Using Electrolyte Containing Surface Active Agent (e.g., Foaming Or Wetting Agent, Etc.) Patents (Class 205/722)
  • Patent number: 10731270
    Abstract: Particles are removed from electronic components, such as components of data storage devices by use of an electrochemical process. An electronic component is immersed in an electrochemical bath, and a voltage is applied across the +ve electrode and ?ve electrode in an amount sufficient to remove charged particles present on a surface of the electronic component.
    Type: Grant
    Filed: August 24, 2017
    Date of Patent: August 4, 2020
    Assignee: Seagate Technology LLC
    Inventor: Zubair Ahmed Khan
  • Patent number: 9409800
    Abstract: An aqueous fluid treatment method and system is provided which preferably uses a 3 step electro-chemical oxidation process to remove organic contaminates from water. A high surface area electro-chemical reaction cell can be employed to remove organic particles and precipitate hardness salts from the aqueous solution. Several 3-phase spark arcs generated mixed oxidants and acoustic cavitations to remove dissolved organic compounds and oxidize organic metal compounds in the next step. Finally, a dielectric discharge in aqueous foam is used to eliminate recalcitrant organic compounds such as, but not limited to, polychlorinated aromatics, disinfectants, pesticides, and pharmaceuticals before release to environment or recycled.
    Type: Grant
    Filed: May 8, 2015
    Date of Patent: August 9, 2016
    Assignee: GLOBAL WATER HOLDINGS, LLC
    Inventors: Michael Fraim, Sanjeev Jakhete
  • Publication number: 20130156631
    Abstract: A pickling solution, including: 50 g/L to 400 g/L of sulfuric acid; 1 g/L to 100 g/L of at least one oxidant selected from a group consisting of nitric acid, hydrogen peroxide, peroxodisulfate ions, and iron (III) ions; 0.01 g/L to 10 g/L of at least one additive selected from a group consisting of aromatic sulfonic acid, aromatic sulfonate, alkylamine, aromatic carboxylic acid, and aromatic carboxylate; 0.005 g/L to 10 g/L of at least one surfactant selected from a group consisting of alkylbenzene sulfonic acid and alkylbenzene sulfonate; and 10 g/L to 300 g/L of copper sulfate, is used to remove oxide film, and then reused by being electrolyzed and adding the oxidant, the additive and the surfactant in amounts equivalent to consumed amounts.
    Type: Application
    Filed: December 14, 2012
    Publication date: June 20, 2013
    Applicant: MITSUBISHI MATERIALS CORPORATION
    Inventor: Mitsubishi Materials Corporation
  • Patent number: 7931813
    Abstract: A process to reduce or prevent biofouling, by destroying or deactivating microbiological content of feedwater, or other liquid, prior to its entrance into membranes or process equipment, such as heat transfer equipment. The process comprises the use of electrical discharge and/or electric fields to destroy microbes that result in the biofouling of surfaces. By destroying the microbiological content of the water the microbiology no longer is able to create a restricting biofilm upon or within said process equipment.
    Type: Grant
    Filed: December 14, 2007
    Date of Patent: April 26, 2011
    Assignee: General Electric Company
    Inventors: Thangavelu Asokan, Setu Chokshi, Yuseph Montasser, David M. Polizzotti, Yatin Tayalia
  • Patent number: 6893549
    Abstract: A cleaning apparatus for an ECMD anode pad including a vacuum head which applies vacuum pressure to the surface of the anode pad between ECMD operations in order to remove particles precipitated onto the surface of the anode pad and prevent or minimize inadvertent scratching or peeling of a wafer supported by the pad during the process. The particles are dislodged from the anode pad and removed from the ECMD system by flow of electrolyte solution into the vacuum head. The electrolyte solution is typically filtered before returning to the electrolyte tank for ultimate redistribution to the ECMD system.
    Type: Grant
    Filed: October 7, 2002
    Date of Patent: May 17, 2005
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd
    Inventors: Shih-Wei Chou, Minghsng Tsai
  • Patent number: 6884338
    Abstract: The present invention provides methods of polishing and/or cleaning copper interconnects using bis(perfluoroalkanesulfonyl) imide acids or copper tris(perfluoroalkanesulfonyl) methide acids compositions.
    Type: Grant
    Filed: December 16, 2002
    Date of Patent: April 26, 2005
    Assignee: 3M Innovative Properties Company
    Inventors: Susrut Kesari, William M. Lamanna, Michael J. Parent, Lawrence A. Zazzera
  • Patent number: 6858124
    Abstract: The present invention provides methods of polishing and/or cleaning copper interconnects using sulfonic acid compositions.
    Type: Grant
    Filed: December 16, 2002
    Date of Patent: February 22, 2005
    Assignee: 3M Innovative Properties Company
    Inventors: Lawrence A. Zazzera, Michael J. Parent, William M. Lamanna, Susrut Kesari
  • Patent number: 6793793
    Abstract: A novel method of electrochemical treatment such as electroplating, etc. and an electrochemical reaction apparatus thereof which is high in reactability and able to be electrochemically reacted efficiently, which is small or zero in amount of generation of liquid waste such as electrolytic solution and cleaning liquid and therefore, amicable to the environment, and in which it is no more required to clean the electrode, etc. with cleaning liquid after reaction. Electrochemical reaction is executed in a reaction vessel (6) containing matter (5) which is in a supercritical or subcritical state and an electrolytic solution (1), and after reaction, the supercritical or subcritical matter (5) is shifted into a state of the matter (5) before being shifted into a critical state.
    Type: Grant
    Filed: March 4, 2002
    Date of Patent: September 21, 2004
    Inventors: Hideo Yoshida, Seizo Miyata, Yoshihiro Asai, Masato Sone, Fumiko Iwao, Hiroe Asai
  • Patent number: 6599416
    Abstract: An electrochemical stripping method for selectively removing at least one coating from the surface of a substrate is described. The substrate is immersed in an aqueous composition through which electrical current flows. The composition includes an acid having the formula HxAF6, in which “A” is Si, Ge, Ti, Zr, Al, or Ga; and x is 1-6. Various coatings can be removed, such as diffusion or overlay coatings. The method can be used to fully-strip a coating (e.g., from a turbine component), or to partially strip one sublayer of the coating. Related processes and an apparatus are also described.
    Type: Grant
    Filed: September 28, 2001
    Date of Patent: July 29, 2003
    Assignee: General Electric Company
    Inventors: Lawrence Bernard Kool, Ralph James Carl, Jr., Bin Wei, James Anthony Ruud, Mark Alan Rosenzweig, Stephen Joseph Ferrigno
  • Patent number: 6585875
    Abstract: A process for cleaning an electrically conducting surface (3) by arranging for the surface to form the cathode of an electrolytic cell in which the anode (1) is maintained at a DC voltage in excess of 30V and an electrical arc discharge (electro-plasma) is established at the surface of the workpiece by suitable adjustment of the operating parameters, characterized in that the working gap between the anode and the cathode is filled with an electrically conductive medium consisting of a foam (9) comprising a gas/vapor phase and a liquid phase. The process can be adapted for simultaneously coating the metal surface by including ions of the species required to form the coating in the electrically conductive medium.
    Type: Grant
    Filed: January 25, 2002
    Date of Patent: July 1, 2003
    Assignee: CAP Technologies, LLC
    Inventor: Danila Vitalievich Ryabkov
  • Publication number: 20030062271
    Abstract: An electrochemical stripping method for selectively removing at least one coating from the surface of a substrate is described. The substrate is immersed in an aqueous composition through which electrical current flows. The composition includes an acid having the formula HxAF6, in which “A” is Si, Ge, Ti, Zr, Al, or Ga; and x is 1-6. Various coatings can be removed, such as diffusion or overlay coatings. The method can be used to fully-strip a coating (e.g., from a turbine component), or to partially strip one sublayer of the coating. Related processes and an apparatus are also described.
    Type: Application
    Filed: September 28, 2001
    Publication date: April 3, 2003
    Inventors: Lawrence Bernard Kool, Ralph James Carl, Bin Wei, James Anthony Ruud, Mark Alan Rosenzweig, Stephen Joseph Ferrigno
  • Patent number: 6045686
    Abstract: A process for the delacquering and detinning of a metal substrate is presented comprising the fully electrochemical removal of both an outer polymeric coating and an inner tin coating from a metal substrate. The disclosed method provides a clean metal substrate, and results in wastes which are easily disposed of with minimal cost and minimal environmental impact. In one embodiment, the present invention comprises a one-stage process for removing an outer polymeric coating and an inner tin coating from a metal substrate in a single electrolyte bath through electrolytic removal of both the polymeric and tin layers from the metal substrate. An electrically conductive container having the electrolyte bath therein acts as an anode in the process, and the removed tin is plated out on the cathode. In another embodiment, the present invention comprises a two-stage process for removing an outer polymeric coating and an inner tin coating from a metal substrate.
    Type: Grant
    Filed: December 15, 1997
    Date of Patent: April 4, 2000
    Assignee: The University of Connecticut
    Inventors: James M. Fenton, John E. Dresty, Jr., Richard Bodensteiner, Chunzhi He, Ramakrishnan Venkataraman, Jung-Chou Lin, Antonio J. Aldykiewicz, Jr.
  • Patent number: 6042713
    Abstract: A device and method for removing metal or mineral deposits from surfaces (eg. surfaces of oil drilling equipment) by creating an electrochemical cell of which the contaminated surface is a part.
    Type: Grant
    Filed: April 1, 1998
    Date of Patent: March 28, 2000
    Inventor: Richard Keatch
  • Patent number: 5814204
    Abstract: The invention relates to processes of decontaminating by electrochemical attack, a metal workpiece or solution contaminated with one or more metal oxides. A metal workpiece or solution contaminated with one or metal oxides is mixed or exposed to a solution including hydrazide ions to complex metal ions of the metal oxides with hydrazide ions. The metal workpiece or an anode is connected to a positive terminal of means for providing direct current. A cathode is disposed away from the metal workpiece in the solution including metal ions complexed with hydrazide ions and connecting the cathode to a negative terminal of means for providing direct current. DC current is conducted from the metal workpiece through the solution including metal ions complexed with hydrazide ions to the cathode. The solution or workpiece is decontaminated by plating out the metal ion as a metal at the cathode thereby removing the metal oxides from the metal workpiece or solution.
    Type: Grant
    Filed: October 11, 1996
    Date of Patent: September 29, 1998
    Assignee: Corpex Technologies, Inc.
    Inventor: Thomas F. D'Muhala