Abstract: A concealing device for an imager of a vehicle includes a photochromic lens cover with an external surface that is co-extensive with an adjacent portion of the vehicle and disposed proximate a lens of the imager. The photochromic lens cover is operable between a first condition wherein the photochromic lens cover is exposed to ultraviolet light and darkens to a transmissivity of less than 15% and a second condition wherein the photochromic lens cover includes a transmissivity of greater than 50%.

Abstract: The invention provides a hoist mechanism for a backdrop as used in the photographic setting. The hoist uses two vertical channels, each having and upper and a lower pull around which a belt is attached. A bracket, secured to the belt, is used to secure a roller of the backdrop thereto. A connecting rod, secured to the lower pullies of the vertical channels, is used to keep the two belts operating in concert. A hand crank, secured to the connecting rod, permits the operator to move the two brackets up/down which moves the a roller having the backdrop in like fashion.

Abstract: An image capturing apparatus having a forced air cooling function and capable of having an accessory attached thereto includes an image capturing apparatus body. A lens mount is provided on the apparatus body and can have a shooting lens removably attached thereto. An attachment portion is provided on the apparatus body and can have the accessory removably attached thereto. A built-in microphone is arranged on a side of a surface of the apparatus body, different from any of a surface where an air outlet port for discharging air used for forced cooling is arranged, a surface where the lens mount is arranged, and a surface where the attachment portion is arranged. The built-in microphone is arranged at a location closer to a top surface of the image capturing apparatus body than a bottom surface thereof.

Abstract: An apparatus having a housing, an arm, a motor, and a camera mount. The housing may be connected to a ceiling of a room. The arm may have (i) a pivot portion connected to the housing and (ii) a portion extending from the pivot portion in a first direction. The motor may be connected to the pivot portion of the arm to move the arm in response to a control signal. The camera mount may be connected to an end of the portion of the arm.

Abstract: A projection optical apparatus includes a first lens group, a first lens barrel holding the first lens group, a first optical path deflector disposed at a demagnifying side of the first lens group, a resin frame holding the first optical path deflector and including a first opening in which the first lens barrel is fitted, and a first reinforcing member disposed around an outer circumference of the first opening.

Abstract: An electronic device includes blowers. Blowers cool liquid crystal panels for light modulation mounted on illumination optical system for outputting light to a projection lens, respectively, and are disposed on the opposite side to the side where the projection lens of three liquid crystal panels is disposed and are arranged side by side along a first direction facing two liquid crystal panels of three liquid crystal panels.

Abstract: A casing of a projector has a leg part provided at a first surface, and a recessed part located at the first surface. The leg part has a shaft part provided pivotally in relation to the casing, and a cover part fixed to the shaft part and pivoting with the shaft part. The shaft part protrudes from or is inserted in the casing according to the pivoting of the shaft part. The cover part has a sidewall part covering a part of the shaft part. The recessed part accommodates at least a part of the sidewall part.

Abstract: An illumination device includes a light emitting element emitting first light, wavelength conversion element converting the first light into second, first optical element, second optical element having a first area transmitting the second light, and second area transmitting part of the first light and reflecting another part, and third optical element having a third area transmitting the second light, and fourth area transmitting part of the first light and reflecting another part. The first area first light transmittance in the second optical element is higher than that in the second area, the second optical element position made switchable between first and second positions, the third area first light transmittance in the third optical element is higher than that in the fourth area, the third optical element position is made switchable between third and fourth positions, and the fourth area first light transmittance is different from that in the second area.

Abstract: A wavelength conversion device and a light-emitting device and a projection device using the wavelength conversion device are provided. The wavelength conversion device includes a substrate capable of rotating around a rotating shaft, the substrate includes a first surface and a second surface opposite to each other, and an annular side surface, which is formed between the first surface and the second surface and is not perpendicular to the first surface. The first surface is provided with a wavelength conversion material layer, and the annular side surface includes a first area and a second area. The first area and the second area are used to reflect incident light beams.

Abstract: A vehicle includes at least one side bay equipped with a window, and a device for displaying at least one item of information on the window. The display device includes an image projector fastened to a ceiling of the vehicle. The display device emits light rays. A system of at least one mirror is arranged to reflect light rays emitted by the image projector in the direction of the window.

Abstract: A reflective mask blank including a substrate, and a multilayer reflection film for EUV light reflection, a protection film, and an absorber film for EUV light absorption formed on one main surface of the substrate in this order from the substrate side, and a conductive film formed on another main surface of the substrate, a coordinate reference mark is formed on the other main surface side.

Abstract: A mask blank in which a phase shift film provided on a light-permeable substrate includes at least a nitrogen-containing layer and an oxygen-containing layer, the nitrogen-containing layer is made from a silicon nitride-based material and the oxygen-containing layer is made from a silicon oxide-based material, wherein, when the nitrogen-containing layer is subjected to X-ray photoelectron spectroscopy to obtain a maximum peak PSi_f of photoelectron intensity of a Si2p narrow spectrum and the light-permeable substrate is subjected to X-ray photoelectron spectroscopy to obtain a maximum peak PSi_s of photoelectron intensity of a Si2p narrow spectrum, the numerical value (PSi_f)/(PSi_s), which is produced by dividing the maximum peak PSi_f in the nitrogen-containing layer by the maximum peak PSi_s in the light-permeable substrate, is 1.09 or less.

Abstract: The present disclosure relates to a fabrication method of a photomask. The method of fabricating a photomask provides for a layout of patterns to be designed. The layout of patterns may be formed on a wafer on which chips are formed. The layout of patterns are corrected to provide a layout of a photoresist pattern serving as an etching mask for forming the patterns on the wafer while generating a flare map of the patterns. An optical proximity correction (OPC) may be performed at a chip level on the corrected layout of patterns to perform a secondary correction of the layout of patterns. A second OPC may be performed at a level of a shot which includes a plurality of ones of the chips by reflecting the flare map on the second corrected layout of patterns to a third corrected layout of patterns.

Abstract: Disclosed herein are methods of using a fluoro oil mask to prepare a beam pen lithography pen array.

Abstract: A photomask assembly may be formed such that stress relief trenches are formed in a pellicle frame of the photomask assembly. The stress relief trenches may reduce or prevent damage to a pellicle that may otherwise result from deformation of the pellicle. The stress relief trenches may be formed in areas of the pellicle frame to allow the pellicle frame to deform with the pellicle, thereby reducing the amount damage to the pellicle caused by the pellicle frame.

Abstract: A reticle enclosure includes a base including a first surface, a cover including a second surface and coupled to the base with the first surface facing the second surface. The base and the cover form an internal space that includes a reticle. The reticle enclosure includes restraining mechanisms arranged in the internal space and for securing the reticle, and structures disposed adjacent the reticle in the internal space. The structures enclose the reticle at least partially, and limit passage of contaminants between the internal space and an external environment of the reticle enclosure. The structures include barriers disposed on the first and second surfaces. In other examples, a padding is installed in gaps between the barriers and the first and second surfaces. In other examples, the structures include wall structures disposed on the first and second surfaces and between the restraining mechanisms.

Abstract: A method is described for utilizing NIL materials with switchable mechanical properties. The method comprises applying an imprint mask to a nano-imprint lithography (NIL) material layer. The NIL material layer is comprised of a NIL material with a modulus level below a flexibility threshold. The NIL material layer has an internal property, that when changed, causes a change in the modulus level of the NIL material. The method further comprises detaching the imprinted NIL material layer from the imprint mask, with the low modulus level of the NIL material causing a shape of the imprinted NIL material layer to remain unchanged after detachment. A modulus level of the NIL material is increased by changing an internal property of the NIL material, with the modulus level increased beyond a strength threshold to create a first imprint layer that has a structure that remains unaffected by a subsequent process.

Abstract: A method for functionalising a substrate intended for the self-assembly of a block copolymer, includes depositing on the surface of a substrate a layer of a first polymer material, the first polymer having a first chemical affinity with respect to the block copolymer; grafting one part only of the first polymer material layer onto the surface of the substrate; printing, using a mould, patterns in a sacrificial layer arranged above the grafted part of the first polymer material layer; transferring the patterns of the sacrificial layer into the grafted part of the first polymer material layer, until the substrate is reached; and removing at least one part of the sacrificial layer by wet etching, so as to uncover the grafted part of the first polymer material layer.

Abstract: A template for imprint comprises a main body having a bottom surface, a middle surface on a portion protruding relative to the bottom surface, and a pattern surface on a portion protruding relative to the middle surface, the pattern surface having an uneven pattern, wherein an outer edge of the pattern surface has a jigsaw shape, wherein a light-shielding member having a light transmittance lower than a light transmittance of the main body is disposed on the middle surface to surround the outer edge of the pattern surface in a plan view as viewed from the pattern surface, and wherein an outer edge of light-shielding member defines four sides having a shape in which a center of each side bulges outward with respect to a rectangle surrounding the outer edge of the pattern surface in the plan view, and wherein the shape of each side bulges outwardly in a stepwise manner from the ends of each side to the center of each side.

Abstract: Asymmetric structures formed on a substrate and microlithographic methods for forming such structures. Each of the structures has a first side surface and a second side surface, opposite the first side surface. A profile of the first side surface is asymmetric with respect to a profile of the second side surface. The structures on the substrate are useful as a diffraction pattern for an optical device.

Abstract: A color conversion layer and a manufacturing method of the same are provided. The manufacturing method of the color conversion layer includes steps of: subjecting a block copolymer thin film to self-assembly to obtain a self-assembled block copolymer thin film, including a plurality of main parts arranged in order, and a plurality of spacing parts disposed between the plurality of main parts; forming a protective layer covering the main parts; removing the spacing parts to form a plurality of grooves arranged in order; and dropping a color conversion layer ink into the grooves, followed by drying the color conversion layer ink to obtain the color conversion layer.

Abstract: Disclosed are a semiconductor photoresist composition including an organometallic compound including at least one selected from compounds represented by Chemical Formulae 1 to 3 and a solvent, and a method of forming patterns using the semiconductor photoresist composition on an etching-objective layer to form a photoresist layer, patterning the photoresist layer to form a photoresist pattern, and etching the etching-objective layer using the photoresist pattern as an etching mask.

Abstract: A resist composition is disclosed which comprises a perovskite material with a structure having a chemical formula selected from ABX3, A2BX4, or ABX4, wherein A is a compound containing an NH3 group, B is a metal and X is a halide constituent. The perovskite material may comprise one or more of the following components: halogen-mixed perovskite material; metal-mixed perovskite material, and organic ligand mixed perovskite material.

Abstract: A resist composition comprising a base polymer and a quencher in the form of a salt of a cyclic ammonium cation with a carboxylate, sulfonamide, halogenated phenoxide or halide anion offers a high sensitivity and minimal LWR or improved CDU, independent of whether it is of positive or negative tone.

Abstract: A negative type photosensitive resin composition containing an epoxy group-containing resin; a metal oxide; and a cationic polymerization initiator (I). The cationic polymerization initiator (I) contains one or more of a compound represented by Formula (I1) and a compound represented by Formula (I2). In Formula (I1), Rb01 to Rb04 represent an aryl group which may have a substituent or a fluorine atom. In Formula (I2), Rb05 represents a fluorinated alkyl group which may have a substituent or a fluorine atom. A plurality of Rb05's may be the same as or different from one another. q represents an integer of 1 or greater, and Qq+'s each independently represent a q-valent organic cation.

Abstract: A chemical supply structure includes a bar-shaped body having a plurality of chemical reservoirs in which a plurality of chemicals is individually stored such that the body partially crosses an underlying substrate, a bar-shaped nozzle protruded from a bottom surface of the body and injecting injection chemicals onto the substrate, a plurality of the chemicals being mixed into the injection chemicals, and a hydrophobic unit arranged on the bottom surface of the body and on a side surface of the nozzle such that a mixed solution mixed with the injection chemicals is prevented from adhering to the bottom surface and the side surface by controlling a contact angle of the mixed solution with respect to the bottom surface and the side surface.

Abstract: A method for mask data synthesis and mask making includes calibrating an optical proximity correction (OPC) model by adjusting a plurality of parameters including a first parameter and a second parameter, wherein the first parameter indicates a long-range effect caused by an electron-beam lithography tool for making a mask used to manufacture a structure, and the second parameter indicates a geometric feature of a structure or a manufacturing process to make the structure, generating a device layout, calculating a first grid pattern density map of the device layout, generating a long-range correction map, at least based on the calibrated OPC model and the first grid pattern density map of the device layout, and performing an OPC to generate a corrected mask layout, at least based on the generated long-range correction map and the calibrated OPC model.

Abstract: An extreme ultraviolet light source system includes a chamber configured to maintain a pressure of an inner space thereof at a first pressure, a droplet supply unit disposed in the chamber and configured to discharge a droplet on a first path, a light source configured to emit a light for generating plasma by irradiating a laser light to the droplet at a focal point on the first path, and a suction unit disposed on the first path so as to face the droplet supply unit in the chamber and configured to suction debris of the droplet irradiated with the laser light at a second pressure, lower than the first pressure, wherein the suction unit includes a nozzle protruding from a side wall of the chamber toward the focal point, and an end of the nozzle is closer to the focal point than it is to the side wall of the chamber.

Abstract: A method for producing a reflecting optical element for a projection exposure apparatus (1). The element has a substrate (30) with a substrate surface (31), a protection layer (38) and a layer partial system (39) suitable for the EUV wavelength range. The method includes: (a) measuring the substrate surface (31), (b) irradiating the substrate (30) with electrons (36), and (c) tempering the substrate (30). Furthermore, an associated reflective optical element for the EUV wavelength range, a projection lens with a mirror (18, 19, 20) as reflective optical element, and a projection exposure apparatus (1) including such a projection lens.

Abstract: An optical assembly and a method of making an optical assembly in which additive manufacturing techniques are used to form a support structure either directly on an optical element or on a carrier that is subsequently bonded to an optical element.

Abstract: A projection exposure apparatus for semiconductor technology includes an optical arrangement with an optical element having an optically effective surface. The optical arrangement also includes an actuator embedded in the optical element. The actuator is outside the optically effective surface and outside the region located behind the optically effective surface. The optical arrangement is set up to deform the optically effective surface.

Abstract: An arrangement of a microlithographic optical imaging device includes first and second supporting structures. The first supporting structure supports at least one optical element of the imaging device via an active relative situation control device of a control device. The first supporting structure supports the second supporting structure via supporting spring devices of a vibration decoupling device. The supporting spring devices act kinematically parallel to one another. Each supporting spring device defines a supporting force direction and a supporting length along the supporting force direction. The second supporting structure supports a measuring device of the control device. The measuring device is connected to the relative situation control device. The measuring device outputs to the relative situation control device measurement information representative for the position and/or the orientation of the at least one optical element in relation to a reference in at least one degree of freedom in space.

Abstract: In a dissection method for layout patterns in a semiconductor device, a design layout is divided into a plurality of patches. A plurality of first dissection points for target layout patterns in the target patch and neighboring layout patterns in the neighboring patches are set based on vertexes of the target and neighboring layout patterns. At least one second dissection point for at least one exceptional layout pattern is set. The at least one exceptional layout pattern is a layout pattern in which the first dissection points are not set and which extends to pass through boundaries of one patch. A plurality of third dissection points for the target layout patterns and the neighboring layout patterns are set based on the first and second dissection points. The target layout patterns are divided into a plurality of target segments based on the first, second and third dissection points.

Abstract: Calibrating stochastic signals in compact modeling is provided by obtaining data of process variations in producing a resist mask; calibrating a continuous compact model of the resist mask based on the data; evaluating the continuous compact model against a stochastic compact model that is based on the data; choosing a functional description of an edge location distribution for the stochastic compact model; mapping image parameters from the evaluation to edge distribution parameters according to the functional description; determining an edge location range for the stochastic compact model based on scaled measurements from the image parameters; calibrating a threshold for the resist mask and updating parameters of the stochastic compact model to reduce a difference between the data and a modeled Line Edge Roughness (LER) value; and outputting the stochastic compact model.

Abstract: First and second metrology data are used to train a machine-learning model to predict metrology data for a metrology target based on metrology data for a device area. The first metrology data are for a plurality of instances of a device area on semiconductor die fabricated using a fabrication process. The second metrology data are for a plurality of instances of a metrology target that contains structures distinct from structures in the device area. Using the trained machine-learning model, fourth metrology data are predicted for the metrology target based on third metrology data for an instance of the device area. Using a recipe for the metrology target, one or more parameters of the metrology target are determined based on the fourth metrology data. The fabrication process is monitored and controlled based at least in part on the one or more parameters.

Abstract: Methods and apparatus for determining a focus of a projection system are disclosed. In one arrangement, a method includes obtaining first data derived from a first measurement of one or more selected properties of a target pattern formed on a substrate by exposing the substrate using the projection system. The first measurement is performed before the substrate is etched based on the target pattern. The method further includes obtaining second data derived from a second measurement of the one or more selected properties of the target pattern. The second measurement is performed after the substrate is etched based on the target pattern. The method further includes determining the focus of the projection system using the first data and the second data.

Abstract: Described is a metrology system for determining a characteristic of interest relating to at least one structure on a substrate, and associated method. The metrology system comprises a processor being configured to computationally determine phase and amplitude information from a detected characteristic of scattered radiation having been reflected or scattered by the at least one structure as a result of illumination of said at least one structure with illumination radiation in a measurement acquisition, and use the determined phase and amplitude to determine the characteristic of interest.

Abstract: A toner comprising a resin that contains an amorphous segment and a crystalline segment as a binder resin, wherein a proportion of a tetrahydrofuran-insoluble matter of a resin component is from 40% by mass to 80% by mass; in differential scanning calorimeter measurement of the tetrahydrofuran-insoluble matter, where a temperature of a maximum endothermic peak is denoted by Tm [° C.] and an endothermic quantity is denoted by H(I) [J/g], the following formulas (1) and (2) are satisfied: 55.0?Tm?80.0??(1) 10.0?H(I)?80.0??(2).

Abstract: A polyester resin, including: (a) a constitutional unit derived from at least one tetravalent carboxylic acid selected from Compounds (A) and (B); a constitutional unit derived from a bisphenol A-alkylene oxide adduct; and a constitutional unit derived from an aliphatic alcohol having a boiling point of lower than or equal to 290° C.

Abstract: Provided is an image forming method using a toner for developing an electrostatic charge image and an electrophotographic photoreceptor, and containing at least a charging step, an exposing step, a developing step and a transferring step, wherein the electrophotographic photoreceptor has a photosensitive layer, and the photosensitive layer contains a triphenylamine derivative having a specific structure as a charge transport material, and the toner for developing an electrostatic charge image contains at least titanic acid compound particles as an external additive.

Abstract: An image forming apparatus includes: a first rotatable member; a second rotatable member that presses against the first rotatable member in a pressed state and separates from the first rotatable member in a separated state; and a hardware processor that sets a target speed of the second rotatable member based on a change in speed of the second rotatable member between a first speed in the separated state and a second speed in the pressed state.

Abstract: A housing includes a first side wall having a first opening and a second side wall arranged spaced away from the first side wall in a first direction. A drawer detachably supports a drum unit. The drawer moves through the first opening between an inside position at which the drawer is located inside the housing and an outside position at which the drawer is located outside the housing. An LED unit moves between: a first position at which the LED unit exposes the photosensitive drum; and a second position at which the LED unit is farther away from the photosensitive drum than at the first position and the LED unit is closer to the first side wall in the first direction than at the first position.

Abstract: An optical head comprises a substrate on which optical elements are arranged in a main scanning direction, a lens unit that transmits light emitted from the optical elements or light entering the optical elements, and a holder that holds the lens unit. The holder has a sidewall extending in the main scanning direction. The sidewall has a hole at a position facing the lens unit. A fixing member is provided in the hole. The fixing member fixes the lens unit to the sidewall.

Abstract: A light source according to the present invention is for an exposure device of a multifunction peripheral and includes a multi-beam light source. Two laser diodes included in the multi-beam light source are individually driven by a laser driver. Reference signals Vref1 and Vref2 used to control the light emitting power of the laser diodes are individually generated by two reference signal generation circuits. The reference signals Vref1 and Vref2 are each generated by processing including digital calculation, and at least one of the reference signals Vref1 and Vref2 includes a component for correcting the relative output difference of the laser diodes.

Abstract: An image forming apparatus includes: a photoreceptor that forms a toner image; a light emission element that exposes the photoreceptor; at least one light emission controller that controls light emission of the light emission element; and a hardware processor that transmits a signal including a control parameter for controlling the light emission element with respect to the light emission controller, wherein the light emission controller stops light emission control over the light emission element according to communication that receives the signal including the control parameter from the hardware processor.

Abstract: A developing apparatus includes a first conveyance screw in a first chamber and a second conveyance screw in a second chamber, a developer accommodating portion disposed above the second conveyance screw, and an opening portion in the accommodating portion and through which the developer is supplied to the second chamber. In addition, a sealing sheet is attached to a sheet attaching portion and seals the opening portion, and a sheet discharge portion is disposed above the sheet attaching portion and discharges the sealing sheet to out of the developing apparatus. The sheet discharge portion is formed along a radial direction of the second conveyance screw in a cross section perpendicular to a rotation axis direction of the second conveyance screw.

Abstract: A method of converting developer in a printer cartridge, comprising the steps: providing a developer unit of a printer cartridge; removing a first mixture of a developer and a first toner from the developer unit; sieving the first mixture of the developer and the first toner; removing the first toner from the first mixture of the developer and the first toner; mixing a second toner to the developer to create a second mixture of the developer and the second toner, wherein the second toner is a different toner than the first toner; and adding the second mixture of the developer and the second toner into the developer unit of the printer cartridge.

Abstract: A developing cartridge includes a casing, a developing roller, a supply roller, a first agitator and a second agitator. The casing is configured to accommodate toner therein. The supply roller is configured to supply the toner to the developing roller. The first agitator is configured to agitate the toner in the casing. The second agitator is configured to agitate the toner in the casing. The second agitator is positioned between the first agitator and the supply roller. The second agitator includes a blade having a tip end configured to contact a peripheral surface of the supply roller.

Abstract: An electrophotographic member comprises a base member and an elastic layer on the base member. The elastic layer contains a silicone rubber, an ionic electroconductive agent, and an inorganic particle, and the inorganic particle contains a hydroxide of at least one of magnesium or aluminum, and has a silicon atom on a surface thereof in an amount of 0.50 to 2.00 atomic %. An aqueous dispersion of which 5 mg of the inorganic particle is dispersed in 10 ml of water has a turbidity of 200 NTU or more and 1,240 NTU or less.

Abstract: An image recording apparatus includes a first path for conveying a recording medium in order of a stacking portion on which the recording medium is stacked, a recording portion for recording an image on the recording medium, a heating portion for heating the image, and a discharge portion for discharging the recording medium; a second path branching off from the first path at a first branch part between the recording portion and the heating portion, and for discharging the recording medium to the discharge portion without passing through the heating portion; and a third path branching off from the first path at a second branch part between the recording portion and the first branch part, and for conveying the recording medium, the recording surface of which is inverted, toward a location between the stacking portion and the recording portion in the first path.