Abstract: The invention relates to an easily personalized magnetic stirrer (1), which has a base body (2). The hood (5) can be put over this base body (2). The receiving space (6) for inserting a decorative inlay is then formed between the hood (5) and the base body (2). The receiving space (6) and a decorative inlay (7) inserted therein can be viewed from the outside through an at least area-wise transparent set-up area (4), which is arranged or formed on the hood (5) (see FIG. 1 for comparison).

Abstract: This invention is an apparatus and a method for continuously generating a hydride gas of M1 which is substantially free of oxygen in a divided electrochemical cell. An impermeable partition or a combination of an impermeable partition and a porous diaphragm can be used to divide the electrochemical cell. The divided electrochemical cell has an anode chamber and a cathode chamber, wherein the cathode chamber has a cathode comprising M1, the anode chamber has an anode comprising M2 and is capable of generating oxygen, an aqueous electrolyte solution comprising a hydroxide M3OH partially filling the divided electrochemical cell. Hydride gas generated in the cathode chamber and oxygen generated in the anode chamber are removed through independent outlets. M1 can be selenium, phosphorous, silicon, metal or metal alloy, M2 is metal or metal alloy suitable for anonic oxygen generation, and M3 is NH4 or an alkali or alkaline earth metal.

Abstract: The present invention provides an electrochemical system and process for the production of very high purity hydride gases and the feed product streams including these hydride gases at constant composition over extended periods of time. The processes and apparatuses of the invention can employ a lined pressure vessel (1) within which resides an electrochemical cell including cathode (2) and anode (3) material. The hydride gas produced within the vessel exits through port (4) to a manifold which contains automatic valve (8) to allow exit of the hydride gas. The hydride gas passes through one or more filters (7). The gas finally exits the manifold through a pressure regulator (6) to the point where it is utilized in semiconductor fabrication. A source of gas (11) for mixing with the hydride gas is also included.