Abstract: A first application of a cleaning material is made to a surface of a substrate. The cleaning material includes one or more viscoelastic materials for entrapping contaminants present on the surface of the substrate. A first application of a rinsing fluid is made to the surface of the substrate so as to rinse the cleaning material from the surface of the substrate. The first application of the rinsing fluid is also performed to leave a residual thin film of the rinsing fluid on the surface of the substrate. A second application of the cleaning material is made to the surface of the substrate having the residual thin film of rinsing fluid present thereon. A second application of the rinsing fluid is then made to the surface of the substrate so as to rinse the cleaning material from the surface of the substrate.

Abstract: A process for treating the surface of a substrate in the manufacture of a semiconductor device. The process comprises providing a concentrated acid or base, a peroxide and water, and delivering the acid or base, the peroxide and the water to the surface of the substrate. The acid or base and the water are delivered separately to the surface of the substrate and allowed to mix on the surface, and the water is delivered in pulses. The present invention also provides an apparatus adapted to carry out this process.

Abstract: A cleaning system which includes an enclosure and having a door with a transparent window. The door is opened and closed to load and unload products to be cleaned. An operator puck on the outside of the enclosure couples magnetically to another actuator puck on the inside of the enclosure. This coupling allows an operator to move and direct the inside puck to actuate spray or air blast functions, without opening the enclosure. The outside operator puck includes one or more switches which turn on the various electronic components such as the liquid pump, light, or air blast valve. The cleaning system enables a user to efficiently direct cleaning action to parts inside to minimize the cleaning time, and to prevent exposure of chemicals. The cleaning fluid is cycled out of the enclosure continuously, and into a “trap” box, through a pump and back into the cleaner box in a closed loop cycle.

Abstract: A semiconductor cleaning method and apparatus and a controlling method of semiconductor cleaning are disclosed. The developing method includes the following steps. A developing solution is applied onto a wafer having a photoresist layer. Next, the wafer is rotated to scatter the developing solution over the photoresist layer. Then, a nozzle upon the center of the wafer ejects a non-reactive liquid onto the photoresist layer for a time period. Next, the nozzle is moved in a radial direction of the wafer to at least one next location and then ejects the liquid onto the photoresist layer for at least one next time period. The wafer is then rinsed until the developing solution and the unnecessary photoresist dissolved in the developing solution are washed away and a patterned photoresist layer is revealed.

Abstract: Particularly in hospitals, care homes or similar institutions, it is necessary to have a safely handled and reliable method for the emptying and cleaning of excretion containers, for example urine bottles or bedpans. A method and a system (110) are therefore proposed, by means of which such articles to be rinsed (112) can be treated. In this case, first, in an emptying step (210), the articles to be rinsed (112) are emptied and are rinsed out with a rinsing-out liquid. Subsequently, in a circulation step (212), the articles to be rinsed (112) are washed in circulation. Finally, a rinsing-clear step (214) is carried out, in which the articles to be rinsed (112) are rinsed with a rinsing-clear liquid. Then, in an optional disinfection step (216), preferably a chemical disinfection step (216), the articles to be rinsed (112) are disinfected, and, in an optional drying step (218), the articles to be rinsed (112) are dried by being blown off with heated air.

Abstract: The present invention provides a system (100) for conditioning multi-component slurries utilized in chemical mechanical polishing (CMP) of semiconductor wafers (140). The system provides a first slurry component (108), and a second slurry component (120). A conditioning component (102) has first and second inlets, and an outlet operatively coupled to a dispensing system (138). First and second flow control components (116, 126) are operably intercoupled between the first and second inlets and the first and second slurry components, respectively. The system further provides a megasonic energy source (106), adapted to generate an energy field (118) across the conditioning component. A conveyance component (114) conducts the slurry components from the inlets through the energy field, and delivers a final mixture (136) of multi-component slurry to the outlet.

Abstract: Disclosed is a method for removing loose scale and other foreign matter from the top and/or bottom face of a cast product (3), such as a slab, thin slab, profiled element, or similar, with the aid of flowable media which are sprayed onto the cast product (3) by means of a cleaning device (5) comprising at least one spraying apparatus (8, 9) that is disposed above the cast product (3) and at least one spraying apparatus (8, 9) that is arranged below the cast product (3). According to said method, the amount of media and/or the effective width and/or the pressure of the media is/are controlled separately and independently of time for each spraying apparatus (8, 9).

Abstract: A radioactive substance decontamination method and apparatus which decontaminates a metal member contaminated by radioactive substance in a short period of time. This apparatus has (1) multiple reducing decontamination tanks having different radiation control values; (2) a carrier for immersing the metal member into the multiple reducing decontamination tanks and a washing tank; (3) a tube for transferring into the second reducing decontamination tank the reducing decontamination agent in the first reducing decontamination tank; (4) a reducing agent decomposer for decomposing a component contained in the reducing decontamination agent of the reducing decontamination tank where the radiation control value is the highest out of the reducing decontamination tanks connected by the tube; and (5) a washing tank for washing the reducing decontamination agent deposited on the decontaminated metal member.

Abstract: A method and biological cleaning system are provided for cleaning substrate surfaces of oils and/or greases using a biological cleaning system which utilizes a pre-treatment bath and/or post-treatment bath as part of the cleaning system. The pre-treatment and/or post-treatment baths are compatible with the biological cleaning bath and during operation of the system, the used pre-treatment and/or post-treatment baths are recycled to the biological cleaning solution for biodegradation. A system is provided in which none of the pre-treatment, post-treatment or biological cleaning baths need expensive waste disposal. Replenishment pre-treatment and/or post-treatment baths as well as biological cleaning baths are added as needed to the biological cleaning system. Other treatment baths may be added directly to the biological cleaning bath with or without pre- or post-treatment for specific purposes such as a detergent phosphating bath used in the biological cleaning tank to provide a cleaned phosphated part.

Abstract: A system for liquid cleaning a plurality of dirty open-ended cylindrical internal combustion engine paper air filters by subjecting each filter to a cleaning cycle including successive first, intermediate and final cleaning steps. For each step liquid is pumped from a separate tank to spray heads for rinsing a filter at a cleaning station and effluent with entrained contaminants is collected for transfer away from the cleaning station. First step cleaning pumps an unclean liquid previously collected in a first tank as effluent from the intermediate step of a preceding filter cleaning cycle and first step effluent is disposed of away from the system. Intermediate step cleaning pumps a semi-clean liquid previously collected in a second tank as effluent from the final cleaning step of a preceding filter cleaning cycle and intermediate step effluent is collected and transferred as unclean liquid to the first tank for cleaning use during the first stage of the succeeding filter cleaning cycle.

Abstract: An apparatus for depositing an array of spots on a receiving surface includes a fluid source, a deposit device that includes a drop-carrying surface, and a cleaning device. The deposit device and a fluid source are cooperatively arranged to deposit a spot(usually created by a drop) on a receiving surface. The cleaning device is constructed and arranged to clean the drop-carrying surface by employing a flow of cleaning fluid or another cleaning matter such as small particles the flow being arranged to prevent contaminating back flow.

Abstract: A system for processing a workpiece includes a base having a bowl or recess for holding a liquid. A process reactor or head holds a workpiece between an upper rotor and a lower rotor. A head lifter lowers the head holding the workpiece into contact with the liquid. Sonic energy is introduced into the liquid and acts on the workpiece to improve processing. The head spins the workpiece during or after contact with the liquid. The upper and lower rotors have side openings for loading and unloading a workpiece into the head. The rotors are axially moveable to align the side openings.

Abstract: A method and biological cleaning system are provided for cleaning substrate surfaces of oils and/or greases using a biological cleaning system which utilizes a pre-treatment bath and/or post-treatment bath as part of the cleaning system. The pre-treatment and/or post-treatment baths are compatible with the biological cleaning bath and during operation of the system, the used pre-treatment and/or post-treatment baths are recycled to the biological cleaning solution for biodegradation. A system is provided in which none of the pre-treatment, post-treatment or biological cleaning baths need expensive waste disposal. Replenishment pre-treatment and/or post-treatment baths as well as biological cleaning baths are added as needed to the biological cleaning system. Other treatment baths may be added directly to the biological cleaning bath with or without pre- or post-treatment for specific purposes such as a detergent phosphating bath used in the biological cleaning tank to provide a cleaned phosphated part.

Abstract: A system for processing a workpiece includes a base having a bowl or recess for holding a liquid. A sonic energy source, such as a megasonic transducer, provides sonic energy into a liquid in the bowl. A process reactor or head holds a workpiece between an upper rotor and a lower rotor. A head lifter lowers the head holding the workpiece into the liquid. Sonic energy is provided to the workpiece through the liquid, optionally while the head spins the workpiece. The liquid may include de-ionized water and an etchant.

Abstract: A dilution tool (100) and a method prepare a solution of two fluids for removing residue from a semiconductor wafer. The fluids are combined in a filter (130) to form the desired solution. Sealless pumps (141, 142) are driven by a common motor (143) to pump the fluids at a constant ratio of their respective flow rates while the flow rate of the solution varies. The conductivity of the solution is measured with a conductivity meter (166) to determine the concentration.

Abstract: An apparatus and method are described for stripping the photoresist from a wafer while in a substantially parallel manner, another wafer is being transferred between a load lock chamber and a transfer chamber, where the processing occurs. Further, a system is described whereby two load lock chambers are employed so that processing of wafers can continue uninterrupted by a delay caused by the need to open, empty, reload and re-equilibrate a single load lock chamber. Still further, a system is described for performing multi-step dry-stripping applications requiring different conditions for two or more of the steps wherein the steps may be performed simultaneously or sequentially. Finally, a system combining a dry-stripping module and a wet-cleaning module is described which combination system permits the continuous, fully-automated dry-stripping and wet-cleaning of wafers and, upon completion of the entire processing cycle, returning wafers to their original wafer cassettes.

Abstract: A device for cleaning surfaces which are soiled in the food industry with grease, starch or protein residues including: a housing body having a first inlet for feeding pressurized water; a propulsion jet positioned behind the inlet and in a direction of flow; a collection jet positioned behind the propulsion jet which is flow connected with a second inlet for feeding a chlorine-free alkaline foam cleaning agent and a third inlet for feeding a hydrogen peroxide solution; and a turbulence chamber into which an elongated jet body of the collection jet extends, the turbulence chamber fitted with a chamber inlet for feeding compressed air into the chamber such that a hydrogen peroxide foam is formed from a solution formed upon dosing an effective amount of the hydrogen peroxide solution into the chlorine-free alkaline foam cleaner at a maximum of 60 seconds prior to contact of the hydrogen peroxide foam with a surface to be cleaned, the turbulence chamber further having a chamber outlet through which the hydrogen

Abstract: It is known to wash dispersion noodles in a `batchwise` fashion in which the noodles are retained in a kettle or kettle and water is sprayed onto the surface of the noodles. Agitation is achieved by bubbling air into the kettle from the bottom. Described herein is a method and apparatus for continuously washing dispersion noodles. The apparatus includes continuous pipe work in which the noodles are washed, the pipe work including at least one separating device (10) for separating the noodles from the water in which they have been washed. The device (10) comprises a housing (12) having an inlet (14) and an outlet (16). A separating element (22) is located in the housing (12) between the inlet (14) and the outlet (16) and is surrounded by a collection chamber (24), the element (22) comprising a tube of mesh material through which water passes into the collection chamber (24) and which is then drained off through drain (32).

Abstract: A system for collecting and disposing of body fluids collected during surgery comprises a canister and a servicing unit for removing the body fluids from the canister and cleaning the canister for re-use. The canister is a vessel having sidewalls, a bottom and a lid. The lid has a first inlet port for the inflow of body fluids into the canister during surgery and a vacuum port for application of vacuum to the canister to induce the inflow of body fluids into the canister. The lid has a second inlet port for the inflow of cleaning fluid into the canister and a spray head in fluid communication with the second inlet port for spraying the cleaning fluid within the canister. The lid also has an outlet port with a suction tube extending into the canister for the outflow of body fluids and cleaning fluid from the canister. Caps are provided for closing those ports when the canister is being used to collect body fluids during surgery.

Abstract: A dishwashing machine is proposed which is considerably shorter in design than the previously used, continuously operated transport-dishwashers. In order permanently to reduce the consumption of water, energy and rinsing agent, the crockery in the individual crockery baskets is washed cyclical operation, the circuits of the rinsing apparatus being started up only in their respective time span within the wash program.

Abstract: A fluid collection and disposal system which includes a reusable collection unit designed to be cleaned by a servicing unit after use. The servicing unit performs an automatic servicing cycle to remove the collected fluid from the collection unit and prepare it for reuse.

Abstract: A control system for a high-speed rotary washer spraying system designed particularly for plastic returnable bottles automatically regulates each process of the wash spraying system, namely, sequentially feeding bottles from an infeed conveyor means, inverting them by a worm/inverter means, receiving and simultaneously rotating each bottle in an inverted position through a plurality of washing, neutralizing and sanitizing treatment zones, and inverting each bottle to its original neck-up orientation for further processing. During the entire process, a programmable logic controller maintains, manages, and controls all pumps, valves, solenoids, and drive motor speeds as required by the process, and also provides for monitoring and adjusting fluid levels, alkalinity/acidity concentrations, and temperatures of the wash and neutralizing solutions.

Abstract: Apparatus for cleaning a toilet brush includes a splash proof housing, which surrounds the toilet brush and has a bottom provided with an outlet for spent water, and a supply line leading to the housing. To permit simple, reliable and effective cleaning of the toilet brush, nozzles are provided in the housing, which are directed toward the toilet brush.

Abstract: A method for the decontamination of a soil, sediment, or sludge containing toxic halogenated organic compound and containing water comprising the steps of mixing said soil, sediment, or sludge with a reagent capable of reacting with said halogenated compound and heating said mixture of soil, sediment, or sludge, and reagent in a reaction zone to an elevated temperature thereby forming a reaction zone vapor stream containing at least a portion of the water contained in said soil, sediment, or sludge and unreacted halogenated organic compound; condensing a portion of said reaction zone vapor stream under conditions suitable for the formation of a condensate stream containing substantially all of the halogenated organic compound in said reaction zone vapor stream, and a vapor stream containing water and trace amounts of said halogenated organic compound; recycling said condensate to said reaction zone; treating said vapor stream to remove trace halogenated organic compound and venting the so-treated stream to th

Abstract: A multi-function warewashing machine which automatically functions in a plurality of operating modes, including a conventional dishwashing mode and specialized washing modes for flatware and pots and pans, the operating mode being indicated by ware racks each of which bears an indicator in the form of an anomaly or signalling device which uniquely predetermines the optimum spray patterns and timing cycles for a particular type of ware contained in the rack, the warewashing machine including a sensor for detecting the indicator and a control circuit which responds to the sensor to actuate various controllable devices in combination to produce specific spray patterns and wash and rinse cycle times which are best suited for cleansing a particular ware.

Abstract: A hydraulic circuit and a wheeled self-propelled moveable frame provides a one-way feed of water under pressure selectively bearing a liquid soap or a liquid rinse chemical via a wind up hose mounted on a spool via a drive motor to axle to belt to clutch to shaft on the moveable frame through a multi-way directional valve to a water powered drive motor for driving the moveable frame forward and reverse relative to an open end of a vehicle body and said spool. A water cylinder changes the angle of inclination of a floor nozzle tube rotatable about its axis horizontally at the front of the moveable frame and bears a series of longitudinally spaced nozzles, when the machine travel reverses towards the open end of the vehicle body. The multi-way directional valve changes the water flow direction upon impact of a sensor operatively coupled thereto and projecting forwardly of the front of the wheeled self-propelled moveable frame.

Abstract: Disclosed is a limited use dishwasher which comprises a housing. Within the housing are a plurality of compartments for receiving dishes to be washed. Each compartment has a movable platform. Each platform is mechanically joined to a separate motor through the means of a lever arm. Conduits are provided to channel water and soap to each compartment and radiant drying is also provided in connection with each compartment. By inserting a dish within the compartment and pressing down on the platform, a switch is closed. Upon the closing of the entrance door to the dishwasher, a second switch is closed, which thereby couples the motor to a source of electrical energy. The motor causes the lever arm to move the platform upward during the washing cycle. Each motor is a rocker arm motor having an elliptical gear which engages the lever arm. On the gear are a series of bosses which contact and close switches at various points during the washing cycle.

Abstract: Apparatus for treating open-mouthed cylindrical containers with a fluid adapted to coat, clean or react chemically with the surface of the containers, comprises a turret fitted with pot assemblies spaced around its periphery, each pot assembly having an internal cavity for reception of a container and a lid for closing the cavity, conduit means for passing fluid through the cavity of each pot assembly, a first pump operable to circulate the fluid in a liquid phase from a reservoir through the conduit means and each cavity so that the liquid flows along the surfaces of a container in the cavity and effects treatment of the surfaces, a second pump operable to circulate the fluid in a gaseous phase from a source thereof through the conduit means and each cavity so as to purge liquid from the cavity, a third pump operable to extract fluid in the gaseous phase from each cavity through the conduit means and thereby reduce the pressure therein so as to effect drying of the container and cavity by vaporization of any

Abstract: Apparatus for cleaning open-mouthed cylindrical containers has a plurality of pot assemblies mounted on a turntable rotatable to move each pot assembly past an unloading station for discharge of containers from the pot assemblies and a loading station for insertion of containers into the pot assemblies. Each pot assembly comprises a body co-operating with a lid to define a cavity for reception of a container, the cavity having a shape corresponding approximately to that of the container and having a size such that the container subdivides the cavity into two chambers in which the walls of the cavity are spaced close to the inside and outside surfaces of the container. Cam rollers on each pot assembly co-operate with cam tracks, upon rotation of the turntable, to open the lid immediately prior to passage past the unloading station and to close the lid immediately after passage past the loading station.

Abstract: A container washing system comprises a container washing zone, a rinsing zone and a deionized rinsing zone through which containers are conveyed. At each of the zones, spray nozzles direct washing and rinsing liquids at the containers. In order to prevent the etching of stationary containers when the conveyor is interrupted, the spray nozzles in the washing and deionized rinsing zones are deactivated. In order to prevent the oxidation or rusting of the stationary containers in the absence of the washing and deionized rinsing liquids, the containers are maintained in the moist condition by fogging nozzles located within the washing and deionized rinsing zones.

Abstract: Apparatus for treating cup-shaped workpieces in which the workpieces are positioned within a shape-conforming chamber formed with an outlet port in the base thereof and a conforming nozzle is positioned within the interior of the workpiece in close clearance-spaced relationship. The nozzle is provided with an axial port for discharging a high-pressure treating fluid against the central portion of the interior bottom surface of the workpiece, causing a high-speed radial outward flow therealong and thence axially outwardly along the interior wall surfaces of the workpiece. Upon reaching the open end of the workpiece, the direction of flow is reversed and is directed axially along the exterior wall surface of the workpiece, and upon passing the bottom edge thereof, the fluid is deflected in impinging relationship against the outer bottom surface, whereafter it is discharged through the outlet port and is recovered for reuse.

Abstract: Apparatus for cleaning open-mouthed cylindrical containers has a plurality of pot assemblies mounted on a turntable rotatable to move each pot assembly past an unloading station for discharge of containers from the pot assemblies and a loading station for insertion of containers into the pot assemblies. Each pot assembly comprises a body co-operating with a lid to define a cavity for reception of a container, the cavity having a shape corresponding approximately to that of the container and having a size such that the container subdivides the cavity into two chambers in which the walls of the cavity are spaced close to the inside and outside surfaces of the container. Cam rollers on each pot assembly co-operate with cam tracks, upon rotation of the turntable, to open the lid immediately prior to passage past the unloading station and to close the lid immediately after passage past the loading station.