Abstract: A projection device, including a light source module and a color wheel, is provided. The light source module includes a plurality of solid-state lighting sources driven by a DC drive power to sequentially provide a first light generated by a first number of light sources, a second light generated by a second number of light sources and a third light generated by a third number of light sources within a response cycle, wherein the number of light sources to be turn on is less than or equivalent to a total number of solid-state lighting sources. The color wheel has a first block, a second block and a third block, respectively corresponding to the first to third lights, so that the projection device sequentially outputs a first color light with a first brightness, a second color light with a second brightness and a third color light with a third brightness.

Abstract: A projector includes a pattern portion including a pattern to be projected onto a projection area, a light source unit that irradiates the pattern with projected light, and a projection lens unit including a projection lens that enlarges a design of the pattern in a region irradiated with the projected light and projects the design onto the projection area to form a projected image thereon. The projected image formed on the projection area is changed by switching the region of the pattern irradiated with the projected light or by changing an in-plane angle of the pattern.

Abstract: An illumination system including a plurality of light-emitting elements, a light combining module, a first lens group, a second lens group and a wavelength conversion device is provided. The plurality of light-emitting elements provide a plurality of first light beams. The light combining module is used for combining the plurality of first light beams into a second light beam. The wavelength conversion device is used for converting the second light beam into the third light beam or reflecting the second light beam. The first lens group has a first central axis. The first lens group includes a first part and a second part which are symmetrical with respect to the first central axis and have equal areas, and a luminous flux of the second light beam passing through the first part is greater than a luminous flux passing through the second part.

Abstract: A digital camera including a printer includes a transport roller pair that transports an instant film, an exposure unit that exposes an image onto the instant film, a spreading roller pair that spreads a developer into a gap of the instant film by crushing a developer pod of the exposed instant film, a spreading control member that is positioned between the transport roller pair and the spreading roller pair, extends in a width direction of the instant film, and controls the developer spread into the gap, and a mechanical switch that is positioned near the spreading control member.

Abstract: Provided are a substrate with a multilayer reflective film, a reflective mask blank, a reflective mask, and a method for manufacturing a semiconductor device capable of, for example, preventing reduction of a reflectance of a multilayer reflective film due to formation of a silicide in a protective film. A substrate with a multilayer reflective film 100 comprises a substrate 10, a multilayer reflective film 12 disposed on the substrate 10, and a protective film 18 disposed on the multilayer reflective film 12. The protective film 18 comprises a SiN material layer comprising silicon (Si) and nitrogen (N) or a SiC material layer comprising silicon (Si) and carbon (C) on a side in contact with the multilayer reflective film 12. The SiN material layer or the SiC material layer comprises an oxide of at least one metal selected from magnesium (Mg), aluminum (Al), titanium (Ti), yttrium (Y), and zirconium (Zr).

Abstract: A reflective mask includes a substrate, a reflective multilayer disposed over the substrate, a capping layer disposed over the reflective multilayer, an intermediate layer disposed over the capping layer, an absorber layer disposed over the intermediate layer, and a cover layer disposed over the absorber layer. The absorber layer includes one or more layers of an Jr based material, a Pt based material or a Ru based material.

Abstract: A reflective mask blank includes: a substrate; a Mo/Si multilayer reflection layer formed by alternately laminating a molybdenum (Mo) layer and a silicon (Si) layer on or above the substrate; an intermediate layer on or above the Mo/Si multilayer reflection layer; a barrier layer on or above the intermediate layer; a protective layer on or above the barrier layer; and an absorption layer on or above the protective layer.

Abstract: A mask for use in a semiconductor lithography process includes a substrate, a mask pattern disposed on the substrate, and a light absorbing border surrounding the mask pattern. The light absorbing border is inset from at least two edges of the substrate to define a peripheral region outside of the light absorbing border. In some designs, a first peripheral region extends from an outer perimeter of the light absorbing border to a first edge of the substrate, and a second peripheral region that extends from the outer perimeter of the light absorbing border to a second edge of the substrate, where the first edge of the substrate and the second edge of the substrate are on opposite sides of the mask pattern.

Abstract: This disclosure describes systems, methods, and devices related to optical proximity corrections to an integrated circuit photomask. A method may include identifying a first contour of a first adjacent polygon of a photomask predicted for a first polygon of an integrated circuit, the first contour excluding a first corner formed by a first edge and a second edge of the first polygon; identifying a second contour of a second adjacent polygon of a photomask predicted for a second polygon of the integrated circuit, the second contour excluding a second corner formed by a third edge and a fourth edge of the second polygon; generating a fast contour prediction based on corner rounding associated with the first contour and the second contour; and generating, based on the fast contour prediction, a minimum distance between the first contour and the second contour, the minimum distance associated with the optical proximity corrections.

Abstract: A planarization system, comprising a superstrate chuck including a holding surface configured to hold a superstrate, an inflatable membrane having an inner diameter defining an inner edge, an outer diameter defining an outer edge, and, a midpoint between the inner edge and the outer edge in a radial direction, wherein the inflatable membrane is disposed radially outward of the holding surface of the superstrate chuck, and a purge gas channel disposed radially inward of the midpoint of the inflatable membrane and radially outward of the holding surface of the superstrate chuck.

Abstract: A method for fabricating a working stamp for forming surface gratings in a waveguide workpiece includes performing a series of step lithography processes using a series of master stamps so as to form a working stamp having a first surface having a plurality of surface gratings formed therein. Each step lithography process includes pressing a master stamp of the series of master stamps into a material layer of a working stamp workpiece at a corresponding region of the material layer, the master stamp having a plurality of surface grating patterns formed thereon. Each step lithography process further includes applying ultraviolet light to the corresponding region to locally cure the material layer at the corresponding region and detaching the master stamp from the material of the working stamp after applying the ultraviolet light.

Abstract: Provided are a method for preparing a pixel defining layer comprising applying and coating, pre-baking, exposing to light, developing, and post-baking of a photosensitive composition containing a colorant having a pigment with an average particle size of 100 nm or less, wherein the coated film generated after the post-baking has an optical density of 0.8/?m to 2.0/?m, a roughness of 3.0 nm or less, and no residue; and an organic light emitting display device comprising the pixel defining layer obtained by the method which has improved display reliability and lifetime as well as vivid colors.

Abstract: Provided are a semiconductor photoresist composition including an organotin compound represented by Chemical Formula 1 and a solvent, and a method of forming patterns using the same. The method of forming patterns may include forming an etching-objective layer on a substrate, coating the semiconductor photoresist composition on the etching-objective layer to form a photoresist layer, patterning the photoresist layer to form a photoresist pattern, and etching the etching-objective layer using the photoresist pattern as an etching mask.

Abstract: The present disclosure relates to a composition formed with a precursor including a C1-4 haloaliphatic or C1-4 aliphatic group or vinyl group (—CH?CH2) and other unsaturated substituents, as well as methods for forming and employing such compositions. In particular embodiments, the haloaliphatic group is a C1-2 haloalkyl group, which in turn provides a resist film having enhanced radiation absorptivity and/or minimal film shrinkage (e.g., upon radiation exposure and/or post-exposure bake). In other embodiments, the aliphatic group is a C1-2 alkyl or vinyl group and other unsaturated substituents, which can be dry deposited. In non-limiting embodiments, the radiation can include extreme ultraviolet (EUV) or deep ultraviolet (DUV) radiation.

Abstract: Organometallic tin clusters represented by chemical formulas [(C5R5Sn)12O14(OH)6]X2, [(C5R5Sn)12O14(OH)4(L)2]X2, or [(C5R5Sn(O)O2CR?]6 and their uses as extreme ultraviolet (EUV) lithography photoresists are descried, wherein C5R5 comprises cyclopentadienyl C5H5 group, or substituted cyclopentadienyl C5H4R, C5H3R2, C5H2R3, C5HR4, or C5R5 group.

Abstract: The present disclosure aims to provide a photosensitive resin composition that can improve the surface roughness of a fluororesin suitable for use as a partition wall material. The present disclosure relates to a photosensitive resin composition containing: a fluororesin having a fluorine atom content of 20 to 60 mass %; a fluorine-containing surface modifier including a fluorine compound having a weight average molecular weight (Mw) of 1,000 to 15,000; a base resin; a solvent; and a photopolymerization initiator.

Abstract: A photosensitive resin composition according to the present disclosure, contains an acid-modified vinyl group-containing resin (A), a thermosetting resin (B), a photopolymerization initiator (C), and a photopolymerizable compound (D), in which the photopolymerizable compound includes a photopolymerizable compound having a polyoxyalkylene chain and an ethylenically unsaturated group.

Abstract: The present disclosure aims to provide a novel surface modifier that can be introduced into a photosensitive resin composition to improve the surface roughness of a fluororesin suitable for use as a partition wall material. The present disclosure relates to a surface modifier containing a fluororesin (A) having a structure represented by the following formula (1): wherein each Ra independently represents a C1-C6 linear, C3-C6 branched, or C3-C6 cyclic alkyl group or a fluorine atom, and any number of hydrogen atoms in the alkyl group are replaced with fluorine atoms.

Abstract: A photoresist includes a solvent, a polymer and an additive. The polymer is dissolved in the solvent, and the additive is dispersed in the solvent. The additive includes a double bond or includes an epoxy group. The additive has a surface tension different from a surface tension of the polymer.

Abstract: A polymer containing a structural unit including an aromatic hydroxy group bonded to a main chain, where the aromatic hydroxy group is protected by an acid-labile group represented by the following formula (ALU-1) and is deprotected by action of an acid to become alkali-soluble. This provides: a polymer that makes it possible to form a resist film with which it is possible to form a pattern having extremely high isolated space resolution, small LER, and excellent rectangularity, effects of development loading and residue defects being suppressed, and the pattern having etching resistance and suppressed pattern collapse in the produced resist pattern; a chemically amplified positive resist composition containing the polymer; a resist patterning process using the chemically amplified positive resist composition; and a mask blank including the chemically amplified positive resist composition.

Abstract: Methods for direct patterning of a silicon hardmask with extreme ultraviolet (EUV) radiation are provided. The method involves forming a polysiloxane and/or oligosiloxane composition into a silicon hardmask layer followed by solvent removal. Without using a photoresist and/or other layer silicon hardmask layer, condensation of the siloxane sol-gel polymers and/or oligomers is induced by EUV radiation, rendering the exposed portions insoluble in typical lithography solvents or developers. The exposed portions of the silicon hardmask layer are removed, leaving a pattern in the silicon hardmask layer that can be transferred to any layers below the silicon hardmask layer, and ultimately to the substrate.

Abstract: A composition for preparing a top antireflection film for photoresist includes a fluorine-containing composition, an alkali, an acid, and a surfactant. The fluorine-containing composition includes a fluorine-containing polymer. The fluorine-containing composition includes fluorine-containing polymers respectively including n=1, 2, 3, 4 and ?5 fluorine-containing polyether groups, the content of the fluorine-containing polymers is 0-10 wt %, 30-68 wt %, 32-60 wt %, 0-15 wt %, and 0-8 wt %, respectively; the content of the fluorine-containing composition in the composition for preparing the top antireflection film for photoresist is 1-15 wt %. The antireflection film can avoid light scattering and standing wave effect, and the pH of the composition and the PH of photoresist are well matched, which improves the problem of the porosity and uniformity of the film surface and a large difference in thickness between a center point and the edge after coating, improving the yield of the photolithographic process.

Abstract: Methods and apparatus for characterizing a semiconductor manufacturing process performed on a substrate. First data is obtained associated with fingerprint data of the substrate measured after a first processing step. Second data is obtained associated with fingerprint data of the substrate measured after a second processing step. A statistical model is used to decompose the first and second data into a first class of fingerprint components mutually correlating between the first and second data and a second class of fingerprint components not mutually correlating between the first and second data. At least one of the first class fingerprint of components and the second class of fingerprint components are used to characterize the semiconductor manufacturing process.

Abstract: A treatment liquid for a semiconductor device includes an alkanolamine; a hydroxylamine; an organic solvent; Ca; Fe; and Na, wherein the content of the alkanolamine in the treatment liquid is 0.1% to 5% by mass, the content of the hydroxylamine in the treatment liquid is 0.1% to 30% by mass, and each of the mass ratio of Ca, Fe, and Na with respect to the content of the alkanolamine and the hydroxylamine in the treatment liquid is 10?12 to 10?4.

Abstract: A tile system for covering a surface. The tile system comprises a first tile assembly connected to a second tile assembly by a connector. Each tile assembly comprises a first tile stacked on a second tile, the first tile and the second tile joined to a reinforcing material disposed therebetween. The connector comprises a first component and a second component that is complementary to the first component. The first component is mounted to the first tile assembly, and the second component is mounted to the second tile assembly.

Abstract: An exposure apparatus for exposing a plurality of shot regions on a substrate includes a projection optical system, a drive mechanism configured to drive the substrate, a detector configured to detect a surface height of the substrate, and a controller configured to control the drive mechanism based on an output of the detector. The projection optical system is configured to project a pattern of an original to an exposure region in an image plane of the projection optical system. A detection region of the detector is larger than the exposure region. The controller is configured to control, based on an output of the detector obtained when a first shot region of the plurality of shot regions is arranged in the exposure region, driving of the substrate, by the drive mechanism, for exposing a second shot region of the plurality of shot regions.

Abstract: Embodiments of the present disclosure generally relate to lithography systems. More particularly, embodiments of the present disclosure relate to a method, a system, and a software application for a lithography process to control transmittance rate of write beams and write gray tone patterns in a single exposure operation. In one embodiment, a plurality of shots are provided by an image projection system in a lithography system to a photoresist layer. The plurality of shots exposes the photoresist layer to an intensity of light emitted from the image projection system. The local transmittance rate of the plurality of shots within an exposure area is varied to form varying step heights in the exposure area of the photoresist layer.

Abstract: An optical device includes a plurality of laser light sources, an output module having an optical modulator, and a time divider that is disposed between the plurality of laser light sources and the output module and that is configured to divide laser beams emitted from the plurality of laser light sources in time.

Abstract: A method includes detecting data associated with a patterning device and/or a lithographic apparatus, performing an action from a plurality of actions when a determination not to proceed is made, and performing the action on the patterning device and/or a lithographic apparatus.

Abstract: Provided are a method of selecting multi-wavelengths for overlay measurement, for accurately measuring overlay, and an overlay measurement method and a semiconductor device manufacturing method using the multi-wavelengths. The method of selecting multi-wavelengths for overlay measurement includes measuring an overlay at multiple positions on a wafer at each of a plurality of wavelengths within a set first wavelength range, selecting representative wavelengths that simulate the overlay of the plurality of wavelengths, from among the plurality of wavelengths, and allocating weights to the representative wavelengths, respectively.

Abstract: A processing apparatus for overlay shift includes a storage unit and a control unit, and is applicable to a semiconductor wafer with several inspection regions. Each of the inspection regions has several sets of overlay marks for inspection. One set of overlay marks includes an original alignment mark without any overlay shift, and several split alignment marks with predetermined overlay shifts arranged near the original alignment mark. The original after-etch inspection (AEI) overlay data of the inspection regions is stored in the storage unit. The after-develop inspection (ADI) overlay data of the original alignment mark and the split alignment marks are compared with the original AEI overlay data by the control unit, thereby acquiring ADI pre-bias data of the original alignment mark and the split alignment marks. The control unit determines whether an overlay shift compensation is performed according to the acquired ADI pre-bias data.

Abstract: A substrate treatment apparatus according to an aspect of the present invention includes: a support plate that supports a substrate and is provided with a heater member for heating the substrate; and a cooling unit for forcedly cooling the support plate, wherein the cooling unit includes: a cooling housing to provide a cooling space; a plurality of gas feed nozzles that is arranged in the cooling housing and supplies cooling gas toward the heater member; and a plurality of gas feed lines that is directly connected to the gas feed nozzles and supplies the cooling gas transferred from the outside to the gas feed nozzles.

Abstract: A semiconductor processing method includes: selecting a target state of a reticle based on a given data set, wherein the given data set comprises temperature profiles of the reticle correlated to a target overlay performance, and the target state is a state in which a deformation of the reticle is substantially unchanged; regulating the reticle to reach the target state; and performing an exposure process on a target workpiece by using the reticle.

Abstract: A measurement device has: a slider which holds a substrate and is movable parallel to the XY plane; a drive system that drives the slider; a position measurement system which emits beams from a head section to a measurement surface in which grating section are provided on the slider, which receives respective return beams of the beams from the measurement surface, and which is capable of measuring position information in at least directions of three degrees of freedom including the absolute position coordinates of the slider; a mark detection system that detects a mark on the substrate; and a controller which detects the marks on the substrate using the mark detection system while controlling the drive of the slider, and which obtains the absolute position coordinates of each mark based on the detection result of each mark and measurement information by the position measurement system at the time of detection.

Abstract: A lithography system is provided with: a measurement device measuring position information of marks on a substrate held in a first stage; and an exposure apparatus on a second stage, the substrate for which the position information measurement for the marks has been completed, performs alignment measurement to measure position information for part of marks selected from among the marks on the substrate, and performs exposure. The measurement device measures position information of marks on the substrate to obtain higher-degree components of correction amounts of an arrangement of divided areas, and the exposure apparatus measures position information of a small number of marks on the substrate to obtain lower-degree components of the correction amounts of the arrangement of the divided areas and exposes the plurality of divided areas while controlling the position of the substrate by using the obtained lower-degree components and the higher-degree components obtained by the measurement device.

Abstract: The present disclosure relates to an electrophotographic photoreceptor including at least a photosensitive layer and a protective layer in sequence on a conductive support, and the protective layer contains a cured product of a curable compound, conductive particles having a band gap of 2.0 eV or more and 3.6 eV or less, and particles having a band gap of 8.0 eV or more.

Abstract: An image forming apparatus includes a magnetic toner, an image bearing member, and a development device. The image bearing member is an amorphous silicon photosensitive drum. The magnetic toner includes toner particles. The toner particles each include a toner mother particle containing a binder resin and a magnetic powder and alumina particles attached to a surface of the toner mother particle. The alumina particles each include a core containing alumina and a conductive layer covering the core. The conductive layer contains antimony tin oxide. The alumina particles have a number average primary particle diameter of at least 0.15 ?m and no greater than 0.50 ?m. The alumina particles have a specific resistance of no greater than 250 ?·cm. The alumina particles have an X-ray intensity ratio of at least 0.25 and no greater than 0.35.

Abstract: An electrostatic charge image developer includes: a toner A incorporating toner particles and silica particles (A) as an external additive, the toner particles containing a binder resin and resin particles, and the silica particles (A) containing a nitrogen-containing compound containing the element molybdenum; and a carrier B incorporating a core and a coating resin layer, the coating resin layer covering the core and containing inorganic particles, and the ratio NMo/NSi is 0.035 or greater and 0.45 or less, where NMo and NSi are measured net intensities for the element molybdenum and the element silicon, respectively, in the silica particles (A) in x-ray fluorescence analysis.

Abstract: An electrostatic image developer includes: a toner A to which silica particles (A) containing an elemental nitrogen-containing compound containing elemental molybdenum are externally added; and a carrier B including a core material and a coating resin layer that covers the core material and contains inorganic particles. In the silica particles (A), the ratio NMo/NSi of a Net intensity NMo of elemental molybdenum that is measured by X-ray fluorescence analysis to a Net intensity NSi of elemental silicon that is measured by the X-ray fluorescence analysis is from 0.035 to 0.45 inclusive.

Abstract: Provided is a toner comprising a toner particle comprising a binder resin and a. silica fine particle, wherein a total content of a polyvalent metal elements in the toner particle is 0.10 to 2.50 ?mol/g, a number-average particle diameter of a primary particle of the silica fine particle is 40 to 500 nm, and in the DD/MAS measurement of solid 29Si-NMR of the silica fine particle, peak PD1 corresponding to a silicon atom represented by Sia in a structure represented by formula (1) and peak PD2 corresponding to a silicon atom represented by Sib in a structure represented by formula (2) are observed, and when an area of the peak PD1 is defined as SD1 and an area of the peak PD2 is defined as SD2, SD1 and SD2 satisfy: 1.2?(SD1+SD2)/SD1?10.0.

Abstract: A toner container (32) includes a rotatable container body (33). The container body includes an opening portion (33c) and a plurality of projections (33a). The opening portion is on a first end, which is opposite a second end, of the container body in a rotation axis direction. The plurality of projections are each protrude inward and have a slope inclined with respect to the rotation axis direction. The plurality of projections are disposed such that, out of two adjacent projections in the rotation axis direction, one projection closer to the first end of the container body in the rotation axis direction overlaps the other projection closer to the second end of the container body in the rotation axis direction, in an area of the one projection closer to the second end and an area of the other projection closer to the first end in the rotation axis direction.

Abstract: A pressing device includes a pressed unit, a pressing member, a support shaft, and a drive transmission mechanism. The pressed unit is supported to be rotatable. The pressing member presses the pressed unit. The support shaft supports the pressing member such that the pressing member is rotatable. The drive transmission mechanism transmits a drive force of a drive source to the pressed unit, is disposed on the pressing member, and includes a pressing-member-side drive transmission member to transmit the drive force to a unit drive transmission member of the pressed unit. The support shaft is disposed coaxially on a fulcrum of rotation of the pressed unit.

Abstract: An image forming apparatus includes an image bearing member, an intermediate transfer member, a reinforcing member, and a collection unit having a contact member and a support member. The contact member extends in a longitudinal direction that is orthogonal to an intermediate transfer member movement direction. One end of the contact member is fixed to the support member and the other end is in contact with the intermediate transfer member as a free end. When a maximum region in the longitudinal direction where an image is formable on a transfer medium having a maximum size that is supported by the image forming apparatus is defined as an image forming region, at least part of the reinforcing member is located outside the image forming region and, on one end side of the contact member, the reinforcing member is provided on an inner side than the end of the contact member.

Abstract: A fixing apparatus is used that has: a first rotation member; an elongated heater disposed in an internal space of the first rotation member, and having a heat generating member and a substrate on which the heat generating member is provided; a temperature sensing unit that detects a temperature of the heater; a heater holder that holds the heater; a second rotation member that forms a nip portion with the heater, across the first rotation member; a reservoir unit that stores grease that is supplied between the first rotation member and the heater; and an elastic member that encloses the temperature sensing unit, such that a toner image formed on a recording material is heated and fixed at the nip portion.

Abstract: A fixing apparatus having a first rotation member, an elongated heater having a heat generating member and a substrate on which the heat generating member is provided and being disposed in an internal space of the first rotation member, a heater holder that holds the heater, a stay that supports the heater holder, a sliding sheet being disposed between the heater and the first rotation member and sliding on an inner circumferential surface of the first rotation member, and a second rotation member forming a nip portion with the heater through the first rotation member, and, in the nip portion, a toner image formed on a recording material being heated and fixed, in which, when a longitudinal direction of a surface of the substrate on which the heat generating member is provided, a transverse direction that is orthogonal to the longitudinal direction.

Abstract: A fixing device includes a belt member that cyclically moves, a pressing unit that comes into contact with the belt member and presses a recording medium moving between the belt member and the pressing unit, and a heat source that includes a base material, a resistance heating element disposed on a surface of the base material along a longitudinal direction of the base material, and an insulator covering the resistance heating element and that comes into contact with the pressing unit via the belt member to heat an inner surface of the belt member, in which the insulator is formed to cover a corner portion of the base material in a direction of movement of the belt member.

Abstract: An image forming apparatus includes an image forming portion, a fixing portion, a discharging portion, a discharge path toward the discharging portion, a reversing portion including a reverse path branched from the discharge path and to reverse the sheet and a reconveying path branched from the reverse path and through which the sheet reversed in the reversing portion is reconveyed to the image forming portion. A curl correcting portion is disposed in the reconveying path and corrects curl of the sheet conveyed through the reconveying path. The curl correcting portion includes a first correcting portion to apply a force to upwardly bend the first side to the sheet conveyed through the reconveying path, and a second correcting portion to apply a force to downwardly bend the first side. The second correcting portion is disposed downstream of the first correcting portion with respect to a conveyance direction of the sheet.

Abstract: An image forming apparatus includes: a plurality of stations and a plurality of stays arranged along a first direction; and a first board support member supporting a first electric board. Each of the plurality of stations includes: a rotation shaft extending in a second direction intersecting the first direction; and a photosensitive member and a flywheel provided to the rotation shaft. The first board support member is attached to two of the plurality of stays so as to bridge a gap between the two stays, and provided, in the second direction, on a first side opposite to a second side of the flywheel on which the photosensitive member is provided. The first board support member overlaps with the flywheel of at least one of the plurality of stations when viewed from a viewpoint along the second direction.

Abstract: An image forming apparatus comprises a first chassis, a second chassis, a first connector, a second connector, a first scale and a first indicator. The first chassis and the second chassis are connected via the first connector and the second connector. The first scale is provided on one of the first connector and the second connector. The first scale indicates a relative distance between the first chassis and the second chassis in a first direction. The first indicator is provided on the other of the first connector and the second connector. The first indicator points the first scale.

Abstract: An object of the present invention is to provide a developer supply container capable of simplifying a mechanism for displacing a developer receiving portion to connect it with a developer supply container. A developer supply container 1 for supplying a developer through a developer receiving portion 11 displaceably provided in a developer receiving apparatus 8 to which said developer supply container 1 is detachably mountable, said developer supply container 1 includes a developer accommodating portion 2c for accommodating a developer; and an engaging portions 3b2, 3b4, engageable with said developer receiving portion 11, for displacing said developer receiving portion 11 toward said developer supply container 1 with a mounting operation of said developer supply container 1 to establish a connected state between said developer supply container 1 and said developer receiving portion 11.