Abstract: A cleaning method for a quartz substrate includes mixing a rinsing solution and mixing a cleaning solution such that the solutions are electrically conductive. The rinsing solution is carbonated and is used in more than one step within the method. The cleaning solution includes ammonium hydroxide. As a result of the electrical conductivity of the solutions, the cleaning method is less susceptible to surface damage caused by electrostatic discharge. The sequence of steps includes rinsing the quartz substrate with the carbonated rinsing solution, removing loose contaminants by a high pressure application of the cleaning solution, and removing organic contaminants in a strong oxidation environment using a solution of sulfuric acid and hydrogen peroxide. The carbonated rinsing solution is again applied, followed by another high pressure application of the cleaning solution and a final rinse with the carbonated rinsing solution.

Abstract: Cleaning a component of a vapor compression system with a cleaning composition having a hydrofluorocarbon as an active ingredient.

Abstract: A composition for removal of chemical residues from metal or dielectric surfaces or for chemical mechanical polishing of a copper surface is an aqueous solution with a pH between about 3.5 and about 7. The composition contains a monofunctional, difunctional or trifunctional organic acid and a buffering amount of a quaternary amine, ammonium hydroxide, hydroxylamine, hydroxylamine salt, hydrazine or hydrazine salt base. A method in accordance with the invention for removal of chemical residues from a metal or dielectric surface comprises contacting the metal or dielectric surface with the above composition for a time sufficient to remove the chemical residues. A method in accordance with the invention for chemical mechanical polishing of a copper surface comprises applying the above composition to the copper surface, and polishing the surface in the presence of the composition.

Abstract: A dry zeolite containing composition is used in a method for removing grease and/or oil stains from the human body is disclosed. In accordance with the method, zeolites having an average particle size of about 0.5 mm or less provide superior performance to remove grease and oil stains from the skin. Stain removing activities of the zeolite compositions may be enhanced by the addition of an imide.

Abstract: A method of cleaning a power cable having a semi-conductive layer includes wiping the semi-conductive layer with a cleaning solution comprising a brominated hydrocarbon selected from the group consisting of n-propyl bromide and isopropyl bromide to remove at least a portion of the semi-conductive layer.

Abstract: Describes a stabilized trans-1,2-dichloroethylene composition having a low concentration of aliphatic aldehyde hydrazone, optionally in combination with an epoxide. The aliphatic aldehyde hydrazone was found to be more efficient than commercially used hydroquinone monomethylether (HQMME) in preventing the isomeric transformation of trans-1,2-dichloroethylene to cis-1,2-dichloroethylene during storage. Also described is a process for cleaning the surface of an article with the stabilized 1,2-dichloroethylene composition.

Abstract: This is a method for pyrocleaning that degreases metal components using an oven, an oxidizer, a system gas supply, a system gas exhaust, and heat exchangers. The degreasing is accomplished by first transporting the metal components through the oven and exposing the oil coated metal components to hot gases which have a temperature above the vaporization point of the oil. The hot gases are introduced into the oven by way of the system gas supply that does not include products of combustion (indirect heating). Since the gases are at a temperature above the vaporization point of the oil, upon contact with the metal components, the gases cause the oil to evaporate from the metal components. The resultant hydrocarbon-filled surrounding gases are then evacuated from the oven and transported to the oxidizer. In the oxidizer, the hydrocarbon-filled gases are exposed to a burner that catalyzes the oxidation process. After exiting from the oxidizer, the hydrocarbon-free gases are discharged into the atmosphere.

Abstract: A method of treating a semiconductor substrate by first oxidizing and reducing the semiconductor substrate by immersion in an aqueous solution of ammonium hydroxide and hydrogen peroxide, and then oxidizing the semiconductor substrate by immersion in an aqueous solution of ozone, nitric acid, hydrogen peroxide, or mixtures thereof, and then reducing the oxidized semiconductor substrate by immersing it in a first aqueous solution composed of a mixture of hydrofluoric acid and an organic acid or salt thereof, thereafter rinsing the reduced semiconductor substrate by immersion in a second aqueous solution composed of a mixture of hydrofluoric acid and an organic acid or salt thereof, and then reoxidizing the rinsed semiconductor substrate by immersing it in an aqueous solution of ozone, nitric acid, hydrogen peroxide or mixtures thereof.

Abstract: The cleaner of the present invention contains, as an active ingredient, a polyphosphoric-acid-urea condensate or phosphoric-acid-urea polymer which is a reaction product from orthophosphoric acid and urea and is used for cleaning a metal surface and/or a glass surface in at least one process of a semiconductor device production process and a liquid crystal device production process. According to the present invention, an etching residue and impurities on metal (including semimetal) and glass surfaces can be cleaned off with high environmental and working safety and effectively without causing the problem of metal corrosion.

Abstract: Well stimulation and purging compositions for enhancing oil and gas production. The compositions include two base solutions which are typically used in combination with each other in well cleanup, well stimulation and formation purging applications. The first base solution is an anionic surfactant characterized by an aqueous solution of ether sulfate, isopropanol anhydrous, ammonium bisulfide, and either potassium chloride or a clay stabilizer formulation. In treatment of oil and gas wells, the solution is capable of reducing surface tension of well fluids and dissipating and dispersing various solids and minerals by dehydrating the well bore and well formation. The composition flocculates and foams the solids, minerals, water and condensate to the well surface.

Abstract: A method of cleaning elemental copper, cobalt, or nickel from the surface of equipment hardware without corroding or damaging the equipment parts and surfaces in the event of wafer breakage and non-wafer breakage is described. A solution includes an alkyldione peroxide, a stabilizing agent, and alcohols is used to oxidize the metal and form soluble complexes which are removed by the cleaning solution. Also, a alkyldione peroxide solution for cleaning elemental copper, cobalt, or nickel from the surface of equipment hardware in the event of wafer breakage and non-wafer breakage is provided.

Abstract: A cleaning process suitable for both mild and aggressive applications employs non-flammable, non-corrosive and environmentally friendly, fluorinated hydrobromocarbon solvent based cleaning compositions.

Abstract: Aqueous acidic solutions of hydrogen peroxide used for metal surface treatments suffer from an increased decomposition rate of the hydrogen peroxide, caused by the dissolution of metals such as iron, copper, or titanium. Stabilization can be achieved by employing a combination of a) hydroxybenzoic acid, preferably p-hydroxybenzoic acid; b) a hydrotropic sulphonic acid, preferably p-toluene sulphonic acid; and c) a hydrophobic alkaryl sulphonic acid, preferably dodecylbenzene sulphonic acid.

Abstract: Use of compounds of the formula ##STR1## where the radicals R.sup.1, R.sup.2 and A are as defined in the description, as bleach activators in bleaching detergents and cleaners.

Abstract: A process for cleaning movie film, and especially cellulose acetate based polymer film, without causing film damage, comprises immersing the film into a cleaning solvent composition which comprises one or more halogenated hydrobromocarbons having from 1 to 3 carbons, from 1 to 3 bromine atoms and at least one chlorine or fluorine atom, such as 3-bromo-1,1,1-trifluoropropane, removing the film from the solvent and drying the film.

Abstract: A method of absorbing oil or wax by contacting the oil or wax with a nonwoven or woven fabric prepared from a polyvinyl alcohol fiber. A method of recovering oil or wax contained in such a fabric using water and at a rate surprisingly faster than the rate of oil or wax recovery from cotton. A method of absorbing oil or wax from a mixture of oil or wax and sand by contacting the mixture with a fabric made from polyvinyl alcohol. Method of disposing of such fabrics which have been soiled or saturated with the oil or wax. The method is also applicable to other hydrocarbons such as aliphatic or aromatic hydrocarbon solvents.

Abstract: A method is disclosed for cleaning a black powder firearm with a patch saturated with an aqueous emulsion. The aqueous emulsion includes a detergent, a lower alcohol and an essential oil. The saturated patch is loaded into a charged firearm with a projectile, and the firearm is then discharged.

Abstract: The invention relates to novel compositions of 1-bromopropane and at least one organic solvent selected from the group consisting of methanol, ethanol, 1-propanol, 2-propanol, 2-methyl-2-propanol, 2,2,2-trifluoroethanol, tetrahydrofuran, nitromethane, ethyl acetate, acetonitrile, hexane, 1,3-dioxolane, 1-chloro-2-methylpropane, 1,1,1,2,3,4,4,5,5, 5-decafluoropentane, methyl ethyl ketone and cyclohexane and more particularly to azeotrope-like compositions based on these compounds which are useful as solvents in refrigeration flushing, oxygen system cleaning and vapor degreasing applications.

Abstract: A method of cleaning a boiler of a power generation plant is performed removing an oil component remaining in an interior of the boiler before a steady operation of the power generation plant. For such cleaning, a surface active agent is used as a cleaning liquid, and a cleaning liquid tank, into which the cleaning liquid is stored, is temporarily located, which is connected to a boiler feed water pipe through a cleaning liquid injection pipe and a cleaning liquid injection pump, by which the cleaning liquid is injected into the boiler feed water pipe in a controlled manner to feed the cleaning liquid into the boiler.

Abstract: A method of cleaning a substrate by covering the substrate with a composition in a sufficient amount to clean the substrate. The composition includes a substantial amount of at least one low viscosity organic compound which includes a radiation curable group. The compound is reclaimed for further use. The reclaimed compound may be used as a reactive diluent in a radiation curable coating composition.

Abstract: A wax and asphaltene solvation fluid for use in oil and gas wells is derived as a residual fluid from a feedstock that includes a greater mass percentage of trimethylbenzene than decane, and is preferably sour. Mass percentage of both aromatics and asphaltenes in the residual fluid is in the 30%-70% range, and a complex mixture of both is described.

Abstract: A process for forming a water-repellent thin film on a substrate surface by means of a coating fluid for forming a water-repellent thin film, which comprises a coating step of excessively coating the coating fluid for forming a water-repellent thin film on the substrate surface, and an excess amount-removing step of subsequently removing the excess amount of the coating fluid for forming a water-repellent thin film.

Abstract: A process for the removal of poly(arylene sulfide) based deposits from an article by contacting said poly(arylene sulfide) based deposits with a polar aprotic compound, a base, an organosulfur compound having the formula:R.sub.1 --S--S--R.sub.2,wherein R.sub.1 and R.sub.2 are hydrocarbon radicals having from 1 to 50 carbon atoms per radical, and optionally, a halogenated aromatic compound.

Abstract: An apparatus for treating contaminated soil is disclosed. The apparatus includes a reactor vessel for holding a volume of water which is subdivided into a first chamber and a second chamber. The chambers are in fluid communication and are partially separated by a baffle. A soil conveyor is provided for conveying a supply of the contaminated soil to the first chamber. A gas supply directs a supply of pressurized gas into the first chamber, thereby creating a turbulent mixture of soil and water in the first chamber to effect segregation of the soil into a substantially small particle size first fraction and a substantially large particle size second fraction. The reactor vessel includes a first outlet located in a lower portion of the second chamber for withdrawing a slurry comprising the second soil fraction from the reactor vessel. The lower portion of the second chamber may be funnel-shaped to help direct the mixture of soil and water toward the first outlet.

Abstract: Compositions and methods for cleaning metal and non-metal surfaces utilizing a nonionic surfactant and an enzyme are disclosed. A composition comprised of at least one nonionic surfactant and at least one enzyme and having a pH of between 6 and 9.5 is specifically disclosed. A method for cleaning a surface using this composition, and a method for cleaning a surface using a first composition comprising at least one nonionic surfactant and a second composition comprising at least one enzyme are also disclosed.

Abstract: Cleaning compositions are disclosed that economically and effectively remove a variety of marking materials from many coated or uncoated substrate surfaces. The compositions contain a terpene compound, a pyrrolidone compound, an emulsifying surfactant, and water, the compositions being in the form of a microemulsion. Also disclosed are methods of cleaning marked surfaces with the microemulsion compositions.

Abstract: A cleaning solution including a brominated hydrocarbon and an ester. The cleaning solution is especially useful for cleaning high-voltage power cables prior to splicing.

Abstract: A method for removing a sludge from a crude oil tank while recovering hydrocarbons from the sludge. The method is carried in the crude oil tank. The sludge is studied to determine a preferred treatment fluid. Once the treatment fluid is in place in the tank, the contents are vigorously mixed and agitated. Subsequently, the contents of the tank are sampled and any recovered hydrocarbons are removed, followed by removal of the treatment fluid.

Abstract: A cleaning composition is provided with effective cleaning performance and viscosity, said composition comprising a polycarboxylate polymer and a surfactant system containing a short chain surfactant and a long chain surfactant. The present invention further encompasses the use of a polycarboxylate polymer in a liquid cleaning composition.

Abstract: Compositions and methods are provided for cleaning and de-oiling metal parts and then degrading the removed oils or other organic compounds in an environmentally-friendly manner. The compositions generally contain surfactants to remove the oils and enzymes to degrade the oils. Generally, both aliphatic and aromatic compounds normally present in standard oils, lubricants, cutting oils, and greases are removed from the metal parts (i.e., "solubilized") by surfactants (although the enzymes may also assist in this process) and then ultimately broken down into relatively short-chain fatty acids by enzymes, both processes being carried out in an aqueous medium. The surfactants include (a) one or more alkylphenol ethoxylates; (b) one or more alkaline metal salts of an alkane sulfonic acid; and (c) one or more alkanolamines in aqueous solution. Suitable enzymes include monomethanoxigenase, alcoholdehydrogenase, and aldehydehydrogenase.

Abstract: This invention provides a stabilized alkyl bromide based solvent system that is useful for cleaning and degreasing a wide variety of metal objects. The solvent is stabilized with a stabilizer system that includes a dialkyl carbonate such as dimethyl carbonate and optionally other stabilizers and/or acid scavengers to inhibit the metal induced decomposition of the alkyl bromide based solvent. The stabilized solvent is applied to metal articles by any known or conventional means to solvate and entrain greases, oils and other undesirable matter from the article's surface.

Abstract: A method is disclosed for removing and preventing the buildup of contaminants in papermaking wet press felts and on forming wires using a cleaning solution which contains at least one acidic cleaning compound and peracetic acid.

Abstract: This invention provides a solvent composition comprising 1-bromopropane and a decafluoropentane for use as a cleaning and degreasing solvent. Preferably the decafluoropentane consists essentially of 1,1,1,2,3,4,4,5,5,5-decafluoropentane. The solvent composition optionally includes stabilizers and co-solvents such alcohols, ketones, ethers, acetals, nitroalkanes, epoxides and amines. Specific compositions of 1-bromopropane, 1,1,1,2,3,4,4,5,5,5-decafluoropentane and optional stabilizers provide azeotrope compositions that are particularly well suited as cleaning and degreasing solvents.

Abstract: The present invention relates to a surfactant solution, and to using an aqueous solution of the surfactants, optionally with an antifoaming additive, for removing or washing MFAC contaminants from equipment, sludge, scale, and soil, among others. Examples of MFAC and related contaminants that can be removed by practicing the invention include at least a member of the tetraalkylleads, including but not limited too, tetramethyllead, trimethylethyllead, dimethyldiethyllead, methyltriethyllead, and tetraethyllead. While any suitable surfactant can be used for practicing the invention, an aqueous solution containing at least one member from the group of nonionic alcohol ethoxylates, including but not limited to the polyethoxylated aliphatic alcohols, is particularly effective at removing MFAC contaminants.

Abstract: Dilute aqueous compositions for removing soap scum consisting essentially of sodium carbonate, hypochlorite bleach, alkali metal hydroxide and a surfactant system consisting of sodium 2-ethylhexyl sulfate and a C.sub.8 -C.sub.10 -alkyldimethylamine oxide.

Abstract: Disclosed is a single phase mixture of about 1 to about 99 wt % of a compound having the general formula ##STR1## where "n" is 1 or 2 and about 0.1 to about 99 wt % of a liquid which can be a perfluoro aliphatic alkane from C.sub.5 to C.sub.8, a perfluoro cycloaliphatic alkane from C.sub.5 to C.sub.8, a perfluoro alkylcycloalkane having 5 to 8 carbon atoms in the ring and 1 or 2 branches of 1 to 3 carbon atoms each, a perfluoro-N-alkylmorpholine from C.sub.5 to C.sub.8, a perfluoro cycloether from C.sub.4 to C.sub.7, or a perfluoro polyether having an average molecular weight from about 400 to about 500.

Abstract: This invention relates to an enzymatic detergent drain cleaner composition containing:0.015-20 wt % of an acid cellulase enzyme having hydrolytic activity specific to .beta.-glucosidic bonds;1-70 wt % of a water soluble carbonate salt;1-70 wt % of a water soluble acid that reacts in an aqueous medium with the carbonate salt to form carbon dioxide that dissolves in the aqueous medium;0.1-10 wt % of a surfactant; and0.05-5 wt % of a thickening agent. This detergent composition may be used as an enzymatic detergent drain cleaner or in a method for removing or preventing bacterial cellulose deposits in an aqueous system at a solution temperature of up to about 60.degree. C. and a pH of about 2 to about 7.

Abstract: Compositions disclosed include hexafluoropropane and a hydrocarbon having from 1 to 5 carbon atoms or dimethyl ether. These compositions are useful as refrigerants, cleaning agents, expansion agents for polyolefins and polyurethanes, aerosol propellants, refrigerants, heat transfer media, gaseous dielectrics, fire extinguishing agents, power cycle working fluids, polymerization media, particulate removal fluids, carrier fluids, buffing abrasive agents, and displacement drying agents.

Abstract: The invention relates to novel compositions of 1-bromopropane, nitromethane or acetonitrile and at least one alcohol selected from the group consisting of ethanol, 2-propanol and 2-methyl-2-propanol and more particularly to azeotrope-like compositions based on these compounds which are useful as solvents in refrigeration flushing, oxygen system cleaning and vapor degreasing applications.

Abstract: A detergent composition for cleaning the surface of a substrate prior to or after application of an organic or inorganic thin film thereon, comprises: (A) a compound selected from the compounds represented by the formula: R.sub.1 --O--(A.sub.1 O).sub.n --R.sub.2 (wherein R.sub.1 represents an alkyl or alkenyl group having 1 to 7 carbon atoms or a phenyl group; A.sub.1 represents an alkylene group having 2 to 4 carbon atoms; R.sub.2 represents an alkyl or alkenyl group having 1 to 6 carbon atoms or a hydrogen atom; and n is a numerical value ranging from 1 to 6); (B) a compound selected from at least one of those represented by the formulas: R.sub.3 --O--(A.sub.2 O).sub.m --H and R.sub.4 --O--(A.sub.3 O).sub.m --H (wherein R.sub.3 represents an alkylphenyl or alkenylphenyl group having 12 to 25 carbon atoms; A.sub.2 represents an alkylene group having 2 to 4 carbon atoms; R.sub.4 represents an alkyl or alkenyl group having 8 to 25 carbon atoms; A.sub.

Abstract: A method for cleaning parts employed during the processing of semiconductor wafers includes a first cleaning step for removing super-micron particles and a second cleaning step for removing sub-micron particles. The second step utilizes frozen carbon dioxide pellets and removes contaminant particles have a size of less than one micron. The cleaning method consistently removes substantially all sub-micron particles from a work surface.

Abstract: An aqueous stripping composition comprising a mixture of an organic amine and a corrosion inhibitor which is benzotriazole alone or in combination with gallic acid, its ester or analog. The stripping composition is effective to strip photoresists, residues from plasma process generated organic, metal-organic materials, inorganic salts, oxides, hydroxides or complexes in combination with or exclusive of organic photoresist films at low temperatures with little corrosion of copper or titanium containing substrates.

Abstract: Apparatus for cleaning, assembling, testing and inspecting contamination sensitive hardware. The apparatus includes an environmental process enclosure having an inner processing chamber, and a carbon dioxide jet spray cleaning system. The enclosure includes a loadlock pass-through having front and rear access doors for providing access to the inner processing chamber. A blower is disposed in the enclosure for circulating purified gas therethrough. A prefilter disposed prior to an inlet of the blower, and a high purity filter and laminar flow screen are disposed in the inner processing chamber. A heater is provided for heating the purified gas and a temperature controller is coupled to the heater for controlling the temperature of the purified gas. A table is disposed in the inner processing chamber upon which contamination sensitive hardware and testing and assembly apparatus may be placed.

Abstract: A method for cleaning and conditioning tape path surfaces and heads of video and audio equipment, recorders, and electrical contact surfaces of electronic equipment, improving the resolution of said heads comprising: providing a cleaning composition consisting essentially of white mineral oil, a compound selected from the group of mineral spirits, hydrotreated heavy petroleum naphtha, heavy alkylate naphtha and isoparaffinic hydrocarbons having 1-13 carbons; with application to said tape path surfaces and the heads of said video and audio equipment, said tape recorders, and the electrical contact surfaces of said electronic equipment, causing the deep cleaning and conditioning for an improved life and improved results of said recorders and said electronic equipment.

Abstract: A solvent composition comprising dichloropentafluoropropane and (perfluorobutyl) methyl ether, wherein the ratios of the dichloropentafluoropropane and the (perfluorobutyl) methyl ether in the solvent composition are from 10 to 50 wt % and from 50 to 90 wt %, respectively.

Abstract: A composition for removal of chemical residues from metal or dielectric surfaces or for chemical mechanical polishing of a copper surface is an aqueous solution with a pH between about 3.5 and about 7. The composition contains a monofuctional, difunctional or trifunctional organic acid and a buffering amount of a quaternary amine, ammonium hydroxide, hydroxylamine, hydroxylamine salt, hydrazine or hydrazine salt base. A method in accordance with the invention for removal of chemical residues from a metal or dielectric surface comprises contacting the metal or dielectric surface with the above composition for a time sufficient to remove the chemical residues. A method in accordance with the invention for chemical mechanical polishing of a copper surface comprises applying the above composition to the copper surface, and polishing the surface in the presence of the composition.

Abstract: A method of degreasing an anode cup used in a zero-mercury, zinc air electrochemical cell involves contacting the anode cup with an aqueous detersive system containing one or more surfactants and which is subjected to an ultrasonic field. After being immersed in the detersive system for a suitable period of time, the anode cups are rinsed, preferably in an ultrasonic field, and dried. The resulting anode cups have lower levels of impurities, and lower levels of oxygen atoms on the surface, which provide a more hydrophobic surface containing lower levels of water and hydroxyl groups. Zinc air cells prepared from the anode cups degreased in accordance with the method of this invention exhibit less hydrogen gassing and improved performance characteristics.

Abstract: An aqueous hard surface cleaner with improved soil removal is provided and has, as components, the following:(a) either an anionic, nonionic, amphoteric surfactant, and mixtures thereof with optionally, a quaternary ammonium surfactant, the total amount of the surfactants being present in a cleaning effective amount;(b) at least one water-soluble or dispersible organic solvent having a vapor pressure of at least 0.001 mm Hg at 25.degree. C., present in a solubilizing--or dispersion--effective amount;(c) Tetrapotassium ethylenediamine-tetraacetate (potassium EDTA) as a chelating agent, present in an amount effective to enhance soil removal in said cleaner; and(d) the remainder, water.

Abstract: A cleaning mechanism and method for cleaning the probe needles of a probe card used for the inspection of the electric characteristics of a wafer W. This mechanism is provided with a soft cleaner and a brush cleaner. The soft cleaner has a cleaner layer formed of rubber and inorganic filler. The brush cleaner has a number of brush sections, and each brush section is a bundle of fiber members. The fiber members are thinner than the probe needles and have a certain degree of elasticity. The cleaning method includes the steps of: a) cleaning the probe needles using the soft cleaner having a the cleaning layer made of rubber and inorganic filler and b) cleaning the probe needles using the brush cleaner having bristles.

Abstract: A cleaning composition including a terpene such as D-limonene and hydrogen peroxide in a surfactants based aqueous solution. The composition in various specific formulations is a micro-emulsion useful for a variety of materials and for both industrial and household applications.