Patents Issued in November 6, 2018
-
Patent number: 10120245Abstract: In order to increase the transmittance around a pixel and to increase the brightness of the screen in an IPS mode liquid crystal display device, a pixel electrode with a slit is formed on a common electrode through an interlayer insulating film. An opening is formed in the common electrode on the outside of the end portion of the pixel electrode as seen in a plane view. Because of the presence of the opening, the electric field lines from the end portion of the pixel electrode reach the layer above the liquid crystal layer and reach further away from the end portion of the pixel electrode, so that it is possible to increase the control ability to the liquid crystal around the pixel. As a result, the pixel transmittance can be increased as a whole and the brightness of the screen can be increased.Type: GrantFiled: November 11, 2016Date of Patent: November 6, 2018Assignee: Japan Display Inc.Inventors: Takeyuki Tsuruma, Hidemasa Yamaguchi
-
Patent number: 10120246Abstract: The present invention provides a manufacturing method of an IPS array substrate and an IPS array substrate.Type: GrantFiled: December 15, 2016Date of Patent: November 6, 2018Assignee: SHENZHEN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD.Inventors: Zhichao Zhou, Hui Xia
-
Patent number: 10120247Abstract: The invention provides an array substrate and a manufacturing method thereof. The array substrate comprises a substrate body, a common electrode, a light shield layer, an insulating layer, a polycrystalline silicon layer, a gate insulating layer, a gate electrode, a medium layer and a source-drain electrode. The array substrate is characterized in that the common electrode is formed on the substrate body, the light shield layer is positioned on the common electrode, the insulating layer is positioned on the light shield layer and the common electrode, and the gate electrode is connected with the common electrode through a through hole.Type: GrantFiled: April 21, 2016Date of Patent: November 6, 2018Assignee: SHENZHEN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD.Inventor: Shimin Ge
-
Patent number: 10120248Abstract: In the present liquid crystal display device, a conventional first auxiliary capacitance trunk line 430 is formed to be narrow, and a second auxiliary capacitance trunk line 440 is additionally provided and disposed at the closest position to the periphery of a substrate. Thus, a shift register can be distanced from the periphery of the substrate without increasing a frame area as a whole, so that the shift register is not overlaid with a seal material. Moreover, the extent of an area overlaid with a seal material within a wiring area for providing signals to the shift register can be reduced.Type: GrantFiled: January 6, 2016Date of Patent: November 6, 2018Assignee: SHARP KABUSHIKI KAISHAInventors: Masahiro Yoshida, Isao Ogasawara, Satoshi Horiuchi, Takaharu Yamada
-
Patent number: 10120249Abstract: The present application discloses an array substrate, a liquid crystal display panel and a liquid crystal display device; a metal layer is designed to be added between the pixel electrode and the common electrode. The metal layer can form a first storage capacitor with the pixel electrode and formed a second storage capacitor with the common electrode, such as the dual storage capacitors to enlarge the storage capacitor to improve the flicker caused by TFT leakage, ensure the display effect, and the two storage capacitor are overlapped set, the aperture ratio of the pixel is not reduced.Type: GrantFiled: July 7, 2016Date of Patent: November 6, 2018Assignee: Wuhan China Star Optoelectronics Technology Co., LtdInventor: Liang Ma
-
Patent number: 10120250Abstract: A liquid crystal device serves as an electro-optical device and includes, on a base member of an element substrate, a first shield layer disposed between a gate electrode and a drain electrode of a TFT, and a second shield layer provided between the drain electrode and a data line serving as a signal line. A first holding capacitor is configured by part of the drain electrode, the first dielectric layer, and the second shield layer.Type: GrantFiled: September 1, 2017Date of Patent: November 6, 2018Assignee: SEIKO EPSON CORPORATIONInventors: Shotaro Izawa, Satoshi Ito
-
Patent number: 10120251Abstract: Provided is a liquid crystal display device including: gate lines formed in a first direction on a second transparent substrate; data lines formed in a second direction; first transparent common electrodes; a protective insulating film; transparent pixel electrodes arranged in the first direction and the second direction and formed so as to be opposed to the first transparent common electrodes on a surface of the protective insulating film; thin film transistors connected to the transparent pixel electrodes; a second transparent common electrode formed on the surface of the protective insulating film; and a liquid crystal layer formed on the protective insulating film, the transparent pixel electrodes, and the second transparent common electrode. The second transparent common electrode covers the gate lines and the data lines through intermediation of the protective insulating film.Type: GrantFiled: March 5, 2014Date of Patent: November 6, 2018Assignee: Panasonic Liquid Crystal Display Co., Ltd.Inventor: Kikuo Ono
-
Patent number: 10120252Abstract: An array substrate and a manufacturing method thereof are disclosed. The array substrate includes: a glass substrate; a gate electrode; a first insulating layer; a semiconductor layer; a planarization layer mounted on the first insulating layer; a source electrode and a drain electrode; a pixel electrode layer mounted on the planarization layer and the drain electrode; a second insulating layer mounted on the planarization layer, the semiconductor layer, the source electrode and the drain electrode. The array substrate can prevent bubbles from forming at through holes and thereby increasing aperture ratio. The planarization layer further increases distances between the source electrode, the drain electrode and the gate electrode, which enhances antistatic ability.Type: GrantFiled: April 28, 2016Date of Patent: November 6, 2018Assignee: SHENZHEN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD.Inventors: Hui Xia, Tienchun Huang
-
Patent number: 10120253Abstract: A display device is provided with a pixel and a dummy pixel including a gate line and a signal line. The dummy pixel includes the gate line and a dummy semiconductor layer crossing the gate line through an insulating layer. The dummy semiconductor layer is electrically separated from the dummy semiconductor layer of the dummy pixel adjacent in the Y direction dummy pixel. The dummy pixel further includes a dummy signal line extending in the Y direction. The dummy signal line is connected to the dummy semiconductor layer through a plurality of contact holes. The contact holes are arranged with the gate line interposed between them in plan view.Type: GrantFiled: December 7, 2017Date of Patent: November 6, 2018Assignee: Japan Display Inc.Inventors: Motoharu Miyamoto, Teppei Yamada, Yasuhiro Kanaya
-
Patent number: 10120254Abstract: A liquid crystal display includes a first substrate and a second substrate facing each other. The liquid crystal display further includes a gate line and a data line disposed on the first substrate, a first thin film transistor and a second thin film transistor connected to the gate line and the data line, a first subpixel electrode connected to the first thin film transistor, a third thin film transistor connected to the second thin film transistor, a second subpixel electrode connected to the third thin film transistor; and a liquid crystal layer interposed between the first substrate and the second substrate. The third thin film transistor includes a first terminal applied with a same constant voltage during all times of operation, a second terminal directly connected to the second thin film transistor, and a third terminal connected to the second subpixel electrode.Type: GrantFiled: November 6, 2015Date of Patent: November 6, 2018Assignee: SAMSUNG DISPLAY CO., LTD.Inventors: Hoon Kim, Hyun Joon Kim, Ki Chul Shin
-
Patent number: 10120255Abstract: A display panel is disclosed, which includes: a first substrate; plural scan lines disposed on the first substrate and extending along a first direction; plural data lines disposed on the first substrate and extending along a second direction, wherein at least one pixel region is defined by the scan lines and the data lines, and the first direction and the second direction are different; a common electrode disposed in the pixel region; and a metal line electrically connecting to the common electrode and extending along the first direction, wherein the metal line has a first portion overlapping the common electrode and a second portion overlapping one of the data lines; wherein the first portion has a first maximum width along the second direction, the second portion has a second maximum with along the second direction, and the first maximum width is greater than the second maximum width.Type: GrantFiled: March 2, 2017Date of Patent: November 6, 2018Assignee: INNOLUX CORPORATIONInventors: Chien-Hung Chen, Hsia-Ching Chu, Ming-Chien Sun
-
Patent number: 10120256Abstract: Preparation method for a thin film transistor, preparation method for an array substrate, an array substrate, and a display apparatus are provided. The preparation method for a thin film transistor includes: forming, on a pattern of a semiconductor layer, a first photoresist pattern including a photoresist with two different thicknesses, and performing a heavily-doped ion implantation process on the pattern of the semiconductor layer by using the first photoresist pattern as a barrier mask; ashing the first photoresist pattern to remove the photoresist with a second thickness and to thin the photoresist with a first thickness, so as to form a second photoresist pattern; and performing a lightly-doped ion implantation process on the pattern of the semiconductor layer by using the second photoresist pattern as a barrier mask.Type: GrantFiled: December 31, 2015Date of Patent: November 6, 2018Assignees: BOE TECHNOLOGY GROUP CO., LTD., ORDOS YUANSHENG OPTOELECTRONICS CO., LTD.Inventors: Lulu Ye, Huafeng Liu, Jingping Lv, Lei Yang, Meng Yang, Kai Zhang, Chao Wang, Chaochao Sun, Shengwei Zhao
-
Patent number: 10120257Abstract: Disclosed herein is an electrochromic device including an active layer in which a catalyst facilitating oxidation-reduction reaction is homogeneously dispersed. The electrochromic device includes at least one active layer to reversibly exhibit a transparent state upon hydrogenation and a reflective state upon dehydrogenation, wherein the active layer includes a catalyst to facilitate a rate of reversible conversion between the transparent state and the reflective state.Type: GrantFiled: January 6, 2015Date of Patent: November 6, 2018Assignee: SAMSUNG ELECTRONICS CO., LTD.Inventors: Cho-Young Lee, Hye Jin Kim, Jun Sung Choi
-
Patent number: 10120258Abstract: Aspects of this disclosure concern controllers and control methods for applying a drive voltage to bus bars of optically switchable devices such as electrochromic devices. Such devices are often provided on windows such as architectural glass. In certain embodiments, the applied drive voltage is controlled in a manner that efficiently drives an optical transition over the entire surface of the electrochromic device. The drive voltage is controlled to account for differences in effective voltage experienced in regions between the bus bars and regions proximate the bus bars. Regions near the bus bars experience the highest effective voltage.Type: GrantFiled: June 28, 2016Date of Patent: November 6, 2018Assignee: View, Inc.Inventors: Gordon Jack, Anshu Pradhan
-
Patent number: 10120259Abstract: An apparatus for modulating a beam of light with balanced push-pull mechanism. The apparatus includes a first waveguide comprising a first PN junction on a substrate and a second waveguide comprising a second PN junction on the silicon-on-insulator substrate. The second PN junction is a replica of the first PN junction shifted with a distance. The apparatus further includes a first source electrode and a first ground electrode coupled respectively with the first PN junction and a second source electrode and a second ground electrode coupled respectively with the second PN junction. The apparatus additionally includes a third ground electrode disposed near the second PN junction at the distance away from the second ground electrode, wherein the first ground electrode, the second ground electrode, and the third ground electrode are commonly grounded to have both PN junctions subjected to a substantially same electric field varied in ground-source-ground pattern.Type: GrantFiled: November 14, 2017Date of Patent: November 6, 2018Assignee: INPHI CORPORATIONInventor: Masaki Kato
-
Patent number: 10120260Abstract: A viewing angle controlling light source device and a display apparatus are provided. The viewing angle controlling light source device includes a base substrate; a light emitting array arranged on the base substrate, wherein the light emitting array includes a plurality of light emitting units; at least one liquid crystal lens array arranged on the light emitting array, wherein the liquid crystal lens array includes a plurality of liquid crystal lens units corresponding to the light emitting units one by one, each liquid crystal lens unit includes a first electrode and a second electrode, and a liquid crystal layer arranged between the first electrode and the second electrode, a light emergent direction of light emitted by the light emitting unit after the light transmitting through the liquid crystal lens unit by regulating a voltage difference between the first electrode and the second electrode.Type: GrantFiled: November 17, 2016Date of Patent: November 6, 2018Assignees: BOE TECHNOLOGY GROUP CO., LTD., BEIJING BOE OPTOELECTRONICS TECHNOLOGY CO., LTD.Inventors: Chenru Wang, Xue Dong, Haiwei Sun, Ruijun Dong, Lu Yu, Lili Chen
-
Patent number: 10120261Abstract: The present subject matter includes apparatus and techniques that can be used to reduce losses in systems that perform steering of a light beam. Such steering can be performed in a non-mechanical manner, such as using an electrically-controlled optical structure (e.g., an electro-optical structure). For example, a waveguide can be used to adjust an angle of a light beam (e.g., steer the light beam). The waveguide can include a core, a cladding including an electro-optic material, and electrodes defining an arrangement that, when selectively energized, adjusts an index of refraction of the electro-optic material. In particular, electrode arrangements as described herein can be used to reduce losses, such as losses that would occur due to diffraction.Type: GrantFiled: April 5, 2017Date of Patent: November 6, 2018Assignee: Analog Devices, Inc.Inventors: Michael Ziemkiewicz, Scott Robert Davis, Michael Howard Anderson, Tyler Adam Dunn
-
Patent number: 10120262Abstract: A system includes a nonlinear crystal positioned such that a focus of a laser beam is outside the nonlinear crystal in at least one plane perpendicular to a beam propagation direction of the laser beam. The nonlinear crystal is disposed in a crystal mount assembly. A laser beam may be directed at the nonlinear crystal for wavelength conversion. The system may be used as a deep-UV wavelength converter.Type: GrantFiled: November 10, 2017Date of Patent: November 6, 2018Assignee: KLA-Tencor CorporationInventor: Dirk Woll
-
Patent number: 10120263Abstract: Systems and methods for plasmonics enhanced photomixing for generating continuous-wave (CW) frequency-tunable terahertz radiation in accordance with embodiments of the invention are disclosed. A photomixing system configured to generate continuous-wave terahertz frequency signals can include an optical pump configured to generate at least two beams, where the at least two beams are utilized to create a frequency-offset and operate below a 50% duty cycle, where the duty cycle includes an operation cycle and a sleep cycle. The photomixing system can also include a photomixer that includes a radiating element configured to receive the frequency-offset and to generate a terahertz radiation utilizing the received frequency-offset and the radiating element, where the radiating element includes at least one plasmonic contact electrode.Type: GrantFiled: June 12, 2015Date of Patent: November 6, 2018Assignee: The Regents of the University of CaliforniaInventor: Mona Jarrahi
-
Patent number: 10120264Abstract: A pumping beam L1 is caused to be incident on an end surface 4A of a nonlinear crystal 4, and a seed beam L2, the diameter of which is increased by a concave lens 6, is collected and adjusted into a collimated beam by a convex lens 7 and caused to be incident on the end surface 4A described above. The pumping beam L1 and the seed beam L2 are caused to be incident on the end surface 4A with the pumping beam L1 and the seed beam L2 superimposed on each other, whereby the nonlinear crystal 4 generates a terahertz wave TH.Type: GrantFiled: November 16, 2017Date of Patent: November 6, 2018Assignee: SHIBUYA CORPORATIONInventors: Toshiaki Naka, Motoi Sasaki, Akito Tsuchiya
-
Patent number: 10120265Abstract: A PhC all-optical multistep-delay OR-transformation logic gate includes an optical switch unit having a first intermediate-signal output port, a PhC structure unit having a first intermediate-signal input port connected with the first intermediate-signal output port, a reference-light source connected with the reference-light input port of the optical switch unit, a wave absorbing load, a flip-flop unit, and a memory or delayer having an input port connected with a first logic signal and an output port connected with the delay-signal input port of an optical switch unit whose logic-signal input port is connected with a second logic signal; a second intermediate-signal input port of the PhC structure unit is connected with the second intermediate-signal output port of said optical switch unit; a third intermediate-signal output port of the optical switch unit is connected with the wave absorbing load; a clock control-signal is input through the input port of a two-branch waveguide.Type: GrantFiled: June 19, 2017Date of Patent: November 6, 2018Inventor: Zhengbiao Ouyang
-
Patent number: 10120266Abstract: A thin flash module for a camera uses a flexible circuit as a support surface. A blue GaN-based flip chip LED die is mounted on the flex circuit. The LED die has a thick transparent substrate forming a “top” exit window so at least 40% of the light emitted from the die is side light. A phosphor layer conformally coats the die and a top surface of the flex circuit. A stamped reflector having a knife edge rectangular opening surrounds the die. Curved surfaces extending from the opening reflect the light from the side surfaces to form a generally rectangular beam. A generally rectangular lens is affixed to the top of the reflector. The lens has a generally rectangular convex surface extending toward the die, wherein a beam of light emitted from the lens has a generally rectangular shape corresponding to an aspect ratio of the camera's field of view.Type: GrantFiled: December 22, 2014Date of Patent: November 6, 2018Assignee: LUMILEDS LLCInventor: Mark Melvin Butterworth
-
Patent number: 10120267Abstract: A method of re-configuring a lighting arrangement (120-170) used to light a scene (100) which is to be captured by an image capture device (110), the method including the steps of: obtaining an initial image of the scene (100) using an initial configuration (190) of the lighting arrangement; developing an image content map identifying at least one scene characteristic of at least a part of the scene (100) captured in the initial image; determining a desired aesthetic effect for a further image to be captured based on the scene (100); in accordance with the at least one scene characteristic identified in the image content map, selecting from a plurality of aesthetic factors at least one aesthetic factor involving adjustment in order to achieve the determined desired aesthetic effect for the further image; and developing at least one lighting parameter for re-configuring the lighting arrangement (120-170), wherein the at least one lighting parameter corresponds with the at least one selected aesthetic factor.Type: GrantFiled: May 18, 2015Date of Patent: November 6, 2018Assignee: CANON KABUSHIKI KAISHAInventors: Nicolas Pierre Marie Frederic Bonnier, Geoffrey John Woolfe
-
Patent number: 10120268Abstract: An optical redirection adapter for an electronic device having a camera includes a housing and an optical element. The optical element is attached to the housing and positioned such that, when the adapter is attached the electronic device, the optical element is positioned in the camera's field of view. The optical element reflects light in the camera's field of view from a redirection angle that is offset from the camera's field of view. The optical redirection adapter facilitates ergonomically sound use of the camera.Type: GrantFiled: June 28, 2017Date of Patent: November 6, 2018Assignee: HAND HELD PRODUCTS, INC.Inventor: Donald Anderson
-
Patent number: 10120269Abstract: A projection apparatus includes a projection unit, a base and a pivoting member. The projection unit includes a light source, a light valve and a lens. The light source provides an illumination beam, the light valve converts the illumination beam into an image beam, and the lens projects the image beam. The base is connected to the projection unit and has at least one first stopping portion. The pivoting member is pivoted to the base and has at least one second stopping portion. The pivoting member is adapted to connect to an external power supply device, the base and the pivoting member are adapted to relatively rotate so as to adjust an angle of the projection image.Type: GrantFiled: September 1, 2016Date of Patent: November 6, 2018Assignee: Coretronic CorporationInventors: Tung-Yi Ko, I-Hsien Liu
-
Patent number: 10120270Abstract: A telescopic projector has a body, a projecting set, and a focusing set. The body has a shell and a roll film. The roll film is mounted in the shell. The projecting set is mounted in the body and has a power supply board and a radiating unit. The power supply board is located in the shell. The radiating unit is located in the shell and is electrically connected with the power supply board. The focusing set has a focusing electric machine, a driving block, and a sliding unit. The focusing electric machine is mounted in the shell and is electrically connected to the power supply board. The driving block is mounted on a top surface of the focusing electric machine and is controlled by the focusing electric machine. The sliding unit is mounted in the shell and is located above the focusing electric machine.Type: GrantFiled: February 19, 2018Date of Patent: November 6, 2018Assignee: GEMMY INDUSTRIES CORPORATIONInventors: Cheng-Chun Zhang, Lio Yenwei Chang
-
Patent number: 10120271Abstract: A light source assembly, an imaging device and an imaging method are provided. The light source assembly comprises a light source component emitting a first light beam; a fluorescent excitation device receiving the first light beam and exciting a second light beam; a coupling device receiving an incident light beam and coupling the incident light beam into a third light beam, wherein the incident light beam includes the second light beam or includes the second light beam and the first light beam. The imaging device comprises the above-mentioned light source assembly and a projection system receiving the third light beam. The imaging method comprises: generating a first light beam; exciting a second light beam by using the first light beam; coupling the second light beam into a third light beam or coupling the second light beam and the first light beam into a third light beam; and imaging with the third light beam.Type: GrantFiled: September 3, 2015Date of Patent: November 6, 2018Assignees: BOE TECHNOLOGY GROUP CO., LTD., HEFEI XINSHENG OPTOELECTRONICS TECHNOLOGY CO., LTD.Inventors: Huan Wang, Yuting Yang, Mookeun Shin
-
Patent number: 10120272Abstract: A fluorescent color wheel includes a substrate, a working fluid, and a fluorescent powder layer. The substrate has at least one flow channel therein. The flow channel has a first end and a second end respectively adjacent to a central region and a peripheral region of the substrate. The working fluid flows in the flow channel in a gas-liquid coexistence state. The fluorescent powder layer is disposed on the substrate and located at the peripheral region. The disclosure further discloses a projector adopting the fluorescent color wheel.Type: GrantFiled: September 1, 2017Date of Patent: November 6, 2018Assignee: DELTA ELECTRONICS, INC.Inventors: Keh-Su Chang, Yen-I Chou, Chi Chen
-
Patent number: 10120273Abstract: A light source apparatus includes a light source unit and an output unit. The light source unit includes at least one solid-state light source capable of outputting light in a predetermined wavelength range as output light. The output unit includes a light emitter and a base unit. The light emitter is excited by the output light from the light source unit and emits visible light with a wavelength different from a wavelength of the output light. The base unit is rotatable about a predetermined rotation axis and contains a crystalline member having a crystal axis direction set to a direction different from a direction orthogonal to an optical axis direction of the output light, the light emitter being supported in the optical axis direction. The output unit is capable of outputting combined light containing the light in the predetermined wavelength range and the visible light emitted from the light emitter.Type: GrantFiled: August 7, 2014Date of Patent: November 6, 2018Assignee: Sony CorporationInventor: Yoshiki Kashihara
-
Patent number: 10120274Abstract: In a chamber (50), a quartz substrate (10) having a main surface on which an optical film (20) is formed is put on a susceptor (30). A flash lamp (60) is housed in a lamp house (90), and the optical film (20) is irradiated with flash light through two quartz plates (70a and 70b). A transmittance adjustment region (80) is formed on a surface of the quartz plate (70b) of the two quartz plates (70a and 70b), and the amount of light with which the optical film (20) is irradiated has in-plane distribution. If the optical film (20) is irradiated with the flash light, optical characteristics of the optical film (20) change depending on the received irradiation energy. Hence, for example, the characteristics of the optical film are not uniform, the optical film is irradiated with flash light having such irradiation energy distribution that cancels the in-plane distribution.Type: GrantFiled: January 12, 2017Date of Patent: November 6, 2018Assignee: SHIN-ETSU CHEMICAL CO., LTD.Inventors: Souichi Fukaya, Yukio Inazuki
-
Patent number: 10120275Abstract: According to one embodiment, a layout region of a mask pattern is divided into N (N is an integer of 2 or larger) units, a main pattern resolved by exposure light is arranged and sub patterns not resolved by the exposure light are arranged outside the main pattern such that distributions of attenuation amount of the exposure light in the divided layout regions are different.Type: GrantFiled: September 2, 2016Date of Patent: November 6, 2018Assignee: TOSHIBA MEMORY CORPORATIONInventors: Masakazu Hamasaki, Yoshihiro Yanai, Michiya Takimoto, Naoki Sato, Satoshi Usui, Takaki Hashimoto
-
Patent number: 10120276Abstract: The present invention provides an imprint apparatus which forms a pattern on a substrate by molding an imprint material on the substrate using a mold, comprising a supply unit configured to supply droplets of the imprint material onto the substrate; and a processing unit configured to acquire arrangement patterns of the droplets on the substrate, wherein based on the arrangement pattern corresponding to a first portion of the mold and the arrangement pattern corresponding to a second portion of the mold, the processing unit acquires the arrangement pattern corresponding to a boundary portion between the first portion and the second portion.Type: GrantFiled: March 31, 2015Date of Patent: November 6, 2018Assignee: CANON KABUSHIKI KAISHAInventors: Philip D. Schumaker, Yeshwanth Srinivasan, Masahiro Tamura, Takuro Yamazaki
-
Patent number: 10120277Abstract: A radiation-sensitive composition includes particles including a metal oxide as a principal component, and an organic solvent. A metal atom constituting the metal oxide includes a first metal atom that is a zinc atom, a boron atom, an aluminum atom, a gallium atom, a thallium atom, a germanium atom, an antimony atom, a bismuth atom, a tellurium atom, or a combination thereof. A percentage content of the first metal atom with respect to total metal atoms in the radiation-sensitive composition is no less than 50 atomic %. A pattern-forming method includes applying the radiation-sensitive composition to form a film on a substrate, exposing the film, and developing the film exposed.Type: GrantFiled: February 17, 2017Date of Patent: November 6, 2018Assignees: JSR CORPORATION, Cornell UniversityInventors: Kazuki Kasahara, Vasiliki Kosma, Jeremy Odent, Hong Xu, Mufei Yu, Emmanuel P. Giannelis, Christopher K. Ober
-
Patent number: 10120278Abstract: A carboxylic acid onium salt of formula (1) exerts a satisfactory acid diffusion control (or quencher) function. A resist composition comprising the carboxylic acid onium salt can be processed by DUV or EUV lithography to form a resist pattern with improved resolution, reduced LWR and minimal defects after development.Type: GrantFiled: April 17, 2017Date of Patent: November 6, 2018Assignee: SHIN-ETSU CHEMICAL CO., LTD.Inventors: Masahiro Fukushima, Kazuhiro Katayama
-
Patent number: 10120279Abstract: A negative resist composition comprising (A) a sulfonium compound of betaine type and (B) a polymer is provided. The resist composition is effective for controlling acid diffusion during the exposure step, exhibits a very high resolution during pattern formation, and forms a pattern with minimal LER.Type: GrantFiled: August 2, 2017Date of Patent: November 6, 2018Assignee: SHIN-ETSU CHEMICAL CO., LTD.Inventors: Keiichi Masunaga, Satoshi Watanabe, Masaaki Kotake, Kenji Yamada, Masaki Ohashi
-
Patent number: 10120280Abstract: Provided are a photosensitive resin composition including (A) a binder resin; (B) a photopolymerizable monomer; (C) a photopolymerization initiator including a compound represented by Chemical Formula 1; (D) a black colorant; and (E) a solvent, a black pixel defining layer manufactured using the photosensitive resin composition, and a display device including the black pixel defining layer. In Chemical Formula 1, each substituent is the same as defined in the detailed description.Type: GrantFiled: April 27, 2017Date of Patent: November 6, 2018Assignee: SAMSUNG SDI CO., LTD.Inventors: Sang Soo Kim, Jinhee Kang, Heekyoung Kang, Chang-Hyun Kwon, Jiyun Kwon, Chanwoo Kim, Bumjin Lee, Junho Lee, Chungbeum Hong
-
Patent number: 10120281Abstract: An actinic ray-sensitive or radiation-sensitive resin composition includes an alkali-soluble resin (A) having a phenolic hydroxyl group, and a crosslinking agent (C) having two or more hydroxymethyl groups or alkoxymethyl groups in total within the molecule, wherein the composition contains a crosslinking agent (C1) having a molecular weight of 420 or more and also having two to four hydroxymethyl groups or alkoxymethyl groups in total within the molecule in a proportion of 60 mol % to 100 mol % based on the total amount of the crosslinking agent (C) including the crosslinking agent (C1), and in which the total concentration of the hydroxymethyl groups or the alkoxymethyl groups of the crosslinking agent (C) relative to 1 g of the solid content in the actinic ray-sensitive or radiation-sensitive resin composition is 0.30 mmol/g or more.Type: GrantFiled: June 8, 2016Date of Patent: November 6, 2018Assignee: FUJIFILM CorporationInventors: Koutarou Takahashi, Tomotaka Tsuchimura, Shuhei Yamaguchi, Natsumi Yokokawa, Hidehiro Mochizuki
-
Patent number: 10120282Abstract: A chemically amplified resist material comprises: a polymer component that is capable of being made soluble or insoluble in a developer solution by an action of an acid; and a generative component that is capable of generating a radiation-sensitive sensitizer and an acid upon an exposure. The polymer component comprises: a first polymer comprising a first structural unit that comprises a fluorine atom and does not comprise a salt structure; or a second polymer comprising a second structural unit that comprises a fluorine atom and a salt structure. The generative component comprises: a radiation-sensitive acid-and-sensitizer generating agent; any two of the radiation-sensitive acid-and-sensitizer generating agent, a radiation-sensitive sensitizer generating agent and a radiation-sensitive acid generating agent; or the radiation-sensitive acid-and-sensitizer generating agent, the radiation-sensitive sensitizer generating agent and the radiation-sensitive acid generating agent.Type: GrantFiled: September 8, 2016Date of Patent: November 6, 2018Assignee: JSR CORPORATIONInventors: Hisashi Nakagawa, Takehiko Naruoka, Tomoki Nagai
-
Patent number: 10120283Abstract: There is provided an illumination method for illuminating an illumination objective surface by using a light from a light source. The illumination method includes setting control amount for controlling a plurality of optical elements, to control a state of an incident light coming into each of the plurality of optical elements, the plurality of optical elements being arranged in parallel and being capable of controlling the state of the incident light; illuminating the illumination objective surface with the light from the light source via the plurality of optical elements; monitoring integrated energy of the light from the light source; and correcting the control amount for the plurality of optical elements on the basis of a result of the monitoring of the integrated energy.Type: GrantFiled: November 30, 2011Date of Patent: November 6, 2018Assignee: NIKON CORPORATIONInventor: Yasushi Mizuno
-
Patent number: 10120284Abstract: A multi charged particle beam writing apparatus according to one aspect of the present invention includes a plurality of first blankers to respectively perform blanking deflection of a corresponding beam in multiple beams having passed through the plurality of openings of the aperture member, a plurality of second blankers to deflect a defective beam in the multiple beams having passed through the plurality of openings of the aperture member to be in a direction orthogonal to a deflection direction of the plurality of first blankers, a blanking aperture member to block each of beams which were deflected to be in a beam off state by at least one of the plurality of first blankers and the plurality of second blankers, and a detection processing unit to detect a defective beam in the multiple beams having passed through the plurality of openings of the aperture member.Type: GrantFiled: February 11, 2016Date of Patent: November 6, 2018Assignee: NuFlare Technology, Inc.Inventor: Hiroshi Matsumoto
-
Patent number: 10120285Abstract: A developing apparatus including a horizontal substrate holder, a rotating mechanism to rotate the substrate holder, a developer nozzle to supply a developer onto a part of the substrate to form a liquid puddle, a moving mechanism to move the developer nozzle in a radial direction of the rotating substrate, a contact part that moves with the developer nozzle and has a surface opposed to the substrate, which is smaller than the surface of the substrate, and a control unit to output a control signal such that a supply position of the developer on the substrate is moved in the radial direction of the substrate so that the liquid puddle is spread out on a whole surface of the substrate while the contact part is in contact with the liquid puddle.Type: GrantFiled: December 9, 2016Date of Patent: November 6, 2018Assignee: Tokyo Electron LimitedInventors: Kousuke Yoshihara, Hideharu Kyouda, Koshi Muta, Taro Yamamoto, Yasushi Takiguchi, Masahiro Fukuda
-
Patent number: 10120286Abstract: There is provided a method of developing an exposed resist film formed on a surface of a substrate to form a resist pattern, which includes: rotating the substrate about a rotation axis that extends in a direction perpendicular to the surface of the substrate that is horizontally supported; supplying a developing solution through a discharge hole positioned above the substrate onto the resist film such that the developing solution is widely spread on a surface of the resist film; and positioning a wetted part having a surface that faces the surface of the substrate, above a preceding region in the surface of the substrate, the preceding region being a region to which the developing solution is preferentially supplied through the discharge hole.Type: GrantFiled: July 17, 2015Date of Patent: November 6, 2018Assignee: Tokyo Electron LimitedInventors: Tomohiro Iseki, Hirofumi Takeguchi, Yuichi Terashita
-
Patent number: 10120287Abstract: A beam modifier device is provided that includes scattering portions in which particles vertically impinging on an exposure surface of the beam modifier device are deflected from a vertical direction. A total permeability for the particles changes along a lateral direction parallel to the exposure surface.Type: GrantFiled: August 29, 2016Date of Patent: November 6, 2018Assignee: Infineon Technologies AGInventors: Roland Rupp, Rudolf Elpelt, Romain Esteve
-
Patent number: 10120288Abstract: An exposure apparatus performs scanning exposure of a substrate with an illumination light via a projection optical. A mask is supported on a first base member, with a slider provided inside a movable member. The first base member is arranged above the projection optical system and has a first opening through which the illumination light passes. The mask is supported in a second opening of the slider, through which the illumination light passes. The slider moves inside the movable member by a first drive system. A stage having a holder that holds the substrate is moved on a second base member by a second drive system. The first and the second drive systems move the mask and the substrate relative to the illumination light during scanning exposure. The movable member is moved by a reaction force generated by a movement of the slider by the first drive system.Type: GrantFiled: September 3, 2015Date of Patent: November 6, 2018Assignee: NIKON CORPORATIONInventor: Yuichi Shibazaki
-
Patent number: 10120290Abstract: A fluid handling structure, an immersion lithographic apparatus and a device manufacturing method are disclosed. In one arrangement, a fluid handling structure has a fluid extraction conduit with a recovery port configured to receive a used fluid into the conduit. A plurality of flow breakers are provided that each extends across at least a portion of the conduit. The flow breakers are positioned downstream of the recovery port. The flow breakers are arranged so that a common plane cuts through at least a portion of two or more of the flow breakers. The common plane is aligned so as to be perpendicular to the average direction of flow in the conduit at the position of the common plane.Type: GrantFiled: June 18, 2015Date of Patent: November 6, 2018Assignee: ASML Netherlands B.V.Inventors: Daan Daniel Johannes Antonius Van Sommeren, Bruno Jean François Frackowiak, Arend Koolma
-
Patent number: 10120291Abstract: There is disclosed a polarization-modulating element for modulating a polarization state of incident light into a predetermined polarization state, the polarization-modulating element being made of an optical material with optical activity and having a circumferentially varying thickness profile.Type: GrantFiled: June 7, 2013Date of Patent: November 6, 2018Assignee: NIKON CORPORATIONInventors: Osamu Tanitsu, Koji Shigematsu, Hiroyuki Hirota, Tomoyuki Matsuyama
-
Patent number: 10120292Abstract: A support apparatus for a lithographic apparatus has an object holder and an extraction body radially outward of the object holder. The object holder is configured to support an object. The extraction body includes an extraction opening configured to extract fluid from a top surface of the support apparatus. The extraction body is spaced from the object holder such that the extraction body is substantially decoupled from the object holder. The extraction body comprises a projection configured such that it surrounds the object holder and such that, in use, a layer of liquid is retained on the projection and in contact with an object supported on the object holder.Type: GrantFiled: October 18, 2016Date of Patent: November 6, 2018Assignee: ASML NETHERLANDS, B.V.Inventors: Raymond Wilhelmus Louis Lafarre, Adrianus Hendrik Koevoets, Sjoerd Nicolaas Lambertus Donders, Menno Fien, Antonius Franciscus Johannes De Groot, Christiaan Alexander Hoogendam, Johannes Henricus Wilhelmus Jacobs, Nicolaas Ten Kate, Martijn Houben, Jan Steven Christiaan Westerlaken, Jim Vincent Overkamp, Maarten Van Beijnum
-
Patent number: 10120293Abstract: An object positioning system includes an object; a measurement system to measure the position of the object, wherein each sensor of the measurement system has an associated measurement area on the object and wherein a location of at least one measurement area on the object is dependent on the position of the object; an actuator system to position the object; a control system configured to drive the actuator system, wherein the control system includes an observer with a dynamic model of the object to estimate an internal dynamic behavior of the object, wherein the dynamic model includes the dependency of the location of at least one measurement area on the position of the object, and wherein the control system is configured to drive the actuator system in dependency of an output of the observer.Type: GrantFiled: September 25, 2014Date of Patent: November 6, 2018Assignee: ASML Netherlands B.V.Inventors: Hans Butler, Ramidin Izair Kamidi, Yanin Kasemsinsup
-
Patent number: 10120294Abstract: A lithography apparatus includes: a stage configured to hold a substrate on which a mark is formed; an image sensor having an image sensing region; a processor configured to read out data concerning an image of the mark on a row basis to obtain a position of the mark; and a controller configured to position the substrate based on the position of the mark. When the processor obtains a position of a first mark on a first substrate, the controller moves the stage with respect to the image sensor such that an image of the first mark is formed closer to a row, from which the processor starts readout of the data, than an image of a second mark on a second substrate on which the pattern has been formed prior to the first substrate.Type: GrantFiled: November 10, 2015Date of Patent: November 6, 2018Assignee: CANON KABUSHIKI KAISHAInventor: Takuro Tsujikawa
-
Patent number: 10120295Abstract: An image forming apparatus includes a fixing unit that includes a heating and pressurizing member, and fixes the toner image by performing the operation of heating and pressurizing on the toner image on a recording medium twice or more times with the heating and pressurizing member, wherein the toner contains a toner particle which contains a binder resin containing a crystalline polyester resin, a colorant, and a release agent, and an external additive, and satisfies Expression: 2?tan ?P1?2.5, wherein tan ?P1 represents a maximum value of a mechanical loss tangent existing in a range where a complex elastic modulus is from 1×106 Pa to 1×108 Pa, which is measured at an angular frequency of 6.28 rad/sec and a distortion amount of 0.3%.Type: GrantFiled: February 2, 2017Date of Patent: November 6, 2018Assignee: FUJI XEROX CO., LTD.Inventors: Naoki Ota, Masataka Kuribayashi, Takafumi Koide, Yusuke Fukuda, Katsuyuki Kitajima, Yasuhisa Morooka