Abstract: A retardation element includes an alignment film and a retardation layer in contact with a surface of the alignment film, and the retardation layer is formed by applying a paint containing a liquid crystal monomer and a non-liquid crystal monomer on the surface of the alignment film and then polymerizing the paint while the liquid crystal monomer is placed in an alignment state.

Abstract: A first retardation plate arranged on a front side causes light received through the a first polarizing plate from the front side to become close to circularly polarized light rotating in a first direction. Second and third retardation plates arranged on a back side cause light received through a second polarizing plate from the back side to become close to circularly polarized light rotating in a second direction opposite to the first direction while passing through both of the second and third retardation plates and the liquid crystal layer in black display period. With this structure, good image quality can be obtained even when used in outdoor.

Abstract: A biaxial retardation film is disclosed, including a substrate, wherein the substrate includes an alignment film thereon or an alignment-treated surface; and an optically anisotropic coating on the substrate, wherein the optically anisotropic coating includes a top layer and a bottom layer, wherein the bottom layer is a parallel aligned liquid crystal layer along an alignment direction of the substrate, and the top layer is a vertically aligned hexagonal pillar array liquid crystal layer, wherein three-dimensional refractive indices of the optically anisotropic coating satisfy a relationship nx>nz>ny. The disclosure also provides a fabrication method thereof.

Abstract: An optical element is provided. The optical element shows excellent durability, hardness property and reworkability. Therefore, the optical element can have a stable light division property since the phase retardation property of the phase retardation layer in the optical element can be stably maintained for a long period of time under severe conditions. Also, it is possible to prevent side effects such as light leakage in an optical instrument to which the optical element is applicable. Also, the optical element can show excellent resistance to external pressure or scratches.

Abstract: Optical compensation films and a method for reducing dark-state light leakage of vertical alignment liquid crystal displays are disclosed. The light path difference (LC?ND) is in a range of 324.3-342.8 nm, and the pretilt angle is in a range of 85 to 90 degrees when measured at a wavelength of 550 nm. Wherein an in-plain retardation value Ro of the biaxial compensation film is in the range of 48-84 nm, an out-of-plain retardation value Rth of the biaxial compensation film is in the range of 160-280 nm, and a retardation value Rth of the TAC compensation film is within a range between Y1 and Y2. The compensation structure with single layer of biaxial compensation film not only can reduce the dark-state light leakage, but also can increase the contrastness and the resolution in the wide viewing angle.

Abstract: A display device includes a first substrate, at least a first protrusion, a first electrode, a second substrate, at least a second protrusion, a second electrode and a display medium. The first protrusion is disposed on the first substrate. The first electrode is disposed on the first protrusion. The second substrate is disposed opposite to the first substrate. The second protrusion is disposed on the second substrate. The second electrode is disposed on the second protrusion, wherein the first electrode and the second electrode are displaced in a horizontal direction so as to form a lateral electric field therebetween. The display medium is sandwiched between the first and the second substrates.

Abstract: A display panel and a display device having the display panel are discussed. According to an embodiment, the display panel includes a lower substrate provided with a display area and a non-display area; a plurality of data pad portions formed at a side region of the non-display area; an upper substrate bonded to the lower substrate, except for the side region of the non-display area; and at least one ground line supplied with ground power, and formed on the lower substrate of the non-display area to surround in part an outline portion of the display area.

Abstract: A liquid crystal display (LCD) is provided that comprises a rearward LCD substrate sheet that has an array of vias formed, where the vias provide electrical conduction between both sides of the rearward LCD substrate sheet. The number of vias in the array is substantially equal to or at least equivalent to a combination of a number of column drive lines and a number of row drive lines. The respective drive lines are connected to a corresponding via, such as on one side of the rearward LCD substrate sheet, and respective patterned conductors are connected to a corresponding via, such as on the other side of the rearward LCD substrate sheet. The patterned conductors provide a connection between respective drive lines and one or more corresponding drivers. In one example, this allows a “full bleed” display to be generated.

Abstract: A mother TFT substrate having plural TFT substrates, and a mother counter substrate having plural counter substrates are bonded together to form a mother panel. At this time, the interior of the mother panel is sealed only with a sealing material, without forming a sealant separately in seal portions. The mother counter substrate has plural counter substrates of liquid crystal cells. A sealing material is arranged in two rows surrounding the counter substrates in the periphery of the mother counter substrate, except for the seal portions in which seal portion sealing materials are arranged in two rows in a staggered manner on the short sides. When the mother counter substrate and the mother TFT substrate are overlapped and the inside air is let out, the sealing materials are heated. Then, the seal portion sealing materials are bridged together to seal the interior of the mother panel.

Abstract: A liquid crystal display device includes a TFT substrate having an organic passivation film, and a counter substrate, with liquid crystals inside of the liquid crystal display device. A columnar spacer is formed on the counter substrate, which defines a distance between the TFT substrate and the counter substrate, and a concavo-convex pedestal is formed in a pixel region of the TFT substrate, the concavo-convex pedestal being provided in facing relation to the columnar spacer. The concavo-convex pedestal is formed with a convex portion and a concave portion at a bottom of the concavo-convex pedestal, with a top end of the columnar spacer being in contact with two or more convex portions formed on the bottom of the concavo-convex pedestal, and an area at the bottom of the concavo-convex pedestal being larger than the area at the top end of the columnar spacer.

Abstract: A mirror system, comprising a spectrally selective liquid crystal reflective assembly, designed and constructed to substantially absorb or transmit light at wavelengths corresponding to mesopic conditions, while reflecting light at other wavelengths. In one embodiment, the reflectance level of the mirror system is altered in response to a voltage applied across the selective liquid crystal reflective assembly.

Abstract: A lithographic apparatus includes a radiation system for providing a beam of radiation from radiation emitted by a radiation source. The radiation system includes a contaminant trap for trapping material emanating from the radiation source. The rotation contaminant trap includes a multiple number of elements extending in a radial direction from a common rotation trap axis and being arranged for allowing contaminant material emanating from the radiation source to deposit during propagation of the radiation beam in the radiation system. The radiation system further includes a contaminant catch for receiving contaminant material particles from the rotation trap elements, the contaminant catch having a constitution, during operation of the radiation, for retaining said contaminant material particles.

Abstract: Immersion lithography aberration control systems and methods that compensate for a heating effect of exposure energy in an immersion fluid across an exposure zone are provided. An aberration control system includes actuators that adjust optical elements within the immersion lithography system and a fluid heating compensation module coupled to the actuators. The fluid heating adjustment module determines actuator commands to make aberration adjustments to optical elements within the immersion lithography system based on changes in one or more of a flow rate of the immersion liquid, an exposure dose and a reticle pattern image. In an embodiment, the aberration control system includes an interferometric sensor that pre-calibrates aberrations based on changes in operating characteristics related to the immersion fluid. Methods are provided that calibrate aberrations, determine actuator adjustments and implement actuator adjustments upon changes in operating characteristics to control aberration effects.

Abstract: A lithographic projection apparatus includes a substrate table to hold a substrate, a projection system to project a patterned beam of radiation onto the substrate and a liquid confinement structure to confine a liquid in a space between the projection system and the substrate, the substrate, the substrate table, or both, to form a part of a boundary of the space. In addition, a closing plate forms a part of a boundary of the space in place of the substrate, the substrate table, or both, when moved without substantially disturbing the liquid, the liquid confinement structure, or both.

Abstract: An exposure apparatus includes a projection optical system by which an image of a pattern is projected onto a substrate to expose the substrate. The apparatus also includes a liquid supply system having a supply port from which a liquid is supplied to a space under the projection optical system. A supply amount of the liquid per unit time from the supply port is changed without stopping the liquid supply from the supply port, and the supply amount of the liquid per unit time from the supply port in a first operation is different from the supply amount of the liquid per unit time from the supply port in a second operation that is different from the first operation.

Abstract: A reflective reticle substantially reduces or eliminates pattern distortion that results from the absorption of EUV radiation while maintaining a reticle thickness consistent with industry standards. The reflective reticle includes a layer of ultra-low expansion (ULE) glass and a substrate of Cordierite having a thermal conductivity substantially larger than that of ULE glass. An aluminum layer is disposed onto a first surface of the ULE glass and a second surface of the ULE glass is polished to be substantially flat and defect-free. The Cordierite substrate can be directly bonded to the aluminum layer using anodic bonding to form the reflective reticle. Alternatively, a first surface of an intermediate Zerodur layer can be bonded to the aluminum layer, and a second aluminum layer can be used to anodically bond the Cordierite substrate to a second surface of the Zerodur layer, thereby forming the reflective reticle.

Abstract: Photolithographic apparatus, systems, and methods that make use of sub-resolution assist devices are disclosed. In the various embodiments, an imaging mask includes an optically transmissive substrate having a sub-resolution assist device that further includes a first optical attenuation region and a spaced-apart second optical attenuation region, and an optically transmissive phase adjustment region interposed between the first optical attenuation region and the second optical attenuation region, the phase adjustment region being configured to change a phase of incident illumination radiation by altering an optical property of the substrate.

Abstract: The present disclosure relates to the field of micro-nano fabrication, and provides a projection-type photolithography system using a composite photon sieve. The system comprises: a lighting system, a mask plate, a composite photon sieve and a substrate, which are arranged in order. The lighting system is adapted to generate incident light and irradiate the mask plate with the incident light. The mask plate is adapted to provide an object to be imaged by the composite photon sieve, and the incident light reaches the composite photon sieve after passing through the mask plate. The composite photon sieve is adapted to perform imaging, by which a pattern on the mask plate is imaged on the substrate. The substrate is adapted to receive an image of the pattern on the mask plate imaged by the composite photon sieve.

Abstract: An exposure apparatus (10) for transferring a mask pattern (12A) from a mask (12) to first and second substrates (14A) (14B) includes an illumination system (18) that generates and simultaneously directs a first beam (32A) at the mask pattern (12A) and a second beam (32B) at the mask pattern (12A). Further, the first beam (32A) is spaced apart from the second beam (32B) at the mask pattern (12A). As provided herein, the first beam (32A) directed at the mask (12) creates a first pattern beam (34A) that is transferred to a first substrate location (33A), and the second beam (32B) directed at the mask (12) creates a second pattern beam (34B) that is transferred to a second substrate location (33B). Moreover, the first substrate location (33A) is spaced apart from the second substrate location (33B). With this design, the first pattern beam (34A) can be transferred to the first substrate (14A) and the second pattern beam (34B) can be simultaneously transferred to the second substrate (14B).

Abstract: Some embodiments include system and methods to obtain information for adjusting variations in features formed on a substrate of a semiconductor device. Such methods can include determining a first pupil in an illumination system used to form a first feature, and determining a second pupil used to form a second feature. The methods can also include determining a pupil portion belonging to only one of the pupils, and generating a modified pupil portion from the pupil portion. Information associated with the modified pupil portion can be obtained for controlling a portion of a projection lens assembly of an illumination system. Other embodiments are described.

Abstract: A position sensor is configured to measure a position data of a target. The position sensor includes a radiation source configured to irradiate a radiation beam, a first grating configured to diffract the radiation beam in a first diffraction direction into at least a first order diffraction beam, and a second grating, arranged in an optical path of the first order diffraction beam, the second grating being configured to diffract the first order diffraction beam diffracted at the first grating in a second diffraction direction substantially perpendicular to the first diffraction direction. The second grating is connected to the target. A first detector is configured to detect at least a part of the beam diffracted by the first grating, and at least one second detector is configured to detect at least part of the beam diffracted by the first grating and the second grating.

Abstract: An apparatus, a method of designing the apparatus, a tool using the apparatus and a method of using the apparatus for optimizing optical photolithography during formation of integrated circuits. The apparatus includes: an asymmetrical complementary dipole element including: first and second openings being equidistant and minor images about a first axis, the first and second openings having essentially a same first area and a same first optical density relative to a selected wavelength of light; third and fourth openings being equidistant and minor images about a second axis, the third and fourth openings having essentially a same second area, and a same second optical density relative to the selected wavelength of light; and wherein the first axis is perpendicular to the second axis and the first and second optical densities are different.

Abstract: An interchangeable chromatic range sensor (CRS) probe for a coordinate measuring machine (CMM). The CRS probe is capable of being automatically connected to a CMM under program control. In one embodiment, in order to make the CRS probe compatible with a standard CMM auto exchange joint, all CRS measurement light transmitting and receiving elements (e.g., the light source, wavelength detector, optical pen, etc.) are included in the CRS probe assembly. The CRS probe assembly also includes an auto exchange joint element that is attachable through a standard auto exchange joint connection to a CMM. In one embodiment, in order to provide the required signals through the limited number of connections of the standard CMM auto exchange joint (e.g., 13 pins), a low voltage differential signaling (LVDS) serializer may be utilized for providing additional control and data signals on two signal lines.

Abstract: Methods and systems for adaptively controlling the illumination of a scene are provided. In particular, a scene is illuminated, and light reflected from the scene is detected. Information regarding levels of light intensity received by different pixels of a multiple pixel detector, corresponding to different areas within a scene, and/or information regarding a range to an area within a scene, is received. That information is then used as a feedback signal to control levels of illumination within the scene. More particularly, different areas of the scene can be provided with different levels of illumination in response to the feedback signal.

Abstract: The invention provides a distance measuring instrument, comprising a light emitting unit 13 for emitting a distance measuring light, a photodetecting unit 14 for receiving and detecting a reflected distance measuring light from an object to be measured and a part of the distance measuring light emitted from the light emitting unit as an internal reference light, a sensitivity adjusting unit 23 for electrically adjusting photodetecting sensitivity of the photodetecting unit, and a control arithmetic unit 22 for calculating a measured distance based on a photodetection signal of the reflected distance measuring light from the photodetecting unit and based on a photodetection signal of the internal reference light, wherein the control arithmetic unit can measure a distance by selecting a prism mode measurement and a non-prism mode measurement, and controls so that photodetecting sensitivity of the photodetecting unit is changed by the sensitivity adjusting unit in response to the selected measurement mode.

Abstract: Disclosed is apparatus for distinguishing between ground and an obstacle for autonomous mobile vehicle, comprising an upper 2D laser radar 1, a lower 2D laser radar 2, and a processing unit 10, the processing unit 10 comprising a distance data receiving part 11, an inclination calculating part 12, a ground and obstacle determining part 13, and a transmitting part. Also disclosed is a method for distinguishing between ground and an obstacle for autonomous mobile vehicle by using the apparatus for distinguishing between ground and an obstacle for autonomous mobile vehicle of claim 1, in which the detected object is determined as an obstacle when the actual inclination (g) of the detected object is larger than the reference inclination, and as ground when the actual inclination (g) of the detected object is smaller than the reference inclination.

Abstract: A system and method for monitoring bending curvature of a flexible pipe structure, including at least one conduit configured to conform to a profile of a bend stiffener of a flexible pipe structure, and the at least one conduit including one or more sensors, wherein each sensor is configured for measuring a bending curvature of the bend stiffener.

Abstract: An apparatus to detect a pressure signal in a fluid flowing in a conduit comprises a flexible band sized to fit at least partially around the conduit. An optical fiber is flexibly adhered to the flexible band. At least one fastener is attached to the flexible band to fasten the flexible band at least partially around the conduit. A method for detecting a pressure signal in a conduit comprises adhering an optical fiber to a flexible band. At least one fastener is attached to the band. The band is fastened around the conduit such that a strain induced in the conduit by the pressure signal is transmitted to the optical fiber.

Abstract: Analysis and characterization of semiconductor and free-metal devices using a plurality of “live” and stored interference patterns or data detected to determine or generate two-dimensional or three-dimensional information of at least one internal stress or signal, or determining the effects thereof of internal or external stresses acting upon or within the electrical signals applied to a device under test or evaluation having exterior surfaces, interior structures, electronic features as well as determining the effects thereof of chemicals, bioelectric materials, or substances, placed adjacent to the surface of the devices under test.

Abstract: A blood analysis apparatus includes an analysis section. The analysis section is configured to compare a measurement spectrum obtained regarding red blood cells with a standard spectrum of heme, biliverdin, and bilirubin, and cause the measurement spectrum to belong to any one of the standard spectra.

Abstract: A system for measuring a characteristic of a solar cell is disclosed and includes a light source irradiating an optical signal having a spectral range from about 100 nm to about 3000 nm, a wavelength selector configured to selectively narrow the spectral range of the optical signal, a beam splitter, a reference detector in optical communication with the beam splitter and configured to measure a characteristic of the optical signal, a specimen irradiated with the optical signal, a reflectance detector in optical communication with the specimen via the beam splitter and configured to measure an optical characteristic of the optical signal reflected by the specimen, a multiplexer in communication with at least one of the reference detector, specimen, and reflectance detector, and a processor in communication with at least one of the reference detector, specimen, and reflectance detector via the multiplexer and configured to calculate at least one characteristic of the specimen.

Abstract: Problems of excessive fading in systems for monitoring single-mode optical fiber for physical disturbances are addressed by launching into the fiber polarized light having at least two different predetermined launch states of polarization whose respective Stokes vectors are linearly-independent of each other; downstream from the first location, receiving the light from the fiber; analyzing the received light using polarization state analyzer means having at least two different analyzer states of polarization that are characterized by respective Stokes vectors that are linearly-independent of each other and detecting the analyzed light to provide corresponding detection signals; deriving from the detection signals measures of changes in polarization transformation properties of the fiber between different times that are substantially independent of said launch states and said detection states; and, on the basis of predefined acceptable physical disturbance criteria determining whether or not the measures are i

Abstract: A system for obtaining a propagation factor for determining the performance of a light beam (32) includes a light sensor (10), a lens element (30) operable to focus a beam from a light source to be tested towards the sensor element (10); wherein the lens element is a variable focus lens (30).

Abstract: An embodiment of a system and a method for inspecting a contact lens is provided. The illumination system illuminates the center zone and the peripheral zone of the contact lens when it is inside a cavity between a male mold and a female mold. The imaging optical system has two channels to capture two images or a composite single image to inspect the entire contact lens. The imaging optical system of the first channel has its entrance pupil far away from the mold tool. The camera of the first channel is used to capture the image of the center zone of the contact lens. The image optical system of the second channel is located outside the mold tool but its entrance pupil is located inside the mold tool or outside but substantially close to it. This enables the camera of the second channel to capture the image of the peripheral zone of the contact lens.

Abstract: A beacon device includes a control circuitry, a window, and a plurality of sets of illumination sources. The window includes a prismatic structure forming a ring from a planar perspective. The prismatic structure defines an inside surface and an outside surface from the planar perspective. The plurality of sets of illumination sources are coupled to the control circuitry. Each set of illumination sources includes a first illumination source disposed proximal to the inside surface of the prismatic structure and includes a second illumination source disposed proximal to the outside surface of the prismatic structure. The control circuitry is to illuminate a first set of the plurality of sets of illumination sources to transmit a signal in a first direction.

Abstract: There is provided a pattern inspection device for a substrate surface which can inspect a substrate including a pattern whose size is equal to or smaller than light resolution limit at high speed. The pattern inspection device for the substrate surface includes: a near-field optical head 101 having a fine repetitive pattern; a ? driving unit 311 of scanning an inspected substrate 900 relatively to the near-field optical head 101; a space holding mechanism of holding a space between the near-field optical head 101 and the inspected substrate 900 constant; alight source 110 of irradiating light to the near-field optical head 101; a detection system 201 of detecting an intensity of scattered light generated by interaction between the fine repetitive pattern on the near-field optical head 101 and a fine pattern on a surface of the inspected substrate 900; and a signal processing unit 321 of inspecting the fine pattern on the inspected substrate 900 based on an output of the detection system 201.

Abstract: Various embodiments for substrate inspection are provided.

Abstract: The present invention provides a detection method which allows specific defects that would occur on a wafer surface to be detected more reliably. A method of detecting a specific defect of the present invention includes the steps of: acquiring a light point map which is in-plane position information of a light point detected in a position corresponding to a defect on a surface of a wafer by irradiating the surface of the wafer with light (S101); specifying a determination region where a specific defect is expected to be formed and a reference region which is a given region other than the determination region in the light point map, and calculating a ratio of a light point density of the determination region to a light point density of the reference region (S102); and determining whether or not the specific defect is formed based on the calculated ratio (S103).

Abstract: A device for sensing the change of feed bobbin for a yarn fed to a textile machine and originating from a first bobbin or a second bobbin connected together in head-tail manner includes at least one first sensor and one second sensor at a passage section of a support body, a control unit associated with the first sensor and second sensor. The first sensor and the second sensor generates first and second presence signals when the yarn unwound from the first bobbin or from the second bobbin passes in front of the first sensor or second sensor. The control unit receiving as input the first and/or second presence signal to generate at least one output signal representative of the first bobbin or of the second bobbin on the basis of the first or second presence signal.

Abstract: A modular optical sensor system for fluid media has a measuring module which includes an exchangeable fluid chamber and an exchangeable optic holder. The fluid chamber has an inlet and an outlet as well as a measurement space for the fluid medium. The optic holder has at least one optical transmitter and at least one optical receiver. The optic holder is inserted within the measuring module relative to the fluid chamber in such a way that the radiation emitted by the optical transmitter traverses the measurement space for the fluid medium in the fluid chamber and impinges on the optical receiver.

Abstract: In accordance with the present invention, a dual-gas Raman sensor is provided that is based on an enhanced spontaneous dual emission as a result of cavity quantum electrodynamic effects. The dual-gas sensor includes a first reflector that exhibits a high reflectivity near the Raman shifted emission for the first species of interest and a moderate reflectivity near the Raman shifted emission for the second species of interest and a second reflector that exhibits a high reflectivity near the Raman shifted emission for the first species of interest and a moderate reflectivity near the Raman shifted emission for the second species of interest, allowing for the simultaneous measurement of the density of both the first species of interest and the second species of interest.

Abstract: A cryogenically cooled imaging spectrometer that includes a spectrometer housing having a first side and a second side opposite the first side. An entrance slit is on the first side of the spectrometer housing and directs light to a cross-disperser grating. An echelle immersions grating and a catadioptric lens are positioned in the housing to receive the light. A cryogenically cooled detector is located in the housing on the second side of the spectrometer housing. Light from the entrance slit is directed to the cross-disperser grating. The light is directed from the cross-disperser grating to the echelle immersions grating. The light is directed from the echelle immersions grating to the cryogenically cooled detector on the second side of the spectrometer housing.

Abstract: The present disclosure relates to the field characterization of particles in a sample solution. More specifically, the present disclosure relates to a flow cell and a method for characterizing particles by means of collected non-Gaussian temporal signals. The present flow cell and method rely on an excitation fiber with a channel. The excitation fiber has a core for transporting an excitation light generated by a light source, and defines a channel through a portion of its core. The channel of the excitation fiber directs a flow of the sample solution. The excitation fiber, the channel and collection fibers characteristics are selected, proportioned and positioned to generate collected light with a non-Gaussian temporal intensity profile.

Abstract: A terahertz ellipsometer, the basic preferred embodiment being a sequential system having a backward wave oscillator (BWO); a first rotatable polarizer that includes a wire grid (WGP1); a rotating polarizer that includes a wire grid (RWGP); a stage (STG) for supporting a sample (S); a rotating retarder (RRET) comprising first (RP), second (RM1), third (RM2) and fourth (RM3) elements; a second rotatable polarizer that includes a wire grid (WGP2); and a Golay cell detector (DET).

Abstract: An optical measuring apparatus may include a light source, linear polarizer, polarized beam splitter, quarter wave plate, objective lens, and/or light receiver. The polarized beam splitter may be configured to transmit linearly polarized light from the linear polarizer to any one of a first and second optical path. The quarter wave plate may be configured to circularly polarize light transmitted through the first optical path from the polarized beam splitter and transmit the circularly polarized light to an object to be measured, and the quarter wave plate may be configured to linearly polarize the circularly polarized light reflected from the object to be measured and transmit the linearly polarized reflected light to the second optical path of the polarized beam splitter. The objective lens may be configured to generate light having different wavelengths by generating chromatic aberration in the circularly polarized light from the quarter wave plate.

Abstract: One embodiment of a method for finding an aim position of a measuring device may include building a color model for an imaging device, initializing a color encoding image, displaying or printing the image on the imaging device, acquiring measurement with the measuring device, converting the measurement into imaging device code values using the color model, calculating said aim position from said device code values. The color encoding image sets one-to-one relationship between coordinates and colors. The image is output on the imaging device and measured by the measuring device. The measurement is converted using the color model to the device code values. The aim position then calculated from position of the device code values in the encoding image.

Abstract: Aligning measurements taken by a second color measurement instrument with measurements taken by first color measurement instrument, wherein the first instrument has access to a first set of standards but not a second set of standards, and the second instrument has access to the second set of standards but not the first set of standards, includes using a third color measurement instrument to generate a profile that mathematically transforms a value measured on the second set of standards to a value measured on the first set of standards, wherein the third instrument has access to the first and second sets of standards, mathematically transforming measurements of the second set of standards taken by the second instrument into virtual measurements of the first set of standards, using the profile, and aligning the measurements taken by the second instrument to the measurements taken by the first instrument, using the virtual measurements.

Abstract: The invention relates to an actuation and evaluation circuit for a laser diode (1) and a photodiode (3) for determining the concentration of a gas. The laser diode can generate light in the range of an absorption line of the gas. The circuit comprises a driver (10, 11, 12, 13) for generating a driving signal (17) for the laser diode (1), an assembly (8, 9) for generating a reference signal (20), and a subtractor (5) for subtracting the reference signal (20) from the signal (21) supplied by the photodiode. The invention further relates to a measuring device for determining the concentration of a gas by means of such an actuation and evaluation circuit. Finally, the invention relates to a corresponding method.

Abstract: An optical Micro Electro-Mechanical System (MEMS) device provides an optical path retardation multiplier. The MEMS device includes a moveable corner cube reflector, a fixed minor and a MEMS actuator. The moveable corner cube reflector is optically coupled to receive an incident beam and reflect the incident beam through 180 degrees towards the fixed mirror. The fixed minor is optically coupled to reflect a reflected beam back towards the moveable corner cube reflector along a reverse path of the incident beam. The MEMS actuator is coupled to the moveable corner cube reflector to cause a displacement of the moveable corner cube reflector to extend an optical path length of the reflected beam.

Abstract: A Sagnac interferometer can include a beamsplitter arranged to receive an input beam of light of a design wavelength, to split the input beam of light into first and second beams that counter propagate around an optical path, and to recombine the first and second beams into an output beam of light. The optical path can include at least one diffraction grating that is arranged to satisfy an effective Littrow geometry.