Abstract: A substrate treating apparatus includes a treating unit for treating substrates, a piping for supplying a treating liquid to the treating unit, a heater mounted on the piping, an electronic thermal unit mounted on the piping in series with the heater, a temperature sensor for measuring a temperature of the treating liquid, and a controller for controlling the heater and the electronic thermal unit. The controller sets a first temperature control mode for performing a room temperature control using the electronic thermal unit when the temperature measured by the temperature sensor is below a predetermined boundary temperature between room temperature and high temperature, and for performing a high temperature control with the heater when the temperature measured by the temperature sensor is above the predetermined boundary temperature between room temperature and high temperature.

Abstract: A method of cleaning a UV irradiation chamber includes steps of: (i) after completion of irradiating a substrate with UV light transmitted through an optical transmitted window provided in the UV irradiation chamber, generating radical species of a cleaning gas outside the UV irradiation chamber; and (ii) introducing the radical species from the outside of the UV irradiation chamber into the UV irradiation chamber, thereby cleaning the optical transmitted window.

Abstract: Embodiments described herein provide methods for removing native oxide surfaces on substrates while simultaneously passivating the underlying substrate surface. In one embodiment, a method is provided which includes positioning a substrate containing an oxide layer within a processing chamber, adjusting a first temperature of the substrate to about 80° C. or less, generating a cleaning plasma from a gas mixture within the processing chamber, such that the gas mixture contains ammonia and nitrogen trifluoride having an NH3/NF3 molar ratio of about 10 or greater, and condensing the cleaning plasma onto the substrate. A thin film, containing ammonium hexafluorosilicate, is formed in part, from the native oxide during a plasma clean process. The method further includes heating the substrate to a second temperature of about 100° C. or greater within the processing chamber while removing the thin film from the substrate and forming a passivation surface thereon.

Abstract: The present invention relates to a method for cleaning a reactor having a tendency of fouling by deposition of solids, wherein a hot solvent, in which the solids are soluble and which has a temperature of at least about 75° C., is applied to the reactor, the solids being substantially dissolved and the dissolved solids being discharged from the reactor, wherein the method is carried out without opening the reactor to atmosphere.

Abstract: Washing plant to perform a washing cycle of objects providing at least a pre-wash operation and a washing and heat disinfecting the objects operation. The plant includes a first battery of pre-wash units, in series one after the other along a first alignment axis and a second battery of washer and heat disinfection machines along a second alignment axis, different from the first alignment axis to operate parallel with each other and perform object washing and heat disinfecting. The second battery is able to receive, along a feed direction transverse to the second alignment axis, the objects subjected to pre-wash exiting from the first battery along the first axis alignment. The second battery feed direction is also transverse to the first alignment axis. Movement members are provided to divert the objects exiting from the first battery and direct them, aligned with the direction of feed, towards the second battery.

Abstract: The present invention discloses a surface treatment to nucleate, grow, detach, implode and collapse vapor bubbles for various cleaning and surface treatment applications. The process can be accomplished by using alternating temperature and chemical, in addition to vacuum/pressure to produce a pulsing and continuous action within a fluid. In an aspect, a thermal cycle nucleation process employs temperature cycling with controlled heating and cooling processes, and with or without vacuum cycles for cleaning delicate surfaces. In another aspect, a chemical cycle nucleation employs varying concentrations fluid mixtures of chemical vapors/fluids to either create, grow vapor bubbles to treat the surface by collapse or implode vapor bubbles. Different chemical vapors or liquids can form chemical mixtures directly on surfaces to inhibit or eliminate re-deposition of particle, and can be tailored to promote rapid chemical dissolving and breakdown of surface contaminates.

Abstract: A method for the manufacture of extended steel products. The steel product is initially contaminated by oils and by at least one of organic and inorganic particles that are suspended or dissolved in the oils. Following the shaping of the steel product by working but before the subsequent treatment of the steel product, burners emit exhaust gases that interact directly with the surface of the steel product. The burners are driven by an oxidant that contains at least 80% oxygen by weight, whereby oils that are present on the product are vaporized and combusted. The exhaust gases interact with the surface of the steel product with a speed that is sufficiently high to blow away organic and/or inorganic particles from the surface of the steel product.

Abstract: The present invention has an object to provide a cleaning agent that has excellent cleaning properties and replacement properties and can further improve the workability during the cleaning of a resin-molding machine, a process for cleaning a resin-molding machine using the same, and the like. A cleaning agent comprising a pellet containing a thermoplastic resin, and 5 to 50 parts by weight of a substance that is liquid at use temperature, based on 100 parts by weight of the thermoplastic resin is used. Such a cleaning agent is introduced into the cylinder of a resin-molding machine, heat is applied to the cleaning agent to hold it in a plasticized state, and the cleaning agent held in a plasticized state is discharged from the cylinder of the resin-molding machine.

Abstract: In the thermal deburring of work pieces, sensitive surfaces are provided with a removable surface protection.

Abstract: A steam purge method for a dishwasher includes a washing cycle, a steam purge cycle and a rinse cycle. During the steam purge cycle, a dishwasher tub is filled with fluid to a level below a heating element in a wash chamber, heated and at least partially converted to steam in the wash chamber. After the steam purge cycle, the dishwasher is drained and the rinse cycle commences. Optionally, a heated drying cycle may be performed upon termination of the rinse cycle. A single heating element arranged in the wash chamber is utilized for heating washing fluid during each of washing, purging and steam generation cycles, as well as for the heated drying cycle.

Abstract: The present invention relates to hydrocarbon extraction method and apparatus therefor.

Abstract: A method of processing a substrate subjected to an exposure process includes the steps of: transporting a substrate subjected to the exposure process to a cleaning processing part and performing a cleaning process in said cleaning processing part on said substrate subjected to the exposure process. The method also includes the steps of transporting said substrate subjected to the cleaning process from said cleaning processing part to a heating processing part and performing a heating process in said heating processing part on said substrate subjected to the cleaning process. A first interprocess time interval between the instant at which the exposure process of a substrate is completed and the instant at which the heating process of the substrate is started is made approximately constant, and a second interprocess time interval between the instant at which the cleaning process of the substrate is completed and the instant at which the heating process of the substrate is started is made approximately constant.

Abstract: The present invention relates to a spray drying system provided with a gas filtering system, which system is intended for use in the pharmaceutical industry for aseptic production of sterile pharmaceutical products or in other industries e.g. production of food, where an intake of sterile air for the drying process is necessary. The spray drying system for providing a particulate material comprises a spray drying chamber (3), after treatment equipment (4, 5) placed downstream of the spray drying chamber and a process gas heater (2) placed upstream in relation to the spray drying chamber (3), wherein an inlet filter (1) capable of removing microorganisms at a temperature below 140° C., is placed upstream of the process gas heater (2) and that the process gas heater (2) is a non-flaking heater.

Abstract: A substrate cleaning method for cleaning and removing foreign materials adhered to a surface of a substrate includes heating the substrate to peel off the foreign materials from the surface of the substrate by a thermal stress, removing the foreign materials from the surface of the substrate by a temperature gradient created in a proximity of the surface of the substrate, and collecting the foreign materials removed from the surface of the substrate by a collecting unit facing the substrate.

Abstract: Steam cleaner, comprising a water tank, heating means for forming steam, at least one connecting socket for a steam hose, a receiving tank for waste and a suction device for sucking waste into said receiving tank, wherein the receiving tank is provided with at least one inlet for steam into said receiving tank.

Abstract: A method and apparatus for cleaning a process chamber are provided. In one embodiment, a process chamber is provided that includes a remote plasma source and a process chamber having at least two processing regions. Each processing region includes a substrate support assembly disposed in the processing region, a gas distribution system configured to provide gas into the processing region above the substrate support assembly, and a gas passage configured to provide gas into the processing region below the substrate support assembly. A first gas conduit is configured to flow a cleaning agent from the remote plasma source through the gas distribution assembly in each processing region while a second gas conduit is configured to divert a portion of the cleaning agent from the first gas conduit to the gas passage of each processing region.

Abstract: A resist film removing method for removing a resist film disposed on a substrate and having a cured layer at a surface includes covering the surface of the resist film with a protection film; causing popping in the resist film covered with the protection film; denaturing the resist film and the protection film after causing popping, to be soluble in water; and performing purified water cleaning to remove from the substrate the resist film and the protection film denatured to be soluble in water.

Abstract: An LPCVD apparatus is provided with a processing chamber and a reaction cooling apparatus. The reaction cooling apparatus is placed outside the processing chamber and is configured to generate hydrogen fluoride gas by reaction of hydrogen gas and fluorine gas and to cool the hydrogen fluoride gas. The hydrogen fluoride gas cooled by the reaction cooling apparatus is supplied into the processing chamber as a cleaning gas.

Abstract: Inside a vacuum chamber 200 a cleaning unit 204 provides atomic hydrogen or atomic deuterium for cleaning a surface 202 at a pressure of less than 10?4 Torr or of more than 10?3 Torr. The surface 202 is heated by the heating unit 203 to a temperature of at least 50° C. This allows achieving cleaning rates of more than 60 ?/h. Preferably, the surface 202 is the surface of a multilayer mirror 201 as used in an EUV lithography apparatus.

Abstract: A method is provided for the removal from a heat exchange of lint that is generated during a drying process in a domestic appliance for laundry care. A rinsing fluid is run through the heat exchanger for cleaning and the rinsing fluid is deflected during a cleaning phase with the magnitude of deflection or the direction of deflection of the rinsing fluid being a function of the strength of an air flow that is applied to deflect the rinsing fluid. The rinsing fluid is thus run through various regions of the heat exchanger depending on the deflection.

Abstract: A drum-type washer capable of easily cleaning a tub and a method of cleaning the tub of the drum-type washer are disclosed. The drum-type washer includes a tub installed in a cabinet to be supplied with washing water, a drum rotatably disposed in the tub such that laundry articles are loaded into the drum, a motor which rotates the drum, a controller which controls a rotational velocity of the motor to rotate the drum at a specified rotational velocity such that the washing water circulates along an inner peripheral surface of the tub to clean the inner peripheral surface of the tub, and a steam supply device which is controlled by the controller to supply high-temperature, high-pressure steam into the tub and the drum.

Abstract: A lubricious glass-coated metal cooking article capable of withstanding repeated heating and cooling between room temperature and at least 500° F. without chipping or cracking the glass coating, wherein the glass coating includes about 0.1 to about 20% by weight of a homogeneously distributed dry refractory lubricant material having a particle size less than about 200 ?m. The lubricant material is selected from the group consisting of carbon; graphite; boron nitride; cubic boron nitride; molybdenum (FV) sulfide; molybdenum sulfide; molybdenum (IV) selenide; molybdenum selenide, tungsten (IV) sulfide; tungsten disulfide; tungsten sulfide; silicon nitride (Si3N4); TiN; TiC; TiCN; TiO2; TiAlN; CrN; SiC; diamond-like carbon; tungsten carbide (WC); zirconium oxide (ZrO2); zirconium oxide and 0.1 to 40 weight % aluminum oxide; alumina-zirconia; antimony; antimony oxide; antimony trioxide; and mixtures thereof.

Abstract: The invention relates to a method of cleaning the surface of a material (4) that is coated with an organic substance. The inventive method is characterised in that it comprises the following steps, consisting in: introducing the material (4) into a treatment chamber (2), having a pressure of between 10 mbar and 1 bar therein, which is supplied with a gas stream containing at least 90 volume percent of oxygen; and generating a plasma by passing an electric discharge between the surface of the material and a dielectric-covered electrode (5a, 5b, 5c, 5d, 5e, 5f, 5g) in order to break down the organic substance under the action of the free radicals O thus produced. The invention also relates to an installation (1) that is used to carry out said method.

Abstract: A radiation source is configured to produce extreme ultraviolet radiation. The radiation source includes a chamber in which, in use, a plasma is generated, and an evaporation surface configured to evaporate a material formed as a by-product from the plasma and that is emitted to the evaporation surface. A method for removing a by-product material in or from a plasma radiation source of a lithographic apparatus includes evaporating a material which, in use, is emitted to that surface from the plasma.

Abstract: The present disclosure relates, according to some embodiments, to compositions, devices, systems, and methods including and/or for preparing and/or using a thermoresponsive nanocomposite hydrogel. In some embodiments, the disclosure relates to methods of preparing a hydrogel including, for example, photochemically curing an aqueous solution of NIPAAm and copoly(dimethylsiloxane/methylvinylsiloxane) colloidal nanoparticles (˜219 nm). At temperatures above a volume phase transition temperature (VPTT) of ˜33-34° C., a hydrogel may deswell and become hydrophobic, while lowering the temperature below a VPTT may cause the hydrogel to swell and become hydrophilic.

Abstract: A system and method whereby on-line cleaning of black oil heater tubes and delayed coker heater tubes may be effectuated by injecting a high pressure water charge through the tubes during normal process operations so as to prevent tube fouling and heater downtime. The high pressure water charge begins the on-line cleaning process once it enters the heater tube by undergoing intense boiling and evaporation. The cleaning occurs by two methods—a scrubbing action and a shocking action. The scrubbing action occurs because of the complete turbulence caused by the water charge's intense boiling within the heater tubes. The shocking action is caused by the expansion and contraction of the heater tubes resulting from the colder water charge flowing through the heater tubes which is then followed by the hotter process fluid flowing through the heater tubes.

Abstract: A method for drying workpieces includes immersing the workpieces in a liquid bath, raising the workpieces with a first holder until a central opening of the workpieces is visible above liquid surface, then using a dry second holder rod inserted through said central opening to continue raising process. Due to this, a drying portion of the workpiece is not held by a wet holding mechanism.

Abstract: The invention relates to a method for cleaning an incubator and to an incubator designed for carrying out the method. The method involves disinfecting the incubator, or at any rate the climatic chamber and/or removable parts present in it during the incubation process, by means of a disinfecting heat treatment. Said heat treatment can comprise a step in which the incubator, or at any rate the climatic chamber, is heated to a temperature of at least 50° C., in particular a temperature of approximately 58° to 65° C. for at least 25 minutes. The invention further relates to an incubator, in which the temperature relating means used for the incubation process are further designed for carrying out a disinfecting heat treatment in the climatic chamber.

Abstract: A pulse detonation cleaner system is described. The cleaner includes an elongated combustion chamber configured with at least one fuel injection inlet and one air inlet to provide fuel to the combustion chamber. The fuel and air are mixed and ignited to produce a flame. The flame is accelerated into a detonation as it propagates downstream through the combustion chamber. The detonation and its products are vented from the combustion chamber into a vessel to be cleaned. The shock and high-pressure products of the detonation are used to release debris from the walls of the vessel and blow them away.

Abstract: Methods are provided for increasing the temperature of a section of conduit used for the production or transmission of hydrocarbon. According to one aspect, the method includes the steps of: (a) forming a treatment fluid comprising: (i) a carrier fluid; and (ii) a first reactant and a second reactant; and (b) introducing the treatment fluid into a section of conduit used for the production or transmission of hydrocarbon. The first reactant and second reactant are selected for being capable of reacting together in an exothermic chemical reaction; and the first and second reactant are in at least sufficient concentrations in the carrier fluid to generate a theoretical heat of reaction of at least 1,000 kJ/liter of the treatment fluid. At least some of at least one of the first reactant and the second reactant is suspended in the carrier fluid in a solid form that is adapted to help control the release of the reactant into the carrier fluid.

Abstract: The present invention relates to compositions and methods for removing soils, e.g., thermally degraded food soils, from surfaces. The cleaning compositions of the present invention can be activated using heat and/or an activator complex to generate oxygen gas in situ on and in the soil to be removed. Surfaces suitable for cleaning using the compositions and methods of the present invention include any surface that can be heated during use and/or cleaning, e.g., smokers, ovens, fryers.

Abstract: An apparatus for cleaning a surface within a vessel has a combustion conduit extending from an upstream end to a downstream end. The downstream end is associated with an aperture in the wall of the vessel and is positioned to direct a shockwave toward the surface. A source of fuel and oxidizer is coupled to the conduit to deliver the fuel and oxidizer to the conduit. An initiator is coupled to the conduit in position to initiate combustion of the fuel and oxidizer to form the shockwave. A buffer chamber is between the conduit and the source.

Abstract: The present invention is a processing method for applying predetermined processing to a workpiece with said workpiece mounted on a mounting stage arranged in a process chamber in a depressurized atmosphere, in which when no workpiece is mounted on the mounting stage, an inactive gas is discharged from at least a heat transfer gas supply hole of the mounting stage in the process chamber so that a gas layer is formed on a mounting surface of the mounting stage. The present invention is also a processing apparatus.

Abstract: A cooking apparatus for assuring easier cleaning of contaminants, such as food residue, attached to the wall surface of a cavity in the cooking apparatus is disclosed. The cooking apparatus includes a body defining the outer appearance of the cooking apparatus, and a cavity defining a space for heating and cooking an object and having an inner surface to form an oil-repellent surface by being heated. In a cleaning method for the cooking apparatus, the inner surface of the cavity is heated prior to cooking food, to have an oil-repellency. The inner surface makes it difficult for the contaminants to be attached thereto. Even if the contaminants are attached, the contaminants have a very low adhesive power and thus are easy to clean.

Abstract: A method for achieving high purity in a jig for semiconductor heat treatment includes subjecting a semiconductor heat treatment jig made of a substrate having a surface covered with a silicon carbide film grown by chemical vapor deposition or a semiconductor heat treatment jig made of a silicon carbide film grown by chemical vapor deposition to high-temperature oxidation heat treatment so as to form an oxide film on a surface of the silicon carbide film, and removing the oxide film.

Abstract: A method of decontaminating an oxide layer-comprising surface of a component or a system of a nuclear facility. An acidic water film is produced on the surface, the film of water is brought into contact with a gaseous acid anhydride, and the oxide layer is treated with gaseous ozone as oxidizing agent.

Abstract: A surface cleaning apparatus comprising a chamber, and a thermal transfer device. The chamber is capable of holding a semiconductor structure therein. The thermal transfer device is connected to the chamber. The thermal transfer device has a surface disposed inside the chamber for contacting the semiconducting structure and controlling a temperature of the semiconductor structure in contact with the surface. The thermal transfer device has a thermal control module connected to the surface for heating and cooling the surface to thermally cycle the surface. The thermal control module effects a substantially immediate thermal response of the surface when thermally recycling the surface.

Abstract: The present invention provides method of treating semiconductor surfaces (e.g., CIGS) using various solvents (including ionic solvents and eutectics), and methods preparing photovoltaic cells comprising treated CIGS materials.

Abstract: Method and apparatus of producing gas pressure pulses in a dust-deposit cleaning apparatus. The apparatus comprises a combustion chamber and an amplifying horn. According to the method a combustible gas and oxygen is fed into the combustion chamber, which has a generally elongated shape, the gas mixture is ignited for generating a pressure pulse, and the pressure pulse is released from the chamber and conducted to the amplifying horn. The gas mixture is ignited to generate an initial explosion which causes a pressure wave, which is reflected from the inner walls of the chamber end to form a collision zone, in which the initial explosion is at least partially transformed into a detonation. The combustion front is reflected from the gas inlet end and compressed at the other end of the chamber and released to the amplifying horn. By means of the invention, sound levels of about 165-170 dB can be produced at low fuel consumption.

Abstract: In an ion source that generates ions by matrix-assisted laser desorption (MALDI), ion acceleration diaphragms having apertures though which ions are accelerated and which have become contaminated by matrix material, are cleaned by temporarily heating the diaphragms. During the cleaning process, the sample support plate is moved aside but remains in the ion source housing, and the heating is preferably limited to regions surrounding the apertures in the diaphragms. In one embodiment, the diaphragms are heated by irradiation generated by infrared laser diodes.

Abstract: A method of forming a highly doped layer of AlGaN, is practiced by first removing contaminants from a MBE machine. Wafers are then outgassed in the machine at very low pressures. A nitride is then formed on the wafer and an AlN layer is grown. The highly doped GaAlN layer is then formed having electron densities beyond 1×1020 cm?3 at Al mole fractions up to 65% are obtained. These levels of doping application of n-type bulk, and n/p tunnel injection to short wavelength UV emitters. Some applications include light emitting diodes having wavelengths between approximately 254 and 290 nm for use in fluorescent light bulbs, hazardous materials detection, water purification and other decontamination environments. Lasers formed using the highly doped layers are useful in high-density storage applications or telecommunications applications. In yet a further embodiment, a transistor is formed utilizing the highly doped layer as a channel.

Abstract: After semiconductor wafers are loaded into a reaction vessel, and ruthenium (Ru) film or ruthenium oxide film is formed, the interior of the reaction vessel is efficiently cleaned without contaminating the wafers. The interior of the reaction vessel is heated to a temperature of above 850° C. while the pressure inside the reaction vessel is reduced to, e.g., 133 pa (1 Torr)-13.3 Kpa (100 Torr), and oxygen gas is fed into the reaction vessel at a flow rate of, e.g., above 1.5 Lm, whereby the ruthenium film or the ruthenium oxide film formed inside the reaction vessel is cleaned off. In place of oxygen gas, active oxygen, such as O3, O* and OH*, etc. may be used.

Abstract: A fuel injector for a gas turbine combustor is disclosed which includes a feed arm having a flange for mounting the injector within the combustor and a fuel nozzle depending from the feed arm for injecting fuel into the combustor for combustion. An optical sensor array is operatively associated with the fuel nozzle for observing combustor flame characteristics. The optical sensor array includes a plurality of sapphire rods positioned to be close enough to the combustor flame to oxidize soot deposits thereon.

Abstract: A method and apparatus for cleaning have been disclosed.

Abstract: In a first phase, after completion of a production process for plastic films, the blowing head is heated by the heater that is present to a temperature above the melting temperature of the plastic remaining in the blowing head to liquefy the same. In a second phase, at the latest after the liquefied plastic has run out, at least the region of the blowing head that is in contact with the plastic is sealed off from the ambient atmosphere and purged of its oxygen-containing atmosphere. The head is then heated far above the decomposition temperature of the plastic still remaining, and the gaseous products thereby occurring are discharged. At the end of the decomposition phase of the remaining plastic, the blowing head is flushed through with a gas which contains at least a proportion of oxygen, in order to carry out an incineration of residual particles.

Abstract: A chandelier cleaning apparatus includes a tent-like enclosure made of a transparent plastic. In a first embodiment, the enclosure includes a main body having a flat top panel and a flat, imperforate bottom panel. A central aperture is formed in the top panel and a zipper extends from the central aperture to an outer periphery of the top panel so that the central opening is enlarged when the zipper is open. The chandelier passes through the central aperture when the zipper is open and is enclosed within the enclosure when the zipper is closed. A mist of hot water is sprayed onto the chandelier with a wand that extends though a small opening in the enclosure. The time required to clean a typical chandelier drops from hours to minutes, no chemicals are used, and the chandelier is touched only by the hot mist.

Abstract: An apparatus and method are provided to treat for example a semiconductor wafer substrate wherein a delivery means for heat, a cryogen, and a fluid chemical reactant, is disposed in a chamber in which the substrate is disposed for at least one surface of the substrate to be cleaned in the chamber. The chamber may also consist of a plurality of stations for chemically treating, providing cryogen to the substrate to effect such cleaning and heating. Air is provided in the chamber in a laminar flow substantially parallel to the surface being treated to remove displaced material from the surface and prevent redeposition of the material on the substrate surface.

Abstract: The steam humidifier fed with a premix of natural gas and forced air under low pressure (less than 1 psi) includes a main frame, a movable lower frame, a two part evaporation canister, releasably sealed, for water, an immersible combustion chamber retaining a radiant gas burner and a heat exchanger coupled downstream thereto. The heat exchanger is a coil with an upstream end coupled to the combustion chamber and a downstream end mounted through the upper part of the canister. Maintenance is enhanced by having the lower part of the evaporation tank or canister move downwardly to expose the combustion chamber and the heat exchanger coils. The coils are subject to thermal shock or relatively rapid thermal expansion and contraction which causes scale, adhered thereon, to be released and broken off. A high degree of control and modulation is achieved because the radiant burner is configured for modulated operation from a blue flame mode through a radiant mode.

Abstract: The present invention is a method of cleaning an object in an open aqueous cleaning system. The method is directed to an open cleaning vessel into which water used for cleaning a material or object can be introduced. A means is provided for introducing a reactant chemical to the vessel to form an aqueous solution. Cleaning of the surface is in the form of bubble formation on the part that vaporizes the chemical in order to react the oxidizer in the vapor state to the exposed surface at the bubble growth area. Treatment in the form of etching or any other process in which material is removed from a solid surface displaces the liquid residue from the surface. The resulting process produces no dissolution or emulsion of the contaminant and therefore can be easily separated from the chemical cleaner. The process also conserves chemistry, water, energy, and reduces pollution.

Abstract: An apparatus for removing haze in a photo mask includes sealed chamber having a bake module disposed therein to support a photo mask, a reactant gas feed line to feed a reactant gas into the chamber, and a discharge device to discharge impurities in the chamber to the outside.