Abstract: A material characteristic value prediction system that can predict material characteristic values with high accuracy is provided. Also provided is a method of manufacturing a metal sheet that can improve the product yield rate, by changing manufacturing conditions of subsequent processes.

Abstract: The present invention refers to the recovery of high-value metals such as gold and silver from ores containing them by the leaching process that is carried out in tanks or reactors, and to the destruction of cyanide, which is carried out in cyanide destruction (detox) tanks at the end of the leaching process, to avoid damage to the environment. An oxygen diffuser with a specific design is provided which is used in pulp leaching tanks and in cyanide destruction (detox) tanks containing residual pulp, with the application of oxygen, whereby better results are obtained in the recovery of metals, in the application of oxygen and in retention time, among others.

Abstract: Solutions and methods for leaching coinage metals. For example, Solutions and methods for leaching copper and/or silver from a substance comprising copper and/or silver (such as a coinage metal-concentrate, or electronic waste) using a water-miscible stabilizer in combination with leaching reagents to form leach solutions.

Abstract: A method for recovering a valuable substance is provided. The method includes a thermal treatment step of thermally treating a target, which contains a valuable substance and is stored in a target storing unit, via a flame blocking unit configured to block a flame for thermally treating the target such that the target storing unit is not contacted by the flame, and a valuable substance recovering step of recovering the valuable substance from a thermally treated product of the target obtained in the thermal treatment step.

Abstract: A method is described for recycling nickel from waste battery material. The method includes providing waste battery material comprising a nickel-containing oxide, reducing the nickel in the waste battery material to the zero oxidation state to provide a reduced waste battery material, reacting the reduced waste battery material with carbon monoxide to form Ni(CO)4, and reacting the Ni(CO)4 with a source of sulfate to form NiSO4. The NiSO4 product is useful as a nickel feedstock in various processes which require a nickel source, including processes which prepare new battery materials.

Abstract: A method for concentrating and collecting lithium and lithium compounds via a fluidized bed reactor is disclosed. A hopper receives crushed and pulverized lithium ore, and a feeder tube transfers the crushed and pulverized lithium ore to a fluidized bed reactor. An air mixing chamber receives pressurized air from a pressurized gas inlet and a distributor plate is positioned between the air mixing chamber and the fluidized bed reactor to distribute air pressure across the bottom of the fluidized bed reactor. A cyclone receives a material from the fluid bed reactor and transmits the material to a flume for collection or redistribution through a series of fluid bed reactors for further refinement.

Abstract: Weak acid lixiviants are used to selectively extract calcium from various sources (e.g., steel slag, impure lime, dolomite). Preferably, non-amine weak acids (e.g., weak acids that do not include an amine) as lixiviants are used. Such lixiviants can be used in stoichiometric quantities relative to calcium content of the calcium source material.

Abstract: A product comprising recycled metal fragments and an alloying supplement, and methods and system for producing same. In some examples, the product comprises a container, shot blasted pieces of aluminum alloy wheels and an alloying supplement. In some examples, the product also comprises an indication on the container of a composition estimate of the combined shot blasted pieces and alloying supplement. In other examples, the indication and/or the alloying supplement may be provided by a company in the business of providing alloying supplements.

Abstract: A Ni-based alloy powder includes, in mass %, 3.5-4.5% of Al, 0.8-4.0% of Cr, 0.0100% or less of C, 0.001-0.050% of O, 0.0001-0.0150% of N, and the balance Ni with inevitable impurities.

Abstract: An aluminium alloy foil with a thickness of maximum 12 ?m, maximum 9 ?m or less than 8 ?m. The aluminium alloy foil is an AA1xxx or A8xxx aluminium alloy in the annealed state. In addition, a method for manufacturing an aluminium alloy foil and its use. The object of proposing an aluminium alloy foil with improved barrier properties, a method for its manufacture and a use of the aluminium alloy foil is achieved in that the aluminium alloy foil has a maximum number of pores with a pore size of 1 ?m to 200 ?m of maximum 12 per dm2, maximum 8 per dm2 or maximum 6 per dm2. In addition, a method is specified for how this aluminium alloy foil can be manufactured.

Abstract: A brazing, monolayer, aluminum-alloy material has a chemical composition composed of Si: 1.5 mass % or more and 3.5 mass % or less, Fe: 0.05 mass % or more and 2.00 mass % or less, Mn: 0.1 mass % or more and 2.0 mass % or less, Mg: 0.005 mass % or more and 0.500 mass % or less, and Bi: 0.010 mass % or more and 0.500 mass % or less, the remainder being Al and unavoidable impurities; and has a metallographic structure in which Mg—Bi-series compounds are dispersed in an Al matrix. The surface-area ratio of the above-mentioned Mg—Bi-series compounds in any arbitrary cross section is 0.05% or more.

Abstract: A high entropy alloy-based composition is provided that has the formula: (M1aM2bM3cM4dM5eM6f)CrAlY1-x-zZrxMoz where: each of M1, M2, M3, M4, M5, and M6 is a different alloying element selected from the group consisting of Ni, Co, Fe, Si, Mn, and Cu such that none of M1, M2, M3, M4, M5, and M6 are the same alloying element; 0.05?a?0.35; 0.05?b?0.35; 0.05?c?0.35; 0.05?d?0.35; 0.05?e?0.35; 0?f?0.35; a+b+c+d+e+f=1; 0?x?1; 0?z?1; and 0?x+z?1.

Abstract: An iron-based welding and forging alloy with a complex chemistry produces a dense, homogenous weld deposit that is resistant to hardness loss at elevated temperatures with less reliance on cobalt content. Such an alloy may comprise, in approximate percentages by weight: cobalt: 5-25; chromium: 7-14; tungsten: 2.5-10; molybdenum: 2-9; nickel: 1-6; carbon: 0.01-5; manganese: 0.01-3; with iron and residual elements comprising the balance. The residual elements may include one or more of the following: silicon, vanadium, phosphorus, and sulfur. The amounts of the residual elements may be up to 1% by weight. The inventive alloys may be provided in any suitable form for welding purposes, including metal-core TIG (GTAW), coated electrode (SMAW) and metal-core-wire (MCAW). The inventive alloy combinations may be fabricated as welding filler, providing resistance to high temperature softening, facilitating use in applications that previously dictated a specific cobalt-based material.

Abstract: The present disclosure generally provides aluminum alloy products having a functional gradient across at least one dimension of the aluminum alloy product. The disclosure also provides articles of manufacture made from such products, and methods of making such products, such as through casting and rolling. The disclosure also provides various end uses of such products, such as in automotive, aerospace, marine, defense, transportation, electronics, and industrial applications.

Abstract: A process for forming a durable, resistant oxide coating on zirconium metal or zirconium-based alloys, in which the metal or alloy is heated either rapidly to a predetermined temperature in an oxidizing or non-oxidizing environment or heated rapidly or slowly in an environment substantially devoid of an oxidizing agent until the predetermined temperature has been reached. The base metal can be pure zirconium or a zirconium-based alloy having niobium and/or titanium. The temperature, oxygen level, and time of exposure are controlled to elicit the desired properties. The oxidized specimen is then cooled under controlled conditions to further control the thickness and hardness of the oxide layer.

Abstract: Preparing a coated steel including the steps of hot rolling or cold rolling, slurry blasting, and coating. The step of hot rolling or cold rolling including rolling a steel ingot to form a steel strip. The step of slurry blasting including slurry blasting at least one side of the steel strip. The step of coating being performed after slurry blasting and including coating the steel strip with an aluminum-based coating.

Abstract: A coated steel product including a base steel, and a coating layer containing a Zn—Al—Mg alloy layer disposed on a surface of the base steel, in which the coating layer has a predetermined chemical composition, the coated steel product including dendrite-shaped MgZn2 phase having a surface roughness Sa of 50 nm or less on a surface of the Zn—Al—Mg alloy layer, an area ratio of the dendrite-shaped MgZn2 phase having a surface roughness Sa of 50 nm or less being from 30% to 80% within a region of an observable field of view of 5 mm2, and among the dendrite-shaped MgZn2 phase having a surface roughness Sa of 50 nm or less, a number of dendrite-shaped MgZn2 phase having an area of 0.1 mm2 or more being from 5 to 100 within a region of an observable field of view of 25 mm2.

Abstract: A coated steel includes a steel strip and an aluminum-based coating. The steel strip includes a free nitrogen concentration of greater than 40 parts per million (PPM). The aluminum-based coating is disposed on at least one surface of the steel strip.

Abstract: The present disclosure relates to a method of forming a coating on a blade for a shaver, the method comprising: a first step of evaporating a portion of a supply of a lubricating coating material in a negative pressure chamber, wherein the blade is positioned in the negative pressure chamber adjacent to the supply of the lubricating coating material such that the portion of the lubricating coating material evaporates from the supply and coats the blade; a second step, performed after the first step, of sintering the portion of the lubricating coating material coating the blade by heating the blade to a temperature above the melting temperature of the lubricating coating material; and a third step, performed after the second step, of cooling the blade after sintering to a room temperature.

Abstract: A method of constructing a sensor, including providing a quartz crystal having a first side and a second side, magnetron sputtering of 4000 to 13000 angstroms of aluminum directly on the quartz crystal first side and the quartz crystal second side, heating the aluminum sputtered quartz crystal to 100° C. to 500° C., magnetron sputtering of gold directly onto the aluminum sputtered quartz crystal first side and the aluminum sputtered quartz crystal second side, wherein the thickness of the aluminum is between 3 times and 40 times greater than the thickness of the gold and wherein the magnetron sputtering of aluminum, the heating and the magnetron sputtering of the gold is performed in a vacuum.

Abstract: Provided is a cover ring assembly that allows suppressing a dust generation source and reducing adhesion of particles on a substrate. A cover ring assembly for a substrate processing apparatus, which exposes a substrate to processing particles in an internal space to process the substrate, includes an annular flat plate and a cover ring having an annular shape. The annular flat plate has an inner peripheral upper surface and an outer peripheral upper surface. The inner peripheral upper surface is in contact with an outer peripheral lower surface terminating at an outer surface of the substrate. The outer peripheral upper surface is around the inner peripheral upper surface. The cover ring has a lower portion surface having an abutting surface in contact with the outer peripheral upper surface of the annular flat plate. A thermal spraying film covering a surface exposed to the processing particles is disposed to the cover ring except for the abutting surface.

Abstract: Disclosed in the present invention is vacuum coating apparatus for uniformly distributing metal steam using a uniform mixing buffer structure, comprising a crucible, wherein an induction heater for heating molten metal in the crucible to form metal steam is arranged outside of the crucible. A top of the crucible is connected to a flow distribution tank body by means of a metal steam pipeline. A horizontal core rod and a pressure stabilizing plate are arranged inside the flow distribution tank body. The core rod is located below the pressure stabilizing plate. A coating nozzle is arranged at the top of the flow distribution tank body. An induction coil is arranged on the outer side of the flow distribution tank body. A pressure regulating valve is arranged on the metal steam pipeline.

Abstract: A mask assembly manufacturing apparatus for manufacturing a mask assembly, including a frame through which an opening is defined and a support bar disposed above the frame, includes a stage on which the frame is placed, an alignment unit disposed above the stage and including magnetic units, and a fixing unit disposed between the stage and the alignment unit and including a first sub-fixing unit which fixes one end of the support bar and a second sub-fixing unit which fixes another end of the support bar and spaced apart from the first sub-fixing unit in a first direction. The magnetic units includes first magnetic units disposed above the support bar and second magnetic units disposed above the support bar, spaced apart from the first magnetic units in a second direction perpendicular to the first direction, and having a polarity opposite to a polarity of the first magnetic units.

Abstract: There is provided a substrate processing method. The method includes providing a substrate having a first surface area and a second surface area having a different surface state than that of the first surface area, exposing the substrate to a substrate surface treatment composition containing a deposition inhibitor, and exposing the substrate to a post-treatment composition containing HF.

Abstract: Apparatus and method for outer wall and/or inner wall coating of hollow bodies made of an electrically nonconductive material in which the hollow body is inserted into a process chamber which is divided by the hollow body into an internal and external reaction space, wherein at least one process gas is introduced into one of the two reaction spaces under a process pressure, and a plasma is generated in the reaction space and fragments and/or reaction products formed in the plasma from the at least one process gas are deposited to form a layer on the side of the wall of the hollow body that faces the plasma, the plasma being influenced with regard to at least one operating parameter by a magnetic field that permeates the two reaction spaces.

Abstract: Methods for forming a Group V-containing film comprise: a) exposing a substrate to a vapor of a Group V (five)-containing film forming composition; b) exposing the substrate to a co-reactant; and c) repeating the steps of a) and b) until a desired thickness of the Group V (five)-containing film is deposited on the substrate using a vapor deposition process, wherein the Group V (five)-containing film forming composition comprises a precursor having the formula: wherein M is Group V (five) element, vanadium (V), niobium (Nb), or tantalum (Ta); R1 to R8 each is H, a C1-C6 alkyl group, a fluoro group, an alkylsilyl group, a germyl group, an alkylamide or an alkylsilylamide; m=1 to 5, n=1 to 5.

Abstract: A method includes affixing a supply apparatus to inlets for one or more channels of a chamber component. The channels provide one or more gas flow paths between a first side of the chamber component that comprises the inlets and a second side of the chamber component comprising outlets of the one or more channels. The method further includes affixing an exhaust apparatus to the outlets of the one or more channels. The method further includes performing a plurality of atomic layer deposition cycles to deposit a corrosion resistant coating on interior surfaces of the one or more channels of the chamber component.

Abstract: In some examples, a rib cover is provided for a multi-station processing module having a rib disposed between adjacent processing chambers. An example rib cover comprises a first portion for supporting the rib cover on the rib, a first side shield to cover a first wall of the rib when the rib cover is fitted thereto, and at least one spacer to hold an inner surface of the rib cover away from the covered rib.

Abstract: The present inventive concept relates to a substrate processing method in which a processing process is performed on a substrate in a processing space divided into a first processing region and a second processing region. The substrate processing method comprises the steps of: performing a first processing process on a substrate in the first processing region when the substrate supported by the support part is positioned in the first processing region; moving the substrate to the second processing region by rotating the support part when the first processing process is completed; and performing a second processing process on the substrate in the second processing region when the substrate supported by the support part is positioned in the second processing region.

Abstract: A substrate processing method capable of forming a film with an improved step coverage and/or improved and/or more uniform properties on a surface of a gap structure having a high aspect ratio is provided. An exemplary substrate processing method includes: providing a gap structure; supplying gas including a source gas onto the gap structure; generating active species from the source gas; generating neutral molecules by neutralizing the active species, and moving the neutral molecules in a direction toward a lower surface of a recess extending between the first stepped portion and the second stepped portion; and exciting the neutral molecules moving in the direction toward the lower surface.

Abstract: A carrier wafer for receiving a wafer and supporting the wafer during semiconductor processing operations. The carrier wafer includes an annular ring surface and a pocket, the pocket being defined in a center of the carrier wafer and including a step defined by a sidewall extending between the annular ring surface and a top surface of the pocket.

Abstract: Aspects of the present disclosure provide systems and apparatuses for a substrate processing assembly with a laminar flow cavity gas injection for high and low pressure. A dual gas reservoir assembly is provided in a substrate processing chamber, positioned within a lower shield assembly. A first gas reservoir is in fluid communication with a processing volume of the substrate processing assembly via a plurality of gas inlet, positioned circumferentially about the processing volume. A second gas reservoir is positioned circumferentially about the first gas reservoir, coupled therewith via one or more reservoir ports. The second gas reservoir is in fluid communication with a first gas source. A recursive path gas assembly is positioned in an upper shield body adjacent to an electrode to provide one or more gases to a dark space gap.

Abstract: In a device and a method for depositing at least one layer on at least one substrate, a first gas flow comprising a reactive gas is fed through a first gas inlet opening, and a second gas flow is fed through a second gas inlet opening, into at least one gas distribution volume of a gas inlet element. The inlet element has a gas outlet surface with a multiplicity of gas outlet openings which are fluidically connected to the gas distribution volume and through which the reactive gas enters the process chamber. Products of a physical or chemical reaction of the reactive gas that have entered the process chamber form a layer on the surface of the substrate. The two gas flows are fed into the same gas distribution volume, such that zones with different concentrations of the reactive gas form within the gas distribution volume.

Abstract: There is provided a substrate processing method for a substrate processing apparatus. The substrate processing apparatus comprises: a processing chamber; a placing stand provided inside the processing chamber, configured to place a substrate on a placing surface, and having a gas path; a freezing device having a contact surface to be in contact with or separated from a surface to be contacted of the placing stand and configured to cool the placing stand; a gas supply pipe connected to the gas path and configured to introduce a heat transfer gas; and a cooling part provided outside the processing chamber and connected to the gas supply pipe. The substrate processing method comprises: (a) cooling the heat transfer gas by the cooling part; and (b) supplying the cooled heat transfer gas between the placing surface and a back surface of the substrate from the gas path through the gas supply pipe.

Abstract: An apparatus for controlling precursor flow. The apparatus may include a processor; and a memory unit coupled to the processor, including a flux control routine. The flux control routine may be operative on the processor to monitor the precursor flow and may include a flux calculation processor to determine a precursor flux value based upon a change in detected signal intensity received from a cell of a gas delivery system to deliver a precursor.

Abstract: An object is to provide an electroless copper plating solution with excellent solution stability and easy composition control while being used in a neutral range. To achieve the object, a reducing electroless copper plating solution used in a neutral range is employed that contains a copper salt serving as a copper ion supply source, a complexing agent for chelating copper ions, a reducing agent, a surfactant, an aromatic compound containing nitrogen, and contains a tellurium compound serving as a deposition stabilizer, and that has a solution pH of 6 to 9.

Abstract: The present invention is directed to a composition for depositing a palladium coating on a substrate, in particular on a nickel-coated substrate, the composition comprising: (i) palladium ions, (ii) chloride ions, (iii) ethylenediamine (EDA), (iv) ethylenediamine disuccinate (EDDS), and (v) at least one reducing agent.

Abstract: Embodiments of the disclosure advantageously provide in situ selectively deposited molybdenum films having reduced resistivity and methods of reducing or eliminating lateral growth of a selectively deposited molybdenum layer. Additional embodiments provide integrated clean and deposition processes which improve the selectivity of in situ selectively deposited molybdenum films on features, such as a via. Further embodiments advantageously provide methods of improving uniformity and selectivity of bottom-up gap fill for vias with improved film properties.

Abstract: A method of making alkenes and/or epoxides from alkanes and hydroxy-alkanes, respectively. In a reactor having an anode and a cathode separated by an ion exchange membrane, and containing a solution comprising water, halogen ions, and an alkane and/or a hydroxy-alkane, apply a potential across the anode and the cathode such that a halogenated intermediate is produced at the anode as an anolyte and hydroxyl ions are produced at the cathode as a catholyte; and combining the anolyte and the catholyte to yield an alkene and/or an epoxide.

Abstract: An electrolytic cell includes an inlet for receiving fluids into a first side of the electrolytic cell, an outlet opposite the inlet at a second side of the electrolytic cell where fluids exit the electrolytic cell, a cell body positioned between the inlet and the outlet having a plurality of bipolar electrode plates spaced apart, a first space formed between the inlet and the plurality of bipolar electrode plates, and a first flow diverter positioned within the first space. The first flow diverter includes a plurality of channels that adjust a flow of fluids flowing into the cell body from the inlet. A system using the electrolytic cells and methods of using the system are also included.

Abstract: A proton exchange membrane-based electrolyser includes an anode, a cathode and a proton exchange membrane, with the anode at a first surface of the membrane and the cathode at a second opposite surface. The anode includes an anodic catalyst layer and an anodic porous transport layer in parallel, with the catalyst layer between the transport layer and the first surface. The cathode includes a cathodic catalyst layer and a cathodic porous transport layer in parallel, with the catalyst layer between the transport layer and the second surface. The electrolyser includes conductive first and second meshes at the side of the anode and the side of the cathode, in which a surface of the first mesh covers the surface of the anodic catalyst layer, and in which a surface of the second mesh covers the surface of the cathodic catalyst layer.

Abstract: The present invention provides an alkaline water electrolysis anode such that even when electric power having a large output fluctuation, such as renewable energy, is used as a power source, the electrolysis performance is unlikely to be deteriorated and excellent catalytic activity is retained stably over a long period of time. The alkaline water electrolysis anode is an alkaline water electrolysis anode 10 provided with an electrically conductive substrate 2 at least a surface of which contains nickel or a nickel base alloy and a catalyst layer 6 disposed on the surface of the electrically conductive substrate 2, the catalyst layer 6 containing a nickel-containing metal oxide having a spinel structure, wherein the nickel-containing metal oxide contains nickel (Ni) and manganese (Mn), and has an atom ratio of Li/Ni/Mn/O of (0.0 to 0.8)/(0.4 to 0.6)/(1.0 to 1.8)/4.0.

Abstract: An electrode for gas evolution in electrolytic processes and a method for the production of such an electrode, the electrode having a metal substrate and a coating formed on the substrate, wherein the coating has at least a highly porous catalytic outer layer containing nickel oxide and nickel hydroxide, the porous outer layer having a surface area of at least 40 m2/g (BET). The catalytic layer is prepared from a Ni oxide/V oxide initial coating with subsequent leaching of V.

Abstract: An electrode catalyst layer for electrolytic cell 3 of an embodiment includes: a carbon material; a metal catalyst supported on the carbon material; and a water-repellent organic substance. In the electrode catalyst layer for electrolytic cell of the embodiment, the water-repellent organic substance includes an organic substance containing sulfur. A metal-sulfur bond is formed between the organic substance containing sulfur and the metal catalyst. A mass ratio (S/M) of a sulfur element (S) to a metal element (M) in the metal catalyst in the catalyst layer is not less than 0.03 nor more than 0.1.

Abstract: Described herein are proton exchange membrane style electrolyzers, and methods of making same, with a polybenzimidazole (PBI) or sulfonated polybenzimidazole (s-PBI) membrane and metal catalysts on the anode and cathode, which enables both acid independent membrane resistance and lower membrane resistance with higher operating temperatures.

Abstract: A modular solid oxide electrolyzer cell (SOEC) system including a stack of electrolyzer cells configured to receive steam in combination with hydrogen, and a steam recycle outlet configured to recycle a portion of the steam.

Abstract: Layered Period Four transition metal oxide materials composed of lithium transition metal oxides and sodium transition metal oxides, in which the transition metal oxide is cobalt, manganese, nickel, or a combination of two or more thereof or provided. Also provided are electrochemical cells incorporating the layered transition metal oxides as electrode materials and methods for extracting dissolved lithium from solution using the electrochemical cells. In the materials a lithium transition metal oxide phase and a sodium transition metal oxide phase exist as separate phases connected by a transition region of intermediate composition and layer spacing to form a stable structure.

Abstract: Disclosed are methods and systems of reversible metal electrodeposition (RME) devices with applications in dynamic smart windows. Embodiments use a RME device that includes two transparent substrates that sandwich a working electrode, counter electrode, and an electrolyte solution. Embodiments apply a pulsed voltage to the RME device that causes electrochemical deposition of metal ions from the electrolyte solution to create a metallic film on the working electrode. The metallic film results in reduced light transmittance of the RME device.

Abstract: The tin alloy plating solution of the present invention includes (A) a soluble salt including at least a stannous salt, (B) a soluble salt of a metal nobler than tin, (C) an alkane sulfonic acid including 9 to 18 carbon atoms in a molecule or a salt thereof, (D) a non-ionic surfactant including one or more phenyl groups in a molecule, and (E) a leveling agent.

Abstract: A metal-ceramic composite includes a ceramic matrix defining a multiplicity of pores, and a metal electrodeposited in the multiplicity of pores. A ceramic slurry includes ceramic microstructures or nanostructures, silica nanopowder, a dispersant, and a binder. Repairing a void in a metal-ceramic composite, wherein the void is defined by at least a first metal surface and a second metal surface of the metal-ceramic composite, includes introducing a solution including metal ions into the void, and electrodepositing the metal ions on the first metal surface and the second surface to yield a metal phase, thereby filling the void.