Patents Issued in July 15, 2014
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Patent number: 8778189Abstract: A method for removing liquid, gaseous and/or dissolved constituents from an aqueous stream includes contacting the aqueous stream with a porous material and then contacting the aqueous stream with an adsorbent material. The porous material includes pores having an average diameter of approximately 0.01 ?m to approximately 50 ?m and an extraction liquid immobilized within at least a portion of the pores.Type: GrantFiled: March 5, 2007Date of Patent: July 15, 2014Assignee: Veolia Water Solutions & Technologies SupportInventors: Dirk Thomas Meijer, Cornelis Johannes Govardus Van Strien
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Patent number: 8778190Abstract: The invention relates to a method for purifying wastewater loaded with nitrogen-containing compounds, wherein the wastewater loaded with nitrogen-containing compounds is reacted with a smectic sheet silicate, wherein a clay material loaded with nitrogen-containing compounds is obtained, and the clay material loaded with nitrogen-containing compounds is separated off, wherein purified wastewater is obtained.Type: GrantFiled: December 15, 2009Date of Patent: July 15, 2014Assignee: Süd-Chemie IP GmbH & Co. KGInventors: Friedrich Ruf, Gerhard Kummer, Manfred Frauenrath, Johannes Lautenschlager, Gotz Burgfels
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Patent number: 8778191Abstract: The invention concerns a centrifugal filtering device for filtering a fluid. The device comprises a rotatable inner casing forming an inner space and a rotatable outer casing forming an outer space. The device further comprises a fluid inlet, at least one filter and drive means. The drive means is configured to rotate the inner casing to create a centrifugal pressure. The pressure forces a part of the fluid contained in the inner space through the filter and to a radially outer position of the outer space. The filtered fluid forms a filtrate, the filtrate having a kinetic energy. The outer casing is configured to transport the filtrate from the radially outer position to a radially inner position of the outer space, permitting transfer of the kinetic energy from the filtrate to the outer casing, thereby permitting regaining of mechanical energy.Type: GrantFiled: December 22, 2008Date of Patent: July 15, 2014Assignee: Aqua Mundus ABInventor: Fredrick Marelius
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Patent number: 8778192Abstract: A method and apparatus for dewatering a mixture of granulate and water are disclosed. In accordance with one example of the system described herein, the apparatus includes a casing as well as hollow sieve body with side walls formed as a sieve, the sieve body being arranged in the casing and suspended thereto. The sieve body tapers towards the bottom, and a clearance is formed between the casing and sieve body. For delivering the granulate-water mixture an inlet is arranged in the upper part of the sieve body. A corresponding outlet for the dewatered granulate is located at the bottom of the sieve body. The inlet is arranged in the sieve body and the sieve is formed such that the water laterally escapes through the sieve into the clearance due to centrifugal and gravitational forces when passing through the sieve body from top to bottom.Type: GrantFiled: June 21, 2011Date of Patent: July 15, 2014Assignee: ECON GmbHInventors: Gerhard Hehenberger, Werner Haan
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Patent number: 8778193Abstract: The invention provides a method for the separation of liquid from a three phase slurry bubble column. The method includes the step of charging the inside of a hollow filter element with a rinsing fluid to clean the inside of the filter for catalyst fines followed by a backflushing step. The invention also provides an installation for the separation of liquid from a three phase slurry bubble column. The installation includes at feast one hollow and enclosed filter element and one or more conduits in fluid communication with the internal volume of the filter, with at least one conduit being configured or connected for inflow of rinsing fluid and at least one conduit being configured or connection for outflow of rinsing fluid.Type: GrantFiled: October 2, 2006Date of Patent: July 15, 2014Assignees: Petroleum Oil and Gas Corporation of South Africa, Ltd., Statoil Hydro ASAInventors: Ockert Rudolph Minnie, Patrick Otto Taylor, Pål Søraker, Marcus Fathi
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Patent number: 8778194Abstract: A method is described for manufacturing a component having a through-connection. The method includes providing a substrate; forming a trench structure in the substrate, a substrate area which is completely surrounded by the trench structure being produced; forming a closing layer for closing off the trench structure, a cavity girded by the closing layer being formed in the area of the trench structure; removing substrate material from the substrate area surrounded by the closed-off trench structure; and at least partially filling the substrate area surrounded by the closed-off trench structure with a metallic material. A component having a through-connection is also described.Type: GrantFiled: January 18, 2013Date of Patent: July 15, 2014Assignee: Robert Bosch GmbHInventors: Jochen Reinmuth, Yvonne Bergmann
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Patent number: 8778195Abstract: A method to fabricate an imprint mould in three dimensions including at least: a) forming at least one trench, of width W and depth h, in a substrate, thereby forming three surfaces including, a bottom of the at least one trench, sidewalls of the at least one trench, and a remaining surface of the substrate, called top of the substrate; b) forming alternate layers in the at least one trench, each having at least one portion perpendicular to the substrate, in a first material and in a second material which can be selectively etched relative to the first material; and c) selectively etching said portions of the layers perpendicular to the substrate.Type: GrantFiled: March 2, 2010Date of Patent: July 15, 2014Assignee: Commissariat a l' Energie AtomiqueInventor: Stéfan Landis
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Patent number: 8778196Abstract: Capsules and similar objects are made from materials having diamond (sp3) lattice structures, including diamond materials in synthetic crystalline, polycrystalline (ordered or disordered), nanocrystalline and amorphous forms. The capsules generally include a hollow shell made of a diamond material that defines an interior region that may be empty or that may contain a fluid or solid material. Some of the capsules include access ports that can be used to fill the capsule with a fluid. Capsules and similar structures can be manufactured by growing diamond on suitably shaped substrates. In some of these methods, diamond shell sections are grown on substrates, then joined together. In other methods, a nearly complete diamond shell is grown around a form substrate, and the substrate can be removed through a relatively small opening in the shell.Type: GrantFiled: October 18, 2012Date of Patent: July 15, 2014Assignee: Sunshell LLCInventor: Victor B. Kley
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Patent number: 8778197Abstract: The present invention relates to graphene windows and methods for making same. One method comprises selecting a high purity metal foil, growing a layer of graphene on a first face of the metal foil, patterning the second face of the graphene-modified foil with a polymer, wherein the second face of the graphene-modified foil has an exposed region and etching the second face of the graphene-modified foil in the exposed region until exposing the first layer of graphene.Type: GrantFiled: December 21, 2011Date of Patent: July 15, 2014Assignee: Clean Energy Labs, LLCInventors: William Neil Everett, William Martin Lackowski, Joseph F. Pinkerton
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Patent number: 8778198Abstract: A method for manufacturing a magnetic sensor using an electrical lapping guide deposited and patterned simultaneously with a hard bias structure of the sensor material. The method includes depositing a sensor material, and patterning and ion milling the sensor material to define a track width of the sensor. A magnetic, hard bias material is then deposited and a second patterning and ion milling process is performed to simultaneously define the back edge of an electrical lapping guide and a back edge of the sensor.Type: GrantFiled: June 29, 2011Date of Patent: July 15, 2014Assignee: HGST Netherlands B.V.Inventors: Quang Le, Shin Funada, Jui-Lung Li
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Patent number: 8778199Abstract: The present disclosure provides a process for manufacturing a solar cell by selectively freeing an epitaxial layer from a single crystal substrate upon which it was grown. In some embodiments the process includes, among other things, providing a first substrate; depositing a separation layer on said first substrate; depositing on said separation layer a sequence of layers of semiconductor material forming a solar cell; mounting and bonding a flexible support on top of the sequence of layers; etching said separation layer while applying an agitating action to the etchant solution so as to remove said flexible support with said epitaxial layer from said first substrate.Type: GrantFiled: May 7, 2012Date of Patent: July 15, 2014Assignee: Emoore Solar Power, Inc.Inventors: Arthur Cornfeld, Daniel McGlynn, Tansen Varghese
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Patent number: 8778200Abstract: A method for manufacturing a liquid discharge head including a substrate on which supply ports for supplying a liquid are provided, includes forming a first supply port among the supply ports by performing crystal anisotropic etching on the substrate from one surface of the substrate, and forming a plurality of second supply ports among the supply ports by performing dry etching on the substrate using a crystal anisotropic etching method from a surface exposed toward the one surface of the substrate to a rear surface so that the independent second supply ports are respectively opened on the rear surface.Type: GrantFiled: October 14, 2008Date of Patent: July 15, 2014Assignee: Canon Kabushiki KaishaInventors: Masahiko Kubota, Akihiko Okano
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Patent number: 8778201Abstract: A pattern forming material contains a block copolymer or graft copolymer and forms a structure having micro polymer phases, in which, with respect to at least two polymer chains among polymer chains constituting the block copolymer or graft copolymer, the ratio between N/(Nc?No) values of monomer units constituting respective polymer chains is 1.4 or more, where N represents total number of atoms in the monomer unit, Nc represents the number of carbon atoms in the monomer unit, No represents the number of oxygen atoms in the monomer unit.Type: GrantFiled: October 21, 2011Date of Patent: July 15, 2014Assignee: Kabushiki Kaisha ToshibaInventors: Koji Asakawa, Toshiro Hiraoka, Yoshihiro Akasaka, Yasuyuki Hotta
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Patent number: 8778202Abstract: This invention relates to methods and apparatuses for creating a textured press plate by spreading ink over the press plate using a heater. Some embodiments provide a method that includes: (a) dispensing radiation-curable ink onto a press plate; (b) spreading the ink over the press plate by heating the ink; and (c) irradiating the ink so that the ink is at least partially cured and/or fixed, and/or such that the spreading of the ink is at least partially slowed and/or stopped. In some embodiments, the irradiating the ink occurs after the spreading the ink. In other embodiments, the ink acts to resist a chemical solution, and the method further includes etching a surface portion of the press plate by exposing the portion to a chemical solution, where the surface portion includes the ink, and where the etching the surface portion occurs after the irradiating the ink.Type: GrantFiled: September 23, 2011Date of Patent: July 15, 2014Assignee: Kings Mountain International, Inc.Inventor: Patrick Lee Bumgardner
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Patent number: 8778203Abstract: A method and system for tunable removal rates and selectivity of materials during chemical-mechanical polishing using a chemical slurry or solution with increased dissolved oxygen content. The slurry can optionally include additives to improve removal rate and/or selectivity. Further selectivity can be obtained by varying the concentration and type of abrasives in the slurry, using lower operating pressure, using different pads, or using other additives in the dispersion at specific pH values.Type: GrantFiled: May 31, 2011Date of Patent: July 15, 2014Assignee: Clarkson UniversityInventors: P. R. Veera Dandu, Naresh K. Penta, Babu V. Suryadevara, Uma Rames Krishna Lagudu
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Patent number: 8778204Abstract: A method and apparatus for monitoring a target layer in a plasma process having a photoresist layer is provided. The method is useful in removing noise associated with the photoresist layer, and is particularly useful when signals associated with the target layer is weak, such as when detecting an endpoint for a photomask etching process.Type: GrantFiled: October 26, 2011Date of Patent: July 15, 2014Assignee: Applied Materials, Inc.Inventor: Michael N. Grimbergen
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Patent number: 8778205Abstract: The present invention is a processing method including a processing step of performing predetermined processing for a workpiece; an unnecessary portion removal step of removing an unnecessary portion produced on a surface of the workpiece due to the predetermined processing; and a surface structure evaluation step of evaluating a surface structure of the workpiece from which the unnecessary portion has been removed by the unnecessary portion removal step.Type: GrantFiled: October 14, 2009Date of Patent: July 15, 2014Assignee: Tokyo Electron LimitedInventors: Tsuyoshi Ohno, Toshihiko Kikuchi, Machi Moriya, Yoshitaka Saita
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Patent number: 8778206Abstract: In a substrate processing method, a polysilicon layer 38 on a wafer W is etched with a bromine cation 45a and a bromine radical 45b in plasma generated from a processing gas containing a hydrogen bromide gas, an oxygen gas, and a nitrogen trifluoride gas, and then, is ashed with an oxygen radical 46 and a nitrogen radical 47 in plasma generated from a processing gas containing an oxygen gas and a nitrogen gas. Thereafter, the polysilicon layer 38 is etched with a fluorine cation 48a and a fluorine radical 48b in plasma generated from a processing gas containing an argon gas and a nitrogen trifluoride gas. While the polysilicon layer 38 is ashed, an oxidation process is performed on a silicon bromide generated by etching the polysilicon layer 38 with the bromine cation 45a.Type: GrantFiled: February 20, 2012Date of Patent: July 15, 2014Assignee: Tokyo Electron LimitedInventors: Eiichi Nishimura, Takashi Sone, Fumiko Yamashita
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Patent number: 8778207Abstract: Plasma etching of boron-doped carbonaceous mask layers with an etchant gas mixture including CxFy or CxHyFz, and at least one of COS and CF3I. Etchant gas mixtures may further include a carbon-free fluorine source gas, such as SF6 or NF3, and/or an oxidizer, such as O2, for higher etch rates. Nitrogen-containing source gases may also be provided in the etchant gas mixture to reduce sidewall bowing in high aspect ratio (HAR) feature etches.Type: GrantFiled: October 12, 2012Date of Patent: July 15, 2014Assignee: Applied Materials, Inc.Inventors: Jong Mun Kim, Jairaj Payyapilly, Kenny Linh Doan
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Patent number: 8778208Abstract: A method of making an article 2 comprising an ultra-thin sheet 26 of material secured at lateral regions to a support member, the method comprises laying the ultra-thin sheet on a substrate 20, forming the support member on the lateral regions of the ultra-thin sheet such that the lateral regions of the ultra-thin sheet are sandwiched between the support member and the substrate and adhered to the support member, and removing the substrate by vaporisation or by a dissolution step using a solvent, to leave the article. The ultra-thin sheet is supported around its periphery and has a central region in which the ultra-thin sheet is free from contact with any other material.Type: GrantFiled: March 26, 2009Date of Patent: July 15, 2014Assignee: Graphene Industries LimitedInventors: Peter Blake, Timothy John Booth
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Patent number: 8778209Abstract: An apparatus for altering a surface of a cylindrical object includes at least one container containing a fluid resist therein and having at least one opening from which the fluid resist is discharged; at least one roller operatively associated with the at least one container and having a surface sized and shaped to be exposed to the at least one opening, the surface area including a pattern of shapes and upon which the fluid resist is deposited; and at least one support member adjacent the at least one roller for supporting the cylindrical object during transit for contacting the at least one roller. A method is also provided.Type: GrantFiled: December 10, 2012Date of Patent: July 15, 2014Assignee: Linde Engineering North America Inc.Inventor: Benjamin P. L. Turner
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Patent number: 8778210Abstract: Compositions useful for the selective removal of silicon nitride materials relative to poly-silicon, silicon oxide materials and/or silicide materials from a microelectronic device having same thereon. The removal compositions include fluorosilicic acid, silicic acid, and at least one organic solvent. Typical process temperatures are less than about 100° C. and typical selectivity for nitride versus oxide etch is about 200:1 to about 2000:1. Under typical process conditions, nickel-based silicides as well as titanium and tantalum nitrides are largely unaffected, and polysilicon etch rates are less than about 1 ? min?1.Type: GrantFiled: December 21, 2007Date of Patent: July 15, 2014Assignee: Advanced Technology Materials, Inc.Inventors: Emanuel I. Cooper, Eileen R. Sparks, William R. Bowers, Mark A. Biscotto, Kevin P. Yanders, Michael B. Korzenski, Prerna Sonthalia, Nicole E. Thomas
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Patent number: 8778211Abstract: The present invention provides chemical-mechanical polishing (CMP) compositions suitable for polishing a substrate comprising a germanium-antimony-tellurium (GST) alloy. The CMP compositions of the present invention are aqueous slurries comprising a particulate abrasive, a water-soluble surface active agent, a complexing agent, and a corrosion inhibitor. The ionic character of the surface active material (e.g., cationic, anionic, or nonionic) is selected based on the zeta potential of the particulate abrasive. A CMP method for polishing a GST alloy-containing substrate utilizing the composition is also disclosed.Type: GrantFiled: July 17, 2012Date of Patent: July 15, 2014Assignee: Cabot Microelectronics CorporationInventors: Matthias Stender, Glenn Whitener, Chul Woo Nam
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Patent number: 8778212Abstract: The invention provides a chemical-mechanical polishing composition containing zirconia particles, a modifying agent that adheres to the zirconia particles, an organic acid, and water, as well as a method of using such a polishing composition to polish substrates and a method of using a polishing composition comprising zirconia particles, an organic acid, an oxidizing agent, and water to polishing substrates containing metal and oxide-based dielectric materials.Type: GrantFiled: May 22, 2012Date of Patent: July 15, 2014Assignee: Cabot Microelectronics CorporationInventors: Wiechang Jin, John Parker, Elizabeth Remsen
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Patent number: 8778213Abstract: The present invention relates to a ferrocene-based fire extinguishing composition. The ferrocene-based fire extinguishing composition comprises ferrocene, a ferrocene derivative, or a combination thereof at a content of 25 mass % or more; when in use, a pyrotechnic agent is used as a heat source and a power source, the pyrotechnic agent is ignited, and the high temperature generated by the combustion of the pyrotechnic agent is utilized to make a fire extinguishing composition produce a large amount of fire extinguishing substance, which is sprayed out together with the pyrotechnic agent, so as to achieve the purpose of extinguishing a fire. Compared with a conventional fire extinguishing composition, a more efficient and safer fire extinguishing composition is provided.Type: GrantFiled: September 7, 2011Date of Patent: July 15, 2014Assignee: Xi'An J&R Fire Fighting Equipment Co., Ltd.Inventors: Hongbao Guo, Honghong Liu
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Patent number: 8778214Abstract: Composites comprising a continuous matrix formed from compounds having a rock salt structure (represented by the structure “MQ”) and inclusions comprising chalcogenide compounds having a rock salt structure (represented by the structure “AB”) are provided. Composites having the structure MQ-ABC2, where MQ represents a matrix material and ABC2 represents inclusions comprising a chalcogenide dispersed in the matrix material are also provided.Type: GrantFiled: September 15, 2010Date of Patent: July 15, 2014Assignee: Northwestern UniversityInventors: Mercouri G. Kanatzidis, Qichun Zhang, Steven N. Girard, Kanishka Biswas
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Patent number: 8778215Abstract: An embodiment of the present disclosure provides a thermoelectric composite material including: a thermoelectric matrix including a thermoelectric material; and a plurality of nano-carbon material units located in the thermoelectric matrix and spaced apart from each other, wherein a spacing between two neighboring nano-carbon material unit is about 50 nm to 2 ?m.Type: GrantFiled: May 3, 2012Date of Patent: July 15, 2014Assignee: Industrial Technology Research InstituteInventors: Shih-Chun Tseng, Wen-Hsuan Chao, Hsu-Shen Chu
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Patent number: 8778216Abstract: A slow release anti-icing material for a bituminous pavement and a method of manufacturing the same. The material includes X, Y and Z components. The X component is a chloride of 80-95 parts. The Y component comprises sodium silicate sodium gluconate and zinc dihydrogen phosphate. The Z component is an acrylate polymer obtained from polymerization of an acrylate monomer, as a cross-linking agent, and a hydrogen containing silicone oil. The manufacturing method includes preparing the X component, preparation the Y component, mixing the X component and the Y component evenly, and encapsulating the surface of the mixture of component X and Y by the component Z evenly through polymerization, to produce the slow release anti-icing material for a bituminous pavement. The anti-icing effects are remarkable for the bituminous pavement, and the material has effects of completely preventing the pavement from icing at ?5 to 0° C.Type: GrantFiled: December 6, 2013Date of Patent: July 15, 2014Assignees: Haiso Technology Co., Ltd, Hubei Expressway Business Development Co., LtdInventors: Fan Zhao, Youkui Wang, Chong Duan, Song Liu, Wei Xiong
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Patent number: 8778217Abstract: Disclosed is a polishing slurry for CMP which makes it possible to polish a barrier layer, a wiring metal layer and an interlayer dielectric continuously, and restrain a phenomenon that the interlayer dielectric in a region near the wiring metal layer is excessively shaven off so that a depression is generated. A polishing slurry, for CMP, containing abrasive particles, an acid, a tolyltriazole compound represented by the following general formula (I), and water: wherein R1s each independently represent an alkylene group having 1 to 4 carbon atoms, and R2 represents an alkylene group having 1 to 4 carbon atoms.Type: GrantFiled: July 4, 2007Date of Patent: July 15, 2014Assignee: Hitachi Chemical Company, Ltd.Inventor: Tadahiro Kimura
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Patent number: 8778218Abstract: The invention relates to a composition containing a particulate solid, an organic or aqueous medium, and a compound with a head group derived from phosphoric acid or sulphuric acid. The invention further relates to novel compounds, and the use of the compound as a dispersant.Type: GrantFiled: March 28, 2008Date of Patent: July 15, 2014Assignee: Lubrizol LimitedInventors: Dean Thetford, Patrick J. Sunderland
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Patent number: 8778219Abstract: The invention is directed to an ionic liquid comprising (i) a cationic portion containing a complex of a silver (I) ion and one or more neutral ligands selected from organoamides, organoamines, olefins, and organonitriles, and (ii) an anionic portion having the chemical formula wherein m and n are independently 0 or an integer of 1 or above, and p is 0 or 1, provided that when p is 0, the group —N—SO2—(CF2)nCF3 subtended by p is replaced with an oxide atom connected to the shown sulfur atom. The invention is also directed to a method for separating an olefin from an olefin-paraffin mixture by passing the mixture through a layer of the ionic liquid described above.Type: GrantFiled: August 19, 2013Date of Patent: July 15, 2014Assignee: UT-Battelle, LLCInventors: Sheng Dai, Huimin Luo, Jing-Fang Huang
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Patent number: 8778220Abstract: Disclosed are a wholly aromatic liquid crystal polyester resin compound and a preparation method thereof. The disclosed wholly aromatic liquid crystal polyester resin compound comprises a wholly aromatic liquid crystal polyester resin having a high melting point, and an inorganic filler having a high thermal conductivity. In addition, the disclosed wholly aromatic liquid crystal polyester resin compound can be prepared by using a twin screw extruder having a barrel temperature of 350 to 450° C.Type: GrantFiled: October 8, 2010Date of Patent: July 15, 2014Assignee: Samsung Fine Chemicals Co., Ltd.Inventors: Myung Se Lee, Youn Eung Lee, Young Hak Shin, Jin Kyu Lee, Mahn Jong Kim
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Patent number: 8778221Abstract: An aromatic amide compound having the following general formula (I) is provided: wherein, X1 and X2 are independently C(O)HN or NHC(O); G1, G2 and G3 are independently hydrogen, C(O)HN-phenyl, or NHC(O)-phenyl, wherein at least one of G1, G2 and G3 is C(O)HN-phenyl or NHC(O)-phenyl; Q1, Q2, and Q3 are independently hydrogen, C(O)HN-phenyl, or NHC(O)-phenyl, wherein at least one of Q1, Q2, and Q3 is C(O)HN-phenyl or NHC(O)-phenyl; R5 is halo, haloalkyl, alkyl, alkenyl, aryl, heteroaryl, cycloalkyl, or heterocyclyl; and m is from 0 to 4.Type: GrantFiled: August 27, 2012Date of Patent: July 15, 2014Assignee: Ticona LLCInventors: Kamlesh P. Nair, Steven D. Gray
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Patent number: 8778222Abstract: A liquid crystalline polyester composition contains at least 100 parts by weight of liquid crystalline polyester and 10 to 100 parts by weight of glass fiber, wherein the glass fiber has a weight-average fiber length of 30 to 100 ?m, and content of specific glass fiber having fiber length of 300 to 500 ?m is 0.1 to 5 percent by weight to a total amount of the glass fiber.Type: GrantFiled: December 14, 2011Date of Patent: July 15, 2014Assignee: Toray Industries, Inc.Inventors: Satoshi Matsubara, Hideyuki Umetsu, Takayuki Hase
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Patent number: 8778223Abstract: Provided are compounds useful for use in liquid crystal mixtures to improve the properties of the mixture. In embodiments, the compound has two cyclohexyl ring and a tail containing one more fluorine atoms.Type: GrantFiled: May 24, 2012Date of Patent: July 15, 2014Assignee: LC Vision, LLCInventor: Michael Wand
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Patent number: 8778224Abstract: The present invention provides a fluorescent dye-silane hybrid resin manufactured by polycondensing an alkoxysilane bonded with a fluorescent dye with an organo-silane. More particularly, the present invention provides a fluorescent dye-siloxane hybrid resin that is manufactured by reacting a fluorescent dye having one or more functional groups with an alkoxysilane having an organic functional group to form an alkoxysilane bonded with the fluorescent dye and then polycondensing the alkoxysilane bonded with a fluorescent dye with an organo-silanediol and an organo-alkoxysilane having a thermocurable or ultraviolet-curable functional group without water. The fluorescent dye-silane hybrid resin has excellent thermostability, photostability, fluorescence characteristics, and processibility.Type: GrantFiled: December 20, 2011Date of Patent: July 15, 2014Assignee: Korea Advanced Institute of Science and TechnologyInventors: Byeong-Soo Bae, Seung-Yeon Kwak
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Iodide single crystal, production process thereof, and scintillator comprising iodide single crystal
Patent number: 8778225Abstract: An object of the invention is to provide an iodide single crystal material that provides a scintillator material for the next-generation TOF-PET, and a production process for high-quality iodide single crystal materials. The iodide single crystal material of the invention having the same crystal structure as LuI3 and activated by a luminescence center RE where RE is at least one element selected from the group consisting of Ce, Pr, Nd, Sm, Eu, Tb, Dy, Ho, Er, Tm, and Yb is characterized in that a part or the whole of lutetium (Lu) in said iodide single crystal material is substituted by Y and/or Gd.Type: GrantFiled: August 4, 2009Date of Patent: July 15, 2014Assignee: Sakai Chemical Industry Co., Ltd.Inventors: Kiyoshi Shimamura, Encarnacion Antonia Garcia Villora, Kenji Kitamura -
Patent number: 8778226Abstract: A photoluminescent or electroluminescent system and method of making a non-luminescent nanostructured material into such a luminescent system is presented. The method of preparing the luminescent system, generally, comprises the steps of modifying the surface of a nanostructured material to create isolated regions to act as luminescent centers and to create a charge imbalance on the surface; applying more than one polar molecule to the charged surface of the nanostructured material; and orienting the polar molecules to compensate for the charge imbalance on the surface of the nanostructured material. The compensation of the surface charge imbalance by the polar molecules allows the isolated regions to exhibit luminescence.Type: GrantFiled: September 30, 2010Date of Patent: July 15, 2014Inventors: Ilia N. Ivanov, Alexander A. Puretzky, Bin Zhao, David B. Geohegan, David J. Styers-Barnett, Hui Hu
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Patent number: 8778227Abstract: The present invention provides an organic/inorganic composite containing an inorganic phase dispersed in an organic polymer, the inorganic phase comprises one or more metal atoms that are coordinated to at least one rare earth metal atom via oxygen. The composite contains at least 5 mass % of rare earth metal. This rare earth metal is dispersed in the inorganic phase.Type: GrantFiled: April 9, 2012Date of Patent: July 15, 2014Assignee: KRI, Inc.Inventors: Hiroshi Mataki, Toshimi Fukui
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Patent number: 8778228Abstract: The present invention is a method of producing an ultraviolet light emitting phosphor material. This method includes a step of heat-treating a composition containing zinc and oxygen as main components and at least one selected from the group consisting of aluminum, gallium and indium as a sub-component, in the presence of at least two coexisting substances selected from the group consisting of zinc oxide, gallium oxide and phosphorus oxide under a non-oxidizing atmosphere.Type: GrantFiled: July 17, 2012Date of Patent: July 15, 2014Assignee: Panasonic CorporationInventors: Osamu Inoue, Hiroshi Asano, Yusuke Fukui
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Patent number: 8778229Abstract: An electrophoretic dispersion with at least two particle species is proposed in which a minimal number (and concentration) of free compounds is present in solution. All chemicals needed to color and stabilize the pigment particles are preferably covalently attached to or within the particles. This enhances the robustness of the system and minimizes the conductivity of the dispersion so that the driving voltage for an electrophoretic display is reduced.Type: GrantFiled: May 10, 2006Date of Patent: July 15, 2014Assignee: Koninklijke Philips N.V.Inventors: Patrick John Baesjou, Lucas Josef Maria Schlangen
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Patent number: 8778230Abstract: A subject-matter of the invention is a novel process for the preparation of sulphur-modified monolithic porous carbon-based materials by impregnation with a strong sulphur-based acid, the materials capable of being obtained according to this process and the use of these materials with improved supercapacitance properties to produce electrodes intended for energy storage systems. Electrodes composed of sulphur-modified monolithic porous carbon-based materials according to the invention and lithium batteries and supercapacitors having such electrodes also form part of the invention.Type: GrantFiled: November 11, 2011Date of Patent: July 15, 2014Assignee: HitchinsonInventors: David Ayme-Perrot, Marie Dieudonné, Philippe Sonntag, Anne-Caroline Pasquier
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Patent number: 8778231Abstract: Disclosed are aluminum paste compositions, processes to form solar cells using the aluminum paste compositions, and the solar cells so-produced. The aluminum paste compositions comprise 0.003% to 9%, by weight of boron nitride; 27% to 89%, by weight of an aluminum powder, such that the weight ratio of aluminum powder to boron nitride is in the range of 9:1 to 9909:1; and 0.1% to 9%, by weight of an optional glass frit-free additive, the optional glass frit-free additive comprising amorphous silicon dioxide, crystalline calcium oxide organometallic compounds, metal salts, or mixtures thereof; and 10% to 70%, by weight of an organic vehicle, wherein the amounts in % by weight are based on the total weight of the aluminum paste composition.Type: GrantFiled: December 16, 2010Date of Patent: July 15, 2014Assignee: E I du Pont de Nemours and CompanyInventor: Raj G. Rajendran
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Patent number: 8778232Abstract: A lead-free conductive compound for a solar cell electrode including: a conductive powder; a glass frit; and a vehicle; the glass fit includes at least one kind of lead-free glass including 10 to 29 (mol %) of Bi2O3, 15 to 30 (mol %) of ZnO, 0 to 20 (mol %) of SiO2, 20 to 33 (mol %) of B2O3, and a total sum 8 to 21 (mol %) of Li2O, Na2O and K2O which are contained in a ratio with respect to a whole of a glass compound in terms of oxides.Type: GrantFiled: May 28, 2010Date of Patent: July 15, 2014Assignee: Noritake Co., LimitedInventors: Yuko Suzuki, Takahiro Sugiyama, Yasushi Yoshino, Takehiro Nakao
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Patent number: 8778233Abstract: The present invention is to provide a device capable of having an easy production process and achieving a long lifetime. A device comprising a substrate, two or more electrodes facing each other disposed on the substrate and a positive hole injection transport layer disposed between two electrodes among the two or more electrodes, wherein the positive hole injection transport layer comprises a transition metal-containing nanoparticle containing at least a transition metal compound including a transition metal oxide, a transition metal and a protecting agent, or at least the transition metal compound including the transition metal oxide, and the protecting agent.Type: GrantFiled: April 30, 2012Date of Patent: July 15, 2014Assignee: Dai Nippon Printing Co., Ltd.Inventors: Shigehiro Ueno, Keisuke Hashimoto, Masato Okada, Seiji Take, Yosuke Taguchi, Masataka Kano, Shin-ya Fujimoto
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Patent number: 8778234Abstract: A process for manufacturing indium tin oxide (ITO) sputtering targets as described. The process includes the precipitation of indium and tin hydroxides, sintering in the absence of chloride ions, using the resultant oxide powders to prepare an aqueous slip with dispersing agent, binder, special high density promoting agents and compacting the slip in a specially surface coated porous mold using the method of slip casting followed by sintering the resultant compacted target body to yield high density ITO target.Type: GrantFiled: May 7, 2009Date of Patent: July 15, 2014Assignee: Bizesp LimitedInventors: Charles Edmund King, Dosten Baluch
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Patent number: 8778235Abstract: A colorant multimer includes, as a partial structure of a colorant moiety, a dipyrromethene metal complex compound or tautomer thereof obtained from: (i) a dipyrromethene compound represented by the following Formula (M); and (ii) a metal or a metal compound: wherein in Formula (M), R4, R5, R6, R7, R8, R9, and R10 each independently represent a hydrogen atom or a monovalent substituent.Type: GrantFiled: September 28, 2010Date of Patent: July 15, 2014Assignee: FUJIFILM CorporationInventors: Junichi Ito, Masaru Yoshikawa, Yuki Mizukawa, Kenta Ushijima, Shinichi Kanna, Haruki Inabe, Yoshihiko Fujie, Akiyoshi Goto, Yushi Kaneko, Hiroaki Idei
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Patent number: 8778236Abstract: A novel photochromic compound which develops a color of a neutral tint and has high color optical density, high fading speed and excellent durability. The present invention is a chromene compound having an indeno(2,1-f)naphtho(1,2-b)pyran structure as the basic skeleton in which a hetero ring having two hetero atoms including at least one sulfur atom is directly bonded to the 6-position and the 7-position of the indeno(2,1-f)naphtho(1,2-b)pyran structure via the hetero atom like the compound represented by the following formula (18).Type: GrantFiled: March 7, 2012Date of Patent: July 15, 2014Assignee: Tokuyama CorporationInventors: Junji Takenaka, Junji Momoda, Kazuhiro Teranishi, Toshiaki Takahashi, Mitsuyoshi Sando, Shinobu Izumi
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Patent number: 8778237Abstract: A mold for molding optical fiber connector includes a core pin, a core mold and a cavity mold. The core pin has insertion portion and a blind hole forming portion. The core mold is used to clamp the insertion portion of the core pin. The cavity mold includes a molding cavity and a through hole defined in the sidewall of the cavity mold, the molding cavity includes a lens forming portion used to mold the lens. A positioning block defining an aligning hole is positioned in the through hole, the aligning hole is used to clamp the blind hole forming portion of the core pin to make the blind hole forming portion align with the lens forming portion during the injection molding process. The present art also relate to a method for adjusting the mold.Type: GrantFiled: December 12, 2010Date of Patent: July 15, 2014Assignee: Hon Hai Precision Industry Co., Ltd.Inventors: Tai-Cherng Yu, I-Thun Lin
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Patent number: 8778238Abstract: A method of providing a conduit (5, 7, 49, 51 93, 129, 131, 151, 231, 233, 259) adapted for conducting a medium, with a functional element. The functional element is adapted for at least one of: coupling, connecting, sealing, fixing, adjusting, aligning, receiving, protecting, and positioning the conduit. A part, comprising a plastic material, is plastified and molded within a forming tool for shaping the form of the functional element and for attaching the functional element to the conduit.Type: GrantFiled: July 19, 2005Date of Patent: July 15, 2014Assignee: Agilent Technologies, Inc.Inventors: Bertram Beigel, Jochen Mueller, Tilmann Rogge