Nitrogen And Sulfur In The Same Compound Patents (Class 106/154.3)
  • Patent number: 10426161
    Abstract: The present disclosure generally provides for antimicrobial compositions having enhanced solubility and methods of using the same. The antimicrobial compositions are suitable for reducing or preventing microorganism growth, viability, or survival. The antimicrobial compositions generally include at least one antimicrobial quaternary ammonium compound and a water-soluble spacer compound or spacer interspersed therewith.
    Type: Grant
    Filed: January 12, 2016
    Date of Patent: October 1, 2019
    Assignee: Biosyn Inc
    Inventor: Frederick A. Busch
  • Patent number: 6911302
    Abstract: A coating composition for use in a photographic element, the composition comprising an aqueous solution of: two or more surfactants; a hydrophilic binder; and optional matte particles; wherein one of the surfactants is represented by the following Formula (I): Rf—CH2CH2—(B)y-A??(I) where Rf is F(CF2CF2)n— and n is 3 and 4 or 3, 4, and 5, and the fraction of all Rf with n=3 is at least 40%; B is a divalent linking group; y is 0 or 1; and A is an anionic group with a counterion or an amphoteric group. A photographic element containing the coating composition is also disclosed.
    Type: Grant
    Filed: November 7, 2003
    Date of Patent: June 28, 2005
    Assignee: Eastman Kodak Company
    Inventors: Alice G. Moon, Mark P. Pavlik, Michael W. Orem
  • Patent number: 6875563
    Abstract: A coating composition for use in forming an overcoat layer in a photographic element, said composition comprising an aqueous solution of: a mixture of two or more surfactants; a hydrophilic binder; matte beads; and a lubricating agent; wherein one of the surfactants is represented by the following Formula (I) and is the only fluorosurfactant in the composition: Rf—CH2CH2—S-(A)-D??(I) where Rf is —(CF2)nCF3, n represents the number of CF2 groups and is 3 or 5 in at least 60% of the Rf groups present, and in the remainder of Rf groups n is 7, 9, or 11. A is a divalent linking group that includes substituted alkylene or alkylene (N-alkylene)amide; and D is an ionic group. A photographic element with an outermost layer containing the coating composition is also disclosed.
    Type: Grant
    Filed: November 6, 2003
    Date of Patent: April 5, 2005
    Assignee: Eastman Kodak Company
    Inventors: Michael W. Orem, Ronald R. Andrews
  • Publication number: 20040170933
    Abstract: A coating composition for use in a photographic element, the composition comprising an aqueous solution of: two or more surfactants; a hydrophilic binder; and optional matte particles; wherein one of the surfactants is represented by the following Formula (I):
    Type: Application
    Filed: November 7, 2003
    Publication date: September 2, 2004
    Inventors: Alice G. Moon, Mark P. Pavlik, Michael W. Orem
  • Patent number: 6770129
    Abstract: Aqueous paper coating compositions containing at least one of a clay, a starch, casein, a resin, and a wax; and wherein the composition contains from about 0.
    Type: Grant
    Filed: January 28, 2003
    Date of Patent: August 3, 2004
    Assignee: Cognis Corporation
    Inventors: David W. Brown, Kenneth Breindel, Ronald W. Broadbent, Michael S. Wiggins
  • Publication number: 20030148232
    Abstract: A coating composition for use in forming an overcoat layer in a photographic element, said composition comprising an aqueous solution of: a mixture of two or more surfactants; a hydrophilic binder; matte beads; and a lubricating agent; wherein one of the surfactants is represented by the following Formula (I):
    Type: Application
    Filed: May 28, 2002
    Publication date: August 7, 2003
    Inventors: Michael W. Orem, Ronald R. Andrews