Patents Issued in December 30, 2014
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Patent number: 8920993Abstract: An Anode Protection Systems for a SOFC system, having a Reductant Supply and safety subsystem, a SOFC anode protection subsystem, and a Post Combustion and slip stream control subsystem. The Reductant Supply and safety subsystem includes means for generating a reducing gas or vapor to prevent re-oxidation of the Ni in the anode layer during the course of shut down of the SOFC stack. The underlying ammonia or hydrogen based material used to generate a reducing gas or vapor to prevent the re-oxidation of the Ni can be in either a solid or liquid stored inside a portable container. The SOFC anode protection subsystem provides an internal pressure of 0.2 to 10 kPa to prevent air from entering into the SOFC system. The Post Combustion and slip stream control subsystem provides a catalyst converter configured to treat any residual reducing gas in the slip stream gas exiting from SOFC stack.Type: GrantFiled: December 14, 2012Date of Patent: December 30, 2014Assignee: Delphi Technologies, IncInventors: Bob X. Li, Malcolm J. Grieves, Sean M. Kelly
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Patent number: 8920994Abstract: A fuel cell system comprising a fuel cell and a motor connected to the fuel cell, and also comprising a converter connected between the fuel cell and the motor, the converter adjusting output of the fuel cell to output to the motor, and a controller that controls the fuel cell and the converter. The controller outputs, to the converter, request power or a request voltage based on an operation state of the fuel cell, and the converter selectively performs an output feedback control that performs an adjustment of supply power to be output to the motor such that the output request power is satisfied or a voltage feedback control that performs an adjustment of an output voltage to be output to the motor such that the output request voltage is satisfied.Type: GrantFiled: July 10, 2009Date of Patent: December 30, 2014Assignee: Toyota Jidosha Kabushiki KaishaInventor: Michio Yoshida
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Patent number: 8920995Abstract: The present disclosure relates to systems and methods that may be used to predict a performance metric of a fuel cell. A system consistent with the present disclosure may include sensors in communication with the fuel cell stack, a performance metric prediction system, and a control system. The performance metric prediction system may determine a current density based on inputs provided by the sensors at a plurality of time periods, calculate a first parameter while the current density is below a lower threshold, and calculate a second parameter while the current density is above an upper threshold. The first parameter and the second parameter may be used to selectively adjust a fuel cell polarization curve over time. Based upon the polarization curve, a performance metric of the fuel cell stack may be predicted. The control system may implement a control action based upon the performance metric.Type: GrantFiled: March 15, 2013Date of Patent: December 30, 2014Assignee: GM Global Technology Operations LLCInventors: Derek R. Lebzelter, Sriram Ganapathy, Daniel T. Folmsbee
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Systems and methods for regulating fuel cell air flow during low loads or cold temperature operation
Patent number: 8920996Abstract: Systems and methods for regulating fuel cell air flow, such as during low loads and/or cold temperature operation. These systems and methods may include providing a thermal management fluid, such as air, to the fuel cell stack, transferring thermal energy between the thermal management fluid and the fuel cell stack, and varying the flow rate of the thermal management fluid that comes into contact with the fuel cell stack to maintain the temperature of the fuel cell stack within an acceptable temperature range. Varying the flow rate of the thermal management fluid may include varying the overall supply rate of the thermal management fluid within the fuel cell system and/or providing an alternative flow path for the thermal management fluid such that a portion of the thermal management fluid supplied by the fuel cell system does not come into contact with the fuel cell stack.Type: GrantFiled: April 29, 2011Date of Patent: December 30, 2014Assignee: DCNSInventor: David W. Skinkle -
Patent number: 8920997Abstract: A fuel cell system includes at least one fuel cell stack, a fuel inlet conduit, and a fuel heat exchanger containing a fuel reformation catalyst. The fuel heat exchanger is connected to the fuel inlet conduit and to at least one fuel cell system exhaust conduit which in operation provides a high temperature exhaust stream to the fuel heat exchanger.Type: GrantFiled: September 27, 2007Date of Patent: December 30, 2014Assignee: Bloom Energy CorporationInventor: Swaminathan Venkataraman
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Patent number: 8920998Abstract: Fuel cell components provide fuel cells on a flexible sheet that defines a wall of a flexible plenum. An external support structure limits expansion of the plenum in response to forces exerted by a pressurized reactant. The external support structure may comprise a portion of a housing of a portable device. Cathodes of the fuel cells may be accessible from an outside of the flexible sheet and exposed to ambient air while anodes of the fuel cell are accessible from an inside of the flexible sheet and exposed to a fuel, such as hydrogen gas.Type: GrantFiled: February 27, 2013Date of Patent: December 30, 2014Assignee: Société BICInventors: Gerard F McLean, Jeremy Schrooten
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Patent number: 8920999Abstract: A fluid injection/ejection system for a fuel cell stack is disclosed, wherein the system includes an array of injectors and ejectors that support hydrogen recirculation and maximize a use of the hydrogen and an efficiency of the fuel cell stack.Type: GrantFiled: December 14, 2007Date of Patent: December 30, 2014Assignee: GM Global Technology Operations LLCInventors: Ralph Senner, Benno Andreas-Schott
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Patent number: 8921000Abstract: An anode separator of a fuel cell forms: a plurality of gas flow channels arranged in parallel to let a fuel gas flow to an MEA; a supply passage configured to supply the plurality of gas flow channels with the fuel gas; and a recovery passage configured to recover the fuel gas from the plurality of gas flow channels. The plurality of gas flow channels include: a gas flow channel connects the supply passage and the recovery passage; and a gas flow channel having the supply passage side blocked.Type: GrantFiled: July 15, 2010Date of Patent: December 30, 2014Assignee: Toyota Jidosha Kabushiki KaishaInventors: Naohiro Takeshita, Hitoshi Hamada, Masayuki Ito, Atsushi Ida, Haruyuki Aono, Norishige Konno, Takashi Kajiwara, Tomoyuki Takamura
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Patent number: 8921001Abstract: A conduit assembly for a fuel cell system includes a dielectric tube comprising a first end and a second end, a first metal tube including a first lip coupled to the first end of the dielectric tube, a first dielectric ring coupled to the first lip of the first metal tube, a second metal tube including a second lip coupled to the second end of the dielectric tube, and a second dielectric ring coupled to the second lip of the second metal tube.Type: GrantFiled: November 26, 2013Date of Patent: December 30, 2014Assignee: Bloom Energy CorporationInventors: James Huynh, Michael Petrucha
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Patent number: 8921002Abstract: A first transport system moves a web comprising a subgasketed CCM layer and an application system applies a crosslinkable resin to at least a subgasketed portion of the subgasketed CCM layer. The crosslinkable resin preferably comprises a photocurable cationic crosslinkable resin. A first curing apparatus subjects an exposed surface of the crosslinkable resin to a photo curing process to initiate curing of the crosslinkable resin. A second transport system moves a GDL into adhering contact with a partially cured exposed surface of the crosslinkable resin of the CCM layer so as to form an MEA layer. A second curing apparatus subjects the GDL, partially cured crosslinkable resin, and CCM layer structure to a thermal curing process to substantially complete curing of the crosslinkable resin. A converting system is configured to receive the MEA layer and produce a plurality of discrete MEAs from the MEA layer.Type: GrantFiled: March 21, 2013Date of Patent: December 30, 2014Assignee: 3M Innovative Properties CompanyInventors: Michael A. Yandrasits, Michael T. Hicks, Daniel M. Pierpont
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Patent number: 8921003Abstract: A solid oxide fuel cell including a metal frame, a pre-treated porous metal substrate, an anode layer, an electrolyte layer, a cathode interlayer and a cathode current collecting layer is provided. The pre-treated porous metal substrate is disposed inside the metal frame. The anode layer is disposed on the porous metal substrate. The electrolyte layer is disposed on the anode layer. The cathode interlayer is disposed on the electrolyte layer. The cathode current collecting layer is disposed on the cathode interlayer. The anode layer is porous and nano-structured. Moreover, a manufacturing method of the solid oxide fuel cell mentioned above is also provided.Type: GrantFiled: July 3, 2012Date of Patent: December 30, 2014Assignee: Institute of Nuclear Energy Research Atomic Energy Council, Executive YuanInventors: Chang-Sing Hwang, Chun-Huang Tsai
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Patent number: 8921004Abstract: A composition for filling an ion exchange membrane including a first aromatic vinyl monomer having a halogenated alkyl group or a quaternary ammonium salt group, a method of preparing the ion exchange membrane, an ion exchange membrane prepared using the method, and a redox flow battery including the ion exchange membrane.Type: GrantFiled: December 19, 2012Date of Patent: December 30, 2014Assignee: Samsung Electronics Co., Ltd.Inventors: Myung-jin Lee, Joung-won Park, Duk-jin Oh, Doo-yeon Lee, Moon-sung Kang, Ji-su Kim, Hyeon-jung Cha
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Patent number: 8921005Abstract: A uniform and dense resin coat is formed on a surface of a peripheral region of a fuel cell separator. However, the formed resin coat may contain defects (holes). With the present invention, however, any such defects in the resin coat are coated with a metal coat. That is, when depositing metal in complex ions on the fuel cell separator by an electrodeposition process, the metal is adhered not only to a power generation region but also to a portion where the surface (separator base material surface) is exposed by the defects of the resin coat, thereby forming the metal coat on the defects. Thus, it is possible to improve the corrosion resistance of the fuel cell separator as compared to the case that the surface of the separator base material is exposed at the portions of the defects of the resin coat.Type: GrantFiled: October 20, 2008Date of Patent: December 30, 2014Assignee: Toyota Jidosha Kabushiki KaishaInventors: Hirofumi Onishi, Jin Hak Kim, Yusuke Watanabe, Makoto Yoshida
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Patent number: 8921006Abstract: The fuel cell assembly of the present invention comprises a first fuel cell, a second fuel cell disposed adjacent to the first fuel cell, and a current collector for electrically connecting the first fuel cell and the second fuel cell. The first fuel cell and the second fuel cell are respectively furnished with an electrical generating portion for generating electricity, each of the electrical generation portion having a first electrode through the interior of which a first gas flows, a second electrode of a polarity different from the first electrode, on the exterior of which a second gas flows, and an electrolyte disposed between the first electrode and the second electrode. The current collector distributes and sources the current generated in the first fuel cell generating portion from two different locations on the first electrode on the first fuel cell to the second electrode of the second fuel cell.Type: GrantFiled: March 31, 2010Date of Patent: December 30, 2014Assignee: Toto Ltd.Inventors: Naoki Watanabe, Yousuke Akagi, Shuichiro Saigan, Nobuo Isaka
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Patent number: 8921007Abstract: A bonding layer, disposed between an interconnect layer and an electrode layer of a solid oxide fuel cell article, may be formed from a yttria stabilized zirconia (YSZ) powder having a monomodal particle size distribution (PSD) with a d50 that is greater than about 1 ?m and a d90 that is greater than about 2 ?m.Type: GrantFiled: November 14, 2012Date of Patent: December 30, 2014Assignee: Saint-Gobain Ceramics & Plastics, Inc.Inventors: Guangyong Lin, Yeshwanth Narendar, John D. Pietras, Qiang Zhao, Robert J. Sliwoski, Caroline Levy, Samuel S. Marlin, Aravind Mohanram
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Patent number: 8921008Abstract: The present invention provides a fuel cell separator with a gasket and a method for manufacturing the same, which can prevent corrosion of the separator and improve corrosion resistance of the separator. In particular, the present invention provides a fuel cell separator with a gasket and a method for manufacturing the same, in which an adhesive is coated on the entire or partial surface of the separator, preferably by screen printing. A process of integrally molding a gasket to the separator is then performed such that the edges of the separator are not exposed to the outside after the injection molding process but, rather, are coated with the resin adhesive. The present invention thereby prevents corrosion of the separator, improves corrosion resistance of the separator, and prevents formation of burrs during the injection molding process.Type: GrantFiled: January 18, 2011Date of Patent: December 30, 2014Assignees: Kia Motors Corporation, Hyundai Motor CompanyInventors: Sae Hoon Kim, Sang Mun Chin, Seong Il Heo, Suk Min Baeck, Yoo Chang Yang
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Patent number: 8921009Abstract: An improved approach toward manufacture of a sealed fuel cell stack configuration including electrostatic deposition of materials onto substrate surfaces of the fuel cell stack.Type: GrantFiled: July 30, 2012Date of Patent: December 30, 2014Assignee: Zephyros, Inc.Inventors: Michael Czaplicki, Karsten Scholz
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Patent number: 8921010Abstract: A unitized electrode assembly (9) for use in the fuel cell comprises a first GDL (23), a PEM (28), and a second GDL (12), with electrode catalysts (27, 30) disposed between said PEM and each of said GDLs, said layers (23, 27, 30, 12) being impregnated with a thermoplastic polymer a sufficient distance from each edge of the UEA so as to form a fluid seal (13). The UEA is formed by a process which comprises making a sandwich of some or all of said layers (23, 27, 28, 30 and 33), with thermoplastic polymer film (22, 25, 32, 35) extending inwardly from the edges of said sandwich a sufficient distance to form the seal, said thermoplastic polymer film being disposed between each electrode and the adjacent GDL and/or between each GDL and release film (21, 36) on the top and bottom of the sandwich.Type: GrantFiled: September 16, 2013Date of Patent: December 30, 2014Assignee: Ballard Power Systems Inc.Inventors: Tommy Skiba, Chi-Hum Paik, Thomas D. Jarvi
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Patent number: 8921011Abstract: A method is provided for mastering optically variable devices (OVDs) used to authenticate optical discs. The method generally includes the steps of providing a laser beam recorder (LBR), introducing a substrate to the LBR, and exposing a portion of the substrate to the LBR. The mastering system thus includes the LBR, which has a laser that emits a beam, a processor or computer for programming or otherwise controlling the beam in order to expose the substrate and create the desired optical effect. Depending on the material used for the substrate, the exposure is then developed, if necessary, and processed to generate a master for the OVD. The OVD can then be replicated in order to provide authentic resultant products or articles, such as optical discs.Type: GrantFiled: April 23, 2013Date of Patent: December 30, 2014Assignee: 3dcd, LLCInventors: Nigel C. Abraham, Holger Hofmann, Raymond L. Keating
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Patent number: 8921012Abstract: The subject matter of the invention is a method for producing illuminated, holographic media comprising a photopolymer formulation having the adjustable mechanical modulus GUV. A further subject matter of the invention is an illuminated, holographic medium that can be obtained by means of the method according to the invention.Type: GrantFiled: October 29, 2010Date of Patent: December 30, 2014Assignee: Bayer MaterialScience AGInventors: Marc-Stephan Weiser, Thomas Rölle, Friedrich-Karl Bruder, Thomas Fäcke, Dennis Hönel
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Patent number: 8921013Abstract: A lithographic mask reticle includes a first mask region having a first mask pattern configured for use in fabrication of electronic circuit structures, and a second mask region having a second mask pattern configured for use in fabrication of test structures. The second mask pattern includes all categories of structural patterns containing in the first mask pattern.Type: GrantFiled: July 12, 2013Date of Patent: December 30, 2014Assignee: Semiconductor Manufacturing International (Shanghai) CorporationInventors: Chi-Yuan Hung, Bin Zhang, Ze Xi Deng, Li Guo Zhang
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Patent number: 8921014Abstract: A first embodiment is a lithography mask comprising a transparent substrate and a first molybdenum silicon nitride (MoxSiyNz) layer. The first MoxSiyNz layer is over the transparent substrate. A percentage of molybdenum (x) of the first MoxSiyNz layer is between 1 and 2. A percentage of silicon (y) of the first MoxSiyNz layer is between 50 and 55. A percentage of nitride (z) of the first MoxSiyNz layer is between 40 and 50. The first MoxSiyNz layer has an opening therethrough.Type: GrantFiled: December 13, 2011Date of Patent: December 30, 2014Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.Inventors: Chue-San Yoo, Chun-Lang Chen
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Patent number: 8921015Abstract: A method for repairing masks includes performing a first repair process to a mask by etching unwanted opaque regions from the mask, applying a plasma passivation process to the mask, and performing a second repair process to the mask by etching away additional unwanted opaque regions.Type: GrantFiled: February 1, 2013Date of Patent: December 30, 2014Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.Inventors: Yueh-Hsun Li, Yuan-Chih Chu
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Patent number: 8921016Abstract: One illustrative method disclosed herein includes the steps of decomposing an initial overall target exposure pattern into at least a first decomposed sub-target pattern and a second decomposed sub-target pattern, performing first and second retargeting processes on the first and second decomposed sub-target patterns while using the other sub-target pattern as a reference layer, respectively, to thereby define retargeted first and second decomposed sub-target patterns, respectively, and, after performing the first and second retargeting processes, performing at least one process operation to determine if each of the retargeted first decomposed sub-target pattern and the retargeted second decomposed sub-target pattern is in compliance with at least one design rule.Type: GrantFiled: July 8, 2013Date of Patent: December 30, 2014Assignee: GLOBALFOUNDRIES Inc.Inventors: Chidambaram G. Kallingal, YuYang Sun
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Patent number: 8921017Abstract: The present invention relates to a multilayer substrate containing a substrate and a multilayer film provided on the substrate, in which a concave or convex fiducial mark that indicates a fiducial position of the multilayer substrate is formed on the surface of the multilayer film on the opposite side to the side of the substrate; and a material of at least a part of the surface of the fiducial mark is different from a material of a most superficial layer of the multilayer film on the opposite side to the side of the substrate.Type: GrantFiled: September 9, 2013Date of Patent: December 30, 2014Assignee: Asahi Glass Company, LimitedInventors: Yuzo Okamura, Yoshiaki Ikuta
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Patent number: 8921018Abstract: The present invention provides a polymer compound represented by the following Formula (1) and a method for production thereof, a pigment dispersant, a pigment dispersion composition, and a photocurable composition respectively using the polymer compound, and a color filter and a method for production thereof [R1: an organic linking group having a valency of (m+n); R2: a single bond or a divalent organic linking group; A1: a monovalent organic group containing at least one moiety selected from an organic dye structure, a heterocyclic structure, an acidic group, a group having a basic nitrogen atom, a urea group, a urethane group, a group having a coordinating oxygen atom, a hydrocarbon group having 4 or more carbon atoms, an alkoxysilyl group, an epoxy group, an isocyanate group, and a hydroxyl group; m=1 to 8, n=2 to 9 (m+n=3 to 10); and P1: polymer skeleton].Type: GrantFiled: February 28, 2014Date of Patent: December 30, 2014Assignee: FUJIFILM CorporationInventors: Hidenori Takahashi, Shuichiro Osada
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Patent number: 8921019Abstract: Disclosed are a positive photosensitive resin composition that includes (A) an alkali soluble resin including a polybenzoxazole precursor, a polyimide precursor, or a combination thereof, (B) a photosensitive diazoquinone compound, (C) a phenol compound, (D) at least one organic dye having an absorption wavelength of about 400 nm to about 700 nm, and (E) a solvent, wherein the organic dye (D) is included in an amount of about 1 to about 40 parts by weight based on about 100 parts by weight of the alkali soluble resin (A), and a photosensitive resin layer and a display device using the same.Type: GrantFiled: September 5, 2012Date of Patent: December 30, 2014Assignee: Cheil Industries Inc.Inventors: Ji-Yun Kwon, Jin-Hee Kang, Dae-Yun Kim, Sang-Kyeon Kim, Sang-Kyun Kim, Sang-Soo Kim, Kun-Bae Noh, Eun-Kyung Yoon, Jong-Hwa Lee, Jun-Ho Lee, Jin-Young Lee, Hwan-Sung Cheon, Hyun-Yong Cho, Chung-Beom Hong, Eun-Ha Hwang
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Patent number: 8921020Abstract: Provided is an electrophotographic photosensitive member, including: a support; and a photosensitive layer, which is provided on the support, in which: a surface layer of the electrophotographic photosensitive member includes a terminal siloxane-containing polyester resin having a specific structure; and a lower layer provided in contact with the surface layer includes a polycarbonate resin, a polyester resin, or a polyvinyl acetal resin, having a specific structure.Type: GrantFiled: October 25, 2011Date of Patent: December 30, 2014Assignee: Canon Kabushiki KaishaInventors: Shio Murai, Harunobu Ogaki, Kazunori Noguchi, Takashi Anezaki, Kazuhisa Shida, Atsushi Okuda
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Patent number: 8921021Abstract: A polyester resin for a toner obtained by polycondensing a carboxylic acid component and an alcohol component, wherein the polyester resin for a toner is obtained using, as the carboxylic acid component and/or the alcohol component, a specified aromatic compound; a polyester resin for a toner obtained by polycondensing a reaction product obtained by treating a specified aromatic compound with a carboxylic acid having an unsaturated reactive group, a carboxylic acid component, and an alcohol component; a resin binder for a toner, containing the polyester resin for a toner; and a toner for electrophotography, containing the resin binder. The polyester resin for a toner of the present invention is suitably used for a resin binder of a toner used in developing and the like of latent images formed in electrophotography, electrostatic recording method, electrostatic printing method or the like.Type: GrantFiled: October 1, 2010Date of Patent: December 30, 2014Assignee: Kao CorporationInventors: Norihiro Fukuri, Takashi Kubo, Yasunori Inagaki, Katsutoshi Aoki
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Patent number: 8921022Abstract: A toner for electrostatic image development containing a resin binder and a releasing agent, wherein the resin binder contains a polyester A having a furan ring, and wherein the releasing agent contains an ester wax, and a method for producing the toner. The toner for electrostatic image development of the present invention can be suitably used in, for example, the development or the like of latent image formed in electrophotography, an electrostatic recording method, an electrostatic printing method, or the like.Type: GrantFiled: March 11, 2013Date of Patent: December 30, 2014Assignee: Kao CorporationInventors: Takeshi Ashizawa, Shogo Watanabe, Takashi Kubo, Norihiro Hirai
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Patent number: 8921023Abstract: Provided is a magnetic carrier excellent in leakage, uniformity of a solid image having satisfactory charging stability and developing performance at low electric field. The magnetic carrier is a magnetic carrier comprising: a magnetic substance-dispersed resin carrier core, which contains a magnetic substance and a binding resin, and a coating resin on a surface thereof, wherein: the carrier core has resistivity at 1000 V/cm of 5.0×106-8.0×107 ?·cm, the magnetic substance has a number average particle diameter of 0.20-0.35 ?m; and comprises magnetic-substance particles having vertexes and a particle diameter of 0.53 ?m or more in an amount of 10.0-32.0 vol % based on a total amount of the magnetic substance; and wherein: the carrier core has Fe2O3 content of 98.00% by mass or more; and ZnO content of 0.06-0.50% by mass.Type: GrantFiled: August 7, 2013Date of Patent: December 30, 2014Assignee: Canon Kabushiki KaishaInventors: Yoshinobu Baba, Koh Ishigami, Masayuki Hama, Kentaro Kamae, Hiroaki Kawakami
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Patent number: 8921024Abstract: A photosensitive polysiloxane composition for forming a protective film having superior sensitivity is disclosed. A protective film formed from the photosensitive polysiloxane composition and an element including the protective film are also disclosed. The photosensitive polysiloxane composition includes a polysiloxane, an o-naphthoquinonediazidesulfonic acid ester, a urethane(meth)acrylate compound having at least six (meth)acryloyl groups in a molecule, and a solvent.Type: GrantFiled: December 6, 2013Date of Patent: December 30, 2014Assignee: Chi Mei CorporationInventors: Ming-Ju Wu, Chun-An Shih
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Patent number: 8921025Abstract: A positive resist composition comprises (A) a resin component which becomes soluble in an alkaline developer under the action of an acid and (B) an acid generator. Resin component (A) is a polymer comprising recurring units of formula (1) wherein R1 is H, CH2 or CF3, R2 is an acid labile group, R3 is H or CO2CH3, X is O, S, CH2 or CH2CH2, 0.01?a<1 and 0.01?b<1. When processed by ArF lithography, the composition forms a pattern with a satisfactory mask fidelity and a minimal LWR.Type: GrantFiled: June 3, 2010Date of Patent: December 30, 2014Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Tatsushi Kaneko, Koji Hasegawa, Tsunehiro Nishi
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Patent number: 8921026Abstract: A chemically amplified resist composition comprising a base polymer, an acid generator, and an amine quencher in the form of a ?-alanine, ?-aminobutyric acid or 5-aminovaleric acid derivative having an acid labile group-substituted carboxyl group has a high contrast of alkaline dissolution rate before and after exposure and forms a pattern of good profile at a high resolution, minimal roughness and wide focus margin.Type: GrantFiled: December 5, 2011Date of Patent: December 30, 2014Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Jun Hatakeyama, Masayoshi Sagehashi, Takeru Watanabe
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Patent number: 8921027Abstract: A radiation-sensitive resin composition includes an acid-labile group-containing resin, and a compound shown by the following general formula (i). R1 represents a hydrogen atom or the like, R2 represents a single bond or the like, R3 represents a linear or branched unsubstituted monovalent hydrocarbon group having 1 to 10 carbon atoms or the like, and X+ represents an onium cation.Type: GrantFiled: December 15, 2011Date of Patent: December 30, 2014Assignee: JSR CorporationInventors: Ryuichi Serizawa, Nobuji Matsumura, Hirokazu Sakakibara
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Patent number: 8921028Abstract: A salt represented by the formula (I) and a resist composition containing the salt are provided, wherein Q1, Q2, L1, ring W1, Re1, Re2, Re3, Re4, Re5, Re6, Re7, Re8, Re9, Re10, Re11, Re12, Re13 and Z are defined in the specification.Type: GrantFiled: March 7, 2012Date of Patent: December 30, 2014Assignee: Sumitomo Chemical Company, LimitedInventors: Satoshi Yamaguchi, Koji Ichikawa
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Patent number: 8921029Abstract: A resist composition having a resin having a structural unit represented by the formula (I), a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid and not including the structural unit represented by the formula (I), and an acid generator represented by the formula (II), wherein R1, A1, R2, RII1, RII2, LII1, YII1, RII3, RII4, RII5, RII6, RII7, n, s and RII8 are defined in the specification.Type: GrantFiled: July 18, 2012Date of Patent: December 30, 2014Assignee: Sumitomo Chemical Company, LimitedInventors: Koji Ichikawa, Yukako Anryu, Shingo Fujita
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Patent number: 8921030Abstract: A stack of an organic planarization layer (OPL) and a template layer is provided over a substrate. The template layer is patterned to induce self-assembly of a copolymer layer to be subsequently deposited. A copolymer layer is deposited and annealed to form phase-separated copolymer blocks. An original self-assembly pattern is formed by removal of a second phase separated polymer relative to a first phase separated polymer. The original pattern is transferred into the OPL by an anisotropic etch, and the first phase separated polymer and the template layer are removed. A spin-on dielectric (SOD) material layer is deposited over the patterned OPL that includes the original pattern to form SOD portions that fill trenches within the patterned OPL. The patterned OPL is removed selective to the SOD portions, which include a complementary pattern. The complementary pattern of the SOD portions is transferred into underlying layers by an anisotropic etch.Type: GrantFiled: September 5, 2012Date of Patent: December 30, 2014Assignee: International Business Machines CorporationInventors: Michael A. Guillorn, Steven J. Holmes, Chi-Chun Liu, Hiroyuki Miyazoe, Hsinyu Tsai
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Patent number: 8921031Abstract: Provided are photoresist overcoat compositions, substrates coated with the overcoat compositions and methods of forming electronic devices by a negative tone development process. The compositions, coated substrates and methods find particular applicability in the manufacture of semiconductor devices.Type: GrantFiled: September 9, 2012Date of Patent: December 30, 2014Assignee: Rohm and Haas Electronic Materials LLCInventors: Young Cheol Bae, Rosemary Bell, Jong Keun Park, Seung-Hyun Lee
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Patent number: 8921032Abstract: A self-assemblable polymer is disclosed, having first and second molecular configurations with the first molecular configuration has a higher Flory Huggins parameter for the self-assemblable polymer than the second molecular configuration, and the self-assemblable polymer is configurable from the first molecular configuration to the second molecular configuration, from the second molecular configuration to the first molecular configuration, or both, by the application of a stimulus. The polymer is of use in a method for providing an ordered, periodically patterned layer of the polymer on a substrate, by ordering and annealing the polymer in its second molecular configuration and setting the polymer when it is in the first molecular configuration.Type: GrantFiled: April 20, 2011Date of Patent: December 30, 2014Assignee: ASML Netherlands B.V.Inventors: Emiel Peeters, Sander Frederik Wuister, Roelof Koole
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Patent number: 8921033Abstract: By a method of preparing a lithographic printing plate having exposing a lithographic printing plate precursor including a photosensitive layer containing (A) a polymerization initiator, (B) a polymerizable compound, (C) a sensitizing dye and (D) a binder polymer and a protective layer in this order on a hydrophilic support with laser and then removing the protective layer and an unexposed area of the photosensitive layer in the presence of a developer, in which the developer is a developer which has pH of from 2 to less than 10 and contains an amphoteric surfactant and a nonionic surfactant having an alkylene oxide chain, a simple processing of one solution and one step which does not require a water washing step becomes possible, excellent development property is achieved and a lithographic printing plate which has good printing durability and does not cause printing stain can be provided.Type: GrantFiled: February 22, 2011Date of Patent: December 30, 2014Assignee: FUJIFILM CorporationInventor: Toshifumi Inno
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Patent number: 8921034Abstract: Some embodiments include methods of patterning a base. First and second masking features are formed over the base. The first and second masking features include pedestals of carbon-containing material capped with silicon oxynitride. A mask is formed over the second masking features, and the silicon oxynitride caps are removed from the first masking features. Spacers are formed along sidewalls of the first masking features. The mask and the carbon-containing material of the first masking features are removed. Patterns of the spacers and second masking features are transferred into one or more materials of the base to pattern said one or more materials. Some embodiments include patterned bases.Type: GrantFiled: September 28, 2012Date of Patent: December 30, 2014Assignee: Micron Technology, Inc.Inventor: John D. Hopkins
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Patent number: 8921035Abstract: A polymer washout solvent for developing a flexographic printing plate comprising: —an ester hydrocarbon component, —an ether hydrocarbon component, —an alcoholic hydrocarbon component. The washout solvent of the invention has less hazardous properties than the known solvents. Use of a polymer washout solvent for developing a flexographic printing plate in a washing step.Type: GrantFiled: June 8, 2010Date of Patent: December 30, 2014Assignee: Flexoclean Engineering B.V.Inventor: Figen Aydogan
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Patent number: 8921037Abstract: Methods of repairing and regenerating hard or soft tissue and reducing inflammation, anti-angiogenesis and anti-osteogenesis in a mammal and related methods of removing PF4 from platelets containing blood preparations. In one embodiment, the method comprises administering to a mammal platelets containing blood preparation where the PF4 has been reduced from the platelet containing blood preparation to repair and regenerate hard and soft tissue in the mammal.Type: GrantFiled: December 16, 2009Date of Patent: December 30, 2014Inventor: Bo Han
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Patent number: 8921038Abstract: A method, according to an embodiment, for evaluating a regenerated cartilage includes allowing a group of cells containing auricular chondrocytes to stand in the presence of a culture medium, subsequently collecting at least a portion of a liquid component from the culture medium, measuring the GFAP content of the collected liquid component, and determining whether a regenerated cartilage that has been obtained or can be obtained from the group of cells is suitable for transplantation based on the GFAP content.Type: GrantFiled: July 19, 2013Date of Patent: December 30, 2014Assignees: Fujisoft Incorporated, The University of TokyoInventors: Kazuto Hoshi, Tsuyoshi Takato, Motohiro Harai
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Patent number: 8921039Abstract: Nucleic acid oligomers specific for human parvovirus genomic DNA are disclosed. An assay for amplifying and detecting human parvovirus genotypes 1, 2 and 3 nucleic acid in biological specimens is disclosed. Compositions for amplifying and detecting the presence of human parvovirus genotypes 1, 2 and 3 genomic DNA in human biological specimens are disclosed.Type: GrantFiled: February 26, 2010Date of Patent: December 30, 2014Assignee: Gen-Probe IncorporatedInventor: James M. Carrick
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Patent number: 8921040Abstract: The present invention relates to methods and apparatus for conducting an assay. In particular, the present invention relates to a rotatable platform which can be used for conducting an assay, in particular multi-step assays. The present invention provides a rotatable platform adapted to immobilize a first binding partner in one or more discrete areas on a surface of said platform, or to selectively immobilize a second binding partner in one or more discrete areas on a surface of said platform. The invention also relates to methods, apparatus, a kit and the use of the rotatable platform for conducting an assay. In particular, the invention has been developed primarily for use in sequencing nucleic acid by pyrosequencing, however the invention is not limited to this field.Type: GrantFiled: July 29, 2010Date of Patent: December 30, 2014Assignee: Pyrobett Pte Ltd.Inventors: John Corbett, John Corbett, Sr.
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Patent number: 8921041Abstract: The present invention includes devices and methods for transfecting a cell or cell population and dynamic monitoring of cellular events. A variety of microelectronic devices are provide that incorporate functions such as electroporation, modulation of a transmembrane potential and dynamic monitoring of cellular functions and mechanisms.Type: GrantFiled: May 17, 2012Date of Patent: December 30, 2014Assignee: ACEA Biosciences, Inc.Inventors: Xiaobo Wang, Yama A. Abassi, Josephine Atienza, Xiao Xu, Junquan Xu
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Patent number: 8921042Abstract: Parkinson's disease is caused by the preferential loss of substantia nigra dopamine neurons. A Parkin Interacting Substrate, PARIS (ZNF746) is identified. The levels of PARIS are regulated by the ubiquitin proteasome system via binding to and ubiquitination by the E3 ubiquitin ligase, parkin. PARIS is a KRAB and zinc finger protein that accumulates in models of parkin inactivation and in human brain Parkinson's disease patients. PARIS represses the expression of the transcriptional co-activator, PGC-1? and the PGC-1? target gene, NRF-1 by binding to insulin response sequences in the PGC-1? promoter. Conditional knockout of parkin in adult animals leads to progressive loss of dopamine (DA) neurons that is PARIS dependent. Overexpression of PARIS causes selective loss of DA neurons in the substantia nigra, which is reversed by either parkin or PGC-1? co-expression. The identification of PARIS provides a molecular mechanism for neurodegeneration due to parkin inactivation.Type: GrantFiled: October 17, 2013Date of Patent: December 30, 2014Assignee: Valted LLCInventors: Ted M. Dawson, Valina L. Dawson, Han Seok Ko, Jooho Shin
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Patent number: 8921043Abstract: Compositions and methods are described to modify Family B DNA polymerases that contain residual exonuclease activity that interferes with sequencing techniques and with detection of single nucleotide polymorphisms. The compositions are mutant proteins with reduced exonuclease activity compared with presently available “exo?” polymerases, and a sensitive screening assay that enables an assessment of exonuclease activity of any synthetic DNA polymerase.Type: GrantFiled: May 10, 2012Date of Patent: December 30, 2014Assignee: New England Biolabs, Inc.Inventor: Andrew Gardner