Beam Of Atomic Particles Patents (Class 324/71.3)
  • Patent number: 11360125
    Abstract: A method for detecting the position of the mass center of a passing-through beam of electric charges in a duct, having a passage section with a plurality of detection faces directed thereto is presented. The method includes: arranging couples of detecting elements, so that each couple detects a space area divided into two half-areas by an intermediate plane between the detecting elements of the respective couple; obtaining, from each detecting element, a signal thereby produced representing the distance thereof from the mass center to be detected; comparing the signals produced by each detecting element, by obtaining a digital signal showing the greater proximity of the mass center to one of the detecting element of the couple; and composing the digital signals produced by the couples of detecting elements, by identifying the cross-section of the beam of electric charges to which the mass center of the beam electric charges belongs.
    Type: Grant
    Filed: March 6, 2019
    Date of Patent: June 14, 2022
    Assignee: ENEA—AGENZIA NAZIONALE PER LE NUOVE TECNOLOGIE, L'ENERGIA E LO SVILUPPO ECONOMICO
    Inventors: Marcello Artioli, Simone Beozzo, Roberto Guida
  • Patent number: 11324971
    Abstract: A linear accelerator system comprising a source arranged to produce a pulsed beam of charged particles, a linear accelerator string arranged to accelerate the pulsed beam up to a predetermined range of energies, and a pre-acceleration stage interposed between the source and the linear accelerator string and arranged to accelerate the pulsed beam up to an energy suitable for beam insertion into the linear accelerator string and perform bunching of the pulsed beam. An average current detector is arranged to measure an average current in the pulsed beam, the average current detector comprising at least one non-interceptive sensor placed at an input side of the linear accelerator string, downstream of the pre-acceleration stage, the sensor being responsive to the pulsed beam passing thereby.
    Type: Grant
    Filed: March 20, 2019
    Date of Patent: May 10, 2022
    Assignee: ADAM S.A.
    Inventors: Michele Caldara, Matevz Cerv, Roland Moser, Hannes Pavetits, Katarzyna Stachyra, Marina Giunta
  • Patent number: 10914766
    Abstract: A Fast Faraday cup includes a group of electrodes including a ground electrode having a through hole and a collector electrode configured with a blind hole that functions a collector hole. The electrodes are configured to allow a beam (e.g., a non-relativistic beam) to fall onto the ground electrode so that the through hole cuts a beamlet that flies into the collector hole and facilitates measurement of the longitudinal distribution of particle charge density in the beam. The diameters, depths, spacing and alignment of the collector hole and the through hole are controllable to enable the Fast Faraday day cup to operate with a fast response time (e.g., fine time resolution) and capture secondary particles.
    Type: Grant
    Filed: August 13, 2018
    Date of Patent: February 9, 2021
    Assignee: FERMI RESEARCH ALLIANCE, LLC
    Inventors: Ding Sun, Alexander Shemyakin
  • Patent number: 10832606
    Abstract: Disclosed is a display driving device capable of determining whether a display panel is shorted, based on a voltage level shared by data lines. The display driving device may include: a data driving unit configured to provide source driving signals to data lines of a display panel in a data output period, and control the data lines to share charges in a charge sharing period; and a short monitoring unit configured to detect a voltage level shared in the charge sharing period, and compare the voltage level with a reference voltage that varies according to the voltage level to monitor whether the display panel is shorted.
    Type: Grant
    Filed: November 21, 2018
    Date of Patent: November 10, 2020
    Assignee: Silicon Works Co., Ltd.
    Inventors: Young Bok Kim, Beom Rak Choi
  • Patent number: 10565911
    Abstract: A device for detection of a display panel is provided in the embodiments of the disclosure, which is configured to detect signal lines on the display panel. The signal lines at least comprises a plurality of data lines which are divided into N groups; the device comprises: N shorting bars provided within an electrode lead region of the display panel to intersect the plurality of data lines, a plurality of welding pads provided on both sides of the electrode lead region, each of which shorting bars short-circuits one of the N groups of data lines together and connects with two welding pad at both ends thereof respectively, and a switch which is provided between each of the shorting bars and each of the corresponding welding pads connecting with the former on one and the same side of all the shorting bars; and N is a positive integer not less than.
    Type: Grant
    Filed: August 14, 2017
    Date of Patent: February 18, 2020
    Assignees: BOE TECHNOLOGY GROUP CO., LTD., BEIJING BOE DISPLAY TECHNOLOGY CO., LTD
    Inventors: Wei Li, Minghui Ma, Jinhu Cao, Bin Cao, Kwon Namin, Jiaxin Yu, Fengwu Yu, Mian Gao
  • Patent number: 9671443
    Abstract: A device and method of use for measuring the electrical charge of flying insects. The inventive device comprises measuring the charge induced by a flying insect and measuring the average of charge deposited on a metal screen due to the impact of multiple of insects on the screen.
    Type: Grant
    Filed: September 11, 2013
    Date of Patent: June 6, 2017
    Assignee: The United States of America as Represented by the Secretary of the Navy
    Inventor: Jacques C. Bertrand
  • Patent number: 9383460
    Abstract: The present invention relates generally to the field of sensors for beam imaging and, in particular, to a new and useful beam imaging sensor for use in determining, for example, the power density distribution of a beam including, but not limited to, an electron beam or an ion beam. In one embodiment, the beam imaging sensor of the present invention comprises, among other items, a circumferential slit that is either circular, elliptical or polygonal in nature.
    Type: Grant
    Filed: March 14, 2013
    Date of Patent: July 5, 2016
    Assignee: BWXT Nuclear Operations Group, Inc.
    Inventors: Michael D. McAninch, Jeffrey J. Root
  • Patent number: 9184024
    Abstract: A selectable Coulomb aperture in charged particle system comprises a non-magnetic conductive plate with a plurality of holes therein. The plurality of holes has variant sizes or diameters to select different beam currents of primary beam in the charged particle system. The charged particle system may include a charged particle source for emitting a primary beam, a condenser lens for receiving the primary beam and condensing the primary beam, an objective lens for receiving the primary beam and focusing the primary beam on a surface of a specimen. The selectable Coulomb aperture is positioned between the charged particle source and the condenser lens.
    Type: Grant
    Filed: January 24, 2011
    Date of Patent: November 10, 2015
    Assignee: HERMES-MICROVISION, INC.
    Inventor: Zhongwei Chen
  • Publication number: 20150129774
    Abstract: The present invention relates generally to the field of sensors for beam imaging and, in particular, to a new and useful beam imaging sensor for use in determining, for example, the power density distribution of a beam including, but not limited to, an electron beam or an ion beam. In one embodiment, the beam imaging sensor of the present invention comprises, among other items, a circumferential slit that is either circular, elliptical or polygonal in nature. In another embodiment, the beam imaging sensor of the present invention comprises, among other things, a discontinuous partially circumferential slit. Also disclosed is a method for using the various beams sensor embodiments of the present invention.
    Type: Application
    Filed: January 13, 2015
    Publication date: May 14, 2015
    Inventors: Michael D. McAninch, Jeffery J. Root
  • Patent number: 8890506
    Abstract: Techniques for measuring ion beam current, especially for measuring low energy ion beam current, are disclosed. The technique may be realized as an ion beam current measurement apparatus having at least a planar Faraday cup and a voltage assembly. The planar Faraday cup is located close to an inner surface of a chamber wall, and intersects an ion beam path. The voltage assembly is located outside a chamber having the chamber wall. Therefore, by properly adjusting the electric voltage applied on the planar Faraday cup by the voltage assembly, some undesired charged particles may be adequately suppressed. Further, the planar Faraday cup may surround an opening of a non-planar Faraday cup which may be any conventional Faraday cup. Therefore, the whole ion beam may be received and measured well by the larger cross-section area of the planar Faraday cup on the ion beam path.
    Type: Grant
    Filed: September 7, 2011
    Date of Patent: November 18, 2014
    Assignee: Advanced Ion Beam Technology, Inc.
    Inventors: Peter M. Kopalidis, Zhimin Wan
  • Patent number: 8854048
    Abstract: In a particle beam therapy system which scans a particle beam and irradiates the particle beam to an irradiation position of an irradiation subject and has a dose monitoring device for measuring a dose of the particle beam and an ionization chamber smaller than the dose monitoring device, the ionization chamber measuring a dose of a particle beam passing through the dose monitoring device, the dose of the particle beam irradiated by the dose monitoring device is measured; the dose of the particle beam passing through the dose monitoring device is measured by the small ionization chamber; and a correction coefficient of the dose measured by the dose monitoring device corresponding to the irradiation position is found based on the dose of the particle beam measured by the small ionization chamber.
    Type: Grant
    Filed: March 10, 2011
    Date of Patent: October 7, 2014
    Assignee: Mitsubishi Electric Corporation
    Inventors: Toshihiro Otani, Hisashi Harada, Masahiro Ikeda, Kazushi Hanakawa, Taizo Honda
  • Patent number: 8810234
    Abstract: A method of controlling and/or predicting the remaining useful life of an active material actuator, such as a shape memory alloy wire, includes obtaining historical actuation data of an inherent system variable, such as electrical resistance, over a secondary variable, such as time, determining a normal operating envelope having upper and lower bounds based on the data, determining a current profile for a given actuation cycle, and comparing the shape of the current profile to the envelope to determine an out-of-bounds event.
    Type: Grant
    Filed: April 20, 2012
    Date of Patent: August 19, 2014
    Assignee: GM Global Technology Operations LLC
    Inventors: Xiujie Gao, Guillermo A. Herrera, Christopher P. Henry, Geoffrey P. McKnight, Lei Hao, Nancy L. Johnson, Alan L. Browne
  • Patent number: 8803072
    Abstract: An apparatus and method that can measure flux density in-situ under high vacuum conditions includes a means for confining a collection of identical, elemental sensor particles to a volume of space by initial cooling by laser or another method, then confinement in a sensor volume using externally applied magnetic and/or optical fields.
    Type: Grant
    Filed: May 26, 2011
    Date of Patent: August 12, 2014
    Assignee: British Columbia Institute of Technology
    Inventors: James Lawrence Booth, David Erik Fagnan, Bruce George Klappauf, Kirk William Madison, Jicheng Wang
  • Patent number: 8791426
    Abstract: A system for analyzing an electron beam including a circular electron beam diagnostic sensor adapted to receive the electron beam, the circular electron beam diagnostic sensor having a central axis; an annular sensor structure operatively connected to the circular electron beam diagnostic sensor, wherein the sensor structure receives the electron beam; a system for sweeping the electron beam radially outward from the central axis of the circular electron beam diagnostic sensor to the annular sensor structure wherein the electron beam is intercepted by the annular sensor structure; and a device for measuring the electron beam that is intercepted by the annular sensor structure.
    Type: Grant
    Filed: November 1, 2010
    Date of Patent: July 29, 2014
    Assignee: Lawrence Livermore National Security, LLC.
    Inventors: John W. Elmer, Alan T. Teruya
  • Patent number: 8759800
    Abstract: A high-voltage supply unit is provided for a particle beam device. The high-voltage supply unit includes at least one high-voltage cable for feeding a high voltage, and at least one measuring device for measuring the high voltage. The measuring device has at least one first capacitor, and the first capacitor is formed by at least one first section of the high-voltage cable.
    Type: Grant
    Filed: June 14, 2012
    Date of Patent: June 24, 2014
    Assignee: Carl Zeiss Microscopy GmbH
    Inventors: Joerg Fober, Martin Hugelmann
  • Patent number: 8653807
    Abstract: Techniques for ion beam current measurement, especially for measuring low energy ion beam current, are disclosed. In one exemplary embodiment, the techniques may be realized as an ion beam current measurement apparatus has at least a planar Faraday cup and a magnet device. The planar Faraday cup is close to an inner surface of a chamber wall, and may be non-parallel to or parallel to the inner surface. The magnet device is located close to the planar Faraday cup. Therefore, by properly adjusting the magnetic field, secondary electrons, incoming electrons and low energy ions may be adequately suppressed. Further, the planar Faraday cup may surround an opening of an additional Faraday cup being any conventional Faraday cup. Therefore, the whole ion beam may be received and measured well by the larger cross-section area of at least the planar Faraday cup on the ion beam path.
    Type: Grant
    Filed: July 22, 2010
    Date of Patent: February 18, 2014
    Assignee: Advanced Ion Beam Technology, Inc.
    Inventors: Peter M Kopalidis, Zhimin Wan
  • Publication number: 20130057250
    Abstract: Techniques for measuring ion beam current, especially for measuring low energy ion beam current, are disclosed. The technique may be realized as an ion beam current measurement apparatus having at least a planar Faraday cup and a voltage assembly. The planar Faraday cup is located close to an inner surface of a chamber wall, and intersects an ion beam path. The voltage assembly is located outside a chamber having the chamber wall. Therefore, by properly adjusting the electric voltage applied on the planar Faraday cup by the voltage assembly, some undesired charged particles may be adequately suppressed. Further, the planar Faraday cup may surround an opening of an additional Faraday cup being any conventional Faraday cup. Therefore, the whole ion beam may be received and measured well by the larger cross-section area of the planar Faraday cup on the ion beam path.
    Type: Application
    Filed: September 7, 2011
    Publication date: March 7, 2013
    Applicant: ADVANCED ION BEAM TECHNOLOGY, INC.
    Inventors: Peter M. KOPALIDIS, Zhimin WAN
  • Patent number: 8377518
    Abstract: In-situ flux measurement methods, devices, and systems are provided. According to some embodiments, an in-situ molecular flux device generally comprises a electrically conductive container configured to hold a precursor material, a heat source proximate the electrically conductive container to heat the precursor material to release ions such that an ion current is produced; and a current-measuring device in electrical communication with the electrically conductive container to measure the ion current associated with the heated precursor material. Other embodiments are also claimed and described.
    Type: Grant
    Filed: August 15, 2012
    Date of Patent: February 19, 2013
    Assignee: Georgia Tech Research Corporation
    Inventors: W. Alan Doolittle, Alexander G Carver
  • Patent number: 8350556
    Abstract: An integrated optical element and Faraday cup that can measure charged particle beam currents, manipulate light and analyze charged particle beam energy distribution. One boundary of the cup is formed by a lens or other suitable optical element which can be used for manipulating light along the axis of the Faraday cup. The surface of the optical element interior to the cup is coated with a transparent conductor in order to establish the simultaneous functions of taking charged particle beam current measurements, taking energy distribution measurements and manipulating light for such applications as focusing or imaging. A suppressor/blanker/retarder electrode is designed to eliminate spurious current signals that can result from production of secondary electrons by the charged particle beam impinging on the electrode surface.
    Type: Grant
    Filed: January 21, 2010
    Date of Patent: January 8, 2013
    Assignee: The United States of America as represented by the Secretary of Commerce, NIST
    Inventors: Brenton J. Knuffman, Adam V. Steele, Jabez J. McClelland
  • Patent number: 8338803
    Abstract: The invention relates to a device for testing an integrated circuit. The device comprises a plate for receiving and subjecting the integrated circuit to a test. The plate comprises a component for powering and operating the integrated circuit and another component for measuring the operation of the integrated circuit during the test. The device also comprises an irradiation device for subjecting the circuit to a proton bombardment and a mask with a variable thickness provided between a bombardment access region on the integrated circuit and an established zone of the integrated circuit.
    Type: Grant
    Filed: December 2, 2009
    Date of Patent: December 25, 2012
    Assignee: European Aeronautic Defence and Space Company Eads France
    Inventors: Florent Miller, CĂ©cile Weulersse, Antonin Bougerol, Thierry Carriere, Patrick Heins, Samuel Hazo
  • Patent number: 8330129
    Abstract: One embodiment relates to an ion implanter. The ion implanter includes an ion source to generate an ion beam, as well as a scanner to scan the ion beam across a surface of a workpiece. The ion implanter also includes an array of absorption and radiation elements arranged to absorb energy of the scanned ion beam and radiate at least some of the absorbed energy away from the propagation direction. A detection element (e.g., an infrared detector) is arranged to detect energy (e.g., in the form of heat) radiated by the array of absorption and radiation elements and to determine a beam profile of the scanned ion beam based on the detected energy.
    Type: Grant
    Filed: August 24, 2011
    Date of Patent: December 11, 2012
    Assignee: Axcelis Technologies Inc.
    Inventor: William D. Lee
  • Patent number: 8168941
    Abstract: An ion beam angle calibration and emittance measurement system, comprising a plate comprising an elongated slit therein, wherein the elongated slit positioned at a rotation center of the plate and configured to allow a first beam portion to pass therethrough. A beam current detector located downstream of the plate, wherein the beam current detector comprises a slit therein configured to permit a second beam portion of the first beam portion to pass therethrough, wherein the beam current detector is configured to measure a first beam current associated with the first beam portion. A beam angle detector is located downstream of the beam current detector and configured to detect a second beam current associated with the second beam portion. The plate, the current beam detector and the beam angle detector are configured to collectively rotate about the rotation center of the plate.
    Type: Grant
    Filed: January 22, 2009
    Date of Patent: May 1, 2012
    Assignee: Axcelis Technologies, Inc.
    Inventors: Marvin Farley, Donald Polner, Geoffrey Ryding, Theodore Smick, Takao Sakase, Ronald Horner, Edward Eisner, Paul Eide, Brian Freer, Mark Lambert, Donovan Beckel
  • Patent number: 8093883
    Abstract: The invention provides an ion current measurement device for a tool having an ion source. The ion current measurement device comprises an ion collecting cup and a replaceable liner. The ion collecting cup is disposed in the tool and the ion collecting cup possesses a cup opening facing the ion source. The replaceable liner is disposed in the ion collecting cup and the replaceable liner entirely covers a continuous inner sidewall of the ion collecting cup.
    Type: Grant
    Filed: October 7, 2008
    Date of Patent: January 10, 2012
    Assignee: United Microelectronics Corp.
    Inventors: Jui-Fang Chen, Cheng-Hung Chang, Chung-Jung Chen, Chien-Kuo Ko, Chi-Chun Yao
  • Patent number: 8053739
    Abstract: A device to measure the beam spot of a particle beam, has a device that records the projections of the beam spot in many directions that are essentially perpendicular to the direction of the particle beam, and an analysis device that reconstructs a two-dimensional cross section profile of the particle beam from the recorded projections.
    Type: Grant
    Filed: June 23, 2009
    Date of Patent: November 8, 2011
    Assignee: Siemens Aktiengesellschaft
    Inventor: Eike Rietzel
  • Patent number: 7902503
    Abstract: A diagnostic system for characterization of an electron beam or an ion beam includes an electrical conducting disk of refractory material having a circumference, a center, and a Faraday cup assembly positioned to receive the electron beam or ion beam. At least one slit in the disk provides diagnostic characterization of the electron beam or ion beam. The at least one slit is located between the circumference and the center of the disk and includes a radial portion that is in radial alignment with the center and a portion that deviates from radial alignment with the center. The electron beam or ion beam is directed onto the disk and translated to the at least one slit wherein the electron beam or ion beam enters the at least one slit for providing diagnostic characterization of the electron beam or ion beam.
    Type: Grant
    Filed: August 8, 2008
    Date of Patent: March 8, 2011
    Assignee: Lawrence Livermore National Security, LLC
    Inventors: Alan T. Teruya, John W. Elmer, Todd A. Palmer
  • Publication number: 20100141236
    Abstract: An integrated optical element and Faraday cup that can measure charged particle beam currents, manipulate light and analyze charged particle beam energy distribution. One boundary of the cup is formed by a lens or other suitable optical element which can be used for manipulating light along the axis of the Faraday cup. The surface of the optical element interior to the cup is coated with a transparent conductor in order to establish the simultaneous functions of taking charged particle beam current measurements, taking energy distribution measurements and manipulating light for such applications as focusing or imaging. A suppressor/blanker/retarder electrode is designed to eliminate spurious current signals that can result from production of secondary electrons by the charged particle beam impinging on the electrode surface.
    Type: Application
    Filed: January 21, 2010
    Publication date: June 10, 2010
    Inventors: Brenton J. Knuffman, Adam V. Steele, Jabez J. McClelland
  • Patent number: 7696497
    Abstract: Apparatus for focusing a charged particle beam onto a surface, including a charged particle beam generator which is adapted to project the charged particle beam onto a location on the surface, thereby causing charges to be emitted from the location. The apparatus further includes an imaging detector which is adapted to receive the charges so as to form an image of the location, and an aberrating element which is positioned before the imaging detector and which is adapted to produce an aberration in the image. A processor is adapted to receive the image and to adjust at least one of the charged particle beam generator and a position of the surface in response to the aberration.
    Type: Grant
    Filed: August 24, 2005
    Date of Patent: April 13, 2010
    Assignees: Applied Materials Israel, Ltd., Carl Zeiss AG
    Inventor: Steven Robert Rogers
  • Publication number: 20100085033
    Abstract: The invention provides an ion current measurement device for a tool having an ion source. The ion current measurement device comprises an ion collecting cup and a replaceable liner. The ion collecting cup is disposed in the tool and the ion collecting cup possesses a cup opening facing the ion source. The replaceable liner is disposed in the ion collecting cup and the replaceable liner entirely covers a continuous inner sidewall of the ion collecting cup.
    Type: Application
    Filed: October 7, 2008
    Publication date: April 8, 2010
    Applicant: UNITED MICROELECTRONICS CORP.
    Inventors: Jui-Fang Chen, Cheng-Hung Chang, Chung-Jung Chen, Chien-Kuo Ko, Chi-Chun Yao
  • Patent number: 7683348
    Abstract: A Faraday cup structure for use with a processing tool. The cup structure has a conductive strike plate coupled to a circuit for monitoring ions striking the strike plate to obtain an indication of the ion beam current. The electrically conductive strike plate is fronted by a mask for dividing an ion beam intercepting cross section into regions or segments. The mask including walls extending to the strike plate for impeding ions reaching the sensor and particles dislodged from the sensor from entering into the evacuated region of the processing tool.
    Type: Grant
    Filed: October 11, 2006
    Date of Patent: March 23, 2010
    Assignee: Axcelis Technologies, Inc.
    Inventors: W Davis Lee, Neil K Colvin
  • Publication number: 20090295365
    Abstract: The present invention refers to a method for the precise measurement of dependency on amplitude and phase of a plurality of high frequency signals, preferably in the synchrotron accelerator of elementary particles. The essence of the solution according to the invention lies in that with a single measuring device and without any aliasing it is achieved a resolution of 0.2 micron and repeatability of measurements of 1 micron down to the lower frequency limit of a few MHz.
    Type: Application
    Filed: May 14, 2009
    Publication date: December 3, 2009
    Applicant: INSTRUMENTATION TECHNOLOGIES D.D.
    Inventors: Borut SOLAR, Primoz LEMUT, Vladimir POUCKI, Borut BARICEVIC, Tomaz KARCNIK
  • Patent number: 7564048
    Abstract: A Faraday sensor test system includes a Faraday sensor configured to intercept a quantity of ions incident on said Faraday sensor, a primary conductor and a test conductor coupled to said Faraday sensor, and a controller. The controller is configured to automatically provide a test current into the test conductor in response to a test condition. The controller is further configured to receive a return current from the primary conductor in response to the test current and to compare the return current to a value representative of the test current to determine a condition of a conductive path comprising the test conductor, the Faraday sensor, and the primary conductor.
    Type: Grant
    Filed: June 30, 2006
    Date of Patent: July 21, 2009
    Assignee: Varian Semiconductor E1quipment Associates, Inc.
    Inventors: Joseph P. Dzengeleski, Greg Gibilaro, Gregg Norris, David Olden, Tamer Onat
  • Publication number: 20090140717
    Abstract: The present invention involves an ion beam angular measurement apparatus for providing feedback for a predetermined set ion beam angle comprising an arrangement of composite pillars formed on an insulating material and wherein the composite pillars selectively allow ion beams to penetrate a first layer of a pillar, wherein resistivity measurements are taken for each of the composite pillars before and after test ion beam implantation and wherein the resistivity measurements yield information relating to an angle of the ion beam during test.
    Type: Application
    Filed: November 29, 2007
    Publication date: June 4, 2009
    Inventors: Leonard M. Rubin, Ivan Berry, Walter Class
  • Patent number: 7468549
    Abstract: The invention relates a substrate for a package for an electronic circuit and methods for packaging an electronic circuit with a substrate. The substrate comprises at least one conduction region and an activation region arranged within the substrate. The activation region is generally in contact with the conduction region and is configured to change its electrical resistance when activation occurs.
    Type: Grant
    Filed: June 15, 2005
    Date of Patent: December 23, 2008
    Assignee: Infineon Technologies AG
    Inventors: Rory Dickman, Michael Sommer
  • Publication number: 20080265866
    Abstract: One embodiment of the invention relates to an apparatus for profiling an ion beam. The apparatus includes a current measuring device having a measurement region, wherein a cross-sectional area of the ion beam enters the measurement region. The apparatus also includes a controller configured to periodically take beam current measurements of the ion beam and to determine a two dimensional profile of the ion beam by relating the beam current measurements to sub-regions within the current measuring device. Other apparatus and methods are also disclosed.
    Type: Application
    Filed: April 30, 2007
    Publication date: October 30, 2008
    Inventors: John Zheng Ye, Michael Paul Cristoforo, Yongzhang Huang, Michael A. Graf, Bo H. Vanderberg
  • Patent number: 7435970
    Abstract: It is possible to simplify the cooling mechanism of a superconductor, significantly reduce the cost, simplify the measurement work, and reduce the time required for measurement. A beam current meter includes: a cylindrical super conductor beam current sensor arranged in a vacuum vessel in such a manner that the beam incoming into the vacuum vessel is guided to pass through a bore of the vacuum vessel and a bridge portion is formed at the outer diameter, a SQUID arranged at the bridge portion of the beam current sensor; a cylindrical superconductor magnetic shield arranged so as to surround the external diameter side of the beam current sensor in such a manner that the SQUID is positioned between the beam current sensor and the magnetic shield, so that a beam is guided to pass through the bore of the beam current sensor, thereby measuring the beam the beam current of the beam. The beam current meter uses a freezing device as cooling means for cooling the beam current sensor, the SQUID, and the magnetic shield.
    Type: Grant
    Filed: May 28, 2004
    Date of Patent: October 14, 2008
    Assignee: Riken
    Inventors: Tamaki Watanabe, Takeshi Katayama, Masayuki Kase, Tokihiro Ikeda, Shin-ichi Watanabe, Takeo Kawaguchi
  • Patent number: 7378830
    Abstract: A micro beam Faraday cup assembly includes a refractory metal layer with an odd number of thin, radially positioned traces in this refractory metal layer. Some of the radially positioned traces are located at the edge of the micro modified Faraday cup body and some of the radially positioned traces are located in the central portion of the micro modified Faraday cup body. Each set of traces is connected to a separate data acquisition channel to form multiple independent diagnostic networks. The data obtained from the two diagnostic networks are combined and inputted into a computed tomography algorithm to reconstruct the beam shape, size, and power density distribution.
    Type: Grant
    Filed: June 23, 2005
    Date of Patent: May 27, 2008
    Assignee: Lawrence Livermore National Security, LLC
    Inventors: Alan T. Teruya, John W. Elmer, Todd A. Palmer, Chris C. Walton
  • Patent number: 7368731
    Abstract: The PSF for a metrology array for high resolution particle beam profile measurement has been improved by improving five major elements of the metrology array. While improvement in each of the five elements provides and improved PSF, a combination of all five of the elements provides an unexpected synergistic effect. The individual elements include the use of a plurality of slots as apertures; use of a high-Z material in forming the array; employing sidewalls on the slotted opening apertures where the sidewall forms an angle with a horizontal surface at the base of the array which is at least 75°; employing a knife edge where the upper corner radius ranges from about 1 nm to about 5 nm; and providing a surface finish at the upper corner of each knife edge which is less than 5 nm RMS.
    Type: Grant
    Filed: September 30, 2005
    Date of Patent: May 6, 2008
    Assignee: Applied Materials, Inc.
    Inventor: Jeffrey S. Sullivan
  • Publication number: 20080088295
    Abstract: A micro beam Faraday cup assembly includes a refractory metal layer with an odd number of thin, radially positioned traces in this refractory metal layer. Some of the radially positioned traces are located at the edge of the micro modified Faraday cup body and some of the radially positioned traces are located in the central portion of the micro modified Faraday cup body. Each set of traces is connected to a separate data acquisition channel to form multiple independent diagnostic networks. The data obtained from the two diagnostic networks are combined and inputed into a computed tomography algorithm to reconstruct the beam shape, size, and power density distribution.
    Type: Application
    Filed: June 23, 2005
    Publication date: April 17, 2008
    Inventors: Alan T. Teruya, John W. Elmer, Todd A. Palmer, Chris C. Walton
  • Patent number: 7279882
    Abstract: A beam position detector for measuring the properties of a charged particle beam, including the beam's position, size, shape, and intensity. One or more absorbers are constructed of thermo-resistive material and positioned to intercept and absorb a portion of the incoming beam power, thereby causing local heating of each absorber. The local temperature increase distribution across the absorber, or the distribution between different absorbers, will depend on the intensity, size, and position of the beam. The absorbers are constructed of a material having a strong dependence of electrical resistivity on temperature. The beam position detector has no moving parts in the vicinity of the beam and is especially suited to beam areas having high ionizing radiation dose rates or poor beam quality, including beams dispersed in the transverse direction and in their time radio frequency structure.
    Type: Grant
    Filed: October 4, 2004
    Date of Patent: October 9, 2007
    Assignee: Jefferson Science Associates, LLC
    Inventors: Pavel V. Degtiarenko, Danny Wayne Dotson
  • Patent number: 7244950
    Abstract: The present invention relates to a probe for determining the orientation of electron beams being profiled. To accurately time the location of an electron beam, the probe is designed to accept electrons from only a narrowly defined area. The signal produced from the probe is then used as a timing or triggering fiducial for an operably coupled data acquisition system. Such an arrangement eliminates changes in slit geometry, an additional signal feedthrough in the wall of a welding chamber and a second timing or triggering channel on a data acquisition system. As a result, the present invention improves the accuracy of the resulting data by minimizing the adverse effects of current slit triggering methods so as to accurately reconstruct electron or ion beams.
    Type: Grant
    Filed: June 21, 2005
    Date of Patent: July 17, 2007
    Assignee: The Regents of the University of California
    Inventors: John W. Elmer, Todd A. Palmer, Alan T. Teruya
  • Patent number: 7170067
    Abstract: The present invention provides a combined electrostatically suppressed Faraday and energy contamination monitor and related methods for its use. The apparatus of the present invention is capable of selectively measuring two properties of an ion beam, including, for example, a current and a level of energy contamination in a decelerated ion beam. A first aspect of the invention provides an ion beam measurement apparatus comprising an aperture for receiving the ion beam, a negatively biased electrode disposed adjacent to the aperture, a positively biased electrode disposed adjacent to the negatively biased electrode, a selectively biased electrode disposed adjacent to the positively biased electrode, and a collector, wherein the selectively biased electrode may selectively be negatively biased or positively biased.
    Type: Grant
    Filed: March 30, 2005
    Date of Patent: January 30, 2007
    Assignee: Varian Semiconductor Equipment Associates, Inc.
    Inventors: Anthony Renau, Eric Hermanson, Joseph C. Olson, Gordon Angel
  • Patent number: 7161352
    Abstract: A beam current measuring device (BMD) capable of measuring beam current while radiating the beam on a target, such as a semiconductor wafer. The BMD at least includes: (a) a detecting part operable to detect or collect a magnetic field corresponding to the beam current; and (b) a measuring part including (i) a SQUID sensitive to magnetic flux, and (ii) a feedback coil operable to carry feedback current wherein the feedback current is operable to cancel out a change in the magnetic flux penetrating through the SQUID. Wherein the operating point of the SQUID is set according to a finite beam current value, other than zero, which penetrates through the detecting part. A BMD of the present invention can be incorporated and used in an ion-implantation apparatus, an electron beam exposure apparatus, an accelerator, and the like.
    Type: Grant
    Filed: December 29, 2004
    Date of Patent: January 9, 2007
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventor: Yuichiro Sasaki
  • Patent number: 7106233
    Abstract: Galvanomagnetic sensor array system and method for providing data interface to a basic sensor array are provided. The sensor system includes an array of galvanomagnetic elements, and a processor coupled to receive each output signal from the array of galvanomagnetic elements. The processor and array of galvanomagnetic elements are integrated in a single semiconductor die.
    Type: Grant
    Filed: January 30, 2003
    Date of Patent: September 12, 2006
    Assignee: Delphi Technologies, Inc.
    Inventors: Thaddeus Schroeder, Jose Alberto Guerra
  • Patent number: 7012419
    Abstract: A circuit card stripline Fast Faraday cup quantitatively measures the picosecond time structure of a charged particle beam. The stripline configuration maintains signal integrity, and stitching of the stripline increases the bandwidth. A calibration procedure ensures the measurement of the absolute charge and time structure of the charged particle beam.
    Type: Grant
    Filed: March 26, 2004
    Date of Patent: March 14, 2006
    Assignee: UT-Battelle, LLC
    Inventor: Craig E. Deibele
  • Patent number: 6972552
    Abstract: A method and device for measurement of dependency on amplitude and phase of a plurality of high frequency signals used primarily with a synchrotron accelerator of elementary particles, includes alternately directing, with a radio frequency (RF) switch, each analogue input signal to each of a plurality of RF processing units; amplifying each analogue input signal in each RF processing unit in order to adjust signals to the measuring range of a plurality of analogue digital converters; directing each amplified analogue input signal to each of a plurality of analogue digital converters; converting the analogue signals to digital signals; directing the digital signals to a plurality of amplification correctors; correcting the digital signals by means of correcting signals from an amplification equalizer; collecting corrected digital signals in a digital switch and directing the ordered recombined number of digital signals to each of a plurality of digital receivers; and filtering the recombined number of digital
    Type: Grant
    Filed: May 5, 2004
    Date of Patent: December 6, 2005
    Assignee: Instrumentation Technologies D.O.O.
    Inventor: Rok Ursic
  • Patent number: 6972551
    Abstract: A widely used scanner device that rotates a single helically shaped wire probe in and out of a particle beam at different beamline positions to give a pair of mutually perpendicular beam profiles is modified by the addition of a second wire probe. As a result, a pair of mutually perpendicular beam profiles is obtained at a first beamline position, and a second pair of mutually perpendicular beam profiles is obtained at a second beamline position. The simple modification not only provides more accurate beam profiles, but also provides a measurement of the beam divergence and quality in a single compact device.
    Type: Grant
    Filed: September 29, 2003
    Date of Patent: December 6, 2005
    Assignee: UT-Battelle, LLC
    Inventors: Charles C. Havener, Riad Al-Rejoub
  • Patent number: 6914253
    Abstract: A method and apparatus for measuring doses of electron beams that are absorbed by an object subjected to e-beam irradiation. The absorbed dose can be continuously measured during an irradiation process, and adjustment can be made to system parameters in accordance with the measured absorbed dose.
    Type: Grant
    Filed: October 24, 2002
    Date of Patent: July 5, 2005
    Assignee: STERIS Inc.
    Inventors: Sergey A. Korenev, Ivan S. Korenev
  • Publication number: 20040222778
    Abstract: A method and device for measurement of dependency on amplitude and phase of a plurality of high frequency signals used primarily with a synchrotron accelerator of elementary particles, includes alternately directing, with a radio frequency (RF) switch, each analogue input signal to each of a plurality of RF processing units; amplifying each analogue input signal in each RF processing unit in order to adjust signals to the measuring range of a plurality of analogue digital converters; directing each amplified analogue input signal to each of a plurality of analogue digital converters; converting the analogue signals to digital signals; directing the digital signals to a plurality of amplification correctors; correcting the digital signals by means of correcting signals from an amplification equalizer; collecting corrected digital signals in a digital switch and directing the ordered recombined number of digital signals to each of a plurality of digital receivers; and filtering the recombined number of digital
    Type: Application
    Filed: May 5, 2004
    Publication date: November 11, 2004
    Inventor: Rok Ursic
  • Publication number: 20040149926
    Abstract: Methods and apparatus are disclosed for rapidly providing for a large number of closely spaced points within an area at right angle to the central trajectory of an ion beam data concerning intensity variations, emittance variations and angular variations of elementary beamlets with respect to the central beam trajectory. The technology is particular applicable to the application and control of ribbon beams used for semiconductor implantation.
    Type: Application
    Filed: December 11, 2003
    Publication date: August 5, 2004
    Inventors: Kenneth H. Purser, Carl J. Russo, Norman L. Turner
  • Patent number: 6763316
    Abstract: A method determines ion beam emittance, i.e., the beam current density based on position and angle, in a charged particle transport system. The emittance is determined from variations in the current measured in a slot Faraday or sample cup as a straight-edged mechanism traverses the beam upstream of the sample cup in a direction perpendicular to the orientation of the slot Faraday and the straight-edged mechanism, which also can be the direction in which the emittance is determined. An expression in terms of the beam current density can be determined for the derivative of the sample current with respect to position of the mechanism. Depending on the angular spread of the beam reaching the sample cup, the density can be determined directly from the derivative, or can be determined using a least squares analysis of the derivative over a range of mechanism positions.
    Type: Grant
    Filed: March 21, 2002
    Date of Patent: July 13, 2004
    Assignee: Varian Semiconductor Equipment Associates, Inc.
    Inventor: Louis Edward Evans