Abstract: An apparatus of cleaning a polishing pad includes: a first gas nozzle for spraying gas onto the pores of the polishing pad; and a first liquid nozzle for spraying a liquid to the pores of the polishing pad.

Abstract: An elevator according to an embodiment of the present invention includes a guide rail installed in an elevator hoist way in a vertical direction, an elevator car that ascends and descends along the guide rail, an elevator guide device, and a cleaning jig for an elevator guide device. The elevator guide device is fixed to the elevator car, and guides the running elevator car along the guide rail without bringing the elevator car into contact with the guide rail while a predetermined clearance is maintained with the guide rail using magnetic force generated by a magnet guide unit. The cleaning jig for an elevator guide device is installed on the guide rail to come into contact with a magnetic pole of the magnetic guide unit to remove a foreign matter attached to a surface thereof when the elevator car passes the cleaning jig for an elevator guide device.

Abstract: There are provided first and second cleaning members which are configured to clean a central zone in a rear surface of a wafer when the wafer held by an absorption pad is horizontally held, and configured to clean a peripheral zone in the rear surface of the wafer when the wafer is held by the spin chuck. Due to the provision of the first and second cleaning members, detergency can be improved as compared with a case in which only one cleaning member is used. The first and second cleaning members are configured to be horizontally turned by a common turning shaft. When the central zone in the rear surface of the wafer is cleaned, the turning shaft is located to be overlapped with the wafer. Since the turning shaft is located by using the moving area of the wafer, a size of an apparatus can be reduced.

Abstract: An escalator step cleaner for cleaning escalator steps having a plurality of parallel tread ridges separated by tread grooves has a cleaning pad assembly configured to extend generally perpendicular to the direction of motion of the escalator steps and clean the escalator steps while the escalator is in motion. The cleaning pad assembly has a rigid upper plate and a flexible disposable bottom pad having a cleaning contact surface. The contact surface carries a plurality of spaced parallel pad ridges separated by pad grooves that matingly engage between the tread ridges of the escalator steps and cause dislodgement of the accumulated debris. The cleaning pad assembly can be secured on a hand-held cleaning tool or on a motorized cleaning tool with rotating brushes and a vacuum.

Abstract: A stem web is disclosed that comprises a backing layer having a first surface and a second surface, and an array of 600 to 20000 upstanding stems projecting from the first surface of the backing. The stems comprise a height from 0.3 and 2.0 millimeters and a shore hardness less than 90A. In one embodiment, the stem web further comprises a reinforcing layer secured to the second surface. In one embodiment, the stem web is secured to a tool to be passed across a surface to be cleaned to capture lint and hair.

Abstract: A cable processing system includes a conveyor that holds cables and conveys the cables in a specified direction. The operation stretches the cables and allows them to be packaged or otherwise coiled. The cable processing system may wash the cables as they pass thereby.

Abstract: The present invention relates to a floor covering storage and dispensing rack including a frame equipped with extendable members having castors. Floor lock anchors are also provided on the frame. Upper frame members of the rack support rollers in spaced relation and a crank or motor is provided to rotate the rollers to wind floor covering onto the rollers for storage. Perforated end caps are provided on the rollers to limit access to moving parts. An elongated cleaning head consisting of a pair of brushes is provided on a frame member. Floor covering passes over at least one brush when the floor covering is retrieved or dispensed to remove dirt prior to storage or reuse.

Abstract: A solar cell cleaning device of an energy storage system, and a method of cleaning solar cells. Solar cells are positioned outside of a protective case only when sunlight is present. The surface of the solar cells is automatically cleaned when the solar cells are positioned outside of a protective case, or when the solar cells are stored in the protective case. The solar cell cleaning device includes a protective case, a rotatable drum coupled to the protective case, and a brush installed on the protective case and closely contacting the drum. A plurality of solar cells are installed on a surface of the drum, and are cleaned by the brush when the drum is rotated.

Abstract: An apparatus, system and method for cleaning a substrate edge include a composite applicator that cleans bevel polymers deposited on wafer edges using frictional contact in the presence of fluids. The composite applicator includes a support material and a plurality of abrasive particles distributed within and throughout the support material. The composite applicator cleans the edge of the wafer by allowing frictional contact of the plurality of abrasive particles with the edge of the wafer in the presence of fluids, such as liquid chemicals, to cut, rip and tear the bevel polymer from the edge of the wafer.

Abstract: A system is provided for providing automated washing for debris removal from the skin of a user's hands. At least some embodiments of the present include a friction enhancing structure such as a brush. In at least one embodiment of the invention, the system includes an RFID capability for identifying when at least one component, such as a removable brush, is due to for replacement for sanitation reasons.

Abstract: Provided is a pan cleaner, comprising a cleaning portion, a brush sweeping portion having a cleaning component and a driving portion; wherein the cleaning portion provides cleaning fluid for a pan, the cleaning component is contacted with an inner surface of the pan, so as to brush the inner surface of the pan, and the driving portion is connected to and drives the brush sweeping portion. The pan cleaner of the invention can effectively remove residues in a pan, and thus decreases labor intensity of a chef and increases hygiene quality.

Abstract: The present invention relates to a floor covering storage and dispensing rack including a frame equipped with castors. Floor lock anchors are also provided on the frame. Upper frame members of the rack are in spaced parallel relation and support a roller. A motor is provided to rotate the roller for winding the floor covering onto the roller for storage. An elongated cleaning head including a pair of parallel brushes is provided on a frame member so that floor covering passing between the brushes while being retrieved or dispensed will be cleaned.

Abstract: In a first aspect, an apparatus for cleaning a thin disk is provided. The apparatus includes a support roller for supporting a rotating wafer within a wafer cleaner. The support roller comprises a guide portion, for receiving an edge of a wafer, having an inclined surface comprising a low-friction material and adapted to allow the wafer edge to slide thereagainst; and an edge-trap portion for retaining the edge of the wafer and having a transverse surface comprising a high-friction material and adapted, when in communication with the edge of the wafer, to resist sliding thereagainst. Numerous other aspects are provided.

Abstract: A brushless wire-rope cleaner having a base plate, two side members arranged on a base plate at a distance from one another, and a cover extending from one side member to the other side member so that the base plate, the side members and the cover form a channel. A cleaning element is slideably arranged in the channel and a tensioning mechanism is arranged to slide the cleaning element through the channel.

Abstract: Mounting equipment comprises a brush which brushes an edge portion of a liquid crystal cell and removes the contaminating dust attached to this edge portion, an ionizer for injecting an ionized gas toward a portion to contact at least the edge portion of the liquid crystal cell of this brush, and a discharge pipe provided within a cleaning case for absorbing and removing the gas injected toward the brush from this ionizer.

Abstract: An apparatus is provided for cleaning residual powder and other contaminants from external surfaces of pressed powder cosmetic pans before the pans are adhered into the compact. A feed chute feeds pans into a feed path in the apparatus one after another in an upright orientation. The feed path includes two cleaning stations, each provided with brushes for scrubbing the pan. One cleaning station has cylindrical or drum brushes to scrub the bottom of each pan. The other cleaning station has a belt-type brush to scrub the sides of each pan. Dust collection systems are suspended above and below the apparatus at appropriate locations along the feed path to collect the residual powder and contaminants removed from the pans. Belts may be provided within the feed path to move the pans through the cleaning stations.

Abstract: A substrate cleaning tool having little particle sticking to the tool and a substrate cleaning apparatus having the substrate cleaning tool are provided. The substrate cleaning tool 23 has a plurality of thready brush members 46 in a bundle. The brush members 46 are capable of passing cleaning liquid through and ejecting the cleaning liquid through respective surfaces of the members 46. In operation, the substrate cleaning tool 23 is brought into contact with a substrate W in their relative movement in order to clean the substrate W. As the cleaning liquid is ejected from the surfaces of the brash members 46, particles are washed away from the surfaces of the brash members 46. Consequently, it is possible to eliminate a possibility that the particles etc. are transferred to the substrate W.

Abstract: A golf cart wheel cleaner comprises a platform; at least one drive member operably attached to a motor, wherein the at least one drive member is adapted to rotatably turn a golf cart wheel when the golf cart wheel is properly positioned on the platform; and a cleaning member adapted to remove debris from the golf cart wheel while the golf cart wheel is being rotated.

Abstract: An improvement is disclosed in a brush cleaning apparatus for cleaning a major surface of a wafer and including wafer guide wheels for transporting the wafer. The improvement includes a polish pad material disposed on a circumference of the guide wheels. The polish pad material is a material used in chemical-mechanical polishing of the wafer. The polish pad material contacts an edge portion of the wafer during cleaning thereof, thereby removing contaminants from the edge portion of the wafer, so that edge cleaning is performed in situ in addition to the brush cleaning of the major surface of the wafer.

Abstract: System and method for cleaning an electrical delivery system. An embodiment of the self-cleaning electrical delivery system comprises a track having an abrasive surface and a brush operatively associated with the track, the brush moving over the abrasive surface of the track to remove debris from the brush. A tool for producing the abrasive surface is also disclosed.

Abstract: An apparatus is provided for scrubbing a substrate's edge. The apparatus comprises a stationary surface (i.e., a surface that does not rotate in a direction in which the substrate rotates) that is positioned so as to contact an edge (e.g., a circumferential edge, an edge portion of the substrate's major surface or a beveled surface of the substrate's edge) such that as the substrate rotates, a dragging force is generated between the stationary surface and the rotating substrate. In a preferred aspect the apparatus is adapted to support a substrate in a generally vertical orientation, and the stationary surface is positioned along a lower portion of the substrate's edge, such that fluid applied to the major surface of the substrate will flow onto, and thereby rinse, the stationary surface. Such a preferred configuration also may allow a substrate to be loaded and unloaded without needing to move the stationary surface.

Abstract: A golf cart wheel cleaner comprises a platform; at least one drive member operably attached to a motor, wherein the at least one drive member is adapted to rotatably turn a golf cart wheel when the golf cart wheel is properly positioned on the platform; and a cleaning member adapted to remove debris from the golf cart wheel while the golf cart wheel is being rotated.

Abstract: A washing machine includes a washing drum, an openable cover mounted on a top end opening of the washing drum, a laundry mount rotatably disposed in a lower portion of the washing drum and on which an article to be washed is mounted, a motor for rotating the laundry mount, an upper brush disposed in an upper portion of the washing drum for brushing the laundry in accordance with the rotation of the laundry mount, a water supply unit for supplying water to the washing drum, and a water drain unit for draining water from the washing drum. In the washing machine, laundry such as sports shoes and bags made of thick fabrics can be cleanly washed.

Abstract: A footwear cleaning apparatus includes a vertically oriented frame with an upper frame for supporting the user that is standing while cleaning the footwear. The apparatus receives water from a garden hose and provides a control valve for regulating the water flow while the user is standing upright. The water is directed upwardly through a foot platform on the lower frame, and also through a lower brush onto the footwear sole, the resulting splash causing water to wet two side brushes that are oriented to bear upon the sides of the footwear. A scraper assembly is also on the lower frame and provides a horizontal scraping edge and two vertical scraping edges for the sole and sides of the footwear, respectively. After the water is turned off a drain outlet allows the device to be drained.

Abstract: A substrate cleaning system incorporating an edge scrubbing roller is disclosed. The system includes a cleaning station having a first brush and a second brush. The second brush is oriented relative to the first brush so as to receive a flat circular substrate therebetween. The first brush and the second brush are configured to simultaneously scrub a first and second surface of the flat circular substrate. The cleaning station also includes a scrubbing roller that is configured to receive an edge of the flat circular substrate. The scrubbing roller has a scrubbing pad for scrubbing a first surface edge of the first surface, a second surface edge of the second surface, and an edge that is not part of either the first or second surface. The edge scrubbing provided by the scrubbing roller advantageously assists in removing edge beading, metal debris, and other particulates that form during fabrication operations, such as metal deposition.

Abstract: A deburring tool for performing non-abrasive deburring of metal and other hard-material parts subject to burring. The deburring tool comprises a portion shaped to engage a specific surface on a workpiece, and surfaced with a deburring material comprising the soft, fuzzy, female loop half of ordinary hook and loop fastener. The female loop half of the hook and loop fastening material is non-abrasive, yet is extremely effective at removing small burrs and shavings from metal parts. In a preferred form, the deburring tool forms a two-sided deburring channel or track through which a part such as a hose connector block having a recessed surface needing deburring can be swiped. Both sides of the channel are surfaced with the female loop half of the hook and loop fastener as the deburring medium.

Abstract: An apparatus for cleaning golf clubs having an enclosure with a lower reservoir for holding water and an upper spray chamber in communication with said lower reservoir. The spray chamber houses a cleaning path for cleaning golf clubs. The cleaning path is defined by a plurality of opposingly spaced bristle brushes with a plurality of high pressure spray nozzles strategically located between the bristle brushes. A low volume/high pressure pump is utilized for providing highly pressurized fluid to the spray nozzles. Golf clubs are inserted along the cleaning path of the apparatus wherein all portions of the golf club are cleaned through the use of the bristle brushes and the high pressure spraying of fluid.

Abstract: There is proposed an apparatus and method for cleaning a semiconductor substrate, which make it possible to minimize the adhesion of mist in a cleaning tank at the occasion of cleaning a semiconductor substrate, to realize a high removal effect of residual polishing particles, and to enable to obtain a clean surface. In view of preventing a mist generated by the jet of high pressure water from re-adhering to the substrate during the cleaning of a semiconductor substrate, a cover member is disposed at a mist-generating region so as to prevent the splash of the mist. Additionally, a cavity is caused to generate by contacting a high pressure water with a still water, and high-frequency generated by the generation of the cavity is utilized for removing the residual polishing particles. Alternatively, the ejection of high pressure water against the surface of the substrate is performed in a liquid phase such as ultrapure water, thereby preventing the generation of mist.

Abstract: The method of the present invention cleans abrasive faces of an upper abrasive plate and a lower abrasive plate of an abrasive machine. The method is executed by a cleaning device including: a nozzle for jetting water; a brush for preventing the jetted water from scattering in the air, the brush enclosing the nozzle; and another brush for closing a gap between the preventing brush and an outer edge of the upper abrasive plate, the method is characterized by the steps of: jetting water from the nozzle toward the abrasive face of the upper abrasive plate; moving the nozzle toward the outer edge of the upper abrasive plate; and closing the gap by the closing brush when the gap is formed between the preventing brush and the outer edge of the upper abrasive plate.

Abstract: Disclosed is an improved spinning washer comprising: a spinning table for fixedly holding a wafer to be washed; water flushing device; first brush which can be put in coplanar position relative to the lower surface of the wafer round the circumference of the spinning table; and second brush confronting the first brush. The second brush can be put in contact with the upper surface of the wafer in its operative position. The opposite surfaces and circumference side of the wafer can be washed without the fear of breaking the wafer no matter how it may be thin.

Abstract: An apparatus for preventing drag-out is provided. The apparatus is arranged at an exit where a workpiece leaves a plating chamber. Brush members are arranged to contact both sides of the workpiece as it leaves the plating chamber. The brush members are adjustably arranged in a housing such that the angle of the brush member relative to the workpiece can be varied. A locking mechanism is provided to hold the brush member at a selected angle. The entire apparatus is adjustably inward and outward with respect to the workpiece as well as with respect to the plating chamber.

Abstract: A grip washer includes a tubular body having a closed lower end for holding cleaning fluid and an open upper end for receiving the grips or handles to be cleaned. A helical cleaning brush with multiple turns for cleaning the grips is threaded into position in the body. A second helical brush of a single turn threaded into the body and spaced above the cleaning brush provides a splash guard function during grip cleaning.