Abstract: A chemically etched needle is provided herein. The chemically etched needle includes a metal base having a first side and a second side. The chemically etched needle also includes a chemically etched blade at one end of the metal base and formed at an intersection of a distal diverging surface and a proximal diverging surface, at least one of the diverging surfaces slopes inward towards the second side.
Type:
Grant
Filed:
February 14, 2020
Date of Patent:
June 1, 2021
Assignee:
MOUND LASER & PHOTONICS CENTER, INC.
Inventors:
Paul V. Pesavento, Peter F. Ladwig, Michael W. Davis, John A. Theget, Kurt C. Swanson, Joel B. Michaletz, Philip W. Anderson, Timothy A. McDaniel, Patrick R. LaLonde
Abstract: In a process for producing a microneedle (12) that can be inserted into body tissue in which a needle tip (20) and a preferably capillary collecting channel (14) having a distal inlet for body fluid formed at the needle tip (20) are formed, it is provided that at least part of a preform (38) prefabricated from a flat material is shaped into a tubular structure (22) so that the collecting channel (14) is at least substantially annularly closed in the cross-section in the area of the tubular structure (22).
Abstract: Process for preparing a pointed device by a photochemical process by coating the top and bottom surfaces of a sheet material with a light-sensitive photoresist, exposing the photoresist with light through a light-impenetrable mask in the form of an image of the device shaped with a blunt end at the tip of the point to compensate for lateral etching during the etching step, said image on the top surface being slightly offset relative to the image on the bottom surface, further exposing with light a portion of the image of the point of the device on the top surface of the sheet material, said exposure conforming generally to a V-shaped configuration running along the inside perimeter of the point, removing exposed photoresist, and then contacting the treated sheet material with an etchant to remove material not protected by the remaining photoresist.