Abstract: A cleaning method and an etching method for removing, by cleaning grease components and silicon micro pieces hard to remove, used for an apparatus and a carrier for manufacturing a semiconductor wafer or a semiconductor device. Matters to be removed are brought into contact with XeF2 gas produced by sublimation in a vacuum atmosphere to decompose and gasify the grease components and to remove silicon pieces by etching. If a trace of residual water is left in the vacuum atmosphere before the cleaning, the H2O reacts with XeF2, so that HF is produced. Therefore, for example, the native oxide SiO2 formed on the silicon pieces can be removed, and XeF2 can directly react with silicon, thereby enabling etching. The cleaning and etching speeds are extremely accelerated.

Abstract: The invention relates to an aqueous composition comprising in combination an alkyl pyrrolidone, such as a C8-C18 linear alkyl pyrrolidone, and an alkyl polysaccharide such as an alkyl polyglucoside, and a method of .enhancing the efficacy of an enzyme containing composition for use in cleaning medical instruments comprising the step of including in said composition an alkyl pyrrolidone and an alkyl polysaccharide. The methods and compositions of the present invention may further include at least one enzyme such as proteases, lipases, amylases, and cellulases.

Abstract: During a washing cycle of a rubber blanket on a blanket cylinder some revolutions of the blanket cylinder are initially performed during which the cleaning element is lifted off the blanket cylinder temporarily when the clamping channel passes under the cleaning element.

Abstract: The invention proposes a process and device for the at least partial elimination of carbon deposits in a heat exchanger in which an oxidation treatment is carried out comprising at least one controlled-oxidation stage at a conventional temperature between 400 and about 500° C. for a period of at least 4 hours, by means of an oxidizing fluid comprising for the greater part an inert gas, and a lesser quantity of oxygen, under conditions such that the temperatures of the fluids feeding or leaving the heat exchanger remain below about 520° C. throughout the oxidation treatment, and in that the hot approach of the exchanger remains below about 120° C. throughout the oxidation treatment. The invention also relates to a hydrotreatment system for the implementation of this process and this device.

Abstract: An environmental friendly cleaning method is provided. The method comprises the step of cleaning an article using a composition comprising material extracted from the fruit of a plant of the genus Garcinia, for example the fruit of the plant Garcinia atroviridis.

Abstract: Aqueous disinfecting and cleaning compositions and concentrates which are efficacious against gram positive and gram negative bacteria, have relatively low volatile organic content (“VOC”) and are surprisingly mild to the user of the compositions. The compositions include a quaternary ammonium compound as its primary germicidal active agent, have a low content of active constituents, and do not include organic solvents such as alcohols, glycols, or glycol ethers in significant amounts.

Abstract: A backpack blower has a lightweight engine, a starter, a fuel tank, a fan, a frame for the engine, two hollow tubes, and a control mechanism upon one tube. The blower improvement comes from a housing and two elbows. The round housing contains the fan and has two tangential outlets. The two elbows have a generally round cross section and a generally right angle shape. On each elbow, the first end connects with an outlet and the second end joins a tube. The elbows rotate and bend, directing leaves and debris with airflow from the tubes.

Abstract: A method of sampling contaminants of a semiconductor wafer carrier. The method includes placing a tool chamber in a clean room and then placing and fixing the semiconductor wafer carrier with its opening facing downward inside the tool chamber. Then the method includes using at least one nozzle to spray extraction fluid uniformly on the inner surfaces of the semiconductor wafer carrier and collecting the extraction fluid.

Abstract: This invention concerns paint stripping compositions which are particularly suitable for stripping paint off aircraft. The basic composition consists of a mixture of specific amounts of the following substances: aromatic hydrocarbons, dimethyl formamide; N-methylpyrrolidone; benzyl alcohol; alkanolamine; wax; wetting agent; and thickening agent. A modified composition may also contain dimethyl sulfoxide and a terpene solvent. The invention also includes the method of stripping paint from an aircraft by applying the new stripping composition onto the surface of the aircraft allowing the paint to soften and loosen under the action of the composition, or to penetrate under the paint coating, and then gently removing both the loosened paint and the stripping composition from the aircraft surface without damaging the surface.

Abstract: An automated car wash system is provided comprising an anthropomorphic robot that serves to spray and clean cars prior to their entering into, or within, an automated car wash so as to remove surface dirt from the car, using a high-pressure spray gun. The robot is controlled by an interconnected network of pneumatic or hydraulic pumps and hoses, electronic relays and mechanical linkages so as to simulate the movements of a human. A sensor is used to detect the presence of an automobile in the field of operation of the robot, which sensor also serves to activate the robot and keep it operational as long as the automobile is in a given location. The robot is configured to resemble the shape and size of a human such that it may be dressed in a variety of costumes or outfits so as to maximize both its entertainment value and its utilitarian function.

Abstract: A method for decontaminating soil containing inorganic contaminants having a degree of liberation of at least 60%, comprising the steps of removing from a coarse fraction at least a portion of inorganic contaminants in particulate form contained therein with a jig to produce a treated coarse fraction, removing from an intermediate fraction at least a portion of inorganic contaminants in particulate form contained therein with a separator selected from the group consisting of a spiral and a classifier to produce a treated intermediate fraction, removing from a fine fraction at least a portion of inorganic contaminants in particulate form contained therein with a separator selected from the group consisting of a flotation cell and a multi-gravity separator to produce a treated fine fraction, whereby the combined treated coarse, intermediate and fine fractions are impoverished in inorganic contaminants.

Abstract: A coherent body (B) of wet crushed ice is pumped along a pipe (5). The crushed ice body can be used as a means of cleaning the pipe wall, as a means of driving a product liquid out of the pipe for recovery, or as a barrier for preventing mixing of two different bodies of liquid (1,2) in the pipe to either side of it. Being coherent but flowable and non-tensile, the mass of crushed ice can negotiate internal constrictions, obstructions and junctions of the pipe readily, unlike conventional solid or gelled pigs.

Abstract: The present invention discloses a method for the removal of a number of molecular contaminants from surfaces within a device. A purge gas containing oxygen and/or water is introduced into the interior of the device, contacting at least a portion of the interior surfaces. A contaminated purge gas is produced by transferring a portion of the contamination from the interior surfaces into the purge gas. The contaminated purge gas is removed from the device and the process is continued until the contaminant concentration in the contaminated purge gas is below a predetermined level.

Abstract: A cleaning method for removing fats, oils, and silicon small particles, which are conventionally difficult to remove, adhering to devices and carriers used to manufacture a semiconductor wafer or a semiconductor device. An etching method is also disclosed. XeF2 gas produced by sublimation is made to contact with an object to be cleaned in a vacuum atmosphere so as to decompose and gasify the oils and fats and to remove silicon small particles by etching. Prior to the cleaning, when a trace amount of residual water is left in the vacuum atmosphere, H2O reacts with XeF2, and HF is produced. For example, a native oxide SiO2 formed on the surface of silicon small particles can be removed, and XeF2 directly reacts with silicon, therby enabling etching. The cleaning etching rates are extremely high.

Abstract: A plastic substrate is processed by a functional water obtained by electrolysis of water or functional water containing active oxygen or active hydrogen for a predetermined time period to selectively remove an alkali and/or halogen component in a surface layer of the plastic substrate to stabilize or remove oligomer in a resin matrix, whereby deterioration of resin and deterioration of properties of a recording medium caused by a remaining unreacted catalyst used for processing the plastic substrate surface or the like can be prevented and the adhesion strength and the durability of a recoding coating to be formed on the substrate are improved.

Abstract: Relatively small particles of glass (i.e., glass swarf) are generated as a by-product of glass grinding, typically performed to smooth edges of a glass product. Disclosed herein is an inventive method of reducing the tendency of the glass swarf to accumulate and harden, thereby improving the ability to maintain a glass grinding facility. According to the present invention, a loosening agent is mixed with the glass swarf to prevent it from accumulating and hardening.

Abstract: Use of cationically modified, particulate, hydrophobic polymers, the surface of which has been cationically modified by coating with polyvalent metal ions and/or cationic surfactants, the particle size of which is 10 nm to 100 ?m, as additive to rinse compositions, care compositions, detergents and cleaners, and also rinse compositions, care compositions, detergents and cleaners which comprise the cationically modified, particulate, hydrophobic polymers.

Abstract: A cleaning station for a vertical nozzle plate of an ink jet printer includes a cylindrical cleaning roller that has an outer surface, and has a substantially vertical central axis and a substantially vertical rotational axis. The roller is spaced from the nozzle plate to form a cleaning cavity between the roller and the nozzle plate. The roller has a top end above the nozzle plate and a bottom end below the nozzle plate. A drive element is connected to the roller to rotate the roller about its rotation axis. A fluid outlet near the top of the roller directs cleaning fluid onto the outer surface of the roller, and into the cleaning cavity between the roller and the nozzle plate. A fluid reservoir stores cleaning fluid, and a fluid conduit conducts cleaning fluid from the fluid reservoir to the fluid outlet.

Abstract: In a method and apparatus for cleaning the front surface of a mounted lens a web is moved to a lowered position against the lens. A first segment of the web is then slackened. The first segment of web is then rubbed against the lens. Following the rubbing the web is pulled taut while the web is still in the lowered position. A second segment of web can be wiped against the lens while the web is held taut. The first segment can be wet and the second segment dry.

Abstract: The present invention involves a solvent vapor transfer device for holding an absorbent pad, which receives and disperses solvent vapors over a lacquer-based residue on a textile. A solvent is poured or dripped into an absorbent pad portion of the vapor transfer box, from which solvent vapors are released. The solvent vapors pass through the vapor transfer box and concentrate in a vapor chamber over the lacquer-based residue and textile. As the solvent vapors come into continuous contact with the lacquer-based residue, the residue begins to dissolve and soften. Upon sufficient dissolution, minute quantities of the liquid solvent may be applied directly to the partially dissolved residue and quickly suctioned into an extraction vacuum. This process may be repeated as necessary to achieve complete removal of the residue.

Abstract: In a method of cleaning metal-containing deposits such as tantalum from a surface of a process chamber component, such as a metal surface, the surface is immersed in a cleaning solution. In one version, the cleaning solution is a solution having HF and HNO3 in a ratio that removes deposits from the surface substantially without eroding the surface. In another version, the cleaning solution is a solution having KOH and H2O2. The solution can be treated after cleaning the surface to recover tantalum-containing materials and one or more of the cleaning solutions.

Abstract: In a method of cleaning and refurbishing a process chamber component having a metal coating having a surface thereon, the surface of the metal coating is immersed in an acidic solution to remove at least a portion of the process deposits from the surface. Thereafter, the surface of the metal coating is immersed in a basic solution to remove substantially all the metal coating. The component may optionally be bead blasting to roughen a surface of the component, and the metal coating may be re-formed.

Abstract: A method of cleaning the interior of a processing chamber first performs a halogenation treatment by supplying a treatment gas containing a halogenating gas into the processing chamber and heating a support member for a target substrate, thereby halogenating a metal element in a by-product film. A reduction treatment is then performed by supplying a treatment gas containing a reducing gas into the processing chamber, thereby reducing a halide of the metal element and liberating the metal element. An oxidation treatment is then performed by supplying a treatment gas containing an oxidizing gas into the processing chamber and heating the casing walls of the processing chamber, thereby passivating the liberated metal element by oxidation.

Abstract: Disclosed are detergent compositions for hand dishwashing which, by incorporating certain organic solvents, results in a liquid dishwashing detergent composition that is not only a more effective cleaning agent, but also offers improved physical and enzymatic stability and more convenient rheology and handling characteristics than typical liquid dishwashing compositions.

Abstract: The invention relates to the use of tenside agents containing selected non-ionic tensides, for use in cleaning and/or disinfecting processes and/or cleaning and/or disinfecting preparations.

Abstract: The stripping agent is sprayed from the tip of the nozzle 33 onto the wafer surface, while the first supply nozzle 33 is actuated to scan from the central portion of the wafer to the outer portion thereof. This operation provides the situation, in which the interface of the residual droplet 38 is pulled back from the center of the wafer to the outer portion of the wafer by the surface tension of the stripping agent supplied from the nozzle. Meanwhile, the second supply nozzle 36 also scans at a same scanning speed as the first supply nozzle 33 scans. Vapor IPA is sprayed from the orifice of the second supply nozzle 36. This provides that vapor IPA is sprayed onto the wafer surface immediately after the stripping agent is sprayed thereon from the first supply nozzle 33, and the residual stripping agent on the wafer surface is efficiently replaced with IPA.

Abstract: In order to remove or decrease fine granular sulfides of Mn, Cr, Mo, etc. (Mn—S, Cr—S, Mo—S, etc.) left on a machined workpiece surface of sulfur free-cutting alloy steel without affecting the form and dimensional accuracy thereof, there is provided a method for treating the sulfur free-cutting alloy steel which comprises a soaking process of the machined workpiece in a solvent and an ultrasonic cleaning process by applying ultrasonic waves of 1.0 to 2.0 W/cm2 in watt density at a frequency of 40 KHz or a multi frequency in the solvent.

Abstract: A cleaner-passivator composition and method for treating a fuel cell cooling system are described. The cleaner-passivator comprises a complexing agent, a surfactant, a corrosion inhibitor, and a solvent. The cleaner-passivator reduces the contaminants circulating in the fuel cell coolant system that contribute to increasing conductivity in the fuel cell coolant. In addition, the passivator reduces the surface corrosion in the fuel cell system.

Abstract: The present invention provides an adaptive fill control for controlling the amount of liquid added in one or more liquid fill periods in a dishwasher cycle. The amount of liquid added in a liquid fill cycle is adjusted by activating the dishwasher drain pump while continuing to operate the dishwasher circulation pump. The accumulated time from the start of the drain pump operation until the circulation pump experiences a liquid starvation episode is compared to a predetermined optimum time period for the circulation pump to experience liquid starvation. The sign and difference between to accumulated time period and optimum time period is used to adjust the amount liquid added in the next liquid fill period. A number of sensors for detecting a circulation pump liquid starvation episode are disclosed.

Abstract: The present invention provides a method for efficiently and uniformly treating articles with two or more fluids without transferring the articles from one container to another container.

Abstract: A cleaning sheet has a base sheet, a first polishing layer formed on the base sheet, a porous foamed layer having air bubbles inside formed on the base sheet, and a second polishing layer formed on the foamed layer. The surface of the foamed layer may be flat or preferably porous with the second polishing layer having openings corresponding to those on the porous surface of the foamed layer. For cleaning a probe by using such a cleaning sheet, the tip of the probe is caused to penetrate the surface of the second polishing layer, to pass through the foamed layer and to be pressed against the first polishing layer.

Abstract: The compressor cleaning system includes a track mounted about the inlet of the compressor. A circumferential position assembly mounts an insertion drive assembly which is driven about the track into selected circumferential positions. The insertion drive assembly carries a manipulator arm assembly mounting at its distal end a cleaning head. By using pairs of control cables, the proximal yaw, pitch and distal yaw sections of the manipulator arm can be moved to weave the cleaning head past the multiple stages of blading to locate the cleaning head adjacent a selected blade. By repeated extension and retraction of the cleaning head relative to the compressor inlet and about the compressor blades, each blade can be cleaned without disassembly of the compressor casing or removal of the rotor.

Abstract: The present invention relates to a method for preventing the deposition of contaminants in steam systems. In a method of this type, deposits are prevented in a simple and economic manner by metering an additive into the steam, which additive adheres to the steam-side surface of the steam system and has the effect of repelling moisture and contaminants.

Abstract: Embodiments of the invention are directed to substrate processing apparatuses and methods for processing substrates. In one embodiment, a substrate processing apparatus includes a processing chamber, a substrate holder inside of the processing chamber for holding a substrate, and a sonic box in the processing chamber for supplying sonic waves substantially perpendicularly to the substrate. The sonic box may comprises a membrane, and a transducer coupled to the membrane.

Abstract: A method of removing a virgin metal oxide coating from the surface of a superalloy gas turbine engine component. The component bearing the applied metal oxide coating is contacted with an aqueous coating-removal solution, typically containing by weight about 10-25% alkali hydroxide, about 1-8% alkanolamine, and about 0.5-5% gluconate salt at a temperature of from about 170° F. (67° C.) to about 210° F. (99° C.), for a time sufficient to remove the metal oxide coating from the superalloy blade by gentle mechanical means. The metal oxide coating can comprise one or more metal oxide layers, such as a chromium oxide layer and an aluminum oxide layer.

Abstract: The present invention controls a temperature of a processing liquid to be in within an allowable processing temperature range, whereby the processing efficiency and throughputs can be improved, deterioration of the processing liquid is prevented, and the life of the processing liquid can be extended. In the liquid processing method, a chemical liquid L stored in a tank 10 can have temperatures controlled by heating and cooling by a heater 1 and cooling means 2 and is circulated for stand-by. the chemical liquid L in the stand-by circulation is supplied to wafers loaded in a processing chamber 6 to process the wafers, a cooling medium of the cooling means 2 is heat-exchanged with the chemical liquid L in the tank 10 to be ready for the next stand-by circulation.

Abstract: System and method for reducing damage to a semiconductor substrate when using cleaning fluids at elevated pressures to clean the semiconductor substrates. A preferred embodiment comprises applying the cleaning fluid at a first pressure for a first time period, wherein the first pressure is relatively low, and then increasing the pressure of the cleaning fluid to a pressure level that can effectively clean the semiconductor substrate and maintaining the pressure level for a second time period. The application of the cleaning fluid at the relatively low initial pressure acts as a temporary filler and creates a buffer of the cleaning fluid on the semiconductor substrate and helps to dampen the impact of the subsequent high pressure application of the cleaning fluid on the semiconductor substrate.

Abstract: A method for cleaning the electrical contact areas or substrate contact areas of an electrochemical plating contact ring is provided. Embodiments of the method include positioning a substrate on a substrate support member having one or more electrical contacts, chemically plating a metal layer on at least a portion of a surface of the substrate, removing the processed substrate from the support member, and cleaning the one or more electrical contacts with a vapor mixture comprising an alcohol. In another aspect, the method includes spraying the vapor mixture on the electrical contacts while rotating the substrate support member.

Abstract: A screen cleaning tool including a thin sheet of fiberous material made by a process that includes the steps forming fibers into a lacy pattern, compressing the pattern into a thin sheet, applying a curable adhesive to the fibers, and curing the adhesive and pre-moistening said thin sheet with an aqueous solution of materials selected from the group consisting of propylene glycol, polysorbate, aloe extract, 2-phenoxyethanol, methyl paraben, butyl paraben, ethyl paraben, propyl paraben, isobutyl paraben, and DL-alpha-tocopheryl acetate in order to make it available to be wiped over the surface of a screen.

Abstract: The present invention relates to compositions for treating shoes, especially leather-containing shoes, such as athletic shoes, and methods and articles of manufacture employing same to treat the shoes prior to and/or during and/or after washing the shoes. More particularly, the present invention relates to compositions applied to one or more shoes in need of treatment prior to and/or during and/or after washing the shoes for imparting a desired benefit to the shoes such as cleaning and/or conditioning and/or disinfecting and/or deodorizing.

Abstract: An automatic dishwashing composition is presented having 0.01 to 90 percent by weight of a detergency builder and 0.1 to 20 percent by weight of at least one polymer, wherein said polymer or polymers comprises carboxylate groups and sulfonate groups. The composition is useful in liquid, tablet and granular compositions. The composition reduces filming and spotting of glass and plastics.

Abstract: Normally liquid, omega-hydrofluoroalkyl ether compounds (and selected mixtures thereof) have a saturated perfluoroaliphatic chain of carbon atoms interrupted by one or more ether oxygen atoms. The compounds can be prepared, e.g., by decarboxylation of the corresponding fluoroalkyl ether carboxylic acids and are useful, e.g., in cleaning and drying applications.

Abstract: The present invention relates to blooming type cleaning compositions comprising natural oil. More particularly, the present invention relates environmentally acceptable, blooming natural oil cleaning compositions which achieve product stability and clarity with essentially one natural oil without the addition of pine oil, amine oxides, amphoteric surfactants or phenolic solvents.

Abstract: An improved method for removing contaminant particles from a surface of a semiconductor wafer includes forming a sacrificial film on the surface of the wafer and then removing the sacrificial film by supercritical fluid cleaning. The removal of the sacrificial film via the supercritical fluid cleaning process facilitates removing the contaminant particles. The method further includes identifying and characterizing the contaminant particles and creating a record of the contaminant particle data. The composition of the sacrificial film is selected based on the contaminant particles data and the supercritical cleaning recipe is selected based on the composition of the sacrificial film and the contaminant particles data.

Abstract: A method for cleaning a semiconductor substrate with a sonic cleaner is provided. The method initiates by introducing a cooling fluid into an inner jacket region of a sonic cleaner to cool a sonic resonator positioned within the inner jacket region. Then, a cleaning agent is introduced into an outer jacket region of the sonic cleaner to clean a semiconductor substrate. Next, a cooling fluid/cleaning agent interface is defined at an orifice location between the inner jacket region and the outer jacket region. Then, sonic energy from the resonator is transmitted to the cleaning agent through the interface at the orifice. Next, the cleaning agent is applied to the semiconductor substrate.

Abstract: A composition and method for stripping and cleaning organic coatings from substrates, comprising a solution of high-boiling alcohols, preferably polyglycols, a surfactant, preferably a nonylphenol ethoxylate, and an alkali metal hydroxide, said composition being essentially free of any amines. The composition aggressively and effectively strips paints and other organic coatings without harming underlying substrates damaged by prior art strippers, over conventional or lower time periods, and at conventional or lower temperatures. One embodiment of the invention comprises from about 40% to about 98.9% by weight of a high-boiling alcohol; from about 1% to about 60% of a non-ionic surfactant; and from about 0.1% to about 10% of an alkali hydroxide or mixture of alkali hydroxide.

Abstract: A release agent for bituminous material is disclosed which comprises a mineral oil-free composition containing an aqueous dispersion of a polyalkenamer, preferably a polyoctenamer. The release agent may additionally contain a dispersing agent and at least one fatty acid ester. The release agent also may be used for the cleaning of surfaces such as motor vehicles, road making machines and environmental surfaces contaminated with bituminous material.

Abstract: Deicing of an external mirror (10) on a vehicle is effected by applying a sudden deformation force to the mirror. Sandwiched between the mirror (10) and a mounting surface (12) is a structure that includes a ribbon conductor (14), portions of which overlap each other in such a way that current through the conductor passes through these portions in opposite directions. A capacitor (32) is discharged through the conductor (14), generating a magnetic field that results in mutual repulsion between the overlapping portions. The mounting surface resists this repulsion force, which is instead transferred to the mirror (10), causing momentary distortion, and dislodgment of ice on the mirror surface. The same technique is also applicable to deicing of windows.

Abstract: Aqueous liquid concentrates for use when diluted as all purpose spray cleaners comprising the following components: A) from about 3 to about 10% by weight of at least one base-catalyzed reaction product comprised of the following reactants: (i) at least one compound of formula I: R1(X)3??(I) ?wherein each X group is a halogen atom or one X group is a halogen atom and two X groups represent an epoxy oxygen atom, which is attached to two adjacent carbon atoms in the R1 group to form an epoxy group, and R1 is an alkanetriyl group containing from 3 to 10 carbon atoms; and (ii) at least one compound having the formula II: R2X(AO)nY??(II) ?wherein R2 is a substituted or unsubstituted, saturated or unsaturated, organic group having from 1 to 36 carbon atoms; X is —O—, —S—, or —NR3— where R3 is hydrogen or a C1-C8 alkyl group; each AO group is independently an ethyleneoxy, 1,2-propyleneoxy, or 1,2-butyleneoxy group, n is a number of from 0 to 200; and Y is hydrogen, or Y can be a mercapto group, an amino gro

Abstract: The method of using the mouse pad cleaning apparatus is disclosed and claimed. The method comprises the steps of uncovering the mouse cleaning surface, applying the mouse and ball of the mouse to the cleaning surface, moving the mouse in a rotational pattern on the mouse cleaning surface, removing the mouse form the mouse cleaning surface, washing the cleaning surface, and covering the mouse cleaning surface. A mouse pad cleaning apparatus comprising a plurality of substrates, each said substrate having adhesive thereon, said plurality of substrates residing in and affixed to a receptacle. A single substrate having adhesive, which may be washable or non-washable, thereon may be employed. The washable adhesive may be an organopolysiloxane or gelatinous elastomer.