Abstract: The invention provides a reflective LCD panel. The reflective LCD panel of the invention is disposed with white sub-pixel unit in the pixel unit. When the pixel electrode is disposed below the CF layer, the white sub-pixel unit is a transparent film layer and the pixel electrode is a reflective electrode, or when the white sub-pixel unit is a reflective film layer, the pixel electrode is a transparent electrode or a non-transparent electrode; when the pixel electrode is disposed above the CF layer, the white sub-pixel unit is a reflection film layer and the pixel electrode is a transparent electrode. The reflective LCD panel of the invention utilizes the combination of the white sub-pixel unit and the pixel electrode to improve the utilization of the ambient light, so as to enhance the brightness of the pixel unit and further enhance the brightness of the reflective LCD panel.

Abstract: Provided is a display device. The display device includes a first substrate and a second substrate including a display area and a non-display area surrounding the display area. The first substrate and the second substrate face and are attached to each other. A first polarizer is disposed on the display area of the first substrate. A second polarizer is entirely disposed on the display area and the non-display area of the second substrate and has a non-overlapping region which does not overlap the first polarizer in the non-display area. A light leakage prevention pattern is disposed between the first substrate and the second substrate in the non-overlapping region of the first polarizer and the second polarizer and includes a color filter pattern and a light blocking pattern which overlap each other.

Abstract: A liquid crystal display device according to an aspect of the disclosure includes a liquid crystal panel including an element substrate, a counter substrate facing the element substrate, a liquid crystal layer sandwiched between the element substrate and the counter substrate, an incident-side linear polarizing plate arranged on a light-incident side of the liquid crystal layer, and an emission-side linear polarizing plate arranged on a light-emission side of the liquid crystal layer. Each of the element substrate and the counter substrate uses a resin film as base material. A plurality of insulating films are formed on the base material. A contact hole is formed in the plurality of insulating films, the contact hole being rectangular in plan view. Either a long side or a short side of the contact hole is parallel with an absorption axis of the incident-side linear polarizing plate or the emission-side linear polarizing plate.

Abstract: The present disclosure provides a method and system for repairing a short circuit defect in a display panel. The method comprises: connecting two terminals of an external repair power supply to a first test point and a second test point respectively, wherein there is a short circuit defect in a line between the first test point and the second test point; and adjusting an input voltage of the external repair power supply to fuse the short circuited line between the first test point and the second test point. With the method for repairing a short circuit defect in a display panel according to the present disclosure, the short circuit defect in the display panel can be repaired without providing a repair line in the display panel.

Abstract: A manufacturing method of the invention, comprising: successively forming an insulation layer and a photoresist layer on a transparent substrate; performing an exposure and a development on the photoresist layer by a back exposure process, so as to form a trench in the photoresist layer, an open area of the trench proximal to the insulation layer is larger than that of the trench distal to the insulation layer; removing a portion of insulation material in a region of the insulation layer exposed through the trench by an etching process, so as to form a slot in the insulation layer; forming a metal layer on a side of the photoresist layer distal to the insulation layer, a portion of the metal layer is embedded in the slot; removing the photoresist layer and the metal layer thereon by a stripping process, and retaining the portion of the metal layer in the slot.

Abstract: A COA substrate manufacturing method including: forming a TFT on a base substrate; forming a second insulation layer on the TFT; forming a color resist layer on the second insulation layer; forming a third insulation layer on the color resist layer; forming a through hole which exposes the drain electrode of the TFT; forming an ITO film layer on the third insulation layer; forming a photoresist layer on the ITO film layer; performing a light-shielding process to the photoresist layer on the vias-region ITO film layer and an exposure process to the photoresist layer on the non vias-region ITO film layer; developing the photoresist layer on the vias-region ITO and the non vias-region ITO film layers to obtain a photoresist layer plug covered on the vias-region ITO film layer. The photoresist is provided to fill the through hole so as to improve the quality of a display device.

Abstract: A liquid crystal display device includes a first substrate formed with a first gate line, a first source line, a first thin film transistor including a first channel region and a first semiconductor layer, and a second semiconductor layer electrically insulated from the first semiconductor layer, a second substrate disposed opposite to the first substrate, and a first liquid crystal layer disposed between the first substrate and the second substrate. The second semiconductor layer is disposed between the first thin film transistor and the first liquid crystal layer, and overlaps at least a part of the first channel region of the first thin film transistor in planar view.

Abstract: An embodiment of the present disclosure provides a display device, including: a liquid crystal display panel, comprising a liquid crystal layer including a polymer network formed of a polymerizable monomer; a light guide component, wherein the light guide component is configured such that light from the light source is emitted out from the first surface of the light guide component into the liquid crystal display panel, and in a case that the liquid crystal layer is not applied with a voltage, light from the light source is totally reflected at the liquid crystal display panel without being emitted from a side of the second substrate opposite to the first substrate into the outside air.

Abstract: An electrochromic apparatus includes a first substrate, a first electrode layer, an electrochromic layer, an electrolyte layer, a second substrate, a second electrode layer, a first extraction electrode layer, a second extraction electrode layer, and a partition wall. The first extraction electrode layer contacts the first electrode layer and is isolated from the second electrode layer and the electrochromic layer. The second extraction electrode layer contacts the second electrode layer and is isolated from the first electrode layer and the electrolyte layer. The partition wall is electrically insulative and sandwiched between the first extraction electrode layer and the electrolyte layer and between the second extraction electrode layer and the electrolyte layer.

Abstract: A stack of layers can be formed adjacent to a substrate before any layer within the stack is patterned. In an embodiment, combinations of substrates and stacks can be made and stored for an extended period, such as more than a week or a month, or shipped to a remote location before further manufacturing occurs. By delaying irreversible patterning until the closer to the date final product will be shipped to a customer, the likelihood of having too much inventory of a particular size or having to scrap windows for a custom order that was cancelled after manufacturing started can be substantially reduced. Further, particles between layers of the stack can be avoided. The process flows described are flexible, and many of the patterning operations in forming holes, openings, or the high resistance region can be performed in many different orders.

Abstract: An electrochromic device is provided. The device includes a substrate and an electrochromic stack on the substrate. The stack includes a first set of bus bars, a first transparent conductive layer, at least one electrochromic layer, a second transparent conductive layer, and a second set of bus bars, wherein at least one of the first transparent conductive layer or the second transparent conductive layer includes resistivity that varies by horizontal location according to a resistivity profile. In some embodiments the resistivity profile has a vertical component that may or may not be in addition to the horizontal component. Various embodiments of these materials can be tuned as to profiles of vertical resistance and horizontal sheet resistance.

Abstract: An electrophoretic medium comprises a fluid, a first, light scattering particle (typically white) and second, third and fourth particles having three subtractive primary colors (typically magenta, cyan and yellow); at least two of these colored particles being non-light scattering. The first and second particles bear polymer coatings such that the electric field required to separate an aggregate formed by the third and the fourth particles is greater than that required to separate an aggregate formed from any other two types of particles. Methods for driving the medium to produce white, black, magenta, cyan, yellow, red, green and blue colors are also described.

Abstract: An image display medium includes a first and second layer of encapsulated dispersion fluid containing charged particles and a front and rear light-transmissive electrode. The first layer is positioned between the front light-transmissive electrode and the second layer and the second layer is position between the first layer and the rear light-transmissive electrode. The charged particles within the first layer have a color similar to and a charge opposite of the charged particles within the second layer. Alternatively, the charged particles within the first layer may have a color and a charge similar to the charged particles within the second layer and the display medium includes a common conductor positioned between the first and second layer that is configured to drive the charged particles in the first and second layer.

Abstract: An optical waveguide modulator with automatic bias control is disclosed. A dither signal is applied to the modulator bias and its signature detected in light tapped from an output of the modulator using a phase sensitive dither detector such as a lock-in amplifier. The detected signal is processed using pre-recorded information defining the direction of the detected signal change relative to a change in the modulator bias, and the bias is adjusted in the direction determined using the information. An IQ bias of a quadrature modulator is controlled by dithering bias settings of two inner modulators at different dither frequencies, and detecting an oscillation at a sum frequency.

Abstract: Systems, methods, and apparatus are disclosed for attenuating an incident polarized light beam using a plurality of Liquid Crystal Polarization Gratings (“LCPGs”) and one or more switchable liquid crystal layers. When four LCPGs are used, a spacing between first and second LCPGs can be equal to a spacing between third and fourth LCPGs. Pi and FCL cells can also be used in place of more traditional LC switches. Switching of the LC switch can be imparted via an AC bias.

Abstract: An array of unit cells allows beam steering of an incident electromagnetic wave. Each unit cell has a back reflector, a conductive oxide between gate dielectrics, and an antenna. Voltage bias applied to different layers enables the accumulation or depletion of charges at the top and bottom interfaces of the conductive oxide. The charge accumulation and depletion regions control the refractive index of the material, enabling control of the reflected electromagnetic wave.

Abstract: An optical device, such as a camera, with an electrochromic lens cap is disclosed. The electrochromic lens cap is electrically switchable and thermally erasable and can reversibly and visibly change from an opaque state to a highly transparent state when a charge is applied to it. A power source such as a battery or photovoltaic cell can supply the charge. In addition, the electrochromic lens cap can reversibly change from an opaque state to a highly transparent state when there is a temperature change in the electrochromic lens cap's environment. The optical device has an actuator and/or transceiver that can communicate with a remote device to control when and how the charge is applied to the electrochromic lens cap to change it to the opaque state, color, pattern, or other feature. Another feature of this invention is using the electrochromic lens cap as a neutral-density filter for an optical device.

Abstract: A device for shielding an outdoor camera from light interference. The light shielding device includes a visor having a brim perpendicularly and pivotally connected to a panel, wherein the panel can rest flush against a support and the brim extends over a camera in order to shield the camera lens from direct sunlight and inclement weather. A first strap extends from a first side of the panel and a second strap extending from a second side of the panel, wherein a distal end of each of the first and second strap removably secure to one another to form a loop. A male and female fastener are disposed at the distal ends of each strap and removably secure the device to the support. In some embodiments, a plurality of teeth extend from an interior side of the panel and can penetrate the support for further securing the device thereto.

Abstract: An electrical fixture apparatus is provided to install devices on an electrical wiring component. In some embodiments, a fixture apparatus is provided for installing a camera using at least one conduit, one of which has a fastening end on one end, and a camera housing attached to a conduit on the other end. The camera in the camera housing provides support to be remotely reset using a sequence of power off on within a certain time interval. In further embodiments, a fixture apparatus is provided for installing a device on an electrical wiring component. The fixture apparatus may comprise at least one conduit, which has a fastening end on one end, and has a base at the other end. The fixture apparatus preferably supports the installation of an off the shelf device on its base.

Abstract: According to principles of the embodiments as disclosed herein, a device for monitoring the use of a handheld device is provided which allows for increased accuracy and ease of monitoring the use of handheld devices during usability testing. The device includes a handheld device mount configured to be releasably coupleable to a handheld device. The handheld device mount includes a cavity and a base and opposing first and second sides and first and second sidewalls extending from the base at the sides of the base. The mast has a first and second end. The first end of the mast is coupled to and extends from a third side of the cavity. A camera mount is located at the second end of the mast and configured to receive a camera.

Abstract: A projector mount with controls enabling quick selection between course alignment of the projector by hand about any of three positioning axes—pitch, yaw, and roll—and precision adjustment of projector position about any one or more of the axes, once the course alignment has been completed.

Abstract: For a laser projection device, a dichroic component is disposed on a light emitting path of a laser array for receiving a first blue polarized light from the laser array. A 1/4 wave plate is disposed between a reflective component and the dichroic component and configured to receive the first blue polarized light from the dichroic component, generate a second blue polarized light, and emit the second blue polarized light to the reflective component; and further configured to receive the second blue polarized light reflected by the reflective component, generate a third blue polarized light, and emit the third blue polarized light to the dichroic component. The dichroic component is further configured to receive the third blue polarized light from the 1/4 wave plate and fluorescent light from a reflective fluorescent wheel, and output the third blue polarized light and the fluorescent light in a same light emitting direction.

Abstract: An AC or DC powered LED or-and laser projection light may have more than one function, which may include conventional all-purpose light device has built-in or add projection functions using existing light device's its-own light housing with project-kits or project-assembly has built-in light sources to project a light beam, image, or digital-data from display-unit. The said project light is a desk top light, floor light, garden light, emergency light, night light, motion sensor light, power fail light, seasonal light, Christmas light and/or ornament, licensee products, cartoon character related products, blue tooth light, moving and or multi-function light; with rechargeable or non-rechargeable energy storage kits having preferred circuit, switch, sensor, timer, IC electric parts, and accessories.

Abstract: A light source control apparatus includes a controller, and a plurality of drivers. The controller transmits an instruction value for adjusting a light amount of at least one light emitting unit. Each of the plurality of drivers obtains the transmitted instruction value, and determines, by using a function of a driving value for driving the light emitting unit and the light amount, the function being each set for the light emitting unit, the driving value of the light emitting unit each on the basis of the instruction value.

Abstract: A monolithic liquid crystal display (LCD) projector includes a light emitting diode (LED) light source, a condenser, a collimating lens, an LCD light valve, a field lens and a projection lens. The LCD light valve is disposed between the collimating lens and the field lens. The condenser is disposed between the LED light source and the collimating lens. The projection lens is disposed behind the field lens. A first reflector is disposed between the field lens and the projection lens. The first reflector conducts mirror reflection along a long axis thereof. The present disclosure has the characteristics of small volume, novel shape, good color uniformity of the image, good radiating performance and long service life.

Abstract: High contrast, glass-based, writeable/erasable front projection screens are provided. The screens include a transparent glass sheet which has a front surface and a back surface separated by a distance d. The back surface is in optical contact with a diffusing element. During use of the projection screen, the glass sheet transmits image light from a projector to the diffusing element and the diffusing element reflects a portion of that light back through the glass sheet to a user. The screens have a user-facing surface that is a writable/erasable surface. In embodiments, the distance d is less than or equal to 0.2 millimeters, the whiteness W of the projection screen is less than or equal to 0.5, and/or the contrast C of the projection screen is at least 75%.

Abstract: A computing device and an input device are provided. Each of the computing device and the input device includes a control unit, a light source, a projection plate and a casing. The control unit, the light source and the projection plate are accommodated within the casing. The light source emits light beams. The projection plate includes a pattern. After the light beams pass through the projection plate, the light beams are projected outside the casing and an image corresponding to the pattern of the projection plate is formed on a projection surface that is located outside the casing. Since the projection plate is cheap and small, the fabricating cost of the computing device or the input device is reduced and the purpose of developing the computing device or the input device toward light weightiness, slimness and small size is achievable.

Abstract: A polyarylate resin is represented by general formula (1) shown below. In general formula (1), R1 represents a hydrogen atom or methyl group. R2 and R3 each represent a hydrogen atom or an alkyl group having a carbon number of at least 1 and no greater than 4. R2 and R3 are not the same as one another. When R1 represents a hydrogen atom, R2 and R3 are not bonded to one another. When R1 represents a methyl group, R2 and R3 are optionally bonded to one another to form a ring. r and s each represent a number greater than or equal to 0 and less than or equal to 49. t and u each represent a number greater than or equal to 1 and less than or equal to 50. r+s+t+u=100. r+t=s+u.

Abstract: A patterning device carries a pattern of features to be transferred onto a substrate using a lithographic apparatus. The patterning device is free of light absorber material, at least in an area. The pattern of features in the area may include a dense array of lines, trenches, dots or holes. Individual lines, holes, etc. are defined in at least one direction by pairs of edges between regions of different phase in the patterning device. A distance between the pair of edges in the at least one direction is at least 15% smaller than a size of the individual feature to be formed on the substrate once adjusted by a magnification factor, if any, of the lithographic apparatus. The patterning device may be adapted for use in EUV lithography. The patterning device may be adapted for use in a negative tone resist and development process.

Abstract: A method for generating an electromagnetic radiation includes the following operations. A target material is introduced in a chamber. A light beam is irradiated on the target material in the chamber to generate plasma and an electromagnetic radiation. The electromagnetic radiation is collected with an optical device. A gas mixture is introduced in the chamber. The gas mixture includes a first buffer gas reactive to the target material, and a second buffer gas to slow down debris of the target material and/or plasma by-product, so as to increase an reaction efficiency of the target material and the first buffer gas, and to reduce deposition of the debris of the target material and/or the plasma by-product on the optical device.

Abstract: A method for forming a pellicle apparatus involves forming a device substrate by depositing one or more pellicle layers defined over a base device layer, where a release layer is formed thereover. An adhesive layer is formed over a transparent carrier substrate. The adhesive layer is bonded to the release layer, defining a composite substrate comprised of the device and carrier substrates. The base device layer is removed from the composite structure and a pellicle frame is attached to an outermost one of the pellicle layers. A pellicle region is isolated from a remainder of the composite structure, and an ablation of the release layer is performed through the transparent carrier substrate, defining the pellicle apparatus comprising a pellicle film attached to the pellicle frame. The pellicle apparatus is then from a remaining portion of the composite substrate.

Abstract: A nanoimprint lithography method includes disposing a pretreatment composition including a polymerizable component on a substrate to form a pretreatment coating. Discrete imprint resist portions are disposed on the pretreatment coating, with each discrete portion of the imprint resist covering a target area of the substrate. The imprint resist is a polymerizable composition and includes a fluorinated photoinitiator. A composite polymerizable coating is formed on the substrate as each discrete portion of the imprint resist spreads beyond its target area. The composite polymerizable coating includes a mixture of the pretreatment composition and the imprint resist. The composite polymerizable coating is contacted with a template, and is polymerized to yield a composite polymeric layer on the substrate. The interfacial surface energy between the pretreatment composition and air exceeds the interfacial surface energy between the imprint resist and air or between at least a component of the imprint resist and air.

Abstract: A resist composition comprising a base polymer and a sulfonium or iodonium salt of sulfonic acid containing a cyclic hydrocarbon-substituted amino group offers dimensional stability on PPD and a satisfactory resolution.

Abstract: A photoacid generator compound having Formula (I): wherein, EWG, Y, R, and M+ are the same as described in the specification.

Abstract: The invention relates to polysulfonamide compositions for use as redistribution layers as used in the manufacture of semiconductors and semiconductor packages. More specifically it relates to photoimageable polysulfonamide composition for redistribution applications. The invention also relates to the use of the compositions in semiconductor manufacture.

Abstract: A negative type photosensitive resin composition includes a polymer compound which has, in a main chain thereof, a constitutional unit A represented by Formula A-1, a constitutional unit B that is at least one of constitutional units represented by Formulae B-1, B-2, B-3, B-4, B-5, B-6, or B-7, and a constitutional unit C containing an ethylenically unsaturated group; and a polymerization initiator. A negative type planographic printing plate precursor includes an image recording layer containing the negative type photosensitive resin composition. A method of preparing a planographic printing plate includes, in order, an exposure step of image-exposing the negative type planographic printing plate precursor; and a development step of performing development by removing a non-exposed portion of the exposed negative type planographic printing plate precursor using a developer.

Abstract: A chemically amplified positive-type photosensitive resin composition capable of suppressing the occurrence of “footing” in which the width of the bottom (the side proximate to the surface of a support) becomes narrower than that of the top (the side proximate to the surface of a resist layer) in a nonresist section and the occurrence of development residue, when a resist pattern serving as a template for a plated article is formed on a metal surface of a substrate using the composition; a method for manufacturing a substrate with a template using the composition; and a method for manufacturing a plated article using the substrate with the template. A mercapto compound having a specific structure is contained in the composition including an acid generator that generates an acid when irradiated with an active ray or radiation and a resin whose solubility in alkali increases under the action of acid.

Abstract: The present invention relates to a photosensitive composition comprising at least one nanosized fluorescent material and polysiloxane, to a color conversion film, and to a use of the color conversion film in an optical device. The invention further relates to an optical device comprising the color conversion film and a method for preparing the color conversion film and the optical device.

Abstract: There is provided an underlayer coating forming composition for lithography that is used in lithography process of the manufacture of semiconductor devices and that has a high dry etching rate in comparison to photoresists, does not intermix with photoresists, and is capable of flattening the surface of a semi conductor substrate having holes of a high aspect ratio. The underlayer coating forming composition for lithography comprises, a compound having two or more protected carboxylic groups, a compound having two or more epoxy groups, and a solvent.

Abstract: A temperature controlling apparatus includes a platen, a fluid source, a chiller, a first conduit and a second conduit. The fluid source supplies a fluid. The chiller is coupled to the fluid source to cool the fluid in the fluid source to a cooling temperature. The first conduit includes a first inlet in communication with the fluid source, a first outlet and a first heater that heats the fluid from the cooling temperature to a first heating temperature. The fluid heated by the first heater is dispensed on the platen through the first outlet. The second conduit includes a second inlet in communication with the fluid source, a second outlet and a second heater that heats the fluid from the cooling temperature to a second heating temperature different from the first heating temperature. The fluid heated by the second heater is dispensed on the platen through the second outlet.

Abstract: A method includes patterning a layer over a substrate with a first metal pattern; using a cut mask in a first position relative to the substrate to perform a first cut patterning for removing material from a first region within the first pattern; and using the same cut mask to perform a second cut patterning while in a second position relative to the same layer over the substrate, for removing material from a second region in a second metal pattern of the same layer over the substrate.

Abstract: Various embodiments of the present application are directed towards an edge-exposure tool with a light emitting diode (LED), as well as a method for edge exposure using a LED. In some embodiments, the edge-exposure tool comprises a process chamber, a workpiece table, a LED, and a controller. The workpiece table is in the process chamber and is configured to support a workpiece covered by a photosensitive layer. The LED is in the process chamber and is configured to emit radiation towards the workpiece. A controller is configured to control the LED to expose an edge portion of the photosensitive layer, but not a center portion of the photosensitive layer, to the radiation emitted by the LED. The edge portion of the photosensitive layer extends along an edge of the workpiece in a closed path to enclose the center portion of the photosensitive layer.

Abstract: A method for generating a radiation light in a lithography exposure system is provided. The method includes connecting a first nozzle assembly coupled to a support to an outlet of a storage member that receives a target fuel inside. The method further includes guiding the target fuel flowing through the first nozzle assembly and supplying a droplet of the target fuel into an excitation zone via the first nozzle assembly. The method also includes moving the support to connect a second nozzle assembly coupled to the support with the outlet. In addition, the method includes guiding the target fuel flowing through the second nozzle assembly and supplying a droplet of the target fuel into the excitation zone via the second nozzle assembly. The method further includes irradiating the droplet of the target fuel in the excitation zone with a laser pulse.

Abstract: A lithographic apparatus includes a projection system which includes a plurality of optical elements configured to project a beam of radiation onto a radiation sensitive substrate. The lithographic apparatus also includes a metrology frame structure which includes a part of one or more optical element measurement systems to measure the position and/or orientation of at least one of the optical elements. The plurality of optical elements, a patterning device stage, and a substrate stage are arranged such that, in a two dimensional view on the projection system, a rectangle is defined such that it envelops the plurality of optical elements, the patterning device stage, and the substrate stage. The rectangle is as small as possible. The metrology frame structure is positioned within the rectangle.

Abstract: A method and apparatus for cleaning the inside of an immersion lithographic apparatus is disclosed. In particular, a liquid supply system of the lithographic apparatus may be used to introduce a cleaning fluid into a space between the projection system and the substrate table of the lithographic apparatus. Additionally or alternatively, a cleaning device may be provided on the substrate table and an ultrasonic emitter may be provided to create an ultrasonic cleaning liquid.

Abstract: A system comprises a variable neutral density (ND) filter that has a first surface and a second surface that is opposite the first surface. The second surface is closer to an exposure region of a photosensitive film layer than the first surface. The photosensitive film layer is disposed on a surface of a substrate layer, and the variable ND filter has an attenuation profile that modulates transmittance of light passing through the variable ND filter to the exposure region. The system also includes one or more laser generators, each generating a coherent beam of light. The plurality of laser generators are arranged such that at least two of the generated coherent beams of light intersect with each other and form an intermediate interference exposure pattern that is modulated by the variable ND filter to form a target interference exposure pattern at the exposure region of the photosensitive film layer.

Abstract: Systems and methods discussed herein relate to patterning substrates during lithography and microlithography to form features to a set or sets of critical dimensions using dose. The dose maps are generated based upon images captured during manufacturing to account for process variation in a plurality of operations employed to pattern the substrates. The dose maps are used along with imaging programs to tune the voltages applied to various regions of a substrate in order to produce features to a set or sets of critical dimensions and compensate for upstream or downstream operations that may otherwise result in incorrect critical dimension formation.

Abstract: Systems and methods for providing improved measurements and predictions of geometry induced overlay errors are disclosed. Information regarding variations of overlay errors is obtained and analyzed to improve semiconductor processes as well as lithography patterning. In some embodiments, a cascading analysis process is utilized to breakdown the wafer geometry induced overlay into various components. The breakdown analysis may also be utilized to determine effectiveness factors for the various components, which in turn may improve the prediction accuracy of the impact of wafer geometry on wafer overlay. Furthermore, the measurements and/or predictions of the wafer geometry induced overlay errors may be utilized to provide overlay monitoring and correction solutions.

Abstract: In an aspect, a plurality of parameters characteristic of the patterned wafer are determined based on measurements of the intensity of electromagnetic radiation after the diffraction thereof at the patterned wafer. The intensity measurements are carried out for at least one used structure and at least one auxiliary structure. The parameters are determined based on intensity values measured during the intensity measurements for respectively different combinations of wavelength, polarization and/or order of diffraction, and also on the basis of correspondingly calculated intensity values, with a mathematical optimization method being applied.

Abstract: An immersion lithography apparatus having a controller configured to control a positioner to move a support table relative to an immersion space between the support table and a projection system to follow a route having a series of motions, the controller adapted to: predict a speed of an edge of the immersion space relative to an edge of an object on the support table when the edge of the immersion space passes over the edge of the object during at least one motion of the series of motions of the route; compare the speed to a predetermined parameter and to predict liquid loss from the immersion space during the at least one motion if the speed is greater than the predetermined parameter; and if liquid loss from the immersion space is predicted, modify one or more parameters of the route during the at least one motion accordingly.