Abstract: A process for densifying an annular porous structure comprising flowing a reactant gas into an inner diameter (ID) volume and through an ID surface of the annular porous structure, flowing the reactant gas through an outer diameter (OD) surface of the annular porous structure and into an OD volume, flowing the reactant gas from the OD volume through the OD surface of the annular porous structure, and flowing the reactant gas through an ID surface of the annular porous structure and into the ID volume.

Abstract: A configuration is provided for a deposition device using the catalytic CVD method which reduces problems associated with extension of the catalyst and is superior in terms of running costs and productivity. The configuration provides a chamber 1 able to maintain reduced interior pressure; a source gas introducing route 32, 33a for introducing source gas into the chamber; a catalyst 4 of tantalum wire having a boride layer on the surface and provided inside the chamber 1 so as to allow the source gas introduced via the source gas introducing route to come into contact with the surface of the catalyst; a gas introducing route 36, 33b for introducing boron-containing gas to the chamber 1 for the reformation of the boride layer on the surface of the catalyst 4; and a power supply unit 5 for applying energy to the catalyst 4 to maintain the catalyst at a predetermined temperature.

Abstract: One disclosed feature of the embodiments is a control processor in a vapor delivery system for chemical vapor deposition precursors. A pressurization rate processor calculates first and second pressurization rate curves at first and second time instants. A volume calculator computes consumed volume based on first and second volumes at the respective first and second time instants. The first and second volumes are computed using slopes of lines fitting the first and second pressurization rate curves.

Abstract: A gas flow of a gas pipe is indicated before an electromagnetic valve is actually opened, so that the electromagnetic valve can be prevented from being opened or closed by a wrong manipulation or hazards caused by undesired mixing of gases can be avoided so as to improve safety. The substrate processing apparatus includes a state detection unit configured to detect an opening/closing request state and an opening/closing state of a valve installed at a gas pipeline; and a indication unit configured to indicate a gas flow state of the gas pipeline predicted according to the opening/closing request state and a gas flow state of the gas pipeline when the valve is opened, in a way that each state is distinguished.

Abstract: A coating device includes a reaction device, a mixing device, a deposition device, a first switching device and a second switching device. The reaction device defines a reaction chamber. The mixing device is connected to the reaction device and defines a mixing chamber that communicates with the reaction chamber. The deposition device is connected to the mixing device and defines a deposition chamber that communicates with the mixing chamber. The first switching device is configured to communicate the reaction chamber and the mixing chamber and separate the reaction chamber from the mixing chamber. The second switching device is configured to communicate the mixing chamber and the deposition chamber and separate the mixing chamber from the deposition chamber.

Abstract: Disclosed is a method for replacing a process instrument in a processing apparatus, in which a target object is loaded by transfer mechanism into a processing unit and is subjected to a process by use of the process instrument. The method includes confirming that a process on the target object is finished in a processing unit designated as a process instrument replacement target, and providing information that a process instrument replacing operation is permitted to start. The method further includes, when a shutter of the processing unit designated as the process instrument replacement target is closed to perform a process instrument replacing operation and an operation prohibition state is thereby applied to the transfer mechanism, canceling the operation prohibition state to allow the transfer mechanism to perform a load/unload operation relative to a processing unit not designated as a process instrument replacement target.

Abstract: In a vacuum processing apparatus, a substrate chuck mechanism member is attached to a substrate holder provided in a vacuum processing chamber, includes a shaft member, first and second coil springs that are provided at the two ends, respectively, of the shaft member, and a substrate chuck plate provided at the end of the shaft member, and is additionally attached to the substrate holder using the substrate chuck plate by elastic biasing of the first coil spring. The holding state of the substrate on the substrate holder is changed by the expansion/contraction actions of the first and second coil springs in accordance with the reciprocal movement of the substrate holder.

Abstract: A film forming apparatus including a film forming chamber which forms a film, a jetting mechanism which jets aerosol containing material particles onto a substrate in the film forming chamber, a measuring chamber communicating with the film forming chamber, a measuring mechanism which measures a thickness of the film in the measuring chamber, a pressure adjusting mechanism which controls an internal pressure of the film forming chamber and the measuring chamber, a conveyor which transports the substrate between the film forming chamber and the measuring chamber, and a blocking section which blocks a communication between the film forming chamber and the measuring chamber. Accordingly, inside of the measuring chamber is maintained clean without being polluted with the aerosol, and the measurement precision can be maintained. In the film forming process, the film thickness can be easily and precisely measured, and fed back to the film forming condition.

Abstract: Disclosed is a method for replacing a process instrument in a processing apparatus, in which a target object is loaded by a transfer mechanism into a processing unit and is subjected to a process by use of the process instrument. The method includes confirming that a process on the target object is finished in a processing unit designated as a process instrument replacement target, and providing information that a process instrument replacing operation is permitted to start. The method further includes, when a shutter of the processing unit designated as the process instrument replacement target is closed to perform a process instrument replacing operation and an operation prohibition state is thereby applied to the transfer mechanism, canceling the operation prohibition state to allow the transfer mechanism to perform a load/unload operation relative to a processing unit not designated as a process instrument replacement target.

Abstract: The present invention provides an apparatus for manufacturing a bonded substrate that suppresses a defect in the bonded substrate. When the pressure in a vacuum chamber is at the atmospheric level, upper and lower chuck units respectively attract substrates through vacuum. When the vacuum chamber is depressurized, each chuck unit electrostatically attracts the associated substrate. During the depressurization of the vacuum chamber, the pressure for attracting each substrate to the associated chuck unit is controlled to be equal to the pressure in the vacuum chamber. This prevents each substrate from falling from or moving relative to the associated chuck unit. The first and second substrates are thus bonded together and accurately aligned.

Abstract: This invention relates to an integrated vapor or liquid phase reagent dispensing apparatus having a plurality of vessels and a plurality of carrier or inert gas feed/vapor or liquid phase reagent delivery manifolds, that may be used for continuously dispensing vapor or liquid phase reagents such as precursors for deposition of materials in the manufacture of semiconductor materials and devices.

Abstract: A new device and process for continuously applying coatings, such as resin and additives or polymers or the like, to minerals is disclosed. The device and apparatus differ substantially from standard batch coating processes currently used by industry. The apparatus uses a horizontal cylinder with an internal auger and a series of injection ports distributed along the cylinder. Minerals that are to be coated are pretreated and passed through the mixing cylinder using the auger (which may comprise one or more screws with variable pitch blades). As the mineral particles pass through the cylinder various coating materials are injected by the injection ports. The complete system is described, the method of use is explained and the control system which allows for different products is described.

Abstract: Provided are a plasma treatment method and a plasma treatment device capable of forming a silicon nitride film having high compressive stress. In the plasma treatment method for depositing the silicon nitride film on a process target substrate by use of plasma of raw material gas containing silicon and hydrogen and of nitrogen gas, ion energy for disconnecting nitrogen-hydrogen bonding representing a state of bonding between the hydrogen in the raw material gas and the nitrogen gas is applied to the process target substrate so as to reduce an amount of nitrogen-hydrogen bonding contained in the silicon nitride film.

Abstract: A metering system for a coating installation for coating components such as vehicle body parts contains an applicator which applies the coating material supplied to it with a volumetric flow metered on-demand, a regulated first metering device which adjusts the pressure or the volumetric flow of the coating material to be applied by the applicator based on setpoints which are specified by automated installation controls, a transducer to generate a reading which matches the pressure or the volumetric flow of the coating material flowing to the applicator and a control device for regulating the metering device as a function of the specified setpoints and of the reading from the transducer. A second metering device is connected at the outlet of the regulated first metering device for the coating material flowing to the applicator which controls the pressure or volumetric flow of the said applied coating material for precision metering of the coating material applied as a function of the specified setpoints.

Abstract: The present invention provides a system to dispense a liquid, contained in a cartridge, onto a substrate employing a dispensing system under control of a processor in data communication with a memory.

Abstract: The present invention relates generally to semiconductor fabrication. More particularly, the present invention relates to system and method of selectively oxidizing one material with respect to another material formed on a semiconductor substrate. A hydrogen-rich oxidation system for performing the process are provided in which innovative safety features are included to avoid the dangers to personnel and equipment that are inherent in working with hydrogen-rich atmospheres.

Abstract: A polyimide processing tool for coating polyimide on a semiconductor wafer is provided with a pause time monitoring means for monitoring the duration of the polyimide processing tool's wafer-transfer robot's pause time. The wafer-transfer robot transfers wafers from polyimide apply tool to polyimide cure bake oven and monitoring the duration of the pause helps prevent undesirably long pauses between polyimide apply of the uncured polyimide and the curing step.

Abstract: A liquid delivery system having safe unit includes: an injection valve connected to a chamber; a mass flow controller connected to the injection valve; an auxiliary valve connected between the injection valve and the mass flow controller; an auxiliary pump connected to the auxiliary valve; and a relay electrically connected to the auxiliary valve.

Abstract: The present invention provides an electrostatic painting device with a transmission frequency adjustment device for automatically adjusting a transmission frequency in such a manner that the consumed current flowing in a high voltage booster circuit does not exceed a prescribed value.

Abstract: A sensor, such as a mass spectrometer, capable of detecting the presence of materials in a sampled gas is interconnected with a processing chamber of a vacuum manufacturing tool. The sensor includes a timing circuit which is activated only if certain levels of specific materials are detected. Furthermore, the timer is set to run a predetermined time interval after activation so as to discriminate between known transient processing conditions and the presence of impurities which can greatly influence the manufacturing process. When the timer exceeds the predetermined time duration, an output signal can alert the process operator or automatically shutdown the manufacturing tool.

Abstract: An apparatus for forming a coating film comprising, a coating unit for forming a coating film by applying a coating solution onto a substrate, and a curing unit for curing the coating film by applying a heating and a cooling to the substrate, in which, the curing unit comprises a heating chamber having a hot plate for heating substrates having the coating solution applied thereon one by one, a cooling chamber communicated with the heating chamber and having a cooling plate for cooling the substrates processed with heat, an inert gas supply mechanism for supplying an insert gas to the heating chamber and the cooling chamber, and an evacuation mechanism for evacuating each of the heating chamber and the cooling chamber.

Abstract: Multiple levels of interlocks are provided relative to gas flow for a chemical vapor deposition chamber. When a chamber lid used for normal processing is in place, no interlock is in effect. When a lid used during maintenance operations is in place, flow of toxic gas to the chamber is interlocked, but flow of purge gas is permitted. When no lid is in place, all gas flow to the chamber is interlocked. The interlock arrangement may be implemented with two switches, both of which are actuated when the lid for normal processing is in place, and only one of which is actuated by the lid for the maintenance process.

Abstract: The invention disclosed herein is related to a photoresist coating system that significantly prevents performance of the system being degraded by any bubble in, liquid photoresist. The proposed system comprises a pump, a series of pipelines, a reactor, a tank, a capacitor sensor, a photochopper sensor and a controller, where the capacitor sensor is coupled to the pipeline and the photochopper sensor is coupled to the pipeline. Thus, any bubble inside the pipeline is detected by the capacitor sensor or the photochopper sensor. In other words, any bubble in the photoresist is detected. The operation of the present photoresist coating system is terminated by the controller to protect any wafer inside the reactor, and a warning alarm is activated by the controller.

Abstract: According to the present invention, a signal transmission system is arranged in a region surrounded by a gas control means and a plurality of blocks whereby a region between elements constituting a gas supply flow path can be utilized for the region of the signal transmission system thereby to make the occupying space small and miniaturize the apparatus.

Abstract: A module of a host computer of a semiconductor fabrication management system receives from an operator a plurality of IDs assigned by the operator to each of the wafers, respectively, received in the slots of a wafer cassette. The module searches a database of the host computer to correlate each received wafer ID with a process step ID, and the process step ID with a process program ID (PPID). Process condition data is formulated from the correlated process step IDs and PPIDs. At this point, the semiconductor fabrication management system is used to determine whether the operator has inputted a track-in signal to the system. If the track-in signal has been inputted, the processing condition data is downloaded to a server of the semiconductor processing equipment. The downloaded process condition data is used to change, if necessary, an equipment control message stored in the server.

Abstract: A thermal protection system for a chemical vapor deposition machine (CVD). The system of the present invention includes a thermal sensor for providing a temperature signal corresponding to a CVD chamber temperature, a heating component for heating the CVD chamber, and a controller for regulating the CVD chamber temperature. The controller is coupled to receive the temperature signal and to control the heating component in response thereto. An interlock circuit is coupled between the heating component and the controller. The interlock circuit has an open state and a closed state. A comparison circuit is coupled to receive the temperature signal and coupled to control the interlock circuit, wherein the comparison circuit effects a comparison between the temperature signal and a reference and commands the interlock to the open state when the temperature signal exceeds the reference.

Abstract: Disclosed herein is a method and a reactor system for CVD surface coating. In this method, the reaction gas is supplied to the reactor chamber with any frequency and at any time intervals in succession, rising and falling in the form of a pulsed gas stream. The reversal of the gas flow direction is performed by a multipath valve located inside the reactor which can be controlled from outside by means of an adjusting shaft.

Abstract: The present invention provides an electrostatic spraying device which includes a primary charge return path between the device and the target to be sprayed and circuitry for warning the operator of potentially hazardous spraying conditions. More particularly, the present invention includes circuitry for warning the operator of conditions wherein the primary charge path is inadequate and other conditions in which the return of spray current via the primary charge path is affected.

Abstract: A semiconductor fabrication apparatus having a process chamber and a handler which is provided for loading wafers into the process chamber or unloading wafers therefrom, comprising a plurality of switches for detecting positions of the handler and for generating detection signals in accordance with the positions; and an indicator for indicating normal operations of the switches. The indicator has relays operated in accordance with a voltage level of each of the detection signals; and LEDs associated with each of the relays, for identifying a normal operation of the handler. By confirming the conductive/nonconductive state of the LED, the operator can easily determine if the switches are accurately detecting the position of a load fork and/or an aligning plate.

Abstract: Lenses are brought individually or in pairs on a transport device (12) to a continuous vacuum apparatus (1) equipped with a rotating substrate carrier (3). The eyeglass lenses (13) are introduced through a system of locks (15) into the continuous vacuum apparatus (1), where they are coated in at least one controllable coating station (5, 6, 7) with at least one transparent layer and then sent back to the transport device (12). The eyeglass lenses (13) are given codes (18), and the codes are read by a code reader (19). The coating parameters of the individual coating stations (5, 6, 7) and the drive of the substrate carrier (3) are controlled by the code reader (19).

Abstract: A powder spray coating system has a controller configurable to a variety of different system configurations. Configuration data is keyed by an operator from menu prompts and stored for use by a microprocessor based operating program to operate the supply of powder and air to a powder spray gun. The microprocessor also presents information from monitored parameters of the system, including the supply air dew point which is monitored to provide warning signals of potential condensation in the system. Dew point detection is accomplished by measuring temperature and relative humidity and comparing the measurements with values for air at the maximum acceptable dew point. Alternatively, measurement of absolute humidity and supply air pressure are used to compute the dew point of the air which is compared with the actual temperature and maximum dew point temperature.

Abstract: An apparatus for application of material to the external diameters of cylindrical items of manufacture. The apparatus includes a frame, a transport system having work stations supporting the items, an application system, and a curing system for curing the material applied to the cylindrical items. The application system includes first and second horizontally, axially spaced application rolls engagable with the items external diameter, and an adjustable reservoir system for supplying a desired thickness of material to be applied to the external diameter of the item.

Abstract: An apparatus for selectively delivering fluids from first and second separate fluid supplies to an outlet. The apparatus consists of a valve casing with an internal chamber, a valve cartridge for placement within the internal valve casing chamber, cooperating structure on the valve and valve cartridge for defining separate first and second chambers for first and second fluids, and structure for selectively communicating the first and second chambers with the fluid outlet to thereby selectively cause the first and second fluids to be discharged from the apparatus.

Abstract: Apparatus for applying a predetermined glue pattern to a predetermined surface of a workpiece, which workpiece is moved in a stepwise, indexed fashion, such that this predetermined surface thereof follows a given path. The predetermined pattern includes first portion which extends along a line which intersects the given path. The apparatus includes a non-contact glue valve having an outlet; a carrier for mounting the glue valve for bidirectional motion along the line intersecting the given path with the outlet thereof in alignment with the first portion of the predetermined pattern and spaced closely above the predetermined surface of the workpiece. A control is provided for turning the glue valve on and off in a predetermined fashion for depositing glue upon the predetermined surface of the workpiece in the first portion of the pattern.

Abstract: An apparatus for thin layer vapor deposition has two horizontally spaced apart vacuum deposition chambers. Rearwardly and inwardly angled horizontal vacuum ducts are connected to the chambers, and a vacuum pumping device is connected to a further horizontal vacuum duct which communicates with the inwardly angled ducts. A computerized central system disposed between the chambers is operatively connected to the ducts and vacuum pumping device to enable either of the chambers to be used for set-up and evacuation while the other chamber is used for heating and deposition.

Abstract: In a process for intermittently spraying a setting pasty composition mixed with a tempering liquid, in particular for building up refractory linings of metallurgical vessels, the composition is conveyed from a preparing station (6) at which it is prepared, to a delivery nozzle (11). In order to prevent the composition from thickening or hardening in the duct (15) leading to the delivery nozzle (11) when delivery is interrupted, it is conveyed during delivery stops in a circuit that includes the delivery nozzle (11).

Abstract: A spray coating booth for enclosing individual articles to be coated with a liquid spray while the articles are supported in closely spaced relation on an article conveyor for movement through the booth includes a rigid frame with fixed sidewalls and movable top and end walls which may be moved between a closed position completely enclosing an article supported on the conveyor and an open position to permit articles to be moved into and out of the booth. The movable top assures against coating liquid dripping onto and contaminating articles moving on the conveyor which are not to be coated. The end walls are supported for movement in substantially a transverse vertical plane to permit close spacing of articles on the conveyor without contact of the articles by the end walls.

Abstract: Applying non-treating liquid to a traveling textile fabric substrate during temporary change-over discontinuance of treating liquor application in a textile treating and drying range with the non-treating liquid being applied in an amount sufficient to approximate the amount of treating liquor applied during normal operation of the range so as to allow the dryer to continue operating at substantially normal operating temperatures without damage to the fabric substrate. A non-treating liquid applicator is shifted between an inoperative position out of the path of the textile fabric substrate into an operative position in engagement with the substrate. The applicator includes a roller for arcuate engagement with the substrate and to which liquid is applied by spray and is uniformly distributed by a squeeze roll acting on a cover on the roller of material capable of retaining and transferring liquid onto the substrate.

Abstract: A valve control mechanism for a paint spraying system provides for pressure relief prior to turn-off of the compressor. A pair of interlocking knobs, a pressure control knob and an off-prime-spray knob, are mechanically interlocked so that the compressor can only be turned on and off in a low pressure condition. When spraying has been completed, it is necessary to first operate the off-prime-spray knob to the prime position at which a cam structure opens the off-prime-spray valve for an immediate pressure relief prior to turn off of the pump.

Abstract: In the case of sequentially coating workpieces, such as motor vehicle bodies, with a program controlled painter-robot, it has hitherto been difficult or impossible to finish painting a partly coated workpiece in the event of an unscheduled breakdown. This was because the robot and the workpiece would inertially overrun their synchronized relative positions after the breakdown, thus making it difficult to resynchronize the two. According to the subject invention, based upon the synchronized relative positions of the workpiece and the painter-robot both at the time of the breakdown and after the unit has come to stop, a path of travel is determined over which the robot is returned accurately to the relative position at which the breakdown occurred. The coating operation is then resumed from this position.

Abstract: The tool of the present invention includes a compliance guide having a cylindrical vertical bore extending therethrough. Slidably mounted within the bore is a tool holder which is free to slide vertically, but which is held against lateral movement within the bore. Attached to the tool holder is a tool having a dauber pad at its lower end. A nipple is threaded within a vertical bore in the tool holder and extends upwardly therefrom through an aperture in a closure plate which fits over the upper end of the vertical bore in the compliance guide. A nut is threaded over the nipple above the closure plate and a spring below the closure plate yieldably urges the nipple and the tool holder downwardly until the nut engages the closure plate. Fluid is introduced through the nipple and extends downwardly to the dauber pad which absorbs the liquid and applies it to the work surface.

Abstract: A developing apparatus is provided with a developing roll for carrying a toner thereon and an elastic blade pressed against the surface of the developing roll to apply the toner thereto. The toner is thus applied to the surface of the developing roll by the elastic blade to form a thin layer of the toner on the surface of the developing roll. The thin layer is opposed to a photosensitive drum at a predetermined space to deposit the toner on an electrostatic latent image in the photosensitive drum. A pressing force changing mechanism is provided for selectively pressing the elastic blade with one of a first and second pressing force. The first pressing force is set to be enough to form the thin layer of the toner on the surface of the developing roll and the second pressing force is set lower than the first pressing force.

Abstract: The present invention relates to a machine for the continuous treatment of a body of revolution. Treatment stations are provided on the periphery of a rotatable drum. The machine comprises at the location of the zone of treatment a continuous guiding belt driven by a prime mover. On one side or the other of such belt, or on both sides thereof, there are disposed elements constituting a fixed guiding guard. The drum drives the bodies of revolution which are to be treated, in rotation by friction as they pass along the guard and the belt, the treating operation being effected when the treatment stations and the bodies pass through the zone of treatment. The bodies can themselves turn, if the drum is stopped, by friction between them and the movable belt, in order to avoid defects in varnishing or other similar treatments in case of breakdown of the driving of the drum. The apparatus is particularly useful in the continuous varnishing of bodies of revolution.

Abstract: An apparatus for melting and applying meltable adhesive, especially in combination with edge gluing machines for continuously advancing work pieces, includes a melting chamber (4) for the meltable granular adhesive material. The melting chamber is equipped with a heatable melting insert (5). A supply container (17) for the solid meltable granular adhesive material (18) is arranged to open into the melting chamber (4). A power driven closure slide (13) is arranged between the melting chamber (4) and the supply container (17) for the granular adhesive material. The closure slide (13) is operated in such a manner that filling the melting chamber (4) with granular adhesive material (18) is free of trouble and the adhesive material may be properly processed without any difficulties, especially without any jamming.

Abstract: An apparatus is provided for applying lubricant to articles such as connectors. The connectors 10 with projecting terminals 12 are loaded into a holder 19 enclosed within a housing 16 having an entry door 23. The door is shut and lubricant is pumped into a tank 28 to overflow into a catch receptacle 66 whereafter the holder is moved to dip the terminal ends into the lubricant. During the dipping operation a pair of locking members 98 and 133 are positioned to block opening of the door. Following the dipping operation the locking member 98 is withdrawn while the lubricant is drained from the receptacle. Upon completion of the draining of the receptacle, facilities 126-132 are operated to withdraw the locking member 133 thus permitting an attending operator to open the door without exposure to any noxious frames emanating from the lubricant.

Abstract: A device for cement applying mechanisms in shoe lasting machines, wherein a safety valve is caused to prevent air from entering an air feed line in the cement feed when there is no shoe in the shoe machine and the shoe machine has been actuated, thereby preventing the machine operator from being injured by hot cement, and where nozzles may be effectively used with an air blast to controllably project hot cement onto portions of insoles some of which may not be immediately thereadjacent.

Abstract: A control system for a slide centrifuge includes a ratio checking circuit which produces a signal when the ratio between the light passing through the slide and the rate of change of this light passes through a predetermined critical value. When this ratio passes through the critical valve, spinning is stopped. This effectively stops spinning when the rate of reduction of blood cell density on the slide slows, thereby producing better slides for clinical analysis.