Abstract: An array substrate, including a first substrate, a metal shielding layer, a first black shading layer, and a data line; in which the metal shielding layer includes a first shielding metal lines, and an orthographic projection of the first black shading layer onto the first substrate partially overlaps with orthographic projections of the two first shielding metal lines arranged at the opposite sides of the data line onto the first substrate.

Abstract: A liquid crystal screen and a display device that prevents light leakage caused by non-uniformity of the electric field of the sub-pixel electrode. The liquid crystal screen comprises a first substrate comprised of first leads and second leads that cross each other, and a liquid crystal screen comprised of a plurality of display areas. Each display area corresponds to an area between two adjacent first leads and two adjacent second leads, and each display area is comprised of two sub-pixels. The liquid crystal screen further comprises a black matrix, which has a plurality of openings, each at a position corresponding to each display area, and comprised of protrusions extending into each opening. The liquid crystal screen of the present invention can effectively prevent light leakage caused by non-uniformity of the electric field of the sub-pixel electrode, and can increase contrast of the liquid crystal screen, thereby improving display effect.

Abstract: Provided is an active matrix substrate that includes a substrate, a thin film transistor, an electrode layer, and a second insulating film. The thin film transistor is provided on the substrate and includes an oxide semiconductor layer, a gate electrode, and source and drain electrodes. The oxide semiconductor layer includes a first region as a channel region. The electrode layer is level with the gate electrode, is provided in a different region from the thin film transistor, and includes a first end. The second insulating film is provided between the substrate and the electrode layer and includes a second end at a more retreated position than the first end of the electrode layer. The oxide semiconductor layer further includes a second region having lower resistance than the first region. The electrode layer is electrically coupled, at the first end, to the second region of the oxide semiconductor layer.

Abstract: The present invention relates to a display panel technology field. An array substrate comprises a first metal layer, a buffer layer, a semiconductor layer, an insulating layer, a scanning metal layer, an inter layer dielectric, and a second metal layer that are sequentially stacked on a glass substrate along a first direction, and a first pixel set and a second pixel set that are arranged alternately along a second direction; and a first conductive path sequentially connecting the first pixel set and a second conductive path sequentially connecting the second pixel set. The first conductive path and the second conductive path change lines alternately in the first metal layer and the second metal layer, such that the first pixel set and the second pixel set are sequentially connected in series. With the array substrate of the present invention, the metal layer for changing line can be eliminated.

Abstract: The present invention is intended to control the color temperature of white exhibited by a liquid crystal display device. White is produced when light waves emitted through pixels associated with three colors of red, green, and blue have maximum intensities. The amounts of light emitted through the respective pixels are controlled by differentiating the shapes of the pixel electrodes disposed at the respective pixels from one another. Thus, the color temperature of white is controlled. Otherwise, the shapes of interceptive films disposed at the respective pixels are differentiated from one another in order to control light waves emitted through the respective pixels. Thus, the color temperature of white is controlled. The interceptive film may be shaped like the pixel electrode. Otherwise, the interceptive film may be realized with an interceptive pattern other than that of the pixel electrode or one of openings bored in a black matrix.

Abstract: An array substrate is provided. The array substrate includes: a first substrate; and a color filter layer disposed on the first substrate, wherein the color filter layer comprises: a first color filter that is located on the first substrate and comprises a recess and a sub-protrusion; and a second color filter that is located on the first substrate to be adjacent to the first color filter along a first direction, and comprises a protrusion protruding toward the recess of the first color filter. The sub-protrusion of the first color filter protrudes toward the protrusion of the second color filter and is at least partially superimposed with the protrusion.

Abstract: The present disclosure relates to an array substrate, a manufacturing method thereof, and a display panel. Each of the pixel areas correspondingly connects with a data line and a scanning line. In each of the pixel areas, a source of a first TFT and a gate of a second TFT are on the same layer. A gate of the first TFT, a source and a drain of the second TFT, and the scanning line are on the same layer. As such, the present disclosure may avoid the color shift of the vertical alignment (VA) display and may improve the pixel aperture rate.

Abstract: A display panel, a manufacturing method thereof and a display device are provided. The display panel includes an array substrate and an opposing substrate which are disposed opposite to each other; the array substrate includes a first base substrate and a source electrode, a drain electrode and an active layer which are disposed on the first base substrate, and a passivation layer disposed on the source electrode, the drain electrode and the active layer; the opposing substrate includes a second base substrate and a gate electrode disposed on the second base substrate; the active layer includes a source electrode region, a drain electrode region and a channel region between the source electrode region and the drain electrode region, the gate electrode is disposed opposite to and spaced apart from the passivation layer at a position where the channel region is located.

Abstract: There is disclosed a transparent display device including: a transparent display panel, a first optical structure fixed on a light incidence side of the transparent display panel, and a plurality of light sources arranged on a side of the first optical structure, wherein there is a scattering lens structure arranged on a side of the first optical structure facing away from the transparent display panel and a refractive index of a medium between the first optical structure and the transparent display panel is less than a refractive index of the first optical structure.

Abstract: Prior electrochromic devices frequently suffer from high levels of defectivity. The defects may be manifest as pin holes or spots where the electrochromic transition is impaired. This is unacceptable for many applications such as electrochromic architectural glass. Improved electrochromic devices with low defectivity can be fabricated by depositing certain layered components of the electrochromic device in a single integrated deposition system. While these layers are being deposited and/or treated on a substrate, for example a glass window, the substrate never leaves a controlled ambient environment, for example a low pressure controlled atmosphere having very low levels of particles. These layers may be deposited using physical vapor deposition.

Abstract: Disclosed is a display apparatus. The display apparatus comprises a display and a field-induced visibility-controlling layer provided on light-outgoing side of the display, wherein the field-induced visibility-controlling layer can be switched between a transparent state and a mirror state by adjusting voltage applied, such that when the field-induced visibility-controlling layer is in the transparent state, the display is visible through the field-induced visibility-controlling layer; and when the field-induced visibility-controlling layer is in the mirror state, a mirror shielding the display is formed therein.

Abstract: A first display includes a layer of electro-optic material with first and second electrodes on opposed sides thereof. One or both electrodes have at least two spaced contacts. Voltage control means are arranged to vary the potential difference between the two spaced contacts attached to the same electrode. A second display includes a layer of electro-optic material with a sequence of at least three electrodes adjacent thereto. Voltage control means vary the potential difference between the first and last electrodes of the sequence. The electrodes of the sequence alternate between two surfaces of the layer of electro-optic material, and have edges that overlap or lie adjacent the preceding and following electrodes of the sequence. The electrodes, other than the first and last, are electrically isolated such that the potential thereof is controlled by passage of current through the layer of electro-optic material. Methods for driving these displays are also provided.

Abstract: An optical interference modulator comprises a main input, a main output, an optical splitter connected to the main input, first and second MMI couplers, each with a first primary-end access port connected to the splitter; a second primary-end access port connected to the main output; a first secondary-end access port connected to a respective primary waveguide; and a second secondary-end access port connected to a respective secondary waveguide. A light reflector is arranged to reflect light incident from said primary and secondary waveguides back into the same respective waveguide such that light travelling through the respective waveguide from the respective secondary-end access port, after reflection, travels back to the same secondary-end access port. For the MMI couplers, at least one of the respective primary and secondary waveguides comprises a respective light phase modulating device arranged to modulate the phase of light travelling along the corresponding waveguide in either direction.

Abstract: An optical signal modulator (modulator) includes, in part, a first multitude of diodes coupled in parallel and disposed along an outer periphery of the optical ring of the modulator, a second multitude of diodes coupled in parallel and disposed along the outer periphery of the optical ring, and a doped region adapted to supply heat to the optical ring. A pair of current sources supply substantially constant currents to the first and second multitude of diodes to generate a pair of electrical signals. The modulator further includes, in part, a control circuit adapted to control the temperature of the optical ring in accordance with the pair electrical signals. To achieve this, the control circuit varies the voltage applied to the doped region to vary the supplied heat. Alternatively, the control circuit applies a voltage to the optical ring to maintain a substantially constant resonant wavelength in the optical ring.

Abstract: Disclosed is a lens device, including: a first transparent substrate; a second transparent substrate; and a liquid crystal layer filled therebetween. The first transparent substrate is a Fresnel lens, and a surface of the Fresnel lens toward the liquid crystal layer is disposed with grooves which are spaced from one another in accordance with Fresnel wave zones. The second transparent substrate is configured to control state of a liquid crystal, such that a refractive index of the liquid crystal, when polarized light incident into the liquid crystal passes through the liquid crystal, transforms between a first refractive index of the liquid crystal and a second refractive index of the liquid crystal, wherein the first refractive index is greater than the second refractive index, and a refractive index of the Fresnel lens is substantially equal to the first refractive index of the liquid crystal in the liquid crystal layer.

Abstract: A wavelength selective switch and a wavelength selection method are provided, where the wavelength selective switch includes: a dual-microring resonator, including a first microring and a second microring that are connected in series, where the first microring and the second microring respectively include one annular PN junction, and a direction of the annular PN junction of the first microring is the same as that of the annular PN junction of the second microring; an electric tuning module, where a first electric port of the electric tuning module is connected to a P zone of the first microring and an N zone of the second microring, a second electric port of the electric tuning module is connected to an N zone of the first microring and a P zone of the second microring; and a thermal tuning module, configured to adjust an operating temperature of the dual-microring resonator.

Abstract: A protection member is disposed on a curved part of a housing having a desired curvature between a first display panel and a second display panel, thus the protection member is deformed along with the curvature of the curved part and curved. The curvature of the curved part formed in the housing has a plurality of curvatures.

Abstract: An electro-optical directional coupler is provided having a substrate and a first and second optical waveguide formed on the substrate, where the second waveguide extends adjacent to and parallel with the first waveguide for at least one interaction length. The interaction length has a first end and a second end such that an optical signal applied only to one of the first and second waveguides couples to the other of the first and second waveguides between the ends. A first electrode is proximate the first and second waveguides and between the ends of the interaction length. A first voltage applied to the first electrode independently tunes a coupling of a TE mode. A second electrode located proximate the first and second waveguides and the first electrode and between the ends of the interaction length. A second voltage applied to the second electrode independently tunes a coupling of a TM mode.

Abstract: A computing apparatus has a logic unit configured to perform an arithmetic operation by relating light beams, each having a respective light amplitude, to obtain a light-based result of the operation, and to evaluate the light-based result to output a corresponding numeric result. The logic unit uses variables values, each corresponding to a respective distinct light amplitude, the variable values thereby corresponding to a plurality of distinct light amplitudes.

Abstract: A radiation imaging apparatus that includes a plurality of sensors, a readout unit and a control unit, wherein the control unit performs a first control of reading out signals from sensors after radiation irradiation is started, and a second control of outputting a control signal to end the radiation irradiation when a calculated value calculated based on an output of the readout unit in the first control reaches a reference value, and the control unit, in the first control, reads out the signals from the sensors by changing a signal amplification ratio of the readout unit such that a value of an output of the readout unit is not saturated, and, in the second control, calculates the calculated value by accumulating the output of the readout unit in consideration of the signal amplification ratio.

Abstract: Apparatus, systems and methods for windows integration with cover glass and for processing cover glass to provide windows for electronic devices are disclosed. Transparent windows such as a transparent camera window, a transparent illuminator window and/or a transparent display window can be integrated into the cover glass. The apparatus, systems and methods are especially suitable for cover glasses, or displays (e.g., LCD displays), assembled in small form factor electronic devices such as handheld electronic devices (e.g., mobile phones, media players, personal digital assistants, remote controls, etc.). The apparatus, systems and methods can also be used for cover glasses or displays for other relatively larger form factor electronic devices (e.g., portable computers, tablet computers, displays, monitors, televisions, etc.).

Abstract: The electronic device can be used with various modules attached to a device main body and is electrically connected by the respective connector portions. The device main body includes a connection terminal portion with a concave shape, and the module has a connection terminal portion with a convex shape that fits into the connection terminal portion of the device main body. The device main body includes a power source terminal group in a first surface, and includes a ground terminal group and terminal groups that are compatible with the external communication interface in the second surface on the side opposite thereto. The terminal groups has a pair of terminal groups that are used for transmitting differential signals and a ground terminal, and communication terminal groups for communication with a power source module are adjacent to the ground terminal.

Abstract: One embodiment provides a monopole for a camera, including: a pole of length sufficient for two handed operation; an offset arrangement attached to an end of the pole, the offset arrangement comprising a first element connected at an angle to the end of the pole and a second element connected to the first element; the first element rotating about a first axis with respect to the end of the pole; the second element rotating about a second axis with respect to the first element; a camera mount attached to the second element, wherein the camera mount rotates about a third axis with respect to the second element; and at least one motor aligned with the first, the second or the third axis and imparting movement to the camera mount with respect to the pole in at least one degree of freedom selected from the group consisting of tilt, pan and roll. Other aspects are described and claimed.

Abstract: The present invention provides a photographic assembly, including a pitch motor, a roll motor and a camera. A second rotor portion of the pitch motor is coupled to the third stator portion of the roll motor and a third rotor portion of the roll motor is coupled to the camera, so that a connection manner of the photographic assembly is a pitch-roll manner. When the roll motor is working, a displacement variation of the camera along a pitch axis is small. That is, a rotation interference phenomenon is weakened, so that a rotation space that needs to be reserved between the camera and the roll motor is correspondingly reduced. That is, distances between the centre of gravity of the camera and the motors are also decreased. Therefore, the photographic assembly becomes more compact at some portions, thereby achieving an objective that the volume, the weight, and the moment of inertia of the photographic assembly are reduced.

Abstract: A lighting apparatus which is held in a state of being suspended from a mounting bracket fixed to a ceiling surface and emits illumination light is provided, and the lighting apparatus includes: an illumination light source for generating the illumination light disposed inside a housing; a projector disposed in an inner space of the housing and configured to project an image onto a projection surface; and a lint disposed in an upper portion inside the housing, wherein an air intake and an air outlet are formed at such positions in the housing that air flow generated by the fan is sucked from a lower portion of the housing, passes upward through a vicinity of the illumination light source and the projector, and is exhausted from the upper portion of the housing.

Abstract: An illumination device of the invention includes a light source unit including light emitting devices having light emission surfaces, a collimating system having collimating lenses provided to respectively correspond to the light emitting devices of the light source unit, into which lights from the respective light emitting devices enter, a collecting lens into which the lights output from the collimating lenses enter, and a rod lens having a light incident end surface into which the light collected by the collecting lens enters. The light source unit and the collimating system are adapted so that a principal ray of the light output from the light emission surface corresponding to a part of the light emitting devices of the light source unit may enter a position separated from an optical axis of the collimating lens corresponding to the part of the light emitting devices of the light source unit.

Abstract: A structured phosphor device includes a frame member comprising wall regions separating multiple openings of window regions. Further, the structured phosphor device includes a phosphor material filled in each of the multiple openings with a first surface thereof being exposed to an excitation light from one or more laser sources to generate an emitted light out of each window region. Additionally, the structured phosphor device includes an anti-reflective film overlying the first surface of the phosphor material. Furthermore, the structured phosphor device includes a substrate attached to a second surface of the phosphor material in each of the multiple openings. Alternatively, the structured phosphor device includes an array of phosphor pixels dividing a plate of single-crystalline or poly-crystalline phosphor material separated by optically reflective and thermally conductive walls. A dynamic lighting system based on the arrays of phosphor pixels for single or full color image projection is also disclosed.

Abstract: A projector includes a light-emitting device, a color wheel, a notch filter, a switching device, and a light controller. The light-emitting device is configured to emit a light. The color wheel is disposed on a path of the light and is configured to produce lights with different color wave bands. The notch filter has two cut-off waveband, and each is located between adjacent two of the color wavebands. The switching module is configured to move the notch filter to or away the path of the light. The light controller is electrically connected to the light-emitting device and the switching module, and is configured to control an intensity of the light emitted by the light-emitting device.

Abstract: An image capturing apparatus including an audio input unit and a driving unit attenuates or disables driving sounds of the driving unit and post-driving sounds as appropriate to reduce unnecessary sounds and improve usefulness of audio data, and an image capturing apparatus including an image capturing unit, a panning/tilting unit configured to change an image capturing direction, and an audio input unit attenuates or disables an audio-related function while the panning/tilting unit is driving and until a predetermined determination condition is satisfied after the driving.

Abstract: An extreme ultraviolet mask and method of manufacture thereof includes: providing a glass-ceramic block; forming a glass-ceramic substrate from the glass-ceramic block; and depositing a planarization layer on the glass-ceramic substrate.

Abstract: An extreme ultraviolet (EUV) mask blank production system includes: a substrate handling vacuum chamber for creating a vacuum; a substrate handling platform, in the vacuum, for transporting an ultra-low expansion substrate loaded in the substrate handling vacuum chamber; and multiple sub-chambers, accessed by the substrate handling platform, for forming an EUV mask blank includes: a multi-layer stack, formed above the ultra-low expansion substrate, for reflecting an extreme ultraviolet (EUV) light, and an absorber layer, formed above the multi-layer stack, for absorbing the EUV light at a wavelength of 13.5 nm includes the absorber layer has a thickness of less than 80 nm and less than 2% reflectivity.

Abstract: A mask blank including a phase shift film is provided, wherein the phase shift film has a predetermined transmittance and a predetermined phase difference with respect to exposure light of an ArF excimer laser, and it is relatively easy to detect an etching end point for detecting a boundary between the phase shift film and a transparent substrate upon the EB defect repair. The phase shift film has a function to transmit the exposure light of the ArF excimer laser at a transmittance of not less than 10% and not more than 20%, and a function to generate a phase difference of not less than 150 degrees and not more than 190 degrees between the exposure light transmitted through the phase shift film and the exposure light transmitted through the air for the same distance as a thickness of the phase shift film. The phase shift film is made of a material containing a metal, silicon, nitrogen, and oxygen.

Abstract: A mask blank with phase shift film where changes in transmittance and phase shift to an exposure light of an ArF excimer laser are suppressed. The film transmits light of an ArF excimer laser at a transmittance of 2% or more and less than 10% and generates a phase difference of 150 degrees or more and 190 degrees or less between the exposure light transmitted through the phase shift film and the exposure light transmitted through the air for the same distance as a thickness of the phase shift film. The film has a stacked lower layer and upper layer, the lower layer containing metal and silicon and substantially free of oxygen. The upper layer containing metal, silicon, nitrogen, and oxygen. The lower layer is thinner than the upper layer, and the ratio of metal to metal and silicon of the upper layer is less than the lower layer.

Abstract: A pellicle composition for a photomask, a pellicle for a photomask, the pellicle for a photomask being formed from the pellicle composition, a method of forming the pellicle, a reticle including the pellicle, and an exposure apparatus for lithography including the reticle are provided. The pellicle composition includes: at least one selected from graphene quantum dots and a graphene quantum dot precursor, the graphene quantum dots having a size of about 50 nm or less; and a solvent.

Abstract: A method of designing an epitaxy template to direct self-assembly of a block copolymer on a substrate into an ordered target pattern involves providing a primary epitaxy template design and then varying the design to optimize a pattern fidelity statistic, such as placement error, relative to the target pattern by modelling predicted self-assembled block copolymer patterns and optimizing pattern placement as a function of a varied design parameter. In addition to varying a design parameter to optimize the pattern fidelity statistic, a random error in the template design is included prior to modelling predicted patterns in order to compensate for expected template inaccuracy in practice. The inclusion of a realistic random error in the template design, in addition to systematic variation of a design parameter, may improve the template design optimization to render the result less sensitive to error which may be inevitable in practice.

Abstract: A method forms a resist underlayer film that has high resistance to dry etching using a gas containing a fluorocarbon. A method for forming a resist underlayer film includes the steps of: applying to a substrate a resist underlayer film-forming composition containing a fullerene derivative in which one to six molecules of malonic acid diester of the following Formula (1): wherein two Rs are each independently a C1-10 alkyl group, are added to one molecule of fullerene, a compound having at least two epoxy groups, and a solvent; and baking the substrate applied with the resist underlayer film-forming composition at least one time at a temperature of 240° C. or higher under an atmosphere of nitrogen, argon, or a mixture thereof.

Abstract: A photoresist composition includes a photoresist polymer including a repeating unit to which a silicon-containing leaving group is combined, a photo-fluorine generator including a sulfonium fluoride, and a solvent.

Abstract: Provided are a resist composition capable of forming a pattern having excellent pattern collapse performance, particularly in the formation of an ultrafine pattern (for example, a pattern with a line width 50 nm or less) using the resist composition containing a resin (A) having a repeating unit (a) having an aromatic ring group and a repeating unit (b) having a silicon atom in a side chain, as well as a resist film, a pattern forming method, and a method for manufacturing an electronic device, each using the resist composition.

Abstract: Provided is an antireflective-film attached transparent substrate, which contains a transparent substrate having two principal surfaces and an antireflective film formed on one of the principal surfaces of the transparent substrate, in which the antireflective-film attached transparent substrate has a luminous transmittance being in a range of 20% to 85% and a b* value of a transmission color being 5 or smaller under a D65 light source, and the antireflective film has a luminous reflectance being 1% or lower and a sheet resistance being 104?/? or higher.

Abstract: A method of forming a directed self-assembled (DSA) layer on a substrate by: providing a substrate; applying a layer comprising a self-assembly material on the substrate; and annealing of the self-assembly material of the layer to form a directed self-assembled layer by providing a controlled temperature and gas environment around the substrate. The controlled gas environment comprises molecules comprising an oxygen element with a partial pressure between 10-2000 Pa.

Abstract: An EUV lithographic structure and methods according to embodiments of the invention includes an EUV photosensitive resist layer disposed directly on an oxide hardmask layer, wherein the oxide hardmask layer is doped with dopant ions to form a doped oxide hardmask layer so as to improve adhesion between the EUV lithographic structure and the oxide hardmask. The EUV lithographic structure is free of a separate adhesion layer.

Abstract: A method for critical dimension control in which a substrate is received having an underlying layer and a radiation-sensitive material layer thereon. The radiation-sensitive material is exposed through a patterned mask to a first wavelength of light in the UV spectrum, and developed a first time. The radiation-sensitive material is flood exposed to a second wavelength of light different from the first wavelength of light and developed a second time to form a pattern.

Abstract: Systems, devices, and methods for printing on surfaces of three-dimensional objects are provided. The systems, devices, and methods allow for images, and three-dimensional structures, to be printed onto a surface of a three-dimensional object. The surface of the three-dimensional object can have many different shapes, including an arbitrary or non-uniform shape having multiple curves. In one exemplary embodiment, the method includes associating a pattern of polygons with a surface of a three-dimensional object and then scaling a pattern of polygons associated with an image to be printed onto the surface with the pattern of polygons associated with the surface. One or more polygons of the scaled pattern of polygons are then progressively projected onto the surface, and a photosensitive material associated with the surface is cured to set projected image portion on the surface. Systems, devices, and other methods for printing onto surfaces of three-dimensional objects are also provided.

Abstract: The present teachings relate to compositions for forming a negative-tone photopatternable dielectric material, where the compositions include, among other components, an organic filler and one or more photoactive compounds, and where the presence of the organic filler enables the effective removal of such photoactive compounds (after curing, and during or after the development step) which, if allowed to remain in the photopatterned dielectric material, would lead to deleterious effects on its dielectric properties.

Abstract: A lithographic apparatus comprises a substrate table for holding a substrate and a projection system for projecting a radiation beam onto a target region of the substrate so as to form an image on the substrate. The projection system comprises a lens element arrangement having a first lens element. A first pressure sensor is arranged to measure at least one pressure value adjacent the first lens element. A controller determines a first change in a pressure difference over the first lens element and/or a further lens element based on a signal received from the pressure sensor, determines adjustments to a position of one of the substrate table and projection system based upon the determined first change, and causes actuators to make adjustments to the substrate table or the projection system.

Abstract: The disclosure relates to a device for changing a shape of a surface of an optical element via electron irradiation. The device includes an electron irradiation unit for radiating electrons onto the surface with a locally resolved energy dose distribution for the purpose of producing local material densifications in the optical element. Furthermore, the device includes a control unit for determining a locally resolved energy dose distribution from a predefined desired change of a surface shape of the optical element by optimization via a minimization of a merit function, in such a way that a difference between the desired change and an actual change of the surface shape of the optical element, the actual change being brought about on account of the predefinition determined, is minimized.

Abstract: A fluid handling structure for a lithographic apparatus configured to contain immersion fluid to a region, the fluid handling structure having, at a boundary of a space: at least one gas knife opening in a radially outward direction of the space; and at least one gas supply opening in the radially outward direction of the at least gas knife opening relative to the space. The gas knife opening and the gas supply opening both provide substantially pure CO2 gas so as to provide a substantially pure CO2 gas environment adjacent to, and radially outward of, the space.

Abstract: Metrology targets, production processes and optical systems are provided, which enable metrology of device-like targets. Supplementary structure(s) may be introduced in the target to interact optically with the bottom layer and/or with the top layer of the target and target cells configurations enable deriving measurements of device-characteristic features. For example, supplementary structure(s) may be designed to yield Moiré patterns with one or both layers, and metrology parameters may be derived from these patterns. Device production processes were adapted to enable production of corresponding targets, which may be measured by standard or by provided modified optical systems, configured to enable phase measurements of the Moiré patterns.

Abstract: Disclosed is a process monitoring method, and an associated metrology apparatus.

Abstract: A lithography apparatus and device manufacturing methods are disclosed. A lithography apparatus includes a support stage, and a measurement system including a sensor part and a reference part, the measurement system being configured to determine the position and/or orientation of the support stage, or of a component mounted on the support stage, relative to a reference frame by using the sensor part to interact with the reference part, wherein: the reference frame comprises N sub-frames coupled together so as to behave predominantly as a single rigid body with respect to vibrations below a first reference frequency and predominantly as an N-body system with respect to vibrations above a second reference frequency, where N is an integer greater than 1.