Produced By Temperature Change, Centrifugal Force, Or Fluid Pressure Shock Patents (Class 134/17)
  • Patent number: 10898947
    Abstract: A process of recovering clean sand and active clay from sand or dust from a foundry is disclosed.
    Type: Grant
    Filed: August 15, 2017
    Date of Patent: January 26, 2021
    Assignee: AMCOL INTERNATIONAL CORPORATION
    Inventors: Jerald W. Darlington, Jr., Elliot Francis Halphen, Liam Matthew Miller
  • Patent number: 10711575
    Abstract: A well tool assembly, system, and method for handling well debris is described. The assembly includes an electric submersible pump (ESP) configured to be positioned within a wellbore and a well debris cutting tool configured to be positioned downhole relative to the ESP within the wellbore. The ESP is configured to rotate in a first direction to pump well fluid in an uphole direction. The well debris cutting tool is configured to rotate in a second direction opposite the first direction and to grind debris carried by the well fluid in the uphole direction.
    Type: Grant
    Filed: March 22, 2019
    Date of Patent: July 14, 2020
    Assignee: Saudi Arabian Oil Company
    Inventors: Chidirim Enoch Ejim, Jinjiang Xiao
  • Patent number: 10634094
    Abstract: Methods, systems and apparatuses are disclosed for delivering high triple point propellant to a rocket engine and maintaining the desired phase of the propellant during engine ignition.
    Type: Grant
    Filed: May 27, 2016
    Date of Patent: April 28, 2020
    Assignee: The Boeing Company
    Inventors: Daniel A. Watts, David S. Jenkins
  • Patent number: 10584438
    Abstract: A laundry treating appliance includes a cabinet, a treating chamber, and a treating chemistry dispenser provided with the cabinet and fluidly coupled to the treating chamber. The dispenser includes multiple compartments for treating chemistry, including multiple powder chemistry compartments and multiple liquid chemistry compartments. A cover for the dispenser includes a first lid selectively covering the multiple power chemistry compartments and a second lid selectively covering the multiple liquid chemistry compartments.
    Type: Grant
    Filed: April 13, 2017
    Date of Patent: March 10, 2020
    Assignee: Whirlpool Corporation
    Inventors: James J. Beaudreault, Gaurav Bhardwaj, Adam Brown, Pushkar P. Gijare, Eamon C. Lyons, Thibaut Viguier
  • Patent number: 10443211
    Abstract: A machine for backfilling pavement material into a trench defined within a pavement surface includes a frame defining a longitudinal axis and having at least one wheel. The frame being configured to move along the pavement surface. A hopper supported on the frame and including an inlet opening configured to receive pavement material and an outlet opening configured to discharge pavement material into the trench. The machine also includes a compactor supported on the frame and aligned with the hopper along the longitudinal axis. The compactor is configured to compact the discharged pavement material within the trench.
    Type: Grant
    Filed: April 30, 2018
    Date of Patent: October 15, 2019
    Assignee: MK-1 CONSTRUCTION SERVICES, LLC
    Inventors: Paul A. Karam, Carlos Medina, Stanley R. Peters, David S. Zuniga
  • Patent number: 9561529
    Abstract: The disclosure relates to the cleaning of oilfield tools made of metal, particularly to the method of reclamation oilfield tools, already used in the mechanical deep-pumping extraction of oil, as well as to the product made with the help of the mentioned method. The method of remanufacturing of standard length rods includes cleaning the rod with at least one cryogen to eliminate environmental contamination and to assist in workplace safety.
    Type: Grant
    Filed: January 19, 2016
    Date of Patent: February 7, 2017
    Assignee: TRC Services, Inc.
    Inventor: Lonnie Dale White
  • Patent number: 9321085
    Abstract: A chemical liquid process is performed on a substrate. Then, a rinse process that supplies a rinse liquid to the substrate is performed. Thereafter, a drying process that dries the substrate is performed while rotating the substrate. The drying process includes a first drying process that rotates the substrate at a first rotational speed; a second drying process that decreases the rotational speed of the substrate to a second rotational speed lower than the first rotational speed after the first drying process. In the second drying process, the rinse liquid and a drying solution are agitated and substituted while generating braking effect. In a third drying process, the rotational speed of the substrate is increased from the second rotational speed to a third rotational speed after the second drying process. Thereafter, in a fourth drying process, the drying solution on the substrate is scattered away by rotating the substrate.
    Type: Grant
    Filed: November 28, 2012
    Date of Patent: April 26, 2016
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Teruomi Minami, Satoru Tanaka, Tatsuya Nagamatsu, Hiroyuki Suzuki, Yosuke Kawabuchi, Tsukasa Hirayama, Katsufumi Matsuki
  • Patent number: 9085016
    Abstract: A reusable tool assembly for purging fluid from a fluid flow pipe system or a portion thereof is presented. The tool assembly includes an input portion configured to accommodate a positively-pressurized flow of air/gas, a flow control portion configured to regulate an amount of pressurized air/gas flow, and a pressure measurement gauge device configured to measure and indicate the amount of pressurized air/gas flow, as regulated by the flow control portion. The tool further includes and an output portion configured to introduce the regulated amount of pressurized air/gas flow into the fluid flow pipe system, the output portion containing a pressure-fitted slip coupling device that temporarily, releasably, and sealably engages an exterior, unthreaded surface of an open pipe portion providing access into the fluid flow pipe system and enabling the air/gas flow to purge fluid from the fluid flow pipe system.
    Type: Grant
    Filed: December 13, 2013
    Date of Patent: July 21, 2015
    Inventor: William B. McCool
  • Patent number: 9011609
    Abstract: An ironing apparatus includes an ironing die and an ironing punch, an injection port for injecting gas or liquid to the metal plate at a high pressure to remove substance adhered to the metal plate therefrom, a suction port for sucking the adhered substance removed from the metal plate, and a protrusion mount portion with a protrusion for preventing dispersion of the gas or the liquid. An ironing method for ironing the metal plate having the single surface or both surfaces coated with the organic resin film includes the steps of injecting the gas or the liquid from the injection port to the metal plate at the high pressure to remove the adhered substance from the metal plate, and sucking and collecting the adhered substance removed from the metal plate from the suction port. The adhered substance such as the hair may be removed by the aforementioned invention.
    Type: Grant
    Filed: March 19, 2009
    Date of Patent: April 21, 2015
    Assignee: JFE Steel Corporation
    Inventors: Yusuke Nakagawa, Masaki Tada, Katsumi Kojima, Yasuhide Oshima, Hiroki Iwasa
  • Patent number: 8999070
    Abstract: The invention provides a method and apparatus for removing a blockage from a fluid conduit. An apparatus comprises a first portion containing a fluid volume separated from the fluid conduit via a controllable valve. The valve is cyclically opened and closed such that a pressure differential between the first portion and the fluid conduit causes a series of pressure pulses in the fluid conduit. The pressure differential is regulated to control the amplitude of the pressure pulses of the series.
    Type: Grant
    Filed: September 28, 2010
    Date of Patent: April 7, 2015
    Assignee: Paradigm Flow Services Services Limited
    Inventor: Hugh MacKenzie
  • Patent number: 8961696
    Abstract: According to one embodiment, a method for cleaning a semiconductor substrate comprises supplying water vapor to a surface of a semiconductor substrate on which a concave-convex pattern is formed while heating the semiconductor substrate at a predetermined temperature, cooling the semiconductor substrate after stopping the heating and the supply of the water vapor and freezing water on the semiconductor substrate, after freezing the water, supplying pure water onto the semiconductor substrate and melting a frozen film, and after melting the frozen film, drying the semiconductor substrate.
    Type: Grant
    Filed: March 19, 2012
    Date of Patent: February 24, 2015
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Hiroshi Tomita, Minako Inukai, Hiaashi Okuchi, Linan Ji
  • Publication number: 20150047673
    Abstract: The disclosure relates to the cleaning of oilfield tools made of metal, particularly to the method of reclamation oilfield tools, already used in the mechanical deep-pumping extraction of oil, as well as to the product made with the help of the mentioned method. The method of remanufacturing of standard length rods includes cleaning the rod with at least one cryogen to eliminate environmental contamination and to assist in workplace safety.
    Type: Application
    Filed: October 30, 2014
    Publication date: February 19, 2015
    Applicant: TRC Services, Inc.
    Inventor: Lonnie Dale White
  • Patent number: 8920570
    Abstract: The disclosure relates to the cleaning of rods made of metal, particularly to the method of reclamation of used standard length rods, such as pump rods already used in the mechanical deep-pumping extraction of oil, as well as to the product made with the help of the mentioned method. The method of remanufacturing of standard length rods includes cleaning the rod with non-toxic particles which are able to undergo sublimation to eliminate environmental contamination and to assist in workplace safety.
    Type: Grant
    Filed: November 5, 2012
    Date of Patent: December 30, 2014
    Assignee: TRC Services, Inc.
    Inventor: Lonnie Dale White
  • Patent number: 8900372
    Abstract: The disclosure relates to the cleaning of rods made of metal, particularly to the method of reclamation of used standard length rods, such as pump rods already used in the mechanical deep-pumping extraction of oil, as well as to the product made with the help of the mentioned method. The method of remanufacturing of standard length rods includes cleaning the rod with cryogenic liquids to eliminate environmental contamination and to assist in workplace safety.
    Type: Grant
    Filed: November 7, 2013
    Date of Patent: December 2, 2014
    Assignee: TRC Services, Inc.
    Inventor: Lonnie Dale White
  • Publication number: 20140124003
    Abstract: The disclosure relates to the cleaning of rods made of metal, particularly to the method of reclamation of used standard length rods, such as pump rods already used in the mechanical deep-pumping extraction of oil, as well as to the product made with the help of the mentioned method. The method of remanufacturing of standard length rods includes cleaning the rod with cryogenic liquids to eliminate environmental contamination and to assist in workplace safety.
    Type: Application
    Filed: November 7, 2013
    Publication date: May 8, 2014
    Inventor: Lonnie Dale White
  • Publication number: 20130263893
    Abstract: The present application provides a pulse detonation combustor cleaning device. The pulse detonation combustor cleaning device may include a combustion section and one or more combustion tube sections downstream of the combustion section. The combustion tube sections may a divergent shape and a number of divergent obstacles therein.
    Type: Application
    Filed: April 4, 2012
    Publication date: October 10, 2013
    Applicant: GENERAL ELECTRIC COMPANY
    Inventors: Tian Xuan Zhang, David Michael Chapin, Robert Warren Taylor, Miles Alan Peregoy
  • Patent number: 8377232
    Abstract: A method for removing hot gas deposits from a system via pressure pulses is provided. The method includes regulating a flow of a mixture of detonation fluid and oxidizer into an expansion chamber; and generating a detonation within the expansion chamber by igniting the mixture of detonation fluid and oxidizer in the expansion chamber producing a high-pressure wave, the high-pressure wave propagating along a fluid path of the system in a supersonic rate removing hot gas deposits in the fluid path while the system is in fired operation, the expansion chamber directing the high-pressure wave towards the fluid path of the system.
    Type: Grant
    Filed: May 4, 2009
    Date of Patent: February 19, 2013
    Assignee: General Electric Company
    Inventors: Geoffrey David Myers, Michael John Hughes, Atul Kumar Vij
  • Patent number: 8211238
    Abstract: A method for cleaning a processing chamber that includes heating an inner surface of the processing chamber to a first temperature. The first temperature can be sufficient to cause a first species to become volatile. The first species can be one of several species deposited on the inner surface. A cleaning chemistry is injected into the processing chamber. The cleaning chemistry can be reactive with a second one of the species to convert the second species to the first species. The volatilized first species can also be output from the processing chamber. A system for cleaning the process chamber is also described.
    Type: Grant
    Filed: May 31, 2006
    Date of Patent: July 3, 2012
    Assignee: Lam Research Corporation
    Inventors: Andrew D. Bailey, III, Shrikant P. Lohokare, Arthur M. Howald, Yunsang Kim
  • Patent number: 8105439
    Abstract: A water quality control method for an evaporative cooling water chiller uses a water pump to transport cooling water from a water tank to a water-spraying element via a water pipe. The cooling water is sprayed onto fins and a refrigerant pipe of a first heat exchanger, flows along the fins and is collected in the water tank. Thereby, the cooling water reduces the temperature of the heat exchanger. The water pump is set to operate for a first period and to stop for a second period so that the temperature of the fins and the refrigerant pipe increases. Thereby, the limescales attached to the heat exchanger are detached and drop into the water tank. Subsequently the water pump is turned on again. The cooling water in the water tank flushes out the accumulated particles on the bottom of the water tank, and clean cooling water is added.
    Type: Grant
    Filed: May 30, 2008
    Date of Patent: January 31, 2012
    Inventors: Fu-Chin Liu, Ming-Tsun Ke, Jien-Chuan Chu
  • Patent number: 8025739
    Abstract: In a dry cleaning process, breakage of a gas supply pipe can be prevented, and maintenance efficiency can be increased. There is provided a method of manufacturing a semiconductor device, comprising: (a) loading a substrate into a process chamber; (b) forming a silicon film or a silicon compound film on the substrate loaded in the process chamber by supplying a raw-material gas to a gas supply pipe disposed in the process chamber to introduce the raw-material gas into the process chamber; (c) unloading the substrate from the process chamber; (d) heating an inside of the process chamber after unloading the substrate to generate a crack in a thin film formed inside the process chamber; (e) decreasing an inside temperature of the process chamber after carrying out the step (d) with the substrate unloaded from the process chamber; and (f) introducing a cleaning gas into the process chamber by supplying the cleaning gas to the gas supply pipe after the step (e) with the substrate unloaded from the process chamber.
    Type: Grant
    Filed: October 1, 2009
    Date of Patent: September 27, 2011
    Assignee: Hitachi Kokusai Electric, Inc.
    Inventors: Kiyohisa Ishibashi, Yasuhiro Inokuchi, Atsushi Moriya, Yoshiaki Hashiba
  • Patent number: 7716922
    Abstract: A diesel particulate filter of a motor vehicle is cleaned of ash, typically using equipment already available in a service shop. The method of the invention cleans ash particles from the diesel particulate filter by generating a pressure wave and transmitting the pressure wave into a housing containing the diesel particulate filter. The pressure wave dislodges ash particulates from the filter, which can then be removed from the filter using an ash collecting apparatus, such as a shop vacuum. The method also uses an inflatable bladder in the filter apparatus to close access between the housing and the engine or outside environment.
    Type: Grant
    Filed: October 20, 2006
    Date of Patent: May 18, 2010
    Assignee: International Truck Intellectual Property Company, LLC
    Inventor: Mark S. Ehlers
  • Patent number: 7534306
    Abstract: The steam humidifier fed with a premix of natural gas and forced air under low pressure (less than 1 psi) includes a main frame, a movable lower frame, a two part evaporation canister, releasably sealed, for water, an immersible combustion chamber retaining a radiant gas burner and a heat exchanger coupled downstream thereto. The heat exchanger is a coil with an upstream end coupled to the combustion chamber and a downstream end mounted through the upper part of the canister. Maintenance is enhanced by having the lower part of the evaporation tank or canister move downwardly to expose the combustion chamber and the heat exchanger coils. The coils are subject to thermal shock or relatively rapid thermal expansion and contraction which causes scale, adhered thereon, to be released and broken off. A high degree of control and modulation is achieved because the radiant burner is configured for modulated operation from a blue flame mode through a radiant mode.
    Type: Grant
    Filed: December 6, 2005
    Date of Patent: May 19, 2009
    Assignee: National Environmental Products, Ltd.
    Inventors: Zev Kopel, Luc Briere, Caroline Duphily
  • Publication number: 20090038643
    Abstract: A parts washing apparatus comprising a basin having a drain, a reservoir located below the drain, and a solvent filtering and recirculating system. This system comprises a centrifuge filter assembly and a solvent recirculating system. The centrifuge filter assembly in turn comprises a centrifugal filter comprising a receptacle and a replaceable filter element, and also a turbine to drive the centrifugal filter. The centrifuge filter and the turbine are positioned in an enclosing structure to enclose the turbulent flow of the solvent from the centrifuge filter and also enclose the fumes associated with the turbulent flow. Thus, there is a discharge of solvent as less turbulent flow while substantially enclosing the associated fumes.
    Type: Application
    Filed: August 10, 2007
    Publication date: February 12, 2009
    Inventor: Charles T. Magliocca
  • Publication number: 20080257385
    Abstract: The invention relates to a method for cleaning an electrode (1) used in resistance point welding, particular a cap (2) which can be placed on the electrode. According to the invention, the electrode (1) and/or the cap (2) are impinged upon with a cold medium. The temperature difference between the cold medium and the functional parts to be cleaned is greater than 80 Kelvin and the temperature of the functional parts is above room temperature. The invention also relates to an electrode (1) for resistance point welding, in addition to a cap (2) which can be placed on the electrode (1). According to the invention, the electrode (1) and/or the cap (2) has a feed direction for supplying the cold medium.
    Type: Application
    Filed: May 14, 2005
    Publication date: October 23, 2008
    Inventors: Emil Schubert, Jorg Faber
  • Patent number: 7429337
    Abstract: The invention relates to a method for removing an area of a layer of a component consisting of metal or a metal compound. According to prior art, corrosion products of a component are removed in a first step by applying a molten mass or by heating in a voluminous powder bed. This requires high temperatures or a large amount of space. The inventive method for removing corrosion products of a component is characterized in that a cleaning agent is applied locally, which removes the corrosion products by means of a gaseous reaction product.
    Type: Grant
    Filed: September 29, 2006
    Date of Patent: September 30, 2008
    Assignees: Siemens Aktiengesellschaft, Diffusion Alloys, Ltd.
    Inventors: Norbert Czech, Andre Jeutter, Adrian Kempster, Ralph Reiche, Rolf Wilkenhöner
  • Patent number: 7393795
    Abstract: Methods for post-etch deposition on a dielectric film are provided in the present invention. In one embodiment, the method includes providing a substrate having a low-k dielectric layer disposed thereon in a etch reactor, etching the low-k dielectric layer in the etch reactor, and forming a protection layer on the etched low-k dielectric layer. In another embodiment, the method includes providing a substrate having a low-k dielectric layer disposed thereon in an etch reactor, etching the low-k dielectric layer in the reactor, bonding the etched low-k dielectric layer with a polymer gas supplied into the reactor, forming a protection layer on the etched low-k dielectric layer, and removing the protection layer formed on the etched low-k dielectric layer.
    Type: Grant
    Filed: February 1, 2006
    Date of Patent: July 1, 2008
    Assignee: Applied Materials, Inc.
    Inventors: Robin Cheung, Siyi Li
  • Patent number: 7337635
    Abstract: Washing agent dispenser for a household washing machine, namely a dishwasher, which dispenser has a body (2) delimiting at least a recess (3) for containing a certain amount of washing agent, comprising occlusion means (4,5) for said recess (3). According to the invention, said occlusion means (4,5) are capable of taking at least two different operating conditions for a partial opening of said recess (3), one for loading said amount of washing agent, the other for its subsequent dispensing.
    Type: Grant
    Filed: June 22, 2001
    Date of Patent: March 4, 2008
    Assignee: Eltek S.p.A.
    Inventors: Daniele Cerruti, Giovanni Perucca, Fabio Nebbia, Stefano Belfiore
  • Patent number: 6964710
    Abstract: A method for cleaning of a measuring element (1) passed over by a gas flow is arranged on a thin-walled membranous material (5). The measuring element (1) includes at least one heatable element (6, 7, 8; 10, 11), which is arranged on the membranous material, the membranous material being capable of vibrating. By means of a control apparatus (20) or a switching (22) associated with the measuring element, a periodic delivery of current (41, 42) in intervals takes place in this manner to at least one heatable element (6, 7, 8; 10, 11) of the measuring element (1) and thereby produces vibrations. Alternatively, vibrations of the membranous material (5) can be produced by special vibration exciters or by means of ultrasonic coupling.
    Type: Grant
    Filed: June 25, 2003
    Date of Patent: November 15, 2005
    Assignee: Robert Bosch GmbH
    Inventors: Hans Hecht, Torsten Schulz, Thomas Lenzing, Klaus Reymann, Uwe Konzelmann
  • Patent number: 6855208
    Abstract: This invention relates to a metal part and other surface modification method suitable for the machining industry in which shot peening is typically used to refine the surface of a metal part (to introduce compressive residual stresses, to enhance fatigue strength, to harden the workpiece) and for fields in which parts need be cleaned. According to the present invention, workpiece W is placed within a first vessel which is filled with a fluid. The first vessel is pressurized by controlling the flow rate of the fluid flowing in the first vessel from nozzle 4 distant from said workpiece on the surface and of the fluid flowing from first vessel. Thus, the collapsing impact force of cavitation bubbles is increased so that the machined part will have its surface strengthened and cleaned by applying a peening effect to the surface of the part with said impact force.
    Type: Grant
    Filed: January 11, 2000
    Date of Patent: February 15, 2005
    Assignee: Japan Science and Technology Corporation
    Inventor: Hitoshi Soyama
  • Patent number: 6805753
    Abstract: A method for removing silicone sealant from glass-ceramic surfaces is provided. The method includes heating the sealant to a temperature greater than 325 degrees Celsius so that it thermally degrades and then, mechanically removing the sealant from the glass-ceramic surface. A method of salvaging a glass-ceramic cooking surface from a cooktop including silicone sealant between a cooktop frame and the glass-ceramic cooking surface is also provided. If a defect is detected in the cooktop during manufacturing or distribution, the entire cooktop is heated to a predetermined temperature to allow the silicone sealant to be easily removed without using a knife or other potentially damaging devices. Once the silicone sealant is removed, the glass-ceramic cooking surface may be reused to produce another cooktop assembly.
    Type: Grant
    Filed: October 14, 2003
    Date of Patent: October 19, 2004
    Assignee: Schott Corporation
    Inventors: Karen Cary, Michael Schulz, Tom Dooley
  • Patent number: 6805808
    Abstract: A method for separating chips from a diamond wafer comprising a substrate, a chemically vapor-deposited diamond layer, and microelectronic elements, with the microelectronic elements protected from thermal damage and degradation caused by the thermally decomposed cuttings produced during the processing steps. (1) Front-side grooves 6 are formed on the chemically vapor-deposited diamond layer 2 by laser processing using a laser such as a YAG, CO2, or excimer laser each having a large output so that the grooves 6 can have a depth 1/100 to 1.5 times the thickness of the diamond layer. (2) The thermally decomposed cuttings produced during the laser processing are removed by using a plasma. (3) Back-side grooves 9 are formed on the substrate 1 by dicing such that the back-side grooves 9 are in alignment with the front-side grooves 6. (4) The diamond wafer 4 is divided into individual chips 10 by applying mechanical stresses.
    Type: Grant
    Filed: May 13, 2002
    Date of Patent: October 19, 2004
    Assignee: Sumitomo Electric Industries, Ltd.
    Inventors: Satoshi Fujii, Noboru Gotou, Tomoki Uemura, Toshiaki Saka, Katsuhiro Itakura
  • Patent number: 6794622
    Abstract: A method and a device for the removal of rust and paint from a metal surface, wherein induction heat is used for heating the metal surface. The device includes an electrical power supply coupled to an induction coil. A wheel and a tachometer on the device measure the velocity of the device as the wheel rotates on the metal surface. A control unit regulates the power output of the electrical power supply based upon the measured velocity of the device.
    Type: Grant
    Filed: June 27, 2002
    Date of Patent: September 21, 2004
    Assignee: Jak. J. Alveberg AS
    Inventors: Bjorn Erik Alveberg, Tom Arne Baann
  • Patent number: 6783599
    Abstract: Contaminants are removed from a surface of a substrate by applying a fluid to the surface; lowering the temperature of the fluid to form a solid layer of the fluid and entrap contaminants therein; and applying energy to the layer and/or substrate to cause the layer containing the contaminants to separate from the surface.
    Type: Grant
    Filed: July 19, 2001
    Date of Patent: August 31, 2004
    Assignee: International Business Machines Corporation
    Inventors: Glenn W. Gale, Frederick W. Kern, Jr., William Alfred Syverson
  • Publication number: 20040163676
    Abstract: The present invention is directed toward methods for cleaning catalytic converters, particularly it pertains to methods of submerging a catalytic converter into an aqueous bath and applying a pressurized fluid through the catalytic converter forcing ash from the channels within the catalytic converter.
    Type: Application
    Filed: May 14, 2003
    Publication date: August 26, 2004
    Inventors: David L. Winnestaffer, Victor L. Bonin
  • Patent number: 6776171
    Abstract: An apparatus and method are provided for removing contaminate particulate matter from substrate surfaces such as semiconductor wafers. The method and apparatus use a material, preferably a liquid curable polymer, which is applied as a sacrificial coating to the surface of a substrate containing contaminate particulate matter thereon. An energy source is used to dislodge the contaminate particulate matter from the surface of the wafer into the sacrificial coating so that the particles are partially or fully encapsulated and suspended in the sacrificial coating. The sacrificial coating is then removed. The coating is preferably formed into a film to facilitate removal of the coating by pulling (stripping) the film providing a cleaner substrate surface.
    Type: Grant
    Filed: June 27, 2001
    Date of Patent: August 17, 2004
    Assignee: International Business Machines Corporation
    Inventors: Nicole S. Carpenter, Joseph R. Drennan, Alison K. Easton, Casey J. Grant, Andrew S. Hoadley, Kenneth F. McAvey, Jr., Joel M. Sharrow, William A. Syverson, Kenneth H. Yao
  • Patent number: 6709531
    Abstract: In this disclosure, air flow is formed above chemical liquid film and a move of the chemical liquid is generated by making the air flow into a contact with the surface of chemical liquid. Further, a negative pressure is generated in a space between a processing object substrate and a plate by rotating the plate. Consequently, uniformity of processing of chemical liquid is improved, so that liquid removing step can be carried out effectively. As a result, yield rate of chemical liquid treatment can be improved.
    Type: Grant
    Filed: March 26, 2003
    Date of Patent: March 23, 2004
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Shinichi Ito, Riichiro Takahashi, Tatsuhiko Ema, Katsuya Okamura
  • Publication number: 20030230324
    Abstract: The invention proposes a process and device for the at least partial elimination of carbon deposits in a heat exchanger in which an oxidation treatment is carried out comprising at least one controlled-oxidation stage at a conventional temperature between 400 and about 500° C. for a period of at least 4 hours, by means of an oxidizing fluid comprising for the greater part an inert gas, and a lesser quantity of oxygen, under conditions such that the temperatures of the fluids feeding or leaving the heat exchanger remain below about 520° C. throughout the oxidation treatment, and in that the hot approach of the exchanger remains below about 120° C. throughout the oxidation treatment. The invention also relates to a hydrotreatment system for the implementation of this process and this device.
    Type: Application
    Filed: March 14, 2003
    Publication date: December 18, 2003
    Applicants: Institut Francais du Petrole, Packinox S.A.
    Inventors: Willi Nastoll, Dominique Sabin
  • Patent number: 6656288
    Abstract: A device and method that cleans microwave ovens through a chemical action, specifically to an agent that is placed into the microwave oven, and then activated by operating the oven for a period of time. Different embodiments include a devise composed of an open cell container filled with solution; an open cell container with an attached sponge(s) and filled with solution; and a sponge that contains a cleaning solution in hydrant or dehydrated form. In some of the described embodiments, the devise has a tear off membrane seal to maintain the solution within the cell prior to use. Another embodiment described has a bottle hanger attached to a cell. All embodiments maintain a process to absorb excess microwave energy.
    Type: Grant
    Filed: August 7, 2001
    Date of Patent: December 2, 2003
    Inventor: John-Paul F. Cherry
  • Patent number: 6652658
    Abstract: A method for clean processing wherein an object and a high pressure nozzle are disposed a specific distance apart from each other inside a washing tank containing only ultra-pure water, an ion exchange material or catalyst material that increases the amount of hydroxide ions is provided between the processing surface of said workpiece and the distal end of the high pressure nozzle facing said surface, a voltage is applied using the high pressure nozzle as the cathode and the object as the anode and the hydroxide ions produced from the ultra-pure water are supplied to the surface of the object.
    Type: Grant
    Filed: June 6, 2001
    Date of Patent: November 25, 2003
    Assignee: Japan Science and Technology Corporation
    Inventors: Yuzo Mori, Toshio Ishikawa
  • Publication number: 20030203116
    Abstract: Refurbishing and/or renewing cut or loop pile carpet products including carpet tiles by passing the product under a high pressure water or liquid dispensing head projecting a stream of water against the subject product at a pressure in the range of 100-2000 p.s.i.g. Improvements to such methods include adding a polymer backing layer to the tile, pre-bulking the face yarns, and/or chemically treating the face yarns.
    Type: Application
    Filed: May 12, 2003
    Publication date: October 30, 2003
    Applicant: MILLIKEN & COMPANY
    Inventors: Robert S. Brown, Kenneth B. Higgins
  • Patent number: 6632289
    Abstract: A to-be-cleaned substrate is cleaned by use of an acid liquid agent in a cleaning cup, the remaining acid liquid agent is washed out by use of pure water, then an alkaline liquid agent is emitted to the surface of the to-be-cleaned substrate in the same cleaning cup to remove the acid liquid agent remaining on the to-be-cleaned substrate. A neutralization reaction between the acid and alkali is caused by emitting the alkaline liquid agent to the surface of the to-be-cleaned substrate so as to efficiently remove the acid liquid agent remaining on the surface of the to-be-cleaned substrate.
    Type: Grant
    Filed: June 25, 2001
    Date of Patent: October 14, 2003
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Kenji Masui, Akio Kosaka, Hidehiro Watanabe
  • Patent number: 6630032
    Abstract: Apparatus for dislodging an accretion of a substance from the vicinity of a vessel, includes apparatus for generating gas-borne shock waves in the vicinity of a vessel, thereby to expose a substance accrued on a surface thereof to separation forces causing at least partial separation of the substance from the surface, so as to facilitate removal of the at least partially separated substance therefrom; and support apparatus for supporting the apparatus for generating shock waves in a selected association relative to the vessel.
    Type: Grant
    Filed: June 11, 2001
    Date of Patent: October 7, 2003
    Assignee: ProWell Technologies, Ltd.
    Inventors: Gennady Carmi, Yuri Ass
  • Publication number: 20030186159
    Abstract: The present invention is directed to a process for separating polyester materials from various coating materials. In general, the process includes the steps of mixing polyester materials which have coatings adhered to the surface with an alkaline composition in a mixer. The alkaline composition contains a solution of a Group I alkaline compound and a Group II alkaline compound. The mixer imparts sufficient energy to the slurry to provide substantially complete, even coating of the polyester containing materials with the alkaline composition and cause separation of the coating materials from the surface of the polyester substrate. The mixture can be dried causing the remaining coating materials to form a dry powder mixed with the polyester substrate. After drying, the coating materials can be substantially removed from the polyester substrate by one or more dry separation techniques.
    Type: Application
    Filed: March 28, 2002
    Publication date: October 2, 2003
    Inventor: John A. Schwartz
  • Patent number: 6579380
    Abstract: A method of removing graphite from metal molds used in the glass fabrication industry, the method including placing a metal glass-fabricating mold with graphite bonded thereto in a chamber, providing an oxygen rich mixture of combustible gases in the chamber, said oxygen rich mixture containing from about 10 to about 25% stoichiometric excess of oxygen, and igniting the oxygen rich mixture of combustible gases in the chamber to produce a temperature of at least about 6,000° F. and a pressure wave. A high temperature wave front and the pressure wave thereby produced remove graphite from the metal mold by ablation of the graphite.
    Type: Grant
    Filed: February 12, 2001
    Date of Patent: June 17, 2003
    Assignee: Ablation Technologies Inc.
    Inventors: Terry W. Martin, Alex Maule
  • Patent number: 6568406
    Abstract: Plant parts which are used for the production or processing of (meth)acrylic esters are cleaned by (a) emptying the plant parts, (b) flushing the plant parts with aqueous 5 to 50% strength by weight alkali metal hydroxide solution, (c) removing the alkali metal hydroxide solution from the plant parts, (d) if required, washing the plant parts with water and (e) if required, drying the plant parts.
    Type: Grant
    Filed: April 18, 2000
    Date of Patent: May 27, 2003
    Assignee: BASF Aktiengesellschaft
    Inventors: Heinrich Aichinger, Holger Herbst, Gerhard Nestler, Jürgen Schröder
  • Publication number: 20030056987
    Abstract: A method and apparatus for treating for disposal oil-contaminated clay substrates such as drill cuttings from drilling with an oil-based mud. If necessary, the substrate is pretreated with an aqueous emulsion breaker such as alkylbenzenesulfonic acid. The substrate is mixed under high shear conditions with a mineral acid such as sulfuric acid. This can be done in an agitated reactor with sequential addition of the organic and inorganic acids. The substrate is then mixed with alkaline earth such as lime in a second agitated reactor. The reactions between the acid(s), alkaline earth and substrate are exothermic and provide heat to vaporize the oil, reaction products and water. Recoverable constituents in the vapor can be condensed in a vapor collection system. The treated substrate is essentially free of oil and has a controlled water content.
    Type: Application
    Filed: February 27, 2002
    Publication date: March 27, 2003
    Inventor: Ramon Perez Cordova
  • Patent number: 6533870
    Abstract: The invention relates to a road surface marking tape intended for temporary use and being of the kind that includes a base layer of non-cured or non-vulcanized soft elastomeric material, and reinforcing material embedded in the base layer. The reinforcing material is comprised of short fibers of non-metallic material distributed generally uniformly in the base layer in an amount corresponding to 5-50%, preferably 10-20% of the weight of the base layer. The reinforcing material is preferably comprised of fibers of fabric, plastic or carbon with lengths generally between 0.5 and 5 mm, preferably between 1 and 3 mm. The elastomeric material is usually a rubber of the acrylnitrile-butadiene type.
    Type: Grant
    Filed: September 5, 2000
    Date of Patent: March 18, 2003
    Assignee: Trelleborg Industri AB
    Inventors: Inga-Lena Granström, Jonas Svensson
  • Patent number: 6503335
    Abstract: A centrifuge for a semiconductor wafer has a centrifuge plate for holding a semiconductor wafer, has a drive for setting the centrifuge plate in rotation, and has a device for supplying a medium to a front side and a rear side of the semiconductor wafer. The centrifuge has a housing which separates a centrifuging area and the semiconductor wafer from the environment, and a device for generating a laminar gas flow in the housing. A method for centrifuging a semiconductor wafer has the semiconductor wafer being centrifuged in a laminar gas flow.
    Type: Grant
    Filed: October 26, 1999
    Date of Patent: January 7, 2003
    Assignee: Wacker Siltronic Gesellschaft für Halbleitermaterialien AG
    Inventors: Georg-Friedrich Hohl, Roland Brunner, Susanne Bauer-Mayer, Günther Brunner, Hans-Joachim Luthe, Franz Sollinger
  • Patent number: 6488037
    Abstract: Wafer cleaning systems (10, 25) utilizing both chemical and physical action to clean integrated circuit wafers (14, 24) is disclosed. Chemical cleaning action is provided by liquid retained within a tank (2, 22), sized either to hold a single wafer (24) or a batch of wafers (14) held within a carrier (12). Physical action is provided in the wafer cleaning system either by way of inert gas bubbling through a baffle (5) or by way of ultrasonic energy applied by transducers (28) located in the tank (2, 22). The systems (10, 25) have a programmable controller (20, 30) for initiating the physical cleaning action after insertion of the wafers (14, 24) into the chemical bath, and for ceasing the physical action prior to removal of the wafers (14, 24). After a waiting time after the ceasing of the physical action, to calm the chemical bath and to permit any retained bubbles to escape to the atmosphere, the wafers (14, 24) may then be removed from the chemical bath, with reduced risk of staining and particle release.
    Type: Grant
    Filed: August 17, 2000
    Date of Patent: December 3, 2002
    Assignee: Texas Instruments Incorporated
    Inventor: Richard L. Guldi
  • Patent number: 6468362
    Abstract: A method and an apparatus that uses a surfactant to clean a hydrophobic wafer is provided. In a first aspect, the method may clean and dry a wafer without applying pure DI water to the wafer. In a second aspect, the method may clean a wafer by applying pure DI water to the wafer only for a short duration of time such that the DI water application ceases prior to or as soon as a surfactant solution is rinsed from the wafer thereafter the wafer is dried. In a further aspect a hydrophobic wafer is maintained wetted with surfactant as it is transferred between cleaning apparatuses and is rinsed via diluted surfactant or via a brief DI water spray and is thereafter dried.
    Type: Grant
    Filed: August 23, 2000
    Date of Patent: October 22, 2002
    Assignee: Applied Materials, Inc.
    Inventors: Youfel Chen, Brian J Brown, Boris Fishkin, Fred C Redeker