Abstract: An illumination unit includes one or more light sources each including a solid-state light-emitting device configured to emit light from a light emission region including a single or a plurality of light-emitting spots. The solid-state light-emitting device includes a single chip or a plurality of chips each emitting a light beam. Three or more of the light-emitting spots are provided within the whole of one or more light sources, to allow the whole of one or more light sources to emit light beams in two or more wavelength bands different from one another, and the solid-state light emitting device in a first light source which is at least one of the one or more light sources, has a plurality of light-emitting spots which emit light in the same wavelength band.

Abstract: There is provided a light source device including at least one light source configured to emit light, a diffusion plate configured to diffuse and reflect the light emitted from the light source, and a partial transmission member which is provided between the light source and the diffusion plate and has a transmission region which allows the light to pass through and a reflection region which reflects the light and is except the transmission region.

Abstract: A light projector for operation during a show that contains theatrical haze. The light projector may include a light source, a lens, a fan, and a housing having an inner chamber. The lens may have a first side and a second side. The first side of the lens may be contained within the inner chamber of the housing. The second side the lens may be outside of the inner chamber of the housing. The fan may be configured to be operated to generate air flow inside the inner chamber of the housing. A substantial portion of the air flow may be directed to impinge upon the first side of the lens to cause de-fogging of theatrical haze condensate on the first side of the lens.

Abstract: A CPU controls an attitude adjustment unit to change the lengths of legs of an electric leg part independently of each other so that a roll angle is changed to roll a projected image, and controls an image converter to correct the projected image to be a rectangular image on a projection target based on the changed roll angle.

Abstract: In a projector, a comparator included in a trapezoid correction unit compares the aspect ratio of a rectangular input unit with that of the device area. A projection area determination unit determines an effective projection area that is an area included in the projection area and that is rectangular on the object on the basis of a result of the comparison. The device area determination unit determines an effective device area so that the relation of the effective projection area with the projection area corresponds to the relation of the effective device area with the device area. A geometric transformation unit projects the input image into the effective device area so that the input image is projected without distortion within the effective projection area of the object.

Abstract: A CPU of a projector determines whether or not a correction mode in which the aspect ratio of an input image is changed to correct distortion is set and, if the correction mode is set, determines distortion correction process parameters for changing the aspect ratio of the image to be projected onto a screen to project the image in the form of a rectangular image, and the image converter performs geometric correction on the input image on the basis of the distortion correction process parameters to project the image subjected to distortion correction.

Abstract: A projector 100 comprising a light source (130), a reflective light bulb (DMD 180), a projection optical system, an illumination optical system (120) that guides light emitted from the light source to the reflective light bulb, a stationary aperture (166), and a movable aperture (167).

Abstract: In one embodiment, a projector may include a focus adjusting unit, an adjustment image projecting unit, an imaging unit, and a condition indicating unit. The focus adjusting unit adjusts a focus of a projection light according to a manual operation. The adjustment image projecting unit projects an adjustment image containing a portion representing a predetermined pattern by the projection light. The imaging unit shoots a projection surface to which the adjustment image is projected. The specifying unit specifies a focusing condition of the focus on the projection surface by analyzing an image data that is created by the imaging unit. The condition indicating unit displays the specified focusing condition. The adjustment image includes a first portion that includes a bar graph representing the specified focusing condition, and a second portion that represents the predetermined pattern.

Abstract: A liquid immersion member used in an immersion exposure apparatus, and capable of forming a liquid immersion space on a surface of an object opposite to an emitting surface of an optical member which emits exposure light. The liquid immersion member includes a first member that includes a first part disposed at surrounding of an optical path of the exposure light, and in which a first opening part, through which the exposure light is able to pass, and a first liquid supply part, is disposed at at least a portion of surrounding of the first opening part and capable of opposing the surface of the object, are provided at the first part, and a second member includes a first liquid recovery part which can be opposing the surface of the object and is movable with respect to the first member outside the first part with respect to the optical path.

Abstract: An exposure apparatus having a projection system configured to project a plurality of radiation beams onto a target and an image slicer. The image slicer is arranged in an inverted configuration such that, if an input image formed of a plurality of separated image regions were provided to the image slicer, it would output an output image formed from the plurality of image regions, each arranged to adjoin an adjacent image region. The exposure apparatus is configured such that each of the radiation beams is input into the image slicer at a location corresponding to a respective one of the separated image regions.

Abstract: An EUV mirror arrangement (100) has a multiplicity of mirror elements (110, 111, 112) which are arranged alongside one another and jointly form a mirror surface of the mirror arrangement. Each mirror element has a substrate (120) and a multilayer arrangement (130) applied on the substrate and having a reflective effect with respect to radiation from the extreme ultraviolet range (EUV), said multilayer arrangement comprising a multiplicity of layer pairs (135) having alternate layers composed of a high refractive index layer material and a low refractive index layer material. The multilayer arrangement has an active layer (140) arranged between a radiation entrance surface and the substrate and consisting of a piezoelectrically active layer material, the layer thickness (z) of which active layer can be altered by the action of an electric field. For each active layer provision is made of an electrode arrangement for generating an electric field acting on the active layer.

Abstract: A drawing apparatus accepts a selection manipulation for selecting the type of shape of a light outgoing ratio function defining a relationship between the position of modulation units included in an optical unit as seen in the direction of the arrangement of the modulation units and a light outgoing ratio from among a plurality of shape type candidates. The drawing apparatus then adjusts the light outgoing ratio of each of the modulation units in accordance with the accepted shape type. While emitting a beam of drawing light of a strip-shaped cross-sectional configuration from the optical unit, the drawing apparatus moves the optical unit relative to a substrate in a direction orthogonal to the direction of the longer dimension of the strip-shaped cross section of the drawing light beam to perform a drawing process on the substrate.

Abstract: The invention relates to intensity values for a plurality of beams used to irradiate a plurality of locations on a target are determined with reference to the position and/or rotation of the locations. Also provided is an associated lithographic or exposure apparatus, an associated device manufacturing method and an associated computer program.

Abstract: An exposure apparatus configured to project each of a plurality of radiation beams onto a respective location on a target, the plurality of radiation beams forming a desired dose pattern via a plurality of spot exposures, the nominal position of a characteristic point in the dose distribution of each of the spot exposures lying at points defining a first grid. The apparatus has, or is provided data from, a controller configured to: calculate a target intensity value for each of the plurality of radiation beams to expose the target to the desired dose pattern, the calculation using as input a rasterized representation of the desired dose pattern, the rasterized representation including a dose value defined at each of a plurality of points on a second grid, the first and second grids having the same geometry, and control the exposure apparatus to emit beams with the target intensity values.

Abstract: According to one embodiment, an exposure system includes: a supporting stage; a plurality of masks provided on an upper side of the supporting stage; and a light source being capable of irradiating a substrate with light through the plurality of masks, the plurality of masks including: a first mask, and a light shielding film being patterned in the first mask; and a second mask provided on an upper side or a lower side of the first mask, the second mask including a second region facing a first region of the first mask, the light shielding film not being present in the first region, and a light shielding film not being patterned in the second region or the light shielding film being patterned in at least a part of the second region, and a plurality of laser-irradiated marks being provided in at least the second region of the second mask.

Abstract: The invention relates to an optical system for a microlithographic projection exposure apparatus, and to a microlithographic exposure method. An optical system for a microlithographic projection exposure apparatus comprises a polarization-influencing optical arrangement, wherein the polarization-influencing optical arrangement comprises at least one first array of first polarization-influencing elements and a second array of second polarization-influencing elements, wherein the first and second arrays are arranged successively in the light propogation direction, wherein the first and second polarization-influencing elements in each case have a birefringence that is dependent on the presence of an electric field, and wherein the first polarization-influencing elements and the second polarization-influencing elements are transverse Pockels cells.

Abstract: A lithography process in a lithography system includes loading a mask that includes two mask states defining an integrated circuit (IC) pattern. The IC pattern includes a plurality of main polygons, wherein adjacent main polygons are assigned to different mask states; and a background includes a field in one of the mask states and a plurality of sub-resolution polygons in another of the two mask states. The lithography process further includes configuring an illuminator to generate an illuminating pattern on an illumination pupil plane of the lithography system; configuring a pupil filter on a projection pupil plane of the lithography system with a filtering pattern determined according to the illumination pattern; and performing an exposure process to a target with the illuminator, the mask, and the pupil filter. The exposure process produces diffracted light and non-diffracted light behind the mask and the pupil filter removes most of the non-diffracted light.

Abstract: A substrate treating apparatus includes a treating section for treating substrates, and an interface section disposed adjacent the treating section and adjacent an exposing machine provided separately from the apparatus. The interface section has a first treating-section-side transport mechanism, a second treating-section-side transport mechanism, and an exposing-machine-side transport mechanism. Each of the first and second treating-section-side transport mechanisms is arranged to receive the substrates from the treating section, pass the substrates to the exposing-machine-side transport mechanism, receive the substrates from the exposing-machine-side transport mechanism and pass the substrates to the treating section.

Abstract: The present invention provides an exposure apparatus which transfers a pattern of a reticle onto a substrate, including a stage configured to place the reticle, a holding mechanism configured to hold the reticle placed on the stage, a driving unit configured to drive the stage, a determination unit configured to determine a feature including at least one of a type or shape of the reticle placed on the stage, and a decision unit configured to decide, based on the feature determined by the determination unit, at least one of a holding state of the reticle held by the holding mechanism, or control regarding driving of the stage.

Abstract: A coordinate measuring device includes a carrier that automatically rotates about two axes and can be directed toward a measuring aid. The following are arranged on the carrier so as to be able to move together: a device for optically measuring the distance to the measuring aid; a first light source for emitting a target beam that is visible as a first target point when reflected on the measuring aid; a detection unit for determining a fine position of the first target point on a first position detection sensor; a second light source, the light of which is visible as a second target point when reflected on the measuring aid; a rough target detection unit for determining a rough position of the second target point on a second position detection sensor. A control device directs the carrier toward the measuring aid according to the fine and rough positions.

Abstract: A downhole optical sensing system can include an optical fiber positioned in the well, the optical fiber including multiple cores, and one of the cores having a Brillouin scattering coefficient which is different from another one of the cores. A method of sensing strain and temperature as distributed along an optical fiber can include measuring Brillouin scattering in a core of the optical fiber disposed in a well, and measuring Brillouin scattering in another core of the optical fiber disposed in the well, the optical fiber cores being exposed to a same strain and temperature distribution in the well.

Abstract: According to an embodiment, a measuring device includes an imaging unit to capture an object from a plurality of positions to obtain a plurality of images; a distance measuring unit to measure a distance to the object from each position to obtain a plurality of pieces of distance information; a position measuring unit to measure each position to obtain a plurality of pieces of position information; a first calculator to calculate three-dimensional data of the object using the images; a second calculator to calculate a degree of reliability of each piece of distance information and each piece of position information; and a estimating unit to, among the pieces of distance information and the pieces of position information, make use of such pieces of distance information and such pieces of position information which have the degree of reliability greater than a predetermined value to estimate the scale of the three-dimensional data.

Abstract: A downhole optical sensing system can include an optical fiber positioned in the well, the optical fiber including multiple cores, and at least one well parameter being sensed in response to light being transmitted via at least one of the multiple cores in the well. The multiple cores can include a single mode core surrounded by a multiple mode core. A method of sensing at least one well parameter in a subterranean well can include transmitting light via at least one of multiple cores of an optical fiber in the well, the at least one of the multiple cores being optically coupled to a sensor in the well, and/or the at least one of the multiple cores comprising a sensor in the well, and determining the at least one well parameter based on the transmitted light.

Abstract: Technologies are generally described for identifying defects in saturable absorbers, such as graphene, by the saturable property of decreasing light absorbance with increasing light intensity. For example, a graphene coated substrate may be imaged twice under two distinct incident intensities. At a gap in the graphene, the substrate may reflect light proportional to the incident intensities. The graphene may show a non-linear increase in reflected light as the intensity of illumination increases. A difference between the two incident intensities may reveal the gap in the graphene. Any suitable imaging technique may be employed such as confocal microscopy or linear scanning. The imaging may be scaled up for high volume automated inspection.

Abstract: A nanotopographic measuring device comprises an input arranged to receive sets of measurement data relating to a semi-conductor wafer (20) and memory organised into first and second working tables and a results table. A calculation function is capable of establishing a current surface equation from localised gradient values. The equation is established in such a way as to generally minimise a deviation amount between the gradient values calculated from the current surface equation and the localised gradient values. A reconstruction function calculates localised gradient values from a set of measurement data corresponding to an area of the wafer, and completes the working tables with these values. It repeatedly calls the calculation function, each time with a part of the values of the first working table and the second working table corresponding to a portion of the area of the wafer to determine, each time, a current surface equation.

Abstract: A coloration measuring apparatus includes a wavelength variable interference filter, an imaging unit which receives light which transmits the wavelength variable interference filter, a storage unit which stores types of test paper, and reference color data obtained by associating colors showing a coloration state of the test paper, a spectrometry unit which measures a spectral spectrum of the test paper from light received by the imaging unit when the wavelength of the light which transmits the wavelength variable interference filter is sequentially switched, and a quantitative analysis unit which performs quantitative measurement of a sample based on the spectral spectrum measured by the spectrometry unit and the reference color data.

Abstract: A spectroscopic camera includes a light incident section provided with an incident angle limiter and first alignment marks, a wavelength tunable interference filter provided with second alignment marks, and a circuit substrate provided with an imaging device and third alignment marks. The amount of deviation of a mechanical central axis of each of the components from an ideal central axis thereof and the angle of rotation indicating the direction of the deviation are measured, and the positions of the first alignment marks and the second alignment marks relative to each other and the positions of the second alignment marks and the third alignment marks relative to each other are so adjusted that the ideal central axes coincide with one another.

Abstract: Apparatus are described for measuring the characteristics of colloidal particles suspended in transparent media by Dynamic Light Scattering (DLS) and Depolarized Dynamic Light Scattering (DDLS) into regions where conventional measurements are difficult or impractical. Matching the diameter of an illuminating beam and an intersecting diameter of a field stop image extends measurements into regions that include concentrated turbid suspensions that frequently appear so visually opaque that multiple scattering typically gives a falsely low estimate of particle size.

Abstract: An airborne, gas, or liquid particle sensor with a mixed-mode photo-amplifier front-end. The photo-amplifier uses pulse-height for the high-gain channel and integrates the pulse-energy for the low-gain channel to provide for a larger dynamic range for larger size particles.

Abstract: [Subject] To offer a light scattering particle counter that improves the SN ratio by sufficiently attenuating the high frequency noise component while suppressing the attenuation of the signal component. [Means for Solving the Problems] A light scattering particle counter which irradiates a laser beam La to a sample fluid and forms a particle detection area 13, a multi-channel light detecting element receives scattered light Ls from a particle passing through the particle detection area and detects the particle, the time constants ?c, ?m, ?e of the low pass filters F1, F2, F3, F4, F5 are set depending on the beam diameter of the laser beam La and the flow velocity of the fluid which flows through each divided area.

Abstract: An analysis system comprises a transmitting device (1.1) and a receiving device (1.2). The transmitting devices comprises means for illuminating an object (1.3), or a part of the object, by a first light beam (1.8) consisting of signals with two distinct frequencies and first orthogonal polarisation states. The receiving device comprises means (1.6) for detecting, in a second light beam with second polarisation states and resulting from the illumination of the object to be analysed by the first light beam, a signal at a beat frequency equal to a difference between the two frequencies of the first light beam; and means (1.7) for obtaining information relating to the depolarising or dichroic character of the object, or of the part of the object, according to the detection or not of a signal at the beat frequency.

Abstract: A laser output measuring apparatus in which an optical separator is disposed in a position that is rotated by a predetermined angle about an optical axis of a laser beam converged by a lens, and further rotated by a predetermined angle about the optical axis of the laser beam and a straight line perpendicular to an incident surface of the laser beam.

Abstract: The present invention relates to a method and the corresponding system for checking the color quality of preforms (2) intended for the manufacture of containers, in particular beverage bottles, the preforms (2) being transported to a collection vessel (4) by a transport device (3), and an image of the preforms (2) being made by means of an imaging device (6) and being transmitted to a processing device for checking, in which the preforms (2) are led unsorted into the collection vessel (4) upon leaving the transport device (3), the image being made between the leaving of the transport device (3) and the collection vessel (4), and in which the image is processed by the processing device in such a way that the color quality of the preforms (2) and/or defective preforms (2) are discovered.

Abstract: The instant invention relates to methods and means for calibrating and matching colors and light. Some embodiments of the methods and means of the invention also incorporate additional functionality including, but not limited to communication, sensing, display and data processing elements. Various embodiments of the methods and means of the invention may be performed by and/or implemented in hardware, in software, by one or more entities, and/or by some combination of hardware, software and/or one or more entities.

Abstract: The transmittance of a filter periodically varies with respect to the incident light frequency. Provided that fk is the sum of Fk and vk, or the difference obtained by subtracting Fk from vk, depending on the kth light source among multiple light sources, an incidence guide causes light from the plurality of light sources to be incident on the filter such that the propagation angle of light when light from the kth light source propagates through the interior of the filter equals ?k obtained by computation using fk. The incidence guide causes light to be incident on the filter, taking fk to be the sum of vk and Fk for at least one of the light sources, and taking fk to be the difference between vk and Fk for at least one other of the light sources. A detector detects the intensity of transmitted light that transmits through the filter.

Abstract: An apparatus for measuring turbidity includes a first storage portion configured to store a measuring fluid therein, a measuring container connected to the first storage portion through first and second pipes, and a turbidity measuring portion configured to measure turbidity of the measuring fluid in the measuring container, at least a portion of the measuring fluid being moved between the first storage portion and the measuring container through the first and second pipes.

Abstract: Surface plasmon-based nanosensor, comprising: at least one first element of metal, preferably silver or gold, or of semiconductor, the first element being excitable to surface Plasmon resonance, in particular localized surface plasmon resonance, in the presence of electromagnetic radiation from a source, and at least one second element preferably near the first element that in the presence of the electromagnetic radiation is exciton-plasmon coupled to the first element and emits electromagnetic radiation representative of the exciton-plasmon coupling, and systems and methods for sensing photons and chemical or biological agents.

Abstract: An apparatus for illuminating a sample(s) can be provided. For example, a first arrangement can transmit a first electro-magnetic radiation and a second electro-magnetic radiation; the first and second electro-magnetic radiations can have different wavelengths from one another. The first arrangement can transmit the first and second electro-magnetic radiations to different spatial locations on the sample(s). A second arrangement(s) can be configured to receive a third radiation(s) provided from the sample(s), the third radiation(s) can be associated with an interaction of the first and second electro-magnetic radiations in the sample(s). A processing third arrangement can be configured to receive, from the second arrangement, at least one fourth radiation that can be based on the third radiation(s), and generate information regarding a sub-surface portion(s) of the sample(s) based on the fourth radiation.

Abstract: A multiplexed OCT imaging system includes a plurality of sample arms, an imaging engine, and an optical controller. The sample arms are optically coupled to the imaging engine via the optical controller; the optical controller multiplexes optical signals from the sample arms to permit some of the sample arms to operate sequentially or simultaneously.

Abstract: A multi-modal imaging and optical property measurement device that is integrated into an interferometer. Data acquired by the multiple imaging modalities in parallel include measurements of single-scattered, multiple-scattered, and diffuse light that enable characterization of different ranges within different depth regions in the sample. The system includes different interferometer configurations and different imaging modalities, and has a signal-processing unit that associates and co-registers interferometric, multi-spectral, and polarization sensitive measurements to derive and analyze optical properties of a sample and enhance an image display of the sample.

Abstract: A wavefront sensing technique using Polarization Rotation INTerferometry (PRINT) provides a self-referencing, high-resolution, direct measurement of the spatially dependent phase profile of a given optical beam. A self-referencing technique is used to create a reference beam in the orthogonal polarization and a polarization measurement to measure the spatial-dependent polarization parameters to directly determine the absolute phase profile of the beam under test. A high-resolution direct measurement of the spatially-resolved phase profile of one or more optical beams is realized.

Abstract: A method for determining roughness data and/or topography data of surfaces in material microscopy, particularly from flat samples, based on a shearing polarization interferometrical sequence with a microscopic “TIC” module (“Total Interference Contrast Module”) of a microscope, wherein the method can be carried out both polychromatically and monochromatically. At least two tilted wave fronts are generated, which after reflection or transmission on a sample generate two images of said sample in the form of fringe patterns, said images being offset relative to one another and interfering with one another, from which roughness values and height topographies of the surface of the sample are determined by application of image evaluation.

Abstract: An apparatus for measurement of a three-dimensional (3D) shape includes a lens unit transmitting slit beams to a plurality of measurement objects, a light source unit irradiating the plurality of slit beams to the lens unit at different angles, an imaging unit obtaining images of the plurality of measurement objects formed by the slit beams irradiated on the plurality of measurement objects, and a calculation processing unit generating information regarding a 3D shape of the plurality of measurement objects from the images obtained by the imaging unit.

Abstract: According to an embodiment, a measuring device includes a projector, an image capturing unit, and a first calculator. The projector projects, onto a target, a first superimposed pattern which is obtained by superimposing a first pattern having a periodic change and a second pattern configured with a first design for specifying a period of the first pattern. The image capturing unit captures the target, onto which the first superimposed pattern is projected to obtain an image. The first calculator performs matching of the first design taken by the image capturing unit, which is included in the first superimposed pattern in the image, with the first design projected by the projecting unit, and calculates correspondence between a second superimposed pattern, which points to the first superimposed pattern captured in the image, and the first superimposed pattern.

Abstract: A limited reflection type photoelectric sensor has a light projecting unit having a light emitting element, a light receiving unit having a light receiving element, and a beam separating member that separates a projected light beam into beams oriented in a plurality of directions and located in an optical path of the projected light beam from the light emitting element. The light projecting unit and the light receiving unit are configured to meet the condition that an intersecting angle between an optical axis of a projected light beam and an optical axis of a receiving light beam is set such that the projected light beam from the light projecting unit is directed to an object detection limited area and the receiving light beam which is reflected light by an object existing in the object detection limited area is received by the light receiving unit.

Abstract: The technology disclosed relates to determining positional information of an object in a field of view. In particular, it relates to calculating a distance of the object from a reference such as a sensor including scanning the field of view by selectively illuminating directionally oriented light sources and measuring one or more differences in property of returning light emitted from the light sources and reflected from the object. The property can be intensity or phase difference of the light. It also relates to finding an object in a region of space. In particular, it relates to scanning the region of space with directionally controllable illumination, determining a difference in a property of the illumination received for two or more points in the scanning, and determining positional information of the object based in part upon the points in the scanning corresponding to the difference in the property.

Abstract: The present invention relates to a position compensation device using visible light communication and a method thereof. To this end, the present invention receives a visible light signal which includes lighting position information from a lighting device to extract the lighting position information from the received visible light signal, and calculates a compensated position of a position compensation device by using the extracted lighting position information if a request for position compensation exists, thereby providing an exact position of a user indoors.

Abstract: An image forming method which is capable of preventing occurrence of moire and forming images having sufficient color saturation and a sufficient gloss is provided. The color toner image is formed in accordance with si color image signal obtained through screen processing using a screen pattern having a screen line count of 50 to 270 lpi on manuscript image data, and the clear toner image is formed in accordance with a clear image signal obtained through contone processing on the manuscript image data. The clear image signal is controlled so that, according to the amount of the color toner per unit area of the stacked toner image obtained by the color toner image being superimposed with the clear toner image, the less the amount of the color toner, the more the amount of the clear toner becomes.

Abstract: A multi-resolution imaging device (10) for a high-speed multi-color printer includes at least one high-resolution sensor array (23), wherein an output of the high-resolution sensor array is transmitted to a controller (19); at least one low-resolution sensor array (24); wherein the controller calculates a correction for stitch; wherein the controller, based on the calculated correction, adjusts a timing of image data provided to individual print elements comprising print stations (12) to aligned an output of the print elements; and wherein the low-resolution sensor array provides full page viewing.

Abstract: A method for high-speed multi-color printing includes at least one high-resolution sensor array (23), wherein an output of the high-resolution sensor array is transmitted to a controller (19); at least one low-resolution sensor array (24); wherein the controller calculates a correction for stitch; wherein the controller, based on the calculated correction, adjusts a timing of image data provided to individual print elements comprising print stations (12) to aligned an output of the print elements; and wherein the low-resolution sensor array provides full page viewing.