Abstract: Membranes and processes for preparing membranes having weakly acidic or weakly basic groups comprising the steps of: (i) applying a curable composition to a support; (ii) curing the composition for less than 30 seconds to form a membrane; and (iii) optionally removing the membrane from the support; wherein the curable composition comprises a crosslinking agent having at least two acrylic groups. The membranes are particularly useful for producing electricity by reverse electrodialysis.

Abstract: A microreplicated article is disclosed. The article includes an opaque web having first and second opposed surfaces. The first surface includes a first microreplicated structure having a plurality of first features. The second surface includes a second microreplicated structure having a plurality of second features. The first microreplicated structure and the second microreplicated structure retain registration within 100 micrometers.

Abstract: An object of the present invention is to provide a TiO2-containing quartz glass substrate which, when used as a mold base for nanoimprint lithography, can form a concavity and convexity pattern having a dimensional variation falling within ±10%. The invention relates to a TiO2-containing quartz glass substrate: in which a coefficient of thermal expansion in the range of from 15 to 35° C. is within ±200 ppb/° C.; a TiO2 concentration is from 4 to 9 wt %; and a TiO2 concentration distribution, in a substrate surface on the side where a transfer pattern is to be formed, is within ±1 wt %.

Abstract: A light-transmitting mold structure having a mold pattern corresponding to a portion to form a pattern by nanoimprint and a conductive film pattern corresponding to a portion to form a pattern by nonadiabatic near-field exposure is used to irradiate UV light from a back surface of the mold structure and to perform nonadiabatic near-field light exposure in an imprint process so that all patterns having various sizes for simulating various designs can be faithfully transferred by a single imprint process (imprint & UV exposure).

Abstract: A semiconductor device manufacturing method has forming a first resist pattern on the semiconductor substrate, and then, forming a first pattern on the semiconductor substrate by the use of the first resist pattern, and forming a second resist pattern on the semiconductor substrate by using an imprinter, and then, forming a second pattern on the semiconductor substrate by the use of the second resist pattern. The forming the first pattern, the first pattern smaller than a design pattern corresponding to the design data for forming a plurality of patterns on a semiconductor substrate being formed.

Abstract: Disclosed is a pattern forming method having a first step of forming a first ultraviolet curable resin layer on a substrate, a second step of leading a pattern-formed surface of a first mold wherein a predetermined pattern is formed to oppose the first ultraviolet curable resin layer, and attaching the substrate to the first mold by applying pressure, and a third step of irradiating diffused ultraviolet rays on the first ultraviolet curable resin layer, to which the pattern of the first mold is transferred by the pressure-attaching, the irradiated ultraviolet rays being diffused by disposing an ultraviolet light diffusion member between the ultraviolet curable resin layer and an ultraviolet light source.

Abstract: The present invention generally relates to a mold assembly (32, 34) and a method of using the mold for the manufacture of composite parts which, more particularly, are generated from a strengthener in a generally solid phase and a matrix in a generally liquid phase. Various types of molds and processes may be used in order to impregnate a strengthener with a matrix such that a composite part may be manufactured, but the efficiency rate and the duration of the manufacturing process significantly varies depending on the chosen type of mold and process. The present invention relates to a mold assembly and to the manufacture of composites by using the mold assembly which includes the injection of the matrix in the mold assembly containing the strengthener and a deformable member (36) which favors the impregnation of the matrix toward the strengthener.

Abstract: A production method of three-dimensional pattern is disclosed. First, an adhesive layer is applied on a three-dimensional workpiece. Next, a film is vacuum adsorbed on the adhesive layer so that the film is impressed onto the adhesive layer to form the three-dimensional pattern on the adhesive layer. Finally, the adhesive layer is cured by implementing a plurality of heat treatments thereon. A workpiece of three-dimensional pattern and a production device of three-dimensional pattern are also disclosed.

Abstract: An aqueous curable imprintable medium having at least one curable compound according to Formula 1: wherein R1-R3 are hydrolysable alkoxy groups, and wherein R4 is selected from the group consisting of C1-C6 linear alkyl groups, hydrolysable alkoxy groups and a phenyl group; and a photo-acid generator or a photo-base generator. Such a medium may have an extended shelf-life and may facilitate the formation of highly reproducible patterned layers when used in an imprint lithography process.

Abstract: The present invention provides a composition and a method of using the same to form a pattern on a substrate using imprint lithography employing dark-field polymerization. To that end, the composition includes a bis vinyl ether component, and an initiator component that produces an acid in response to radiation. The bis vinyl ether component is reactive to the acid and polymerizes in response thereto.

Abstract: A method of reducing the dimension of an imprint structure on a substrate, the method comprising the steps of: (a) providing a substrate having at least one imprint structure thereon, said structure being formed of an inorganic-organic compound comprising an inorganic moiety and a polymer moiety, said polymer moiety having a lower vaporization temperature than the melting point of said inorganic moiety; and (b) selectively removing at least part of the polymer moiety while enabling at least part of the inorganic moiety to form a substantially continuous inorganic phase in said imprint structure, wherein the removal of the at least part of the polymer moiety from the imprint structure reduces the dimension of the imprint structure.

Abstract: In one embodiment, a patterning method is disclosed. The method includes applying an uncured imprint material containing a first curing agent and a second curing agent onto a substrate. The method includes pressing a template against the imprint material. The method includes reacting the first curing agent with the template pressed against the imprint material. The method includes stripping the template from the imprint material. In addition, the method includes reacting the second curing agent.

Abstract: Disclosed is a resinous molded article which has a fine structure of a nanometer level and includes a material containing a polymer of a polymerizable organic fluorocompound. The polymer is formed from, for example, a monomeric precursor composition containing a methacrylate and/or an acrylate in combination with a fluorine-containing photopolymerizable monomeric precursor composition miscible with the former composition.

Abstract: The present disclosure relates to techniques for replicating large-scale nano-pattern structures using a block copolymer structure as a mask in a replication process. Example methods may include performing self-assembling block copolymer reactions to create large self-assembling nano-structures. The nano-structures may then be replicated by using the large self-assembling nano-structure as a mask in nano-imprint lithography.

Abstract: A method for coating hydrogel and silicone hydrogel articles, and articles made by the method, are provided in which the coating is first applied to the molding surface in which an article-forming material will be cured to form the article. The method permits the thickness and uniformity of the coating to be more easily controlled than in known coating methods.

Abstract: To provide a photocurable composition whereby it is possible to obtain a cured product provided with both release property and high refractive index, and a process whereby it is possible to produce a molded product having a high refractive index and having on its surface a fine pattern having a reverse pattern of a mold precisely transferred. A photocurable composition comprising from 61 to 90 mass % of a compound (A) having a refractive index of at least 1.55 at a wavelength of 589 nm before curing and having at least two (meth)acryloyloxy groups, from 2 to 15 mass % of a compound (B) having fluorine atoms and at least one carbon-carbon unsaturated double bond (provided that the compound (A) is excluded), from 5 to 35 mass % of a compound (C) having one (meth)acryloyloxy group (provided that the compound (B) is excluded), and from 1 to 12 mass % of a photopolymerization initiator (D) (provided (A)+(B)+(C)+(D)=100 mass %).

Abstract: A fully curable jettable composition having a viscosity less than 30 cps at a temperature within the range of 15° C.-180° C. comprising (i) at least one low viscosity reactive resin; (ii) at least one higher viscosity resin having a viscosity greater than twice that of the low viscosity resin and a functionality of greater than or equal to 2; (iii) at least one curable toughener, (iv) at least one initiator for the polymerization of the resins, and (v) at least one stabilizer for delaying the curing of the resins of the composition. The composition can be jetted from piezo electric printing heads under the control of a computer program to form a multi-layered article, for example, a three dimensional article, in which the adjacent droplets merge and are cured homogeneously together.

Abstract: A fluidic channel system is provided. The fluidic channel system includes a light projection apparatus, a fluidic channel, and a rail. The light projection apparatus provides light. A photocurable fluid, which is selectively cured by the light, flows inside the fluidic channel. A fine structure which is to be formed by curing the photocurable fluid moves along the rail.

Abstract: A method is provided for transferring a pattern from a template (1) to an object (12) in an imprint process, using a two-step process. The first step includes contacting a pattern of the template surface with a polymer material comprising one or more Cyclic Olefin Copolymers (COCs), to produce a flexible polymer replica having a structured surface with an inverse of the pattern of the template surface. In a second step, after releasing the flexible polymer replica from the template, the inverse pattern of the flexible polymer replica is pressed into a resist layer on a substrate, to imprint a replica of the pattern of the template surface in therein.

Abstract: The present invention has an object to provide a curable composition for transfer materials. The curable composition is applicable to a UV nanoimprint process capable of forming micropatterns with high throughput, is applicable to a thermal nanoimprint process in some cases, and is capable of forming a micropattern having high selectivity on etching rates regarding a fluorine-based gas and an oxygen gas. The curable composition for transfer materials comprises a silsesquioxane skeleton-containing compound having, in its molecule, a specific silsesquioxane skeleton and a curable functional group.

Abstract: According to one embodiment, a template for imprint lithography includes a transparent substrate having a pattern with a recess portion and a protruding portion, and a light-shielding portion formed on a bottom surface of the recess portion and on a top surface of the protruding portion. A side wall of the protruding portion is inclined.

Abstract: A nanoimprint mold includes a flexible body and a molding layer formed on the flexible body. The molding layer includes a plurality of protrusions and recesses. The molding layer is a polymer material polymerized via a cross linking polymerization of a nanoimprint resist which includes a hyperbranched polyurethane oligomer (HP), a perfluoropolyether (PFPE), a methylmethacrylate (MMA), a diluent solvent and a photo initiator. A method for making the nanoimprint mold is also provided.

Abstract: A method for producing a flexible, three-dimensional coating structure with a surface curvature on the front side and an impression on the rear side for a flexible switch or a flexible user interface. The method is essentially characterized by the following steps: introducing an uncured, transparent casting compound into a compression mould with an impression that forms the shaping of a surface curvature; introducing a counterpunch that penetrates at least partially into the impression, so that the casting compound is distributed in the gap between the shaping of the surface curvature of the compression mould and the surface of the counterpunch and fills this gap; introducing energy into the casting compound, so that the casting compound cures to form a substantially self-supporting, flexible, transparent surface layer with a surface curvature on the front side and an impression on the rear side.

Abstract: The present disclosure describes methods for making shaped polymeric materials. Methods are provided for making shaped polymeric materials from a precursor composition that contains a polar solvent and a polymerizable material that is miscible with the polar solvent. The precursor composition is at least partially polymerized in a mold.

Abstract: A processing method for transferring a relief pattern of a mold to a resist includes the steps of compressing the mold having the relief pattern against the resist on a substrate, irradiating an exposure light onto the resist through the mold, vibrating the mold and the substrate relative to each other during the irradiating step, and releasing the mold from the resist.

Abstract: In a method for producing a free-standing solid state layer, a solid state material is provided having at least one surface available for layer formation thereon and a layer of polymer is formed on the available surface. The solid state material and polymer layer are then exposed to a change in local temperature from a first temperature that is no greater than about 300° C. to a second temperature below about room temperature to cause the solid state material to fracture along a plane at a depth in the material, to produce at least one free-standing solid state layer from the solid state material.

Abstract: Described herein are implantable devices, formulations and methods of making implantable devices for the release of a polypeptide from an implantable device, and methods of use thereof.

Abstract: An imprinting apparatus and an imprinting method that prevents movement of an imprinting mold during an imprinting process. The imprinting method includes coating a resin on a substrate; aligning an imprinting mold on the resin; temporarily securing the imprinting mold on the substrate; pressing the imprinting mold; hardening the resin; and detaching the imprinting mold.

Abstract: The present invention provides a new monomer and methods of using the monomer to fabricate robust polymer surface coatings with controlled thicknesses between 1 and 5 nanometers. The coatings are composed of a new material containing polymerized monomers of 4-vinylbenzenepropanethiol. The polymer surface coating may be applied to metal and silicon. The method includes exposing a metal substrate to a solution of the monomer in hexanes in order to deposit a monolayer of the monomer onto the metal surface. The substrate is then irradiated with ultraviolet radiation in order to graft a thin polymer coating onto the surface. The procedure can be repeated in order to control the thickness of the coating between about 1 nm and 5 nm. Alternatively, thermally initiated polymerization or deposition of partially oligomerized monomers onto the surface provides nanothin coatings with identical performance.

Abstract: One embodiment of the present invention provides a photosensitive organo-metallic hybrid material which functions as both a structural material and a photoresist material. More specifically, this photosensitive organo-metallic hybrid material includes an organo-metallic compound comprised of at least one unsaturated double bond. The photosensitive organo-metallic hybrid material also includes a cross-linking agent comprised of at least two unsaturated double bonds capable of cross-linking the organo-metallic compound to form an organo-metallic hybrid material. Additionally, the photosensitive organo-metallic hybrid material includes a photoactive compound capable of absorbing exposure light during a photolithography process to form the photosensitive organo-metallic hybrid material.

Abstract: An object of the present invention is to provide a micropattern transfer method and a micropattern transfer device in which the small amount of resin is applied to a substrate, and the nonuniformity in thickness is prevented to arise on the obtained pattern forming layer. In order to achieve the above object, the present invention provides a micropattern transfer method in which a micropattern is transferred to a resin by pressing a stamper having the micropattern onto the resin applied to a substrate, including the steps of: applying the resin to a surface of the substrate discretely in order to obtain a plurality of resin islands so that a center portion of each of the resin islands forms a planar thin-film, and a peripheral portion of the resin island rises higher than the center portion.

Abstract: A pattern transfer method for filling a surface on a template having a concave-convex pattern with a resist material has contacting the template with the resist material applied on a substrate, curing the resist material while contacting the template with the resist, electrically charging the template and the resist with an identical polarity, and removing the template from the resist material while eclectically charging the template and the resist with an identical polarity.

Abstract: A low density component, such as hollow microspheres, dispersed in a binder to produces a material having a surface that is comfortable to the touch even after extended exposure to an energy source, such as direct sun light.

Abstract: The present disclosure describes articles, such as medical articles, containing a substrate having disposed thereon a hydrophilic gel material (e.g., a shaped hydrophilic gel material or a coating of a hydrophilic gel material) and methods for making such articles. Methods are provided for making hydrophilic gel materials from a precursor composition that contains a polar solvent and a polymerizable material that is miscible with the polar solvent.

Abstract: An imprinting machine that brings a mold having a pattern into contact with an object and transfers the pattern onto the object includes a measurement unit that measures a position of the mold when the mold contacts the object.

Abstract: The present invention has an object to provide a curable composition for transfer materials. The curable composition is applicable to a UV nanoimprint process capable of forming micropatterns with high throughput, is applicable to a thermal nanoimprint process in some cases, and is capable of forming a micropattern having high selectivity on etching rates regarding a fluorine-based gas and an oxygen gas. A curable composition for transfer materials of the present invention contains a curable silicon compound produced by subjecting a silicon compound (A) having a Si—H group and a compound (B) having a curable functional group and a carbon-carbon double bond other than the curable functional group to a hydrosilylation reaction.

Abstract: A method of depositing material upon a substrate features filling recesses of a substrate with liquid and removing material present on the substrate, outside of the recesses using fluid, i.e., apply a vacuum of a jet of fluid. To that end, one method of the present invention includes depositing a measure of liquid upon a surface of a substrate having a recess formed therein to ingress into a volume of the recess with a portion of the liquid. A quantity of the liquid is disposed upon regions of the surface proximate to the recess. Thereafter, the quantity of liquid is removed while maintaining the portion within the volume. In this manner, the portion may be transferred onto an additional substrate. More specifically, the portion may be placed in contact with a layer of flowable material and cross-linking therewith by exposing the liquid and the flowable material to actinic radiation.

Abstract: A method for forming a nano/microstructure includes applying a release coating having a transition temperature to a mold, the release coating promoting adhesion thereto at temperatures below the transition temperature and release at temperatures above the transition temperature. A cast material is adhered to the release coating at a first temperature below the transition temperature and released from the mold by exposing the release coating to a second temperature greater than the transition temperature.

Abstract: A diffusively reflective paint composition is disclosed for use in reflectors in lighting fixtures. The paint is formed by blending macroporous polymeric particles with a paint carrier. The macroporous polymeric particles are formed by reducing a reflective macroporous sheet material. The paint can be applied to a variety of substrates to form diffusely reflective articles.

Abstract: A manufacturing method of a color filter substrate includes forming a black matrix on a substrate, the black matrix including first, second, third and fourth openings, forming first, second and third color filter patterns in the first, second and third openings, forming an overcoat layer on the substrate, disposing a soft mold on the organic material layer, the soft mold including first depressed portions and a second depressed portion, the first depressed portions corresponding to the black matrix, and the second depressed portion corresponding to the fourth opening, wherein a first depth of the first depressed portions is larger than a second depth of the second depressed portion, applying pressure to the soft mold such that the first and second depressed portions are filled with the overcoat layer, first curing the overcoat layer, detaching the soft mold from the overcoat layer, and second curing the overcoat layer.

Abstract: An active energy beam-curable composition for optical material is provided that comprises (A) a di(meth)acrylate represented by the following formula (1) and (B) a mono(meth)acrylate represented by the following formula (2) and/or a mono(meth)acrylate represented by the following formula (3), wherein the active energy beam-curable composition contains 10 to 90 wt % of the component (A) and 90 to 10 wt % the component (B) on the basis of the total weight of the components (A) and (B). In the formula, R1 and R3 independently represents a hydrogen atom or a methyl group, R2 and R4 independently represents a hydrogen atom, a methyl group or an ethyl group, R5 to R8 independently represents a hydrogen atom, a methyl group or a bromine atom, and l and m independently represents an integer of 1 to 6, R9 represents a hydrogen atom or a methyl group, R10 represents a hydrogen atom or a methyl group.

Abstract: A method for manufacturing a mold used in impression process is provided. The method includes the following steps: forming a negative photoresist layer between a transparent substrate and a supporting substrate; exposing the negative photoresist layer via the transparent substrate by direct writing technology; removing the supporting substrate; and developing the negative photoresist layer to form the mold.

Abstract: A method and apparatus used for forming a lens master for forming lenses on a wafer. The method includes using an inverted lens pin mold in conjunction with a dispense method to create both concave and convex lens masters for making lens stamps containing lens-shaped cavities. The lens-shaped cavities are used to imprint a plurality of lenses into a curable material.

Abstract: A process for preparing a lithographic mask, including: making patterns on a plane mask, the plane mask having an SOI structure including a layer of semiconductor material, a buried layer of insulant and a substrate; and transferring the patterns and the mask to a curved support that includes at least one point of non-nil curvature.

Abstract: Systems and methods of manufacturing ophthalmic lenses, for example, soft, extended wear silicone hydrogel contact lenses, are provided. The systems generally include a housing having an illuminated chamber, a carrier, for example a tray, movable in the illuminated chamber from an inlet portion to an outlet portion of the housing, and the tray configured to carry a plurality of contact lens molds. Polymerizing light energy is provided, for example, by multiple fluorescent lamps, to the molds at an intensity effective to at least initiate polymerization of a monomer composition located in each of the molds. The light may be illuminated onto two opposing sides of each mold. In some cases, the intensity of the light provided to one side of the mold may be different to the light intensity provided to the opposing side of the mold. In addition, the system may include features that are effective to provide for an instantaneous start and an instantaneous end to the light induced cure of the monomer in the molds.

Abstract: An improved lithographic alignment method, system, and template. The method includes creating, within a lithographic subfield, subsequent-layer features which are intentionally offset from their respective previous-layer features, where the intentional offset may vary in magnitude and direction from one subfield to the next. The system includes an imprint lithographic machine and first and second lithography templates where the templates are adapted to enable the machine to form first and second features, respectively, and where a second feature is configured to be deliberately offset from a corresponding first feature. The template set includes at least two templates, one having features which are deliberately offset from corresponding features of another template. Also, a method of manufacturing such a template set.

Abstract: This disclosure relates to gasket materials used for attaching and sealing covers to enclosures. More particularly, this disclosure relates to form-in-place gaskets, applied to surfaces of containers for sensitive electronic components. The gaskets include a flexible polymer and a micropowder polyolefin filler.

Abstract: The instant invention pertains to a method and a fluid composition for producing contact lenses with improved lens quality and with increased product yield. The method of the invention involves adding a phospholipid into a fluid composition including a lens-forming material in an amount sufficient to reduce an averaged mold separation force by at least about 40% in comparison with that without the phospholipids.

Abstract: A thermosensitive light-adjusting material is formed by reacting 18-84% polymer polyols and/or terminal hydroxyl-containing polymers which are formed by reacting polymer polyols and diisocyanate, with 15-80% terminal hydroxy-containing ethylenically unsaturated monomers through light or heat polymerization reaction. A process for preparing the thermosensitive light-adjusting material and an optical device comprising thereof. The light-adjusting ability is high, the light-adjusting range is broad, and mechanical capability is good. The preparation method is simple, short-circle, and high effective, so it can be applied in industry, furthermore, because of no organic solvents, the method's advantages are low cost and without pollution.

Abstract: There is disclosed an imprinted polymer support for solid phase organic synthesis (SPOS). The polymer support being obtainable from a method that comprises providing a substrate and a mold, the mold having a defined surface pattern. A composition is placed between the defined surface pattern of the mold and the substrate. The composition comprises a polymerisation medium with at least one functional monomer and a free radical initiator. The composition is polymerised to form an array of polymer imprints adhered to the substrate.