Abstract: The present invention generally relates to a method for producing silicone hydrogel contact lenses having less optical defects or free of optical defects by subjecting the extraction tray for the formed silicone hydrogel contact lenses to a reciprocating lowering and raising motion thereof to obtain the silicone hydrogel contact lenses.

Abstract: The subject invention provides an apparatus for cooling and/or freezing samples. In an exemplary embodiment, the apparatus is a stackable chilling plate used in a comet assay. In specific embodiments, the chilling plate can accommodate glass slides deposited with an agarose gel suspension, wherein the gel is cured by a refrigerant disposed underneath a thermally-conductive top plate. Advantageously, the cooling/freezing apparatus provided herein can easily accommodate the placement of multiple cellular sample slides in a compact configuration.

Abstract: A method for processing a substrate includes arranging the substrate on which a photoresist layer is formed and providing a treatment liquid for removing the photoresist layer on the substrate. The method also includes providing a mist including deionized water or hydrogen peroxide on the substrate to make contact with the treatment liquid so as to increase a temperature of the treatment liquid. Therefore, efficiency of removing the photoresist layer may be improved.

Abstract: A method and an arrangement are disclosed for providing an implant for implantation in a body lumen, that include at least one processing unit (1) for processing the implant (7; 103), a sheathing (2) with a front opening (3) and a rear opening (4), which is at least partially disposed at or in the processing unit (1), and at least one power unit (5). The implant (7; 103) can be stored inside the sheathing (2) between the openings (3, 4). The power unit (5) serves for generation of a current (P) of a defined medium through the sheathing (2), which is connected at least to one opening (3; 4) of the sheathing (2), whereby the current (P) flows inside the sheathing (2) with the stent (7; 103).

Abstract: A protective chuck is disposed on a substrate with a gas layer between the bottom surface of the protective chuck and the substrate surface. The gas layer protects a surface region against a fluid layer covering the substrate surface. In some embodiments, the pressure fluctuation at the gas layers is monitored, and through the dynamic feedback, the gas flow rate can be adjusted to achieve a desired operation regime. The dynamic control of operation regime setting can also be applied to high productivity combinatorial systems having an array of protective chucks.

Abstract: A protective chuck is magnetically levitated on a substrate with a gas layer between the bottom surface of the protective chuck and the substrate surface. The gas layer protects a surface region of the substrate against a fluid layer covering the remaining of the substrate surface without contacting the substrate, reducing or eliminating potential damage to the substrate surface. The magnetically levitated protective chuck can enable combinatorial processing of a substrate, providing multiple isolated processing regions on a single substrate with different material and processing conditions.

Abstract: A liquid processing apparatus includes a substrate holding member configured to rotate along with a substrate held thereon in a horizontal state; an annular rotary cup configured to surround the substrate held on the substrate holding member and to rotate along with the substrate; a rotation mechanism configured to integrally rotate the rotary cup and the substrate holding member; and a liquid supply mechanism configured to supply a process liquid onto the substrate. The apparatus further includes an annular drain cup configured to receive the process liquid discharged from the rotary cup, and provided with a drain port; and a circular flow generation element configured to generate a circular flow within the drain cup when the rotary cup and the substrate holding member are rotated, such that the circular flow serves to lead the process liquid within the drain cup to the drain port.

Abstract: A multi-chamber heat treatment device (S1) includes a plurality of treatment chambers having a heat treatment chamber, the device including: a cooling chamber (3) serving as the heat treatment chamber configured to cool a treatment target by latent heat of liquid particles; treatment chambers (1, 2) different from the cooling chamber (3); and drying devices (11, 19) configured to dry the cooling chamber (3).

Abstract: Inside a single apparatus main body (100), a surface treatment apparatus includes: a treatment cell (11); a vertical rotation shaft (12); an attachment/detachment device; a receiving tank (15); a cover body (16); a plurality of tanks (21); a plurality of surface treatment liquid supply devices (22); a cleaning water supply device; a drain device (3); and a first cleaning device. Upon operation of the surface treatment liquid supply device while the treatment cell (11) containing small objects is rotated by the vertical rotation shaft (12), a surface treatment is carried out on the small objects, upon operation of the cleaning water supply device, the small objects inside the treatment cell (11) are cleaned, and upon operation of the first cleaning device, the inner face of the cover body and the outer face of the treatment cell are cleaned, thus providing circulation use of surface treatment liquids in the tanks.

Abstract: A cleaning system which includes an enclosure and having a door with a transparent window. The door is opened and closed to load and unload products to be cleaned. An operator puck on the outside of the enclosure couples magnetically to another actuator puck on the inside of the enclosure. This coupling allows an operator to move and direct the inside puck to actuate spray or air blast functions, without opening the enclosure. The outside operator puck includes one or more switches which turn on the various electronic components such as the liquid pump, light, or air blast valve. The cleaning system enables a user to efficiently direct cleaning action to parts inside to minimize the cleaning time, and to prevent exposure of chemicals. The cleaning fluid is cycled out of the enclosure continuously, and into a “trap” box, through a pump and back into the cleaner box in a closed loop cycle.

Abstract: A liquid processing apparatus is provided which can reduce the amount of liquids used and reduce the difference of the process level between objects to-be-processed. The liquid processing apparatus includes a main pipe, a liquid supply device, a main valve, a plurality of branch pipes, and a plurality of processing units. The liquid supply device includes a mixer, a first liquid supply pipe, and a second liquid source supplying a second liquid and supplies a mixed liquid prepared by mixing the first and second liquids in the mixer to one end of the main pipe. The main valve is configured to close the other end of the main pipe opposite to the liquid supply device when the object to-be-processed is processed in the processing unit.

Abstract: A mobile mattress sanitizing and cleaning system. A cleaning chamber and drying chamber may be located within the body of truck which may also carry a water supply and steam generator. The cleaning and drying chambers are dimensioned and configured to receive a mattress therein, and may be separate or combined. The mattress is steam cleaned in the cleaning chamber and air dried in the drying chamber. The cleaning and drying chambers may face the rear of the truck to facilitate loading and may be oriented such that mattresses stand on edge when being cleaned and dried. The system may include a water purifier. Drying may be conducted by blowers mounted to the drying chamber. Drying air may be heated.

Abstract: Methods and apparatus for cleaning electrostatic chucks in processing chambers are provided. The process comprises flowing a backside gas comprising a reactive agent into a zone in a process chamber, the zone defined by a space between a surface of an electrostatic chuck or of a cleaning station and a surface of a substrate. The surface of the electrostatic chuck is etched with the reactive agent to remove debris. An apparatus for cleaning an electrostatic chuck is also provided, the apparatus comprising: a process chamber; an elongate arm having a reach disposed through a wall of the process chamber; an electrostatic chuck attached to the elongate arm; a cleaning station located within the reach of the elongate arm; and a reactive gas source that is operatively connected to the cleaning station.

Abstract: A combination parts washer for cleaning mechanical parts of oil, grease and contaminants. The washer has a cabinet which has two reservoirs. A parts receptacle in the one of the reservoirs receives the parts which are cleaned by ultrasonic waves. An operable sink for manual cleaning is positioned on the top of the cabinet and opens to access the cabinet and reservoir. Fluid from the sink drains to the first reservoir. In the closed position, the sink covers the top of the cabinet and may be used as a sink washer using the attached brush supplied by fluid from the first reservoir. Initial pre-cleaning may be performed in the sink using the brush. Subsequent precision cleaning may be accomplished by immersion and ultrasonic cleaning in the second reservoir.

Abstract: A combination parts washer for cleaning mechanical parts of oil, grease and contaminants. The washer has a cabinet which has two reservoirs. A parts receptacle in the one of the reservoirs receives the parts which are cleaned by ultrasonic waves. An operable sink for manual cleaning is positioned on the top of the cabinet and opens to access the cabinet and reservoir. Fluid from the sink drains to the first reservoir. In the closed position, the sink covers the top of the cabinet and may be used as a sink washer using the attached brush supplied by fluid from the first reservoir. Initial pre-cleaning may be performed in the sink using the brush. Subsequent precision cleaning may be accomplished by immersion and ultrasonic cleaning in the second reservoir.

Abstract: A dishwasher in the form of a programmable machine, in particular a commercial dishwasher, having a pre-cleaning station, which is disposed outside a treatment chamber of the dishwasher, and having a waste water transfer system, by which washing liquid can be fed from a wash tank of the dishwasher as pre-cleaning liquid to the pre-cleaning station.

Abstract: A liquid processing apparatus is provided which can reduce the amount of liquids used and reduce the difference of the process level between objects to-be-processed. The liquid processing apparatus includes a main pipe, a liquid supply device, a main valve, a plurality of branch pipes, and a plurality of processing units. The liquid supply device includes a mixer, a first liquid supply pipe, and a second liquid source supplying a second liquid and supplies a mixed liquid prepared by mixing the first and second liquids in the mixer to one end of the main pipe. The main valve is configured to close the other end of the main pipe opposite to the liquid supply device when the object to-be-processed is processed in the processing unit.

Abstract: A biomedical device carrier includes multiple recesses for holding a plurality of polymerized biomedical devices, such as polymerized ophthalmic lenses, during an extraction procedure. A biomedical device extraction assembly includes multiple biomedical device carriers. The structure of the individual carriers and the arrangement of the carriers in the assembly provide sufficient extraction of an extractable component from the biomedical devices during an extraction procedure using relatively small amounts of extraction media per biomedical device. Methods of extracting biomedical devices include providing polymerized biomedical devices in the present carriers and assemblies and contacting the devices with an extraction composition.

Abstract: The invention provides probe washing cups and methods. A probe washing cup has a washing well and a waste cup. A drying section is disposed between an open end of the probe washing cup and an inlet plane of the washing well. The drying section has a channel that is aligned with the washing well. The channel has an opening for receiving the probe therethrough.

Abstract: In order to produce a cleaning device comprising a flood chamber for accommodating a workpiece requiring cleaning and a flooding device for flooding the flood chamber with a liquid cleaning agent which is of simple construction and the flood chamber of which can be rapidly filled and emptied again, it is proposed that the flood chamber be connectable to a cleaning agent reservoir and that the flooding device comprise a blower for reducing the pressure in the flood chamber so that cleaning agent is sucked into the flood chamber from the cleaning agent reservoir due to the reduced pressure in the flood chamber.

Abstract: A biomedical device carrier includes multiple recesses for holding a plurality of polymerized biomedical devices, such as polymerized ophthalmic lenses, during an extraction procedure. A biomedical device extraction assembly includes multiple biomedical device carriers. The structure of the individual carriers and the arrangement of the carriers in the assembly provide sufficient extraction of an extractable component from the biomedical devices during an extraction procedure using relatively small amounts of extraction media per biomedical device. Methods of extracting biomedical devices include providing polymerized biomedical devices in the present carriers and assemblies and contacting the devices with an extraction composition.

Abstract: A method and system for cleaning a batch of substrates is provided. The system includes a first cluster of vertical processing chambers, an IPA reservoir, and an IPA delivery system in fluid communication with the IPA reservoir and the first cluster of vertical processing chambers, wherein the IPA delivery system is adapted to transfer IPA vapor between the IPA reservoir and the first cluster of vertical processing chambers. In certain embodiments, the system further comprises a first main circulation tank, a second main circulation tank, a reservoir-cluster recirculation circuit in fluid communication with the first main circulation tank and the second main circulation tank and with each processing chamber in the first cluster of vertical processing chambers, and a dosing circuit comprising a plurality of additive sources in fluid communication with the first main circulation tank and the second main circulation tank.

Abstract: Semiconductor device fabrication equipment performs a PEOX (physical enhanced oxidation) process, and includes a remote plasma generator for cleaning a process chamber of the equipment. After a PEOX process has been preformed, a purging gas is supplied into the process chamber to purge the process chamber, and the remote plasma generator produces plasma using a first cleaning gas. Accordingly, a reactor of the remote plasma generator is cleaned by the first cleaning gas plasma. Subsequently, the purging gas is supplied to purge the process chamber, and the remote plasma generator produces plasma using a second cleaning gas to remove the first cleaning gas plasma from the remote plasma generator and the process chamber. Finally, full flush operations are performed to remove any gases remaining in the process chamber.

Abstract: Embodiments of the invention generally provide a fluid processing platform. The platform includes a mainframe having a substrate transfer robot, at least one substrate cleaning cell on the mainframe, and at least one processing enclosure. The processing enclosure includes a gas supply positioned in fluid communication with an interior of the processing enclosure, a first fluid processing cell positioned in the enclosure, a first substrate head assembly positioned to support a substrate for processing in the first fluid processing cell, a second fluid processing cell positioned in the enclosure, a second head assembly positioned to support a substrate for processing in the second fluid processing cell, and a substrate shuttle positioned between the first and second fluid processing cells and being configured to transfer substrates between the fluid processing cells and the mainframe robot.

Abstract: A substrate treatment apparatus, comprising a box-shaped treatment tank (11) having an opening part at its upper side and a cover body (21) openably covering the opening part of the treatment tank. The cover body (21) is characterized in that a drying chamber (23) storing and drying a treated substrate (W) is formed therein, the treatment tank (11) is so formed that at least three of treatment fluid feed nozzle tubes (14a) to (14c) and (14a?) to (14c?) are disposed at each of the opposed side wall faces thereof forming the box shape horizontally at specified intervals and these feed nozzle tubes (14a) to (14c) and (14a?) to (14c?) are formed to be connected to a switching mechanism to supply a treatment fluid from the opposed side wall sides while alternately switching them at the opposed side wall faces. Thus, the treatment of various types of chemical liquids, flushing, and drying can be performed in the same treatment tank.

Abstract: A liquid processing system includes a liquid processing section including liquid processing units horizontally disposed therein and each configured to perform a liquid process while supplying a process liquid onto a substrate; a process liquid storing section that stores the process liquid to be supplied to the liquid processing units of the liquid processing section; and a piping unit including a supply pipe configured to guide the process liquid from the process liquid storing section to the liquid processing units. The process liquid storing section, the piping unit, and the liquid processing section are disposed inside a common casing in this order from below. The supply pipe of the piping unit has a horizontal pipe portion horizontally extending along an array direction of the liquid processing units, such that the process liquid is supplied from the horizontal pipe portion to the liquid processing units individually.

Abstract: The dishwashing machine has at least two washing vessels (10–12) that are separated from each other and are part of a structural assembly (3) that is capable of being pulled out as a whole from a casing (1) in which it is housed. Each such washing vessel (10–12) has at least a loading lid or door (17) that can be opened when the structural assembly (3) is in its pulled-out position.

Abstract: An apparatus containing a composition suitable for eliminating a thermosetting resin is disclosed. In the composition, tetra methyl ammonium hydroxide (TMAH) is included so as to eliminate the thermosetting resin. Accordingly, the composition is suitable for removing a dielectric layer, an organic protective layer, an insulating layer, an alignment layer, black matrices and color filters, etc. made form a thermosetting resin in an LCD or a semiconductor, and permits a reproduction or a rework of the thermosetting resin film.

Abstract: A method and biological cleaning system are provided for cleaning substrate surfaces of oils and/or greases using a biological cleaning system which utilizes a pre-treatment bath and/or post-treatment bath as part of the cleaning system. The pre-treatment and/or post-treatment baths are compatible with the biological cleaning bath and during operation of the system, the used pre-treatment and/or post-treatment baths are recycled to the biological cleaning solution for biodegradation. A system is provided in which none of the pre-treatment, post-treatment or biological cleaning baths need expensive waste disposal. Replenishment pre-treatment and/or post-treatment baths as well as biological cleaning baths are added as needed to the biological cleaning system. Other treatment baths may be added directly to the biological cleaning bath with or without pre- or post-treatment for specific purposes such as a detergent phosphating bath used in the biological cleaning tank to provide a cleaned phosphated part.

Abstract: The dining table comprises a table structure having one or more openings adapted to receive in a snug fit either a dining tray or a pair of operatively associated access covers, which in either case fill the opening. An inner one of the access covers is connected to the table structure by a hinge and an outer one of the access covers is suspended by a lever and latching arrangement. In a raised position, the covers abut each other and provide a substantially smooth dining surface. In a lower position, the covers are stored below the dining tray.

Abstract: A system for liquid cleaning a plurality of dirty open-ended cylindrical internal combustion engine paper air filters by subjecting each filter to a cleaning cycle including successive first, intermediate and final cleaning steps. For each step liquid is pumped from a separate tank to spray heads for rinsing a filter at a cleaning station and effluent with entrained contaminants is collected for transfer away from the cleaning station. First step cleaning pumps an unclean liquid previously collected in a first tank as effluent from the intermediate step of a preceding filter cleaning cycle and first step effluent is disposed of away from the system. Intermediate step cleaning pumps a semi-clean liquid previously collected in a second tank as effluent from the final cleaning step of a preceding filter cleaning cycle and intermediate step effluent is collected and transferred as unclean liquid to the first tank for cleaning use during the first stage of the succeeding filter cleaning cycle.

Abstract: The dining table comprises a table structure having one or more openings adapted to receive in a snug fit either a dining tray or a pair of operatively associated access covers, which in either case fill the opening. An inner one of the access covers is connected to the table structure by a hinge and an outer one of the access covers is suspended by a lever and latching arrangement. In a raised position, the covers abut each other and provide a substantially smooth dining surface. In a lower position, the covers are stored below the dining tray.

Abstract: During the treatment, in particular cleaning, disinfecting and drying, of used, dirty endoscopes, in order to render them suitable once again for subsequent use, the following steps take place: placing a used, dirty endoscope in a rack, connecting the passages of the endoscope to a connection block which is arranged in a fixed position in the rack, placing the rack, with the endoscope therein, in at least one device for treating the endoscope, the connection block being connected to a counter-connection block which is present in the treatment device, in order to bring about a connection between the endoscopes and the treatment device, subjecting the endoscope which is accommodated in the rack to a specific treatment in the treatment device, taking the rack with the endoscope therein out of the treatment device, and uncoupling the endoscope from the connection block after it has been taken out of the final treatment device.

Abstract: During the treatment, in particular cleaning, disinfecting and drying, of used, dirty endoscopes, in order to render them suitable once again for subsequent use, the following steps take place: placing a used, dirty endoscope in a rack, connecting the passages of the endoscope to a connection block which is arranged in a fixed position in the rack, placing the rack, with the endoscope therein, in at least one device for treating the endoscope, the connection block being connected to a counter-connection block which is present in the treatment device, in order to bring about a connection between the endoscopes and the treatment device, subjecting the endoscope which is accommodated in the rack to a specific treatment in the treatment device, taking the rack with the endoscope therein out of the treatment device, and uncoupling the endoscope from the connection block after it has been taken out of the final treatment device.

Abstract: A cleaning apparatus and a cleaning method for cleaning a object are provided. In the cleaning apparatus, a drying chamber 42 and a cleaning bath 41 are separated from each other up and down, respectively. Thus, a space in the drying chamber 42 can be insulated from a space of the cleaning bath 41 through rotary doors 59a and a slide door 72. In the cleaning method, a cleaning process in the cleaning bath 41 is carried out while sealing it by the rotary doors 59a. On the other hand, a drying process in the drying chamber 42 is accomplished while sealing and closing it by the slide door 72. Consequently, there is no possibility that, during the drying process, the object is subjected to a bad influence from a chemical treatment.

Abstract: An apparatus for wet cleaning or etching of flat substrates comprising a tank with an inlet opening and outlet opening for said substrates. Said tank contains a cleaning liquid and is installed in a gaseous environment. At least one of the openings is a slice in a sidewall of the tank and is present below the liquid-surface. In the tank there may be a portion above the liquid filled with a gas with a pressure being lower than the pressure within said environment. The method comprises the step of transferring a substrate through the cleaning or etching liquid at a level underneath the surface of said liquid making use of said apparatus.

Abstract: An enclosure 23A that defines a drying chamber 23 is configured of a pair of enclosing elements 23c and 23d and a base element 23b. When wafers enter or leave the drying chamber 23, the enclosing elements 23c and 23d are lifted upward by vertical air cylinders 42 to separate them from the base element 23b. The enclosing elements 23c and 23d are then moved in directions that mutually separate them. To dry wafers within the drying chamber 23, the enclosing elements and the base element 23b are mutually engaged to form a hermetic seal, in the opposite sequence. The present invention reduces the dimensions of the drying chamber without impeding the work of moving wafers into and out of the drying chamber. This makes it possible to reduce the internal volume of the drying chamber, achieving a reduction is the consumption of drying gas, an improvement in the drying efficiency, and a reduction in overall size of the apparatus.

Abstract: A manufacturing method of an alkaline solution, comprising dissolving a gaseous molecule having oxidizing properties or reducing properties in an aqueous alkaline solution.

Abstract: In a method for cleaning for cleaning metallic ion contamination, and especially copper, from wafer containers, the containers are loaded into a cleaning apparatus. The containers are sprayed with a dilute chelating agent solution. The chelating agent solution removes metallic contamination from the containers. The containers are then rinsed with a rinsing liquid, such as deionized water and a surfactant. The containers are then dried, preferably by applying heat and/or hot air movement.

Abstract: In a method for cleaning for cleaning metallic ion contamination, and especially copper, from wafer containers, the containers are loaded into a loader of a cleaning apparatus. The containers are sprayed with a dilute chelating agent solution, while the rotor is spinning. The chelating agent solution removes metallic contamination from the containers. The containers are then sprayed with a rinsing liquid, such as deionized water and a surfactant while the rotor is spinning and heat is applied. The containers are then dried by applying heat, hot air movement and spinning the rotor.

Abstract: A cleaning device for a probe needle of a probe card rarely causing abrasion and deformation of the tip of a probe needle and capable of improving a probe needle life as well as a washing liquid used therefor are obtained. The tip of a probe needle of a probe card is immersed in a washing liquid for a probe needle of a probe card which includes an aqueous solution containing phosphoric acid or an aqueous solution containing chromic acid anhydride and phosphoric acid. While the tip of the probe needle is immersed in the washing liquid, the washing liquid is vibrated by a vibration generating member.

Abstract: A dual dishwasher construction includes an upper drawer dishwasher and a lower dishwasher of conventional construction. The upper drawer has a lid which moves upwardly and downwardly in response to the opening and closing of the drawer. A fluid reservoir is positioned remote from the upper drawer dishwasher and conduits interconnect the fluid reservoir with the drawer dishwasher.

Abstract: In an apparatus for treating semiconductor wafers, a plurality of chemical treatment tanks 21a to 21c filled with treatment liquids for processing semiconductor wafers W and a plurality of rinse treatment tanks 22a to 22c filled with rinse liquids for rinsing the semiconductor wafers W are disposed in a direction across the direction of conveyance of a wafer holder conveyor carriage 5, such as a direction perpendicular thereto. A transportation device provided with a wafer boat 14 is disposed at a position in the vicinity of the chemical treatment tanks 21a to 21c and the rinse treatment tanks 22a to 22c, to transfer the wafers W to and from the wafer holder conveyor carriage 5 and also transport the thus transferred wafers W to the chemical treatment tanks 21a to 21c and the rinse treatment tanks 22a to 22c. This configuration makes it possible to reduce the size of the treatment apparatus and also improve the processing efficiency thereof.

Abstract: For depositing fluid dots in an array, e.g., for microscopic analysis, a deposit device, e.g. a pin, cooperating with a fluid source defines a precisely sized drop of fluid of small diameter on a drop carrying surface. Transport mechanism positions the device precisely over the receiving surface and drive mechanism moves the deposit device toward and away from the surface. By repeated action, minute drops of fluid can be deposited precisely in a dense array, preferably under computer control. A mobile-fluid storage device resupplies the deposit device along the array, e.g. in the immediate vicinity of the deposit locations. Mobile annular storage rings are lowered and raised to obtain a supply of fluid, or a mobile multiwell plate is used. Cleaning mechanism is shown, in particular a jet arrangement that directs a jet from a pin or tool axis portal to deeper into the confinement chamber, to scrub along a pin or pin-like structure while inducing an air flow from the working zone to prevent back contamination.

Abstract: A method and biological cleaning system are provided for cleaning substrate surfaces of oils and/or greases using a biological cleaning system which utilizes a pre-treatment bath and/or post-treatment bath as part of the cleaning system. The pre-treatment and/or post-treatment baths are compatible with the biological cleaning bath and during operation of the system, the used pre-treatment and/or post-treatment baths are recycled to the biological cleaning solution for biodegradation. A system is provided in which none of the pre-treatment, post-treatment or biological cleaning baths need expensive waste disposal. Replenishment pre-treatment and/or post-treatment baths as well as biological cleaning baths are added as needed to the biological cleaning system. Other treatment baths may be added directly to the biological cleaning bath with or without pre- or post-treatment for specific purposes such as a detergent phosphating bath used in the biological cleaning tank to provide a cleaned phosphated part.

Abstract: A cleaning system that utilizes an organic cleaning solvent and pressurized fluid solvent is disclosed. The system has no conventional evaporative hot air drying cycle. Instead, the system utilizes the solubility of the organic solvent in pressurized fluid solvent as well as the physical properties of pressurized fluid solvent. After an organic solvent cleaning cycle, the solvent is extracted from the textiles at high speed in a rotating drum in the same way conventional solvents are extracted from textiles in conventional evaporative hot air dry cleaning machines. Instead of proceeding to a conventional drying cycle, the extracted textiles are then immersed in pressurized fluid solvent to extract the residual organic solvent from the textiles. This is possible because the organic solvent is soluble in pressurized fluid solvent. After the textiles are immersed in pressurized fluid solvent, pressurized fluid solvent is pumped from the drum.

Abstract: A cleaning system that utilizes an organic cleaning solvent and pressurized fluid solvent is disclosed. The system has no conventional evaporative hot air drying cycle. Instead, the system utilizes the solubility of the organic solvent in pressurized fluid solvent as well as the physical properties of pressurized fluid solvent. After an organic solvent cleaning cycle, the solvent is extracted from the textiles at high speed in a rotating drum in the same way conventional solvents are extracted from textiles in conventional evaporative hot air dry cleaning machines. Instead of proceeding to a conventional drying cycle, the extracted textiles are then immersed in pressurized fluid solvent to extract the residual organic solvent from the textiles. This is possible because the organic solvent is soluble in pressurized fluid solvent. After the textiles are immersed in pressurized fluid solvent, pressurized fluid solvent is pumped from the drum.

Abstract: A double, front loading, dishwasher comprising two side-by-side dishwashing cabinets each provided with a washing arm and either a common pump and motor or an individual pump and motor is described. Preferably, the dishwasher is designed to fit into an existing kitchen cabinet and even more preferably into an eye level kitchen cabinet so that while one cabinet is used to store clean dishes and cutlery the other cabinet is available to load and wash another set of dirty dishes. Storage of a set of clean dishes in the dishwasher saves time as the step of unloading the dishwasher to a separate storage cabinet is eliminated, as the clean dishes may be unloaded directly to the table.

Abstract: An apparatus for removing deposits from a razor blade includes a quantity of cation source material, a vessel retaining a cation carrying medium, and a medium and cation permeable barrier dividing the vessel and the medium into a blade placement region and a material retaining region, for separating the quantity of cation source material from the razor blade. The cation source material preferably includes several plastic beads. The medium permeable barrier is preferably a wire mesh. The cation carrying medium preferably includes water. A method of removing deposits from a razor blade includes the steps of: providing an apparatus including a vessel containing a water medium and cation source material at least partly submerged in the water medium, and immersing the blade in the water medium for a length of time to permit cations supplied by the material to react with the deposits on the blade.

Abstract: The apparatus includes an elongated wash tank and an elongated rinse tank each having a plurality of conduits disposed adjacent to the bottom thereof. Conduits in the washing tank are connected to a Wye. One inlet branch of the Wye is supplied with air at a pressure of at least 15 psi and the second inlet branch of the Wye is connected to a recirculating pump having an output of at least 30 psi. A mixture of pressurized air and water is discharged from apertures in the elongated conduits and forms vortices in a bath of water held in the tank. Window blinds are suspended in the tank in contact with the vortices. The elongated conduits in the rinse tank are supplied with air at a pressure of greater than 15 psi. Air is discharged from the elongated conduits in the rinse tank through vertically directed openings. After the blinds are washed in the wash tank they are inserted in the rinse tank and thereafter removed and air dried.