Replenishing Liquid Precursor, Other Than A Moving Zone Patents (Class 117/912)
  • Patent number: 8932403
    Abstract: A method for forming a surface-textured single-crystal film layer by growing the film atop a layer of microparticles on a substrate and subsequently selectively etching away the microparticles to release the surface-textured single-crystal film layer from the substrate. This method is applicable to a very wide variety of substrates and films. In some embodiments, the film is an epitaxial film that has been grown in crystallographic alignment with respect to a crystalline substrate.
    Type: Grant
    Filed: May 23, 2011
    Date of Patent: January 13, 2015
    Assignee: Sandia Corporation
    Inventors: Qiming Li, George T. Wang
  • Patent number: 8137457
    Abstract: A method of forming monodisperse metal chalcogenide nanocrystals without precursor injection, comprising the steps of: combining a metal source, a chalcogen oxide or a chalcogen oxide equivalent, and a fluid comprising a reducing agent in a reaction pot at a first temperature to form a liquid comprising assembly; increasing the temperature of the assembly to a sufficient-temperature to initiate nucleation to form a plurality of metal chalcogenide nanocrystals; and growing the plurality of metal chalcogenide nanocrystals without injection of either the metal source or the chalcogen oxide at a temperature equal to or greater than the sufficient-temperature, wherein crystal growth proceeds substantially without nucleation to form a plurality of monodisperse metal chalcogenide nanocrystals. Well controlled monodispersed CdSe nanocrystals of various sizes can be prepared by choice of the metal source and solvent system.
    Type: Grant
    Filed: October 10, 2008
    Date of Patent: March 20, 2012
    Assignee: University of Florida Research Foundation, Inc.
    Inventors: Yunwei Charles Cao, Ou Chen
  • Patent number: 7922817
    Abstract: A feed assembly and method of use thereof of the present invention is used for the addition of a high pressure dopant such as arsenic into a silicon melt for CZ growth of semiconductor silicon crystals. The feed assembly includes a vessel-and-valve assembly for holding dopant, and a feed tube assembly, attached to the vessel-and-valve assembly for delivering dopant to a silicon melt. An actuator is connected to the feed tube assembly and a receiving tube for advancing and retracting the feed tube assembly to and from the surface of the silicon melt. A brake assembly is attached to the actuator and the receiving tube for restricting movement of the feed tube assembly and locking the feed tube assembly at a selected position.
    Type: Grant
    Filed: April 24, 2008
    Date of Patent: April 12, 2011
    Assignee: MEMC Electronic Materials, Inc.
    Inventors: Massoud Javidi, Steve Garner
  • Patent number: 7135074
    Abstract: A method for manufacturing a silicon carbide single crystal includes the steps of: preparing a seed crystal with a screw dislocation generation region; and growing the single crystal on a growth surface of the seed crystal. The generation region occupies equal to or smaller than 50% of the growth surface, which has an offset angle equal to or smaller than 60 degrees. The screw dislocation density in the single crystal generated from the generation region is higher than that in the other region. The single crystal includes a flat C-surface facet disposed on a growing surface of the single crystal. The C-surface facet overlaps at least one of parts of the growing surface provided by projecting the generation region in a direction perpendicular to the growth surface and in a direction parallel to a <0001> axis, respectively.
    Type: Grant
    Filed: August 5, 2004
    Date of Patent: November 14, 2006
    Assignees: Kabushiki Kaisha Toyota Chuo Kenkyusho, Denso Corporation
    Inventors: Itaru Gunjishima, Daisuke Nakamura, Naohiro Sugiyama, Fusao Hirose
  • Patent number: 5700321
    Abstract: The object of the present invention affords a method of feeding dopant and a dopant composition used therein for easily preparing single crystals having a desired doping concentration during semiconductor substrate fabrication.In accordance with the present invention, a water solution containing oxides of the dopant is first added to the liquid containing colloidal silica. The colloidal silica can adsorb the oxides of the dopant to form a dopant composition. Around rod-shaped polysilicon, that is polysilicon rod, the dopant composition is discontinuously coated on the periphery of the polysilicon rods spaced at constant intervals and then dried. When the polysilicon rods are melted in an apparatus for manufacturing single crystals by a heater, dopant is protected by the glassed silica without evaporation. Accordingly, the dopant can be provided at a predetermined concentration to sustain the grown single crystals having a doping concentration as required.
    Type: Grant
    Filed: July 26, 1996
    Date of Patent: December 23, 1997
    Assignee: Komatsu Electronic Metals Co., Ltd.
    Inventor: Keishi Niikura
  • Patent number: 5611854
    Abstract: A method of fabricating bulk superconducting material including RBa.sub.2 Cu.sub.3 O.sub.7-.delta. comprising heating compressed powder oxides and/or carbonates of R and Ba and Cu present in mole ratios to form RBa.sub.2 Cu.sub.3 O.sub.7-.delta. in physical contact with an oxide single crystal seed to a temperature sufficient to form a liquid phase in the RBa.sub.2 Cu.sub.3 O.sub.7-.delta. while maintaining the single crystal seed solid to grow the superconducting material and thereafter cooling to provide a material including RBa.sub.2 Cu.sub.3 O.sub.7-.delta.. R is a rare earth or Y or La and the single crystal seed has a lattice mismatch with RBa.sub.2 Cu.sub.3 O.sub.7-.delta. of less than about 2% at the growth temperature. The starting material may be such that the final product contains a minor amount of R.sub.2 BaCuO.sub.5.
    Type: Grant
    Filed: September 21, 1995
    Date of Patent: March 18, 1997
    Assignee: The University of Chicago
    Inventors: Boyd W. Veal, Arvydas Paulikas, Uthamalingam Balachandran, Wei Zhong
  • Patent number: 5569325
    Abstract: A process for growing crystals at an enhanced rate comprising providing a dispersion of a fluid medium and seed crystals of a metal oxide, introducing feed material comprising a metal oxide into the dispersion and maintaining a uniform mixture of the seed crystals, the feed material and the fluid medium, the feed material having an average crystal size less than the average crystal size of the seed crystals, the feed material being added in an amount and at a rate whereby the seed crystals grow, the feed material providing a soluble nutrient species for deposition of the said crystal to effect crystal growth, the mixture of seed crystals and feed material being treated under conditions which stimulate crystal growth for a period of time sufficient to obtain a desired quantity of a product comprising at least one grown crystal having an average crystal size greater than the average crystal size of the seed crystal.
    Type: Grant
    Filed: April 22, 1991
    Date of Patent: October 29, 1996
    Assignee: Condea Vista Company
    Inventors: David A. Barclay, Duane J. Lewis, Lewis B. Decker, Jr., William R. Carradine
  • Patent number: 5413067
    Abstract: A method of obtaining a crystal by crystal growth in the liquid phase from a seed in the form of a plate taken from a primary crystal, which method comprises at least two steps constituted firstly by forming first crystal growth to obtain a secondary crystal from a first seed taken from said primary crystal in a first growth zone, and secondly in performing second crystal growth from a second seed taken from said secondary crystal in a second growth zone, said first and second seeds being selected so that few of the dislocations that they contain propagate respectively into the second zone of the secondary crystal or into the first growth zone of the resulting crystal. According to the invention said first and second crystal growth steps are performed in different growth directions. Application to monocrystals of quartz, or of materials that are isomorphs of quartz, such as berlinite, and that are intended for use in making electronic components, in particular oscillators and filters.
    Type: Grant
    Filed: November 13, 1992
    Date of Patent: May 9, 1995
    Assignees: France Telecom, Centre National de la Recherche Scientifique (CNRS)
    Inventors: Albert Zarka, Jacques Detaint, Jacquie Schwartzel, Yves Toudic, Bernard Capelle, Yun L. Zheng, Etienne Philippot, Xavier Buisson, Roger Arnaud