Abstract: An optical device with a variable index of refraction is formed by exposing a film to an energy gradient. The optical device has angular selectivity. The optical device can be used as an output coupler for a waveguide used in a virtual-reality and/or augmented-reality apparatus.
Type:
Grant
Filed:
March 29, 2021
Date of Patent:
October 17, 2023
Assignee:
META PLATFORMS TECHNOLOGIES, LLC
Inventors:
Giuseppe Calafiore, Austin Lane, Matthew E. Colburn
Abstract: In one embodiment, a multi charged particle beam writing apparatus includes an emitter emitting a charged particle beam, a shaping aperture array forming multiple beams by allowing the charged particle beam to pass through a plurality of opening portions, an alignment unit disposed between the emitter and the shaping aperture array, the alignment unit including an aperture plate, a detector provided in the aperture plate and detecting charged particles, and an alignment coil adjusting an angle of incidence of the charged particle beam on the aperture plate, a feature quantity calculating unit calculating, from an alignment scan image based on a detection value of the detector, a feature quantity representing a perpendicularity of the angle of incidence of the charged particle beam on the aperture plate, and a coil control unit controlling an excitation value of the alignment coil based on the feature quantity.
Abstract: An electron beam writing apparatus comprising a stage that a sample is placed on, an electron optical column, an electron gun emitting an electron beam disposed in the optical column, an electrostatic lens provided with electrodes aligned in an axial direction of the electron beam disposed in the optical column, and a voltage supply device for applying positive voltage constantly to the electrostatic lens. A shield plate is disposed between the XY stage and the electron optical column to block reflected electrons or secondary electrons generated by irradiation to the sample with the electron beam. The electrostatic lens is disposed immediately above the shield plate to change a focal position of the electron beam. A voltage supply device applies a positive voltage constantly to the electrostatic lens.
Abstract: A phenomenon where a depicted pattern becomes unclear owing to a rotational runout of a roller mold in the direction of a rotary shaft is suppressed while restraining an increase in the cost.
Abstract: A method for cold-forming a nozzle for a laser includes placing a slug or tube of oxygen-free copper into a die. A mandrel is forced into the copper slug or tube. The resultant compressive force causes the copper to cold flow around the mandrel and the die to define an inner shape and an outer dimension of the part.
Abstract: When the focal point of the objective lens of a charged-particle beam lithographic system is shifted according to the deflection position within a writing field, the image magnification of the objective lens will vary. In the present invention, the focal point of the objective lens is shifted in a corresponding manner to deflection positions in X- and Y-directions, respectively. Amounts of variations in the image magnification are previously measured, as well as the amounts of shifts. The results are stored in a memory. During lithographic writing, the focus of the objective lens is varied by referring to the memory according to the deflection positions. The size and position of a pattern to be written are corrected by controlling a shaping deflector and a positioning deflector.
Abstract: A method for altering a circuit pattern of a printed-circuit board includes the steps of removing a portion of the printed-circuit board so that the circuit pattern inside the printed-circuit board is exposed, and connecting an exposed portion of the circuit pattern to another portion of the printed-circuit board by a conductive body so that a circuit path is formed between the exposed portion of the circuit pattern and the other portion of the printed-circuit board.
Abstract: A method of forming a welded component by electron beam welding, and the resulting welded assembly. The method is particularly directed to the welding of a component whose subcomponents are formed of dissimilar metals, with the result that an electron beam used to weld the subcomponents is prone to being deflected away from the contact surface interface between the subcomponents and into one of the subcomponents as it passes through the interface. The method is also suitable for welding applications in which the interface between the subcomponents has an arcuate shape. The method involves magnetically steering the electron beam so that the beam is caused to follow the desired path through the interface.
Abstract: The method of the invention produces protruding features on a glass layer. Initially, a conductive layer is applied to the glass layer and is coupled to a source of reference potential. This conductive layer prevents a build-up of electrons in the glass layer when it is exposed to an electron beam. Thereafter, an electron beam is directed at combined layers in areas where protruding features are to be produced. The energy, current density and duration of application of the electron beam are controlled so as to create a melt/softened region within the glass layer. Such softening and differences in expansion rates between the softened glass and the surrounding glass causes a protruding feature to appear on the surface of the glass layer.
Abstract: An electrical discharge machining probe for creation of micrometer and nanometer scale structures. The probe is further designed to allow ions to be accelerated toward a target surface. The probe is further designed and the ions are further selected and energized to either dislodge atoms from the target surface or to be deposited on the target surface.