Discharge Device With Positive Ion Emitter Patents (Class 313/230)
  • Patent number: 10290469
    Abstract: Embodiments of an apparatus having an improved coil antenna assembly that can provide enhanced plasma in a processing chamber is provided. The improved coil antenna assembly enhances positional control of plasma location within a plasma processing chamber, and may be utilized in etch, deposition, implant, and thermal processing systems, among other applications where the control of plasma location is desirable. In one embodiment, an electrode assembly configured to use in a semiconductor processing apparatus includes a RF conductive connector, and a conductive member having a first end electrically connected to the RF conductive connector, wherein the conductive member extends outward and vertically from the RF conductive connector.
    Type: Grant
    Filed: June 2, 2014
    Date of Patent: May 14, 2019
    Assignee: Applied Materials, Inc.
    Inventors: Valentin N. Todorow, Gary Leray, Michael D. Willwerth, Li-Sheng Chiang
  • Patent number: 10132707
    Abstract: Devices and corresponding methods can be provided to test an ionization gauge, such as a hot cathode ionization gauge, for leakage currents and to respond to the leakage currents to improve pressure measurement accuracy. Responding to the leakage current can include applying a correction to a pressure measurement signal generated by the gauge based on the leakage current. Responding to the leakage current can also include removing contamination causing the leakage current, where the contamination is on electrical feedthrough insulators or other gauge surfaces. Testing and correcting for leakage currents and removing contamination can be completed with the ionization pressure gauge in situ in its environment of use, and while the gauge remains under vacuum.
    Type: Grant
    Filed: July 9, 2015
    Date of Patent: November 20, 2018
    Assignee: MKS Instruments, Inc.
    Inventors: Stephen C. Blouch, Paul C. Arnold, Gerardo A. Brucker, Wesley J. Graba, Douglas C. Hansen
  • Patent number: 9799482
    Abstract: A device manufacturing apparatus and manufacturing method of a magnetic device. The device manufacturing apparatus can include a substrate holding portion configured to hold a substrate, an ion source, an anode disposed in a housing of the ion source, and a cathode disposed outside the housing of the ion source. A first opening can be disposed in a portion of the housing such the anode is exposed to a region between the anode and the substrate holding portion. The ion source can be configured to generate an ion beam with which the substrate is irradiated. A first structure can be disposed between the ion source and the substrate holding portion. The first structure can have a first through hole through which the ion beam can pass. The first structure can include a conductor, and an opening dimension of the first through hole can be equal to or larger than an opening dimension of the first opening.
    Type: Grant
    Filed: March 11, 2016
    Date of Patent: October 24, 2017
    Assignee: TOSHIBA MEMORY CORPORATION
    Inventors: Yuichi Ohsawa, Akio Ui, Junichi Ito, Chikayoshi Kamata, Megumi Yakabe, Saori Kashiwada
  • Patent number: 9376747
    Abstract: When treating workpiece or substrate surfaces with the help of a vacuum plasma discharge between an anode and an cathode and whereby due to such treatment a solid is formed and deposited on the anode surface, which solid has a higher specific DC impedance than the specific DC impedance of the anode material, at least parts of the anode surface are shielded from such deposition by establishing thereat a shielding plasma.
    Type: Grant
    Filed: November 1, 2007
    Date of Patent: June 28, 2016
    Assignee: OERLIKON SURFACE SOLUTIONS AG, PFAFFIKON
    Inventors: Juergen Ramm, Beno Widrig, Denis Kurapov
  • Patent number: 8933630
    Abstract: An apparatus for extending the useful life of an ion source, comprising an arc chamber containing a plurality of cathodes to be used sequentially and a plurality of repellers to protect cathodes when not in use. The arc chamber includes an arc chamber housing defining a reaction cavity, gas injection openings, a plurality of cathodes, and at least one repeller element. A method for extending the useful life of an ion source includes providing power to a first cathode of an arc chamber in an ion source, operating the first cathode, detecting a failure or degradation in performance of the first cathode, energizing a second cathode, and continuing operation of the arc chamber with the second cathode.
    Type: Grant
    Filed: December 19, 2012
    Date of Patent: January 13, 2015
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Chin-Tsung Lin, Hsiao-Yin Hsieh, Chi-Hao Huang, Hong-Hsing Chou, Yeh-Chieh Wang
  • Patent number: 8822945
    Abstract: A focused ion beam apparatus includes a gas field ion gun unit having an emitter, an ion source gas supply unit for supplying different ion source gases to the emitter, a heater for heating the emitter, and an extraction electrode. A storage section stores, for each gas of a plurality of different types, set values of emitter temperature, gas pressure, extraction voltage to be applied to an extraction electrode, image contrast and image brightness. An input section selects and inputs one of the gas types. A control section reads, from the storage section, the set values of emitter temperature, gas pressure, extraction voltage, image contrast and image brightness, which correspond to the input gas type, and sets a heater, a gas control section, a voltage control section, and an adjustment section for the contrast and brightness of the image.
    Type: Grant
    Filed: March 28, 2011
    Date of Patent: September 2, 2014
    Assignee: SII NanoTechnology Inc.
    Inventors: Kenichi Nishinaka, Takashi Ogawa, Yoshihiro Koyama
  • Publication number: 20140167614
    Abstract: An apparatus for extending the useful life of an ion source, comprising an arc chamber containing a plurality of cathodes to be used sequentially and a plurality of repellers to protect cathodes when not in use. The arc chamber includes an arc chamber housing defining a reaction cavity, gas injection openings, a plurality of cathodes, and at least one repeller element. A method for extending the useful life of an ion source includes providing power to a first cathode of an arc chamber in an ion source, operating the first cathode, detecting a failure or degradation in performance of the first cathode, energizing a second cathode, and continuing operation of the arc chamber with the second cathode.
    Type: Application
    Filed: December 19, 2012
    Publication date: June 19, 2014
    Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventor: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
  • Patent number: 8624476
    Abstract: An ion-generating device includes a discharge electrode and an induction electrode. The discharge electrode has a needle-like tip. The induction electrode has a circular through hole. The tip of the discharge electrode penetrates the through hole of the induction electrode, and protrudes upward with respect to an upper surface of the induction electrode. It is thereby possible to obtain an ion-generating device capable of improving ion emission efficiency, and an electrical apparatus provided with the ion-generating device.
    Type: Grant
    Filed: June 30, 2009
    Date of Patent: January 7, 2014
    Assignee: Sharp Kabushiki Kaisha
    Inventor: Yoshinori Sekoguchi
  • Patent number: 8593051
    Abstract: Apparatus for the production of a charged particle beam, comprising: an ion source plasma chamber (104), having a door (106), and an accelerator (102) mounted on the face of the door remote from the ion source plasma chamber.
    Type: Grant
    Filed: February 21, 2008
    Date of Patent: November 26, 2013
    Assignee: Nordiko Technical Services Limited
    Inventors: Timothy Andrew James Holmes, Mervyn Howard Davis
  • Patent number: 8319410
    Abstract: The filament clamp assembly has a pair of bifurcated clamps to hold the connecting leads of a filament within a cavity of a cathode of a separate cathode assembly. The filament clamp assembly is mounted on the insulator block in self-aligning relation. The cathode assembly has a tungsten cathode with an internal cavity to receive the filament that is secured within a retainer shield made of one of tungsten, molybdenum and graphite by a threaded graphite cylindrical collar.
    Type: Grant
    Filed: December 29, 2009
    Date of Patent: November 27, 2012
    Assignee: Ion Technology Solutions, LLC
    Inventor: Manuel A. Jerez
  • Patent number: 8304744
    Abstract: A closed drift ion source is provided, having an anode that serves as both the center magnetic pole and as the electrical anode. The anode has an insulating material cap that produces a closed drift region to further increase the electrical impedance of the source. The ion source can be configured as a round, conventional ion source for space thruster applications or as a long, linear ion source for uniformly treating large area substrates. A particularly useful implementation uses the present invention as an anode for a magnetron sputter process.
    Type: Grant
    Filed: October 19, 2007
    Date of Patent: November 6, 2012
    Assignee: General Plasma, Inc.
    Inventor: John Eric Madocks
  • Patent number: 8159118
    Abstract: An electron gun includes the following: a primary thermionic electron source, a secondary thermionic electron source and a focusing electrode disposed within a first housing that includes one or more reference members adjustably attached to a housing support connected to a first platform; an anode and one or more focusing coils disposed within a second housing comprising one or more insulating members adjustably connected to the first platform; and one or more deflection coils disposed within a third housing connected to the second housing and located opposite said first housing.
    Type: Grant
    Filed: November 2, 2005
    Date of Patent: April 17, 2012
    Assignee: United Technologies Corporation
    Inventors: Viktor A. Tymashov, Oleg L. Zhdanov, Sergiy I. Ryabenko, Andriy A. Tsepkalov, Steven M. Burns
  • Publication number: 20110115362
    Abstract: An ion-generating device includes a discharge electrode and an induction electrode. The discharge electrode has a needle-like tip. The induction electrode has a circular through hole. The tip of the discharge electrode penetrates the through hole of the induction electrode, and protrudes upward with respect to an upper surface of the induction electrode.
    Type: Application
    Filed: June 30, 2009
    Publication date: May 19, 2011
    Inventor: Yoshinori Sekoguchi
  • Patent number: 7695552
    Abstract: In an ionizer composed of an electrode needle cartridge and a main body block, the electrode needle cartridge is provided with an electrode needle for generating an ion, a high voltage generating device for applying high voltage to the electrode needle, and a receiving connector for connecting a feeding connector, and the main body block is provided with an air-blowing outlet serving as an electrode needle housing portion, an air passing-through hole for supplying air to the air-blowing outlet, and a connecting port for connecting an air piping. The electrode needle cartridge is configured such that when the electrode needle cartridge and the main body block are connected or separated, the electrode needle is inserted into or removed from the air-blowing outlet from a rear end portion side of the air-blowing outlet.
    Type: Grant
    Filed: January 16, 2008
    Date of Patent: April 13, 2010
    Assignee: SMC Corporation
    Inventors: Toshio Sato, Gen Tsuchiya
  • Patent number: 7569837
    Abstract: It is a technical challenge to provide a small-sized ion source excellent in operability.
    Type: Grant
    Filed: July 20, 2007
    Date of Patent: August 4, 2009
    Assignee: Kyoto Institute of Technology
    Inventors: Nishino Shigehiro, Ono Ryoichi
  • Patent number: 7497898
    Abstract: Positive and negative electrode needles, an air-blowing outlet, and a protection cover for covering these electrode needles and the air-blowing outlet are attached to an electrode cartridge which is attached to a housing, and an air-blowing hole positioned in front of the air-blowing outlet in a concentric manner therewith, for blowing out air from the air-blowing outlet toward the outside, and two air-flowing-out holes positioned in a concentric manner with the respective positive and negative electrode needles, and respectively surrounding outer peripheries of respective tip end portions of respective electrode needles via respective gaps for flowing out the air are formed in the protection cover.
    Type: Grant
    Filed: October 23, 2007
    Date of Patent: March 3, 2009
    Assignee: SMC Corporation
    Inventors: Toshio Sato, Satoshi Suzuki, Takashi Yasuoka
  • Patent number: 7482749
    Abstract: There is disclosed a gas discharge apparatus that is adaptive for reducing a discharge voltage as well as increasing its brightness and luminescence efficiency. In a gas discharge apparatus according to an embodiment of the present invention, a discharge gas injected into the discharge space includes a hydrogen group isotope gas in a mixture ratio of 0.01%˜2.0%.
    Type: Grant
    Filed: June 27, 2005
    Date of Patent: January 27, 2009
    Assignee: LG. Electronics Inc.
    Inventor: Sung Yong Ahn
  • Patent number: 7465340
    Abstract: Parts-attaching grooves are formed at both side surfaces of an ionizer main body, and an auxiliary member for extending parts is detachably latched to the parts-attaching grooves. Parts, such as sensors, filters, and so forth are extended by means of the auxiliary member. The aforementioned parts attaching grooves are constructed such that a lower side groove wall is slanting in a gradually outside-down manner toward a groove opening side, and further the auxiliary member includes a projection edge for latching, at a tip end of left and right side walls, and the auxiliary member is attached to the aforementioned ionizer main body by means of elastically latching the projection edge to the aforementioned parts-attaching groove.
    Type: Grant
    Filed: November 29, 2006
    Date of Patent: December 16, 2008
    Assignee: SMC Corporation
    Inventors: Toshio Sato, Satoshi Suzuki, Gen Tsuchiya
  • Patent number: 7459704
    Abstract: Ion sources and methods for generating molecular ions in a cold operating mode and for generating atomic ions in a hot operating mode are provided. In some embodiments, first and second electron sources are located at opposite ends of an arc chamber. The first electron source is energized in the cold operating mode, and the second electron source is energized in the hot operating mode. In other embodiments, electrons are directed through a hole in a cathode in the cold operating mode and are directed at the cathode in the hot operating mode. In further embodiments, an ion beam generator includes a molecular ion source, an atomic ion source and a switching element to select the output of one of the ion sources.
    Type: Grant
    Filed: November 8, 2005
    Date of Patent: December 2, 2008
    Assignee: Varian Semiconductor Equipment Associates, Inc.
    Inventors: Joseph C. Olson, Anthony Renau, Donna L. Smatlak, Kurt Deckerlucke, Paul Murphy, Alexander S. Perel, Russell J. Low, Peter Kurunczi
  • Patent number: 7368727
    Abstract: Ion source and method of making and sharpening. The ion source is a single crystal metal conductor having a substantially conical tip portion with substantial rotational symmetry. The tip portion terminates with a tip radius of curvature in the range of 50–100 nanometers. The ion source is made by electrochemical etching so that a conical tip of a selected geometry is formed. The ion source is then sharpened to provide a source of ions from a volume near the size of a single atom. Further, this ion source makes possible a stable and practical light ion microscope which will have higher resolution than existing scanning electron microscopes and scanning metal-ion microscopes.
    Type: Grant
    Filed: October 15, 2004
    Date of Patent: May 6, 2008
    Assignee: ALIS Technology Corporation
    Inventor: Billy W. Ward
  • Patent number: 7238952
    Abstract: A metal ion emission device for emitting a metal ion by applying voltage to a molten liquid metal includes a needle-like part having an internal opening in which the liquid metal can be moved. The needle-like part has a first opening for supplying the liquid metal to the opening and a second opening for emitting the liquid metal as a metal ion.
    Type: Grant
    Filed: November 16, 2004
    Date of Patent: July 3, 2007
    Assignee: Canon Kabushiki Kaisha
    Inventor: Mitsuru Ohtsuka
  • Patent number: 7165458
    Abstract: A thermal conductivity type pressure gauge comprises a gauge head (2) being rotatably mountable in a vessel whose environmental pressure is to be measured and an elongate electrical filament (6) mounted in the gauge head, the gauge head (2) having an inlet where through the electrical filament is exposed to the environmental pressure within the vessel and the filament (6) having directional component lengths in two orthogonal axes, one of the orthogonal axes X—X being parallel to the axis of rotation of the gauge head (2).
    Type: Grant
    Filed: June 6, 2003
    Date of Patent: January 23, 2007
    Assignee: The BOC Group plc
    Inventors: Kenneth George Packer, Matthew Key
  • Patent number: 6921906
    Abstract: A rotating field mass spectrometer includes an ionizing structure having a pair of conductive electrodes located closer to one another than the mean free path of the gas being ionized, and a rotating field mass spectrometer part for analyzing ions produced by the ionizing structure. The membrane may include a supporting portion, and a relatively thin non-supporting portion where the ions are formed.
    Type: Grant
    Filed: March 25, 2003
    Date of Patent: July 26, 2005
    Assignee: California Institute of Technology
    Inventors: Frank T. Hartley, Steven J. Smith
  • Patent number: 6914386
    Abstract: The invention provides a system and method for controlling a source of liquid metal ions, the source comprises a tip a first electrode and a second electrode, the method includes the steps of: (i) maintaining the first electrode at a first voltage level range and maintaining the second voltage at a second voltage range, such as to extract metal ions formed on a tip of the source, during an active mode of operation of the source; and (ii) maintaining the first electrode at a third voltage level range and maintaining the second voltage at a fourth voltage level range, such as to substantially reduce an extraction of metal ions from the tip, during an idle mode of operation of the source. The third voltage level range and, alternatively or additionally, the fourth voltage level ranges does not include zero voltage level. The first voltage level range differs than the third voltage level range.
    Type: Grant
    Filed: September 22, 2003
    Date of Patent: July 5, 2005
    Assignee: Applied Materials Israel, Ltd.
    Inventor: Asher Pearl
  • Patent number: 6770353
    Abstract: The invention concerns co-deposited films with nano-columnar structures. A film of the invention is formed upon a substrate, and includes a nano-columnar structure of a first material and a co-deposited second material.
    Type: Grant
    Filed: January 13, 2003
    Date of Patent: August 3, 2004
    Assignee: Hewlett-Packard Development Company, L.P.
    Inventors: Peter Mardilovich, Alexander Govyadinov, David Neiman, Gregory S Herman, David Champion, James O'Neil
  • Patent number: 6661014
    Abstract: An oxygen ion containing plasma is generated using a hot filament ion source. The oxygen ions in the plasma come from an oxide source (e.g., a metal oxide) which has a lower free energy of formation than that of the filament metal oxide (e.g., WO3) at the operating temperatures of the ion source. Consequently, oxidation of the filament and other metal components of the arc chamber is limited, or even prevented. Thus, the invention can advantageously lead to longer filament lives as compared to certain conventional processes that generate oxygen plasmas using hot filament sources.
    Type: Grant
    Filed: March 12, 2002
    Date of Patent: December 9, 2003
    Assignee: Varian Semiconductor Equipment Associates, Inc.
    Inventor: Jaime M. Reyes
  • Patent number: 6642526
    Abstract: A field ionizing element formed of a membrane that houses electrodes therein that are located closer to one another than the mean free path of the gas being ionized. The membrane includes a supporting portion, and a non supporting portion where the ions are formed. The membrane may be used as the front end for a number of different applications including a mass spectrometer, a thruster, an ion mobility element, or an electrochemical device such as a fuel cell.
    Type: Grant
    Filed: June 25, 2002
    Date of Patent: November 4, 2003
    Assignee: Ionfinity LLC
    Inventor: Frank T. Hartley
  • Publication number: 20020113535
    Abstract: A microprocessor may be switchable between a normal mode and a test mode for performing a test program and may include a central processing unit (CPU) for saving contextual data in a stack of the microprocessor at the time of switching to the test mode. The CPU may deliver, at the beginning of the test program and on an input/output port, contextual data present in the stack beginning with the top of the stack. The CPU may also decrement a stack pointer by a value corresponding to a number of contextual data delivered.
    Type: Application
    Filed: November 28, 2001
    Publication date: August 22, 2002
    Applicant: STMicroelectronics S.A.
    Inventors: Franck Roche, Thierry Bouquier
  • Patent number: 6346768
    Abstract: A low energy ion gun for ion beam processing. The ion gun includes a plasma chamber having an open ended, conductive, non-magnetic body, a first end of which is closed by a flat or minimally dished dielectric member and with electrodes at a second end thereof opposite the first end. The ion gun also has primary magnets arranged around the body for trapping electrons adjacent the wall of the plasma chamber in use of the ion gun and an r.f. induction device. The electrodes include multi-aperture grids arranged for connection to respective positive potential sources and positioned to contact the plasma in the plasma chamber. The apertures of the grids are aligned so that particles emerging from an aperture of a first one of the grids are accelerated through corresponding apertures of the other grids in the form of a beamlet. A plurality of beamlets forms a beam.
    Type: Grant
    Filed: June 7, 1999
    Date of Patent: February 12, 2002
    Assignee: Nordiko Limited
    Inventor: Gary Proudfoot
  • Patent number: 6033924
    Abstract: A method for fabricating a field emission device (200) includes the steps of forming on the surface of a substrate (110) a cathode (112), forming on the cathode (112) a dielectric layer (114), forming an emitter well (115) in the dielectric layer (114), forming within the emitter well (115) an electron emitter structure (118) having a surface (123), forming on a portion of the dielectric layer (114) a gate electrode (116), depositing on the dielectric layer (114) a sacrificial layer (210), thereafter depositing on the surface (123) of the electron emitter structure (118) a coating material (220, 320, 420) that has an emission-enhancing material, and then removing the sacrificial layer (210).
    Type: Grant
    Filed: July 25, 1997
    Date of Patent: March 7, 2000
    Assignee: Motorola, Inc.
    Inventors: Sung P. Pack, Babu R. Chalamala
  • Patent number: 5864199
    Abstract: Electron beam emitting filaments having a tip with a radius of curvature less than about 50 .ANG. are produced using focused ion beam milling. In one embodiment, platinum is deposited on a tungsten loop electron beam filament and sharpened using focused ion beam milling to a radius of curvature less than about 50 .ANG..
    Type: Grant
    Filed: August 18, 1997
    Date of Patent: January 26, 1999
    Assignee: Advanced Micro Devices, Inc.
    Inventors: Roger L. Alvis, Janice Gray, Bryan Tracy
  • Patent number: 5602441
    Abstract: A vacuum ionization gauging tube, particularly a Bayard-Alpert (B-A) type vacuum ionization gauging tube, has a firmly compact construction, and provides the capabilities for minimizing outgassing gases and measuring pressures accurately without affecting the ultimate pressure range. The B-A vacuum ionization gauging tube includes a filament having a total surface area of between 6 mm.sup.2 and 20 mm.sup.2, a grid formed like a coil from a 0.1 mm to 0.3 mm diameter metal wire, the coil having a diameter of 5 mm to 7 mm and a length of 15 mm to 20 mm and across which it can be energized, an ion collector electrode having substantially the same length as the filament, and a metal envelope for enclosing the above electrode elements and which is maintained at a potential lower than that of the filament. The grid coil has a winding pitch of between 1.5 mm and 2.5 mm. The filament and grid are spaced apart from each other by the distance of between 2 mm and 4 mm.
    Type: Grant
    Filed: August 26, 1992
    Date of Patent: February 11, 1997
    Assignee: Anelva Corporation
    Inventors: Nobuharu Ohsako, Toshio Kikuchi, Wakao Watanabe
  • Patent number: 5537005
    Abstract: Plasma-cathode electron gun structures capable of operation in low-pressure, e.g., <5.times.10.sup.-3 Torr, ionizable gas environments are disclosed. They utilize a thermionic emitter within an enclosure with a partially transparent electrode defining a plasma face. Spaced anodes are disposed adjacent the electrode to extract an electron beam from the plasma face. A magnetic system forms an inward directed field, and a portion of the plasma electrons are directed through this field to enhance ionization efficiency.
    Type: Grant
    Filed: May 13, 1994
    Date of Patent: July 16, 1996
    Assignee: Hughes Aircraft
    Inventors: Dan M. Goebel, Robert W. Schumacher
  • Patent number: 5521389
    Abstract: A solid state cesium ion gun comprises an ion emission pellet, a pellet heating mechanism, a replaceable ion source unit, ion extraction electrodes, and a self-supporting feedthrough flange. The ion emission pellet is capable of emitting positive cesium ions. One end of the pellet is sputter coated with a thin film of porous tungsten (cathode) from which ions are emitted. The other end of the pellet (anode) is coated with platinum which enables application of a bias to the pellet to direct the cesium ions toward the emitting electrode. The area of the anode electrode determines the life of the ion source. The ion emission pellet is heated to 1000.degree. C. and is not in contact with the beam forming electrode so as to minimize the heat losses. A thin tantalum or molybdenum tube is used to enclose the pellet and minimizes heat conduction losses. The ion gun includes a replaceable ion source unit and a mountable gun unit which mounts extraction electrodes.
    Type: Grant
    Filed: March 21, 1995
    Date of Patent: May 28, 1996
    Inventor: Seong I. Kim
  • Patent number: 5296713
    Abstract: An ion source device includes an electron generating chamber detachably combined with an electron attraction electrode and an ion generating chamber through insulating members. Hooks are projected from both sides of the electron generating chamber. A holder plate is arranged under the ion generating chamber with an insulating member interposed between them. A fixing member is arranged under the holder plate. The fixing member includes a pusher supported by coned disc springs and this pusher of the fixing member is fitted into a recess on the underside of the holder plate and struck against the top of the recess. A pair of holder members are arranged along both sides of the device. The holder members are detachably engaged with the hooks of the electron generating chamber at the upper portion thereof and also detachably engaged with the fixing member at the lower portion thereof.
    Type: Grant
    Filed: January 22, 1993
    Date of Patent: March 22, 1994
    Assignee: Tokyo Electron Limited
    Inventor: Hisato Tanaka
  • Patent number: 5235239
    Abstract: Window constructions for use in particle accelerators to separate an evacuated accelerator beam chamber from a gas or liquid filled target area, which window structure enhances cooling of the foil covering the window opening and reduces stresses on the foil. For preferred embodiments, the window opening is shaped and dimensioned to provide high length-to-width aspect ratio and a rectangular shape with rounded corners. The openings should generally be as narrow as possible while still being wide enough to assure efficient transmission of the ion beam. Stresses in the foil is reduced by providing controlled bowing of the portions of the foil covering the window. This may be accomplished by providing some slack in the foil, at least in one dimension, but is preferably accomplished by pressing the foil between mating curved surfaces selectively extending from the edges of the window openings, resulting in the desired bow in the foil in the window area.
    Type: Grant
    Filed: June 7, 1991
    Date of Patent: August 10, 1993
    Assignee: Science Research Laboratory, Inc.
    Inventors: Jonah H. Jacob, Allen M. Flusberg, Barbara J. Hughey, Ruth Shefer, Robert Klinkowstein
  • Patent number: 5198718
    Abstract: A filamentless (without a heated cathode) ion source for thin film processing and surface modification. The ion source comprises a plasma chamber which includes a wall defining an evacuable chamber having a first end and a second end, with a dielectric member extending across the first end of the evacuable chamber. A gas inlet admits a plasma forming gas into the chamber. An RF emitter is positioned adjacent to the dielectric member for inductively generating a plasma in the gas in the plasma chamber during use of the ion source. A control grid structure is provided for extracting ions from plasma in the plasma chamber, and include a first grid connected to a positive voltage source and a second grid connected to a negative voltage source, to produce an acceleration field for accelerating ions towards and through the second grid of the control grid structure. An ion beam processing apparatus and an ion beam neutralizer incorporating such an ion source are also described.
    Type: Grant
    Filed: May 31, 1991
    Date of Patent: March 30, 1993
    Assignee: Nordiko Limited
    Inventors: Mervyn H. Davis, Gary Proudfoot, Keith H. Bayliss
  • Patent number: 5101110
    Abstract: An ion generator comprises an electron-generating chamber and an ion-generating chamber. Ions are generated by introducing a raw material gas into the ion-generating chamber and irradiating the raw material gas with electrodes generated in the electron-generating chamber. The ions, thus generated, are drawn by ion-collecting electrodes and guided out of the ion-generating chamber through a slit formed in the ion output section of the ion-generating chamber. That corner of the ion-generating chamber which faces the ion-collecting electrodes is curved, and that outer wall of the ion-generating chamber which faces the ion-collecting electrodes is specular. With this structure, an undesirable spark discharge does not easily take place with reference to the ion-collecting electrodes, so that damage to the structural components of the ion generator is suppressed. Further, the ion output section is removable from the main body of the ion-generating chamber.
    Type: Grant
    Filed: November 9, 1990
    Date of Patent: March 31, 1992
    Assignee: Tokyo Electron Limited
    Inventors: Masahiko Matsudo, Akira Koshiishi, Naoki Takayama, Kohei Kawamura
  • Patent number: 5038082
    Abstract: A vacuum switch apparatus has an electrically insulating vacuum enclosure which is evacuated to a vacuum degree of 2.times.10.sup.-2 Torr or less. One set of anode and cathode electrodes is arranged in the vacuum enclosure, having capacity which permits the flow of a discharge current of at least 1 KA therebetween and being operable to switch the discharge current at least 10.sup.6 shots. A high voltage power supply applies a high voltage of at least 20 KV across the anode and cathode electrodes. An electron beam irradiation unit irradiates an electron beam on the anode electrode through the cathode electrode. A control electrode is arranged between the beam irradiation unit and the cathode electrode, for controlling passage and interception of the electron beam. A control voltage power supply applies a control voltage to the control electrode.
    Type: Grant
    Filed: March 7, 1990
    Date of Patent: August 6, 1991
    Assignee: Hitachi, Ltd.
    Inventors: Hiroshi Arita, Kouzi Suzuki, Hiroyuki Sugawara, Yukio Kurosawa
  • Patent number: 5034612
    Abstract: Ion source methods and apparatus include an ion generating element for providing a reservoir of flowing liquid source material, accelerating elements for providing an electric field around the ion generating element, and shielding elements. The shielding element is constructed from a material including atoms which, if backsputtered onto the ion generating element, do not substantially degrade ion source performance.
    Type: Grant
    Filed: December 3, 1990
    Date of Patent: July 23, 1991
    Assignee: Micrion Corporation
    Inventors: Billy W. Ward, Randall G. Percival
  • Patent number: 5028791
    Abstract: An electron beam excitation ion source comprises a housing having an ion generation chamber therein. A discharge gas and an accelerated electrons are introduced into the ion generation chamber, causing the accelerated electrons to collide against the discharge gas to generate a plasma containing ions in the ion generation chamber. The housing includes an ion extraction port through which the ions are extracted from the ion generation chamber outside the housing and an electron reflecting member exposed in the ion generation chamber to reflect the electrons.
    Type: Grant
    Filed: February 28, 1990
    Date of Patent: July 2, 1991
    Assignee: Tokyo Electron Ltd.
    Inventors: Akira Koshiishi, Kohei Kawamura, Masahiko Matsudo, Naoki Takayama
  • Patent number: 5026997
    Abstract: An ion source for creating an ion beam. The source includes an ionization chamber having one wall that defines a generally elliptical opening for allowing ions to exit the ionization chamber. Use of an elliptical (in section) ion beam has advantages over a rectangular ion beam which allow the integrity of a relatively high current ion beam to be maintained as ions travel to a beam treatment workstation. A dual configuration extraction electrode assembly also provides for a range of extraction energies from a single source.
    Type: Grant
    Filed: November 13, 1989
    Date of Patent: June 25, 1991
    Assignee: Eaton Corporation
    Inventor: Victor M. Benveniste
  • Patent number: 5006715
    Abstract: An ion evaporation source for tin ions is prepared by coating a source element with a wettability enhancing gallium coating, and then loading the source with tin. The tin may be the naturally occurring tin, but can be an enriched tin containing a higher concentration of Sn.sup.120. The source produces a beam having a high fraction of Sn.sup.+ and Sn.sup.++ ions, and a small amount of the ionized wettability coating material. All but the desired ions are readily separated from the beam.
    Type: Grant
    Filed: May 16, 1989
    Date of Patent: April 9, 1991
    Assignee: Hughes Aircraft Company
    Inventors: Peter B. Back, Mark W. Utlaut, William M. Clark, Jr.
  • Patent number: 4994711
    Abstract: A solid electrolyte ion source has an emitting tip which is small enough to concentrate an elecric field from an extraction plate and thereby significantly increase the extracted current density compared to prior solid electrolyte sources. The source is heated to a temperature sufficient to induce a thermionic ion emission from the tip. The ion emission can be varied independent of the extraction field by varying the degree of heating, thereby preserving a constant focused ion beam spot size during changes of beam brightness. The tip preferably has a radius in the approximate range of 1-10 microns. The source can be used for ion-microprobe surface analysis and micro-circuit fabrication applications previously unavailable with solid electrolyte sources.
    Type: Grant
    Filed: December 22, 1989
    Date of Patent: February 19, 1991
    Assignee: Hughes Aircraft Company
    Inventor: Jesse N. Matossian
  • Patent number: 4987346
    Abstract: The invention relates to a particle source with which positive, negative, and neutral particles can be generated and applied on a substrate. The particle source comprises a container (26) in which a gas or gas mixture to be ionized is held. Into this container (26) an electromagnetic wave irradiates which preferably is a microwave. A torus-shaped magnetic field, which is generated with the aid of permanent magnets (32, 33) or electromagnets, simultaneously projects into the container (26). With the aid of a special control grid configuration (38, 39, 40) it becomes possible to draw off positive, negative or neutral particles from the container (26).
    Type: Grant
    Filed: January 18, 1989
    Date of Patent: January 22, 1991
    Assignee: Leybold AG
    Inventors: Werner Katzschner, Stefan Eichholz, Michael Geisler, Michael Jung
  • Patent number: 4965491
    Abstract: A plasma generator according to the invention comprises a chamber (2) at a first potential (V1) filled with a gas at a low pressure and a transparent electrode surface comprised of wires, grid or perforated plate (3) at a second potential (V2) higher than (V1). Thus, an electron (4) present in the chamber will be oscillating on both sides of the transparent electrode surface (3) for providing secondary electrons (11 and 12) which create in turn other secondary electrons (13-14, 15-16). At each occurence of an electron pair, one ion (i1, i2, i3, . . . ) is created.
    Type: Grant
    Filed: March 25, 1987
    Date of Patent: October 23, 1990
    Assignee: Centre National de la Recherche Scientifique
    Inventors: Jacques Menet, Vincent Comparat
  • Patent number: 4954711
    Abstract: This source for charged particles comprises a sharply pointed tip (1) and an aperture (2) in a thin sheet of material. If the point of the tip (1) is made sharp enough, i.e., if it ends in a single atom or a trimer of atoms, the electric field existing between the tip (1) and the aperture (2) will cause a stream of electrons to be emitted from the tip (1), pass the aperture (2) and to continue as a beam (4) of free electrons beyond said aperture (2). The sheet (3) carrying the aperture (2) may, for example, be a carbon foil or a metallic foil, including gold. The distance of the tip (1) from the aperture (2) is in the submicron range, and so is the diameter of said aperture (2). The distance is being held essentially constant by means of a feedback loop system. The divergence of the beam (4) is <2.degree..
    Type: Grant
    Filed: October 27, 1989
    Date of Patent: September 4, 1990
    Assignee: International Business Machines Corporation
    Inventors: Hans-Werner Fink, Roger Morin, Heinz Schmid, Werner Stocker
  • Patent number: 4954750
    Abstract: An air ion emitter has a needle-like emitter coaxially mounted within a cylindrical barrel. The barrel is pivoted and rotatable on the base so that it can be pointed in any direction and angle, as at a collector at opposite plurality. The end of the barrel has venturi slots therein so that air flow induced by the emission of ions is radially inward and then axially out the end to scour the needle point and keep it sharp.
    Type: Grant
    Filed: July 7, 1988
    Date of Patent: September 4, 1990
    Inventors: Albert Barsimanto, Maris Ambats
  • Patent number: 4943718
    Abstract: The invention provides a mass spectrometer comprising an ion source provided with an electron emitting source and magnets which are cooperable to produce a collimated electron beam within the ion source; a mass analyzer; first and second electrodes which cooperate to limit the angular divergence of the ion beam which emerges from the source along the ion beam axis; and magnetic field screens disposed between the first and second electrode means, which reduce the field due to the magnets along the ion beam axis. In this way the mass discrimination introduced by the magnets in prior ion sources is reduced and the accuracy of isotropic ratio measurements is improved.
    Type: Grant
    Filed: February 17, 1989
    Date of Patent: July 24, 1990
    Assignee: VG Instruments Group Limited
    Inventors: Raymond C. Haines, Patrick J. Turner
  • Patent number: 4931700
    Abstract: A cold cathode electron gun utilizes a metallic torus for electrostatic focusing of an electron beam. A nonconductive tube is disposed within and along the axis of the torus. A conductive aerodynamic body electrically connected to the torus forms an annular venturi in the tube and includes a face which serves as a high field emitting surface. High molecular weight gas is introduced into a proximal end of the tube at a stagnation pressure sufficient to produce supersonic flow thereby causing a vacuous gas region adjacent the emitting surface. The torus and emitting surface are driven to a very high negative potential by a Tesla transformer or the like, producing high field emission into the vacuous region. The electric field of the torus produces, from the emitted electrons, an electron beam which issues from the tube into the atmosphere.
    Type: Grant
    Filed: September 2, 1988
    Date of Patent: June 5, 1990
    Inventor: Jay L. Reed