Abstract: The invention relates generally to electrodeposition apparatus and methods. When depositing films via electrodeposition, where the substrate has an inherent resistivity, for example, sheet resistance in a thin film, methods and apparatus of the invention are used to electrodeposit materials onto the substrate by forming a plurality of ohmic contacts to the substrate surface and thereby overcome the inherent resistance and electrodeposit uniform films. Methods and apparatus of the invention find particular use in solar cell fabrication.

Abstract: Disclosed are electrodeposition systems and methods wherein at least three electrodes are placed in a container containing a plating solution. The electrodes are connected to a polarity-switching unit and include a first electrode, a second electrode and a third electrode. The polarity-switching unit establishes a constant polarity state between the first and second electrodes in the solution during an active plating mode, wherein the first electrode has a negative polarity and the second electrode has a positive polarity, thereby allowing a plated layer to form on a workpiece at the first electrode. The polarity-switching unit further establishes an oscillating polarity state between the second and third electrodes during a non-plating mode (i.e.

Abstract: A system is disclosed for controlling an electrochemical process. The system has a power source that is coupled to a power amplifier. The power amplifier is configured to provide an electromotive force (emf) signal, and a plurality of electrodes apply the emf signal to an electrochemical solution. A control element is configured to control the power amplifier such that the emf signal exhibits a predetermined frequency, amplitude, and duty cycle for reducing a thickness of the Nernst diffusion layer such that an operational parameter is set to a predetermined value.

Abstract: A system for electroplating a substrate includes one or more controllers, with each controller having an FPGA with one or more output channels. A bulk power supply is connected to each controller. One or more transistors are associated with each output channel. An electroplating chamber has one or more electrodes, with each electrode connected to at least one output channel. The system may include a waveform capture and viewing circuit providing built-in process verification and diagnostic tools. The system may also have a throttle back mode which attempts to maintain proper anode current ratios by reducing setpoints of all anodes by the same percentage, if a fault condition causes a reduction in current to one of the anodes. Blackbox logging may also optionally be used for recording selected data values into a circular buffer having a selected amount of memory.

Abstract: A pulse generator includes a wave generator connected to a power source, the wave generator having an output signal; a de-multiplexer having a single input for receiving the output signal of the wave generator and splitting the signal into a plurality of channels carrying corresponding DeMux output signals; and a multiplexer electrically connected to each of the DeMux output signals and including means for alternately advancing or retarding the time interval between pulses of each the DeMux output signals and for combining at least two of the advanced or retarded output signals together and outputting the at least two advanced or retarded output signals as a single circuit output signal having a diverse pulse train. Pulse control means for controlling at least one of the pulse width and pulse amplitude of the circuit output signal is also provided.

Abstract: The invention relates to an electrolysis method, an electrolysis electrode, an electrolysis vessel, an electrolysis device, and a system for use of electrolysis gasses for combustion, in particular for combustion engines, for example piston or turbine engines, wherein an electrolysis electrode is artificially vibrated with a vibration frequency and said electric voltage of the electrolysis electrode oscillates with a lower harmonic frequency of said vibration frequency.

Abstract: In an air filtering apparatus in which power is supplied from a power supply to electrodes in an electrolytic bath to electrolyze water in the electrolytic bath and thus generate electrolytic water and the generated electrolytic water and air are supplied to a gas-liquid contact member to filter the air, a voltage varying unit varies the voltage applied between the electrodes, and includes a voltage switching unit for switching a power supply voltage, a voltage adjusting unit for adjusting the power supply voltage switched by the voltage switching unit and applying the adjusted voltage between the electrodes and a controller for controlling the voltage switching unit so that the power supply voltage is adjusted to a voltage nearest to the adjusted power supply voltage by the voltage adjusting unit.

Abstract: A digital control device for tracking a sine wave according to the present invention has a compensator, a control object and a feedback gain. An input into the compensator is a signal obtained by subtracting a control quantity from a reference value. An input into the control object is a signal obtained by subtracting an output of the feedback gain from an output of the compensator. A transfer function of the compensator is (k2z+k1)/(z2?2z cos ?T+1), where ? is an angular frequency, T is a sampling period, z is a z operator, and k1 and k2 are constants. Thus, a second-order compensator can be configured, with which a sinusoidal reference waveform can be tracked simply and with high accuracy.

Abstract: The invention relates to a method for electrochemically processing a workpiece (61) in which a pulsating or alternating electrical voltage is applied between the workpiece and a workpiece electrode (62) which are arranged at a distance from one another in an electrolyte. A distance range is defined by precisely dimensioning the mean value of the applied pulsating voltage and of the voltage amplitudes measured with regard to this mean value. A double layer charge reversal on the workpiece which is sufficient for bringing about the desired electrochemical reaction results within said distance range, whereas workpiece areas situated at further distances do not experience a sufficient double layer charge reversal. The dimensions of the space between the workpiece and the workpiece electrode are proportioned in such a way that only points of the area of the workpiece to be processed lie within said distance range.