Deposition (e.g., Sputtering) Patents (Class 219/121.15)
  • Patent number: 11813690
    Abstract: The present disclosure provides a system for printing a three-dimensional (3D) object. The system may comprise a source of at least one feedstock, a support for supporting at least a portion of the 3D object, a feeder for directing such feedstock from the source towards the support, and a power supply for supplying electrical current. The system may comprise a controller operatively coupled to the power supply. The controller may receive a computational representation of the 3D object. The controller may direct such feedstock through a feeder towards the support and may direct electrical current through such feedstock and into the support. The controller may subject such feedstock to heating such that at least a portion of such feedstock may deposit adjacent to the support. The controller may direct deposition of additional portions adjacent to the support and may direct an additional feedstock through such feeder and subject to heating.
    Type: Grant
    Filed: December 21, 2022
    Date of Patent: November 14, 2023
    Assignee: Relativity Space, Inc.
    Inventors: Paul Burke, Mateo Pena Doll
  • Patent number: 11590702
    Abstract: Method for additively manufacturing at least one three-dimensional object, comprising assigning a parameter indicative of the time required for irradiating a respective irradiation zone to a plurality of irradiation zones of a respective build material layer, assigning a first energy beam to the irradiation zone whose parameter indicates that the irradiation zone has the longest and second longest time required for irradiating and irradiating these irradiation zones with at least one respective first and second energy beams, wherein after irradiation and consolidating the irradiation zone whose parameter indicates that the irradiation zone has the second longest time required for irradiating and irradiating with the second energy beam is completed, assigning the at least one second energy beam to the irradiation zone whose parameter indicates that the irradiation zone has the third longest time required for irradiating and irradiating this irradiation zone with the at least one second energy beam.
    Type: Grant
    Filed: March 6, 2019
    Date of Patent: February 28, 2023
    Assignee: CONCEPT LASER GMBH
    Inventor: Jürgen Werner
  • Patent number: 11148196
    Abstract: A method for additive production and a correspondingly produced component made of a powdery base material, includes the thermal pre-treatment of the base material at a first temperature of at least 800° C. under an inert gas atmosphere, wherein the first temperature and a duration of the pre-treatment are further selected such that no sintering process of the base material occurs, subsequent cooling of the base material, and additive construction of the component from the thermally pre-treated base material. A corresponding device is for the additive production.
    Type: Grant
    Filed: May 8, 2017
    Date of Patent: October 19, 2021
    Assignee: Siemens Energy Global GmbH & Co. KG
    Inventors: Christian Brunhuber, Axel Papperitz, Steffen Walter
  • Patent number: 11133154
    Abstract: According to various embodiments, a method for vaporizing a vaporization material by means of an electron beam may include the following: generating a first deflection pattern having a first power density at least on an end face of a rod-shaped vaporization material; and, subsequently, generating a second deflection pattern having a second power density on a portion of an outer edge of the rod-shaped vaporization material and a portion of an inner edge of a ring crucible, which encloses the rod-shaped vaporization material, wherein the second power density is greater than the first power density.
    Type: Grant
    Filed: April 10, 2019
    Date of Patent: September 28, 2021
    Assignee: VON ARDENNE Asset GmbH & Co. KG
    Inventor: Carsten Deus
  • Patent number: 10192708
    Abstract: An electron emitter that consists of: a low work function material including Lanthanum hexaboride or Iridium Cerium that acts as an emitter, a cylinder base made of high work function material that has a cone shape where the low work function material is embedded in the high work function material but is exposed at end of the cone and the combined structure is heated and biased to a negative voltage relative to an anode, an anode electrode that has positive bias relative to the emitter, and a wehnelt electrode with an aperture where the cylindrical base protrudes through the wehnelt aperture so the end of the cone containing the emissive area is placed between the wehnelt and the anode.
    Type: Grant
    Filed: November 19, 2016
    Date of Patent: January 29, 2019
    Assignees: OREGON PHYSICS, LLC, APPLIED PHYSICS TECHNOLOGIES, INC.
    Inventors: Paul P. Tesch, Gerald G. Magera
  • Patent number: 8952292
    Abstract: A welding head is provided. The welding head includes a bracket and a plurality of blocks coupled to the bracket. Each of the plurality of blocks has a contact tip. The contact tips are adapted to receive an electrode. Further, at least one of the plurality of blocks is capable of variable positioning relative to the bracket.
    Type: Grant
    Filed: April 17, 2012
    Date of Patent: February 10, 2015
    Assignee: Caterpillar Inc.
    Inventors: Matthew J. Behmlander, Huijun Wang
  • Publication number: 20150018956
    Abstract: A surgical implant device, comprising: a body portion; and one or more surfaces comprising a plurality of protruding structures; wherein the body portion and the one or more surfaces comprising the plurality of protruding structures are integrally formed. The one or more surfaces comprising the plurality of protruding structures are formed by an additive manufacturing process. The plurality of protruding structures comprise a plurality of needles. Optionally, the surgical implant device comprises one of an anterior lumbar interbody fusion cage, a posterior lumbar interbody fusion cage, a transforaminal lumbar interbody fusion cage, an oblique lumbar interbody fusion cage, a cervical cage, and a bone screw.
    Type: Application
    Filed: July 24, 2014
    Publication date: January 15, 2015
    Inventors: John C. STEINMANN, Scott RUCKER, Tim RASMUSSEN, John P. STEINMANN, Trace CAWLEY, Thomas ROSS, Ernesto RIOS, Andrew OLCESE
  • Patent number: 8932682
    Abstract: It is an object of the present invention to provide a deposition device that can selectively form a thin film without using a shadow mask with respect to a substrate having a large size. In the deposition device, an evaporation source is provided with a cylinder cell, a heater for heating a lower part of the cylinder cell, and a heater for heating an upper part of the cylinder cell. A hot plate can control a temperature by a heater provided inside thereof. The hot plate heats an evaporation material supplied into the cylinder cell from a material supply portion that is connected to the cylinder cell, and vaporizes the evaporation material by evaporation or sublimation. A rotating mechanism for rotating the hot plate in the cylinder cell may be provided to achieve uniformity of a temperature. A heater for heating the material supply potion may be provided to raise a temperature of the evaporation material supplied into the cylinder cell.
    Type: Grant
    Filed: October 10, 2006
    Date of Patent: January 13, 2015
    Assignee: Semiconductor Energy Laboratory Co., Ltd.
    Inventor: Yasuyuki Arai
  • Publication number: 20140320969
    Abstract: A method to prepare low reflective surface according to an example of the present invention comprises: the first step to prepare materials having pillar structure on the surface; the second step to prepare aluminum surface-materials by treating for the pillar structure to have aluminum surface; and the third step to prepare a low reflective surface with dual protuberance structure by forming nano-flake layer on the pillar surface of the material surface through oxidation of the surface aluminum of the aluminum surface-materials. The method to prepare low reflective surface can provide a low reflective surface structure that can be applied to photovoltaic device surface or various display surface as a surface able to reduce reflection significantly by absorbing wavelengths in the range of visible and infrared ray through internally total reflection with simple, low cost, and ecofriendly process.
    Type: Application
    Filed: April 24, 2014
    Publication date: October 30, 2014
    Applicant: KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY
    Inventors: Heon Ju LEE, Myoung Woon MOON, Kyu Hwan OH, Seong Jin KIM, Eu Sun YU, Tae Jun KO, Seung Chul KIM
  • Publication number: 20140038050
    Abstract: The present invention intends to provide silicon-containing particles that, when used as a negative electrode active material for a nonaqueous electrolyte secondary battery, can form a nonaqueous electrolyte secondary battery that is less in volume change during charge/discharge and has high initial efficiency and excellent cycle characteristics. The present invention provides silicon-containing particles that are used as a negative electrode active material for a nonaqueous electrolyte secondary battery and have a diffraction line with a peak at 2?=28.6° in X-ray diffractometry, a negative electrode material for a nonaqueous electrolyte secondary battery therewith, a nonaqueous electrolyte secondary battery, and a method of manufacturing the silicon-containing particles.
    Type: Application
    Filed: June 24, 2013
    Publication date: February 6, 2014
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Tetsuo NAKANISHI, Yoshiyasu YAMADA, Kazuyuki TANIGUCHI, Motoyuki YAMADA
  • Publication number: 20130180962
    Abstract: A method of raster scanning a surface of an object using a particle beam comprises determining a basic set of raster points within a surface; determining a surface portion of the surface of the object, wherein the surface portion is to be raster scanned; ordering a set of raster points of the basic set located within the surface portion; and scanning of the surface portion by directing the particle beam onto the raster points of the ordered set in an order corresponding to an order of the raster points in the ordered set from the outside to the inside, i.e. starting from the boundary of the surface portion towards its center, or in the reverse order, i.e. from the inside to the outside.
    Type: Application
    Filed: January 15, 2013
    Publication date: July 18, 2013
    Applicant: Carl Zeiss Microscopy GmbH
    Inventors: Josef Biberger, Ralph Pulwey
  • Patent number: 8452073
    Abstract: A closed-loop control method for an electron beam freeform fabrication (EBF3) process includes detecting a feature of interest during the process using a sensor(s), continuously evaluating the feature of interest to determine, in real time, a change occurring therein, and automatically modifying control parameters to control the EBF3 process. An apparatus provides closed-loop control method of the process, and includes an electron gun for generating an electron beam, a wire feeder for feeding a wire toward a substrate, wherein the wire is melted and progressively deposited in layers onto the substrate, a sensor(s), and a host machine. The sensor(s) measure the feature of interest during the process, and the host machine continuously evaluates the feature of interest to determine, in real time, a change occurring therein. The host machine automatically modifies control parameters to the EBF3 apparatus to control the EBF3 process in a closed-loop manner.
    Type: Grant
    Filed: March 31, 2010
    Date of Patent: May 28, 2013
    Assignee: The United States of America as represented by the Administrator of the National Aeronautics and Space Administration
    Inventors: Karen M. Taminger, Robert A. Hafley, Richard E. Martin, William H. Hofmeister
  • Publication number: 20100193480
    Abstract: A solid free-form (SFF) method is used to manufacture a component from successive layers of feedstock material with low ductility. A plasma stream is created by energizing a flowing gas using an arc electrode, the arc electrode having a variable magnitude current supplied thereto. The plasma stream is directed to a predetermined targeted region to preheat the predetermined targeted region prior to deposition. The current is adjusted and the feedstock material is introduced into the plasma stream to deposit molten feedstock in the predetermined targeted region. The current is adjusted and the molten feedstock is slowly cooled at an elevated temperature, typically above the brittle to ductile transition temperature of the feedstock material, in a cooling phase to minimize the occurrence of material stresses.
    Type: Application
    Filed: January 30, 2009
    Publication date: August 5, 2010
    Applicant: HONEYWELL INTERNATIONAL INC.
    Inventor: Robbie Joseph Adams
  • Patent number: 7674997
    Abstract: A spinner for fiberizing glass has fiberizing holes formed in the spinner sidewall by a process utilizing an electron beam perforating process. A backing material used in the process is deposited on the walls of the fiberizing holes for increasing the corrosion resistance of the fiberizing holes. With regard to the formation of each fiberizing hole, an interaction of the backing material with an electron beam during the electron beam perforating process creates a gaseous backing material that expands through a hole created by the electron beam in the spinner sidewall to eject molten alloy material of the spinner sidewall made molten by the electron beam from the hole and deposit a thin substantially uniform coating layer of the backing material on the wall of the hole to increase the corrosion resistance of the fiberizing hole thus formed.
    Type: Grant
    Filed: October 17, 2006
    Date of Patent: March 9, 2010
    Assignee: Johns Manville
    Inventor: Jason J. Blush
  • Patent number: 7168935
    Abstract: An apparatus for formation of a three dimensional object comprising a sealed container; an electron beam subsystem capable of directing energy within said container; a positioning subsystem contained within said container; a wire feed subsystem contained within said container; an instrumentation subsystem electronically connected to said electron beam subsystem, positioning subsystem, and wire feed subsystem; and a power distribution subsystem electrically connected to said electron beam subsystem, positioning subsystem, wire feed subsystem, and said instrumentation subsystem.
    Type: Grant
    Filed: August 1, 2003
    Date of Patent: January 30, 2007
    Assignee: The United States of America as represented by the Administrator of the National Aeronautics and Space Administration
    Inventors: Karen M. Taminger, J. Kevin Watson, Robert A. Hafley, Daniel D. Petersen
  • Patent number: 7025863
    Abstract: A vacuum system for the treatment of work pieces has an evacuatable treatment chamber having a centrally disposed low voltage arc discharge arrangement and laterally disposed loading opening. A coupling device between the work piece support and a receiving device on the system side allows simplified loading and removal of the work pieces to be treated along with the support by simply lifting onto or lowering from the receiving device.
    Type: Grant
    Filed: September 5, 2001
    Date of Patent: April 11, 2006
    Assignee: Unaxis Balzers Limited
    Inventors: Roger Seeli, Mauro Pedrazzini, Volker Derflinger
  • Patent number: 6608277
    Abstract: An automated system, method and apparatus for producing welded end closures in thin-walled metal tubes, preferably sealing a radioactive source inside the tubes, by use of an electronically controlled robot that grasps and sequentially repositions the tube through a series of stations in which the tube is bottom-welded, inspected, filled, inspected, top welded and inspected, and wherein the tube bottom and top are welded using multi-directional laser beams generated by a single laser light source and discharged through a plurality of spaced-apart laser welder heads. Brachytherapy seeds containing radiolabeled microspheres are produced using the system, method and apparatus of the invention.
    Type: Grant
    Filed: June 11, 2002
    Date of Patent: August 19, 2003
    Assignee: Bard Acquisition Sub. Inc.
    Inventors: Scott A. Spooner, Tommy L. Thompson, Michael L. Vinson
  • Publication number: 20030019430
    Abstract: An arrangement for controlling the deflection of an electron beam in a vapor deposition system includes a control unit to which are assigned deflection modules (23, 27) which can be driven in accordance with respective selected functions. By driving these deflection modules, the electron beam can be deflected in two coordinate directions. At least one of the selected functions has a time-changing term via which the periodicity of the deflection of the electron beam (14) changes with respect to this coordinate direction. The term can be pregiven manually or automatically. The invention also relates to a method for controlling the deflection of the electron beam in a vapor deposition system.
    Type: Application
    Filed: July 11, 2002
    Publication date: January 30, 2003
    Inventor: Roland Malischke
  • Patent number: 6476340
    Abstract: The present invention provides for an improved electron gun evaporation source using high direct current negative voltage for forming high energy electron beams to produce thin-film coatings on a variety of substrates. The present invention further provides for the use of a grounded metallic shield which functions as an electrode enclosing both the filament leads and emitter structures of an electron beam source.
    Type: Grant
    Filed: April 10, 2000
    Date of Patent: November 5, 2002
    Assignee: The BOC Group, Inc.
    Inventor: Russell J. Hill
  • Patent number: 6471781
    Abstract: A CVD apparatus for fabricating a titanium nitride thin film is provided. The apparatus comprises an evacuatable reaction vessel having an interior, a pumping apparatus capable of exhausting the reaction vessel and maintaining the interior of the reaction vessel at a prescribed pressure, a gas feeder for introducing a mixed gas into the reaction vessel, a substrate holder in the reaction vessel for holding a substrate to be coated with a titanium nitride thin film, and a heater for heating the substrate. The gas feeder is equipped with the following components: (a) a vaporizer for vaporizing tetrakis(dialkylamino)titanium (TDAAT) from a liquid source material, (b) a first flow controller capable of setting a flow rate of the vaporized TDAAT to any level within a range of 0.
    Type: Grant
    Filed: June 30, 1999
    Date of Patent: October 29, 2002
    Assignee: Anelva Corporation
    Inventors: Ryoki Tobe, Yasuaki Tanaka, Atsushi Sekiguchi, Hitoshi Jimba, So Won Kim
  • Patent number: 6444086
    Abstract: Existing devices for vacuum coating substrates having different shapes, either in continuous or hatch facilities, are equipped in such a way that several coatings are applied after a coating process. The slide bearings are to be coated with several coats and the coating materials used and the conditions related thereto require the use of several coating techniques. This relates inter alia to conveyance parameters. Existing facilities fail to meet these requirements. According to the invention, such a device comprises several aligned processing chambers. Slide bearings which are held together by positive and non-positive fit in tempered carrier bodies are displaced through said chambers comprising pretreatment, atomization and evaporation chambers using a conveyance system adapted to this process. A tempering device for the carrier bodies is connected upstream from the coating track. Corresponding inlet and outlet channels enable air-to-air conveyance.
    Type: Grant
    Filed: August 31, 2000
    Date of Patent: September 3, 2002
    Assignee: Ferderal-Mogul Wiesbaden GmbH & Co. KG
    Inventors: Gerd Andler, Wolfgang Wixwat-Ernst, Christoph Metzner, Jens-Peter Heinss, Klaus Goedicke, Siegfried Schiller
  • Publication number: 20020074317
    Abstract: An electrical discharge machining probe for creation of micrometer and nanometer scale structures. The probe is further designed to allow ions to be accelerated toward a target surface. The probe is further designed and the ions are further selected and energized to either dislodge atoms from the target surface or to be deposited on the target surface.
    Type: Application
    Filed: December 18, 2000
    Publication date: June 20, 2002
    Inventor: Eric Orace Johnson
  • Patent number: 6403916
    Abstract: An automated system, method and apparatus for producing welded end closures in thin-walled metal tubes, preferably sealing a radioactive source inside the tubes, by use of an electronically controlled robot that grasps and sequentially repositions the tube through a series of stations in which the tube is bottom-welded, inspected, filled, inspected, top welded and inspected, and wherein the tube bottom and top are welded using multi-directional laser beams generated by a single laser light source and discharged through a plurality of spaced-apart laser welder heads. Brachytherapy seeds containing radiolabeled microspheres are produced using the system, method and apparatus of the invention.
    Type: Grant
    Filed: May 12, 2000
    Date of Patent: June 11, 2002
    Assignee: Isostar International, Inc.
    Inventors: Scott A. Spooner, T. L. Thompson, Michael L. Vinson
  • Patent number: 6384367
    Abstract: An assembly for a vaporizer for a vacuum coating system includes a crucible having a cavity; a liner accommodated in the cavity for receiving a material to be vaporized; and a spacer arrangement disposed between the inner wall of the crucible and the outer wall of the liner. The spacer arrangement which is disposed about the outer wall of the liner, centers the liner at a set distance from the inner crucible wall.
    Type: Grant
    Filed: May 4, 2000
    Date of Patent: May 7, 2002
    Assignee: Satis Vacuum Industries Vertriebs-AG
    Inventor: Beat Siegrist
  • Patent number: 6364956
    Abstract: An apparatus for simultaneously depositing gradients components of two or more target materials onto a substrate is disclosed. The apparatus comprises a first target material source that directs a first target material towards the substrate and a second target material source that directs a second material towards the substrate. The apparatus further comprises a gradient shutter system that blocks a first predetermined amount of the first target material and a second predetermined amount of the second target material directed towards the substrate in order to generate gradients of the first and second target materials on the substrate. The gradients of the first and second target materials being simultaneously deposited onto the substrate to form a homogenous resulting material. A method for simultaneously depositing gradients of two or more target material onto a substrate is also disclosed.
    Type: Grant
    Filed: January 26, 1999
    Date of Patent: April 2, 2002
    Assignee: Symyx Technologies, Inc.
    Inventors: Youqi Wang, Xin Di Wu