Patents Issued in March 7, 2017
  • Patent number: 9588407
    Abstract: A timer mount system is configured for use with a camera and a camera mount to capture panoramic videos or photographs in multiple rotational directions. The timer mount system comprises a housing, a drive shaft, a panning mechanism, a first mount component, and a second mount component. Within the housing, the drive shaft is coupled to the panning mechanism, which stores rotational energy when wound in a rotational direction and then causes the drive shaft to rotate in a reverse rotational direction when released. The first mount component is configured to secure to and rotate with the drive shaft, while the second mount component is configured to remain stationary while allowing the drive shaft to rotate freely. A first configuration allows the first mount component to rotate in a first rotational direction, and a second configuration allows the first mount component to rotate in a second rotational direction.
    Type: Grant
    Filed: April 6, 2016
    Date of Patent: March 7, 2017
    Assignee: GoPro, Inc.
    Inventor: Ryan Harrison
  • Patent number: 9588408
    Abstract: Example embodiments may relate to methods and systems for providing a higher-resolution segment within a larger lower-resolution projection onto a projection surface. For example, the system may receive pose data corresponding to a viewing location relative to the projection surface. The system may then determine, based on the pose data, a target portion of an image frame of image data. As a result, the system may cause a first projector to project at least the target portion onto the projection surface and cause a second projector to project at least a remaining portion of the image frame of the image data onto the projection surface. The projections of the target portion and the remaining portion may collectively provide a complete projection of the image data on the projection surface and a projection-surface resolution of the target portion may be higher than a projection-surface resolution of the remaining portion.
    Type: Grant
    Filed: July 21, 2014
    Date of Patent: March 7, 2017
    Assignee: Autofuss
    Inventor: Jeffrey Linnell
  • Patent number: 9588409
    Abstract: A projector includes an illumination unit which has an optical system including a light source apparatus, an image formation unit which has an optical system including a light modulator (liquid crystal panels), a projection unit which has an optical system including a projection lens, to which the image formation unit is coupled, and which is coupled to the illumination unit, and a base frame which fixes one of the illumination unit and the projection unit and holds the other shiftably in a direction parallel to a projection direction. In a case where the projection unit is fixed to the base frame, second fixing portions (projection unit fixing portions) of the projection unit are fixed, and first fixing portions (illumination unit fixing portions) of the illumination unit are shiftably held.
    Type: Grant
    Filed: March 9, 2015
    Date of Patent: March 7, 2017
    Assignee: Seiko Epson Corporation
    Inventor: Kaname Nagatani
  • Patent number: 9588410
    Abstract: A projector which includes a light source, liquid crystal light valves, a dimming mechanism, an illumination optical system, a control circuit which determines an input light amount which is caused to be input to the liquid crystal light valve on the basis of an input image signal, outputs an output image signal which is decompressed according to the input light amount, and generates a first control signal which designates a first dimming rate of a high pressure mercury lamp and a second control signal which designates a second dimming rate of the dimming mechanism based on the input light amount, an illumination driving circuit which drives the light source on the basis of the first control signal, and a douser driving circuit which drives the douser on the basis of the second control signal.
    Type: Grant
    Filed: August 17, 2012
    Date of Patent: March 7, 2017
    Assignee: SEIKO EPSON CORPORATION
    Inventors: Hirosada Horiguchi, Hiroshi Yoshimoto, Tadashi Yamada
  • Patent number: 9588411
    Abstract: A light source apparatus includes: an excitation light source including a laser light source; a first wheel that is controlled to rotate, and includes, in a part of a surface thereof to be illuminated by excitation light emitted from the excitation light source, a phosphor layer to be excited by the excitation light; and a second wheel that is controlled to rotate, and includes a dichroic filter that outputs light having a desired wavelength component of each of fluorescence emitted from the phosphor layer of the first wheel and the excitation light emitted from the excitation light source.
    Type: Grant
    Filed: August 18, 2014
    Date of Patent: March 7, 2017
    Assignee: PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.
    Inventor: Hiroshi Kitano
  • Patent number: 9588412
    Abstract: The x-ray film image marker is a device that is adapted for use with an x-ray portable cassette in order to provide the image marker capability that is used in conjunction with taking an x-ray, but also enabling a technician the ability to locate a misplaced x-ray film image marker. The x-ray film image marker includes at least one light member that illuminates or flashes for a pre-determined amount of time upon depression of an on/off button. The at least one light member aids in location of the x-ray film image marker in a poorly lit environment. The at least one speaker may be used to play an audio file in order to aid in location of the x-ray film image marker in a poorly lit environment.
    Type: Grant
    Filed: February 10, 2015
    Date of Patent: March 7, 2017
    Inventor: Jerusalmi Streete
  • Patent number: 9588413
    Abstract: Provided are a photomask and a method of correcting errors thereof. The photomask includes a multilayer reflection film covering one side surface of a substrate and an energy receiving layer covering the other side surface of the substrate. The method includes determining a local correction position on a frontside surface of the photomask according to a detected error of the photomask, and locally applying an energy beam to a backside surface region of the photomask aligned with the local correction position in a thickness direction of the photomask. The invention may be applicable to structures other than photomasks that benefit from modification of surface heights or selectively applied stress.
    Type: Grant
    Filed: September 7, 2016
    Date of Patent: March 7, 2017
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Sang-hyun Kim, Seong-sue Kim, Dong-gun Lee
  • Patent number: 9588414
    Abstract: Various embodiments provide photomask patterns and methods for forming the same. In an exemplary method, a to-be-etched pattern can be provided. The to-be-etched pattern can be divided into a first mask pattern and an initial second mask pattern. The first mask pattern can include one or more first patterns and the initial second mask pattern can include one or more second patterns. A second print scattering pattern can be formed and added to the initial second mask pattern. A position of the second print scattering pattern can be separated from a position of the one or more first patterns of the first mask pattern.
    Type: Grant
    Filed: July 16, 2014
    Date of Patent: March 7, 2017
    Assignee: SEMICONDUCTOR MANUFACTURING INTERNATIONAL (SHANGHAI) CORPORATION
    Inventor: Tiezhu Wang
  • Patent number: 9588415
    Abstract: An exposure system includes a data processing part that forms an exposure layout and an exposure part that irradiates an electron beam at a photoresist layer according to the exposure layout. The data processing part generates a control parameter for driving the exposure part without a pattern position error and a beam drift error and to prevent a discrepancy between the exposure layout and a mask layout to be formed in the photoresist layer. A controlling part controls the exposure part according to the control parameter.
    Type: Grant
    Filed: January 6, 2015
    Date of Patent: March 7, 2017
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Sukjong Bae, Jin Choi, Sunghoon Park
  • Patent number: 9588416
    Abstract: Apparatus for nanofabrication on an unconventional substrate including a patterned pliable membrane mechanically coupled to a membrane support structure, a substrate support structure to receive a substrate for processing, and an actuator to adjust the distance between the pliable membrane and the substrate. Nanofabrication on conventional and unconventional substrates can be achieved by transferring a pre-formed patterned pliable membrane onto the substrate using a transfer probe or non-stick sheet, followed by irradiating the substrate through the patterned pliable membrane so as to transfer the pattern on the pliable membrane into or out of the substrate. The apparatus and methods allow fabrication of diamond photonic crystals, fiber-integrated photonic devices and Nitrogen Vacancy (NV) centers in diamonds.
    Type: Grant
    Filed: November 10, 2014
    Date of Patent: March 7, 2017
    Assignee: Columbia University
    Inventors: Dirk Robert Englund, Igal Bayn, Luozhou Li
  • Patent number: 9588417
    Abstract: A method includes providing a carrier wafer, forming an indented portion on the carrier wafer, the indented portion having a sloped portion at an edge of the indented portion, bonding a pellicle wafer on the carrier wafer so as to form an open area within the indented portion, patterning the pellicle wafer to form a pellicle membrane over the indented portion and a pellicle membrane support structure over the sloped portion, and applying a mechanical force to disconnect the pellicle membrane from the pellicle wafer.
    Type: Grant
    Filed: May 28, 2015
    Date of Patent: March 7, 2017
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Chia-Chun Chung, Chia-Hao Hsu, Chih-Tsung Shih
  • Patent number: 9588418
    Abstract: A near-field exposure mask according to an embodiment includes: a substrate; a concave-convex structure having convexities and concavities and formed on one surface of the substrate; a near-field light generating film arranged at least on a tip portion of each of the convexities, the near-field light generating film being a layer containing at least one element selected from the group consisting of Au, Al, Ag, Cu, Cr, Sb, W, Ni, In, Ge, Sn, Pb, Zn, Pd, and C, or a film stack formed with layers made of some of those materials; and a resin filled in each of the concavities.
    Type: Grant
    Filed: December 16, 2014
    Date of Patent: March 7, 2017
    Assignee: KABUSHIKI KAISHA TOSHIBA
    Inventors: Naomi Shida, Kenji Todori, Shigehiko Mori, Reiko Yoshimura, Hiroyuki Kashiwagi, Ikuo Yoneda, Tsukasa Tada
  • Patent number: 9588419
    Abstract: Embodiments of EUV photomasks and methods for forming a EUV photomask are provided. The method comprises providing a substrate, a reflective layer, a capping layer, a hard mask layer, and forming an opening therein. An absorber layer is then filled in the opening and over the top surface of the hard mask layer. A removing process is provided to form an absorber with a top surface lower than a top surface of the capping layer.
    Type: Grant
    Filed: July 27, 2015
    Date of Patent: March 7, 2017
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Yen-Cheng Lu, Chih-Tsung Shih, Shinn-Sheng Yu, Jeng-Horng Chen, Anthony Yen
  • Patent number: 9588420
    Abstract: A photomask includes at least one feature disposed thereon. The at least one feature has an associated design location, where a distance between a location of the at least one feature and the associated design location defines a positional error of the at least one feature. A method for improving a performance characteristic of the photomask includes directing electromagnetic radiation toward the photomask, the electromagnetic radiation having a wavelength that substantially coincides with a high absorption coefficient of the photomask; generating a thermal energy increase in the photomask through incidence of the electromagnetic radiation thereon; and decreasing the positional error as a result of the generating the thermal energy increase in the photomask.
    Type: Grant
    Filed: February 19, 2016
    Date of Patent: March 7, 2017
    Assignee: RAVE LLC
    Inventors: Jeffrey E. LeClaire, Kenneth G. Roessler, David Brinkley
  • Patent number: 9588421
    Abstract: Provided with a pellicle inspection apparatus that inspects a pellicle film of a mask provided with a pellicle and used in EUV lithography. The pellicle inspection apparatus includes: an illumination optical system that projects a converging illuminating beam toward the pellicle film; a light collection optical system including an object lens having an optical axis substantially orthogonal to the pellicle film and that collects scattering light outgoing from a foreign substance present on the pellicle film; and a detection system that detects the scattering light collected by the light collection optical system, wherein an incident angle ?2 of the illuminating beam with respect to the pellicle film satisfies Expression ?2??0>?1+23°, where ?0 is a collecting angle (half angle) of the illuminating beam, and ?1 is a maximum light-receiving angle (half angle) of the object lens.
    Type: Grant
    Filed: April 10, 2015
    Date of Patent: March 7, 2017
    Assignee: Lasertec Corporation
    Inventors: Kiwamu Takehisa, Atsushi Tajima, Haruhiko Kusunose
  • Patent number: 9588422
    Abstract: A method of forming an imprint template using a substrate having an inorganic release layer and a layer of imprintable medium is disclosed. The method includes using a master imprint template to imprint a pattern into the imprintable medium, causing the imprintable medium to solidify, and etching the imprintable medium and the inorganic release layer to form a pattern in the inorganic release layer.
    Type: Grant
    Filed: September 27, 2010
    Date of Patent: March 7, 2017
    Assignee: ASML NETHERLANDS B.V.
    Inventor: Sander Frederik Wuister
  • Patent number: 9588423
    Abstract: An acid diffusion control agent includes a compound represented by a formula (1), a compound represented by a formula (2) or both thereof. R1 represents a hydrocarbon group comprising a monovalent alicyclic structure, or the like. R2 and R3 each independently represent a monovalent hydrocarbon group, or the like. R4 and R5 each independently represent a monovalent hydrocarbon group, or the like. R6 and R7 each independently represent a monovalent hydrocarbon group, or the like. R8 represents a monocyclic heterocyclic group together with the ester group and with the carbon atom. n is an integer of 1 to 6. R9 represents a monovalent hydrocarbon group, or the like. R10 represents a monovalent hydrocarbon group having 1 to 10 carbon atoms. R11 and R12 each independently represent a monovalent hydrocarbon group, or the like. R13 and R14 each independently represent a monovalent hydrocarbon group, or the like.
    Type: Grant
    Filed: November 14, 2014
    Date of Patent: March 7, 2017
    Assignee: JSR CORPORATION
    Inventors: Hayato Namai, Norihiko Ikeda
  • Patent number: 9588424
    Abstract: A photosensitive resin composition is prepared by dispersing at least one of a hydrophobic polymer and a mixture of an oil-soluble photopolymerization initiator and a water-insoluble or sparingly water-soluble compound having at least one photoactive, ethylenically unsaturated group in an aqueous solution that contains both a water-soluble polymer and a diazo resin is obtained by condensing a water-soluble salt of an optionally substituted 4-diazodiphenylamine with formaldehyde in the presence of sulfuric acid and phosphoric acid. This photosensitive resin composition gives a photosensitive film having excellent stability over time and a wide exposure latitude. By adding a specific fluorine compound to the photosensitive resin composition, a screen plate has an excellent discharge performance.
    Type: Grant
    Filed: September 25, 2012
    Date of Patent: March 7, 2017
    Assignee: SUNTYPE CO., LTD.
    Inventors: Yoshio Umeda, Kenji Ota, Yuichi Ono, Taichi Okada, Yukina Kuwahara, Takafumi Somei, Setsuka Nakajima, Masataka Miyazaki, Toru Mori, Suguru Komatsu, Michihiro Iljima
  • Patent number: 9588425
    Abstract: The present invention aims to provide positive photosensitive compositions that have excellent patterning properties and can exhibit excellent electrical insulation reliability when cured (as thin films). The positive photosensitive composition according to a first aspect of the present invention is characterized by including (A) a compound that contains an alkenyl group or a SiH group within a molecule and has a structure that decomposes in the presence of acid to generate an acidic group or a hydroxyl group; (B) a compound that contains a SiH group or an alkenyl group within a molecule; (C) a hydrosilylation catalyst; and (D) a photoacid generator.
    Type: Grant
    Filed: October 7, 2016
    Date of Patent: March 7, 2017
    Assignee: Kaneka Corporation
    Inventors: Masahito Ide, Hirofumi Inari, Aki Kitajima, Komei Tahara, Takao Manabe
  • Patent number: 9588426
    Abstract: Disclosed is a negative photoresist comprising 1 to 90 parts of hydroxyl-containing or carboxyl-containing film-forming resin, 1 to 99 parts of silicon-containing vinyl ether monomer, 0.1 to 15 parts by weigh of a crosslinking agent, and an organic solvent capable of dissolving the aforesaid substances. Disclosed is also methods of preparing and using the negative photoresist.
    Type: Grant
    Filed: August 15, 2014
    Date of Patent: March 7, 2017
    Assignee: BOE Technology Group Co., Ltd.
    Inventors: Jianguo Wang, Hehe Hu
  • Patent number: 9588427
    Abstract: A light exposure system executing a light exposure process to a plurality of assembly cells, each of which includes a first substrate, a second substrate and a liquid crystal layer disposed between the first and second substrates, comprises: a transmission device; two moving stages disposed on the transmission device and carrying the assembly cells; and a light source module including at least a light emitting element, wherein the transmission device moves at least one of the moving stages carrying the assembly cell or the light source module, and the light emitting element emits the light to the assembly cell, wherein the assembly cells include a first assembly cell and a second assembly cell, the moving stages carry the first assembly cell and the second assembly cell, respectively, wherein when the light exposure process is executed to the first assembly cell, the second assembly cell receives the work of cell replacement and alignment, electrode contact and application of electric field, wherein when the
    Type: Grant
    Filed: May 19, 2014
    Date of Patent: March 7, 2017
    Assignee: INNOLUX CORPORATION
    Inventors: Ker-Yih Kao, Tsan-Jen Chen, Chen-Kuan Kao, Chien-Hsing Lee
  • Patent number: 9588428
    Abstract: A resist removal method includes removing a resist provided on a photomask substrate by bringing a resist removing liquid into contact with the resist in patterning of a photomask for EUV lithography in which the resist removing liquid contains an alkali compound, a specific nitrogen-containing compound, and water, and a content of the water is more than 50% by mass.
    Type: Grant
    Filed: October 15, 2015
    Date of Patent: March 7, 2017
    Assignee: FUJIFILM Corporation
    Inventor: Atsushi Mizutani
  • Patent number: 9588429
    Abstract: Lithographic printing plates are formed by imagewise exposing a single-layer or dual-layer positive-working lithographic printing plate precursor. The precursor has an outermost ink receptive layer containing a phenolic resin. The exposed precursor can be processed using a silicate-free developer composition having a pH of at least 12.5. This composition also includes an alkali metal hydroxide; a coating protecting agent that is a quaternary ammonium salt or phosphonium salt, or a mixture thereof, and a moderator for the coating protecting agent that is represented by the following general formula (I): wherein m is at an integer of at least 1 and up to and including 10 and M represents one or more counterions sufficient to balance the negatively-charged sulfonate groups.
    Type: Grant
    Filed: September 3, 2015
    Date of Patent: March 7, 2017
    Assignee: EASTMAN KODAK COMPANY
    Inventors: Jianbing Huang, Gerhard Hauck, Celin Savariar-Hauck, Andrea Pauls, Dietmar Frank, Oliver Piestert
  • Patent number: 9588430
    Abstract: Energy output from a laser-produced plasma (LPP) extreme ultraviolet light (EUV) system varies based on how well the laser beam is focused on droplets of target material to generate plasma at a primary focal spot. Maintaining droplets at the primary focal spot during burst firing is difficult because generated plasma from preceding droplets push succeeding droplets out of the primary focal spot. Current droplet-to-droplet feedback control to re-align droplets to the primary focal spot is relatively slow. The system and method described herein adaptively pre-compensate for droplet push-out by directing droplets to a target position that is offset from the primary focal spot such that when a droplet is lased, the droplet is pushed by the laser beam into the primary focal spot to generate plasma. Over time, the EUV system learns to maintain real-time alignment of droplet position so plasma is generated consistently within the primary focal spot.
    Type: Grant
    Filed: January 13, 2016
    Date of Patent: March 7, 2017
    Assignee: ASML Netherlands B.V.
    Inventors: Jeroen van der Burgt, Matthew R. Graham, Charles Kinney, Wayne J. Dunstan
  • Patent number: 9588431
    Abstract: An illumination optics illuminates an object field of a projection exposure apparatus for microlithography. The illumination optics include a condenser group of optical components which guide a bundle of useful light. An objective group of bundle-guiding components is arranged downstream of the condenser group. At least one component of the condenser group and at least one component of the objective group are displaceable for compensation of deviations of the object field, which is in an actual illumination state, from a desired illumination state.
    Type: Grant
    Filed: March 7, 2014
    Date of Patent: March 7, 2017
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Artur Hoegele, Markus Deguenther
  • Patent number: 9588432
    Abstract: An illumination optical apparatus illuminates a pattern on a mask with illumination light. The illumination optical apparatus includes an optical integrator arranged in an optical path of the illumination light, a deflecting member arranged in the optical path on an incidence side of the optical integrator, which deflects the illumination light, a lens element arranged in the optical path between the deflecting member and the optical integrator, which distributes the illumination light in a region, on a pupil plane of the illumination optical apparatus, away from an optical axis of the illumination optical apparatus, and a polarization member arranged in the optical path between the lens element and the optical integrator, which changes a polarization state of the illumination light so that a polarization direction of the illumination light in the region is substantially coincident with a circumferential direction about the optical axis.
    Type: Grant
    Filed: May 9, 2013
    Date of Patent: March 7, 2017
    Assignee: NIKON CORPORATION
    Inventors: Takehito Kudo, Shigeru Hirukawa
  • Patent number: 9588433
    Abstract: The invention relates to an optical system, in particular of a microlithographic projection exposure apparatus, with an optical system axis (OA) and a polarization-influencing optical arrangement.
    Type: Grant
    Filed: September 30, 2014
    Date of Patent: March 7, 2017
    Assignee: Carl Zeiss SMT GmbH
    Inventor: Ingo Saenger
  • Patent number: 9588434
    Abstract: In general, in one aspect, the invention features a system that includes an illumination system of a microlithography tool, the illumination system including a first component having a plurality of elements. During operation of the system, the elements direct radiation from a source along an optical path to an arc-shaped object field at an object plane of a projection objective, and at least one of the elements has a curved shape that is different from the arc-shape of the object field.
    Type: Grant
    Filed: July 31, 2012
    Date of Patent: March 7, 2017
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Jens Ossmann, Martin Endres, Ralf Stuetzle
  • Patent number: 9588435
    Abstract: The disclosure relates to an EUV microlithography projection exposure apparatus having an exposure light source for producing radiation in a first spectral range from 5 nm-15 nm, and a heat light source for producing radiation in a second spectral range from 1-50 ?m. The apparatus also includes an optical system having a first group of mirrors for guiding radiation from the first spectral range along a light path such that each mirror in the first group can have a first associated intensity distribution applied to it in the first spectral range during operation of the exposure light source. The heat light source is arranged such that at least one mirror in the first group can have a second associated intensity distribution in the second spectral range applied to it during operation of the heat light source. The first intensity distribution differs from the second intensity distribution essentially by a position-independent factor.
    Type: Grant
    Filed: March 4, 2013
    Date of Patent: March 7, 2017
    Assignee: Carl Zeiss SMT GmbH
    Inventor: Damian Fiolka
  • Patent number: 9588436
    Abstract: An exposure apparatus (EX) exposes a substrate (P) by irradiating exposure light (EL) on the substrate (P) via a projection optical system (PL) and a liquid (LQ) supplied from a liquid supply mechanism (10). The exposure apparatus (EX) has a pressure adjustment mechanism (90) for adjusting pressure of the liquid (LQ) supplied from the liquid supply mechanism (10). A liquid immersion area is satisfactorily formed to obtain high exposure accuracy and measurement accuracy.
    Type: Grant
    Filed: October 12, 2011
    Date of Patent: March 7, 2017
    Assignee: NIKON CORPORATION
    Inventor: Hiroyuki Nagasaka
  • Patent number: 9588437
    Abstract: A fluid handling structure for a lithographic apparatus, the fluid handling structure having, at a boundary from a space configured to contain immersion fluid to a region external to the fluid handling structure: a meniscus pinning feature to resist passage of immersion fluid in a radially outward direction from the space; and a plurality of gas supply openings in a linear array at least partly surrounding and radially outward of the one or more meniscus pinning features, wherein the plurality of gas supply openings in a linear array are of a similar or the same size.
    Type: Grant
    Filed: December 18, 2015
    Date of Patent: March 7, 2017
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Rogier Hendrikus Magdalena Cortie, Nicolaas Ten Kate, Niek Jacobus Johannes Roset, Michel Riepen, Henricus Jozef Castelijns, Cornelius Maria Rops, Jim Vincent Overkamp
  • Patent number: 9588438
    Abstract: Embodiments of the present invention provide methods for optimizing a lithographic projection apparatus including optimizing projection optics therein. The current embodiments include several flows including optimizing a source, a mask, and the projection optics and various sequential and iterative optimization steps combining any of the projection optics, mask and source. The projection optics is sometimes broadly referred to as “lens”, and therefore the optimization process may be termed source mask lens optimization (SMLO). SMLO may be desirable over existing source mask optimization process (SMO) or other optimization processes that do not include projection optics optimization, partially because including the projection optics in the optimization may lead to a larger process window by introducing a plurality of adjustable characteristics of the projection optics.
    Type: Grant
    Filed: November 9, 2011
    Date of Patent: March 7, 2017
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Duan-Fu Hsu, Luoqi Chen, Hanying Feng, Rafael C. Howell, Xinjian Zhou, Yi-Fan Chen
  • Patent number: 9588439
    Abstract: Embodiments of the present invention describe methods of selecting a subset of test patterns from an initial larger set of test patterns for calibrating a computational lithography model. An example method comprises: generating an information matrix for the initial larger set of test patterns, wherein the terms of the information matrix comprise one or more identified model parameters that represent a lithographic process response; and, executing a selection algorithm using terms of the information matrix to select the subset of test patterns that effectively determines values of the identified model parameters that contribute significantly in the lithographic process response, wherein the subset of test patterns characteristically represents the initial larger set of test patterns. The selection algorithm explores coverage relationships existing in the initial larger set of test patterns.
    Type: Grant
    Filed: December 20, 2011
    Date of Patent: March 7, 2017
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Antoine Jean Bruguier, Yu Cao, Jun Ye, Wenjin Shao
  • Patent number: 9588440
    Abstract: This invention relates to a method of obtaining optimal focus for exposing a photoresist in an EUV lithography with an EUV mask containing a pattern with an assist feature. The invention also relates to an EUV mask with a special focus test target for monitoring focus in EUV lithography, and a method of fabricating this EUV mask by designing the special focus test target. The EUV mask contains a repeating pattern, wherein the repeating pattern has two different pitches, i.e. a first pitch and a second pitch, and contains an assist feature between main features. Because the two different pitches have different focus offsets, the difference between linewidths of said gratings provides a calibration curve which is a measure of focus. The method for monitoring focus is performing an EUV exposure using a focus position with a pre-determined focus position as calibrated using the linewidth difference between the two gratings.
    Type: Grant
    Filed: February 12, 2015
    Date of Patent: March 7, 2017
    Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Timothy Allan Brunner, Martin Burkhardt
  • Patent number: 9588441
    Abstract: A method and apparatus for process control in the processing of a substrate is disclosed in the present invention. Embodiments of the present invention utilize a first analysis tool to determine changes in a substrate's geometry. The substrate geometry data is used to generate sampling plan that will be used to check areas of the substrate that are likely to have errors after processing. The sampling plan is fed forwards to a second analysis tool that samples the substrate after it has been processed. It is emphasized that this abstract is provided to comply with the rules requiring an abstract that will allow a searcher or other reader to quickly ascertain the subject matter of the technical disclosure. It is submitted with the understanding that it will not be used to interpret or limit the scope or meaning of the claims.
    Type: Grant
    Filed: May 18, 2012
    Date of Patent: March 7, 2017
    Assignee: KLA-TENCOR CORPORATION
    Inventors: Craig W. MacNaughton, Jaydeep K. Sinha
  • Patent number: 9588442
    Abstract: A lithographic projection apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a liquid supply system configured to provide liquid to a space between the projection system and the substrate; and a shutter configured to isolate the space from the substrate or a space to be occupied by a substrate.
    Type: Grant
    Filed: May 27, 2016
    Date of Patent: March 7, 2017
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Christiaan Alexander Hoogendam, Antonius Theodorus Anna Maria Derksen, Sjoerd Nicolaas Lambertus Donders, Joeri Lof, Erik Roelof Loopstra, Johannes Catharinus Hubertus Mulkens, Hans Jansen, Jacobus Johannus Leonardus Hendricus Verspay, Alexander Straaijer, Bob Streefkerk
  • Patent number: 9588443
    Abstract: A carrier apparatus positions a chuck member above a wafer mounted on a fine movement stage, relatively moves the chuck member and the fine movement stage in a vertical direction, makes the chuck member approach a position which is a predetermined distance away from the upper surface of the wafer, makes the chuck member hold the wafer from above in a non-contact manner, and makes the chuck member holding the wafer and the fine movement stage move apart within a predetermined plane after making the chuck member holding the wafer and the fine movement stage move apart in the vertical direction. Further, the carrier apparatus loads the wafer held in a non-contact manner from above by the chuck member on the fine movement stage.
    Type: Grant
    Filed: December 23, 2014
    Date of Patent: March 7, 2017
    Assignee: NIKON CORPORATION
    Inventor: Yuichi Shibazaki
  • Patent number: 9588444
    Abstract: A balance mass system shared by a workpiece stage and a mask stage includes a balance mass and an anti-drift and compensation apparatus (16). The balance mass includes a first part (11) for mounting thereon a workpiece stage system, a second part (20) for mounting thereon a mask stage system, and a third part (14) for interconnecting the first part (11) and the second part (20). The first part (11) of the balance mass is floatingly supported on a base frame (1) of a lithography machine, and the third part (14) of the balance mass is in connection with the base frame (1) via the anti-drift and compensation apparatus (16). The anti-drift and compensation apparatus (16) is disposed in proximity to the center of gravity of the balance mass as a whole.
    Type: Grant
    Filed: September 23, 2013
    Date of Patent: March 7, 2017
    Assignee: SHANGHAI MICRO ELECTRONICS EQUIPMENT CO., LTD.
    Inventor: Tianming Wang
  • Patent number: 9588445
    Abstract: A projection objective of a microlithographic projection exposure apparatus contains a plurality of optical elements arranged in N>?2 successive sections A1 to AN of the projection objective which are separated from one another by pupil planes or intermediate image planes. According to the invention, in order to correct a wavefront deformation, at least two optical elements each have an optically active surface locally reprocessed aspherically. A first optical element is in this case arranged in one section Aj, j=1 . . . N and a second optical element is arranged in another section Ak, k=1 . . . N, the magnitude difference |k?j| being an odd number.
    Type: Grant
    Filed: January 28, 2016
    Date of Patent: March 7, 2017
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Norbert Wabra, Robert Eder
  • Patent number: 9588446
    Abstract: A calibration apparatus is provided. The calibration apparatus includes a wafer carrier configured to support a substrate with a patterned layer. The patterned layer includes a first exposure area and remaining exposure areas, and each of the first and the remaining exposure areas includes a first checking mark. The calibration apparatus also includes a measurement device configured to obtain a first exposure value of the first checking mark of the first exposure area by measuring the first checking mark of the first exposure area. The calibration apparatus also includes a processing module configured to calculate first calculated values of the first checking marks of the remaining exposure areas according to the first exposure value and a standard file. The illumination device is adjusted by an adjustment device of the lithography apparatus according to the first calculated values during a lithography process.
    Type: Grant
    Filed: May 29, 2015
    Date of Patent: March 7, 2017
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Chen-Yen Huang, Ai-Jen Hung, Shin-Rung Lu, Yen-Di Tsen
  • Patent number: 9588447
    Abstract: A surface layer of the electrophotographic photosensitive member has a change region in which a ratio of the number of carbon atoms with respect to the sum of the number of silicon atoms and the number of carbon atoms gradually increases toward a surface side of the electrophotographic photosensitive member from a photoconductive layer side, wherein the change region has an upper charge injection prohibiting portion containing a Group 13 atom, and a surface-side portion which is positioned closer to the surface side of the electrophotographic photosensitive member than the upper charge injection prohibiting portion and does not contain the Group 13 atom, and the distribution of the Group 13 atom in a boundary portion between the surface-side portion and the upper charge injection prohibiting portion is precipitous.
    Type: Grant
    Filed: June 15, 2015
    Date of Patent: March 7, 2017
    Assignee: CANON KABUSHIKI KAISHA
    Inventors: Toshiyasu Shirasuna, Yuu Nishimura
  • Patent number: 9588448
    Abstract: An electrophotographic photosensitive member includes an undercoat layer containing a resin and a metal oxide particle whose surface has been treated with a compound represented by formula (1), and the resin is a polymerized product of a composition containing a compound having a group represented by formula (2) and a polyol.
    Type: Grant
    Filed: July 2, 2015
    Date of Patent: March 7, 2017
    Assignee: Canon Kabushiki Kaisha
    Inventors: Kazumichi Sugiyama, Daisuke Tanaka, Takeshi Murakami, Daisuke Kawaguchi
  • Patent number: 9588449
    Abstract: There is provided a method for electrostatic printing comprising providing a print substrate having a layer comprising a polymeric material, the layer comprising a polymeric material having thereon a surface layer comprising an aminofunctional silane; carrying out an electrostatic printing process to transfer an ink onto the surface layer comprising the aminofunctional silane. Also disclosed herein are print substrates producible by the method, and print substrates for use in the method.
    Type: Grant
    Filed: February 15, 2012
    Date of Patent: March 7, 2017
    Assignee: Hewlett-Packard Indigo B.V.
    Inventors: Hannoch Ron, Inna Tzomik, Shani Maor, Eran Goldenberg
  • Patent number: 9588450
    Abstract: Provided is a magnetic toner in which enhancement of initial transfer efficiency and transfer efficiency that is stable during a long-term use are achieved by simultaneously suppressing the friction force between the toner and a drum and the cohesion between toners, and further the degradation in chargeability and fluidity caused by the deterioration of the toner. The magnetic toner includes: a magnetic toner particle; a first external additive; and a second external additive. The first external additive includes an organic-inorganic composite fine particle, a plurality of convexes derived from an inorganic fine particle being present on a surface of the organic-inorganic composite fine particle, and has a number-average particle diameter of 50 nm or more and 500 nm or less. The second external additive includes a silica fine particle and has a number-average particle diameter of 5 nm or more and 30 nm or less. A shear load calculated from a rotation torque is 0.50 kPa or more and 2.
    Type: Grant
    Filed: July 30, 2014
    Date of Patent: March 7, 2017
    Assignee: CANON KABUSHIKI KAISHA
    Inventors: Shohei Tsuda, Koji Nishikawa, Katsuhisa Yamazaki, Yojiro Hotta, Kazuo Terauchi, Motohide Shiozawa, Takeshi Naka, Takuya Mizuguchi, Takayuki Itakura
  • Patent number: 9588451
    Abstract: A toner, wherein an amount of Al detected in the toner is 0.7% to 1.3%, where the amount of Al detected is determined based on quantitative analysis of Al by X-ray photoelectron spectroscopic analysis (XPS), and wherein [Tg2nd (THF insoluble matter)] is ?40° C. to 30° C., where the [Tg2nd (THF insoluble matter)] is a glass transition temperature measured in second heating of differential scanning calorimetry (DSC) of THF insoluble matter of the toner.
    Type: Grant
    Filed: April 27, 2015
    Date of Patent: March 7, 2017
    Assignee: Ricoh Company, Ltd.
    Inventors: Akihiro Takeyama, Shinya Nakayama, Akinori Saitoh, Shinsuke Nagai, Hiroyuki Takeda
  • Patent number: 9588452
    Abstract: The toner according to the present invention comprises a matrix phase composed of a vinyl resin, and domain phases composed of a non-crystalline polyester resin dispersed in the matrix phase, and a number-average domain diameter of the domain phases composed of the non-crystalline polyester resin is 30 to 150 nm. The toner satisfies relation represented by a specific requirement of the total area of the domain phases present in a surface layer area of the toner particle, and the total area of the domain phases present in areas other than the surface layer area, in a given cross-section of the toner particle.
    Type: Grant
    Filed: September 4, 2015
    Date of Patent: March 7, 2017
    Assignee: KONICA MINOLTA, INC.
    Inventors: Tatsuya Fujisaki, Junya Onishi, Naoya Tonegawa, Shiro Hirano, Hidehito Haruki, Tatsuya Nagase
  • Patent number: 9588453
    Abstract: There is provided a resin-filled ferrite carrier for an electrophotographic developer, in which a void of a porous ferrite particle used as a ferrite carrier core material is filled with silicone resin, wherein a true specific gravity (Y) of the porous ferrite particle filled with the silicone resin and a Si/Fe value (X) measured by fluorescent X-ray elemental analysis satisfy the following inequality (1): ?350X?Y?4.83??100X??(1).
    Type: Grant
    Filed: March 30, 2015
    Date of Patent: March 7, 2017
    Assignee: POWDERTECH CO., LTD.
    Inventors: Hiroki Sawamoto, Takao Sugiura
  • Patent number: 9588454
    Abstract: A rubber foam tube (5) is produced by extruding a rubber composition into a tubular body (4) and feeding the tubular body (4) in an elongated state without cutting to pass the tubular body (4) through a microwave crosslinking device (8) and then through a hot air crosslinking device (9) for continuously foaming and crosslinking the rubber composition. At this time, a ratio V2/V1 between a speed V2 at which the tubular body (4) passes through the hot air crosslinking device (9) and a speed V1 at which the tubular body (4) passes through the microwave crosslinking device (8) is not less than 1.0 and not greater than 1.6.
    Type: Grant
    Filed: November 26, 2013
    Date of Patent: March 7, 2017
    Assignee: SUMITOMO RUBBER INDUSTRIES, LTD.
    Inventors: Takuya Yamaguchi, Shunichi Yabushita, Yusuke Tanio
  • Patent number: 9588455
    Abstract: An image forming apparatus includes exposing units, a photoconductor, developing units, a processor, and a memory storing instructions. Each exposing unit includes light emitting elements arranged in a main scanning direction and divided into blocks each illuminating at a corresponding light emitting time point. The instructions cause the image forming apparatus to: change a light emitting time point for one of two blocks contained in respective two exposing units at the same position in the main scanning direction, to reduce an image distance in a sub-scanning direction between two images each to be formed by illumination of at least one light emitting element contained in a corresponding one of the two blocks; illuminate the light emitting elements of each of the exposing units at light emitting time points including the light emitting time point obtained by the change; and develop electrostatic latent images formed on the photoconductor.
    Type: Grant
    Filed: January 28, 2015
    Date of Patent: March 7, 2017
    Assignee: BROTHER KOGYO KABUSHIKI KAISHA
    Inventor: Junichi Yokoi
  • Patent number: 9588456
    Abstract: At image formation time, when the light amount setting value used in the image formation is equal to or larger than the light amount value Xm affected by the stray light, a corrected signal width Tw corresponding to the light amount setting value used in the image formation is calculated from the increase ratio ?n of the signal width tn of a detection signal acquired in a region having a light amount value smaller than the light amount value Xm affected by the stray light; and a synchronization signal is generated on the basis of a center position of the corrected signal width Tw.
    Type: Grant
    Filed: February 3, 2016
    Date of Patent: March 7, 2017
    Assignee: CANON KABUSHIKI KAISHA
    Inventor: Kenji Nemoto