Abstract: A method of cleaning a semiconductor wafer includes: loading a semiconductor wafer into a cell having an annular trough; moving a plurality of nozzles into operational orientations for spraying a cleaning solution onto a top surface of the loaded semiconductor wafer; spraying the cleaning solution from each nozzle onto the top surface of the loaded semiconductor wafer in a direction defined by each nozzle's operational orientation such that a patterned flow of cleaning solution is formed on the top surface of the loaded semiconductor wafer; and collecting the cleaning solution in the annular trough of the cell as it flows off the top surface of the loaded semiconductor wafer.

Abstract: A dishwasher including a tub provided in the cabinet to form a washing chamber, and a drying apparatus arranged on a side wall of the tub and including a flow path provided to allow air sucked from the washing chamber to flow, a heater arranged in the flow path to heat air in the flow path, and a switch arranged upstream of the heater to turn off the heater in response to air, which is adjacent to the heater, reaching a predetermined temperature.

Abstract: The disclosed Hydro-Gravitational Trap (HGT) method and apparatus separate a suspension into two flow streams, discriminating particles based on a designated particle settling velocity: one Designated Particle Concentrated (DPC) and one Designated Particle Diluted (DPD). The HGT confines particles between a controlled upward hydrodynamic field and the downward net gravitational field within the apparatus's High-Energy Segment (HES), awaiting removal. The HES typically contains an internal agitator conforming to its divergent shape. Agitator motion prevents trapped particles from adhering to the HES, provides flocculation energy, and mixes the contents, controlling the DPC flow stream concentration. The agitator can also simultaneously function as a control valve or an actuator regulating this flow in some preferred embodiments.

Abstract: A fluid flow structure for a washing machine is located within a wash tank of the washing machine, which includes a fluid flow guide surface, and a support for the guide surface. The guide surface includes at least one region contoured inconsistently from the contour of at least one corresponding wall of the washing machine wash tank. The contour of the guide surface is generally curved so as to aide in reducing and/or preventing the pinning of items that often occurs in rectangular wash tanks of the prior art. The support for the guide surface creates a gap between the guide surface and at least one wall of the washing machine wash tank.

Abstract: A substrate processing apparatus includes a processing tub, a storage, a liquid recovery unit, a storage drain line and a liquid recovery unit drain line. The processing tub is allowed to accommodate therein multiple substrates, and configured to store therein a processing liquid. The storage is connected to the processing tub, and configured to store therein the processing liquid drained from the processing tub. The liquid recovery unit is configured to receive the processing liquid overflown from the processing tub. The storage drain line is configured to drain a liquid stored in the storage. The liquid recovery unit drain line is configured to drain a liquid received from the liquid recovery unit to an external drain line provided at an outside.

Abstract: A fluid flow structure for a washing machine is located within a wash tank of the washing machine, which includes a fluid flow guide surface, and a support for the guide surface. The guide surface includes at least one region contoured inconsistently from the contour of at least one corresponding wall of the washing machine wash tank. The contour of the guide surface is generally curved so as to aide in reducing and/or preventing the pinning of items that often occurs in rectangular wash tanks of the prior art. The support for the guide surface creates a gap between the guide surface and at least one wall of the washing machine wash tank.

Abstract: A fluid device includes: a flow path through which a fluid flows; a pressure chamber spaced apart from the flow path in a first direction (Y direction) orthogonal to a flowing direction of the fluid in the flow path; a communication path that is formed along the Y direction and that communicates the flow path with the pressure chamber; and an ultrasonic wave transmitter configured to transmit ultrasonic waves to the fluid in the pressure chamber to generate a standing wave along the Y direction in the flow path.

Abstract: An inlet assembly (T) and a washing device (C), particularly a dishwasher, are provided. The inlet assembly (T) comprises at least one body (1) having a first opening (1a); a connection area (1b) on the body (1), and a hole; a cover assembly (2), at least a part of which is inserted into the body (1) through the first opening (1a), and including a cover body (2a) closing the first opening (1a), a water inlet section (2b) extending from one side of the cover body (2a), a second opening (2d) on the water inlet section (2b), allowing air to enter the water inlet section (2b), a condensation section (2e), formed as a chamber, extending into the body (1), and located on the other part of the cover body (2a), and a third opening (2f) on a part of the cover body (2a) where the condensation section (2e) is situated.

Abstract: The present disclosure relates to the technical field of wafer cleaning, and in particular to a wafer cleaning device and a wafer cleaning system. The wafer cleaning device includes a liquid inlet pipe, a first liquid discharge pipe, a first valve and a liquid supply device, wherein the liquid inlet pipe has an inlet terminal and an outlet terminal; a wall of the liquid inlet pipe is protruded outward to form a protrusion, the protrusion having a cavity; one terminal of the first liquid discharge pipe is communicated with the cavity, while the other terminal thereof is communicated with a container; the first valve is arranged on the liquid inlet pipe and located between the protrusion and the outlet terminal; and, the liquid supply device is communicated with the inlet terminal of the liquid inlet pipe to import cleaning solution into the liquid inlet pipe.

Abstract: A method for cleaning semiconductor wafer includes putting at least one wafer on a cassette bracket in a first cleaning tank filled with chemical solution; after said wafers have been processed in the first cleaning tank, transferring the wafers from the first cleaning tank to a second cleaning tank with the wafers immersing in the chemical solution; and after said wafers have been processed in the second cleaning tank, taking the wafers out of the second cleaning tank.

Abstract: The invention relates to a module for chemically processing a substrate, a method for chemically processing a substrate and a use of a module for chemically processing a substrate and in particular a large substrate. The module for chemically processing a substrate comprises: an immersion chamber, a spray unit, and a motion unit (14). The immersion chamber is configured to receive a first liquid and the substrate, so that the substrate is immersed in the liquid. The spray unit comprises a plurality of spray nozzles, which are configured to spray a second liquid within the immersion chamber. The motion unit is configured to provide a relative motion between the substrate and the spray unit.

Abstract: A bottle cleaner includes a housing defining a chamber therein. A support frame is disposed within the housing to support one or more bottles. A base is disposed below the housing. A bottom liner is at least partially received within the housing. The bottom liner defines a plurality of openings and a fluid reservoir. At least one pump is disposed within the base to pump liquid from within the fluid reservoir to one or more spray jets for cleaning the bottles. Further, a blower and heater are disposed within the base. The blower discharges air into the chamber through the plurality of openings to dry the bottles. A heater element produces steam which aids in steam sterilization functionality.

Abstract: A substrate processing apparatus includes a processing tub configured to store therein a processing liquid in which a substrate is immersed to be processed, the processing liquid including a first component and a second component having a boiling point higher than that of the first component; an adjusting liquid supply configured to supply an adjusting liquid configured to adjust a concentration of the second component into the processing tub, the adjusting liquid including the first component; and a controller configured to control the adjusting liquid supply. When changing the concentration, the controller calculates a liquid surface height in the processing tub corresponding to the concentration after being changed based on a concentration difference between the concentration after being changed and the concentration before being changed, and the controller controls a supply of the adjusting liquid into the processing tub based on the calculated liquid surface height.

Abstract: A substrate liquid processing apparatus includes a processing liquid storage unit configured to store a processing liquid therein; a processing liquid drain unit configured to drain the processing liquid from the processing liquid storage unit; and a control unit. The control unit performs a first control in a constant concentration mode in which a concentration of the processing liquid in the processing liquid storage unit is regulated to a predetermined set concentration and a second control in a concentration changing mode in which the concentration of the processing liquid is changed. In the second control, a set concentration after concentration change is compared with a set concentration before the concentration change, and when the set concentration after the concentration change is lower, the control unit controls the processing liquid drain unit to start draining of the processing liquid.

Abstract: A dishwasher assembly may include a dishwasher rack including at least one drinkware row configured to hold drinkware along a length of the rack, a sprayer configured to provide at least one stream of liquid into the drinkware, and a paddle wheel assembly arranged between the drinkware row and the sprayer and including at least one paddle configured to rotate responsive to force of the at least one stream of liquid against the at least one paddle, such that during rotation the at least one paddle is configured to variably deflect at least a portion of the stream onto a plurality of portions of an interior surface of the drinkware.

Abstract: According to one embodiment, a semiconductor manufacturing device includes a chemical solution preparation tank configured to prepare a solution; a chamber configured to discharge the chemical solution prepared at the chemical solution preparation tank to a substrate; a pressure sensor configured to measure a pressure inside the chemical solution preparation tank; and a variable opening valve arranged between the chemical solution preparation tank and an exhaust pipe.

Abstract: A nozzle cleaning apparatus has one cleaning liquid outlet to which a nozzle is attached, and the other cleaning liquid outlet to which a cleaning attachment is attached. The cleaning attachment includes a nozzle cover, and a cleaning holder attached to the nozzle cover. A cleaning chamber is formed in the nozzle cover. A cleaning liquid inflow chamber, an outer cleaning liquid ejection port, and a cleaning liquid discharge hole are formed in the cleaning holder. A cleaning liquid ejected in a first direction from the nozzle and a cleaning liquid ejected in a second direction from the outer cleaning liquid ejection portion toward the nozzle collide with each other near discharge portions inside the cleaning chamber.

Abstract: A dishwashing appliance includes a tub defining a wash chamber for receipt of articles for washing. A sump is a sump positioned at a bottom of the wash chamber for receiving fluid from the wash chamber. A circulation pump is connected to the sump. The dishwashing appliance also includes a mounting cable extending from the circulation pump. The circulation pump is suspended by the mounting cable.

Abstract: Provided is a dishwasher with a structure capable of improving ease of use. The dishwasher may be installed in a built-in type in a system kitchen including a cabinet having an accommodating space and a counter positioned on the cabinet and including an opening. The dishwasher may include: a tub including a front opening; a front door configured to open or close the front opening; a top door configured to open or close the opening; a basket positioned in the inside of the tub, the basket being taken out through the front opening; and an additional basket being taken out through the opening.

Abstract: A dishwasher, in particular household dishwasher, includes a dishwasher cavity for receiving an item to be washed, a rotatable fan wheel arranged in the dishwasher cavity and configured to draw in air and to blow out the air, and a motor operably connected to the fan wheel and operating at a rotational speed which is variable over time.

Abstract: A modular system of plastic walls having embedded and coextensive electrically conductive components configured to electrically connect with each other when the walls are mated. The walls have joining edges that form joint seams with other walls when joined together to create an enclosure. When enough walls are used to surround a storage space, a Faraday cage is created. The walls additionally have portions of tortuous paths at each joining edge that mate with a complementary portion of a tortuous path of another wall when the walls are joined together. A torturous path seal is thereby created at each joint seam. The plastic walls can be configured in a multiplicity of combinations to create various enclosures necessary for RFID-enabled storage and tracking of medical articles. Containers, enclosures, cabinets, and drawers of differing heights and sizes can be made and they may be stacked or otherwise assembled.

Abstract: An injecting assembly includes a nozzle that is formed with a mixture channel, a mixture opening communicating with the mixture channel, a shaper channel, and a shaper opening communicating with the shaper channel. A mixture of a precursor and a supercritical fluid (SCF) passes through the mixture channel. Waves of the mixture are periodically injected toward a surface of a substrate at the mixture opening. A stream of a shaping fluid flows through the shaper channel and is injected toward the substrate at the shaper opening. The stream of the shaping fluid confines the waves of the mixture. Molecules of the precursor penetrate into the substrate by impact of the wave fronts reaching the surface of the substrate. The molecules of the precursor can react with molecules of a material of the substrate to improve surface properties of the substrate.

Abstract: A washing machine including: a first drainage pump arranged between a washing drum and a filter membrane assembly. The first drainage pump pumps water in the washing drum into the filter membrane assembly for filtration and ensures that a water level in a water inlet cavity of the filter membrane assembly is not higher than a lower edge of a sewage outlet, so as to prevent reduce of the amount of washing water due to drainage of excessive washing water/rinsing water. Since the first drainage pump is a low-lift water pump, water in the filter membrane assembly moves continuously during filtration, so as to scour pollutants on a surface of a filter membrane/membrane filament, reduce an accumulation degree of the pollutants, effectively prevent blockage and achieve low noise.

Abstract: An open water pump comprises an upper casing, a lower casing, an impeller having a central shaft and a plurality of blades. Each blade has an upper portion and a lower portion. The upper casing has an upper chamber, the lower casing has a lower chamber. A plurality of inlets attached below and to a side of the lower casing, and a plurality of outlets attached to a side of the upper casing. At least the bottom portion of the lower portion of each blade which attached to the shaft gradually bends along a rotation direction of the impeller, and a ratio of a height of the lower portion of each blade to a height of the upper portion is between 1 and 5. The impeller can be allowed to draw water at a low water level, foam formed by washing liquid or food debris on the surface of water can be less likely to get into the impeller to influence the drawing of water, a sufficient amount of water can be drawn from the water inlets.

Abstract: An apparatus for use in a bathtub containing water includes an outer shell, a soap holder, configured to hold a liquid soap, at least one set of blades, and a motor disposed within the outer shell and coupled to the set of blades. The motor is configured to form soap bubbles by spinning the set of blades such that the blades lift the water from the bathtub, and pass the lifted water, together with liquid soap from the soap holder, through air.

Abstract: A dishwasher appliance is provided having a drain pump assembly including a hub mounted to a drive shaft that is driven in a first direction during a drain cycle and in a second direction during a wash/rinse cycle. One or more vanes are mounted to the hub and are rotatable between a retracted position during the drain cycle and an extended position during the wash/rinse cycle. A biasing member is mounted to each vane for urging the vanes to the retracted position to counteract the centrifugal force exerted on the vanes during operation. In this manner, the drain pump assembly pumps wash fluid during a drain cycle but does not pump wash fluid during a wash cycle.

Abstract: A dishwasher for treating dishes according to an automatic cycle of operation and including a tub at least partially defining a treating chamber, at least one sprayer configured to emit a corresponding spray of liquid into the treating chamber, at least one liquid circuit supplying liquid to the at least one sprayer, a pump having a pump inlet fluidly coupled to the treating chamber and a pump outlet, and a diverter valve controlling a flow of liquid from the pump to the at least one sprayer.

Abstract: A solvent extraction apparatus comprises a cooler for condensing solvent vapor and a funnel provided towards its lower end. The funnel has an upper surface at which terminates a central downwards directed elongate outlet having an internal exit port formed in a side wall. A vertically movable lifting rod passes through the cooler and the outlet. A section of the lifting rod is shaped to delimit a passage-way for condensate while simultaneously sealing the port. A liquid guide is provided at the upper surface to preferentially direct flow of condensate towards the passage-way.

Abstract: A dishwasher has a treating chamber for receiving dishes for treatment according to an automatic cycle of operation and a dispensing system for storing and dispensing treating chemistry to the treating chamber during the cycle of operation. The dishwasher can be provided with a lifetime supply of a treating chemistry for the dispensing system.

Abstract: A dishwasher for treating dishes includes a tub at least partially defining a treating chamber, the tub having a bottom portion with a sump opening therein, a liquid spraying system supplying a spray of liquid to the treating chamber, and a liquid recirculation system recirculating the sprayed liquid from the treating chamber to the liquid spraying system to define a recirculation flow path. A sump is positioned in the sump opening of the bottom of the tub within the recirculation flow path, the sump having an outlet therein located adjacent the forward portion of the sump opening. A pump has an inlet fluidly interconnected with the outlet of the sump, the pump configured to receive fluid from the outlet of the sump and impel the fluid along the recirculation flow path toward the treating chamber.

Abstract: Method for operating a shortened dishwashing cycle of a dishwasher, dishwasher configured for running the shortened dishwashing cycle and computer program product for operating a shortened dishwashing cycle of a dishwasher. The dishwasher (10) includes a tub (12) configured to hold dishware during a dishwashing cycle, at least one circulation pump (50, 250), at least one heating element (230), and a controller (40, 240) configured to operate the dishwasher. The controller (40, 240) is configured to operate the dishwasher (10) according to at least one of a normal dishwashing cycle or the shortened dishwashing cycle. The method includes providing a first amount of warm water to the tub (12). The first amount of warm water is greater than a standard amount of water provided to the tub (12) for the normal dishwashing cycle.

Abstract: A dishwasher includes a cabinet, a tub providing a washing space, a sump located below the tub and providing a space in which the washing water is stored, racks provided inside the tub and providing a space in which washing targets are received, spray arms for spraying the washing water to the racks, a pump for supplying the washing water stored in the sump to the spray arms, and at least two insulating units for connecting the pump with the sump to allow the pump to be spaced apart from a bottom of the cabinet at a predetermined distance and attenuating transfer of vibration generated in the pump to the sump.

Abstract: An ultra-clean transportation and storage system includes a product storage container with a base having product supports and a segmented lid enclosing the product supports. Rollers on the base have grooved sidewalls receiving a rail to support the product storage container and rolling along the rail edges. Lift-off hinges allow lid removal only after a predetermined rotation. Seals, a one-way breather valve, and a gas inlet allow the interior of the enclosure to be purged. A friction brake on the product storage container has an integrated O-ring contact surface and a housing enclosing complementary acme threads for moving the brake. A transfer cart includes a rail on the lift arm to support the product storage container during movement, and alignment and docking mechanisms on a transfer end effector of the lift are for docking with either a storage spaced on a storage rack or a transfer space on a pass-through.

Abstract: A megasonic processing apparatus matches the fundamental resonant or higher-level harmonic frequencies of megasonic thickness-mode transducers to the fundamental resonant or higher-level harmonic frequencies of a plate or other mounting structure upon which the transducers are mounted. The multifrequency transducers are piezoelectric transducers operating in thickness mode at different operating frequencies. The thickness of the mounting plate at the transducer locations is selected to provide a resonant or harmonic frequency matched to that of its corresponding transducer. Two or more megasonic transducers are bonded to the same radiating surface.

Abstract: Fluid circulation systems for dishwasher appliances are provided. A dishwasher appliance includes a tub that defines a wash chamber. A fluid circulation system includes a sump for receiving fluid from the wash chamber. The sump includes a chamber having a sidewall and a base wall. The fluid circulation system further includes a pump, the pump including an impeller disposed within the chamber. The fluid circulation system further includes a filter at least partially disposed within the chamber and surrounding the impeller, the filter including a sidewall, the sidewall defining a plurality of perforations extending therethrough. The fluid circulation system further includes a shelf cantilevered from the sidewall of the sump towards the filter.

Abstract: A centrifugal blower includes a centrifugal fan; an electric motor that rotationally drives the centrifugal fan; a fan case that has an air inlet and an air outlet and that internally accommodates the centrifugal fan; and an electric motor case (8) that has a cylinder (6) accommodating the electric motor and a flange portion (7) extending radially outward from the cylinder (6) and that is fitted to the fan case. The flange portion (7) is provided with a ring-shaped rib portion (20) that protrudes from the flange portion (7); the ring-shaped rib portion (20) is provided with a plurality of slits (22a and 22b) that extend from the flange portion (7) in the axial direction of the cylinder (6); and the flange portion (7) between the ring-shaped rib portion (20) and the cylinder (6) is inclined in a circumferential direction toward the slits (22a and 22b).

Abstract: A dishwasher includes a wash container for items to be washed and configured to conduct at least water during operation, and a fluid line system having an inlet valve defined by a center line and configured for direct or indirect connection of a water inlet line from a water supply network. Disposed below the wash container is a base support having an outer wall provided with a cutout. The inlet valve is secured by a support part which is lockable in the cutout and has at least one externally open locking holder, into which the inlet valve is lockable and secured therein non-movably in an axial direction. The externally open locking holder is aligned in such a manner that the center line of an inlet of the inlet valve runs at an angle between >0° and <90° in relation to a lower face of the base support.

Abstract: A table top washing machine comprises a tub (14) for accommodating articles to be cleaned, means for circulating water within the tub, and a waste water drain (51) comprising a drain port (52) for draining water from the tub and a fitting (54) for connecting a waste line (26) to said drain port. In accordance with the present invention the waste water drain comprises an angled connector (56) having a first leg (58) for connection to the drain port (52) and a second leg (60) comprising the fitting (54), wherein said first leg is adapted for rotatable connection to the drain port, and wherein said waste water drain further comprises means (69, 70, 72, 74, 76) for limiting rotation of the first leg such that orienting the second leg to point in an upward direction is prevented.

Abstract: In one aspect of the present invention, a combination dishwashing machine and sink that utilizes a first use solution includes a dishwashing machine, a sump, a pump, a sink, a first fluid passageway, and a controller. The sump is in fluid communication with the dishwashing machine and is configured and arranged to contain the first use solution utilized in the dishwashing machine. The pump is in fluid communication with the sump, and the first fluid passageway interconnects the pump and the sink. The controller is operatively connected to the pump and is programmed to signal the pump to direct the first use solution from the sump, through the first fluid passageway, and into the sink. The controller automates the filling of the sink with the first use solution from the sump.

Abstract: A dishwasher with a tub at least partially defining a washing chamber, a liquid spraying system, a liquid recirculation system defining a recirculation flow path, and a liquid filtering system. The liquid filtering system includes a rotating filter disposed in the recirculation flow path to filter the liquid.

Abstract: A dishwasher incorporates a dampened pump assembly including a housing having a base to which is mounted a pump and motor unit configured to develop a flow of washing fluid during operation of the dishwasher. A mass damper is mounted to the housing, with the mass damper substantially conforming to the shape, directly abutting and being rigidly fixed to a portion of the housing at a position offset from the pump and motor unit. The mass damper provides added weight, generally in the order of 1-6 lbs, to the pump assembly which reduces vibrations throughout the dishwasher caused by operation of the pump and motor unit.

Abstract: Dishwasher appliances are provided. A pump device of a dishwasher appliance may include a first centrifugal pump in fluid communication with a drain and a second centrifugal pump in fluid communication with a fluid circulation assembly. The pump device further includes a motor, the motor including a driveshaft, the driveshaft rotatable in a first direction and a second opposite direction. The pump device further includes a first one-way bearing connecting the first centrifugal pump to the driveshaft, the first one-way bearing operable to rotate the impeller of the first centrifugal pump when the driveshaft is rotating in the first direction, and a second one-way bearing connecting the second centrifugal pump to the driveshaft, the second one-way bearing operable to rotate the impeller of the second centrifugal pump when the driveshaft is rotating in the second direction.

Abstract: The present invention relates to a dish washer in which a structure for mounting a drain pump is improved for minimizing residual water, vibration and noise. The dish washer includes a cabinet which forms an exterior of the dish washer, a tub in the cabinet to form a space for washing the dishes, a sump assembly at a lower portion of the cabinet, the sump assembly having a drain chamber for holding washing water to be drained, and a drain pump assembly coupled to a lower side of an outside of the sump assembly so as to be in communication with one side of the drain chamber for draining the washing water from the drain chamber by pumping, wherein the drain pump assembly is mounted tilted upward at a predetermined angle from an inside bottom surface of the cabinet.

Abstract: An apparatus and a method of washing (or pre-washing) silverware/flatware, or one or more other objects/parts is provided. The apparatus and method utilizes a fluid-push/pull system and method in which generally an entire volume of fluid is pushed or pulled through a cavity in which the silverware/flatware or other objects/parts are located. A cavity is filled with fluid, a mass of silverware or other item(s) is located within the cavity, generally an entire volume of fluid is pumped out of the cavity, and the pumped fluid is directed back into the cavity to create a generally continuous flow of generally an entire volume of fluid through the cavity.

Abstract: A dishwasher includes a wash tub enclosing an interior and a clean water feed line which passes through a port of the wash tub into the interior. The feed line has a line end leading from outside to the wash tub. An inlet bolt can be fastened from the interior to the line end and has an axial bore to extend the feed line. The axial bore leads into a plurality of inlet openings which are distributed over a circumference on a circumferential surface of the inlet bolt projecting into the interior. The inlet bolt has an end which faces the interior and is implemented as a cover to protect the axial bore from ingress of splash water.

Abstract: A substrate treatment apparatus is used for treating a major surface of a substrate with a chemical liquid. The substrate treatment apparatus includes: a substrate holding unit which holds the substrate; a chemical liquid supplying unit having a chemical liquid nozzle which supplies the chemical liquid onto the major surface of the substrate held by the substrate holding unit; a heater having an infrared lamp to be located in opposed relation to the major surface of the substrate held by the substrate holding unit to heat the chemical liquid supplied onto the major surface of the substrate by irradiation with infrared radiation emitted from the infrared lamp, the heater having a smaller diameter than the substrate; and a heater moving unit which moves the heater along the major surface of the substrate held by the substrate holding unit.

Abstract: A cleaning system is provided which includes a wash floor, a side trough adjacent the wash floor, which is positioned to receive waste from the wash floor and is attached to a filtering system. A method of using this cleaning system is also provided.

Abstract: A dishwasher is provided. The dishwasher may include a tub forming a washing space, a sump collecting washing water, a tank forming a storage space outside the tub, a motor generating a dynamic force to supply the washing water collected in the sump to the tank, and a controller incrementally increasing a water level of the tank by intermittently driving the motor.

Abstract: A conductor cleaning system for cleaning aluminum strands of all aluminum and steel reinforced conductors, such as ACSS, ACSR, ACAR, and AAA. The conductor cleaning system having a container adapted to receive a portion of a conductor to be cleaned, a housing adapted to receive and support the container, and a cleaning solution contained in the container for cleaning the portion of the conductor. The cleaning solution being adapted to clean the conductor without reacting with or damaging the conductor.

Abstract: An exemplary cleaning apparatus includes a cleaning member, a connecting member, a drying member, and a workpiece holder. The connecting member includes a main housing defining two opposite surfaces and two blocks received in the main housing. The main housing defines a first chamber and two second chambers communicating with the first chamber, each of the second chambers extending through to one of the two opposite surfaces and near to the other opposite surface. The cleaning member and the drying member are connected to the two opposite surfaces and communicate with each other via the first chamber. The two blocks are movable between the first chamber the second chambers, respectively. Each block defines an engaging surface, facing the other engaging surface. When the blocks move into the first chamber and the engaging surfaces engage with each other, the blocks shut off communication between the cleaning member and the drying member.