Abstract: A refuse receptacle apparatus, including a first part having one or more walls defining at least part of a first cavity, a longitudinal axis, and first and second openings situated opposite each other such that the longitudinal axis passes through the first and second openings. The apparatus may also include a second part having one or more walls defining at least part of a second cavity and configured to support at least part of the first part and to cover the second opening. A screen may be situated between the first and second cavities and supported by the first or second parts.

Abstract: A method and apparatus for cleaning a process chamber are provided. In one embodiment, a process chamber is provided that includes a remote plasma source and a process chamber having at least two processing regions. Each processing region includes a substrate support assembly disposed in the processing region, a gas distribution system configured to provide gas into the processing region above the substrate support assembly, and a gas passage configured to provide gas into the processing region below the substrate support assembly. A first gas conduit is configured to flow a cleaning agent from the remote plasma source through the gas distribution assembly in each processing region while a second gas conduit is configured to divert a portion of the cleaning agent from the first gas conduit to the gas passage of each processing region.

Abstract: Treated articles with improved water sheeting and soap scum repellency result from forming hydroscopic films on the surfaces of hydrophobic polymeric substrates treated with compositions, kits and methods that employ water-soluble or water-dispersible copolymers having: (i) a first monomer that is capable of forming a cationic charge on protonation; (ii) a second monomer that is acidic and that is capable of forming an anionic charge in the compositions; (iii) optionally, a third monomer having an uncharged hydrophilic group; and (iv) optionally, a fourth monomer that is hydrophobic. Treated articles exhibit a Water Sheeting Index of greater than 6. Treated articles may further exhibit improved soap scum repellency behavior compared to untreated articles.

Abstract: This invention relates to cleaning compositions comprising unsaturated fluorinated hydrocarbons. The invention further relates to use of said cleaning compositions in methods to clean, degrease, deflux, dewater, and deposit fluorolubricant. The invention further relates to novel unsaturated fluorinated hydrocarbons and their use as cleaning compositions and in the methods listed above.

Abstract: In a substrate processing apparatus configured to perform a predetermined process on a target substrate accommodated in a process chamber, the process chamber is cleaned by alternately performing an operation of generating plasma of a gas containing oxygen within the process chamber, and an operation of generating plasma of a gas containing nitrogen within the process chamber.

Abstract: The invention relates to a detergent for hard surfaces, which contains (a) a polymer compound having a cationic group, such as a cation-modified polyvinyl alcohol containing specified structural units, (b) a surfactant and (c) water.

Abstract: In a process chamber of a substrate processing apparatus, such as an RTP apparatus, a carrier is placed and configured to carry out a contaminant that has been attached to it. In this state, a cleaning gas containing N2 and O2 is introduced into the process chamber, and cleaning is performed under conditions including a pressure of 133.3 Pa or less and a temperature of 700° C. to 1,100° C. This cleaning is repeatedly performed by sequentially replacing a plurality of carriers.

Abstract: A method for cleaning a steam generator may include supplying water to the steam generator and boiling the water in the steam generator to separate and expel at least some deposits in the steam generator.

Abstract: Disclosed is a hydrofluoroether compound comprising two terminal fluoroalkyl groups and an intervening substituted or unsubstituted oxymethylene group, each of the fluoroalkyl groups comprising only one hydrogen atom and, optionally, at least one catenated (that is, in-chain) heteroatom; with the proviso that the hydrogen atom is part of a monofluoromethylene moiety.

Abstract: A resist film removing method for removing a resist film disposed on a substrate and having a cured layer at a surface includes covering the surface of the resist film with a protection film; causing popping in the resist film covered with the protection film; denaturing the resist film and the protection film after causing popping, to be soluble in water; and performing purified water cleaning to remove from the substrate the resist film and the protection film denatured to be soluble in water.

Abstract: The present invention relates to cleaning and/or treatment compositions comprising a dye conjugate, and processes of making and using such compositions. Such compositions can provide benefits such as an increase in the whiteness or blackness perception of a situs that is cleaned or treated with such compositions.

Abstract: The present invention relates to methods using cleaning compositions for the reduction of nucleic acid contamination. More particularly, the present invention relates to cationic compositions that bind to, and can remove, extraneous nucleic acids, polynucleotides, and DNA from the surface of a substrate. Preferably, the cationic compositions include a substance with a molecular weight of 500 Da or more. The present invention finds utility as a surface decontamination agent in PCR and other related DNA amplification techniques.

Abstract: Methods for preventing feature collapse subsequent to etching a layer encasing the features include adding a non-aqueous liquid to a microelectronic topography having remnants of an aqueous liquid arranged upon its surface and subsequently exposing the topography to a pressurized chamber including a fluid at or greater than its saturated vapor pressure or critical pressure. The methods include flushing from the pressurized chamber liquid arranged upon the topography and, thereafter, venting the chamber in a manner sufficient to prevent liquid formation therein. The topography features may be submerged in a liquid while pressurizing the chamber. A process chamber used to prevent feature collapse includes a substrate holder for supporting a microelectronic topography, a vessel configured to contain the substrate holder, and a sealable region surrounding the substrate holder and the vessel. The chamber is configured to sequester wet chemistry supplied to the vessel from metallic surfaces of the sealable region.

Abstract: An apparatus and method for removing contaminants from a workpiece is described. Embodiments of the invention describe placing a workpiece on a holding bracket within a process chamber to hold and rotate the workpiece to be cleaned. A first cleaning fluid is provided to the workpiece non-device side, while a degasified liquid is provided to the workpiece device side during megasonic cleaning. The degasified liquid inhibits cavitation from occurring on and damaging the device side of the workpiece during megasonic cleaning.

Abstract: In a working method for a cleaning device (2) that moves back and forth in a swimming pool (1), control thereof is such that the cleaning device (2) moves from a starting position at a low speed in a forward direction V in a first pass in a first cleaning path (4) until it runs up to a pool wall (3), wherein the distance D1 traversed along the first cleaning path is measured or determined, the cleaning device (2) is then guided to a second cleaning path (5) deviating from or offset relative to the first cleaning path (4) in a second pass, initially at a low speed, whereupon the cleaning device then moves in a backward direction along the second cleaning path (5) at a high speed until the distance Dz traversed is smaller than the distance D1 traversed in the previous pass by an amount A, upon reaching distance Dz the cleaning device (2) continues to move along the second cleaning path (5) at low speed until it runs up to a swimming pool wall (3), wherein the distance D2 traversed along the second cleaning p

Abstract: The method for cleaning chemical process and hydrocarbon processing apparatuses is performed by establishing a closed flow circulation loop, under specific operating conditions and in the presence of hydrocarbon-based fluids. The cleaning method is monitored by performing chemical/physical analysis. After cleaning the apparatus(es) can be immediately inserted back into the process. An optional degassing step can also be performed, in case the apparatus(es) has to be disassembled for inspection of maintenance.

Abstract: The invention relates to a chemical composition and a process for using the chemical composition to remove and recover petroleum hydrocarbons from a contaminated substrate including an ammonia compound; a nitrogen-containing compound; and an aqueous carrier solution.

Abstract: A method is provided for reducing the amount of film fragments discharged into a processing liquid circulation system during removal of films from wafers, thereby reducing the frequency of filter cleaning or filter replacement. The method includes exposing a wafer containing a film formed thereon in a process chamber of a substrate processing system to a processing liquid, where the wafer is not rotated or is rotated at a first speed and the processing liquid is discharged from the process chamber to a processing liquid circulation system. Subsequently, exposure of the wafer to the processing liquid is discontinued and the wafer is rotated at a second speed greater than the first speed to centrifugally remove fragments of the film from the wafer. Next, the wafer is exposed to the same or a different processing liquid and the processing liquid is discharged from the process chamber to a processing liquid drain.

Abstract: An ultra-pure ozone water comprising an increased amount of an organic carbon capable of suppressing the reduction of the half-life period of ozone; and a method for producing the ultra-pure ozone water which comprises adding an organic solvent containing the above organic carbon to an ultra-pure ozone water containing a trace amount of the organic carbon. The above ultra-pure ozone water exhibits an increased half-life period of ozone, and thus, when used in cleaning a semiconductor substrate, allows the cleaning with an ozone water having an enhanced content of ozone, which results in exhibiting an enhanced cleaning capability and cleaning efficiency for an organic impurities, metallic impurities and the like adhered to the substrate, due to enhanced oxidizing action of ozone.

Abstract: Methods and apparatus for cleaning the peeling section of a roller-type peeling machine. The apparatus includes an x-y robot disposed above the peeling section of the peeling machine. The robot has a cleaning tool, such as a liquid spray nozzle, as an end effector. A controller commands the robot to control the movement of the cleaning tool along a predetermined cleaning path to clean the peeling section. One such cleaning path follows each of the insert rollers in the peeling section of a peeling machine.

Abstract: A stabilizer composition comprising a) an amine and b) a compound selected from aliphatic, non-cyclic monomeric polyunsaturated hydrocarbons and terpenes is useful for stabilizing an organic solvent against degradation.

Abstract: The substrate processing apparatus according to the present invention includes: a substrate rotating mechanism holding a substrate in a horizontal attitude and rotating the substrate around an axis passing through the center of the substrate; a processing liquid supply mechanism supplying a processing liquid to a central portion of the upper surface of the substrate rotated by the substrate rotating mechanism; a counter member arranged to be opposed to the upper surface of the substrate rotated by the substrate rotating mechanism; and a liquid film extending mechanism moving the counter member from a position opposed to the central portion of the substrate to a position opposed to a peripheral edge portion of the substrate in parallel with the supply of the processing liquid by the processing liquid supply mechanism and extending a liquid film of the processing liquid covering the central portion of the substrate toward the peripheral edge of the substrate due to the movement.

Abstract: A spray head for use with or in combination with a beverage making apparatus. The spray head receives liquid from a liquid dispensing path of the beverage making apparatus and distributes liquid over a beverage making substance retained in close proximity to the spray head. The spray head includes a body portion (14) having a lip (15) extending generally from a periphery of the body portion. A plurality of holes (20) are formed extending through at least the lip portion. A connector (49) is provided for removably attaching the spray head to the beverage making apparatus. The spray head is removable from the beverage making apparatus for facilitating direct contact cleaning of the surfaces of at least the body of the spray head to remove particles and mineral deposits therefrom.

Abstract: A method of removing particles from a wafer is provided. The method is adopted after a process for removing unreactive metal of a salicide process or after a salicide process and having oxide residue remaining on a wafer or after a chemical vapor deposition (CVD) process that resulted with particles on a wafer. The method includes performing at least two cycles (stages) of intermediate rinse process. Each cycle of the intermediate rinse process includes conducting a procedure of rotating the wafer at a high speed first, and then conducting a procedure of rotating the wafer at a low speed.

Abstract: The liquid composition is based on surfactants and enzymes, and is particularly useful for manual cleaning of instruments. In manual and ultrasonic application the composition in use concentration shows low foaming and gives a cleaning solution which is not cloudy at least at a temperature in the range from 16° C. to 40° C. In addition, the composition has good cleaning efficacy over a broad temperature range (20 to 55° C.) and shows good material compatibility.

Abstract: A cleaning composition based on an aqueous or non-petroleum solvent, and useful for cleaning exterior surfaces such as aircraft exterior surfaces and other metal, glass, rubber and polymer surfaces possesses solvent-like properties with respect to greasy soils; inhibits corrosion and degradation of rubber; is biodegradable; forms a stable emulsion with water; remains optically clear and stable at multiple dilutions with water; and conforms to MIL-PRF 87937D. The composition includes at least one fatty acid methyl ester, at least one ethoxylated alcohol having an HLB ranging from about 10 to about 14, at least one alkyl polyglycoside having an HLB ranging from about 10 to about 14, at least one hydrotrope, an alkali metal silicate, at least one corrosion inhibitor in an amount effective to prevent corrosion on metals, and water.

Abstract: To provide a solvent composition capable of removing soils such as dusts and oils attached to the surface of an article made of an acrylic resin or an article coated with an acrylic resin, without damaging it. An azeotrope-like solvent composition comprising from 38 to 41 mass % of (2,2,2-trifluoroethoxy)-1,1,2,2-tetrafluoroethane and from 59 to 62 mass % of perfluorohexane. A mixed solvent composition comprising from 30 to 60 mass % of (2,2,2-trifluoroethoxy)-1,1,2,2-tetrafluoroethane and from 40 to 70 mass % of perfluorohexane.

Abstract: The invention relates to a composition which makes it possible to obtain a gelled aqueous foam capable of decontaminating, stripping or degreasing a surface. The composition of the present invention comprises one or more surfactants, one or more acidic or basic reactants and a gelling agent. The decontamination foam obtained from this composition exhibits long lifetimes, generally of between 1 and 10 hours, guaranteeing a prolonged time of action on the surface and a high decontamination effectiveness. These foams can be used to remove the radioactivity from an inaccessible plant, which is large in size and complex in design, by simple filling or by simple spraying over an accessible surface.

Abstract: A concrete cleaning and preparation composition is described, which includes urea hydrochloride, surfactant, water, and one or more glycol ethers. Also described is a method of preparing a concrete surface, including pre-wetting a concrete surface, using a cleaning and preparation composition, including urea hydrochloride, a surfactant, water, and one or more glycol ethers, and rinsing the concrete surface. Furthermore, a kit for cleaning, preparing, and coating concrete including a cleaning and preparation composition including urea hydrochloride, and a coating is also described.

Abstract: A pellicle cover, system, and method for cleaning a photomask are disclosed. A pellicle cover is disposed over a photomask and pellicle without damaging the markings surrounding the mask pattern area. The pellicle cover can be practicably implemented in an improved photomask cleaning system and process in which the backside of the photomask may be cleaned without removing the pellicle from the patterned surface.

Abstract: In the washing process of the invention, the solid particles in a high-concentration zone, which is formed in a washing tank by a gravitational sedimentation of solid particles, are continuously washed by a counter-current contact with upward flow of a washing liquid which is fed from the bottom portion of the washing tank. With this process, the impurities in the solid particles are sufficiently removed by a simple apparatus. Since the used washing liquid can be recycled as the disperse medium for feeding the solid particles and as the washing liquid, the amount of used washing liquid to be discharged as the waste from the system is reduced.

Abstract: A process chamber is provided which includes a gate configured to align barriers with an opening of the gate and an opening of the process chamber such that the two openings are either sealed or provide an air passage to the chamber. A method is provided and includes sealing an opening of a chamber with a gate latch and exposing a topography to a first set of process steps, opening the gate latch such that an air passage is provided to the process chamber, and exposing the topography to a second set of process steps without allowing liquids within the chamber to flow through the air passage. A substrate holder comprising a clamping jaw with a lever and a support member coupled to the lever is also contemplated herein. A process chamber with a reservoir arranged above a substrate holder is also provided herein.

Abstract: The invention relates to a method for cleaning an incubator and to an incubator designed for carrying out the method. The method involves disinfecting the incubator, or at any rate the climatic chamber and/or removable parts present in it during the incubation process, by means of a disinfecting heat treatment. Said heat treatment can comprise a step in which the incubator, or at any rate the climatic chamber, is heated to a temperature of at least 50° C., in particular a temperature of approximately 58° to 65° C. for at least 25 minutes. The invention further relates to an incubator, in which the temperature relating means used for the incubation process are further designed for carrying out a disinfecting heat treatment in the climatic chamber.

Abstract: An aqueous, concentrated neutral detergent composition for use in cleaning medical instruments and metal components (parts, tools, utensils, vessels, equipment, and surfaces) having scale control and corrosion inhibition properties when diluted to about 1/40 ounce per gallon to about 1/10 ounce per gallon in potable water. In addition, the concentrate may be applied directly to metal surfaces, such as stainless steel, to remove rust and other stains, without causing any additional corrosion or other damage to the metal surface.

Abstract: A handle for a cleaning implement made of a plastics tubular material having a flexible loop shaped end with an oblong shape and an open end extending away from the loop end. The open end is sized and shaped to securely fit over the post end of a cleaning implement such as a broom, mop, brush, squeegee or rake. The shape and dimensions of the opening in the loop end accommodates a user's hand and arm, allowing the user to place his or her hand and forearm through the opening allowing the loop shaped end come to rest on the forearm. The user's hand then grips the post of the cleaning implement providing better leverage and control of the cleaning implement and allowing the user to flawlessly utilize a dust pan or similar object, move furniture, or maneuver the cleaning implement without repositioning the hand.

Abstract: The present invention relates to azeotropic or azeotrope-like compositions comprising a fluorinated olefin having the formula E- or Z-C3F7CH?CHC3F7, and at least one alcohol, halocarbon, hydrofluorocarbon, fluoroether, or alkanes and combinations thereof. In one embodiment, the one compound selected from the group consisting of alcohols, halocarbons, fluoroalkyl ethers, hydrofluorocarbons, alkanes is either methanol, ethanol, iso-propanol, n-propanol, trans-1,2-dichloroethylene, cis-1,2-dichloroethylene, n-propyl bromide, C4F9OCH3, C4F9OC2H5, HFC-43-10mee, HFC-365mfc, heptane, or combinations thereof. In another embodiment, these compositions are useful in cleaning applications as a degreasing agent or defluxing agent for removing oils and/or other residues from a surface.

Abstract: A method of wet cleaning a surface is disclosed. The method of wet cleaning a surface of at least one material chosen from silicon, silicon-germanium alloys, A(III)/B(V)-type semiconductors and epitaxially grown crystalline materials, such as germanium, includes the following successive steps: a) the surface is brought into contact with an HF solution; b) the surface is rinsed with acidified, deionized water, then a powerful oxidizing agent is added to the deionized water and the rinsing is continued; c) optionally, step a) is repeated, once or twice, while optionally reducing the contacting time; d) step b) is optionally repeated, once or twice; and e) the surface is dried.

Abstract: An aqueous, concentrated neutral detergent composition for use in cleaning medical instruments and metal components (parts, tools, utensils, vessels, equipment, and surfaces) having scale control and corrosion inhibition properties when diluted to about 1/40 ounce per gallon to about 1/10 ounce per gallon in potable water. In addition, the concentrate may be applied directly to metal surfaces, such as stainless steel, to remove rust and other stains, without causing any additional corrosion or other damage to the metal surface.

Abstract: A method for removing a mask layer and reducing damage to a patterned dielectric layer is described. The method comprises disposing a substrate in a plasma processing system, wherein the substrate has a dielectric layer formed thereon and a mask layer overlying the dielectric layer. A pattern is formed in the mask layer and a feature formed in the dielectric layer corresponding to the pattern as a result of an etching process used to transfer the pattern in the mask layer to the dielectric layer. The feature includes a sidewall with a first roughness resulting from the etching process. A process gas comprising CO2 and CO is introduced into the plasma processing system, and plasma is formed. The mask layer is removed, and a second roughness, less than the first roughness, is produced by selecting a flow rate of the CO relative to a flow rate of the CO2.

Abstract: A cleaning composition with a limited number of ingredients contains a polyaluminum compound and surfactant. The cleaning composition optionally has an additional amount of fragrance. The cleaning composition optionally has a small amount of solvent. The cleaning composition optionally comprises a comprises a group selected from the group consisting of a dye, a builder, a fatty acid, a colorant, a preservative, a chelating agent, a colloidal silica and mixtures thereof.

Abstract: The invention pertains to a method and apparatus of cleaning glassware, for example, in a hotel room or a motel room. More particularly, the invention pertains to a method and apparatus for cleaning, rinsing, and sanitizing glassware.

Abstract: The present invention relates to a novel etching solution suitable for characterizing defects on semiconductor surfaces, including silicon germanium surfaces, as well as a method for treating semiconductor surfaces with an etching solution as disclosed herein. This novel etching solution is chromium-free and enables a highly sufficient etch rate and highly satisfactory etch results.

Abstract: A method of cleaning a wafer after an etching process is provided. A substrate having an etching stop layer, a dielectric layer, a patterned metal hard mask sequentially formed thereon is provided. Using the patterned metal hard mask, an opening is defined in the dielectric layer. The opening exposes a portion of the etching stop layer. A dry etching process is performed in the environment of helium to remove the etching stop layer exposed by the opening. A dry cleaning process is performed on the wafer surface using a mixture of nitrogen and hydrogen as the reactive gases. A wet cleaning process is performed on the wafer surface using a cleaning solution containing a trace amount of hydrofluoric acid.

Abstract: A cleaning composition with a limited number of natural ingredients contains alkyl polyglucoside, a 2-hydroxylcarboxylic acid, and a fragrance containing lemon oil or d-limonene. The cleaning composition optionally has a small amount of dye, colorant, and preservative. The cleaning composition can be used to clean hard surfaces and cleans as well or better than commercial compositions containing synthetically derived cleaning agents.

Abstract: An apparatus is provided comprising first and second pads each having a cleaning portion. The apparatus includes a means for attaching the first and second pads to a shoe. The first and second pads are configured so that a golf club head can be cleaned with the cleaning portions of the first and the second pads, while the first and the second pads are attached to the shoe. A connecting portion may connect the first pad and the second pad. First and second straps may be connected to the first and second pads, wherein the first and second straps may have first and second attachment devices located on them.

Abstract: A method for cleaning a substrate is provided. The method includes providing foam to a surface of the substrate, brush scrubbing the surface of the substrate, providing pressure to the foam, and channeling the pressured foam to produce jammed foam, the channeling including channeling the pressured foam into a gap, the gap being defined by a space between a surface of a brush enclosure and the surface of the substrate. The brush scrubbing of the surface of the substrate and the channeling of the pressured foam across the surface of the substrate facilitate particle removal from the surface of the substrate.

Abstract: The present invention relates to compositions comprising fluorinated olefins or fluorinated ketones, and at least one alcohol, halocarbon, hydrofluorocarbon, or fluoroether and combinations thereof. In one embodiment, these compositions are azeotropic or azeotrope-like. In another embodiment, these compositions are useful in cleaning applications as a degreasing agent or defluxing agent for removing oils and/or other residues from a surface.

Abstract: A method for cleaning a work string which may have been used to inject drilling muds, cement slurries, cement displacement materials and the like into a well where the work strong may contain drilling mud residues, cement slurry residues, cement slurry displacement materials, pipe thread lubricants, pipe dope and the like, as well as corrosion on the inside of the work string by injecting a dispersion slug into and recovering the dispersion slug from the work string.

Abstract: The invention relates to amphiphilic acetal of the formula (1) wherein R1 is n-C8-C22-alkyl, iso-C9-C22-alkyl, n-C5-C18-alkylphenyl or iso-C5-C18-alkylphenyl, R2 and R4 are each independently C1-C7-alkyl or have the same meaning as R1, R3 is C1-C7-alkyl, A is a group of the formulae —C2H4— or —C3H6—, and the indices a, b, c and d are each independently from 0 to 50, where at least one of the indices a, b, c or d has to have a value other than 0. The compounds of the invention are suitable as surfactants, emulsifiers, demulsifiers, humectants, foamers, or antifoaming agents.

Abstract: A cleaning system that utilizes an organic cleaning solvent and pressurized fluid solvent is disclosed. The system has no conventional evaporative hot air drying cycle. Instead, the system utilizes the solubility of the organic solvent in pressurized fluid solvent as well as the physical properties of pressurized fluid solvent. After an organic solvent cleaning cycle, the solvent is extracted from the textiles at high speed in a rotating drum in the same way conventional solvents are extracted from textiles in conventional evaporative hot air dry cleaning machines. Instead of proceeding to a conventional drying cycle, the extracted textiles are then immersed in pressurized fluid solvent to extract the residual organic solvent from the textiles. This is possible because the organic solvent is soluble in pressurized fluid solvent. After the textiles are immersed in pressurized fluid solvent, pressurized fluid solvent is pumped from the drum.