Abstract: An optical apparatus comprising: a source and a loop. The source generates a pump. The resonating cavity of the source includes: a gain medium; and a tunable filter for selecting a wavelength. The loop comprises: an input coupler; a waveguide; and an output coupler. The input coupler receives the pump and a signal and outputs the pump and the signal into the waveguide In the waveguide, energy in the pump is transferred into energy in the signal while a relative center position of the signal is crossing a center position of the pump in a first direction while both are passing through the waveguide and into the output coupler. The output coupler r outputs a first portion of the signal and a second portion of the signal is fed into the input coupler as the signal, completing the loop.

Abstract: Techniques related to a method, apparatus, and systems for magnetic fluid shutter operation are described herein. For example, an apparatus may include an aperture of an image sensor. The apparatus may also include a ferrofluid to expose the aperture based on a propagation direction of a magnetic flux applied to the ferrofluid.

Abstract: This invention comprises a self-centering mechanism for retaining an object, a clamping device for retaining an electronic device or an electronic device in a case, and means to integrate the devices in an adapter form. The structure of the self-centering mechanism allows for a compact device that is capable of fitting a wide range of differently sized and shaped objects. The clamping device allows for means to retain an electronic device or an electronic device in a case that is capable of fitting a wide range of differently sized and shaped electronic device. The self-centering mechanism and clamping device can also be integrated into the form of an adapter for various applications.

Abstract: An optical device includes a glass plate, a movable section that supports the glass plate, shaft sections that swingably support the movable section around a swing axis, a support section that supports the shaft sections, a permanent magnet provided in the movable section, a coil that is so disposed as to face the permanent magnet and produces a magnetic field acting on the permanent magnet, and a coil support section that is supported by the support section and supports the coil, and the coil support section is made of a material having thermal conductivity higher than that of the support section and intersects the in-plane direction of a light incident surface.

Abstract: An illumination optical system is provided that is configured to guide light emitted from a light source to an image generation unit that is arranged to be movable in a direction perpendicular to incoming light and is configured to generate an image by reflecting the incoming light. The illumination optical system includes a first lens that is arranged to be movable in a direction perpendicular to an optical axis of the first lens, a second lens that is arranged to be movable in a direction that changes a face-to-face distance between the first lens and the second lens, and a lens position control unit configured to displace the first lens and the second lens.

Abstract: A lighting device includes a supporting section configured to support a light source device unit, a fan housing section in which an outflow port for causing the air discharged by a cooling fan to flow out is formed, and a circulating device supported by the light source device unit. The outflow port is opened in a direction along a second direction. The light source device unit includes an inflow port opened to a side opposed to the outflow port and a channel for leading the air flowing in from the inflow port to a light source. The circulating device includes a moving section disposed between the light source device unit and the fan housing section in a predetermined position, a ventilation hole for causing the outflow port and the inflow port to communicate being formed in the moving section, and an urging section configured to urge the moving section.

Abstract: In an electro-optical device, a light-transmitting cover is disposed in mirrors, and when light is applied toward the mirrors through the light-transmitting cover, the temperature of the light-transmitting cover tires to increase due to the applied light. Here, in the electro-optical device, first metal portions that are in contact with the light-transmitting cover and the element substrate are formed. For this reason, it is possible to release the heat of the light-transmitting cover to a substrate through the first metal portions and the element substrate.

Abstract: An optical device includes a phosphor wheel and two light sources. The phosphor wheel has two phosphor regions. The phosphor regions are located at different radial positions of the phosphor wheel and are not overlapped. Each of the phosphor regions has a plurality of color sections. The light sources emit two light beams so as to respectively provide two light spots on the phosphor wheel. During the rotation of the phosphor wheel, the light spots are located at the color sections having the same fluorescent characteristic respectively in the phosphor regions.

Abstract: Provided is a luminescent wheel for a projector, which has a novel structure in which a phosphor layer is hard to break even if its thickness is reduced; a manufacturing method therefor; and a light emitting device for a projector. A luminescent wheel for a projector includes: a phosphor layer (11) which has a first principal surface (11a) and a second principal surface (11b) located on an opposite side to the first principal surface (11a) and is capable of being excited by the entry of excitation light to emit fluorescence; a first glass layer (12) provided on the first principal surface (11a) of the phosphor layer (11); and a second glass layer (13) provided on the second principal surface (11b) of the phosphor layer (11).

Abstract: A wavelength conversion element includes: a substrate; an intermediate layer that is provided on the substrate and has a refractive index less than a refractive index of the substrate; a dichroic layer that is provided on the intermediate layer; and a fluorescent layer that is provided on the dichroic layer and that is excited by light with a first wavelength band and thereby emits light with a second wavelength band different from the first wavelength band.

Abstract: A light source device includes a light source section that emits laser beam, a member reducing light quantity unevenness of the laser beam, a diffusion member that is provided in a traveling optical path of the laser beam between the light source section and the member reducing light quantity unevenness and diffuses the laser beam, a detection element that detects a physical characteristic of the diffusion member and outputs a state detecting signal, and an abnormal state determiner that determines an abnormal state of the diffusion member based on the state detecting signal.

Abstract: A multi-layer projection screen includes a transparent substrate having first and second sides, a stray light rejection layer, and a lens array. The stray light rejection layer is disposed across the first side of the transparent substrate. The stray light rejection layer includes an array of pillar structures, wherein each pillar structure of the array of pillar structures includes an entrance aperture, an exit aperture, a substantially transparent pathway extending from the entrance aperture to the exit aperture, and an opaque side wall surrounding the transparent pathway. The lens array is disposed across the second side of the transparent substrate and optically aligned to the array of pillar structures. The stray light rejection layer blocks display light received from the lens array having an oblique trajectory that is greater than a threshold angle from a normal of the second side of the transparent substrate.

Abstract: The present invention discloses a restoration solution for cine film bubble and a restoration method. The restoration solution comprises 100 parts by volume of n-butanol, 60 to 120 parts by volume of lacquer thinner having 5% by mass of ethyl cellulose, 8 to 20 parts by volume of diphenyl isooctyl phosphite, 2 to 10 parts by volume of bis (1,2,2,6,6-pentamethyl-4-piperidyl) sebacate, and 2 to 15 parts by volume of petroleum ether. The present invention integrates micro-restoration, bubble puncture and optical filling, and effectively restores a bubble having a diameter of 0.1 mm to 1 mm generated between a film base layer and an emulsion layer of a cine film. The present invention has advantages of simple method of operation, low cost and good controllability.

Abstract: An extreme ultraviolet mask and method of manufacture thereof includes: providing a glass-ceramic block; forming a glass-ceramic substrate from the glass-ceramic block; and depositing a planarization layer on the glass-ceramic substrate.

Abstract: Provided are photomask and a method of correcting errors thereof. The photomask includes a multilayer reflection film covering one side surface of a substrate and an energy receiving layer covering the other side surface of the substrate. The method includes determining a local correction position on a frontside surface of the photomask according to a detected error of the photomask, and locally applying an energy beam to a backside surface region of the photomask aligned with the local correction position in a thickness direction of the photomask. The invention may be applicable to structures other than photomasks that benefit from modification of surface heights or selectively applied stress.

Abstract: A phase shift mask blank includes a transparent substrate, a phase shift layer, a first hard mask layer and an opaque layer. The transparent substrate is disposed on the transparent substrate. The first hard mask layer is disposed on the phase shift layer. The phase shift layer has an etching selectivity with respect to the first hard mask layer. The opaque layer is disposed on the first hard mask layer.

Abstract: To provide a phase-shift mask in which the reduction in thickness of a light-shielding film is provided when a transition metal silicide-based material is used for the light-shielding film and by which the problem of ArF light fastness can be solved; and a mask blank for manufacturing the phase-shift mask. A mask blank 10 comprises a phase-shift film 2 and a light-shielding film 4 on a transparent substrate 1, the phase-shift film 2 is made of a material with ArF light fastness, and at least one layer in the light-shielding film 4 is made of a material which contains transition metal, silicon, and nitrogen, and satisfies the conditions of Formula (1) below: CN?9.0×10?6×RM4?1.65×10?4×RM3?7.718×10?2×RM2+3.611×RM?21.084??Formula (1) wherein RM is a ratio of the content of transition metal to the total content of transition metal and silicon in said one layer, and CN is the content of nitrogen in said one layer.

Abstract: Disclosed is a curable composition for nanoimprinting, which includes one or more polymerizable monomers, in which one or more monofunctional radically polymerizable monomers occupy 90 percent by weight or more of the one or more polymerizable monomers, and the one or more monofunctional radically polymerizable monomers give a polymer having a glass transition temperature of 25° C. or higher. The one or more monofunctional radically polymerizable monomers are preferably at least one compound selected from (meth)acrylic ester compounds, styrenic compounds, and vinyl ether compounds.

Abstract: Compounds of the formula (I) wherein Q is a direct bond or an n-valent linking group; n is an integer 2, 3, or 4; Z is for example C1-C20alkylene, C2-C20alkenylene, C5-C8cycloalkylene or C5-C8cycloalkenylene; Y is for example C6-C20aryl or C3-C20heteroaryl; R1 is for example hydrogen, C2-C5alkenyl, C3-C8cycloalkyl, C1-C12alkyl, phenyl, naphthyl, C3-C20heteroaryl, C1-C8alkoxy, benzyloxy or phenoxy; R2 is for example C1-C20alkyl, C2-C12alkenyl, C4-C8cycloalkenyl, C2-C12alkinyl, C3-C10cycloalkyl, phenyl or naphthyl; R15, R16, R17, R18, R19 and R20 independently of each other for example are hydrogen, halogen, C1-C20alkyl, C6-C20aryl or C4-C20heteroaryl; provided that a compound wherein R15, R16, R17, R15, R19 and R20 are hydrogen, Y is thienyl, R1 is methyl, R2 is ethyl, n is 2, Q is a direct bond and Z is n-propylene and a compound wherein R15, R16, R17, R18, R19 and R20 are hydrogen, Y is thienyl, R1 is methyl, R2 is ethyl, n is 2, Q as an n-valent linking group is methylene and Z is methylene are exclude

Abstract: A resist composition which contains a resin (A1) which has a structural unit represented by formula (I), a structural unit represented by formula (II) and a structural unit having an acid-labile group, and an acid generator: wherein R1 and R2 independently represent a hydrogen atom, a halogen atom or a C1-6 alkyl group that may have a halogen atom, Ra25 represents a carboxy group, a cyano group or a C1-4 aliphatic hydrocarbon group, A1 represents a single bond, *-A2-O—, A2-CO—O—, etc., A2 and A3 independently represents a C1-6 alkanediyl group, and w1 represents an integer of 0 to 8, L1 represents a single bond or *-L2-CO—O-(L3-CO—O)g—, L2 and L3 independently represent a C1-12 divalent hydrocarbon group, g represent 0 or 1, R3 represents a C1-12 liner or branched alkyl group except for a tertiary alkyl group and * represents a binding position to an oxygen atom.

Abstract: A resist composition which contains a resin (A1) which has a structural unit having a sulfonyl group, a structural unit represented by formula (II) and a structural unit having an acid-labile group, and an acid generator: wherein R1 represents a hydrogen atom, a halogen atom or a C1 to C6 alkyl group that may have a halogen atom, L1 represents a single bond or *-L2-CO—O-(L3-CO—O)g— where * represents a binding position to an oxygen atom, L2 and L3 independently represent a C1 to C12 divalent hydrocarbon group, “g” represents 0 or 1, and R3 represents a C1 to C12 liner or branched alkyl group except for a tertiary alkyl group.

Abstract: A resist composition which contains a resin (A1) which has a structural unit having a cyclic carbonate, a structural unit represented by formula (II) and a structural unit having an acid-labile group, and an acid generator: wherein R1 represents a hydrogen atom, a halogen atom or a C1 to C6 alkyl group that may have a halogen atom, L1 represents a single bond or *-L2-CO—O-(L3-CO—O)g— where * represents a binding position to an oxygen atom, L2 and L3 independently represent a C1 to C12 divalent hydrocarbon group, g represents 0 or 1, and R3 represents a C1 to C12 liner or branched alkyl group except for a tertiary alkyl group.

Abstract: Various embodiments of the invention demonstrate selective laser ablation processes as a means to create a block copolymer derived lithographic pattern through the selective removal of one block. Three block copolymer systems described PS-b-PHOST, P2VP-b-PS-b-P2VP, and P2VP-b-PS-b-P2VP where the P2VP is infiltrated with platinum Pt. The selective laser ablation processes on block copolymers offers an alternative to plasma etching when plasma etching is not effective.

Abstract: Patterning methods for creating features with sub-resolution dimensions that are self-aligned in photoresist materials. Techniques include selectably creating antispacers (or spacers) in soft materials, such as photoresist. A photoresist without a photo acid generator is deposited on a relief pattern of a solubility-neutralized photoresist material having a photo acid generator. A photomask then defines where photo acid is generated from a corresponding activating exposure. Photo acid is then diffused into the photoresist, that is free of the photo acid generator, to cause a solubility shift for subsequent development. These selectably-created antispacers can be line segments having widths defined by acid diffusion lengths, which can be widths of 1 nanometer to tens of nanometers. Moreover, the creation of antispacers, their location, and length, can be controlled using a photomask.

Abstract: A process of an extreme ultraviolet lithography is disclosed. The process includes receiving an extreme ultraviolet (EUV) mask, an EUV radiation source and an illuminator. The process also includes exposing the EUV mask by a radiation, originating from the EUV radiation source and directed by the illuminator, with a less-than-three-degree chief ray angle of incidence at the object side (CRAO). The process further includes removing most of the non-diffracted light and collecting and directing the diffracted light and the not removed non-diffracted light by a projection optics box (POB) to expose a target.

Abstract: A mirror, in particular for a microlithographic projection exposure apparatus has an optically effective surface, wherein the mirror has a reflectivity of at least 0.5 for electromagnetic radiation which has a prescribed working wavelength and impinges on the optically effective surface at an angle of incidence based on the respective surface normal of at least 65°, wherein the mirror has at least one layer (160, 170, 320) which comprises a compound of an element of the second period and an element of the 4d transition group, wherein the mirror has a protective layer (430, 530, 630, 730) arranged on top in the direction of the optically effective surface, wherein the material of the layer (420, 510, 620, 705) arranged in each case underneath the protective layer in the direction of the optically effective surface has a lower absorption than the material of the protective layer (430, 530, 630, 730).

Abstract: Disclosed is component for a radiation source, said radiation source being operable to generate radiation from a fuel, said component having a surface comprising a plurality of first regions that have a high wettability by said fuel, separated by second regions which have a low wettability by said fuel. Said component may comprise a screening element for a droplet generator or contamination trap, for example.

Abstract: A target supply device may include a tank for storing a target material, a nozzle which is connected to the tank and outputs the target material, and a gas supply section for supplying the tank with gas. The gas supply section may include a booster which is connected to a gas line, boosts the gas supplied from the gas line, and outputs the boosted gas to the tank, a pressure sensor for measuring the pressure inside the tank, and a pressure controller which adjusts the pressure of the gas to be supplied to the tank on the basis of a measurement result from the pressure sensor.

Abstract: An super-resolution system for nano-patterning is disclosed, comprising an optical printing head that enables a super-resolution lithographic exposures compatible with conventional optical lithographic processes. The super-resolution exposures are carried out using light directed onto a medium using plasmonic structures, and in particular using plasmonic structures using specially designed super-resolution apertures, of which the “bow-tie” and “C-aperture” are examples. These specially designed apertures create small but bright images in the near-field transmission pattern. A printing head comprising an array of these apertures is held in close proximity to a medium for patterning. In some embodiments, a data processing system is provided to re-interpret the data to be patterned into a set of modulation signals used to drive the multiple individual channels and the multiple exposures.

Abstract: An optical arrangement includes an optical element (1) and a thermal manipulation device. The optical element has a substrate (2), a coating (3, 9, 5) applied to the substrate (2), and an antireflection coating (3). The coating (3, 9, 5) includes: a reflective multi-layer coating (5b) configured to reflect radiation (4) with a used wavelength (?EUV). The antireflection coating (3) is arranged between the substrate (2) and the reflective multi-layer coating (5b) to suppress reflection of heating radiation (7) with a heating wavelength (?H) that differs from the used wavelength (?EUV). The thermal manipulation device has at least one heating light source (8) to produce heating radiation (7).

Abstract: A fluid handling structure for a lithographic apparatus, the fluid handling structure having, at a boundary from a space configured to contain immersion fluid to a region external to the fluid handling structure: a meniscus pinning feature to resist passage of immersion fluid in a radially outward direction from the space; a plurality of gas supply openings in a linear array at least partly surrounding and radially outward of the meniscus pinning feature; and a gas recovery opening radially outward of the plurality of gas supply openings in a linear array.

Abstract: The present invention determines property of a target (30) on a substrate (W), such as a grating on a wafer. An inspection apparatus has an illumination source (702, 710) with two or more illumination beams (716, 716?, 716?, 716??) in the pupil plane of a high numerical aperture objective lens (L3). The substrate and target are illuminated via the objective lens from different angles of incidence with respect to the plane of the substrate. In the case of four illumination beams, a quad wedge optical device (QW) is used to separately redirect diffraction orders of radiation scattered from the substrate and separates diffraction orders from the two or more illumination beams. For example four 0th diffraction orders are separated for four incident directions. After capture in multimode fibers (MF), spectrometers (S1-S4) are used to measure the intensity of the separately redirected 0th diffraction orders as a function of wavelength. This may then be used in determining a property of a target.

Abstract: The present invention provides a method for solving the need for layer management with double-layer overlay accuracy control, a calibration mark structure which realizes the method and a measurement system with the calibration mark structure. The method modifies the layout of the overlay calibration marks such that overlay information of two layers is contained in one combined calibration mark, has realized the overlay accuracy data collection for the two previous layers in the current layer by one-time measurement, and can treat the overlay accuracies of the two layers as different control accuracies. Thus, the method can complete the automatic feedback optimization of the overlay accuracy compensation, is simple and easy, and can better help the enterprises for production quality assurance and cost control.

Abstract: A lithographic apparatus including an inspection apparatus can measure the overlay error of a target in a scribelane is measured. The overlay error of the required feature in the chip area may differ from this due to, for example, different responses to the exposure process. A model is used to simulate these differences and thus a more accurate measurement of the overlay error of the feature determined.

Abstract: A multi-stage system includes a stator including a plurality of electric coils; a first stage including a first magnet assembly, the first stage moveable relative to the stator; a second stage including a second magnet assembly, the second stage moveable relative to the stator; a controller configured to position the first and the second stage relative to the stator by activating, respectively, a first subset of the plurality of electric coils to interact with the first magnet assembly and a second subset of the plurality of electric coils to interact with the second magnet assembly, the controller adapted to prevent at least one electric coil, to be simultaneously shared by the first and the second subset to position the first and the second stage on the stator, from activating.

Abstract: A substrate holder for a lithographic apparatus has a main body having a thin-film stack provided on a surface thereof. The thin-film stack forms an electronic or electric component such as an electrode, a sensor, a heater, a transistor or a logic device, and has a top isolation layer. A plurality of burls to support a substrate are formed on the thin-film stack or in apertures of the thin-film stack.

Abstract: A device for positioning a mask relative to the surface of a wafer with a view to the exposure of the wafer, which includes (i) first positioning structure suitable for holding and moving the mask and the wafer in relation to each other; (ii) imaging structure suitable for producing at least one image of the mask and of the surface of the wafer according to at least one field of view, so as to image positioning marks of the mask and of the wafer simultaneously in the field of view; and (iii) at least one optical distance sensor suitable for producing a distance measurement between the surface of the water and the mask in the field(s) of view, with a measurement beam, which passes at least partially through the imaging structure.

Abstract: A lithographic apparatus includes: an object that is moveable in at least one direction; a control system to move the object in the at least one direction, wherein the control system is arranged to control movement of the object in the at least one direction in a frequency range of interest; and a conduit provided with a fluid, wherein the conduit is arranged on or in the object in a pattern, and wherein the pattern is such that an acceleration of the object in the at least one direction causes an acceleration pressure profile in the fluid along the conduit, the acceleration pressure profile not matching with a resonance pressure profile that corresponds to a standing wave mode in the fluid with a resonance frequency in the frequency range of interest.

Abstract: A method of determining a position of an imprint template in an imprint lithography apparatus is disclosed. In an embodiment, the method includes illuminating an area of the imprint template in which an alignment mark is expected to be found by scanning an alignment radiation beam over that area, detecting an intensity of radiation reflected or transmitted from the area, and identifying the alignment mark via analysis of the detected intensity.

Abstract: Provided is an electrophotographic photosensitive member including a support, an undercoat layer formed on the support, and a photosensitive layer formed on the undercoat layer, in which the undercoat layer contains a polymer of a composition containing a compound represented by the formula (1).

Abstract: The present invention provides an electrophotographic photosensitive member that allows positive ghost to be reduced even in repeated use. The electrophotographic photosensitive member of the present invention is an electrophotographic photosensitive member wherein an undercoat layer contains a polymerization product of a composition including a compound represented by the following formula (1).

Abstract: Provided is an electrophotographic photosensitive member comprising a support, an intermediate layer formed on the support, a charge generating layer formed directly on the intermediate layer, and a charge transporting layer formed on the charge generating layer, in which the intermediate layer contains a compound represented by the formula (1).

Abstract: Provided are an electrophotographic photosensitive member comprising: a support, an undercoat layer formed on the support, and a photosensitive layer formed on the undercoat layer, on which the undercoat layer contains one of a compound represented by the formula (1) and a polymer of a composition containing the compound represented by the formula (1).

Abstract: An undercoat layer of an electrophotographic photosensitive member includes a binder resin, and a complex particle composed of a core particle coated with tin oxide doped with zinc.

Abstract: Provided is a toner having improved durability. The magnetic toner includes magnetic toner particles each containing a binder resin and a magnetic material, in which a deformation amount when a load of 9.8×10?4 N is applied to one particle of the magnetic toner in a microcompression test is 3.0 ?m or less, in which the magnetic toner has a surface free energy of 5 mJ/m2 or more and 20 mJ/m2 or less, and in which the magnetic toner has a melt viscosity ?? at 100° C. of 5.0×103 Pa·s or more and 1.0×105 Pa·s or less.

Abstract: A part material for printing three-dimensional parts with an electrophotography-based additive manufacturing system, the part material including a composition having a copolymer (including acrylonitrile units, butadiene units, and aromatic units), a charge control agent, and a heat absorber. The part material is provided in a powder form having a controlled particle size, and is configured for use in the electrophotography-based additive manufacturing system having a layer transfusion assembly for printing the three-dimensional parts in a layer-by-layer manner.

Abstract: A developer contains at least a binder resin and a fluorescent brightening agent. A content of the fluorescent brightening agent in the developer is 0.3% by weight or more and 0.5% by weight or less.

Abstract: A toner includes a binder resin; a release agent; and two or more inorganic fine particles as external additives. At least one of the inorganic fine particles is silica. When an ultrasonic oscillation is applied to a dispersion including the toner and a dispersant and a rate of the silica releasing from the toner is 20% based on total silica, an application energy of the ultrasonic oscillation is from 8 to 14 kJ, and from 70 to 130 kJ when the rate of the silica releasing from the toner is 50%.

Abstract: An electrostatic latent image developing toner contains toner particles each containing a toner core, and a shell layer dividedly disposed as a plurality of segments on a surface of the toner core. The shell layer contains a hydrophobic thermoplastic resin and a hydrophilic thermosetting resin. A toner core-shell layer interface formation rate is 3.78×106 m?1 or more and 7.02×106 m?1 or less. A ratio of the hydrophobic thermoplastic resin to the toner core is 0.40% by mass or more and 1.55% by mass or less.

Abstract: In accordance with one embodiment, an image forming apparatus forms a metallic toner image with the toner having metallic color tone. The plurality of developing sections includes either or both of a developing section for forming a black toner image with the black toner and a developing section for forming a white toner image with the white toner. The plurality of developing sections is provided with one or more than two developing sections for forming a metallic toner image with the toner having metallic color tone.