Abstract: A method of making an aluminum alloy containing zirconium includes heating a first composition comprising aluminum to a first temperature of greater than or equal to about 580° C. to less than or equal to about 800° C. The method further includes adding a second composition including a copper-zirconium compound to the first composition to form a third composition. The copper-zirconium compound of the second composition has a molar composition of greater than or equal to about 41% zirconium to less than or equal to about 67% zirconium and a balance of copper. The method also includes solidifying the third composition at a cooling rate of greater than or equal to about 0.1° C./second to less than or equal to about 100° C./second to a second temperature less than or equal to a solidus temperature and decomposing the copper-zirconium compound at a third temperature of less than or equal to about 715° C.

Abstract: A method of making an aluminum alloy containing zirconium includes heating a first composition including aluminum to a first temperature. The first temperature is greater than or equal to a liquidus temperature of the first composition. The method further includes adding a second composition including a copper-zirconium compound to the first composition. The method further includes decomposing at least a portion of the copper-zirconium compound into copper and zirconium. The method further includes forming a third composition by dissolving at least some of the copper from the decomposing in the aluminum of the first composition. The method further includes cooling the third composition to a second temperature to form a first solid material. The second temperature is less than or equal to a solidus temperature of the third composition. The method further includes heat treating the first solid material to form the aluminum alloy containing zirconium.

Abstract: A method of forming a sintered nickel-titanium-rare earth (Ni—Ti-RE) alloy includes adding one or more powders comprising Ni, Ti, and a rare earth constituent to a powder consolidation unit comprising an electrically conductive die and punch connectable to a power supply. The one or more powders are heated at a ramp rate of about 35° C./min or less to a sintering temperature, and pressure is applied to the powders at the sintering temperature, thereby forming a sintered Ni—Ti-RE alloy.

Abstract: Provided herein are anodized quality AA5xxx series aluminum alloys and methods for making the aluminum alloys. Also described herein are products prepared from the anodized quality AA5xxx series aluminum alloy sheets. Such products include consumer electronic parts, consumer electronic product parts, architectural sheet products, architectural sheet product parts, and automobile body parts.

Abstract: An object of the present invention is to provide a Mg alloy that exhibits a superelastic effect and a shape memory effect, and is excellent in cold workability. The Mg alloy is prepared so as to have a composition in which Sc is contained in a content of more than 13 at % and 30 at % or less, and the balance is Mg and inevitable impurities. In addition, the alloy may contain, in addition to the above-described composition, at least one or more additive elements selected from Li, Al, Zn, Y, Ag, In, Sn and Bi, in a total content of 0.001 at % or more and 9 at % or less in relation to the amount of the whole alloy defined to be 100 at %.

Abstract: The invention relates to a copper-nickel-zinc alloy with the following composition in weight percentages: 46.0 to 51.0% Cu, 8.0 to 11.0% Ni, 0.2 to 0.6% Mn, 0.05 to 0.5% Si, up to 0.8% of each of Fe and/or Co, the sum of the Fe content and double the Co content equaling at least 0.1 wt. %, residual Zn, and unavoidable impurities, wherein nickel-, iron-, and manganese-containing and/or nickel-, cobalt-, and manganese-containing mixed silicides are embedded into a microstructure consisting of ?- and ?-phases as spherical or ellipsoidal particles. The invention further relates to uses of a copper-nickel-zinc alloy according to the invention.

Abstract: There is a hot-rolled steel according to one aspect of the invention including predetermined chemical compositions including 0.0001 to 0.0050 mass % of Bi, in which 90 area % or more of a metallographic structure is configured with a ferrite and a pearlite, and an average number density of Mn sulfides extending along a rolling direction and having an aspect ratio exceeding 10 and equal to or smaller than 30, which is measured on a cross section parallel to the rolling direction, is 50 to 200 number/mm2.

Abstract: There is provided a hot forging steel including, by mass %, C: more than 0.30% and less than 0.60%, Si: 0.10% to 0.90%, Mn: 0.50% to 2.00%, S: 0.010% to 0.100%, Cr: 0.01% to 1.00%, Al: more than 0.005% and 0.100% or less, N: 0.0030% to 0.0200%, Bi: more than 0.0001% and 0.0050% or less, Ti: 0% or more and less than 0.040%, V: 0% to 0.30%, Ca: 0% to 0.0040%, Pb: 0% to 0.40%, and a remainder including Fe and impurities, in which P and O in the impurities are respectively P: 0.050% or less and O: 0.0050% or less, an expression d+3?<20 is satisfied, and a presence density of MnS having an equivalent circle diameter of smaller than 2.0 ?m is 300 pieces/mm2 or more in a cross section parallel to a rolling direction of a steel.

Abstract: There is provided a steel for machine structural use including, as a chemical composition, by mass %, C: 0.40% to 0.70%, Si: 0.15% to 3.00%, Mn: 0.30% to 2.00%, Cr: 0.01% or more and less than 0.50%, S: 0.003% to 0.070%, Bi: more than 0.0001% and 0.0050% or less, N: 0.0030% to 0.0075%, Al: 0.003% to 0.100%, and P: 0.050% or less; and as necessary, B, Mo, Ni, Cu, Ca, Mg, Zr, Rem, Ti, Nb, V, Sb, Te, and Pb, a remainder including Fe and impurities, in which Expressions 290×C+50×Si+430?620 and d+3?<20 are satisfied, and a presence density of MnS having an equivalent circle diameter of smaller than 2.0 ?m is 300 pieces/mm2 or more in a cross section parallel to a longitudinal direction.

Abstract: A method for manufacturing a part including steps of (1) casting an ingot, (2) scalping the ingot to yield a scalped ingot, (3) homogenizing the scalped ingot to yield a homogenized ingot, (4) breakdown of the homogenized ingot to yield a slab, (5) rolling the slab to yield a rolled aluminum material, (6) annealing the rolled aluminum material to yield an aluminum starting material, (7) cold working the aluminum starting material to obtain an aluminum cold worked material, and (8) forming the part from the aluminum cold worked material.

Abstract: An aluminum alloy including aluminum, about 1.8 to about 5.6 percent by weight copper, about 0.6 to about 2.6 percent by weight lithium, and at least one of lanthanum up to about 1.5 percent by weight, strontium up to about 1.5 percent by weight, cerium up to about 1.5 percent by weight and praseodymium up to about 1.5 percent by weight.

Abstract: A copper alloy material has a composition including: 0.1 mass % or more and 1.5 mass % or less of Cr; 0.05 mass % or more and 0.25 mass % or less of Zr; 0.005 mass % or more and 0.10 mass % or less of P; and a Cu balance including inevitable impurities. The copper alloy material includes a Cr—Zr—P compound containing Cr, Zr and P and an area ratio of the Cr—Zr—P compound is in a range of 0.5% or more and 5.0% or less in a structure observation, and the Cr—Zr—P compound is in a form of a needle shape or a granular shape and a length a longest side of the needle shape or the granular shape is 100 ?m or less.

Abstract: A corrosion resistant copper tube which can exhibit a further improved resistance to ant nest corrosion, and which is suitably usable as a heat transfer tube and refrigerant tube in air-conditioning equipment and refrigerating equipment. The copper tube is formed of a copper material consisting of 0.15-0.6% by weight of phosphorus and the balance being copper and impurities, and has electric conductivity (Y1 or Y2: % IACS) which satisfies 50-75X?Y1?60-75X in the case where the tube includes a recrystallized structure, or 47-75X?Y2?57-75X in the case where the tube includes a deformation structure, wherein X (% by weight) represents a content of phosphorus.

Abstract: Titanium alloys formed into a part or component used in applications where a key design criterion is the energy absorbed during deformation of the part when exposed to impact, explosive blast, and/or other forms of shock loading is described. The titanium alloys generally comprise a titanium base with added amounts of aluminum, an isomorphous beta stabilizing element such as vanadium, a eutectoid beta stabilizing element such as silicon and iron, and incidental impurities. The titanium alloys exhibit up to 70% or more improvement in ductility and up to a 16% improvement in ballistic impact resistance over a Ti-6Al-4V alloy, as well as absorbing up to 50% more energy than the Ti-6Al-4V alloy in Charpy impact tests. A method of forming a part that incorporates the titanium alloys and uses a combination of recycled materials and new materials is also described.

Abstract: An installation for continuous hot-dip coating of a metal strip is provided. The installation includes a tank containing a bath of molten metal, a metal strip running through the bath and a confined wiping device. The confined wiping device includes at least two wiping nozzles placed on each side of a path of the strip after the strip has left the bath of molten metal. Each nozzle has at least one gas outlet orifice and an upper face. The confined wiping device also includes a confinement box adjacent each upper face. The confinement boxes are open on a face which faces the strip. Each box includes at least one upper part and two lateral parts.

Abstract: The present disclosure relates to a shadow mask assembly including a shadow mask film and a frame. The frame includes an outer wall, an inner wall arranged opposite to the outer wall, and a bonding surface connecting the outer wall and the inner wall, wherein the bonding surface bonds with the shadow mask film. The bonding surface includes a welding area and a tiling area, wherein the welding area and the tiling area are non-coplanar. The welding area is arranged between the tiling area and the outer wall. The frame is fixed on at least one edge of the shadow mask film via at least one solder joint arranged within the welding area. The tiling area is arranged between the welding area and the inner wall, and the tiling area is configured to support the shadow mask film and to maintain the shadow mask film to be a flat surface.

Abstract: The disclosure provides a mask assembly comprising a mask which comprises a first surface facing towards an evaporation source and a second surface facing towards an article to be deposited, and pattern openings are formed in the mask, wherein the mask assembly further comprises at least one test sheet which is detachably provided on the mask. The test sheet is provided at a region on the mask where no pattern opening is provided, and is configured such that an evaporation material can be deposited on the test sheet when an evaporation process is performed by using the mask assembly. The disclosure further provides an apparatus and a method for detecting a film thickness of the evaporation material on the mask assembly. With the apparatus, the film thickness of the evaporation material deposited on the mask assembly can be easily detected.

Abstract: The present invention provides a stacked body including a germanium layer, an organic material layer, a zinc compound layer, and the like, thereby exhibiting a specific color and glossiness, transmitting electromagnetic waves, and having excellent water resistance, and more particularly, a stacked body including a substrate and a deposition layer formed on the substrate, wherein the deposition layer includes the organic material layer made of an organic material, the zinc compound layer made of zinc sulfide (ZnS) or zinc selenium (ZnSe), and the germanium layer made of germanium (Ge) or a germanium alloy.

Abstract: A method of manufacturing indium tin oxide includes sputtering indium and tin from a target onto a substrate, the sputtering including moving the target along a path over the substrate. The indium tin oxide may have a sheet resistance less than 0.5 ?/?. An indium film includes: a first moving target sputtered indium tin oxide layer; a second moving target sputtered indium tin oxide layer on the first moving target sputtered indium tin oxide layer; and a third moving target sputtered indium tin oxide layer on the second moving target sputtered indium tin oxide layer. A transparency includes the indium tin oxide, and a flying vehicle includes the transparency.

Abstract: The present invention provides a transparent conductive thin film which is flexible for suiting substantially all kinds of electronic and optoelectronic devices or display panel. The present conductive thin film includes at least one transparent substrate, a deformable layer and a conductive network pattern having a high aspect ratio such that at least one surface of the conductive network being exposed out of the deformable layer or the transparent substrate for contacting with an external structure while a large proportion thereof stays firmly integrated into the substrate. The present invention also relates to methods of fabricating a transparent conductive thin film including the structural features of the transparent conductive thin film of the present invention. Various optimizations of the present methods are also provided in the present invention for facilitating large area thin film fabrication and large scale production.

Abstract: A method for manufacturing a coated non-metal substrate, in particular a plastic substrate, or manufacturing a coated metal substrate, involves applying at least one metal layer using an application system, treating the metal layer with at least one organosilicon compound, in particular using plasma polymerization, such that a polysiloxane layer is formed, plasma processing using a plasma generator and/or corona treatment of the polysiloxane layer, and applying an overcoat, in particular a transparent one, to the treated polysiloxane layer. Further disclosed is a non-metal substrate or a metal substrate that is obtained according to the disclosed method, as well as an application system for applying a metal layer and a method of using the disclosed substrates.

Abstract: Methods and apparatus for reducing defects in a workpiece are provided herein. In some embodiments, a sputter deposition target is provided for reducing defects in a workpiece, the target comprising a dielectric compound having a predefined average grain size ranging from approximately 20 ?m to 200 ?m. In other embodiments, a process chamber is provided, the process chamber comprising a chamber body defining an interior volume, a substrate support to support a substrate within the interior volume, a plurality of targets to be sputtered onto the substrate including at least one dielectric target, wherein the dielectric target comprises a dielectric compound having a predefined average grain size ranging from approximately 20 ?m to 200 ?m and a shield rotatably coupled to an upper portion of the chamber body and having at least one hole to expose at least one of the plurality of targets to be sputtered.

Abstract: A coating for protecting a base material, such as a process chamber component, from an excess material film resulting from operation of a process chamber. The coating including a sheet for receiving the excess material deposited during the operation. In some aspects the sheet may be structured to provide at least one of stress relief and defect prevention in the deposited excess material. The sheet structure may include at least one of folds, ribs, and bi-facial curves in the sheet. In an aspect, the sheet may be patterned to provide improved adhesion of the deposited excess material. A plurality of joints for securing the at least one sheet at joint locations to the base material. In some aspects, a method and system are provided for protecting process chamber components.

Abstract: A storage device includes: a sidewall formed in a cylindrical shape; a cover wall disposed at an upper end of the sidewall; a bottom wall connected to a lower end of the sidewall and comprising a mounting surface mountable on a weight detector; a storage chamber surrounded by the sidewall, the cover wall, and the bottom wall; a recess communicating with the storage chamber and provided at the bottom wall; a communication pipe having one end connected to a bottom portion of the recess in a direction of gravity and the other end extending in a direction different from the direction of gravity in the bottom wall, the communication pipe having a diameter smaller than that of the recess; a gas flow path provided at a wall other than the bottom wall; and a liquid discharge path connected to a downstream side of the communication pipe.

Abstract: Metal complexes containing one or more amidoimine ligands, methods of making such metal complexes, and methods of using such metal complexes to prepare metal-containing films are provided.

Abstract: Metal coordination complexes comprising an iridium atom coordinated to at least one diazabutadiene based ligand having a structure represented by: where R1 and R4 are independently selected from the group consisting of C1-C4 alkyl and amino groups, and each of R2 and R3 are independently selected from the group consisting of H, C1-C3 alkyl, or amino groups are described. Processing methods using the metal coordination complexes are also described.

Abstract: Provided are methods for the deposition of films comprising SiCN. Certain methods involve exposing a substrate surface to a silicon precursor, wherein the silicon precursor is halogenated with Cl, Br or I, and the silicon precursor comprises a halogenated silane, a halogenated carbosilane, an halogenated aminosilane or a halogenated carbo-sillyl amine. Then, the substrate surface can be exposed to a nitrogen-containing plasma or a nitrogen precursor and densification plasma.

Abstract: Apparatus is described for coating of three dimensional objects such as glass jars or bottles, during a continuous manufacturing process, by Chemical Vapour Deposition (CVD). The objects pass through tunnel having one or more vertical arrays of nozzles located in the sidewalls. The nozzles deliver CVD precursors and, being independently variable, allow for variation of the precursor concentration along the height of the object. Thus, the thickness of the resultant coating may be so varied. Preferred embodiments include corresponding exhaust arrays, aligned with the nozzles and one or more air curtains which isolate the interior of the tunnel from the external environment.

Abstract: A vapor phase growth apparatus has a reaction chamber to form a film on an upper surface of a substrate by a vapor growth reaction, a gas supplier to supply a gas to the reaction chamber, a heater to heat the substrate from a back side of the substrate, and a controller to control an output of the heater. The controller has an electrical characteristics measuring instrument which measures electrical characteristics of the heater at predetermined time intervals and detects a variation value of the electrical characteristics between a newly value and previous value, and a threshold determiner which extracts a maximum value and a minimum value of a predetermined number of detected variation values and newly variation value of the electrical characteristics, calculates differences between the maximum value and the minimum value at the predetermined time intervals, and determines whether the difference exceeds a predetermined threshold.

Abstract: A fabrication method for two-dimensional materials of the present invention includes the following steps: forming a thin film having at least one two-dimensional element on a substrate; forming at least one capping layer on the thin film; annealing the thin film to form a two-dimensional material film after the capping layer is formed.

Abstract: In an activated gas generation apparatus, metal electrodes are formed on a bottom surface of a dielectric electrode, and are disposed so as to face each other with a central region of the dielectric electrode interposed therebetween in plan view. The metal electrodes face each other along the Y direction. A wedge-shaped stepped part is provided so as to protrude upward in the central region on an upper surface of the dielectric electrode. The wedge-shaped stepped part is formed so as to have a shorter formation width in the Y direction as approaching each of a plurality of gas spray holes in plan view.

Abstract: A continuous deposition device comprises a first fixing chamber having a first fixing unit disposed therein; a first pump coupled with the first fixing chamber to adjust the pressure in the first fixing chamber; a second fixing chamber having a second fixing unit disposed therein, wherein ends of a roll material are fix on the first fixing unit and second fixing unit respectively; a second pump coupled with the second fixing chamber to adjust the pressure in the second fixing chamber; and a plurality of reaction chambers connected with each other, wherein the upstream of the reaction chambers couples with the first fixing chamber and the downstream of the reaction chambers couples with the second fixing chamber. The roll material passes through the reaction chambers. The reaction chambers respectively provide reactants to deposit on the roll material. The present invention also provides a method of continuous deposition.

Abstract: A method for manufacturing a discharge surface treatment electrode includes: a first laying of laying powder particles to form a first powder layer; and a first binding of binding some of the powder particles in the first powder layer to each other. The method further includes: a second laying of further laying the powder particles on the first powder layer in which some of the powder particles are bound to each other to form a second powder layer; and a second binding of binding some of the powder particles in the second powder layer to each other to form a stacked body of granulated particles. A region having a different porosity from another region is formed inside the stacked body.

Abstract: The invention relates to compositions, methods and preparation of such compositions to protect metals from corrosion, especially acid corrosion. The compositions of this invention may be added to acids to protect metals from their corrosive influence, particularly at elevated temperatures. These compositions are of particular utility in the oil and gas (petroleum) industry. Also disclosed are “corrosion inhibition intensifiers” to enhance the corrosion inhibition properties of other corrosion inhibitors. Formulations which control ferric ions in acidic solutions are also disclosed. These may be combined with inhibited acids and some compositions provide both corrosion inhibition and ferric ion control.

Abstract: A method for the electrochemical production silicon comprises applying an electrical potential across an anode and a cathode to provide electrons at the cathode. The anode and the cathode are in contact with an electrolyte melt at a reaction temperature. The electrolyte melt comprises a molten salt or a mixture of molten salts; a silicon-containing precursor at least partially dissolved in the electrolyte melt to provide soluble silicon-containing ions in the electrolyte melt; and a supporting electrolyte at least partially dissolved in the electrolyte melt to provide O2? ions in the electrolyte melt. The soluble silicon-containing ions at the cathode undergo reduction reactions with the electrons to release O2? ions and deposit silicon on the cathode.

Abstract: A system for generating a chlorine-containing mixture comprises an anodic chamber comprising an anodic electrode and having an inlet for a first solution and an outlet for an anolyte solution. A cathodic chamber is spaced from and adjacent the anodic chamber in the system. The cathodic chamber comprises a cathodic electrode and has an inlet for a second solution and an outlet for a catholyte solution. The second solution may be the same as or different from the first solution, and at least one of the first and second solutions comprises a chlorinated solution. A membrane is disposed between and separates the anodic chamber and the cathodic chamber. The system further comprises a dilution chamber having an inlet for an aqueous solution and an outlet. Finally, the system comprises a mixing chamber, which has an outlet for the chlorine-containing mixture. The outlet of the dilution chamber is in fluid communication with the mixing chamber.

Abstract: A CO2 reduction system has a cathode in contact with a catholyte. The cathode includes a selectivity-determining layer on an electron conductor. The selectivity-determining layer includes a selectivity-determining component that includes a substituted heterocycle.

Abstract: An electrolysis system includes a power generator configured to output a first direct current power; a plurality of DC-DC converters respectively configured to convert the first direct current power into a second direct current power and output voltage information and current information of the second direct current power; a plurality of electrolyzers respectively configured to receive the second direct current power output from a DC-DC converter and generate gas; a control circuit configured to output control information that maximizes the first direct current power based on a voltage value and a current value of the first direct current power; and a processor configured to output the target current value and a selection signal indicating whether or not to select each of the plurality of electrolyzers to each of the plurality of respective DC-DC converters, based on the control information, the voltage information and the current information.

Abstract: Methods of electroplating metal on a substrate while controlling azimuthal uniformity, include, in one aspect, providing the substrate to the electroplating apparatus configured for rotating the substrate during electroplating, and electroplating the metal on the substrate while rotating the substrate relative to a shield such that a selected portion of the substrate at a selected azimuthal position dwells in a shielded area for a different amount of time than a second portion of the substrate having the same average arc length and the same average radial position and residing at a different angular (azimuthal) position. The shield is positioned in close proximity of the substrate (e.g., within a distance that is equal to 0.1 of the substrate's radius). The shield in some embodiments may be an ionically resistive ionically permeable element having an azimuthally asymmetric distribution of channels.

Abstract: A manufacturing method of a tool surface mark includes a first cleaning step, a first electroplating step, a second cleaning step, a drying step, a printing step, a cation removal step, and a second electroplating step. In the first electroplating step, the surface of the tool is electroplated, and a first protective layer is formed on the surface of the tool. In the cation removal step, the tool is placed into an electrolyte and then electrically connected to an anode, the anode is electrically energized, and metal cations on the surface of the tool and on the printing pattern are dissolved. In the second electroplating step, the surface of the tool is electroplate at potions without the printing pattern to form a second protective layer. The yield of the printing pattern increases and the printing pattern does not easy peel off.

Abstract: A manufacturing method of a tool surface mark includes a first cleaning step, a first electroplating step, an ionized water cleaning step, a drying step, a printing step, a second cleaning step and a second electroplating step. In the first electroplating step, the surface of the tool is electroplated to form a first protective layer on the surface of the tool. In the ionized water cleaning step, ionized water is sprayed on the surface of the tool and the ions in the ionic water are adhered to the pores of the first protective layer to form an ion-protective coating. In the second electroplating step, the surface of the tool is electroplated with nickel so that a second protective layer is formed on the surface of the tool. The ion-protective coating can enhance the adhesion of the printing pattern and make it difficult for the printing pattern to fall off.

Abstract: Disclosed is a method for the plasma-electrolytic deposition of a titanium-based non-metallic protective coating on an aluminum-containing material that exhibits excellent resistance to corrosion and high resistance against wear; a coated aluminum-containing metallic article, wherein the coating comprised of oxides and hydroxides of the elements titanium and aluminum has a thickness of at least 15 microns and a cross-section hardness (HV) of at least 800; and a device comprising an arrangement of two adjacent parts at least one being selected from an aluminum-containing metallic material that is coated according to the method and in frictional connection with the other part wherein under operation the frictionally connected parts move relatively to each other, such as, pistons moving in the cylinder within the powertrain of a vehicle.

Abstract: The agitation of the plating solution may result in spattering of the plating solution. It have been found that the spattered plating solution can be attached even to portions that are not originally brought into contact with the plating solution in the plating apparatus. There is provided an electroplating apparatus for plating a substrate using a substrate holder, the electroplating apparatus comprising at least one bath for storing the substrate, the substrate holder being provided with a hanger shoulder, and a holder contact, and wherein the electroplating apparatus being provided with a cleaning/drying part provided on at least one side of the bath, the cleaning/drying part being provided for cleaning and/or drying at least one of the hanger shoulder, the holder contact and a contact provided to the bath.

Abstract: The method for improvement of Nitinol fatigue fracture resistance may be accomplished by electropolishing or magnetoelectropolishing under oxygen evolution regime, and by anodizing or magnetoanodizing the intermetallic compound. All four processes are performed under an oxygen evolution regime and by these processes the outermost and subsequent underlying oxide layers are enriched with oxygen which saturates, fills oxygen vacancies and bridges surface oxide lattice defects making the passive oxide layer more stoichiometric and homogenous, elastic and, as a result of the oxygen enrichment, more fatigue fracture resistant.

Abstract: A multi-step Q-passivation method for stainless steel is described. The method includes a first high voltage electropolishing step followed by as separate low voltage chromium enhancement step. The method can also include a vacuum heat treatment step that utilizes a cyclic ramp-up period so as to maintain a relatively low pressure and low temperature throughout the step. The method can also include a controlled oxidation step during which the surface is contacted with an oxygen/inert gas mixture at low oxygen partial pressure.

Abstract: Methods for growing single crystal ingots doped with volatile dopants and ingots grown according to the methods are described herein.

Abstract: In a gallium nitride crystal, a nanovoid density in the crystal is less than 1×105 [cm?2]. A crystal growth apparatus is an apparatus for manufacturing a gallium nitride crystal, wherein a member having a B concentration of less than 1 ppm at least at a surface part is used as a member used at a part where a temperature is 500° C. or higher (high-temperature member) among members exposed to a crystal growth space. When such a crystal growth apparatus is used, a gallium nitride crystal wherein a nanovoid density in the crystal is less than 1×105 [cm?2] is obtained.

Abstract: The present invention provides an elastic fiber dry spinning component and spinning part. The spinning component includes: a temperature control box (3) including a box body (31), wherein the box body (31) is longitudinally provided with multiple polymer solution channels (32) separated from each other; areas in the box body (31) other than the polymer solution channels (32) are cavities, and the cavities are used for circulation of a fluid medium that exchanges heat with an elastic fiber dry spinning polymer solution in the polymer solution channels (32); and a spinneret part (4) detachably connected to the temperature control box (3), wherein the spinneret part (4) includes multiple spinneret orifice sets (41) separated from each other, and the multiple spinneret orifice sets (41) are correspondingly in communication with outlets of the multiple polymer solution channels (32).

Abstract: The invention provides a system and process for manufacturing nanofibers that integrate a post-drawing process in a continuous electro spinning manufacturing process. In certain embodiments, the system and process are capable of post-drawing multiple individual electrospun nanofibers simultaneously. In certain embodiments, the system can be configured and controlled to accommodate various materials that can be electrospun.

Abstract: A method for forming porous fibers is provided. The fibers are formed from a thermoplastic composition containing a continuous phase, which includes a matrix polymer, and a nanoinclusion additive that is at least partially incompatible with the matrix polymer so that it becomes dispersed within the continuous phase as discrete nano-scale phase domains. The method generally includes traversing a bundle of the fibers over one or more draw bars that are in contact with a fluidic medium (e.g., water). In certain embodiments, for example, the draw bar(s) are submerged in the fluidic medium. The fluidic medium is lower than the melting temperature of the matrix polymer.