Abstract: An apparatus for depositing a solid film onto a substrate from a reagent solution includes a reservoir of solution maintained at a low temperature to inhibit homogeneous reactions. The solution contains multiple ligands to control temperature stability and shelf life. The chilled solution is periodically dispensed onto a substrate positioned in a holder having a raised peripheral structure that retains a controlled volume of solution over the substrate. The solution is periodically replenished so that only the part of the solution directly adjacent to the substrate is heated. A heater maintains the substrate at an elevated temperature at which the deposition of a desired solid phase from the solution may be initiated. The apparatus may also dispense excess chilled solution to cool various components within the apparatus and minimize nucleation of solids in areas other than on the substrate. The apparatus is particularly suited to forming films of II-VI semiconductors.

Abstract: A method for a surface being plated locally includes a fixture for holding at least a work piece and the fixture is supported with two opposite lateral walls of a plating tank. Hence, a plated zone on a surface of the work piece can be immerged into the liquid contained in the plating tank for the plated zone being coated with de-oxide layer and plating layer sequentially.

Abstract: A tank for an immersion lithography apparatus provided. The tank has a container with a bottom plate and side plates connected to each, wherein the side plates surround and connect all edges of the bottom plate. The container is filled in at least a liquid having a refractive index thereof from about 1.4 to about 1.8. A platform is located in the container and immersed in the liquid. The platform has an axle fastened on a side thereof parallel to the bottom plate, wherein the axle passes through a bearing hole penetrated through one of the side plates. A roller disposed outside the container connects to the axle to rotate the axle, and furthermore, to incline the platform accordingly.

Abstract: A device for guiding a strip through a liquid contained in a tank, includes an immersed diverting roller, in particular a roller immersed in a bath of liquid metal such as zinc, mounted rotatably about an axis on two aligned supporting shafts extending through two respective side walls of the tank, and each rotating in a centering bearing positioned outside of the tank. Each bearing of one shaft of the roller includes two rotary supporting members mounted in a fixed housing and spaced apart from each other, namely an outer supporting member and an inner supporting member. The housing of the bearing is held against a support plane formed on the wall and perpendicular to the axis of a hole through which the shaft passes. The wall has measures for centering the housing on the axis.

Abstract: A method and apparatus are provided for growing a composite metal sulphide photcatalyst thin film, wherein photochemical deposition and chemical bath deposition are both performed for growing the composite metal sulphide thin film, such as (AgInS2)x/(ZnS)2(1-x), wherein x is 0-1.

Abstract: 2.1 The present invention pertains to a hot-dip coating device 100 for coating a metal strip with a molten metal 200. The metal strip is deflected in the molten metal 200 with the aid of a roll 120. The roll is rotatably supported in a support arm 105 by means of a bearing 144. The bearing is installed in a bearing chamber 142. In order to seal the bearing chamber 142 against an undesirable admission of the molten metal 200, a lock is arranged between the bearing chamber 142 and a roll passage 136 toward the molten metal 200 and acted upon with a gaseous medium under a gas pressure in order to seal the lock chamber 132 relative to the molten metal 200. 2.2 In order to lower the maintenance expenditures for the lock, the invention proposes to realize the lock chamber 132 in the form of a diving bell with a channel-shaped outlet 134 that is open relative to the surrounding molten metal 200.

Abstract: A coating apparatus for batches of elongate flimsy members includes batch handling portion and a coating portion. The batch handling portion having an array support portion and an array alignment portion. The array support portion secures and vertically moves an array of elongate flimsy members to be lowered into an array of inlets of the coating portion, the inlets aligned in an array. The array alignment portion provides removable discrete position locating of the individual flimsy members by a guide portion that moves from an upwardly position downwardly to position each member of the array in alignment with the array of inlets. The support portion then lowers the flimsy members into the coating portion through the array.

Abstract: The present invention relates to a substrate processing apparatus useful for plating a substrate or processing a substrate by dipping a substrate in a processing liquid. A substrate processing apparatus of the present invention includes: a loading/unloading area for carrying in and out a substrate; a cleaning area for cleaning the substrate; and a plating area for plating the substrate. The loading/unloading area is provided with a substrate transfer robot having a plurality of hands of dry-use design, a loading port mounted with a cassette for housing substrates, and a reversing machine of dry-use design for reversing the substrate from face up to face down.

Abstract: A process and relating plant for applying protective coats of paint to containers, especially plastic bottles. The process involves gripping the bottles by means of rotating gripping devices fastened to a conveyor chain, and conveying said bottles to all the different stations involved in the process: coating, drying, and curing. Centrifugation is used to remove any excess coating from the external surface of the bottles, keeping the bottles fastened to the same conveyor chain.

Abstract: A coating apparatus and method of using for use in dip coating an article may have a container with opposing sides and a volume capable of holding a liquid coating material and at least one article to be coated by the material, and a stepped apron adjacent at least one of the opposing sides of the container, the stepped apron capable of holding the liquid coating material to a depth sufficient to maintain the material in the liquid state and receiving the liquid coating material dripping from at least one coated article positioned above the stepped apron; and at least one support member above the container capable of holding at least one article to be coated by dipping in the container. The apparatus may include localized heating of the article, such as by spot welding, and air cooling of the article using a cooling system having at least one fan and a conveyor before the article is dipped in the container containing the liquid coating material and subsequently dried.

Abstract: A rack (300) configured for holding workpieces (50) includes a base unit (30) and a cover unit (40). The base unit includes a plurality of holding members (31). Each holding member includes two parallel holding boards (311, 313) cooperating with each other to hold the workpieces, each holding board defines a plurality of gaps (312, 314) corresponding to the workpieces therein. The cover unit covers on the base unit.

Abstract: A method for applying treatment to a single side or surface of an object while preventing other surfaces from being treated and a holder used during the treatment process are disclosed. An object is placed in an opening of the holder. The holder firmly holds the object during the treatment process. The holder comprises a hollow interior so that when the object and holder are dipped into the solution in the tank, air is trapped inside the holder. Air pressure prevents the solution from entering into the hollow interior portion of the holder. In this way, the treatment solution is only applied to the exposed surface of the object and not to the surface in the interior of the holder.

Abstract: The present invention provides an electro-chemical deposition system that is designed with a flexible architecture that is expandable to accommodate future designs and gap fill requirements and provides satisfactory throughput to meet the demands of other processing systems. The electro-chemical deposition system generally comprises a mainframe having a mainframe wafer transfer robot, a loading station disposed in connection with the mainframe, one or more processing cells disposed in connection with the mainframe, and an electrolyte supply fluidly connected to the one or more electrical processing cells. Preferably, the electro-chemical deposition system includes a spin-rinse-dry (SRD) station disposed between the loading station and the mainframe, a rapid thermal anneal chamber attached to the loading station, and a system controller for controlling the electro-chemical deposition process and the components of the electro-chemical deposition system.

Abstract: A plating method of a negative electrode can of a flat alkaline cell and a plating apparatus thereof are provided, by which a plated-coating layer can be formed only in a concave of the negative electrode can, a plating liquid is not uselessly consumed, and an inner face of the negative-electrode-can can be washed with a small amount of washing liquid. An electroless plating liquid is filled into the concave of the negative electrode can so as to form a plated-coating layer on an inner face of the concave. The electroless plating liquid is recovered from the concave of the negative electrode can, then a washing liquid is filled into the concave to wash the inner face of the concave. Then, the washing liquid is recovered from the concave of the negative electrode can, and then air is filled into the concave to dry the inner face of the concave.

Abstract: Apparatus and systems for the application of a coating to an object. The systems comprise a continuous belt comprising at least one supporting member positioned to retain the object thereon, a drive member in operative engagement with the continuous belt, a coating unit in communication with the continuous belt, and a drying unit in communication with the continuous belt and the coating unit and arranged such that the object is coated and dried on the continuous belt. The supporting member of the belt may include at least one blade member comprising a plurality of projections, at least one of which is positioned to contact the object.

Abstract: The present invention relates to a coating assembly and methods that employ the coating assembly to control the thickness of therapeutic or other coatings delivered to a medical device during a coating process. In one embodiment the coating assembly may include a coating plate having a coating transfer surface and a shoulder having a first height, a mandrel moveable over the coating transfer surface, and a coating dispenser positioned in fluid communication with the coating transfer surface. The invention also includes a method of coating a medical device. This method may include placing a medical device on a mandrel, dispensing coating onto a coating transfer surface of a coating plate, moving the mandrel and the medical device over the coating transfer surface of the coating plate so that coating resident on the coating transfer surface transfers to an exposed surface of the medical device, and removing the medical device from the mandrel.

Abstract: Embodiments of the invention generally provide a fluid processing platform. The platform includes a mainframe having a substrate transfer robot, at least one substrate cleaning cell on the mainframe, and at least one processing enclosure. The processing enclosure includes a gas supply positioned in fluid communication with an interior of the processing enclosure, a first fluid processing cell positioned in the enclosure, a first substrate head assembly positioned to support a substrate for processing in the first fluid processing cell, a second fluid processing cell positioned in the enclosure, a second head assembly positioned to support a substrate for processing in the second fluid processing cell, and a substrate shuttle positioned between the first and second fluid processing cells and being configured to transfer substrates between the fluid processing cells and the mainframe robot.

Abstract: There is provided a plating apparatus and method which can control the temperature of a plating solution during plating more uniformly and easily form a uniform plated film on the to-be-plated surface of a workpiece, and which can simplify the device and decrease the footprint. The plating apparatus includes a plating bath having a double bath structure including an inner bath for holding a plating solution and carrying out plating, and an outer bath which surrounds the inner bath and is in fluid communication therewith. A heating device is disposed in the outer bath. The plating apparatus may further include means for circulating or stirring the plating solution in the plating bath.

Abstract: An electroless deposition system is provided. The system includes a processing mainframe, at least one substrate cleaning station positioned on the mainframe, and an electroless deposition station positioned on the mainframe. The electroless deposition station includes an environmentally controlled processing enclosure, a first processing station configured to clean and activate a surface of a substrate, a second processing station configured to electrolessly deposit a layer onto the surface of the substrate, and a substrate transfer shuttle positioned to transfer substrates between the first and second processing stations. The system also includes a substrate transfer robot positioned on the mainframe and configured to access an interior of the processing enclosure.

Abstract: The subject invention includes a plating apparatus (10) having an electrically conductive rack (12) and a frame assembly (14). The frame assembly (14) includes a rod (24) and series of support structures (26). A number of removable (34) and fixed (32) bars are attached to the support structures (26) such that a strand of interconnected workpieces (18) are wrapped over the bars (32, 34) to define a revolution of the interconnected workpieces (18). The plating apparatus (10) and frame assembly (14) are characterized by a series of spacers (38) mounted along the removable bars (34) for separating adjacent revolutions of the interconnected workpieces (18) such that the workpieces (18) can be effectively coated with the material.

Abstract: Various apparatus and methods are provided for lubricating hard memory disks. A mandrel is provided in one embodiment with three rows of teeth and provides a stable, three-point engagement with the inside edge of the disks at the center aperture. When removing disks from a cassette, the mandrel preferably places a uniform space between the disks. In a second embodiment, the mandrel may be used to lubricate single-sided hard memory disks. The single-sided hard memory disk may be positioned on the mandrel in pairs in a gap merge orientation, or equally spaced apart.

Abstract: A liquid-phase growth apparatus for growing a crystal on a substrate includes a crucible containing a solution that contains a raw material for forming the crystal, and a substrate holder for vertically holding the substrate. The substrate holder includes connectors, a receiving component, and a push component. The receiving component and the push component are opposite to each other and are connected by the connectors. The push component holds an upper portion of the substrate while the receiving component holds a lower portion of the substrate. The substrate holder containing the vertically held substrate is dipped into the solution. The receiving component ascends with buoyancy in the solution contained in the crucible, so that the substrate is now held securely and prevented from cracking due to thermal expansion.

Abstract: A container with a quantity of coating liquid includes a luminescent pigment and a paint base. An impeller is in proximity to the bottom of the container to keep the pigment in suspension in the paint base. The container also has a linear inlet slot and a linear outlet slot. A feeding assembly includes a supply roll, a take up roll and a plurality of idler rolls to move a plurality of nylon straps from the supply roll, across the take up rolls and through the container and liquid therein and to the take up roll. A drying assembly is provided for nylon straps moving between the outlet slot and the take up roll. Also provided is a method and material.

Abstract: The present invention relates to a web handling apparatus and process ideally suited for applications involving wet chemistry. The invention involves the horizontal processing of webs in processing containers. The web is redirected into the processing container by inserting a cassette across the web and into the processing container. The cassette includes at least one functional fluid element that facilitates processing of the web. The web handling practices of the invention improve the quality of the processed web. The invention is preferably used in electrodeposition processes.

Abstract: The present invention provides a method for removing wrinkles formed on a web, which is continuously transported through a plurality of guide members. The plurality of guide member includes a crown roller which has the diameter gradually increased toward the center thereof. The crown roller is placed in a transport path of the web and downstream of a first zone in which wrinkles are desirably removed, and the web is deformed in a second zone located downstream of the crown roller so as to at least decrease the width of the web, whereby the wrinkles in the first zone are removed. Even when the web is thin (10 ?m or less), without using particular backup means, wrinkles formed during transport and coating of the web can be removed. In addition, since wrinkles are appropriately removed, a coating film having a uniform thickness can be obtained by an extrusion coating method.

Abstract: A method and apparatus to impart a coating layer on the surface of decorative mouldings that are widely used in the externally insulated finishing systems (EIFS) in the construction industry. The method is a sequence of mechanically advancing a core, constructed from pre-formed expanded polystyrene (EPS, in a straight horizontal plane through a coating chamber/hopper with templates conforming to the desired decorative profile. The apparatus is a rectangular box with a funneled opening at the top with adjustable internal plates to direct the material from the sides of the box toward the pre-formed core that is being coated. Two plates on the bottom of the box support the pre-formed core and are adjustable to leave an opening in the center so that excess material can fall through the bottom after coating the last core.

Abstract: A method for dip coating the exterior surface of a hollow substrate having an open first end and an open second end, the method including: (a) inserting a chuck assembly through the open first end into the substrate interior, wherein the chuck assembly includes a head section and a polymeric member and defines a space that communicates with the substrate interior but is otherwise enclosed, wherein the space is located in the head section; (b) holding the substrate with the chuck assembly wherein the polymeric member forms a hermetic seal with the substrate; (c) contacting the substrate with a coating solution, starting from the second end, while the chuck assembly holds the substrate and the hermetic seal is maintained between the polymeric member and the substrate, wherein there is a closed area into which vapor from the coating solution can flow and the closed area is defined by the space of the chuck assembly and the substrate interior; and (d) separating the substrate and the coating solution to leave a

Abstract: An apparatus and method are provided for applying adhesive to an outer circumference of a section of tubing. The apparatus includes opposed grippers with concave adhesive transfer areas that can be moved into surrounding relationship with the tubing. Adhesive dispensing passages communicate with the adhesive transfer areas for delivering adhesive to the tubing. Counterbores are at opposed ends of the adhesive transfer areas and communicate with a vacuum source for removing excess adhesive.

Abstract: An apparatus including: a tank with a closed base end and an open top end, and adapted to contain a coating formulation; and a receiver member with at least a cone shape, where the base of the cone is attached to the interior and to the base end of the tank and adapted to receive an article for coating.

Abstract: A system and method for applying adhesive to at least a first end of a rod-shaped member, such as a cotton swab stick includes a carrier, an adhesive applicator, and a rotator device. The carrier conveys the rod-shaped member or stick in a machine direction and also allows rotation of the rod-shaped member about its longitudinal axis. The adhesive applicator includes an application surface positioned to engage the first end of the rod-shaped member. The application surface includes at least one discharge passage for applying adhesive to the first end of the rod-shaped member. The rotator device rotates the rod relative to the application surface and about its longitudinal axis as the rod-shaped member is conveyed along the application surface.

Abstract: A method and apparatus is provided for applying a plaster-like coating material to the decorative exposed surface of a preform workpiece. The apparatus comprises; means for mechanically advancing a workpiece along the apparatus along a straight horizontal axis over a non-continuous surface; means for engaging the bottom portion of a workpiece to constrain lateral and vertical movement as the workpiece passes along the apparatus; and means for applying a desired thickness of plaster-like coating material to a decorative surface of an advancing workpiece. Both the method and apparatus provide on a consistent basis, a smooth coating with a controlled thickness tightly bonded to the entire exposed decorative surface of a workpiece. The method and apparatus provide a simple, efficient, cost effective and reliable means for applying a plaster-like coating to the exposed decorative surface of a workpiece for use on a commercial scale in the construction industry.

Abstract: A plating apparatus continuously plates a surface of a substrate with metal and performs its supplementary process in one housing unit. The plating apparatus comprises a cassette stage for placing a substrate cassette thereon, a pre-treatment unit for pre-treating a surface of a substrate, and a plating unit for plating a surface of the substrate pre-treated in the pre-treatment unit. The plating apparatus further comprises a first substrate stage disposed between the cassette stage and the pre-treatment unit, a cleaning and drying unit disposed between the cassette stage and the first substrate stage, a first transfer device, and a second transfer device. The first transfer device transfers a substrate between the substrate cassette, the cleaning and drying unit, and the first substrate stage. The second transfer device transfers a substrate between the first substrate stage, the pre-treatment unit, and the plating unit.

Abstract: A filament bundle is rewound from a reel, and passes through various sorts of liquid in processing vessels to be used for plating. The filament bundle passes through a fixed guide roller and a movable guide roller while it travels within the liquid in the processing vessel. The movable guide roller is moved periodically, the filament bundle is stretched and slackened by turns, whenever the filament bundle is slackened or untied, the bundle is loosened. The filament bundle with each filament subjected to the plating is taken up to a take-up reel.

Abstract: After a thin liquid agent film is formed by supplying a liquid agent onto a plate-like developer holder, this liquid agent film and the surface of a substrate are opposed. The liquid agent film and the substrate are brought into contact with each other at a point by declining the substrate and moving it close to the liquid agent film, or by curving the substrate toward the liquid agent film. Then, the substrate is made parallel to the liquid agent film, and the liquid agent is supplied such that the contact area of the liquid agent film spreads over the entire surface by the interfacial tension between the liquid agent film and the substrate. Since a thin liquid agent film can be uniformly formed below the substrate, processing can be performed with a small consumption amount. Additionally, the liquid agent can be supplied to the substrate without holding air.

Abstract: A method and apparatus is provided for applying a plaster-like coating material to the decorative exposed surface of a preform workpiece. The apparatus comprises; means for mechanically advancing a workpiece along the apparatus along a straight horizontal axis over a non-continuous surface; means for engaging the bottom portion of a workpiece to constrain lateral and vertical movement as the workpiece passes along the apparatus; and means for applying a desired thickness of plaster-like coating material to a decorative surface of an advancing workpiece. Both the method and apparatus provide on a consistent basis, a smooth coating with a controlled thickness tightly bonded to the entire exposed decorative surface of a workpiece. The method and apparatus provide a simple, efficient, cost effective and reliable means for applying a plaster-like coating to the exposed decorative surface of a workpiece for use on a commercial scale in the construction industry.

Abstract: An electrostatic powder coating apparatus including a housing with an interior coating area for receiving a workpiece. The interior coating area includes a vortex inducing surface and a pressurized air input device directs air against the surface to form a swirling pattern of air around the workpiece. A powder introducer directs charged powder into the swirling pattern of air and the powder is then electrostatically attracted to the workpiece. The powder introducer may be a powder fluidizing bed disposed in the housing or other suppliers, such as electrostatic powder spray guns. In alternative embodiments, vortex generators in the form of tubular structures connected proximate the housing inlet and outlet have tangential ports for introducing positive pressure air or inducing vacuum in the tubular structures.

Abstract: The invention relates to an installation for treating wafers made of materials serving as microelectronics substrates including a tank for containing a treatment bath, a wafer support device capable of receiving at least one wafer of a first size, and an element for grasping and placing each wafer of the first size in the bath and for removing it therefrom. The installation further includes a support for receiving at least one wafer of a second size that is smaller than the first size, the shape of the support allowing it to be grasped by the grasping element and received by the wafer support device in the tank.

Abstract: A method for producing coated strands of metal includes guiding a metal strand through the bottom of a vessel filled with a molten mass of the same or different composition as the metal strip, wherein the residence time of the metal strand is selected as a function of at least one of the molten bath level, the casting speed, the metal strand thickness, and the preheating temperature of the metal strand such that the deposited molten mass on the metal strand has a desired thickness of several times the initial thickness of the metal strand. After exiting from the molten bath, the metal strand with a layer crystallized thereon is subjected to a smoothing path carried out when the surface temperature of the strand crystallized thereon is smaller than the solidus temperature of the molten bath, so that at least the surface of the layer crystallized thereon is solidified. The crystallized layer is applied with a thickness which exceeds the desired final thickness of the coated strand.

Abstract: The coating device for coating a metal band (12) in a melt (14) of a non-magnetic metal comprises a shaft (16) rotatable in the melt (14) for guiding the metal band (12). The shaft (16) is supported in a shaft bearing (261) that is a magnetic bearing whose stationary portion (281) is encapsulated. Thus, a contactless shaft support in a metal melt is obtained, whereby the bearing wear is largely reduced and the service life of the bearing is prolonged.

Abstract: In a coating method for forming a film of a coating material on a substrate by supplying the coating material from a coating unit to the substrate held by a stage while the coating unit is moved relative to the stage, the stage includes a substrate-holding section and a peripheral section which has a surface higher than that of the substrate-holding section. The coating method includes the steps of mounting the substrate on the substrate-holding section of the stage; forming the film of the coating material so that the coating covers the substrate and extends to the peripheral section; and removing the coating material remaining in the peripheral section by a coating material removing unit after the substrate provided with the film is dismounted from the stage.

Abstract: A wallpaper dispensing apparatus includes a tray with a ridge projecting from the bottom and extending transversely between the side walls to divide the tray into a forward pool section and a rearward trough section. A removable cover is attached to the forward pool section and includes a pair of depressions with guide surfaces on the bottom, spaced above the bottom of the tray to form a passageway between the cover and tray bottom. the cover has a rearward portion following a portion of the ridge, and a straight rearward edge extending transversely across the tray. An opening in the cover, extending from the forward edge permits the user to draw a strip of wallpaper from a roll located in the trough, through the passageway between the cover and tray, and out the forward end of the tray. Water in the pool portion wets the wallpaper as it is drawn from the dispensing apparatus.

Abstract: Objects, (4) especially vehicle bodies (4), are guided through a painting installation comprising at least one bath (2) in a continuous translation movement, by means of a transport device (5). Immersion devices carry the objects using a carrier structure (61) which is connected to the transport device (5) in such a way that it can be pivoted by a pivoting arm (50, 51). A first drive device (54, 55, 56, 57) causes a pivoting movement of the pivoting arm (50, 51) about a first axis. A second drive device (78, 79, 80, 81) is used to pivot the carrier structure (61) about the second axis, in relation to the pivoting arm (50, 51). One such immersion device enables very different kinematics of the immersing and emerging movement to be carried out.

Abstract: The present invention relates to an electroless plating apparatus which can reduce the amount of a plating liquid to be used, maintain a stable plating process, be downsized, reduce an apparatus cost, form a film having a uniform thickness over an entire surface, and prevent a plating liquid from being deteriorated due to a temperature rise. The present invention comprises a holding apparatus for holding a substrate with a surface, to be plated, facing upward, a plating liquid holding mechanism for sealing a periphery of the surface, to be plated, of the substrate held by the holding apparatus, an electroless plating treatment liquid supply apparatus for supplying an electroless plating liquid to the surface, to be plated, of the substrate sealed by the plating liquid holding mechanism to allow the supplied electroless plating liquid to be stored on the substrate, and a heating apparatus provided below the substrate.

Abstract: A transport object support means (40) is rotated about an anteroposterior axis (39) by a rotary control means (30), whereby a transport object (85) supported by the transport object support means (40) can be displaced in the vertical direction and the orientation of the transport object (85) can be varied during the vertical displacement without moving the carriage (10). As a result, the distance needed to displace the transport object (85) in the vertical direction can be dispensed with, the section (apparatus) for treating the transport object (85) can be shortened and made more compact, and the varying orientation of the transport object (85) can be utilized to perform a variety of treatments smoothly and efficiently without affecting the environment.

Abstract: A method for applying a sealant to a component, in which the sealant is applied to a part of or the entirety of a sealing surface of the component, comprises the steps of: disposing in the sealant, an abutting member approximately in parallel to a surface of the sealant, which is a liquid, formed into a film of a specified thickness; pressing the sealing surface of the component to the abutting member in the sealant formed into the film; and transferring the sealant to the sealing surface of the component by pulling the component apart from the sealant.

Abstract: An apparatus and method for plating a workpiece. The apparatus comprises, generally, an anode, a cathode, and a selective anode shield/material flow assembly. In use, both the anode and the cathode are immersed in a solution, and the cathode is used to support the workpiece. During an electroplating process, the anode and the cathode generate an electric field emanating from the anode towards the cathode, to generate a corresponding current to deposit an electroplating material on the workpiece. The selective shield/material flow assembly is located between the anode and the cathode, and forms a multitude of adjustable openings. These opening have sizes that are adjustable during the electroplating process for selectively and controllably adjusting the amount of electric flux passing through the selective shield/material flow assembly and the distribution of the electroplating material on the workpiece. The selective shield/material flow assembly can also be used with an electroless plating system.

Abstract: An apparatus and method for processing substrates are provided. The apparatus includes a first processing unit and a second processing unit. A substrate holder is vertically displaceable over the first processing unit, and is guided outside the first and second processing units. In a raised position of the substrate holder relative to the first processing unit, the second processing unit is movable between the substrate holder and the first processing unit.

Abstract: The invention relates to a method for introducing and removing workpieces, especially vehicle bodies, into or from a treatment area (20) by rotational movements, whereby the treatment area serves for treating surfaces of the workpieces (1). A workpiece (1) is detachably fixed at a holding frame (2) which is moved together with at least one workpiece that is situated thereon at an essentially constant speed and by a continuous translation. The workpiece (1) is rotated around a rotational axle (6) at least at the beginning and end of the treatment area (20) and simultaneously with the translation movement. The rotational axle (6) is orientated vertically in relation to the moving direction of the holding frame (2) and is lifted and lowered during rotation.

Abstract: A holder for electroless plating to hold a plurality of ceramic elements for ceramic electronic parts during electroless plating treatment, each surface of said ceramic elements being to be electroless plated, said holder comprising a plurality of cells to house each of said plurality of ceramic elements separately, and each of said cells having such a structure as to permit the flow communication of a plating solution into the cell.

Abstract: An apparatus for transferring wafers between wafer holders such as wafer cassettes, etching drums and the like includes a tank for containing a liquid transfer medium in which the wafers can be transferred. The apparatus includes a wafer transfer unit that can transfer a plurality of wafers such as semiconductor wafers between wafer holders, and maintain the wafers in a desired relative orientation during transfer. For example, the wafers can be maintained in a parallel relationship. The apparatus can be used to automatically transfer wafers to etching drums without cross-indexing of the wafers and without manual handling of the wafers.