Abstract: Provided herein are methods for selecting a drug therapy for a patient with cancer, such as colorectal cancer, pancreatic cancer, lung cancer or breast cancer. The method includes determining or measuring the level of RasGRP1 polynucleotide or polypeptide in a sample from the patient. Also provided herein are methods for determining the likelihood of a good prognosis for a patient with cancer. Additionally, provided herein are methods for predicting the likelihood of a negative clinical response to an anti-EGFR therapy in a subject with cancer.

Abstract: Nucleic acid molecules comprising a SNP site at position 1296 of bovine uterine milk protein (UTMP) coding sequence (SEQ ID NO: 1), which SNP indicates a desirable productive life in a dairy cattle. Also disclosed are an array or a kit comprising the same, a method for detecting the SNPs, a method for progeny testing of cattle, and a method for selectively breeding of cattle.

Abstract: Provided herein are methods and apparatus for the identification of pathogenic and non-pathogenic microorganisms in food and environmental samples. The disclosure solves existing challenges encountered in identifying food borne pathogens, including pathogens of the Salmonella, Campylobacter, Listeria, and Escherichia genera in a timely and efficient manner. The disclosure also provides methods for differentiating a transient versus a resident pathogen, correlating presence of non-pathogenic with pathogenic microorganisms, distinguishing live versus dead microorganisms by sequencing.

Abstract: A method of diagnosing bacterial vaginosis in a woman, which involves determining an amount of each of more than one BV-associated bacterium in a vaginal sample obtained from the female and assessing a BV status of the female based on the amount of each of the more than one BV-associated bacterium in the sample.

Abstract: Disclosed are nucleic acid oligomers, including amplification oligomers, capture probes, and detection probes, for detection of a 16S rRNA or its encoding gene from bacterial species associated with bacterial vaginosis. Also disclosed are methods of specific nucleic acid amplification and detection using the disclosed oligomers, as well as corresponding reaction mixtures and kits.

Abstract: A concentrated sugarcane juice powder obtained by a convection current vacuum freeze drying process that includes: selecting and preparing sugarcane stalks by a predetermined quality guideline; extracting sugarcane juice by inserting the sugarcane stalks into a sugarcane juice extracting apparatus having a mesh pattern of micro ridges configured to achieve a maximum extraction efficiency; adding probiotics into the extracted sugarcane juice; freezing the sugarcane juice mixed with the probiotics in molds using an individual quick freezer (IQF) to obtain frozen sugarcane juice blocks; and vacuum freezing said frozen sugarcane juice blocks using a convection current vacuum freeze drying apparatus.

Abstract: The invention relates to a poly silsesquioxane-acrylic nanocomposite auxiliary for leather process and its preparation method. By mixing octavinyl silsesquioxane, organic solvent, ammonium persulfate, distilled water and surfactant in one system, and adding acrylic acid dropwise into the mixing system, cooling to adjust pH to obtain poly silsesquioxane-acrylic nanocomposite auxiliary for leather process. The auxiliary obtained in this invention is easily to penetrate into gap of the collagen fibers, and forms nano and micro-scale combination with the leather collagen, which can further improve the multi-point combination of the acrylic polymer with the collagen. Thus, the filling property of the leather that treated by the auxiliary is improved without affect the yield of leather, and the chromium content in the waste water is significantly reduced.

Abstract: In various aspects, systems and methods are provided for operating a molten carbonate fuel cell, such as a fuel cell assembly, with increased production of syngas while also reducing or minimizing the amount of CO2 exiting the fuel cell in the cathode exhaust stream. This can allow for improved efficiency of syngas production while also generating electrical power.

Abstract: A method of additive manufacturing and heat treatment. A substrate is secured to a fixture and an additive manufacturing system is operated to perform a build process by building a part on the substrate secured to the fixture, the part being built by forming a series of layers of metallic material on the substrate, the metallic material melting and solidifying during the build process thereby bonding the part to the substrate and creating thermally induced stress in the part. The part, the substrate and the fixture are moved together from the additive manufacturing system to a heat treatment system, wherein the substrate remains secured to the fixture and the part remains bonded to the substrate as they are moved. The heat treatment system is operated to perform a heat treatment process by heating the part, the substrate and the fixture together thereby relieving the thermally induced stress in the part, the substrate remaining secured to the fixture during the heat treatment process.

Abstract: The present invention relates generally to steel compositions, methods of manufacturing the compositions and using the compositions to produce rimfire ammunition cartridges. The steel compositions for use in the rimfire cartridges are processed through cold-rolling and annealing steps to create suitable physical properties.

Abstract: A forging method is provided. The forging comprises determining plans of second and third processes for each of a plurality of ingots, categorizing the plurality of ingots into first and second ingot sets, based on the plans of the second and third processes, evaluating the first and second ingot sets using a scoring function, determining an ingot set to be provided to a first heating furnace, based on the evaluating of the first and second ingot sets, and performing a first process, different from the second and third processes, on the ingot set provided to the first heating furnace.

Abstract: A copper alloy for an electronic and electric device is provided. The copper alloy includes: Mg in a range of 0.15 mass % or more and less than 0.35 mass %; and a Cu balance including inevitable impurities, wherein the electrical conductivity of the copper alloy is more than 75% IACS, and a strength ratio TSTD/TSLD, which is calculated from strength TSTD obtained in a tensile test performed in a direction perpendicular to a rolling direction and strength TSLD obtained in a tensile test performed in a direction parallel to a rolling direction, is more than 0.9 and less than 1.1. The copper alloy may further include P in a range of 0.0005 mass % or more and less than 0.01 mass %.

Abstract: A steel sheet is provided with a coating providing sacrificial cathodic protection. The coating includes between 1 and 40% by weight zinc, between 0.01 and 0.4% by weight lanthanum, optionally up to 10% by weight magnesium, optionally up to 15% by weight silicon, and optionally up to 0.3% by weight, in cumulative amounts, of additional components, the remainder includes aluminum and unavoidable impurities or residual elements. A method of producing parts by hot or cold swaging and the parts which can be obtained in this way are also provided.

Abstract: The invention is a process for manufacturing a nano aluminum/alumina metal matrix composite and composition produced therefrom. The process is characterized by providing an aluminum powder having a natural oxide formation layer and an aluminum oxide content between about 0.1 and about 4.5 wt. % and a specific surface area of from about 0.3 and about 5 m2/g, hot working the aluminum powder, and forming a superfine grained matrix aluminum alloy. Simultaneously there is formed in situ a substantially uniform distribution of nano particles of alumina. The alloy has a substantially linear property/temperature profile, such that physical properties such as strength are substantially maintained even at temperatures of 250° C. and above.

Abstract: A wear resistant coating may comprise an amorphous metal comprising at least one refractory metal, at least two elements selected from periods 4, 5, 6, 9, and 10, and a metalloid. An amorphous metal may comprise at least one refractory metal, at least two elements selected from periods 4, 5, 6, 9, and 10, and a metalloid. A coating may comprise at least one refractory metal, at least two elements selected from periods 4, 5, 6, 9, and 10, and silicon. In some examples, the amorphous metal is TaWSi. In one example, the refractory metals may comprise Niobium, Molybdenum, Tantalum, Tungsten, Rhenium, or combinations thereof.

Abstract: The invention relates to a device for changing the temperature of a metal strip including means for changing the temperature of the metal strip by heating or cooling. By using means for conveying the metal strip, the metal strip is moved in the strip direction relative to the means for changing the temperature of the metal strip. The object of providing a device for changing the temperature of metal strips, which allows improved process control and improved flatness of the treated metal strip, is achieved according to the invention by a device in that means for changing the temperature of the metal strip include a plurality of individual temperature-control means which each heat or cool the metal strip only in some regions, and at least the position of a plurality of the temperature-control means can be individually changed translationally and/or rotationally relative to the metal strip.

Abstract: A method for producing a metal film from an over 50% nickel alloy melts more than one ton of the alloy in a furnace, followed by VOD or VLF system treatment, then pouring off to form a pre-product, followed by re-melting by VAR and/or ESU. The pre-product is annealed 1-300 hours between 800 and 1350° C. under air or protection gas, then hot-formed between 1300 and 600° C., such that the pre-product then has 1-100 mm thickness after the forming and is not recrystallized, recovered, and/or (dynamically) recrystallized having a grain size below 300 ?m. The pre-product is pickled, then cold-formed to produce a film having 10-600 ?m end thickness and a deformation ratio greater than 90%. The film is cut into 5-300 mm strips annealed 1 second to 5 hours under protection gas between 600 and 1200° C. in a continuous furnace, then recrystallized to have a high cubic texture proportion.

Abstract: According to certain embodiments, a method of producing a pattern on a substrate comprises securing a flexible polymeric substrate, printing a layer of ink as a negative pattern on the substrate, and placing the flexible polymeric substrate in a vacuum chamber. The method further includes uniformly applying, while the flexible polymeric is under a vacuum in the vacuum chamber, a layer of material over both the layer of ink and the substrate via physical vapor deposition and then removing the flexible polymeric substrate from the vacuum chamber. The method further includes removing the ink and material applied over the ink by immersing the flexible polymeric substrate in a solvent such that it results in a desired pattern of the material on the flexible polymeric substrate.

Abstract: A hard coating, which is to disposed to cover a surface of a tool substrate, has a total thickness of 0.5-20 ?m and includes an A layer and nanolayer-alternated layer that are alternately laminated by physical vapor deposition. The nanolayer-alternated layer includes a B layer and C layer that are alternately laminated. The A layer has a thickness of 50-1000 nm and is AlCr(SiC) nitride that is represented by a composition formula of [Al1-W-XCrW(SiC)X]N wherein an atomic ratio W is 0.20-0.80 and an atomic ratio X is 0.01-0.20. The B layer has a thickness of 1-100 nm and is TiAl nitride that is represented by a composition formula of [Ti1-YAlY]N wherein an atomic ratio Y is 0.30-0.85. The C layer has a thickness of 1-100 nm and is Ti(SiC) nitride represented by a composition formula of [Ti1-Z(SiC)Z]N wherein an atomic ratio Z is 0.05-0.45. The nanolayer-alternated layer has a thickness of 50-1000 nm.

Abstract: A method of manufacturing a display device is provided. A method of manufacturing a display device comprises preparing a thin film forming apparatus including a crucible, which stores a source material for forming a thin film, and a front heatsink, which is disposed on the crucible and includes a reflective plate, wherein the reflective plate has a first surface with a first reflectivity and a second surface with a second reflectivity, which is different from the first reflectivity; and forming a thin film on a substrate by evaporating the source material of the thin film forming apparatus.

Abstract: Embodiments of the disclosure generally relate to evaporation sources used for physical vapor deposition of material onto substrates and more particularly for controlled coating of large substrates, such as vacuum deposition of selenium on flexible substrates. In one embodiment an evaporation source for depositing a source material on a substrate is provided. The evaporation source includes a crucible having a base and a first plurality of walls surrounding an interior region of the crucible. The crucible further includes a supporting ridge extending inwardly towards the interior region. The evaporation source further includes a lid disposed on the supporting ridge, the lid including two or more adjacently positioned sheets, where each sheet includes a plurality of openings formed therethrough, and the plurality of openings in each sheet are not aligned with the plurality of openings formed in an adjacently positioned sheet.

Abstract: This invention provides a deposition apparatus which forms a film on a substrate, comprising: a rotation unit configured to rotate a target about a rotating axis; a striker configured to generate an arc discharge; a driving unit configured to drive the striker so as to make a close state which the striker closes to a side surface around the rotating axis of the target to generate the arc discharge; and a control unit configured to control rotation of the target by the rotation unit so as to change a facing position on the side surface of the target facing the striker in the close state.

Abstract: A pulsed laser deposition system comprising a split ablation target having a first half and a second half, wherein the target contains a film material for deposition on a substrate, and wherein the film material is comprised of a plurality of component elements, the elements varying in volatility, and wherein one half of the split ablation target contains more of the most volatile elements being deposited than the other half, and wherein the split ablation target is rotated about its center. A laser beam is rastered back and forth across the target such that the laser spends more time on one half of the split target than the other half depending on the elemental volatility. The target rotation and laser beam rastering are coordinated simultaneously to vary the elemental composition of the resulting film deposition.

Abstract: The present invention relates to a method for manufacturing a device for heat transmission, dissipation and highly efficient capillary siphoning action. The method comprises preparing a metal substrate; processing a surface of the metal substrate to form a rugged surface layer thereon; neutralizing, cleaning and drying the metal substrate to remove oil and rust thereon; placing the metal substrate into a first vacuum chamber for heating, deoxygenizing by hydrogen gas and ion bombarding to the rugged surface layer. Further, the metal substrate can be selectively subject to deposition, decomposition, degradation and reaction treatments for obtainment of a device for heat transmission, dissipation and highly efficient capillary siphoning action.

Abstract: A high-barrier film is provided that includes a biaxially-oriented polyethylene terephthalate (PET) layer having a first side and a second side opposite the first side, a cross-linked acrylic primer layer, and a metal barrier layer. The cross-linked acrylic primer layer is adjacent to the second side of the PET layer and has a dynamic coefficient of friction (?D) to steel of less than about 0.45, while the metal barrier layer is adjacent to the first side of the PET layer. The film has a total thickness of less than or equal to about 12 ?m. Processes for producing the high-barrier film are also provided.

Abstract: Device for processing a substrate are described herein. An apparatus for controlling deposition on a substrate can include a chamber comprising a shadow frame support, a substrate support comprising a substrate supporting surface, a shadow frame with a shadow frame body including a first support surface, a second support surface opposite the first surface, and a detachable lip connected with the shadow frame body. The detachable lip can include a support connection, a first lip surface facing the substrate, a second lip surface opposite the first lip surface, a first edge positioned over the first support surface, and a second edge opposite the first edge to contact the substrate.

Abstract: A method for producing a material based on silicon nanowires is provided. The method includes the steps of: i) bringing into contact, in an inert atmosphere, a sacrificial support based on a halogenide, a carbonate, a sulfate or a nitrate of an alkali metal, an alkaline earth metal or a transition metal having metal nanoparticles, with the pyrolysis vapours of a silicon source having a silane compound, by which silicon nanowires are deposited on the sacrificial support; and optionally ii) eliminating the sacrificial support and recovering the silicon nanowires produced in step ii).

Abstract: Described herein is a method of depositing a plasma resistant ceramic coating onto a surface of a chamber component using a non-line-of-sight (NLOS) deposition process, such as atomic layer deposition (ALD) and chemical vapor deposition (CVD). The plasma resistant ceramic coating consists of an erbium containing oxide, an erbium containing oxy-fluoride, or an erbium containing fluoride. Also described are chamber components having a plasma resistant ceramic coating of an erbium containing oxide, an erbium containing oxy-fluoride, or an erbium containing fluoride.

Abstract: There is provided a cleaning method of a film forming apparatus in which a process of forming a silicon film, a germanium film or a silicon germanium film on a substrate mounted on a substrate holder in a processing container is performed, comprising: etching away the silicon film, the germanium film or the silicon germanium film adhered to an interior of the processing container including the substrate holder by supplying a halogen-containing gas not containing fluorine into the processing container in a state where the substrate holder, which was stored in a dew point-controlled atmosphere after the film forming process, is accommodated in the processing container with no substrate being mounted thereon.

Abstract: A method comprises transporting a first stream of a carrier gas to a delivery device that contains a liquid precursor compound. The method further comprises transporting a second stream of the carrier gas to a point downstream of the delivery device. The first stream after emanating from the delivery device and the second stream are combined to form a third stream, such that the dew point of the vapor of the liquid precursor compound in the third stream is lower than the temperature of the plumbing that transports the vapor to a CVD reactor or a plurality of CVD reactors. The flow direction of the first stream, the flow direction of the second stream and the flow direction of the third stream are unidirectional and are not opposed to each other.

Abstract: Method of depositing an atomic layer on a substrate. The method comprises supplying a precursor gas from a precursor-gas supply of a deposition head that may be part of a rotatable drum. The precursor gas is provided from the precursor-gas supply towards the substrate. The method further comprises moving the precursor-gas supply by rotating the deposition head along the substrate which in its turn is moved along the rotating drum.

Abstract: A processing method includes a first process of exposing a first sensor to a processing space within a chamber and blocking a second sensor from the processing space within the chamber; a second process of supplying a first processing gas containing a precursor gas into the chamber; a third process of controlling a state within the chamber based on a measurement value of the first sensor; a fourth process of blocking the first sensor from the processing space within the chamber and exposing the second sensor to the processing space within the chamber; a fifth process of supplying a second processing gas containing a reactant gas into the chamber; and a sixth process of controlling the state within the chamber based on a measurement value of the second sensor. The first process to the six process are repeatedly performed multiple times.

Abstract: An enclosed-channel reactor system is provided, which includes: a reactor body having a plurality of enclosed channels therein; an upper cap disposed at one end of the reactor body and having an inlet port communicating with the plurality of enclosed channels; a lower cap disposed at the other end of the reactor body opposite to the upper cap and having an outlet port communicating with the plurality of enclosed channels; and at least a conduit plate disposed between the upper cap and the reactor body for guiding a precursor injected from the inlet port into the plurality of enclosed channels uniformly.

Abstract: The gas jetting apparatus according to the present invention includes a gas jetting cell unit for rectifying a gas and jetting the rectified gas into the film formation apparatus. The gas jetting cell unit has a fan shape internally formed with a gap serving as a gas route. A gas in a gas dispersion supply unit enters from a wider-width side of the fan shape into the gap, and, due to the fan shape, the gas is rectified, accelerated, and output from a narrower-width side of the fan shape into the film formation apparatus.

Abstract: Methods of forming 2D metal chalcogenide films using laser-assisted atomic layer deposition are disclosed. A direct-growth method includes: adhering a layer of metal-bearing molecules to the surface of a heated substrate; then reacting the layer of metal-bearing molecules with a chalcogenide-bearing radicalized precursor gas delivered using a plasma to form an amorphous 2D film of the metal chalcogenide; then laser annealing the amorphous 2D film to form a crystalline 2D film of the metal chalcogenide, which can have the form MX or MX2, where M is a metal and X is the chalcogenide. An indirect growth method that includes forming an MO3 film is also disclosed.

Abstract: The present invention pertains to a multilayer tubular article, to processes for the manufacture of said multilayer tubular article and to uses of said multilayer tubular article in upstream applications for conveying hydrocarbons from a well to a floating off-shore unit via a bottom platform.

Abstract: A composite can include a substrate and a conversion coating overlying the substrate and comprising at least one of a zirconium oxide, a hafnium oxide, or a combination thereof. The conversion coating can be formed from a zirconia or hafnia-based complex obtained by reacting at least one of a zirconium ion source, a hafnium ion source, or a combination thereof, with a chelating compound in a reaction and another chelating compound in another reaction.

Abstract: Compounds and compositions are used as corrosion inhibitors for pipelines for crude oil containing water with high salt concentrations. The inhibitors are ionic liquids, imidazoles, benzotriazoles, and mixtures thereof. The composition includes two or more members of the inhibitors with a solvent. The inhibitors reduce corrosion of metallic surfaces of the pipelines containing crude oil having 0.2 and 40 wt % water, 10,000 to 70,000 ppm salt, and 9 to 600 ppm hydrogen sulfide. A synergic effect is provided by two or more different inhibitors. This synergy is derived from interactions with the metallic surface, among themselves or with the corrosive medium depending on the chain length, to inhibit the corrosion with decrease of the formulation dose. The composition can be a ternary formulation of the three families or two components of one family and a third component of a different family.

Abstract: Features for an aqueous reactor include a field generator. The field generator includes a series of parallel conductive plates including a series of intermediate neutral plates. The intermediate neutral plates are arranged in interleaved sets between an anode and a cathode. Other features of the aqueous reactor may include a sealed reaction vessel, fluid circulation manifold, electrical power modulator, vacuum port, and barrier membrane. Methods of using the field generator include immersion in an electrolyte solution and application of an external voltage and vacuum to generate hydrogen and oxygen gases. The reactor and related components can be arranged to produce gaseous fuel or liquid fuel. In one use, a mixture of a carbon based material and a liquid hydrocarbon is added. The preferred carbon based material is powdered coal.

Abstract: The claimed invention provides an economical cathode for electrolysis and a method of manufacturing the same. The cathode includes a conductive base and a catalyst layer including a catalyst component. The conductive base, e.g. a wire mesh, includes plural intersection portions and is made of nickel. The cathode catalyst layer includes a catalyst component, such as platinum, and is formed by applying an application liquid to the base and drying and solidifying the liquid. The solidified portion of the applied liquid is not formed in the intersection portions of the base, or even if formed, the cross-sectional shape of the solidified portion has mesh-shaped pores with an average porosity of 15% or larger. The base is prepared by preheating to a temperature from 43° C. to 120° C. immediately before applying the application liquid, and thereafter the cathode catalyst layer is formed.

Abstract: Provided is a method capable of producing, in a simple and low-cost manner, an electrolysis electrode which can be used in alkaline water electrolysis and has superior durability against output variation. The method for producing an anode for alkaline water electrolysis includes: a step of dissolving lithium nitrate and a nickel carboxylate in water to prepare an aqueous solution containing lithium ions and nickel ions, a step of applying the aqueous solution to the surface of a conductive substrate having at least the surface composed of nickel or a nickel-based alloy, and a step of subjecting the conductive substrate to which the aqueous solution has been applied to a heat treatment at a temperature within a range from at least 450° C. to not more than 600° C., thereby forming a catalyst layer composed of a lithium-containing nickel oxide on the conductive substrate.

Abstract: Disclosed are cathodes comprising a conductive support substrate having a catalyst coating containing nickel phosphide nanoparticles. The conductive support substrate is capable of incorporating a material to be reduced, such as CO2 or CO. Also disclosed are electrochemical methods for generating hydrocarbon and/or carbohydrate products from CO2 or CO using water as a source of hydrogen.

Abstract: A mining method (10) by which graphitic ore is produced in a form that constitutes an appropriate feedstock for an electrolytic process (20) for the production of graphitic materials through exfoliation. The graphitic ore feedstock may be utilised directly as an electrode in the electrolytic process (20). Also disclosed is a graphitic feedstock for an electrolytic process for the production of graphitic material through exfoliation of that feedstock, wherein the feedstock is less than about 99% graphite (w/w) and of a sufficiently cohesive and conductive nature as to allow electrochemical exfoliation therethroughout without fracturing that might result in collapse of a significant portion of the feedstock or that may result in a loss of conductivity throughout a significant portion of the feedstock.

Abstract: There is provided a tin-plated product having an excellent minute sliding abrasion resistance property when it is used as the material of insertable and extractable connecting terminals, and a method for producing the same. After a nickel layer 16 is formed on a substrate 10 of copper or a copper alloy so as to have a thickness of 0.1 to 1.5 ?m by electroplating, a tin-copper plating layer 12 containing tin 12b mixed with a copper-tin alloy 12a is formed thereon so as to have a thickness of 0.6 to 10 ?m by electroplating using a tin-copper plating bath which contains 5 to 35% by weight of copper with respect to the total amount of tin and copper, and then, a tin layer 14 is formed thereon so as to have a thickness of 1 ?m or less by electroplating if necessary.

Abstract: Some embodiments are directed to techniques for building single layer or multi-layer structures on dielectric or partially dielectric substrates. Certain embodiments deposit seed layer material directly onto substrate materials while others use an intervening adhesion layer material. Some embodiments use different seed layer and/or adhesion layer materials for sacrificial and structural conductive building materials. Some embodiments apply seed layer and/or adhesion layer materials in what are effectively selective manners while others apply the materials in blanket fashion. Some embodiments remove extraneous material via planarization operations while other embodiments remove the extraneous material via etching operations. Other embodiments are directed to the electrochemical fabrication of multilayer mesoscale or microscale structures which are formed using at least one conductive structural material, at least one conductive sacrificial material, and at least one dielectric material.

Abstract: An electrocoating composition and a coating formed from the composition are described herein. The electrocoating composition includes at least an epoxy resin component, an isocyanate-functional component and a silica-based additive. The coating shows about 40 to 70% reduction in edge corrosion relative to a conventional coating.

Abstract: A resistance measuring module for measuring electric resistance of a substrate holder is provided. The substrate holder has an electric contact configured to feed a current to a held substrate and contactable with the substrate. The substrate holder is able to hold a testing substrate for measurement of electric resistance of the substrate holder, and is configured such that the electric contact comes into contact with the testing substrate in a state where the testing substrate is held. The resistance measuring module includes: a test probe contactable with the testing substrate held in the substrate holder; and a resistance measuring instrument for measurement of a resistance value between the electric contact and the probe via the testing substrate.

Abstract: In an electrodeposition system, the final quality of a coating is prevented from being degraded due to a coating material-containing aqueous solution flowing out of a steel plate mating portion during a drying process, while derivative problems such as an increase in the size of the system, an increase in the initial costs and the running costs, and a decrease in reliability are avoided. A washing zone that is subsequent to an electrodeposition zone in which an object to be coated is immersed in a coating material solution for electrodeposition so that a coating is formed on a surface of the object to be coated is provided with: a hot water washing tank in which the coated object is washed by being immersed in high-temperature washing water in the tank; and a spray washer that sprays a steel plate mating portion of the coated-object with high-temperature washing water, subsequent to washing in the hot water washing tank.

Abstract: The method is a method of evaluating a manufacturing process of a silicon material, wherein the manufacturing process includes a process that uses a member containing a carbon-containing sintered body, and the method of evaluating the manufacturing process of a silicon material includes performing DLTS measurement on a silicon material manufactured in the manufacturing process, and estimating a heavy metal contamination source of a silicon material manufactured in the manufacturing process with an indicator in the form of presence/absence of detection of a peak of a carbon-related level and presence/absence of detection of a peak of a heavy metal-related level in a DLTS spectrum obtained by the DLTS measurement.

Abstract: A semiconductor substrate for being used as a base substrate for epitaxial crystal growth by HVPE method includes a ?-Ga2O3-based single crystal, and a principal surface that is a plane parallel to a [010] axis of the ?-Ga2O3-based single crystal. An epitaxial wafer includes the semiconductor substrate, and an epitaxial layer that includes a ?-Ga2O3-based single crystal and is formed on the principal surface of the semiconductor substrate by epitaxial crystal growth using the HVPE method. A method for manufacturing the epitaxial wafer includes forming the epitaxial layer by epitaxial crystal growth using the HVPE method on the semiconductor substrate.