces that are created when the blind is moved. In various embodiments, the blinds can be configured to operate in the vertical or horizontal orientation.Type: ApplicationFiled: May 15, 2007Publication date: November 20, 2008Applicant: Nikon CorporationInventors: Michael B. Binnard, Douglas C. Watson, Yoichi Arai
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Publication number: 20080285004Abstract: Methods and apparatus for controlling a stage assembly in up to six degrees of freedom using actuators which each allow for forces to be generated in a horizontal direction and a vertical direction are disclosed. According to one aspect of the present invention, a stage apparatus includes a stage assembly and a first stator arrangement. The stage assembly includes a first magnet arrangement of an actuator assembly, and the first stator arrangement is part of the actuator assembly. The first magnet arrangement cooperates with the first stator arrangement to allow the stage assembly to move relative to a first horizontal axis as well as a vertical axis.Type: ApplicationFiled: May 18, 2007Publication date: November 20, 2008Applicant: NIKON CORPORATIONInventors: Michael B. Binnard, Yoichi Arai, Douglas C. Watson, Alton H. Phillips
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Publication number: 20080285005Abstract: A mover (344) that moves a stage (238) along a first axis includes a magnetic component (354), a conductor component (356), and a sensor (366). The magnetic component (354) includes one or more magnets (354D) that are surrounded by a magnetic field. The conductor component (356) is positioned near the magnetic component (354). Further, the conductor component (356) interacts with the magnetic component (354) to generate a force when current is directed to the conductor component (356). The sensor (366) can be used for determining a first axis component of a magnetic flux of the magnetic component (354) during operation of the mover (344). Further, the sensor (366) can be used to determine a side force (365) that along a second axis that is orthogonal to the first axis that is being generated by the mover (344). With this design, the mover (344) or other components can be controlled to compensate for the side force (370).Type: ApplicationFiled: April 23, 2008Publication date: November 20, 2008Inventors: Jean-Marc Gery, Michael B. Binnard
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Publication number: 20080285006Abstract: To attain a method of manufacturing a semiconductor device using an exposure system capable of obtaining preferable resolution while an adverse effect caused by a reduction in depth-of-focus margin is prevented, there is provided a method of manufacturing a semiconductor device comprising exposing a first portion of a wafer with a first lens aperture, and exposing a second portion of the wafer with a second lens aperture.Type: ApplicationFiled: September 11, 2007Publication date: November 20, 2008Applicant: NEC ELECTRONICS CORPORATIONInventor: Yoshihisa MATSUBARA
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Publication number: 20080285007Abstract: A measurement system that uses a laser triangulation device to measure the thickness of transparent and/or opaque layers of a multilayer film. The triangulation device has a laser device that projects a beam perpendicularly to a surface of the multilayer film and first and second detectors that image first and second reflected rays of the beam at first and second distances offset from first and second optical axes to produce first and second measurement signals. A controller processes the measurement signals using a triangulation procedure and a simultaneous equation procedure to provide a thickness of an outer transparent layer. For a multilayer film having an opaque layer sandwiched between outer transparent layers, first and second triangulation devices are disposed on opposed sides of the film to measure the thickness of each outer film. Knowing the distance between the two devices, the thickness of the opaque layer can be derived.Type: ApplicationFiled: July 28, 2008Publication date: November 20, 2008Inventor: Michael K. Hughes
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Publication number: 20080285008Abstract: A target gas sensing system includes a single source at a first location for generating two light beams having first and second frequencies wherein the difference between the first and second frequencies is the Raman frequency of the target gas. A difference frequency generator outputs the two light beams having the first frequency, the second frequency, and a third light beam having a third frequency that is the difference between the first and second frequencies. The first, second, and third light beams are directed toward the target gas. An input optic directs light from the third light beam, after interacting with the target gas, to a receiver for absorption spectroscopy processing, directs a fourth light beam from the target gas to a receiver for coherent anti-Stokes Raman processing, wherein the fourth light beam has a frequency of twice the first frequency minus the second frequency.Type: ApplicationFiled: May 15, 2007Publication date: November 20, 2008Inventors: Frederick R. Vachss, Robert A. Smith
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Publication number: 20080285009Abstract: This invention belongs to instruments for distance measurement (rangefinders). The proposed laser rangefinder contains, serially connected, pulse laser with an optical system, a pulse amplifier and a regulated pulse generator; also, serially connected, a photoreceiver based on an avalanche photodiode with an optical system (conjugate to that of the laser), an amplifier of photo-detected signals, comparator, time-interval meter, and an object detection indicator. This rangefinder is unique in that the pulse amplifier features an additional output, connected to which is a second laser with an optical system (conjugate to that of the first laser and avalanche photodiode); and an additional second input connected to the first input of the pulse amplifier, to the first output of the regulated pulse generator and to the first input of the time-interval meter.Type: ApplicationFiled: November 9, 2007Publication date: November 20, 2008Applicant: Nikolai N. SlipchenkoInventors: Nikolai N. Slipchenko, Mikhail I. Krymsky
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Publication number: 20080285010Abstract: An object detector projects laser light from a projecting part as detecting waves, moves the laser light horizontally and receives reflected waves of the laser light from an object to detect the position of the object from the elapsed time from when the laser light is projected until its reflection is received. A standard scan direction for a horizontal range of scan is set in a forward direction, and the vertical length irradiated by the laser light at positions where the distance from the projecting part is the same as the horizontal distance of the direction of projection of the detecting waves from the standard scan direction increases.Type: ApplicationFiled: February 22, 2008Publication date: November 20, 2008Applicant: OMRON CorporationInventors: Takashi Shoji, Ryoji Fujioka
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Publication number: 20080285011Abstract: An apparatus for use in measuring the free chlorine level in a solution of halogenated pool/spa water includes a pH adjusting device for producing a first sample of said solution having a first selected pH and a second sample of said solution having a second selected pH, as well as a spectral analyzer for determining first and second ultraviolet light (UV) transmissivity values for each of the first and second samples. An electronic processor receives the first and second transmissivity values and determines the free chlorine or bromine level using those values.Type: ApplicationFiled: May 14, 2007Publication date: November 20, 2008Inventors: Simon Adam Shakespeare, Matthew Emmanuel Milton Storkey
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Publication number: 20080285012Abstract: A method of measuring the free chlorine level in a solution of chlorinated pool/spa water comprises a first sample of said solution having a first selected pH and a second sample of said solution having a second selected pH and determining first and second ultraviolet light (UV) transmissivity values for each of the first and second samples. The first and second transmissivity values are then used to determine the free chlorine level.Type: ApplicationFiled: May 14, 2007Publication date: November 20, 2008Inventors: Simon Adam Shakespeare, Matthew Emmanuel Milton Storkey
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Publication number: 20080285013Abstract: A method for checking the volume of material in the form of a thin layer of a powdery substance in pockets of a blister pack including: bringing at least one blister pack to the measuring area of a measuring system, the pack including a plurality of pockets which are designed to be reflective and are filled with a thin layer of the substance; exposing the substance in at least one of the pockets to near-infrared radiation; recording at least partial ranges of an actual reflectance spectrum for each pocket by detecting the radiation reflected from the pocket; calculating actual values associated with the intensities displayed in the actual reflectance spectrum for at least partial ranges of the actual reflectance spectrum; comparing, in at least partial ranges of the actual reflectance spectrum, the calculated actual values with corresponding reference values associated with the intensities displayed in at least one model spectrum; and checking the ratio of the layer thickness to the density of the powdery subType: ApplicationFiled: May 12, 2008Publication date: November 20, 2008Applicant: Uhlmann VisioTec GmbHInventors: Richard Mertens, Heino Prinz
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Publication number: 20080285014Abstract: A device for measuring an optical property of a liquid crystal display is provided. The device has a light source providing a light, a first polarizer pervious to the light, a second polarizer pervious to the light, a detector receiving the light, and a calculating module. The first polarizer and the second polarizer are mounted between the light source and the detector, a first transmittance spectrum is obtained while the liquid crystal display is mounted between the first polarizer and the second polarizer, and a second transmittance spectrum is obtained while the liquid crystal display is mounted between the detector and the first and second polarizers.Type: ApplicationFiled: May 15, 2007Publication date: November 20, 2008Applicant: ARIMA DISPLAY CORPORATIONInventors: Ko-Chiang Lo, Jung-Chan Tsai
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Publication number: 20080285015Abstract: In a first aspect according to the invention there is provided a sensing system 100, suitable for sensing the stage of processing of a wafer 200, said sensing system 100 comprising receiving means 110 in the form of a first photosensitive device 110a and a second photosensitive device 110b, detector 120, a comparator 130 and a control system in the form of a programmable logic controller (PLC) 140. The first photosensitive device 110a receives light from the wafer 200, while the second photosensitive device 110b receives ambient light. The light received by the first photosensitive device 110a can be incident ambient light reflected off the surface of the wafer 200, refracted light radiating through the wafer 200, filtered light radiating through the wafer 200 or translucent light radiating through the wafer 200. It is further envisaged that the received light may be filtered through filters (not shown) before being received by the photosensitive devices 110a&b.Type: ApplicationFiled: May 16, 2007Publication date: November 20, 2008Inventor: Alan Torres Garcia
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Publication number: 20080285016Abstract: The invention relates to a method for monitoring an optical amplifier, in particular, an optical fiber amplifier, which has an optical input port (3) and an optical output port (5), between which an optical path (7) extends, in which an optical amplification means (9) is arranged, which has at least one pumping source (19), whose optical power (Ppump) is supplied via a coupling unit (11) to optical path (7), wherein the optical input signal power (Pin) supplied to input port (3) of optical amplifier (1) and/or the optical output signal power (Pout) emitted at output port (5) of optical amplifier (1) is detected and wherein the gain (G) of optical amplifier (1) is to be controlled or regulated to a predetermined nominal value. According to the invention, the optical pumping power (Ppump) is presumed to be approximately directly proportional to the electrical pumping current (Ipump), the time-variant proportionality constant subject to a degradation over time being designated with ?(t).Type: ApplicationFiled: April 22, 2008Publication date: November 20, 2008Inventor: Michael Eiselt
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Publication number: 20080285017Abstract: A medical laser system and related methods of monitoring optical fibers to determine if an optical fiber cap on the optical fiber is in imminent danger of failure. The laser system includes a photodetector for converting returned light from the optical fiber cap to an electronic signal for comparison to a trigger threshold value known to be indicative imminent fiber cap failure. The returned light can be the main laser treatment wavelength, an auxiliary wavelength such as an aiming beam or infrared wavelengths generated by a temperature of the optical fiber cap. In the event the electronic signal reaches the trigger threshold value, the laser system can be temporarily shut-off or the power output can be reduced.Type: ApplicationFiled: May 19, 2008Publication date: November 20, 2008Inventors: Gerald M. Mitchell, Douglas G. Stinson, Michael W. Sasnett, David S. Jebens, Michael R. Hodel
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Publication number: 20080285018Abstract: An illumination mask (10a) for a device for the range-resolved determination of scattered light, having one or more scattered-light measuring structures (11a) which respectively include an inner dark-field zone which defines a minimum scattering range, to an associated image-field mask and a corresponding device is provided. Also provided is an associated operating method and a microlithography projection-exposure system having such a device. The scattered-lighter measuring structure in the illumination mask has a scattered-light marker zone (20a) in the form of a bright-field zone, which on the one hand borders the inner dark-field zone and on the other hand borders an outer dark-field zone, which defines a maximum scattering range. The device may optionally be designed for the multi-channel measuring of scattered light by using a suitable image-field mask and also for multi-channel wavefront measurement, and the detection part may contain an immersion medium.Type: ApplicationFiled: July 29, 2008Publication date: November 20, 2008Applicant: Carl Zeiss SMT AGInventors: Michael Arnz, Oswald Gromer, Gerd Klose, Joachim Stuehler, Matthias Manger
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Publication number: 20080285019Abstract: Modified MZ (Mach-Zender) interferometers preferably are utilized to analyze the transmitted, aspherical wavefront of an ophthalmic lens by mounting the lens in a cuvette having a rotatable carousel that can hold multiple lenses. Fresh, temperature controlled, saline solution is circulated about the lenses, and the cuvette is positioned in a vertical test arm of the interferometer configuration. Reverse raytracing preferably is utilized to remove aberrations induced into the wavefront as it is imaged from immediately behind the lens to the detector of the interferometer.Type: ApplicationFiled: December 21, 2007Publication date: November 20, 2008Applicant: Johnson & Johnson Vision CareInventors: Gregory A. Williby, Russell T. Spaulding, Larry G. Jones, James W. Haywood, John Edward Greivenkamp, JR.
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Publication number: 20080285020Abstract: The invention generally relates to a compact, inexpensive-to-manufacture device consisting of few components for optically testing a surface. The zone on the surface that is to be investigated is illuminated by a semitransparent mirror and an aspheric field mirror, employing a telecentric optical train, and at least part of the light reflected or scattered by the surface is imaged onto the entrance pupil of the lens of an electronic camera by the field mirror, via the semitransparent mirror. Images recorded by the camera are analyzed using known image-processing methods.Type: ApplicationFiled: May 8, 2008Publication date: November 20, 2008Applicant: INTELLIGENTE OPTISCHE SENSOREN UND SYSTEME GMBHInventors: Joachim Gaessler, Christian Konz, Harald Richter
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Publication number: 20080285021Abstract: A wafer inspecting method including the steps of scanning the surface of a wafer along a street by using a line sensor having a plurality of elements arranged in a line, and determining a deposited condition of foreign matter on the surface of the wafer near electrodes formed on both sides of the street according to image information obtained by the above scanning step. By the use of the linear sensor, it is possible to efficiently determine whether or not the electrodes are good.Type: ApplicationFiled: April 16, 2008Publication date: November 20, 2008Applicant: DISCO CORPORATIONInventor: Kazuma Sekiya
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Publication number: 20080285022Abstract: A visual inspection apparatus includes: a first substrate holding portion that holds a substrate so that a top surface is observable; a second substrate holding portion that holds the substrate so that a bottom surface is observable; a first substrate holding portion moving mechanism that moves the first substrate holding portion; a second substrate holding portion moving mechanism that moves the second substrate holding portion; and a control device that controls the first substrate holding portion moving mechanism and the second substrate holding portion moving mechanism so that the position of the substrate when observing the top surface of the substrate in the first substrate holding portion substantially matches the position of the substrate when observing the bottom surface of the substrate in the second substrate holding portion.Type: ApplicationFiled: May 15, 2008Publication date: November 20, 2008Applicant: OLYMPUS CORPORATIONInventor: Haruyuki Tsuji
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Publication number: 20080285023Abstract: A method and inspection system to inspect a first pattern on a specimen for defects against a second pattern that is intended to be the same where the second pattern has known responses to at least one probe. The inspection is performed by applying at least one probe to a point of the first pattern on the specimen to generate at least two responses from the specimen. Then the first and second responses are detected from the first pattern, and each of those responses is then compared with the corresponding response from the same point of the second pattern to develop first and second response difference signals. Those first and second response difference signals are then processed together to unilaterally determine a first pattern defect list.Type: ApplicationFiled: June 23, 2008Publication date: November 20, 2008Inventors: Bin-Ming Benjamin Tsai, Russell M. Pon
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Publication number: 20080285024Abstract: An apparatus comprising a mechanically stable substrate selected from the group consisting of a semiconductor, metal, and dielectric and at least two nanowires on the substrate, the nanowires comprising a core and a metal shell, wherein the core is selected from the group consisting of a semiconductor and a dielectric, thereby forming a nanowire-composite to allow plasmon coupling for enhancements of the electric fields and enhancements of the surface enhanced Raman signal (SERS) and enhancements of the chemical or biological specificity and sensitivity.Type: ApplicationFiled: April 8, 2008Publication date: November 20, 2008Inventors: Sharka M. Prokes, Orest J. Glembocki
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Publication number: 20080285025Abstract: A light amount is increased and an analyzing accuracy can be kept in accordance with an enlargement of a load angle, however, a scattered light tends to be loaded in an analysis accompanying the scattered light and a dynamic range of a concentration which can be measured becomes narrow. A light is dispersed by a light dispersing portion, a load angle of the received light is changed per wavelength, the load angle is made larger in the light of a wavelength having a small light amount, and the load angle is made smaller in the light a wavelength having a large light amount and used for an analysis accompanying a scattered light. Accordingly, it is possible to gain a dynamic range of a concentration which can be measured in the analysis accompanying the scattered light, while increasing the light amount and maintaining the analyzing accuracy.Type: ApplicationFiled: May 15, 2008Publication date: November 20, 2008Inventor: Sakuichiro ADACHI
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Publication number: 20080285026Abstract: A measurement-purpose light source generates a measurement light used for measuring an optical characteristic of an object to be measured, and the measurement light includes a component in a wavelength range for measurement of the optical characteristic of the object. An observation-purpose light source generates an observation light used for focusing on the object to be measured and checking a position of measurement. The observation light is selected such that the observation light includes a component that can be reflected from the object to be measured. The measurement light and the observation light are thus applied independently to the object to be measured, through a common objective lens, and accordingly improvement of the precision in measurement of the optical characteristic and facilitation of focusing on the object to be measured are achieved simultaneously.Type: ApplicationFiled: May 15, 2008Publication date: November 20, 2008Applicant: Otsuka Electronics Co., Ltd.Inventors: Makoto OKAWAUCHI, Tsutomu Mizuguchi, Shiro Kawaguchi
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Publication number: 20080285027Abstract: Most scanning systems today employ the conventional prior art method of using mirrors, moving the lens, rotating the slit, and moving the internal optics of the system. This system moves the slit plane across the projected focal plane that is formed by the fore/objective lens. The basic system includes a camera/sensor, a dispersive spectrograph with entrance slit, a computer with control software, an encoded stage and/or motor control, an objective lens, a computer, and an enclosure. The system works as a stationary enclosure with internal moving parts. The spectrograph and camera are moved in precision by a linear stage in the vertical or horizontal plane depending on whether the slit is vertically set or horizontally set. The precision movement of the assembly is controlled via an intelligent motor controller interface and customized software.Type: ApplicationFiled: April 17, 2008Publication date: November 20, 2008Inventor: Mark Allen Lanoue
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Publication number: 20080285028Abstract: The present invention compensates a fluctuation of a light-emitting intensity of a light source. First splitting portions (12, 13) in the present invention are used to split lights emitted from the light source, and an excitation light with a specific wavelength (?Ex) is incident to a sample element 15. Second splitting portions (16, 17) are used to split the lights from the sample element portion, and a fluorescence detecting portion 18 is used to measure the fluorescence intensity (IEm). A reference light detecting portion 19 detects a specific wavelength (?R) of the lights without being selected by the first splitting portion, and then the light intensities detected by the reference light detecting portion are outputted and stored in a spectrum data storage portion 21. The intensity (IEx) of the excitation light is calculated according to the wavelength of the excitation light, the wavelength of the reference light, and the intensity of the reference light in the spectrum data.Type: ApplicationFiled: November 27, 2007Publication date: November 20, 2008Applicant: SHIMADZU CORPORATIONInventor: Masahide Gunji
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Publication number: 20080285029Abstract: A method and apparatus for calibrating an NIRS system which includes a sensor portion (42) and for evaluating an NIRS system for proper functioning is provided that includes an enclosure (40) with at least two windows (16,18) disposed in a wall of the enclosure (40) The windows (16,18) allow the light source (22) and one or more detectors (24) of an NIRS system sensor (42) to interface with the enclosure (40) One window (16) is dedicated to the light source (22) while each light detector (24) has a window (18) dedicate thereto Thus, the enclosure (40) includes a number of windows (16,18) equal to the number of light detectors (24) in the NIRS system sensor plus one The inner surface of the wall(s) of the enclosure (40 is of a light-absorbing color, e.g., black A diffuse reflectance member (28) of a light-reflecting color, e.g.Type: ApplicationFiled: November 3, 2006Publication date: November 20, 2008Applicant: CAS Medical Systems, Inc.Inventors: Paul B. Benni, Andrew Kersey, Krystian Gieryk
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Publication number: 20080285030Abstract: Device for inspecting vegetable products in general, and fruit in particular, by spectroscopic analysis of refracted light, comprising a conveyor (1) provided with equidistant seats (21) for receiving single fruits (3), means (6) for laterally illuminating the fruits, and means (100, 200) arranged to collect the refracted light which passes through the fruit, to concentrate it and to feed it to spectroscopic analysis means, the refracted light collection means comprising a fixed part (200) and a series of movable parts (100) positioned equidistant on a conveyor chain (45) lying above and parallel to a portion of the conveyor (1) and in phase with the seats (21) of this latter, said movable parts being formed from two telescopic bodies (101, 102), of which the outer body (101) is permanently fixed to the chain and the inner body (102) can slide freely downwards by gravity.Type: ApplicationFiled: December 17, 2004Publication date: November 20, 2008Applicant: SACMI COOPERATIVA MECCANICI IMOLA SOCIETA' COOPERAInventor: Dario Beltrandi
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Publication number: 20080285031Abstract: Disclosed are an apparatus and methods for determining electric field characteristics of pulses. In one example, a method is provided in which an unknown pulse is propagated through a first optical fiber. A reference pulse is propagated through a second optical fiber. The unknown pulse and the reference pulse are directed out of the first and second optical fibers into a spectrometer. The unknown pulse and the reference pulse propagated along a pair of crossing trajectories through the spectrometer to form an interferogram. The electric field of the unknown pulse is determined by processing this interferogram.Type: ApplicationFiled: May 17, 2007Publication date: November 20, 2008Applicant: GEORGIA TECH RESEARCH CORPORATIONInventors: Pamela Bowlan, Pablo Gabolde, Rick Trebino
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Publication number: 20080285032Abstract: The light scattering detector according to the present invention aims at simultaneously measuring the molecular weight and size of particles having varieties of diameters. This detector facilitates the measurement operation and knowing how particles associate or dissociate as time progresses. In this detector, the emitted light (static light scattering measurement light) having a first wavelength by the first light source and the emitted light (dynamic light scattering measurement light) having a second wavelength which is different from the first wavelength by the second light source are combined by a beam splitter 5 and coaxially directed onto the sample sell 10 to which a liquid sample S is supplied. While the irradiated area by the static light scattering measurement light is large, the irradiated area by the dynamic light scattering measurement light, which is coherent light, is narrow.Type: ApplicationFiled: August 3, 2007Publication date: November 20, 2008Applicant: SHIMADZU CORPORATIONInventor: Kunihiko Ohkubo
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Publication number: 20080285033Abstract: A method and a device for detecting object properties using electro-optically modulated surface plasmon resonance (SPR) based on phase detection is disclosed. In the case of a surface plasmon resonance sensing device according to the present invention, the voltage is applied on the sensing device made of an electro-optic material to modulate the surface plasmon resonance condition by varying the wavevector of the incident lightwave. The relation between the phase of output optical wave and the applied voltage is measured, and the solution concentration or the material property is obtained by using the slope of a regression straight line of this relations. The invention can be used in the experimental arrangements of the attenuated-total-reflection (ATR) structure and the optical waveguide structure, and has advantages of high sensitivity, high stability, small bulk, low equipment cost, etc.Type: ApplicationFiled: May 15, 2007Publication date: November 20, 2008Inventors: Tzyy-Jiann Wang, Chih-Wuei Hsieh
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Publication number: 20080285034Abstract: A device and method for three-dimensional (3-D) imaging using a defocusing technique is disclosed. The device comprises a lens, at least one polarization-coded aperture obstructing the lens, a polarization-sensitive sensor operable for capturing electromagnetic radiation transmitted from an object through the lens and the at least one polarization-coded aperture, and a processor communicatively connected with the sensor for processing the sensor information and producing a 3-D image of the object.Type: ApplicationFiled: April 23, 2008Publication date: November 20, 2008Inventors: Morteza Gharib, Emilo Gran, Francisco Pereire
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Publication number: 20080285035Abstract: Maintenance of information content in a focused beam of electromagnetic radiation when the intensity thereof is attenuated by application of an aperture-like element.Type: ApplicationFiled: June 18, 2008Publication date: November 20, 2008Inventors: Martin M. Liphardt, Ping He
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Publication number: 20080285036Abstract: Disclosed are photometric methods and devices for determining optical pathlength of liquid samples containing analytes dissolved or suspended in a solvent. The methods and devices rely on determining a relationship between the light absorption properties of the solvent and the optical pathlength of liquid samples containing the solvent. This relationship is used to establish the optical pathlength for samples containing an unknown concentration of analyte but having similar solvent composition. Further disclosed are methods and devices for determining the concentration of analyte in such samples where both the optical pathlength and the concentration of analyte are unknown. The methods and devices rely on separately determining, at different wavelengths of light, light absorption by the solvent and light absorption by the analyte. Light absorption by the analyte, together with the optical pathlength so determined, is used to calculate the concentration of the analyte.Type: ApplicationFiled: February 25, 2008Publication date: November 20, 2008Applicant: Molecular Devices CorporationInventors: Dean G. Hafeman, Calvin Y. Chow