Abstract: A drawer sliding mechanism for storing materials is disclosed. The drawer sliding mechanism comprises a cabinet. The cabinet comprising a table top and side walls. The drawer sliding mechanism further comprises rails coupled to the cabinet. The rails comprise at least one bracket. The bracket is tilted about an angle. The drawer sliding mechanism further comprises a drawer coupled to rails. The drawer is slid horizontally along the rails and the drawer is raised vertically by tilting the at least one bracket. The drawer is placed on the table top by sliding the drawer when the at least one bracket is raised.

Abstract: Disclosed is a substrate processing apparatus capable of drying a substrate to be processed while suppressing the pattern collapse or the occurrence of contamination. A substrate is held in a liquid bath while being immersed in a liquid, and the liquid bath is disposed in a processing space of a processing vessel. A processing of drying the substrate is performed by replacing the liquid in the liquid bath with a supercritical-state fluid. A predetermined mechanism moves liquid bath between a processing location in the processing case and a stand-by location outside the processing case. A heater installed in the processing case changes the fluid to a supercritical state or maintains the supercritical state while cooling mechanisms cool down the liquid bath moved to the stand-by location outside the processing vessel.

Abstract: An automatic wax removing device includes a base, a heating plate, a cooling plate, a first actuator, a second actuator, and an operation plate. The base includes a base plate and a framework. The heating plate is arranged on the base plate. The cooling plate is arranged on the base plate and separated from the heating plate. The first actuator includes a sliding rail and a elongated sliding member on the sliding rail. The sliding rail is fixed on the frame and parallel with the heating plate. The second actuator includes a main body and a rotation shaft arranged on the main body. The main body is slideable along the length of the sliding member. One end of the rotation shaft is connected to the main body. The operation plate is fixed to the other end of the rotation shaft.

Abstract: A disclosed film deposition apparatus includes a susceptor provided rotatably in a chamber; a substrate receiving portion provided in one surface of the susceptor, for receiving a substrate; a reaction gas supplying member configured to supply a reaction gas to the one surface of the susceptor; a cleaning member including: a first concave member that is provided above the susceptor and open toward the one surface, thereby defining a space of an inverted concave shape, a second concave member provided over the first concave member to define a gas passage between the first concave member and the second concave member, a cleaning gas supplying portion configured to supply a cleaning gas to the space, and an evacuation pipe configured to be in gaseous communication with the gas passage and extend out from the chamber; and an evacuation opening provided in the chamber in order to evacuate the chamber.

Abstract: A device for filtering a processing liquid in a processing tank includes an opening for recovering a surface-layer processing liquid on a work-discharging side of the tank, a separating part for recovering an intermediate-layer processing liquid on a work-receiving side of the tank, a hopper for recovering a bottom-layer processing liquid on a bottom surface on the work-receiving side, a first processing liquid discharge nozzle on a bottom surface of the tank and which is oriented in an opposite direction to a work-conveying direction and toward the bottom surface, second processing liquid discharge nozzles on both side surfaces of the processing tank and which are oriented in an opposite direction to the work-conveying direction and toward a work, cyclone devices which filter the processing liquids recovered by the opening, the separating part, and the hopper, and which individually separate foreign material, a separating tank, and a screw conveyor.

Abstract: A liquid processing apparatus includes a substrate holding member configured to rotate along with a substrate held thereon in a horizontal state; an annular rotary cup configured to surround the substrate held on the substrate holding member and to rotate along with the substrate; a rotation mechanism configured to integrally rotate the rotary cup and the substrate holding member; and a liquid supply mechanism configured to supply a process liquid onto the substrate. The apparatus further includes an annular drain cup configured to receive the process liquid discharged from the rotary cup, and provided with a drain port; and a circular flow generation element configured to generate a circular flow within the drain cup when the rotary cup and the substrate holding member are rotated, such that the circular flow serves to lead the process liquid within the drain cup to the drain port.

Abstract: In accordance with one embodiment of the present disclosure, an assembly is provided comprising a multi-component electrode and a peripherally engaging electrode carrier. The peripherally engaging electrode carrier comprises a carrier frame and a plurality of reciprocating electrode supports. The multi-component electrode is positioned in the electrode accommodating aperture of the carrier frame. The backing plate of the electrode comprises a plurality of mounting recesses formed about its periphery. The reciprocating electrode supports can be reciprocated into and out of the mounting recesses. Additional embodiments of broader and narrower scope are contemplated.

Abstract: A reusable container for the sterile transfer of pharmaceutical recipients, in particular of syringe bodies. The container comprises an outer case and a sterilizable interior, wherein the interior is microbially isolated from the environment of the container. The interior has at least one holder for accommodating at least one nest for storing a plurality of pharmaceutical recipients. The nest can be removably accommodated in the holder. The container further has at least one container door for removing or introducing the nest into the interior and at least one lock for coupling the container to a sterile space. The lock is configured in such a way that, after coupling to the sterile space, it is possible to open the container door without substantially suspending sterility.

Abstract: A drawer guide is provided for a dishwasher or other device through which there is a flow of liquid or gas. The drawer guide has guide rails and at least one rolling member assembly to guide the guide rails in a displaceable manner on another guide rail. A cage is provided for the rolling members. At least one of the guide rails has a rear rail portion with fluid passage openings that allow liquid or gas to flow through the guide rail when the device is in operation. At least one cage for the rolling members of the drawer guide can include a rear cage portion that is provided with fluid passage openings that allow liquid or gas to flow therethrough when the device is in operation.

Abstract: A dishwasher basket for use with baby bottle nipples includes a specially designed rack that maintains baby bottle nipples in an upright position during the washing and drying. The base of the nipple is also prevented from resting upon the surface of the rack. Feeding straw and valve holders are also provided that can be attached to the dishwasher basket. The dishwasher basket is able to be opened using only one hand.

Abstract: A process and system reprocesses soiled animal bedding material commingled with animal manure. The material is to remove a preponderance of the manure. The remaining soiled bedding is washed in water and a cleaning agent, rinsed and, optionally, bleached to restore color and appearance. The resulting material is dewatered and dried to reduce its moisture content and kill any remaining pathogens. After being cleaned and sanitized, the material may be reused as bedding or further processed into pellets or other products, such as manufactured fire logs.

Abstract: Apparatus to clean silicon electrode assembly surfaces which controls or eliminates possible chemical attack of electrode assembly bonding materials, and eliminates direct handling contact with the parts to be cleaned during acid treatment, spray rinse, blow dry, bake and bagging. Aspects of the apparatus include a kit including an electrode carrier to hold an electrode assembly, a treatment stand to allow access to the electrode assembly, a spider plate to clamp the electrode assembly in the electrode carrier, a nitrogen purge plate to supply nitrogen gas to the backside of the electrode assembly during acid cleaning of the electrode, a water rinse plate to supply water to the electrode face, a blow dry plate to supply nitrogen to dry the electrode assembly and a bake stand to support the electrode assembly during a bake before placing the clean electrode assembly in a bag.

Abstract: An exposure apparatus for executing an exposure of a substrate to light via a mask. The apparatus includes a booth which stores the mask in an atmospheric pressure, a processing chamber in which the exposure is executed in a first vacuum pressure, a vacuum chamber, arranged between the booth and the processing chamber, stores the mask at a second vacuum pressure that is higher than the first vacuum pressure and is between 0.1 Pa and 100 Pa, a first load lock chamber, arranged between the booth and the vacuum chamber, through which the mask is transferred, in which the atmospheric pressure and the second vacuum pressure are replaceable, and a second load lock chamber arranged between the vacuum chamber and the processing chamber, through which the mask is transferred, in which the second vacuum pressure and the first vacuum pressure are replaceable.

Abstract: A cleaning system used for cleaning small parts, and more specifically for degreasing small parts, is provided that comprises a top work station, a bottom work station, and a grid tray having a grid portion. The top and bottom work stations can be assembled into a container and may employ one or more clips to secure the assembly. A method of cleaning items using the cleaning system is also provided. Further provided is a kit comprising the cleaning system, one or more brushes, and one or more pairs of gloves.

Abstract: An washing machine for washing trays. The machine includes a housing, a frame, a water system, and an air system. The frame is rigidly mounted in the housing and holds the trays to be washed at a tilted angle so that fluids completely drain there from and accordingly facilitate the washing and drying processes. The water system is contained in the housing and supplies water to wash the trays. The air system is contained in the housing and supplies air to dry the trays.

Abstract: A device for stacking cutlery pieces is provided by means of which cutlery pieces may be easily accessible and can be housed in a space-saving and tidy manner in the rinsing chamber of a dishwashing machine. The device provides reliable isolation and easy loading and unloading of cutlery pieces. A pivoting stacking device is arranged on an external side of the washing-up basket and includes a holder, in which at least one separate cutlery receptacle may be introduced, whereby the cutlery receptacle is characterised by particular aids for individual stacking of the cutlery pieces.

Abstract: A workpiece surface treatment system (1), which obtains a surface-treated workpiece by sequentially carrying a treatment cell (9) containing a workpiece to a series of apparatuses for operations in the respective apparatuses, is characterized by including: a carrying apparatus (2) for sequentially carrying the treatment cell (9) to a series of the apparatuses in the system; a carrying-in/out apparatus (3) for carrying the treatment cell in and out of the carrying apparatus; a surface treatment apparatus (4) for performing a surface treatment on the workpiece by receiving the treatment cell from the carrying apparatus and supplying a surface treatment liquid to the inside of the treatment cell while rotating the treatment cell; and a workpiece collection apparatus (5) for collecting the workpiece by receiving the treatment cell from the carrying apparatus, inverting the treatment cell, and squirting the inside of the treatment cell with water from below to flow out the workpiece, wherein the carrying apparatus

Abstract: A dishwasher rack basket assembly that includes a water impervious basket of open mesh construction, the basket is selectively positionable between a first size and a second size, the first size securing small items while permitting flow of liquid therethrough, the second size smaller than the first size and not securing small items while permitting flow of liquid therethrough, and a projection positioned on the basket, wherein the projection is engageable to transform the basket from the first size to the second size.

Abstract: Cleaning equipment for cleaning a moving surface particularly in a paper machine includes a washing head with a chamber in it opening onto the surface to be cleaned and nozzle elements arranged inside the chamber. The cleaning equipment also includes vacuum means and removal means. The vacuum means are arranged in the washing head. In addition, the washing head is arranged to be movable relative to the removal means that are fitted in a fixed manner.

Abstract: A substrate treating apparatus for treating substrates includes a treating tank for receiving and treating the substrates, a holding device movable, while holding the substrates in a cantilever mode, between a treating position in the treating tank and a transfer position above the treating tank, a transport device for supporting the substrates and transferring the substrates to and from the holding device in the transfer position, a detecting device for detecting a posture variation of the holding device, and a correcting device for correcting a position of the holding device or the transport device. The correcting device performs a correction according to the posture variation of the holding device detected by the detecting device in time of transfer of the substrates between the holding device and the transport device.

Abstract: An ultrasonic cleaner apparatus is disclosed which includes a support housing, a tub supported by the housing and an ultrasound and sensor transducer contacting the bottom of the cleaning tank. A fixture assembly for holding items to be cleaned is configured for insertion into the cleaning tank. The fixture assembly comprises a predetermined number of slots, which are positioned around the perimeter of a pair of end disks disposed on the fixture assembly. The slots are configured to receive the distal ends of slats or other items to be cleaned. Rotation of the fixture assembly in the cleaning solution and ultrasonic energy effectively cleans the items while the fixture assembly securely holds the items during cleaning, rinsing and drying.

Abstract: A vacuum processing apparatus which includes a means for transferring substrates from a loader, with a transferring device, to a double lock chamber; and, then to a selected vacuum processing chamber. The substrates are returned to a substrate, by the vacuum loader, into their original position in the substrate table. The surfaces of the substrates are maintained in a horizontal position during processing.

Abstract: An oscillating machine for washing trays. The machine includes a housing, a frame, a water system, and an air system. The frame is oscillatingly mounted in the housing and holds the trays to be washed. The water system is contained in the housing and supplies water to wash the trays. The air system is contained in the housing and supplies air to dry the trays.

Abstract: The dishwashing machine has at least two washing vessels (10–12) that are separated from each other and are part of a structural assembly (3) that is capable of being pulled out as a whole from a casing (1) in which it is housed. Each such washing vessel (10–12) has at least a loading lid or door (17) that can be opened when the structural assembly (3) is in its pulled-out position.

Abstract: The present invention relates to a containment chamber that is used for carrying out multiple processing steps such as depositing on, polishing, etching, modifying, rinsing, cleaning, and drying a surface on the workpiece. In one example of the present invention, the chamber is used to electro chemically mechanically deposit a conductive material on a semiconductor wafer. The same containment chamber can then be used to rinse and clean the same wafer. As a result, the present invention eliminates the need for separate processing stations for depositing the conductive material and cleaning the wafer. Thus, with the present invention, costs and physical space are reduced while providing an efficient apparatus and method for carrying out multiple processes on the wafer surface using a containment chamber.

Abstract: The present invention relates to a loading system in a washing installation comprising a plurality of dishwashers arranged essentially in parallel. The loading system comprises a dish holder to be loaded with goods to be washed, and a traveller which is adapted to convey the dish holder to a selected dishwasher, into which loading is to take place, the traveller being displaceably arranged along the dishwashers arranged in parallel. The invention also relates to a washing installation and a method therefor. The installation comprises a plurality of essentially parallel dishwashers of a straight-way type, which are essentially built into a separating wall portion to form an inlet side and an outlet side. The installation has two mutually independent loading systems for loading of goods to be washed on the inlet side and unloading of washed goods on the outlet side.

Abstract: A radioactive substance decontamination method and apparatus which decontaminates a metal member contaminated by radioactive substance in a short period of time. This apparatus has (1) multiple reducing decontamination tanks having different radiation control values; (2) a carrier for immersing the metal member into the multiple reducing decontamination tanks and a washing tank; (3) a tube for transferring into the second reducing decontamination tank the reducing decontamination agent in the first reducing decontamination tank; (4) a reducing agent decomposer for decomposing a component contained in the reducing decontamination agent of the reducing decontamination tank where the radiation control value is the highest out of the reducing decontamination tanks connected by the tube; and (5) a washing tank for washing the reducing decontamination agent deposited on the decontaminated metal member.

Abstract: A vacuum processing apparatus is composed of a cassette block and a vacuum processing block. The cassette block has a cassette table for mounting a plurality of cassettes containing a sample and an atmospheric transfer means. The vacuum processing block has a plurality of processing chambers for performing vacuum processing to the sample and a vacuum transfer means for transferring the sample. Both of the plan views of the cassette block and the vacuum processing block are nearly rectangular, and the width of the cassette block is designed larger than the width of the vacuum processing block, and the plan view of the vacuum processing apparatus is formed in an L-shape or a T-shape.

Abstract: This invention relates to a vacuum processing apparatus having vacuum processing chambers the insides of which must be dry cleaned, and to a method of operating such an apparatus. When the vacuum processing chambers are dry-cleaned, dummy substrates are transferred into the vacuum processing chamber by substrates conveyor means from dummy substrate storage means which is disposed in the air atmosphere together with storage means for storing substrates to be processed, and the inside of the vacuum processing chamber is dry-cleaned by generating a plasma. The dummy substrate is returned to the dummy substrate storage means after dry cleaning is completed. Accordingly, any specific mechanism for only the cleaning purpose is not necessary and the construction of the apparatus can be made simple.

Abstract: A household dishwashing machine of the type having a wash chamber in the form of a drawer, with the drawing being moveable between a lowered to a raised position for facile loading and unloading of the dishes.

Abstract: Based on an insert (1) having insert compartments (4, 5, 6) separated from one another by separating walls (7, 8), according to the invention at least two insert compartments (4, 5; 5, 6) are provided with compartment floors (4′, 5′; 5′, 6′), arranged in different heights, for loading different silverware pieces (2, 3) and/or small dishes. Overall, the insert (1) embodied according to the invention leads to essentially improved drying results compared to conventional solutions for the silverware pieces (2, 3) and/or small dishes loaded into the insert. The silverware pieces (2, 3) and/or the small dishes may, depending on their respective length/size/shape, be loaded into the insert compartment (4, 5, 6) having the corresponding compartment floor (4′, 5′, 6′), positioned in a suitable height, so that they stand on the compartment floor and are no longer required to be hung.

Abstract: Insert for a dish basket of an automatic dish washer Based on an insert having openings (9) for the penetration of dish washing liquid (10), limited by ridges (1, 2, 3, 4) in-plane crossing at crossing points (5, 6, 7, 8), ridges (1, 2, 3, 4) are embodied according to the invention at the crossing points (5, 6, 7, 8) in such a sloped manner, that they are provided with a rhomb shaped cross-section. Due to the rhomb shaped profile of the ridges (1, 2, 3, 4) embodied in a sloped manner a type of double pyramid (12) is formed, by which the dish washing liquid (10) can autonomously run off downwards over the sloped planes provided on all sides of the rhombus, particularly in the critical locations. Thus, the residue of the dish washing liquid (10) on horizontal planes and numerous contact points is avoided, particularly at the crossing points (5, 6, 7, 8.

Abstract: An apparatus for depositing an array of spots on a receiving surface includes a fluid source, a deposit device that includes a drop-carrying surface, and a cleaning device. The deposit device and a fluid source are cooperatively arranged to deposit a spot(usually created by a drop) on a receiving surface. The cleaning device is constructed and arranged to clean the drop-carrying surface by employing a flow of cleaning fluid or another cleaning matter such as small particles the flow being arranged to prevent contaminating back flow.

Abstract: A wafer conveyor system for use in a vacuum processing apparatus wherein the conveyor structure is provided with a transfer structure, and a robot apparatus is arranged on the transfer structure. The robot provides for rotation of the wafer in a horizontally from a position in a cassette to an opposite position of the cassette.

Abstract: There are provided a band-shaped tray 12 having grasping grooves 12a for grasping opposite side ends of wafers 1, and a cleaning tank 20 to which the wafers 1 inserted in the tray 12 are conveyed by a conveyor robot 2 to be cleaned. The cleaning tank 20 is provided with guides 22 for mounting the tray 12 in the tank, a bottom portion 26 formed substantially in V-shape conforming to the bottom-face shape of the wafer 1, and flow ports 24 via which cleaning fluid is supplied into the tank. An outer side face of the cleaning tank 20 is provided with an overflow tank 30 for containing the cleaning fluid overflowing from the cleaning tank 20, and the overflow tank 30 is provided with a circulation line 32 for circulating the cleaning fluid again into the cleaning tank 20.

Abstract: A cleaning apparatus and a cleaning method for cleaning a object are provided. In the cleaning apparatus, a drying chamber 42 and a cleaning bath 41 are separated from each other up and down, respectively. Thus, a space in the drying chamber 42 can be insulated from a space of the cleaning bath 41 through rotary doors 59a and a slide door 72. In the cleaning method, a cleaning process in the cleaning bath 41 is carried out while sealing it by the rotary doors 59a. On the other hand, a drying process in the drying chamber 42 is accomplished while sealing and closing it by the slide door 72. Consequently, there is no possibility that, during the drying process, the object is subjected to a bad influence from a chemical treatment.

Abstract: In a substrate treating unit, a removal liquid supplying mechanism supplies a removal liquid to the surface of a substrate. In order to retain the removal liquid on the surface of the substrate for a fixed time, a spin chuck is operated to spin the substrate at such a low speed as to retain the removal liquid on the substrate, or spins the substrate intermittently, or temporarily stops spinning of the substrate. Thus, treatment with the removal liquid progresses without a further supply of the removal liquid, thereby restraining consumption of the removal liquid.

Abstract: A processing apparatus essentially includes a rotatable rotor 21 for carrying semiconductor wafers W, a motor 22 for driving to rotate the rotor 21, a plurality of processing chambers for surrounding the wafers W carried by the rotor 21, for example, an inner chamber 23 and an outer chamber 24, a chemical supplying unit 50, an IPA supplyig unit 60, a rinse supplying unit 70 and a drying fluid supplying unit 80. With this constitution of the apparatus, it is possible to prevent the wafers from being contaminated due to the reaction of treatment liquids of different kinds, with the improvement of processing efficiency and miniaturization of the apparatus.

Abstract: An apparatus for supercritical processing of multiple workpieces comprises a transfer module, first and second supercritical processing modules, and a robot. The transfer module includes an entrance. The first and second supercritical processing modules are coupled to the transfer module. The robot is preferably located with the transfer module. In operation, the robot transfers a first workpiece from the entrance of the transfer module to the first supercritical processing module. The robot then transfers a second workpiece from the entrance to the second supercritical processing module. After the workpieces have been processed, the robot returns the first and second workpieces to the entrance of the transfer module. Alternatively, the apparatus includes additional supercritical processing modules coupled to the transfer module.

Abstract: An apparatus for supercritical processing of multiple workpieces comprises a transfer module, first and second supercritical processing modules, and a robot. The transfer module includes an entrance. The first and second supercritical processing modules are coupled to the transfer module. The robot is preferably located with the transfer module. In operation, the robot transfers a first workpiece from the entrance of the transfer module to the first supercritical processing module. The robot then transfers a second workpiece from the entrance to the second supercritical processing module. After the workpieces have been processed, the robot returns the first and second workpieces to the entrance of the transfer module. Alternatively, the apparatus includes additional supercritical processing modules coupled to the transfer module.

Abstract: A drawer dishwasher includes a drawer which is movable from a closed to an open position. A lid is separate from the drawer and is adapted to seal over the top of the drawer when the drawer is in its closed position and to move upwardly and away from the drawer in response to movement of the drawer from its closed to its open position. Recirculation plumbing and draining plumbing are connected to the drawer dishwasher and lead to a remote pump and reservoir for receiving drained fluid from the drawer and for recirculating drained fluid back into the spray assembly within the drawer.

Abstract: A rinsing tray system for pipette tips or transfer needles, arranged in the form of a matrix and having a bottom tray and a top tray, protrusions which have through-apertures arranged perpendicular to the base of the top tray and at the same grid spacing from one another as the pipette tips or transfer needles, projecting into the interior of the top tray, wherein the bottom tray having at least one inlet in order to be continuously filled with rinsing liquid and at least one outlet being present on the top tray.

Abstract: The present invention includes a method and system for cleaning, disinfecting, or sterilizing objects, such as medical or dental instruments or devices. The system of the invention includes an energy source, such as a sonicator, adapted and configured to impact the object with energy, such as ultrasonic energy; a liquid transporter adapted and configured to circulate around, through, and/or into the object a wash composition, an antimicrobial composition, a rinse composition, or a plurality of these compositions; and a dryer adapted and configured to dry the object, preferably, in the presence of a sterilant. The method of the invention includes contacting the object with a wash composition and energy, such as ultrasonic energy; treating the object with an antimicrobial composition; rinsing the object with a rinse composition; and drying the object, preferably in the presence of a sterilant.

Abstract: A vacuum processing system, including a vacuum processing chamber for processing wafers, provides a controller for controlling a wafer processing mode and a cleaning mode for the processing chamber. The vacuum processing system further provides for a wafer moving mechanism which is controlled by the controller and allows for the transferring of a dummy wafer into the processing chamber when the cleaning mode is started and then returning the dummy wafer when the cleaning mode is finished.

Abstract: For depositing fluid dots in an array, e.g., for microscopic analysis, a deposit device, e.g. a pin, cooperating with a fluid source defines a precisely sized drop of fluid of small diameter on a drop carrying surface. Transport mechanism positions the device precisely over the receiving surface and drive mechanism moves the deposit device toward and away from the surface. By repeated action, minute drops of fluid can be deposited precisely in a dense array, preferably under computer control. A mobile-fluid storage device resupplies the deposit device along the array, e.g. in the immediate vicinity of the deposit locations. Mobile annular storage rings are lowered and raised to obtain a supply of fluid, or a mobile multiwell plate is used. Cleaning mechanism is shown, in particular a jet arrangement that directs a jet from a pin or tool axis portal to deeper into the confinement chamber, to scrub along a pin or pin-like structure while inducing an air flow from the working zone to prevent back contamination.

Abstract: In order to reuse dishes, cutlery, glassware and other food service utensils onboard an aircraft, a washing apparatus is provided as a part of the food service system onboard the aircraft. The apparatus includes a service trolley and a washing unit that may be coupled together to form a washing chamber within the trolley. The washing unit is installed within a trolley parking bay in a galley of the aircraft and is connected to a water supply and a power supply. The trolley is equipped with racks for receiving the dirty utensils, and the washing unit is equipped with water spray arms that reach into the trolley into clearance spaces between the racks. The dirty utensils are collected from passengers directly into the service trolley, which is then wheeled into position in the trolley parking bay, and coupled to the washing unit. Thereby, the utensils may be collected, cleaned, stored, and reused, with only minimal handling, cost, and space requirements.

Abstract: The present invention provides a combination sink and dishwashing apparatus having a sink sharing a common side wall with a cabinet which defines a closed space. The cabinet has a wire basket for holding and washing a plurality of dishes within the cabinet. The common side wall is a part of the cabinet that defines the closed space and is positioned to form one side of the sink. The common side wall can be opened to allow the wire basket to slide from within the cabinet and into the sink, for loading and unloading the dishes. Within the cabinet, the invention contains a pump powered by a motor, the pump spraying water through a rotatably mounted spray arm onto the dishes to wash them, as with traditional dishwashing machines. The invention preferably includes a garbage disposal which is also powered by the motor. In an alternative embodiment, this invention can include two cabinets as described above, each located on opposing sides of the sink.

Abstract: An apparatus for use in removing oil containing contaminants from articles includes a wash station and a rinse station. At the wash station, the articles are immersed in a tank of wash water containing detergent to remove oil containing contaminants from the articles. A flow of wash water containing the detergent and oil is conducted through an oil retainer. The oil is removed from the wash water and retained by the oil retainer. A flow of wash water which contains detergent and is substantially free of oil, is conducted from the oil retainer apparatus back to the wash tank. After having been removed from the wash tank, the articles are immersed in deionized rinse water in a rinse tank to remove detergent and any remaining oil containing contaminants from the articles.

Abstract: An improved blind washing device comprising a frame supporting a plurality of open-ended tubes, closure mechanism for selectably closing said tubes, mechanism for elevating one end of said tubes, a hose connection for delivering water into said tubes, a spray arm, an extensible hose connected to deliver water to said spray arm, an outlet drain and filter mechanism connected between said tubes and said outlet drain.

Abstract: An aerosol cleaning apparatus and a method of treating a substrate within such an apparatus prevent contaminant recirculation by controlling the post-impingement exhaust flow through control of the aerodynamic behavior of the contaminant laden exhaust stream. By the present invention, the post-impingement exhaust flow is divided into two streams. A first stream is the main stream flowing initially over the contaminated side of the wafer and carrying most of the suspended contaminants into the exhaust. The second stream flows initially over the cleaned side of the wafer and eventually into the exhaust stream. A flow separator is provided for dividing the post-impingement aerosol spray into plural flow streams.