Electrostatic Accelerator Means Patents (Class 315/506)
  • Publication number: 20120256564
    Abstract: A single-ended DC linear accelerator for the generation of high-current, high-energy ion beams of H, D or He includes an ion source located in a high-voltage terminal for the creation of the ion beam, an analyzing magnet to purify the ion beam, an accelerating tube and DC high-voltage power supply for accelerating the ions of interest to high energies and a separate pumping tube that transports the vast majority of the neutral gas from the ion source at high-voltage towards a vacuum pump at ground potential, thereby preventing the adverse influence of increased vacuum pressure inside the accelerating tube to facilitate stable acceleration of high-current beams to high energies in single-ended DC linear accelerators. The resulting high-current accelerator for H, D or He has diverse applications, including ion beam cancer therapy, cyclotron injection, silicon cleaving, ion implantation in semiconductor devices and NRA.
    Type: Application
    Filed: February 8, 2012
    Publication date: October 11, 2012
    Inventor: Dirk Jozef Willem Mous
  • Patent number: 8264173
    Abstract: A method is described wherein the acceleration of a beam of charged particles is achieved using the properties of conductors to limit the penetration of magnetic and electric fields in short times compared to natural time constants. This allows the use of induction electric fields with a Curl localized to a gap to accelerate particles while coupling the accelerated beam to a power supply. Two methods of coupling the particle beam to the power supply are disclosed as exemplary.
    Type: Grant
    Filed: January 9, 2009
    Date of Patent: September 11, 2012
    Assignee: Passport Systems, Inc.
    Inventors: William Bertozzi, Stephen E. Korbly, Robert J. Ledoux
  • Publication number: 20120161673
    Abstract: A particle accelerator may include at least one accelerator cell and a power supply device. The power supply device may provide electrical energy to the accelerator cell via a feed line. With electrical energy received via the feed line, the accelerator cell may generate an electric field for accelerating an electrically charged elementary particle. The power supply device may have a DC current source and a switch arrangement. The power supply device may be designed such that electrical energy provided by the DC circuit source is capacitively buffered, and upon corresponding actuation of the switch arrangement, is provided to the acceleration cell. The switch arrangement may be disposed near the acceleration cell such that the switch arrangement is exposed to ionizing radiation generated by the particle accelerator at least during operation. The DC circuit source may be connected to the switch arrangement via a first cable.
    Type: Application
    Filed: July 23, 2010
    Publication date: June 28, 2012
    Inventors: Oliver Heid, Timothy Hughes
  • Publication number: 20120146554
    Abstract: A d. c. charged particle accelerator comprises accelerator electrodes separated by insulating spacers defining acceleration gaps between adjacent pairs of electrodes. Individually regulated gap voltages are applied across each adjacent pair of accelerator electrodes. In embodiments, the individually regulated gap voltages are generated by electrically isolated alternators mounted on a common rotor shaft driven by an electric motor. Alternating power outputs from the alternators provide inputs to individual regulated d. c. power supplies to generate the gap voltages. The power supplies are electrically isolated and have outputs connected in series across successive pairs of accelerator electrodes. The described embodiment enables an ion beam to be accelerated to high energies and high beam currents, with good accelerator stability.
    Type: Application
    Filed: December 8, 2010
    Publication date: June 14, 2012
    Applicant: TWIN CREEKS TECHNOLOGIES, INC.
    Inventors: Theodore H. Smick, Geoffrey Ryding, William H. Park, Ronald Horner
  • Publication number: 20120146555
    Abstract: A d. c. charged particle accelerator comprises accelerator electrodes separated by insulating spacers defining acceleration gaps between adjacent pairs of electrodes. Individually regulated gap voltages are applied across each adjacent pair of accelerator electrodes. In an embodiment, direct connections are provided to gap electrodes from the stage points of a multistage Cockcroft Walton type voltage multiplier circuit. The described embodiment enables an ion beam to be accelerated to high energies and high beam currents, with good accelerator stability.
    Type: Application
    Filed: July 20, 2011
    Publication date: June 14, 2012
    Applicant: TWIN CREEKS TECHNOLOGIES, INC.
    Inventors: Geoffrey Ryding, Steven Richards, Paul Eide, Theodore H. Smick, Malcolm Barnett
  • Publication number: 20120133306
    Abstract: The present invention relates to waveguides, e.g., waveguides in a dielectricwall accelerator, and to methods for the manufacture thereof. For example, planar contact electronic assemblies may be integrated in a waveguide e.g., a waveguide of an accelerator cell of a dielectricwall accelerator.
    Type: Application
    Filed: July 15, 2010
    Publication date: May 31, 2012
    Inventors: Norbert Seliger, Karl Weidner
  • Publication number: 20120126112
    Abstract: A novel system and methods for accelerating analytes including, without limitation, molecular ions, biomolecules, polymers, nano- and microparticles, is provided. The invention can be useful for increasing detection sensitivity in applications such as mass spectrometry, performing collision-induced dissociation molecular structure analysis, and probing surfaces and samples using accelerated analyte.
    Type: Application
    Filed: February 2, 2012
    Publication date: May 24, 2012
    Applicant: ACADEMIA SINICA
    Inventors: Chung Hsuan Chen, Jung-Lee Lin, Nien-Yeen Hsu, Yi-Sheng Wang
  • Patent number: 8159157
    Abstract: According to certain embodiments, a linear accelerator comprises a nanotube, a particle, and an energy source. The nanotube has a cylindrical shape, and the particle is disposed within the nanotube. The energy source is configured to apply energy to the nanotube to cause the particle to accelerate.
    Type: Grant
    Filed: December 2, 2008
    Date of Patent: April 17, 2012
    Assignee: Raytheon Company
    Inventor: Timothy J. Imholt
  • Patent number: 8111025
    Abstract: Man-portable radiation generation sources and systems that may be carried by hand to a site of interest by one or two people, are disclosed. Methods of use of such sources and systems are also disclosed. Battery operated radiation generation sources, air cooled radiation generation sources, and charged particle accelerators, are also disclosed. A radiation generation source with a target less than 0.20 mm is also disclosed.
    Type: Grant
    Filed: October 14, 2008
    Date of Patent: February 7, 2012
    Assignee: Varian Medical Systems, Inc.
    Inventors: David Whittum, James E. Clayton, George Merdinian
  • Publication number: 20120025741
    Abstract: In a charged particle accelerator, voltage of several tens of kV is applied between accelerating electrodes. In such a case, electric discharge is sometimes generated between the accelerating electrodes. In the charged particle accelerator, part or entirety of the accelerating electrodes is coated with an electric discharge suppressing layer made of ceramics or alloy having a high melting point as compared with metal. When impurity fine particles are accelerated by an electric field and collide with the electrodes, the electric discharge suppressing layer made of ceramics or alloy prevents metal vapor from being easily generated from the electrodes and an ionized plasma from being easily produced, thus suppressing electric discharge between the electrodes.
    Type: Application
    Filed: October 7, 2011
    Publication date: February 2, 2012
    Applicant: Hitachi High-Technologies Corporation
    Inventors: Hiroshi MORITA, Ryozo Takeuchi, Toshiyuki Yokosuka
  • Patent number: 8093603
    Abstract: An organic light emitting diode display includes a substrate, a pixel electrode, a pixel defining film, a light absorbing layer pattern, an organic light emitting layer and a common electrode. The pixel electrode is formed on the substrate, and the pixel defining film formed on the substrate has an opening to expose the pixel electrode. The light absorbing member divides the opening into a plurality of sub-emitting areas within the opening of the pixel defining film. The organic light emitting layer is formed on the pixel electrode, and the common electrode is formed on the organic light emitting layer.
    Type: Grant
    Filed: December 4, 2009
    Date of Patent: January 10, 2012
    Assignee: Samsung Mobile Display Co., Ltd.
    Inventors: Woo-Suk Jung, Soon-Ryong Park, Hee-Seong Jeong, Chul-Woo Jeong, Hee-Chul Jeon, Eun-Ah Kim, Noh-Min Kwak, Joo-Hwa Lee
  • Patent number: 8067907
    Abstract: In a charged particle accelerator, voltage of several tens of kV is applied between accelerating electrodes. In such a case, electric discharge is sometimes generated between the accelerating electrodes. In the charged particle accelerator, part or entirety of the accelerating electrodes is coated with an electric discharge suppressing layer made of ceramics or alloy having a high melting point as compared with metal. When impurity fine particles are accelerated by an electric field and collide with the electrodes, the electric discharge suppressing layer made of ceramics or alloy prevents metal vapor from being easily generated from the electrodes and an ionized plasma from being easily produced, thus suppressing electric discharge between the electrodes.
    Type: Grant
    Filed: February 18, 2009
    Date of Patent: November 29, 2011
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Hiroshi Morita, Ryozo Takeuchi, Toshiyuki Yokosuka
  • Publication number: 20110266981
    Abstract: A charged particle beam generator, a charged particle irradiation system, a method for operating the charged particle beam generator and a method for operating the charged particle irradiation system, which allow a charged particle beam to be injected into a circular accelerator at an arbitrary timing and can reduce an irradiation time and a time for a therapy, are provided while maintaining the lower limit of an operation cycle of a linear accelerator. An accelerator control device controls an operation of a synchrotron on the basis of a beam extraction request signal transmitted from a beam utilization system control device. A control device generates a timing signal notifying the linear accelerator of an injection timing of a next operation cycle of the synchrotron after completion of an extraction process performed by the synchrotron, changes an operation timing of the linear accelerator so that the operation timing of the linear accelerator matches the injection timing.
    Type: Application
    Filed: April 27, 2011
    Publication date: November 3, 2011
    Applicant: Hitachi, Ltd.
    Inventors: Masumi UMEZAWA, Yoshifumi Hojo
  • Patent number: 7999239
    Abstract: Techniques for reducing an electrical stress in a acceleration/deceleration system are disclosed. In one particular exemplary embodiment, the techniques may be realized as an acceleration/deceleration system. The acceleration/deceleration system may comprise an acceleration column including a plurality of electrodes having apertures through which a charged particle beam may pass. The acceleration/deceleration system may also comprise a plurality of voltage grading components respectively electrically coupled to the plurality of electrodes. The acceleration/deceleration system may further comprise a plurality of insulated conductors disposed proximate the plurality of voltage grading components to modify an electrical field about the plurality of voltage grading components.
    Type: Grant
    Filed: January 2, 2008
    Date of Patent: August 16, 2011
    Assignee: Varian Semiconductor Equipment Associates, Inc.
    Inventors: Kasegn D. Tekletsadik, Russell J. Low
  • Patent number: 7884333
    Abstract: A new type of structure for the deflection and crabbing of particle bunches in particle accelerators comprising a number of parallel transverse electromagnetic (TEM)-resonant) lines operating in opposite phase from each other. Such a structure is significantly more compact than conventional crabbing cavities operating the transverse magnetic TM mode, thus allowing low frequency designs.
    Type: Grant
    Filed: September 25, 2008
    Date of Patent: February 8, 2011
    Assignee: Jefferson Science Associates, LLC
    Inventor: Jean Delayen
  • Patent number: 7855361
    Abstract: An ion detector comprises an ion guide with electrodes arranged about a first axis; a positive ion detection device with an ion inlet at a first side of the ion output section offset from and at an angle to the first axis; and a negative ion detection device with an ion inlet at a second side opposite the first side, offset from and at an angle to the first axis. A negative voltage bias applied to the positive ion device accelerates positive ions toward the inlet along a path including a component along a second axis orthogonal to the first axis. A positive voltage bias applied to the negative ion detection device accelerates negative ions toward the inlet along a path that includes a component along the second axis orthogonal to the first axis in a direction generally opposite to the path of the positive ions.
    Type: Grant
    Filed: May 30, 2008
    Date of Patent: December 21, 2010
    Assignee: Varian, Inc.
    Inventor: Urs Steiner
  • Publication number: 20100295485
    Abstract: The present invention relates to a circular particle accelerator capable of modulating the particle beam current exiting the circular particle accelerator. The circular particle accelerator includes: an ion source for generating the particle beam; Dee electrode and counter-Dee electrode separated from each other by gaps for accelerating the particle beam, the counter-Dee electrode being grounded; a generator capable of applying an alternating high voltage to the Dee electrode, so as it is possible to have an electric field between the gaps; means for measuring the current intensity of the particle beam exiting the circular particle accelerator. It also comprises a regulator capable of modulating the Dee electrodes voltage amplitude (VD) by comparing a given set point (I0) of the current intensity of the particle beam and the measured value of the current intensity (I?M) of the particle beam.
    Type: Application
    Filed: October 29, 2007
    Publication date: November 25, 2010
    Inventor: Michel Abs
  • Publication number: 20100289437
    Abstract: An arrangement with radiation cooling of the anode, which avoids the need for complex additional cooling measures, is proposed for an electrostatic ion accelerator arrangement in which the thermal power loss which is not negligible occurs at the anode, which is arranged in an ionization chamber, during operation.
    Type: Application
    Filed: September 12, 2008
    Publication date: November 18, 2010
    Inventor: Norbert Koch
  • Patent number: 7820986
    Abstract: Techniques for controlling a charged particle beam are disclosed. In one particular exemplary embodiment, the techniques may be realized as a charged particle acceleration/deceleration system. The charged particle acceleration/deceleration system may comprise an acceleration column. The acceleration column may comprise a plurality of electrodes having apertures through which a charged particle beam may pass. The charged particle acceleration/deceleration system may also comprise a plurality of resistors electrically coupled to the plurality of electrodes. The charged particle acceleration/deceleration system may further comprise a plurality of switches electrically coupled to the plurality of electrodes and the plurality of resistors, each of the plurality of switches may be configured to be selectively switched respectively in a plurality of operation modes.
    Type: Grant
    Filed: September 13, 2007
    Date of Patent: October 26, 2010
    Assignee: Varian Semiconductor Equipment Associates, Inc.
    Inventors: Piotr R. Lubicki, Russell J. Low, Joseph C. Olson, Anthony Renau
  • Patent number: 7791291
    Abstract: A diamond field emission tip and methods of forming such diamond field emission tips, for use with cathodes that will act as a source of and emit beams of charged particles.
    Type: Grant
    Filed: May 5, 2006
    Date of Patent: September 7, 2010
    Assignee: Virgin Islands Microsystems, Inc.
    Inventor: Jonathan Gorrell
  • Patent number: 7791290
    Abstract: A method and apparatus for modulating a beam of charged particles is described in which a beam of charged particles is produced by a particle source and a varying electric field is induced within an ultra-small resonant structure. The beam of charged particles is modulated by the interaction of the varying electric field with the beam of charged particles.
    Type: Grant
    Filed: September 30, 2005
    Date of Patent: September 7, 2010
    Assignee: Virgin Islands Microsystems, Inc.
    Inventors: Jonathan Gorrell, Mark Davidson, Michael E. Maines, Paul Hart
  • Patent number: 7768187
    Abstract: The invention relates to charged particle beam accelerators, in particular electron beam accelerators, and can be used for physics, chemistry and medicine. The inventive charged particle beam accelerator comprises a metallic shell fitted with a dielectric material layer arranged therein, and a vacuum channel for electron transit embodied along the central symmetry axis of said metallic shell. In addition, the metallic shell is fitted with a ferroelectric material layer arranged therein. Said ferroelectric material layer can be arranged between the metallic shell and the dielectric material layer or in said dielectric material layer. The invention provides an object with a very important property, i.e. said property makes it possible to control the accelerator parameters and regulate the phase balance of the charged particle beam and the wave that accelerates the particles.
    Type: Grant
    Filed: March 2, 2004
    Date of Patent: August 3, 2010
    Inventors: Alexei Dmitrievich Kanareikin, Elizaveta Arkadievna Nenasheva
  • Patent number: 7759883
    Abstract: Electromedical apparatus for intraoperative radiotherapy via a linac. It includes an arm in which, at an extremity thereof, an oscillator is assembled which generates electromagnetic waves, and which supports, at an opposite extremity thereof, a radiating head in which a linac is assembled, emitting at its output an electron beam, supplied by the oscillator through a guiding structure. The apparatus includes a first and a second rotary couplings, respectively including a fixed portion and a mobile portion, endowed with sensors of the angular position of the mobile portions, which support the radiating head on the arm in roll and pitch motion. The guiding structure includes three separate rigid waveguides, of which one at the output of the oscillator and one of input to the linac, and an intermediate one therebetween, which connects them, with the heads of which they are respectively connected through the first and the second rotary couplings.
    Type: Grant
    Filed: October 24, 2007
    Date of Patent: July 20, 2010
    Inventor: Pompilio Gatto
  • Patent number: 7671546
    Abstract: To provide a voltage division resistor for acceleration tube, an acceleration tube, and an accelerator capable of reducing the cost of the acceleration tube and enhancing the operation efficiency.
    Type: Grant
    Filed: August 25, 2005
    Date of Patent: March 2, 2010
    Assignee: Kyoto Institute of Technology
    Inventors: Shigehiro Nishino, Ryoichi Ono
  • Patent number: 7609009
    Abstract: The electrode lengths of a plurality of electrodes linearly arranged in an acceleration cavity are proportional to the velocity of a traveling ion beam. Further, the electrode length is so designated that, in each half of a predetermined cycle in the ion beam direction of travel, the absolute value of a difference, relative to a length that is proportional to the beam traveling velocity is equal to or greater than a value corresponding to the phase width of the traveling ion beam, is provided for electrodes that do not exceed three units and that are fewer than electrodes allotted to half the predetermined cycle.
    Type: Grant
    Filed: December 31, 2007
    Date of Patent: October 27, 2009
    Assignee: Mitsubishi Electric Corporation
    Inventors: Hirofumi Tanaka, Kazuo Yamamoto, Hisashi Harada, Hiromitsu Inoue, Takahisa Nagayama, Nobuyuki Zumoto
  • Patent number: 7594958
    Abstract: A spark management device includes a high voltage power source and a detector configured to monitor a parameter of an electric current provided to a load device. In response to the parameter, a pre-spark condition is identified. A switching circuit is responsive to identification of the pre-spark condition for controlling the electric current provided to the load device so as to manage sparking including, but not limited to, reducing, eliminating, regulating, timing, and/or controlling any intensity of arcs generated.
    Type: Grant
    Filed: August 30, 2005
    Date of Patent: September 29, 2009
    Assignee: Kronos Advanced Technologies, Inc.
    Inventors: Igor A. Krichtafovitch, Vladimir L. Gorobets
  • Publication number: 20090224701
    Abstract: In a charged particle accelerator, voltage of several tens of kV is applied between accelerating electrodes. In such a case, electric discharge is sometimes generated between the accelerating electrodes. In the charged particle accelerator, part or entirety of the accelerating electrodes is coated with an electric discharge suppressing layer made of ceramics or alloy having a high melting point as compared with metal. When impurity fine particles are accelerated by an electric field and collide with the electrodes, the electric discharge suppressing layer made of ceramics or alloy prevents metal vapor from being easily generated from the electrodes and an ionized plasma from being easily produced, thus suppressing electric discharge between the electrodes.
    Type: Application
    Filed: February 18, 2009
    Publication date: September 10, 2009
    Inventors: Hiroshi MORITA, Ryozo Takeuchi, Toshiyuki Yokosuka
  • Patent number: 7560716
    Abstract: A beam of charged particles (e.g., an electron beam) from a charged particle source can be selectively applied to a pair of electrodes. For example, the charged particles can be electrons that are directed toward a first electrode when the charge difference between the electrodes is in one state and directed toward the second electrode when the charge difference between the electrodes is in another state. The electrodes are configured so that the beam of charged particles oscillates between the first and second electrodes.
    Type: Grant
    Filed: September 22, 2006
    Date of Patent: July 14, 2009
    Assignee: Virgin Islands Microsystems, Inc.
    Inventors: Jonathan Gorrell, Mark Davidson
  • Patent number: 7521674
    Abstract: Apparatus and method for trapping uncharged multi-pole particles comprises a bound cavity for receiving the particles, and a multiplicity of electrodes coupled to the cavity for producing an electric field in the cavity. In a preferred embodiment, the electrodes are configured to produce in the electric field potential both a multi-pole (e.g., dipole) component that aligns the particles predominantly along an axis of the cavity and a higher order multi-pole (e.g., hexapole) component that forms a trapping region along the axis. In one embodiment, the electrodes and/or the particles are cooled to a cryogenic temperature.
    Type: Grant
    Filed: September 1, 2007
    Date of Patent: April 21, 2009
    Assignee: Alcatel-Lucent USA Inc.
    Inventor: Stanley Pau
  • Publication number: 20090085504
    Abstract: Techniques for controlling a charged particle beam are disclosed. In one particular exemplary embodiment, the techniques may be realized as a charged particle acceleration/deceleration system. The charged particle acceleration/deceleration system may comprise an accelerator column, which may comprise a plurality of electrodes. The plurality of electrodes may have apertures through which a charged particle beam may pass. The charged particle acceleration/deceleration system may also comprise a voltage grading system. The voltage grading system may comprise a first fluid reservoir and a first fluid circuit. The first fluid circuit may have conductive connectors connecting to at least one of the plurality of electrodes. The voltage grading system may further comprise fluid in the first fluid circuit. The fluid may have an electrical resistance.
    Type: Application
    Filed: October 1, 2007
    Publication date: April 2, 2009
    Applicant: Varian Semiconductor Equipment Associates, Inc.
    Inventors: Piotr R. Lubicki, Russell J. Low, Stephen E. Krause, Frank Sinclair
  • Patent number: 7497893
    Abstract: A method for handling a fluid may be incorporated into the operation of, for example, a corona discharge device and an electric power supply. Such a corona discharge device typically includes at least one corona discharge electrode and at least one collector electrode positioned proximate each other so as to provide a total inter-electrode capacitance within a predetermined range. The electric power supply is connected to supply an electric power signal to said corona discharge and collector electrodes so as to cause a corona current to flow between the corona discharge and collector electrodes. A relationship between alternating and direct (or constant, non-time varying) components of the voltage may be expressed as (Vac/Vdc)?(Iac/Idc).
    Type: Grant
    Filed: October 16, 2006
    Date of Patent: March 3, 2009
    Assignee: Kronos Advanced Technologies, Inc.
    Inventor: Igor A. Krichtafovitch
  • Patent number: 7498588
    Abstract: A method of producing an ion beam in a tandem accelerator, the method includes the acts of insulating, in a cavity containing an insulating gas under pressure, a beam tube having first and second ends and a terminal situated between the first and second ends; seating, using a load lock valve, the insulating gas under pressure; generating an operating voltage using a first voltage source situated outside the cavity when the operating voltage is less than or equal to a threshold value; generating the operating voltage using a second voltage source situated inside the cavity when the operating voltage is greater than the threshold value; coupling the terminal to the first or second voltage sources; generating, using a particle source, an ion beam; and accelerating the ion beam in a first and second parts of the beam tube.
    Type: Grant
    Filed: May 7, 2008
    Date of Patent: March 3, 2009
    Assignee: International Business Machines Corporation
    Inventors: Michael S. Gordon, Carl Emil Bohnenkamp
  • Publication number: 20090039804
    Abstract: To provide a voltage division resistor for acceleration tube, an acceleration tube, and an accelerator capable of reducing the cost of the acceleration tube and enhancing the operation efficiency.
    Type: Application
    Filed: August 25, 2005
    Publication date: February 12, 2009
    Applicant: KYOTO INSTITUTE OF TECHNOLOGY
    Inventors: Shigehiro Nishino, Ryoichi Ono
  • Patent number: 7446490
    Abstract: The invention relates to a cyclotron which can produce a beam of accelerated charged particles that are intended for the irradiation of at least one target (200). The inventive cyclotron consists of a magnetic circuit which essentially comprises: an electromagnet with at least two poles (1, 1?), namely an upper pole (1) and a lower pole (1?), which are disposed symmetrically in relation to a mid-plane (110) which is perpendicular to the central axis (100) of the cyclotron and which are separated by a gap (120) containing the circulating charged particles and return flux (2) in order to close the aforementioned magnetic circuit; and a pair of main induction coils (5, 5?) which are used to create an essentially-constant main induction field in the gap between poles 1 and 1?.
    Type: Grant
    Filed: November 14, 2003
    Date of Patent: November 4, 2008
    Assignee: Ion Beam Appliances S.A.
    Inventors: Yves Jongen, Frédéric Genin
  • Patent number: 7400094
    Abstract: A device for generating a particle beam includes a particle source, and a structure having a first section and a second section, the first section coupled to the particle source, the first section having a first power input, and the second section having a second power input, wherein the first section is configured to produce a particle beam having a first energy E1, and the second section is configured to increase or decrease the first energy E1 by an amount E2, the absolute value of E2 being less than E1.
    Type: Grant
    Filed: August 25, 2005
    Date of Patent: July 15, 2008
    Assignee: Varian Medical Systems Technologies, Inc.
    Inventor: Gard E. Meddaugh
  • Patent number: 7355357
    Abstract: A plasma accelerator is provided. The plasma accelerator includes a chamber having a closed top, an opened bottom and a lateral surface, a first coil section comprising a plurality of coils that are connected to one another in series and are wound around the lateral surface of the chamber in opposite directions, and a second coil section comprising a plurality of coils that are wound around the lateral surface of the chamber between coils of the first coil section in opposite directions. Accordingly, it is possible to make the mutual inductance between the coils small, to accurately adjust levels and phase differences of currents to be applied to the coils, and also to simplify the driving circuit.
    Type: Grant
    Filed: April 27, 2006
    Date of Patent: April 8, 2008
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Won-taek Park, Vasily Pashkovski, Yuri Tolmachev
  • Patent number: 7355188
    Abstract: A technique for uniformity tuning in an ion implanter system is disclosed. In one particular exemplary embodiment, the technique may be realized as a method for ion beam uniformity tuning. The method may comprise generating an ion beam in an ion implanter system. The method may also comprise tuning one or more beam-line elements in the ion implanter system to reduce changes in a beam spot of the ion beam when the ion beam is scanned along a beam path. The method may further comprise adjusting a velocity profile for scanning the ion beam along the beam path such that the ion beam produces a substantially uniform ion beam profile along the beam path.
    Type: Grant
    Filed: December 15, 2005
    Date of Patent: April 8, 2008
    Assignee: Varian Semiconductor Equipment Associates, Inc.
    Inventors: Joseph C. Olson, Jonathan Gerald England, Morgan D. Evans, Douglas Thomas Fielder, Gregg Alexander Norris, Shengwu Chang, Damian Brennan, William Gray Callahan
  • Patent number: 7262564
    Abstract: An electrostatic fluid acceleration and method of operation thereof includes at least two synchronously powered stages. A single power supply or synchronized and phase controlled power supplies provide high voltage power to each of the stages such that both the phase and amplitude of the electric power applied to the corresponding electrodes are aligned in time. The frequency and phase control allows neighboring stages to be closely spaced at a distance of from 1 to 2 times an inter-electrode distance within a stage, and, in any case, minimizing or avoiding production of a back corona current from a corona discharge electrode of one stage to an electrode of a neighboring stage. Corona discharge electrodes of neighboring stages may be horizontally aligned, complementary collector electrodes of all stages being similarly horizontally aligned between and horizontally offset from the corona discharge electrodes.
    Type: Grant
    Filed: March 23, 2004
    Date of Patent: August 28, 2007
    Assignee: Kronos Advanced Technologies, Inc.
    Inventors: Igor A. Krichtafovitch, Vladimir L. Gorobets
  • Patent number: 7253423
    Abstract: A technique for uniformity tuning in an ion implanter system is disclosed. In one particular exemplary embodiment, the technique may be realized as a method for uniformity tuning in an ion implanter system. The method may comprise measuring an ion beam at a plurality of predetermined locations along a beam path. The method may also comprise calculating an ion beam profile along the beam path based at least in part on the ion beam measurements at the plurality of predetermined locations. The method may further comprise determining a desired velocity profile along the beam path based at least in part on the calculated ion beam profile such that the ion beam, when scanned according to the desired velocity profile, produces a desired ion beam profile along the beam path.
    Type: Grant
    Filed: May 24, 2005
    Date of Patent: August 7, 2007
    Assignee: Varian Semiconductor Equipment Associates, Inc.
    Inventors: Shengwu Chang, Joseph C. Olson, Damian Brennan
  • Patent number: 7248003
    Abstract: An electrostatic fluid accelerator includes a first number of corona electrodes and a second number of accelerating electrodes spaced apart from and parallel to adjacent ones of the corona electrodes. An electrical power source is connected to supply the corona and accelerating electrodes with an operating voltage to produce a high intensity electric field in an inter-electrode space between the corona electrodes and the accelerating electrodes. The accelerating electrodes may be made of a high electrical resistivity material, each of the electrodes having mutually perpendicular length and height dimension oriented transverse to a desired fluid flow direction and a width dimension oriented parallel to the desired fluid flow direction.
    Type: Grant
    Filed: February 1, 2005
    Date of Patent: July 24, 2007
    Assignee: Kronos Advanced Technologies, Inc.
    Inventor: Igor A. Krichtafovitch
  • Patent number: 7176470
    Abstract: A technique for high-efficiency ion implantation is disclosed. In one particular exemplary embodiment, the technique may be realized as an apparatus for high-efficiency ion implantation. The apparatus may comprise one or more measurement devices to determine a shape of an ion beam spot in a first dimension and a second dimension. The apparatus may also comprise a control module to control movement of the ion beam across a substrate according to a two-dimensional velocity profile, wherein the two-dimensional velocity profile is determined based at least in part on the shape of the ion beam spot, and wherein the two-dimensional velocity profile is tunable to maintain a uniform ion dose and to keep the ion beam spot from going fully off the substrate surface.
    Type: Grant
    Filed: December 22, 2005
    Date of Patent: February 13, 2007
    Assignee: Varian Semiconductor Equipment Associates, Inc.
    Inventors: Morgan D. Evans, Douglas Thomas Fielder, Gregg Alexander Norris
  • Patent number: 7098615
    Abstract: An interdigital (Wideröe) linear accelerator employing drift tubes, and associated support stems that couple to both the longitudinal and support stem electromagnetic fields of the linac, creating rf quadrupole fields along the axis of the linac to provide transverse focusing for the particle beam. Each drift tube comprises two separate electrodes operating at different electrical potentials as determined by cavity rf fields. Each electrode supports two fingers, pointing towards the opposite end of the drift tube, forming a four-finger geometry that produces an rf quadrupole field distribution along its axis. The fundamental periodicity of the structure is equal to one half of the particle wavelength ??, where ? is the particle velocity in units of the velocity of light and ? is the free space wavelength of the rf. Particles are accelerated in the gaps between drift tubes. The particle beam is focused in regions inside the drift tubes.
    Type: Grant
    Filed: April 28, 2004
    Date of Patent: August 29, 2006
    Assignee: Linac Systems, LLC
    Inventors: Donald A. Swenson, W. Joel Starling
  • Patent number: 7053565
    Abstract: An electrostatic fluid acceleration and method of operation thereof includes at least two synchronously powered stages with final or rear-most electrodes of one stage maintained at substantially the same instantaneous voltage as the immediately adjacent initial or forward-most electrodes of a next stage in an airflow direction. A single power supply or synchronized and phase controlled power supplies provide high voltage power to each of the stages such that both the phase and amplitude of the electric power applied to the corresponding electrodes are aligned in time. The frequency and phase control allows neighboring stages to be closely spaced at a distance of from 1 to 2 times an inter-electrode distance within a stage, and, in any case, minimizing or avoiding production of a back corona current from a corona discharge electrode of one stage to an electrode of a neighboring stage.
    Type: Grant
    Filed: May 18, 2004
    Date of Patent: May 30, 2006
    Assignee: Kronos Advanced Technologies, Inc.
    Inventors: Igor A. Krichtafovitch, Vladimir L. Gorobets
  • Patent number: 7030576
    Abstract: A Hall effect thruster for propelling spacecraft and satellites includes at least two acceleration channels, each of the channels has a closed end and an open end, and a plurality of flux guides adjacent each of the channels. The plurality of flux guides includes an innermost flux guide, an outermost flux guide, and at least one intermediate flux guide. Each intermediate flux guide helps provide a magnetic field to each of two adjacent acceleration channels.
    Type: Grant
    Filed: December 2, 2003
    Date of Patent: April 18, 2006
    Assignee: United Technologies Corporation
    Inventors: John B. McVey, Andrew S. Perrucci, Edward J. Britt
  • Patent number: 7026635
    Abstract: Methods, and materials made by the methods, are provided herein for treating materials with a particle beam processing device. According to one illustrative embodiment, a method for treating a material with a particle beam processing device is provided that includes: providing a particle beam generating assembly including at least one filament for creating a plurality of particles; applying an operating voltage greater than about 110 kV to the filament to create the plurality of particles; causing the plurality of particles to pass through a thin foil having a thickness of about 10 microns or less; and treating a material with the plurality of particles.
    Type: Grant
    Filed: July 31, 2003
    Date of Patent: April 11, 2006
    Assignee: Energy Sciences
    Inventors: Imtiaz Rangwalla, Harvey Clough, George Hannafin
  • Patent number: 7012386
    Abstract: An RF window and a method of manufacture of the RF window are provided. The RF window of the invention has very low reflected RF power. The RF window includes a center sleeve assembly including a ceramic disc mounted within a copper sleeve. The ceramic disc has opposed surfaces, a ceramic surface coating is applied to each of the opposed surfaces. The ceramic surface coatings are selected for a particular application of the RF window. A pair of end assemblies is removably assembled with the center sleeve assembly. An end assembly mating face is arranged for adjustable slip fit engagement within the copper sleeve of the center sleeve assembly to define a respective cavity on opposed sides of the ceramic disc with the mating face positioned at an adjusted position. An intermediary ring is fixedly secured to the end assembly with the mating face at the adjusted position.
    Type: Grant
    Filed: October 22, 2004
    Date of Patent: March 14, 2006
    Assignee: The University of Chicago
    Inventors: Steve W. Berg, George A. Goeppner, Arthur E. Grelick, John Hoyt, Yoon W. Kang, Wayne Michalek, Terry L. Smith, William Yoder
  • Patent number: 7005809
    Abstract: Some embodiments include operation of an accelerator waveguide to output first particles from a tuned end cavity of the accelerator waveguide at a first energy, detuning of the end cavity, and operation of the accelerator waveguide to output second particles from the detuned end cavity at a second energy.
    Type: Grant
    Filed: November 26, 2003
    Date of Patent: February 28, 2006
    Assignee: Siemens Medical Solutions USA, Inc.
    Inventors: Kenneth Whitham, Xiaodong Ding
  • Patent number: 6949895
    Abstract: A linear acceleration system comprises one or more accelerating stages along an axis and a unipolar electrostatic quadruple lens in series with the one or more accelerating stages. The unipolar electrostatic quadruple lens focuses an ion beam in a direction transverse to the axis. The unipolar electrostatic quadruple lens includes a switching circuit, a first pair of electrodes, and a second pair of electrodes. The switching circuit controllably connects to ground and a first voltage potential. The electrodes of the first pair are located opposite each other and are connected to the switching circuit. The electrodes of the second pair are also located opposite each other and connected to the switching circuit. The second pair of electrodes are biased to a second voltage potential.
    Type: Grant
    Filed: September 3, 2003
    Date of Patent: September 27, 2005
    Assignee: Axcelis Technologies, Inc.
    Inventors: William F. DiVergilio, Youngzhang Huang
  • Patent number: 6936981
    Abstract: A multiple electron beam pattern generator includes a multiple electron beam source to generate a plurality of electron beams that are modulated according to a pattern. An anode accelerates the electron beams, and then a beam retarding system generates a retarding electric potential about the electron beams to decrease the kinetic energy of the electron beams substantially near a substrate. A beam scanner scans the electron beams across the substrate. A substrate support supports the substrate, and a pattern is generated on the substrate.
    Type: Grant
    Filed: November 8, 2002
    Date of Patent: August 30, 2005
    Assignee: Applied Materials, Inc.
    Inventor: Mark Alan Gesley
  • Patent number: 6919698
    Abstract: An electrostatic fluid accelerator includes a first number of corona electrodes and a second number of accelerating electrodes spaced apart from and parallel to adjacent ones of the corona electrodes. An electrical power source is connected to supply the corona and accelerating electrodes with an operating voltage to produce a high intensity electric field in an inter-electrode space between the corona electrodes and the accelerating electrodes. The accelerating electrodes may be made of a high electrical resistivity material, each of the electrodes having mutually perpendicular length and height dimension oriented transverse to a desired fluid flow direction and a width dimension oriented parallel to the desired fluid flow direction.
    Type: Grant
    Filed: January 28, 2003
    Date of Patent: July 19, 2005
    Assignee: Kronos Advanced Technologies, Inc.
    Inventor: Igor A. Krichtafovitch