Patents Issued in April 8, 2014
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Patent number: 8691695Abstract: The present invention provides a chemical-mechanical polishing (CMP) composition suitable for polishing a silicon nitride-containing substrate while suppressing polysilicon removal from the substrate. The composition comprises abrasive particles suspended in an acidic aqueous carrier containing a surfactant comprising an alkyne-diol, an alkyne diol ethoxylate, or a combination thereof. Methods of polishing a semiconductor substrate therewith are also disclosed.Type: GrantFiled: June 18, 2010Date of Patent: April 8, 2014Assignee: Cabot Microelectronics CorporationInventors: Kevin Moeggenborg, William Ward, Ming-Shih Tsai, Francesco De Rege Thesauro
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Patent number: 8691696Abstract: Methods are provided for forming an integrated circuit. In an embodiment, the method includes forming a sacrificial mandrel overlying a base substrate. Sidewall spacers are formed adjacent sidewalls of the sacrificial mandrel. The sidewall spacers have a lower portion that is proximal to the base substrate, and the lower portion has a substantially perpendicular outer surface relative to the base substrate. The sidewall spacers also have an upper portion that is spaced from the base substrate. The upper portion has a sloped outer surface. A first dielectric layer is formed overlying the base substrate and is conformal to at least a portion of the upper portion of the sidewall spacers. The upper portion of the sidewall spacers is removed after forming the first dielectric layer to form a recess having a re-entrant profile in the first dielectric layer. The re-entrant profile of the recess is straightened.Type: GrantFiled: May 21, 2012Date of Patent: April 8, 2014Assignee: GLOBALFOUNDRIES, Inc.Inventors: Xiuyu Cai, Xunyuan Zhang, Ruilong Xie, Errol T. Ryan, John Iacoponi
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Patent number: 8691697Abstract: A method includes forming patterned lines on a substrate having a predetermined pitch. The method further includes forming spacer sidewalls on sidewalls of the patterned lines. The method further includes forming material in a space between the spacer sidewalls of adjacent patterned lines. The method further includes forming another patterned line from the material by protecting the material in the space between the spacer sidewalls of adjacent patterned lines while removing the spacer sidewalls. The method further includes transferring a pattern of the patterned lines and the another patterned line to the substrate.Type: GrantFiled: November 11, 2010Date of Patent: April 8, 2014Assignee: International Business Machines CorporationInventors: Roger A. Booth, Jr., Kangguo Cheng, Joseph Ervin, Chengwen Pei, Ravi M. Todi, Geng Wang
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Patent number: 8691698Abstract: A method for etching features in a silicon layer disposed below a mask in a plasma processing chamber a plurality of cycles is provided. A deposition phase forming a deposition on the silicon layer in the plasma processing chamber is provided comprising providing a deposition gas into the plasma processing chamber wherein the deposition gas comprises a halogen containing etchant component and a fluorocarbon deposition component, forming the deposition gas into a plasma, which provides a net deposition on the silicon layer, and stopping the flow of the deposition gas. A silicon etch phase is provided, comprising providing a silicon etch gas into the plasma processing chamber that is different than the deposition gas, forming the silicon etch gas into a plasma to etch the silicon layer, and stopping the flow of the silicon etch gas.Type: GrantFiled: February 8, 2012Date of Patent: April 8, 2014Assignee: Lam Research CorporationInventors: Qing Xu, William Thie, Camelia Rusu
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Patent number: 8691699Abstract: A manufacturing method of a semiconductor device includes: forming an insulating layer above a substrate; forming a recessed section in the insulating layer; forming, on the insulating layer, a mask pattern having a first opening which exposes the recessed section, and a second opening which is arranged outside the first opening and does not expose the recessed section; forming a first conductive member and a second conductive member by respectively depositing a conductive material in the first opening and the second opening; and polishing and removing the first conductive member and the second conductive member on the upper side of the insulating layer so as to leave the first conductive member in the recessed section.Type: GrantFiled: March 22, 2012Date of Patent: April 8, 2014Assignee: Fujitsu LimitedInventors: Tsuyoshi Kanki, Shoichi Suda, Shinya Sasaki
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Patent number: 8691700Abstract: A method of etching a substrate is described. In one embodiment, the method includes preparing a mask layer having a pattern formed therein on or above at least a portion of a substrate, etching a feature pattern into the substrate from the pattern in the mask layer using a gas cluster ion beam (GCIB), and controlling a sidewall profile of the feature pattern etched into the substrate by adjusting a beam divergence of the GCIB.Type: GrantFiled: September 1, 2011Date of Patent: April 8, 2014Assignee: TEL Epion Inc.Inventors: John J. Hautala, Michael Graf
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Patent number: 8691701Abstract: A method for forming etched features in a low-k dielectric layer disposed below the photoresist mask in a plasma processing chamber is provided. Features are etched into the low-k dielectric layer through the photoresist mask. The photoresist mask is stripped, wherein the stripping comprising at least one cycle, wherein each cycle comprises a fluorocarbon stripping phase, comprising flowing a fluorocarbon stripping gas into the plasma processing chamber, forming a plasma from the fluorocarbon stripping gas, and stopping the flow of the fluorocarbon stripping gas into the plasma processing chamber and a reduced fluorocarbon stripping phase, comprising flowing a reduced fluorocarbon stripping gas that has a lower fluorocarbon flow rate than the fluorocarbon stripping gas into the plasma processing chamber, forming the plasma from the reduced fluorocarbon stripping gas, and stopping the flow of the reduced fluorocarbon stripping gas.Type: GrantFiled: May 8, 2009Date of Patent: April 8, 2014Assignee: Lam Research CorporationInventors: Bing Ji, Andrew D. Bailey, III, Maryam Moravej, Stephen M. Sirard
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Patent number: 8691702Abstract: The present invention provides a method for plasma processing a substrate. The method comprising providing a process chamber having a wall; providing a plasma source adjacent to the wall of the process chamber; providing a work piece support within the process chamber; loading a work piece onto the work piece support, the work piece having a support film, a frame and the substrate; providing a cover ring above the work piece, the cover ring having at least one perforated region, and at least one non-perforated region; generating a plasma using the plasma source; and processing the work piece using the generated plasma.Type: GrantFiled: March 14, 2013Date of Patent: April 8, 2014Assignee: Plasma-Therm LLCInventors: Dwarakanath Geerpuram, David Pays-Volard, Linnell Martinez, Chris Johnson, David Johnson, Russell Westerman
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Patent number: 8691703Abstract: A semiconductor device is manufactured by, inter alia: forming second gate lines, arranged at wider intervals than each of first gate lines and first gate lines, over a semiconductor substrate; forming a multi-layered insulating layer over the entire surface of the semiconductor substrate including the first and the second gate lines; etching the multi-layered insulating layer so that a part of the multi-layered insulating layer remains between the first gate lines and the first and the second gate lines; forming mask patterns formed on the respective remaining multi-layered insulating layers and each formed to cover the multi-layered insulating layer between the second gate lines; and etching the multi-layered insulating layers remaining between the first gate lines and between the first and the second gate lines and not covered by the mask patterns so that the first and the second gate lines are exposed.Type: GrantFiled: August 14, 2012Date of Patent: April 8, 2014Assignee: SK Hynix Inc.Inventors: Suk Ki Kim, Hyeon Soo Kim
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Patent number: 8691704Abstract: The invention includes methods for selectively etching insulative material supports relative to conductive material. The invention can include methods for selectively etching silicon nitride relative to metal nitride. The metal nitride can be in the form of containers over a semiconductor substrate, with such containers having upwardly-extending openings with lateral widths of less than or equal to about 4000 angstroms; and the silicon nitride can be in the form of a layer extending between the containers. The selective etching can comprise exposure of at least some of the silicon nitride and the containers to Cl2 to remove the exposed silicon nitride, while not removing at least the majority of the metal nitride from the containers. In subsequent processing, the containers can be incorporated into capacitors.Type: GrantFiled: May 29, 2013Date of Patent: April 8, 2014Assignee: Micron Technology, Inc.Inventors: Kevin R. Shea, Thomas M. Graettinger
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Patent number: 8691705Abstract: A method of patterning a metal alloy material layer having hafnium and molybdenum. The method includes forming a patterned mask layer on a metal alloy material layer having hafnium and molybdenum on a substrate. The patterned mask layer is used as a mask and an etching process is performed using an etchant on the metal alloy material layer having hafnium and molybdenum so as to form a metal alloy layer having hafnium and molybdenum. The etchant includes at least nitric acid, hydrofluoric acid and sulfuric acid. The patterned mask layer is removed.Type: GrantFiled: May 31, 2011Date of Patent: April 8, 2014Assignee: Nanya Technology CorporationInventors: Chih-Wei Huang, Chao-Sung Lai, Hsing-Kan Peng, Chung-Yuan Lee, Shian-Jyh Lin
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Patent number: 8691706Abstract: System and method for reducing substrate warpage in a thermal process. An embodiment comprises pre-heating a substrate in a loadlock chamber before performing the thermal process of the substrate. After the thermal process, the substrate is cooled down in a loadlock chamber. The pre-heat and cool-down process reduces the warpage of the substrate caused by the differences in coefficients of thermal expansion (CTEs) of the materials that make up the substrate.Type: GrantFiled: January 12, 2012Date of Patent: April 8, 2014Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.Inventors: Chen-Hua Yu, Wen-Chih Chiou, Fang Wen Tsai, Kuang-Wei Cheng, Jiann Sheng Chang, Yi Chou Lai, Jiung Wu
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Patent number: 8691707Abstract: A voltage-switchable dielectric layer may be employed on a die for electrostatic discharge (ESD) protection. The voltage-switchable dielectric layer functions as a dielectric layer between terminals of the die during normal operation of the die. When ESD events occur at the terminals of the die, a high voltage between the terminals switches the voltage-switchable dielectric layer into a conducting layer to allow current to discharge to a ground terminal of the die without the current passing through circuitry of the die. Thus, damage to the circuitry of the die is reduced or prevented during ESD events on dies with the voltage-switchable dielectric layer. The voltage-switchable dielectric layer may be deposited on the back side of a die for protection during stacking with a second die to form a stacked IC. A method includes depositing a voltage-switchable dielectric layer on a first die between a first terminal and a second terminal.Type: GrantFiled: August 1, 2013Date of Patent: April 8, 2014Assignee: QUALCOMM IncorporatedInventors: Shiqun Gu, Ratibor Radojcic, Yiming Li
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Patent number: 8691708Abstract: A method of manufacturing a semiconductor device and a substrate processing apparatus capable of providing a TiN film at a higher film-forming rate. The method includes loading a substrate into a processing chamber; simultaneously starting a supply of a first processing gas and a second processing gas to form a film on the substrate, simultaneously stopping the supply of the first and second processing gas; removing the remaining first and second processing gas from the processing chamber; supplying the second processing gas into the processing chamber without supplying the first processing gas; removing the second processing gas starting and then stopping a supply of the first processing gas into the processing chamber without supplying the second processing gas; removing the first processing gas; and unloading the substrate from the processing chamber.Type: GrantFiled: January 24, 2011Date of Patent: April 8, 2014Assignee: Hitachi Kokusai Electric Inc.Inventors: Yukinao Kaga, Tatsuyuki Saito, Masanori Sakai, Takashi Yokogawa
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Patent number: 8691709Abstract: A method of forming metal carbide barrier layers for fluorocarbon films in semiconductor devices is described. The method includes depositing a fluorocarbon film on a substrate and depositing a metal-containing layer on the fluorocarbon film at a first temperature, where the metal-containing layer reacts with the fluorocarbon film to form a metal fluoride layer at an interface between the metal-containing layer and the fluorocarbon film. The method further includes heat-treating the metal-containing layer at a second temperature that is greater than the first temperature, wherein the heat-treating the metal-containing layer removes fluorine from the metal fluoride layer by diffusion through the metal-containing layer and forms a metal carbide barrier layer at the interface between the metal-containing layer and the fluorocarbon film, and wherein the metal-containing layer survives the heat-treating at the second temperature without blistering or pealing.Type: GrantFiled: September 24, 2011Date of Patent: April 8, 2014Assignee: Tokyo Electron LimitedInventor: Yoshiyuki Kikuchi
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Patent number: 8691710Abstract: Metal-containing complexes with general formula (1) (R1nPyr)(R2nPyr)ML1L2; or (2) [(R8XR9)(R1nPyr)(R2nPyr)]ML1L2 are disclosed; wherein M is a Group IV metal, Pyr is pyrrolyl ligand, n=1, 2 and 3, L1 and L2 are independently selected from alkoxide, amide or alkyl, L1 and L2 can be linked together, R1 and R2 can be same or different organic groups substituted at 2,3,4-positions of the pyrrole ring and are selected from the group consisting of linear and branched C1-6 alkyls, R8 and R9 are independently selected from the linear or branched chain alkylene group having 2-6 carbon atoms, and X is CH2 or oxygen. Methods of using the metal complexes as precursors to deposit metal or metal oxide films used for various devices in semi-conductor industries are also discussed.Type: GrantFiled: January 31, 2012Date of Patent: April 8, 2014Assignee: Air Products and Chemicals, Inc.Inventors: Wade Hampton Bailey, III, Sergei Vladimirovich Ivanov, Xinjian Lei, Moo-Sung Kim
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Patent number: 8691711Abstract: Glass for a display device, which comprises, as represented by mole percentage based on the following oxides, from 61 to 72% of SiO2, from 8 to 17% of Al2O3, from 6 to 18% of Li2O, from 2 to 15% of Na2O, from 0 to 8% of K2O, from 0 to 6% of MgO, from 0 to 6% of CaO, from 0 to 4% of TiO2, and from 0 to 2.5% of ZrO2, and having a total content R2O of Li2O, Na2O and K2O of from 15 to 25%, a ratio Li2O/R2O of the Li2O content to R2O of from 0.35 to 0.8, and a total content of MgO and CaO of from 0 to 9%.Type: GrantFiled: May 25, 2011Date of Patent: April 8, 2014Assignee: Asahi Glass Company, LimitedInventors: Tetsuya Nakashima, Seiki Ohara, Tatsuo Nagashima
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Patent number: 8691712Abstract: There is provided an optical glass with a high refractive index and a low dispersion having a refractive index (nd) of not less than 1.75 and an Abbe's number (?d) of not less than 35 where the image formation characteristic is hardly affected by changes in temperature of the using environment. SiO2, B2O3 and La2O3 are contained as essential components and the ratio of the constituting components are adjusted whereby an optical glass in which a product of ? and ? where ? is an average linear expansion coefficient at ?30 to +70° C. and ? is an optical elasticity constant at the wavelength of 546.1 nm is not more than 130×10?12° C.?1×nm×cm?1×Pa?1 is able to be achieved.Type: GrantFiled: November 14, 2012Date of Patent: April 8, 2014Assignee: Ohara Inc.Inventors: Junko Suzuki, Michiko Ogino, Masahiro Onozawa
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Patent number: 8691713Abstract: Treatment at elevated temperature and advantageously superatmospheric pressure with an inert gas, especially nitrogen, rejuvenates molecular sieve catalysts deactivated by use in liquid-phase or supercritical or dense-phase olefin oligomerization, or by use in aromatic alkylation.Type: GrantFiled: May 26, 2006Date of Patent: April 8, 2014Assignee: ExxonMobil Chemical Patents Inc.Inventors: Jihad M. Dakka, Hans K. T. Goris, Stephen H. Brown
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Patent number: 8691714Abstract: This invention relates to a process to make a multimodal polyolefin composition comprising: (i) contacting at least one first olefin monomer with a mixed catalyst system, under polymerization conditions, to produce at least a first polyolefin component having a Mw of 5,000 g/mol to 600,000 g/mol, wherein the mixed catalyst system comprises: (a) at least one polymerization catalyst comprising a Group 4 or Group 5 transition metal; (b) at least one organochromium polymerization catalyst; (c) an activator; and (d) a support material; (ii) thereafter, contacting the first polyolefin component/mixed catalyst system combination with a molecular switch; (iii) contacting the first polyolefin component/mixed catalyst system combination with at least one second olefin monomer, which may be the same or different, under polymerization conditions; and (iv) obtaining a multimodal polyolefin composition.Type: GrantFiled: February 21, 2012Date of Patent: April 8, 2014Assignee: ExxonMobil Chemical Patents Inc.Inventors: Matthew W. Holtcamp, Matthew S. Bedoya
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Patent number: 8691715Abstract: The present invention provides a polymerization process utilizing a dual ansa-metallocene catalyst system. Polymers produced from the polymerization process are also provided, and these polymers have a reverse comonomer distribution, a non-bimodal molecular weight distribution, a ratio of Mw/Mn from about 3 to about 8, and a ratio of Mz/Mw from about 3 to about 6.Type: GrantFiled: January 24, 2013Date of Patent: April 8, 2014Assignee: Chevron Phillips Chemical Company LPInventors: Qing Yang, Max P. McDaniel, William B. Beaulieu, Joel L. Martin, Tony R. Crain
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Patent number: 8691716Abstract: The invention describes the preparation of electrocatalysts, both anodic (aimed at the oxidation of the fuel) and cathodic (aimed at the reduction of the oxygen), based on mono- and plurimetallic carbon nitrides to be used in PEFC (Polymer electrolyte membrane fuel cells), DMFC (Direct methanol fuel cells) and H2 electrogenerators. The target of the invention is to obtain materials featuring a controlled metal composition based on carbon nitride clusters or on carbon nitride clusters supported on oxide-based ceramic materials. The preparation protocol consists of three steps. In the first the precursor is obtained through reactions of the type: a) sol-gel; b) gel-plastic; c) coagulation-flocculation-precipitation.Type: GrantFiled: March 16, 2012Date of Patent: April 8, 2014Assignee: Breton S.p.A.Inventors: Vito Di Noto, Enrico Negro, Sandra Lavina, Giuseppe Pace
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Patent number: 8691717Abstract: The invention discloses core/shell, type catalyst particles comprising a Mcore/Mshell structure with Mcore=inner particle core and Mshell=outer particle shell, wherein the medium diameter of the catalyst particle (dcore+shell) is in the range of 20 to 100 nm, preferably in the range of 20 to 50 nm. The thickness of the outer shell (tshell) is about 5 to 20% of the diameter of the inner particle core of said catalyst particle, preferably comprising at least 3 atomic layers. The core/shell type catalyst particles, particularly the particles comprising a Pt˜based shell reveal a high specific activity. The catalyst particles are preferably supported on suitable support materials such as carbon black and are used as electrocatalysts for fuel cells.Type: GrantFiled: July 24, 2012Date of Patent: April 8, 2014Assignee: Umicore AG & Co. KGInventors: Marco Lopez, Michael Lennartz, Dan V. Goia, Carsten Becker, Stéphanie Chevalliot
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Patent number: 8691718Abstract: The present invention provides a novel ligand represented by the following formula and a novel transition metal complex having the ligand, which shows superior enantioselectivity and catalytic efficiency, particularly high catalyst activity, in various asymmetric synthesis reactions. A transition metal complex having, as a ligand, a compound represented by the formula wherein R4 is a hydrogen atom or a C1-6 alkyl group optionally having substituent(s), and R5 and R6 are each a C1-6 alkyl group optionally having substituent(s), or the formula is a group represented by the formula wherein ring B is a 3- to 8-membered ring optionally having substituent(s).Type: GrantFiled: September 20, 2006Date of Patent: April 8, 2014Assignee: Takeda Pharmaceutical Company LimitedInventors: Mitsuhisa Yamano, Mitsutaka Goto, Shinji Kawaguchi, Masatoshi Yamada, Jun-ichi Kawakami
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Patent number: 8691719Abstract: The present invention relates generally to the field of emission control equipment for boilers, heaters, kilns, or other flue gas-, or combustion gas-, generating devices (e.g., those located at power plants, processing plants, etc.) and, in particular to a new and useful method and apparatus for reducing or preventing the poisoning and/or contamination of an SCR catalyst. In another embodiment, the method and apparatus of the present invention is designed to protect the SCR catalyst. In still another embodiment, the present invention relates to a method and apparatus for increasing the service life and/or catalytic activity of an SCR catalyst while simultaneously controlling various emissions.Type: GrantFiled: May 27, 2011Date of Patent: April 8, 2014Assignee: Babcock & Wilcox Power Generation Group, Inc.Inventors: Mandar R. Gadgil, S. Behrooz Ghorishi
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Patent number: 8691720Abstract: A process for making a fluorinated olefin and/or catalyst composition. The process has the step of dehydrochlorinating a hydrochlorofluorocarbon having at least one hydrogen atom and at least one chlorine atom on adjacent carbon atoms in the presence of a catalytically effective amount of a catalyst composition. The catalyst composition is represented by the following: n wt. % MX/M?OyFz, wherein 0<y<1 and 0<z<2 and wherein y+z/2=1; M is an alkali metal ion selected from the group consisting of Li+, Na+, K+, Rb+, and Cs+; X is a halogen ion selected from the group consisting of F?, Cl?, Br?, and I?, M? is a bivalent metal ion; wherein n is a weight percentage of about 0.05% to about 50% MX based on the total weight of the MX and M?OyFz, and wherein y and z are the mole fractions of oxygen and fluorine in M?OyFz, respectively.Type: GrantFiled: October 12, 2011Date of Patent: April 8, 2014Assignee: Honeywell International Inc.Inventors: Haiyou Wang, Hsueh Sung Tung
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Patent number: 8691721Abstract: A rhodium-loading solution characterized by comprising rhodium atoms and an organic base in a molar ratio of 1:0.5-35.Type: GrantFiled: September 27, 2007Date of Patent: April 8, 2014Assignee: Cataler CorporationInventors: Akiya Chiba, Motoya Abe, Isao Naito
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Patent number: 8691722Abstract: Sorbents comprising activated carbon particles, sulfur, and metal catalyst. The sorbents may be used, for example, for the removal of a contaminant, such as mercury, from a fluid stream.Type: GrantFiled: July 3, 2008Date of Patent: April 8, 2014Assignee: Corning IncorporatedInventors: Kishor Purushottam Gadkaree, Anbo Liu
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Patent number: 8691723Abstract: The sequential production of a library of N different solids, in particular heterogeneous catalysts, where N within a day is an integer of at least 2, is performed by a) producing at least two different sprayable solutions, emulsions and/or dispersions of elements and/or element compounds of the chemical elements present in the catalyst and optionally of dispersions of inorganic support materials, b) continuously metering the at least two different solutions, emulsions and/or dispersions in a predefined ratio into a mixing apparatus in which the solutions, emulsions and/or dispersions are homogeneously mixed, c) continuously drying the mixture removed from the mixing apparatus and recovering the dried mixture, d) changing the ratios in step b) and repeating steps b), c) and d) (N?1) times until N different dried mixtures are obtained, e) optionally shaping and optionally calcining the mixtures to give the solids.Type: GrantFiled: July 30, 2004Date of Patent: April 8, 2014Assignee: BASF AktiengesellschaftInventors: Hartmut Hibst, Frieder Borgmeier, Martin Dieterle
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Patent number: 8691724Abstract: An inlet face for an aftertreatment device that prevents and/or eliminates face-plugging for a passageway where the inlet face is disposed. The inlet face includes a particular end surface disposed on an outer surface at the end of a substrate. The end surface includes at least one of a three-dimensional topographical configuration disposed at the end of the substrate, a chemical coating applied on the end of the substrate, or both a three-dimensional topographical configuration disposed on the end of the substrate and a chemical coating applied on the three-dimensional topographical configuration. As one example, the inlet face can be helpful in preventing carbonaceous fouling, which can result from engine exhaust material, such as carbon soot and other engine exhaust by-products.Type: GrantFiled: September 4, 2012Date of Patent: April 8, 2014Assignee: Cummins Filtration IP, Inc.Inventors: Conrad J. Simon, III, Thomas M. Yonushonis, Bryan E. Blackwell
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Patent number: 8691725Abstract: A synergistic antimicrobial composition containing a glyphosate compound and thiabendazole is provided. Also provided is a method of inhibiting the growth of or controlling the growth of microorganisms in a building material by adding such a synergistic antimicrobial composition. Also provided is a coating composition containing such a synergistic antimicrobial composition, and a dry film made from such a coating composition.Type: GrantFiled: December 9, 2011Date of Patent: April 8, 2014Assignee: Dow Global Technologies LLCInventors: Emerentiana Sianawati, Sudhakar Balijepalli
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Patent number: 8691726Abstract: A synergistic antimicrobial composition containing a glyphosate compound and zinc pyrithione is provided. Also provided is a method of inhibiting the growth of or controlling the growth of microorganisms in a building material by adding such a synergistic antimicrobial composition. Also provided is a coating composition containing such a synergistic antimicrobial composition, and a dry film made from such a coating composition.Type: GrantFiled: December 9, 2011Date of Patent: April 8, 2014Assignee: Dow Global Technologies LLCInventors: Emerentiana Sianawati, Sudhakar Balijepalli
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Patent number: 8691727Abstract: A method of controlling or preventing pathogenic damage or pest damage in a plant propagation material, a plant, parts of a plant and/or plant organs that grow at a later point in time, which comprises applying on the plant, part of the plant, or surroundings thereof, a pesticidal combination comprising, for example, at least three active ingredient components optionally together with one or more customary formulation auxiliaries, wherein component (I) is one or more of an -azole fungicide, component (II) is one or more of a phenylamide fungicide, component (III) is one or more of a strobilurin fungicide and/or one or more of a phenylpyrrole fungicide, in any desired sequence or simultaneously.Type: GrantFiled: November 27, 2006Date of Patent: April 8, 2014Assignee: Syngenta Crop Protection, LLCInventors: Ronald Zeun, Clifford George Watrin, Michael Oostendorp, Franz Brandl
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Patent number: 8691728Abstract: Provided is a composition comprising (a) at least one cyclopropene molecular encapsulating agent complex, and (b) at least one salt other than calcium chloride, wherein the ratio of dry weight of said salt to dry weight of said cyclopropene molecular encapsulating agent complex is from 0.03 to 500, and wherein said composition either (i) has 30% or less water by weight, based on the weight of said composition, and has at least one said salt that is non-deliquescent, or (ii) has more than 30% water by weight, based on the weight of said composition, and has a ratio of dry weight of said salt to weight of said water of 0.05 or higher. Also provided are methods of storing and using such compositions.Type: GrantFiled: October 18, 2007Date of Patent: April 8, 2014Assignee: Rohm and Haas CompanyInventors: Edward Charles Kostansek, Bridget Marie Stevens
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Patent number: 8691729Abstract: A novel reaction discovery system that does not depend on DNA duplex formation is provided. The advantages of this system include exploring reactions conditions not possible where DNA hybridization is required. For example, the inventive reaction discovery system allows for reaction conditions using organic solvents, higher temperatures, and water-insoluble reagents, catalysts, and ligands. The invention also provides single-stranded oligonucleotide templates with substrate pairs covalently attached and methods of screening for reaction conditions that result in a direct covalent bond between the substrates. Kits are also provided for practicing this novel reaction discovery system.Type: GrantFiled: January 9, 2008Date of Patent: April 8, 2014Assignee: President and Fellows of Harvard CollegeInventors: David R. Liu, Matthew William Kanan, Mary M. Rozenman
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Patent number: 8691730Abstract: The present invention overcomes the inadequacies inherent in the known methods for generating libraries of antibody-encoding polynucleotides by specifically designing the libraries with directed sequence and length diversity. The libraries are designed to reflect the preimmune repertoire naturally created by the human immune system and are based on rational design informed by examination of publicly available databases of human antibody sequences.Type: GrantFiled: September 12, 2008Date of Patent: April 8, 2014Assignee: Adimab, LLCInventors: Maximiliano Vasquez, Michael Feldhaus, Tillman U. Gerngross, K. Dane Wittrup
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Patent number: 8691731Abstract: Generating heat within a combination solvent/acid system removes undesirable deposits from petroleum reservoir formations (especially the near well-bore region), oilfield equipment, and petroleum processing equipment. An exothermic reaction occurs between the solvent and the acid and the heat evolved helps remove organic solid deposits. The acids may include organic acid compounds, such as sulfonic acids, sulfuric acid and nitric acid. The solvents may include terpene- and terpene-derivative-containing solvents, including, but not necessarily limited to, limonene, pinene, dipentene, myrcene, turpentines and compounds having at least one double bond, such as methyl furan, dienes, styrene, vinyl acetate and the like. The exothermic reaction produces a great amount of heat, and together with using certain acids and solvents already known as effective to remove paraffin and asphaltene deposition, removing such deposits is improved.Type: GrantFiled: November 5, 2010Date of Patent: April 8, 2014Assignee: Baker Hughes IncorporatedInventors: David W. Jennings, Samuel Asomaning, Michael E. Newberry
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Patent number: 8691732Abstract: A water-based fluid, containing: a non-ionic surfactant, which is stable in a temperature range from 10 to 90° C. and soluble in water; and a salt, wherein the non-ionic surfactant contains an alkyl polyglucoside selected from the group consisting of a C8 alkyl polyglucoside, a C10 alkyl polyglucoside, and mixtures thereof, and the salt is present, and is present in an amount up to 60%. In addition, a process for preventing the formation of a W/O inverse emulsion or resolving a W/O inverse emulsion that has already formed in an oil well in which an oil-based mud has been employed by injecting the water-based fluid into the oil well.Type: GrantFiled: June 9, 2008Date of Patent: April 8, 2014Assignee: ENI S.p.A.Inventors: Lucilla Del Gaudio, Paola Albonico, Sandra Cobianco, Chiara Neva Emiliani, Giuseppe Ripa
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Patent number: 8691733Abstract: Among the methods provided is a method of drilling a subterranean well with an invert emulsion fluid comprising: providing an invert emulsion fluid formed by combining components that comprise: an oil-based continuous phase; an aqueous discontinuous phase; and a polar hydrophobic additive that comprises a polar hydrophobe, wherein the polar hydrophobic additive may substantially increases the yield point, the low-shear yield point, or both of the invert emulsion fluid relative to a fluid without a polar hydrophobic additive while limiting the change in the plastic viscosity to no more than about 35% of the change in the property with the largest increase; and placing the invert emulsion fluid in a subterranean formation.Type: GrantFiled: September 1, 2009Date of Patent: April 8, 2014Assignee: Halliburton Energy Services, Inc.Inventors: Jeffrey J. Miller, Shadaab Syed Maghrabi, Vikrant Bhavanishankar Wagle, William W. Shumway
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Patent number: 8691734Abstract: Well treatment fluids and methods of treating high temperature subterranean formations of up to about 500° F. (260° C.) are provided. The well treatment fluids and methods utilize a high molecular weight synthetic copolymer and a pH buffer than maintains a pH in a range of about 4.5 to about 5.25 for the fluids. The high molecular weight synthetic copolymer is derived from acrylamide, acrylamidomethylpropanesulfonic acid, and vinyl phosphonates. The well treatment fluids may be energized or foamed.Type: GrantFiled: September 19, 2011Date of Patent: April 8, 2014Assignee: Baker Hughes IncorporatedInventors: Paul S. Carman, D. V. Satyanarayana Gupta
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Patent number: 8691735Abstract: Fracturing fluid compositions and methods of fracturing subterranean formations using polyboronic compounds as crosslinking agents are provided. The compositions and methods of the present invention allow for lower polymer loadings because achieving higher fracturing fluid viscosities can be achieved using less polymer than in traditional crosslinked systems.Type: GrantFiled: April 27, 2012Date of Patent: April 8, 2014Assignee: Baker Hughes IncorporatedInventors: Hong Sun, Qi Qu, Frances De Benedictis, Jerry Edwin Pardue
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Patent number: 8691736Abstract: The invention is directed to long lasting crosslinked water-soluble swellable polymers, methods for making same, and their uses. More particularly, the invention relates to a composition comprising expandable polymeric particles having cationic sites as well as labile crosslinkers and stable crosslinkers, said particle mixed with a fluid. A particularly important use is as an injection fluid in petroleum production, where the expandable polymeric particles are injected into a target zones in the reservoirs and when the heat and/or a suitable pH in the reservoir cause degradation of the labile crosslinker and when the particle expands, the cationic sites in the polymer adsorb to negative sites of the rock in the formation, thus diverting water to lower permeability regions and improving oil recovery. However, many other uses are possible.Type: GrantFiled: June 14, 2010Date of Patent: April 8, 2014Assignees: ConocoPhillips Company, University of KansasInventors: Ahmad Moradi-Araghi, James H. Hedges, David R. Zornes, Riley B. Needham, Huili Guan, Jenn-Tai Liang, Cory Berkland, James P. Johnson, Min Cheng, Faye L. Scully
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Patent number: 8691737Abstract: Disclosed are spacer fluids and methods of use in subterranean formations. Embodiments may include use of consolidating spacer fluids in displacement of drilling fluids from a well bore annulus.Type: GrantFiled: March 27, 2013Date of Patent: April 8, 2014Assignee: Halliburton Energy Services, Inc.Inventors: Jiten Chatterji, D. Chad Brenneis, Crystal L. Keys, James R. Benkley, Craig W. Roddy, Ronnie G. Morgan, Rickey L. Morgan
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Patent number: 8691738Abstract: Lubricating oils of improved initial and long term metal corrosion inhibiting properties comprises a base stock containing one or more hydrodewaxate or hydroisomerate base stock(s) and/or base oil(s), GTL base stock(s) and/or base oil(s), or mixtures thereof, preferably GTL base stock(s) and/or base oil(s), boiling in the lubricating oil boiling range and an additive amount of an anti-corrosion additive.Type: GrantFiled: May 4, 2010Date of Patent: April 8, 2014Assignee: ExxonMobil Research and Engineering CompanyInventors: David J. Baillargeon, Marc-André Poirier
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Patent number: 8691739Abstract: To provide a fuel-efficient lubricating oil composition, particularly suitable for internal combustion engines, which has a reduced shear viscosity in an intermediate temperature range from 80 to 100° C., an effective temperature range for reducing fuel consumption. The present invention provides a lubricating oil composition comprising a base oil incorporated with a viscosity index improver, wherein the viscosity index improver has a peak area at a chemical shift between 3.4 and 3.7 ppm in a spectral pattern observed by nuclear magnetic resonance analysis (1H-NMR) accounts for 5% or more of the total peak area.Type: GrantFiled: July 28, 2006Date of Patent: April 8, 2014Assignee: Exxonmobil Research and Engineering CompanyInventors: Yasuharu Yokoyama, Miyoshi Marumo, Satoshi Ogano
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Patent number: 8691740Abstract: A composition is provided suitable for use as a friction modifier for an automatic transmission, comprising an N-substituted oxalic acid bisamide or amide-ester containing at least two hydrocarbyl groups of 12 to 22 carbon atoms.Type: GrantFiled: February 11, 2010Date of Patent: April 8, 2014Assignee: The Lubrizol CorporationInventors: Richard J. Vickerman, Daniel J. Saccomando
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Patent number: 8691741Abstract: The present invention provides a liquid detergent composition containing the following components (a) to (c), wherein the total content of components (a) to (c), (a)+(b)+(c), is 40 to 90% by mass; a mass ratio of components (a) to (b), (a)/(b), is 25/75 to 90/10; and a mass ratio [(a)+(b)]/(c), is 95/5 to 70/30: component (a): 15 to 75% by mass of a nonionic surfactant produced by adding p1 mol of ethylene oxide to a compound represented by R—OH (wherein, R represents a hydrocarbon group having 8 to 18 carbon atoms), then adding q1 mol of an alkylene oxide having 3 to 5 carbon atoms, and then adding p2 mol of ethylene oxide, wherein p1 is the number of 3 to 30, q1 is the number of 1 to 5, and p1+p2 is 14 to 50, component (b): anionic surfactant, component (c): cationic surfactant, component (d): 5 to 40% by mass of water-miscible organic solvent.Type: GrantFiled: April 16, 2010Date of Patent: April 8, 2014Assignee: Kao CorporationInventors: Hitoshi Ishizuka, Kyoko Okada, Yoshiyuki Komatsu, Toshio Miyake
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Patent number: 8691742Abstract: Treatment composition, preferably liquid detergent compositions exhibiting a two, or multicolor effect, comprising an aesthetic system including a colored interference pigment and a dye system.Type: GrantFiled: September 28, 2009Date of Patent: April 8, 2014Assignee: The Procter & Gamble CompanyInventors: Jean-Pol Boutique, Karl Ghislain Braeckman, Karel Jozef Maria Depoot, Jan-Sebastiaan Uyttersprot, Tim Roger Michel Vanpachtenbeke, Nathalie Jean Marie-Louise Vanwyngaerden
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Patent number: 8691743Abstract: The present invention relates to aqueous liquid detergent compositions comprising an alkaline protease and/or one or more other non-proteolytic enzymes, and an enzyme stabilization system. The invention also relates to enhancing stability of the non-proteolytic enzymes in a liquid detergent composition comprising an alkaline protease.Type: GrantFiled: May 14, 2009Date of Patent: April 8, 2014Assignee: Novozymes A/SInventors: Kenneth Edmund Kellar, Christina Edwards, Domenic Paone, Megan Allen
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Patent number: 8691744Abstract: Siloxane copolymers producible by (a) reacting organopolysiloxanes (1) having a Si-bound hydrogen atom with linear oligomeric or polymeric compounds (2) of the general formula R1-(A-CnH2n)m-A1-H (I), (b) reacting the resultant H-A1 group-bearing intermediates (4) with organic compounds (5) having at least two isocyanate groups in the presence of further organic compounds (6) and (7) which are reactive toward isocyanate groups, wherein the compounds (6) contain at least one tertiary amine group and the compounds (7) can be eliminated from the siloxane copolymer in a temperature range from 50° C. to 250° C., wherein free isocyanate groups are formed in the siloxane copolymer, and (c) partially or completely quaternizing the amine-containing intermediates (8) from step (b) with an alkylating agent (9).Type: GrantFiled: December 8, 2009Date of Patent: April 8, 2014Assignee: Wacker Chemie AGInventors: Michael Messner, Sabine Hoffmann, Jens-Peter Moldenhauer