Abstract: The present invention relates to a liquid crystal display panel and a display device. The liquid crystal display panel comprises a first substrate and a second substrate assembled in an aligned manner, and further comprises a reflecting layer, a light wavelength conversion layer and a quantum dot layer; the reflecting layer is provided on the second substrate, the quantum dot layer is provided on the first substrate or the second substrate, and the reflecting layer and the quantum dot layer are arranged in a direction from the second substrate to the first substrate; the light wavelength conversion layer is made from an upconversion material and provided between the reflecting layer and the quantum dot layer. The above liquid crystal display panel has a higher utilization of ambient light, and thus has higher brightness and contrast ratio.

Abstract: In an FFS liquid crystal display device, viewing angle characteristics are further improved. In an FFS liquid crystal display device, the alignment axis of a first alignment film of a first substrate and the alignment axis of a second alignment film of a second substrate are directed in the same direction. At least two of an upper polarizer, a lower polarizer, or a retardation plate 160 satisfy conditions below. (1) The absorption axis of the upper polarizer forms an angle of one to 45 degrees inclusive with the alignment axis. (2) The absorption axis of the lower polarizer forms an angle of 91 to 135 degrees inclusive or forms an angle of 45 to 89 degrees inclusive with the alignment axis. (3) The extension axis of the retardation plate 160 forms an angle of one to 45 degrees inclusive with the alignment axis.

Abstract: A display panel and a display apparatus are disclosed, the display panel including: a first substrate; a second substrate arranged to face the first substrate; a liquid crystal layer interposed between the first and second substrates; and a retardation compensation layer including a grid pattern which is provided on one or more of the first and second substrates, and is configured to compensate for optical anisotropy of the liquid crystal layer and includes a first parameter in a first direction and a second parameter in a second direction perpendicular to the first direction. A structure for compensation for optical retardation is provided within the display panel to replace a conventional viewing angle compensation film, and thus the panel manufacturing process is shortened and a cost reduction is achieved.

Abstract: The present invention provides a liquid crystal display device with reduced power consumption as well as reduced flicker. The liquid crystal display device is one in a transverse electric field mode, including: paired substrates; a photo-alignment film disposed on at least one of the substrates; a horizontal alignment liquid crystal layer disposed between the substrates; and pixels arranged in a matrix form, the liquid crystal layer containing liquid crystal molecules with a bicyclohexyl skeleton and liquid crystal molecules with a difluorobenzene skeleton, the liquid crystal layer having negative anisotropy of dielectric constant, one of the substrates including TFTs disposed in the respective pixels, the TFTs each including a semiconductor layer that contains an oxide semiconductor, the liquid crystal display device having a frame rate of lower than 50 Hz.

Abstract: A manufacturing method for a polymer stabilized vertical alignment (PS-VA) liquid crystal panel includes: forming a first substrate of PS-VA liquid crystal panel, the first substrate including a common electrode; forming a second substrate of the PS-VA liquid crystal panel, the second substrate including a pixel electrode; forming a liquid crystal layer between the first and second substrates, the liquid crystal layer containing negative liquid crystal molecules and ultraviolet-curable resin; applying an electrical voltage that exceeds a rotation threshold of the liquid crystal layer to the common electrode and the pixel electrode; and reciprocally moving an ultraviolet light source, which is composed of at least two ultraviolet light sources that are distributed parallel to each other in a first direction and respectively extend in a second direction, in such a direction as to have accumulation of ultraviolet light received by the ultraviolet-curable resin of the liquid crystal layer homogenized.

Abstract: According to one embodiment, a liquid crystal display device includes a first substrate including a first alignment film, a second substrate including a second alignment film opposed to the first alignment film, and a liquid crystal layer held in a cell gap between the first substrate and the second substrate. The liquid crystal layer is formed of a liquid crystal material having a viscosity of 20 mPa*s or more under a condition of 65° C. The cell gap is greater than or equal to 2.3 ?m and smaller than or equal to 3.3 ?m.

Abstract: The object can be achieved by the following structure. A material whose value of fracture toughness is greater than or equal to 1.5 [MPa·m1/2] is used for a base substrate and a counter substrate which hold a liquid crystal material therebetween; a first sealant containing liquid crystal contaminants at less than or equal to 1×10?4 wt % is provided so as be in contact with the liquid crystal material and to surround the liquid crystal material seamlessly; the second sealant is provided to surround the first sealant; and the base substrate and the counter substrate which hold the liquid crystal material therebetween using the first sealant and the second sealant are bonded with a bond strength of greater than or equal to 1 [N/mm2].

Abstract: A pixel structure having a substrate, an insulating layer and a pixel electrode is disclosed. The pixel electrode has first sub-electrodes and second sub-electrodes. The first sub-electrodes are arranged on a first region of the insulating layer and spaced apart from each other, and the second sub-electrodes are continuously disposed on a second region of the insulating layer. The first region is a flat region of the insulating layer, and the second region is a grooved region of the insulating layer.

Abstract: A display device according to an exemplary embodiment of the present inventive concept includes: a first insulation substrate; a thin film transistor; a pixel electrode; a second insulation substrate; and a common electrode. The pixel electrode includes a first subpixel electrode including a first horizontal stem portion and a first vertical stem portion perpendicular thereto at one end of the first horizontal stem portion and a second subpixel electrode including a second vertical stem portion and a second horizontal stem portion perpendicular thereto at one end of the second horizontal stem portion, a plurality of regions in which arrangements of liquid crystal molecules are respectively different are divided by the first horizontal stem portion, the first vertical stem portion, the second horizontal stem portion, and the second vertical stem portion, and each of the plurality of regions has a longest vertical length of less than about 100 ?m.

Abstract: A display device may include a common electrode, a first pixel electrode, a second pixel electrode, an insulation layer, and a liquid crystal layer. The first pixel electrode overlaps the common electrode. The second pixel electrode is electrically connected to the first pixel electrode and is positioned between the first pixel electrode and the common electrode. A first portion of the second pixel electrode does not overlap the first pixel electrode in a direction perpendicular to the common electrode. A second portion of the second pixel electrode overlaps a first portion of the first pixel electrode. A second portion of the first pixel electrode does not overlap the second pixel electrode in the direction perpendicular to the common electrode. The insulating layer is positioned between the first pixel electrode and the second pixel electrode. The liquid crystal layer is positioned between the common electrode and the second pixel electrode.

Abstract: A liquid crystal display includes a first substrate, a gate line disposed on the first substrate and extending parallel to a major horizontal reference line of the display, and a plurality of pixel unit cells disposed on and tesslating a display area of the first substrate where each unit cell includes a first field generating electrode and a second field generating electrode with an insulating layer interposed therebetween, wherein a first one of the first and second field generating electrodes has a plurality of cutouts defined therein for producing corresponding liquid crystal domains, the plurality of cutouts each including a first inclined edge portion forming a first angle with the vertical reference line and a second inclined edge portion forming a second angle with the vertical reference line that is different from the first angle, wherein a ratio of a length of the first inclined edge portion to a length of the cutout is about 80% or more, and the density of the plurality of pixels is about 200 PPI o

Abstract: A pixel structure of display panel includes a first substrate, a second substrate, a liquid crystal layer, a first pixel electrode, a patterned insulation layer, a second pixel electrode and a common electrode. The first substrate has a plurality of alignment regions. The second substrate and the first substrate are disposed opposite to each other. The first pixel electrode is a full-surfaced electrode, which includes a plurality of branch electrodes disposed in the alignment regions. The patterned insulation layer is disposed between the first pixel electrode and the liquid crystal layer. The second pixel electrode is disposed in at least one boundary of each of the alignment regions. The common electrode is disposed on the second substrate.

Abstract: An array substrate and a manufacturing method thereof, a display panel and a display device are provided. The array substrate includes a base substrate, a plurality of pixel units arranged in a matrix and a plurality of common electrode lines extending along the column direction on the base substrate. There are two scanning signal lines between two adjacent rows of pixel units, and pixel units in a (2N+1)-th column and a (2N+2)-th column are taken as one pixel unit group, N being selected from integers greater than or equal to zero. The respective common electrode lines are located between two adjacent pixel unit groups.

Abstract: An array circuit board 11B includes a glass substrate, an IC chip 20, two ACFs 30, and a resin film 32. The IC chip 20 is disposed on the glass substrate. The ACFs 30 are disposed between the glass substrate and the IC chip 20 for electrically connecting the glass substrate and the IC chip 20 together. The ACFs 30 are separated from each other. The resin film 32 is made of resin material having cure shrinkage smaller than the ACFs 30 and disposed to fill a gap between the ACFs 30 adjacent to each other between the glass substrate and the IC chip 20.

Abstract: To improve the reliability of a display device. The display device includes a display portion, an input unit, and a lead-out wiring portion which connects the display portion and the input unit to each other. In addition, the input unit includes a first terminal group in which a plurality of first terminals are arranged. In addition, the lead-out wiring portion includes a plurality of first lead-out wirings connected to the plurality of first terminals. In addition, a first end-portion wiring, which is formed in an end portion of an array, among the plurality of first lead-out wirings, includes a first main line which extends along an extending direction of a neighboring first lead-out wiring, a first bypass line which extends along the first main line, and a first branch portion and a second branch portion which connect the first main line and the first bypass line to each other.

Abstract: The present disclosure provides an array substrate, a display device, a method for maintenance and a method for manufacturing the array substrate. The array substrate includes a base substrate and a plurality of signal lines arranged on the base substrate.

Abstract: An LCD panel and an LCD device are provided. The LCD panel includes a first substrate, which includes a first metal layer, a first insulating layer, an active layer, a second metal layer, a second insulating layer, a color barrier layer, a first transparent conductive layer, a planarization layer, and a second transparent conductive layer electrically connected with the first transparent conductive layer sequentially formed. The first metal layer includes scanning lines. Black matrices are arranged on positions corresponding to scanning lines and corresponding to channels.

Abstract: The present invention provides a liquid crystal display device which can be miniaturized while preventing display defects such as flicker. The present invention relates to a liquid crystal display device including a wiring connected to an electrode to supply a common signal. The electrode includes a first electrode portion formed in a transparent conductive layer. The wiring is formed outside a display region and includes at least one of the first wiring portion and a second wiring portion and a third wiring portion facing the at least one of the first wiring portion and the second wiring portion. The first wiring portion, the second wiring portion, and the third wiring portion are respectively formed in a first conductive layer, a second conductive layer, and a third conductive layer.

Abstract: A display device including a substrate, a gate line, a data line, a plurality of thin film transistors, a first pixel electrode, and a second pixel electrode. The gate line is disposed on the substrate. The data line is disposed on the substrate. The data line includes a first branch line and a second branch line. The first branch line and the second branch line form a closed loop. The plurality of thin film transistors is connected to the data line. The first pixel electrode is connected to at least one of the plurality of thin film transistors. The second pixel electrode is connected to at least another one of the plurality of thin film transisters. The first pixel electrode and the second pixel electrode are arranged in a substantially diagonal direction with respect to each another. The first branch line is connected to a source electrode of said at least one of the plurality of thin film transistors.

Abstract: According to one embodiment, a liquid crystal device includes a first substrate including a first electrode and a second electrode opposed to the first electrode, a second substrate opposed to the first substrate, and a liquid crystal layer including liquid crystal molecules held between the first substrate and the second substrate, wherein the second electrode is positioned closer to the liquid crystal layer than is the first electrode and has a polygonal-shaped first opening including at least one projection, and the liquid crystal layer indicates transparency when no voltage is applied thereto and indicates scattering when a voltage is applied thereto.

Abstract: Disclosed are a transflective liquid crystal display device and a driving method thereof. The transflective liquid crystal display device includes: a first surface electrode (103), a first pixel electrode (107), a second surface electrode (113) and a second pixel electrode (112) located in transmissive regions (A); the first surface electrode (103) and first pixel electrode (107) are located between a first substrate (102) and a liquid crystal layer (110), the second surface electrodes (113) and the second pixel electrodes (112) are located between a second substrate (104) and the liquid crystal layer (110). The device further includes: a third surface electrode (104), a reflection layer (105) and a third pixel electrode (108) located in reflective regions (B); the third surface electrode (104), the reflection layer (105) and the third pixel electrode (108) are located between the first substrate (102) and the liquid crystal layer (110).

Abstract: Methods of manufacturing electrochromic windows are described. Insulated glass units (IGU's) are protected, e.g. during handling and shipping, by a protective bumper. The bumper can be custom made using IGU dimension data received from the IGU fabrication tool. The bumper may be made of environmentally friendly materials. Laser isolation configurations and related methods of patterning and/or configuring an electrochromic device on a substrate are described. Edge deletion is used to ensure a good seal between spacer and glass in an IGU and thus better protection of an electrochromic device sealed in the IGU. Configurations for protecting the electrochromic device edge in the primary seal and maximizing viewable area in an electrochromic pane of an IGU are also described.

Abstract: There is provided a light control element including a transparent conductive film, a proton accumulation layer on the transparent conductive film, an inorganic electrolyte layer on the proton accumulation layer, an organic electrolyte layer on the inorganic electrolyte layer, a catalyst layer on the organic electrolyte layer, and a light control mirror layer on the catalyst layer.

Abstract: A composite particle is provided that includes a base particle and a plurality of hydrophilic oligomeric groups extending from an exterior portion of the base particle, the base particle including a cross-linked polyurea and at least one of a pigment and a dye. The cross-linked polyurea may form a network throughout the base particle. A method of making the composite particle includes providing either a solution containing a dye or a dispersion containing a pigment in a water-dispersible polyfunctional isocyanate dissolved in a water-miscible solvent, forming an emulsion of the solution/dispersion in water, agitating the emulsion while the polyfunctional isocyanate is converted into a cross-linked polyurea, and separating the composite particle containing the cross-linked polyurea and the dye/pigment from the emulsion.

Abstract: A shake correction apparatus includes: a stationary portion (21) having coils (22S, 22L, 23S, 23L, 24S, 24L) arranged; a movable portion including magnets (52a, 52b, 52c, 52d, 53a, 53b, 53c, 53d, 54a, 54b, 54c, 54d) opposed to the coils and an imaging element; a supporting member for movably supporting the movable portion to the stationary portion along a plane orthogonal to an optical axis of light entering into the imaging element; means for detecting a position of the movable portion; and means for controlling current flowed into the coils based on output of the detection means, the coils including at least three coil pairs when two coils opposed to each other along the plane orthogonal to the optical axis are paired, driving forces of two coils forming each coil pair being different.

Abstract: A shutter device includes: a substrate having an opening; a first light-shielding member that moves from a first position outside the opening of the substrate to a second position outside the opening to shield the opening, the second position being different from the first position; a second light-shielding member that partly shields the opening while moving from the first position to the second position; a first moving member that has a protrusion moving along a hole provided in the substrate to move the first light-shielding member; a second moving member that is coupled to the second light-shielding member and moves together with the second light-shielding member; and a third moving member, located outside a movement range of the protrusion during the second light-shielding member being located in the first position, that is coupled to the second light-shielding member and moves together with the second light-shielding member.

Abstract: A camera is configured for use with a removable camera lens cover, which can be secured to or removed from the camera by a user without the use of a tool set. The mechanism which allows the lens cover to be secured to and removed from the camera includes a set of wires embedded into the lens cover and a set of wedges protruding from the lens wall of the camera. To secure the lens cover to the camera, the lens cover is placed onto the front of the camera and rotated until the wires align with corresponding wedges, securing the wires underneath the tapered surface of the wedges. To remove the lens cover from the camera, a force is applied outward and normal to the lens cover, causing the wires to flex outward and enabling the rotation and removal of the lens cover from the camera.

Abstract: An image pickup apparatus includes a circuit board, a solid-state image sensing device disposed on an upper surface of the circuit board, a cylindrical lens barrel disposed above the circuit board, a lens housed in the lens barrel, and a holding member that holds the lens barrel and the circuit board therein. The solid-state image sensing device is positioned in an enclosed space formed by the lens barrel and the circuit board. The lens barrel has a first flange portion protruding in a direction perpendicular to a central axis of the lens barrel. The holding member has a first fitting groove portion in which the first flange portion of the lens barrel is fit. A thermal expansion coefficient of the holding member is smaller than a thermal expansion coefficient of the lens barrel.

Abstract: A telescopic limiting structure includes a first retractable member including a first inclined face and a second retractable member including a second inclined face bearing against the first inclined face. The first retractable member is configured to move along a first direction. The first inclined face and the second inclined face are configured to drive the second retractable member to move along a second direction in response to the first retractable member moving along the first direction. The second direction is different from the first direction.

Abstract: A photo shooting support device or selfie device, includes a telescopic stick and a clamping device for holding and clamping a camera device. The clamping device includes a carrier and a stretchable clamping mechanism arranged above the carrier. The clamping device is pivotally or rotatably connected to the top end of the telescopic stick. A notch is arranged on the carrier. The middle portion of the clamping mechanism is provided with a bending portion corresponding to the notch. The telescopic stick can be accommodated in the notch and the bending portion after folding. The clamping device is always rotatably connected to the top end of the telescopic stick; so it does not require temporary assembly for use, bringing great convenience to users; and after use, the telescopic stick can be directly received in the notch of the carrier and the bending portion of the clamping mechanism, so it saves space and is easy to carry.

Abstract: An image pickup apparatus includes a main mirror holder rotating between a mirror down position in an image pickup optical path and a mirror up position outside the image pickup optical path in accordance with drive of a mirror driving unit, which drives in accordance with rotation of a motor, a sub mirror holder being supported by the main mirror holder to abut against the main mirror holder positioned at the mirror up position, and a driving pin rotating in accordance with the drive of the mirror driving unit and rotating the main and sub mirror holders. The driving pin includes an abutting part that abuts against the mirror driving unit while the mirror driving unit drives. The abutting part is provided with a reduction structure to reduce a bound of the sub mirror holder when the main mirror holder reaches the mirror up position.

Abstract: A head-up display device with dust cover, which includes a base, a display module, a reflective module, an anti-dust cover and an electric drive module, wherein the anti-dust cover at least includes a first cover body and a second cover body, the electric drive module is provided to flip the second cover body, so that the first cover body and the second cover body may be driven to cover an opening of the base, to thereby prevent dust from falling inside the base when a user wipes dust off, to achieve anti-dust purpose and ensure smooth operation.

Abstract: A cooling structure includes a phosphor unit, air-blowing systems that cause cooling air to flow, and a duct structure. The phosphor unit includes a substrate and a phosphor that is formed on the substrate and that emits fluorescent light when irradiated with excitation light. The duct structure guides the cooling air blown from the air-blowing systems to the phosphor unit.

Abstract: A multi-layer display screen capable of being tiled without a visible gap between tiled screens and methods of using said device are described herein. In one embodiment, a system includes a light generator configured to produce light and a multi-layer screen with a plurality of layers. The multi-layer screen can be configured to permit the light from the light generator to propagate therethrough. The plurality of layers can include an opaque region layer having a plurality of opaque regions and a first layer comprising one or more abutted layers disposed within a common plane, the abutted layers spaced apart by a gap, wherein the gap is coincident with the opaque region.

Abstract: A method includes receiving a layout of an integrated circuit (IC) device, the layout having an outer boundary and an inner boundary thereby defining a first region between the outer boundary and the inner boundary and placing a first plurality of dummy patterns in the first region, wherein the first plurality of dummy patterns is lithographically printable. The method further includes performing an Optical Proximity Correction (OPC) process, the first plurality of dummy patterns being position within the first region in such a way that prevents sub-resolution assist features from being inserted into the first region by the OPC process.

Abstract: A lithography mask includes a substrate, a reflective multilayer (ML) on the substrate, and a barrier layer on the reflective ML. The barrier layer includes at least one material selected from the group consisting of ruthenium nitride, hafnium oxide, aluminum nitride, boron carbide, boron nitride, and a combination thereof.

Abstract: Aspects of the present invention relate to a test photomask and a method for evaluating critical dimension changes in the test photomask. Various embodiments include a test photomask. The test photomask includes a plurality of cells having a varied density pattern. The plurality of cells include a first group of cells arranged along a first line, the first group of cells having a first combined density ratio. The plurality of cells also include a second group of cells arranged along a second line, the second group of cells having a second combined density ratio. In the plurality of cells, the second combined density ratio for the second group of cells is equal to the first combined density ratio of the first group of cells. The varied density pattern is configured to substantially neutralize fogging effects.

Abstract: A reticle including a mask and an edge cover may be provided. The mask may include a mask substrate and mask patterns on the mask substrate. The edge cover may be coupled to an edge of the mask substrate and may include a floating cover part. The floating cover part may be spaced apart from the mask patterns while extending from a sidewall of the mask substrate over the mask patterns.

Abstract: A resist composition includes (A1) a resin which includes a structural unit represented by formula (a4), a structural unit having a cyclic carbonate and a structural unit represented by formula (I), the resin has no acid-labile group; (A2) a resin which has an acid-labile group; and an acid generator: wherein R3 represents a hydrogen atom or a methyl group, R4 represents a C1 to C24 saturated hydrocarbon group having a fluorine atom, and a methylene group contained in the saturated hydrocarbon group may be replaced by an oxygen atom or a carbonyl group, R1 represents a hydrogen atom or a methyl group, and L1 represents a single bond or a C1 to C18 divalent saturated hydrocarbon group where a methylene group may be replaced by an oxygen atom or a carbonyl group, and R2 represents a C3 to C18 alicyclic hydrocarbon group where a hydrogen atom may be replaced by a C1 to C8 aliphatic hydrocarbon group or a hydroxy group, provided that the carbon atom directly bonded to L1 has no aliphatic hydrocarbon group by

Abstract: Provided are an active-light-sensitive or radiation-sensitive resin composition having high depth of focus and excellent resolving power; a pattern forming method using the composition; and a method for manufacturing an electronic device.

Abstract: A vacuum-integrated metal oxide-containing hardmask formation process and related vacuum-integrated hardware that combine steps of film formation by vapor deposition and optical lithography results in direct photopatterning of metal oxide-containing hardmasks at substantially reduced cost relative to current approaches.

Abstract: In order to reduce the negative influence of reactive hydrogen on the lifetime of a reflective optical element, particularly inside an EUV lithography device, there is proposed for the extreme ultraviolet and soft X-ray wavelength region a reflective optical element (50) having a reflective surface (60) with a multilayer system (51) and in the case of which the reflective surface (60) has a protective layer system (59) with an uppermost layer (56) composed of silicon carbide or ruthenium, the protective layer system (59) having a thickness of between 5 nm and 25 nm.

Abstract: Methods disclosed herein provide apparatus and methods for applying an electric field and/or a magnetic field to a photoresist layer without air gap intervention during photolithography processes. In one embodiment, an apparatus includes a processing chamber configured to apply an electric field to a substrate via a non-gas phase intermediate medium. Methods described herein include dissociation of a photoacid generator to generate anions and cations. The anions may be moved within the photoresist layer by the electric field to more precisely control the speed and location of acid generation and regeneration processes.

Abstract: Provided are a polymer used for a manufacturing process of a semiconductor and a display, a resist underlayer film composition containing the polymer for a manufacturing process of a semiconductor and a display, and a method for manufacturing semiconductor device using the composition, and more specifically, the polymer of the present disclosure simultaneously has optimized etching selectivity, planarization characteristic, and excellent thermal resistance, such that the resist underlayer film composition containing the polymer is usable as a hard mask for a multilayer semiconductor lithography process.

Abstract: Provided are methods of trimming photoresist patterns. The methods involve coating a photoresist trimming composition over a photoresist pattern, wherein the trimming composition includes a matrix polymer, a free acid having fluorine substitution and a solvent, the trimming composition being free of cross-linking agents. The coated semiconductor substrate is heated to cause a change in polarity of the resist polymer in a surface region of the photoresist pattern. The photoresist pattern is contacted with a developing solution to remove the surface region of the photoresist pattern. The methods find particular applicability in the formation of very fine lithographic features in the manufacture of semiconductor devices.

Abstract: An extreme ultraviolet (EUV) exposure system capable of improving the yield of an EUV exposure process by improving EUV exposure performance, and furthermore, capable of increasing throughput or productivity of the EUV exposure process, the EUV exposure system including an EUV exposure apparatus configured to perform EUV exposure on a wafer disposed on a chuck table, a load-lock chamber combined with the EUV exposure apparatus and configured to supply and discharge the wafer to/from the EUV exposure apparatus, and an ultraviolet (UV) exposure apparatus configured to perform UV exposure by irradiating an entire upper surface of the wafer with a UV light without using a mask.

Abstract: An illumination optical assembly for projection lithography serves for illuminating an object field, in which an object to be imaged is arrangeable. The object field has a scan length along an object displacement direction. The illumination optical assembly has two facet mirrors for the reflective guidance of illumination light towards the object field. Second facets of the second facet mirror serve for guiding a respective illumination light partial beam into the object field. The second facet mirror is a pupil distance from a pupil plane of the illumination optical assembly that is closest adjacent to the second facet mirror. The second facets are arranged in a grid, wherein at least one grid constant of the grid is predefined by the pupil distance and by the scan length. This results in an illumination optical assembly which achieves an illumination of predefined pupil sections that is relatively homogeneous.

Abstract: A method provides an integrated circuit (IC) substrate having first and second alignment marks defined in a first pattern layer, and third and fourth alignment marks defined in a second pattern layer. The first and second alignment marks are illuminated, through a photomask, with a first light to determine a first layer alignment error including a first alignment error and a second alignment error. The first alignment error has more weight than the second alignment error in determining the first layer alignment error. The third and fourth alignment marks are illuminated with a second light to determine a second layer alignment error including a third alignment error in relation to the third alignment mark and a fourth alignment error in relation to the fourth alignment mark. The third alignment error has more weight than the fourth alignment error in determining the second layer alignment error.

Abstract: A facet mirror is to be used as a bundle-guiding optical component in a projection exposure apparatus for microlithography. The facet mirror has a plurality of separate mirrors. For individual deflection of incident illumination light, the separate mirrors are in each case connected to an actuator in such a way that they are separately tiltable about at least one tilt axis. A control device, which is connected to the actuators, is configured in such a way that a given grouping of the separate mirrors can be grouped into separate mirror groups that include in each case at least two separate mirrors. The result is a facet mirror which, when installed in the projection exposure apparatus, increases the variability for setting various illumination geometries of an object field to be illuminated by the projection exposure apparatus. Various embodiments of separate mirrors for forming the facet mirrors are described.

Abstract: An extreme ultraviolet lithography (EUVL) system is disclosed. The system includes an extreme ultraviolet (EUV) mask with three states having respective reflection coefficient is r1, r2 and r3, wherein r3 is a pre-specified value that is a function of r1 and r2. The system also includes a nearly on-axis illumination (ONI) with partial coherence ? less than 0.3 to expose the EUV mask to produce diffracted light and non-diffracted light. The system further includes a projection optics box (PUB) to remove a portion of the non-diffracted light and to collect and direct the diffracted light and the remaining non-diffracted light to expose a target.